JP7150500B2 - 液体吐出ヘッドおよび液体吐出ヘッドの製造方法 - Google Patents
液体吐出ヘッドおよび液体吐出ヘッドの製造方法 Download PDFInfo
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- JP7150500B2 JP7150500B2 JP2018127514A JP2018127514A JP7150500B2 JP 7150500 B2 JP7150500 B2 JP 7150500B2 JP 2018127514 A JP2018127514 A JP 2018127514A JP 2018127514 A JP2018127514 A JP 2018127514A JP 7150500 B2 JP7150500 B2 JP 7150500B2
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- filter
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- 239000007788 liquid Substances 0.000 title claims description 60
- 238000000034 method Methods 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000011347 resin Substances 0.000 claims description 50
- 229920005989 resin Polymers 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 16
- 230000000149 penetrating effect Effects 0.000 claims description 13
- 238000005530 etching Methods 0.000 description 12
- 239000007864 aqueous solution Substances 0.000 description 10
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 239000004372 Polyvinyl alcohol Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 238000001020 plasma etching Methods 0.000 description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
- B41J2/17563—Ink filters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14145—Structure of the manifold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14403—Structure thereof only for on-demand ink jet heads including a filter
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Description
12 基板
16 ノズル層
18 フィルタ
26 支持部
Claims (9)
- 液体を供給する供給口と、液体を吐出するためのエネルギーを発生する素子とを備えた基板と、前記素子によって発生したエネルギーによって液体を吐出可能な吐出口と、前記供給口と前記吐出口とを連通する流路とを備えた樹脂層と、前記供給口と前記流路との間に配置されたフィルタと、を有する液体吐出ヘッドであって、
前記フィルタの前記供給口側の面および前記流路側の面を支持する支持部を有し、
前記支持部は、前記樹脂層と一体的に形成されている、ことを特徴とする液体吐出ヘッド。 - 前記支持部は、前記樹脂層から前記流路内を通って延在し、前記フィルタを貫通して前記供給口まで達している、請求項1に記載の液体吐出ヘッド。
- 前記フィルタを貫通する前記支持部の貫通部は、前記流路内に位置する前記支持部の延在部および前記供給口に位置する前記支持部の先端部よりも小径である請求項2に記載の液体吐出ヘッド。
- 液体を吐出するためのエネルギーを発生する素子を備えた基板を用意する第1工程と、
前記基板の第1面に、複数の貫通孔を備えたフィルタを形成する第2工程と、
前記フィルタに孔部を形成する第3工程と、
前記孔部と連通するように前記基板に供給口を形成するとともに、前記供給口に穴埋め部材を充填する第4工程と、
前記フィルタ上に第1樹脂層を形成し、前記孔部を利用するとともに前記第1樹脂層および前記穴埋め部材を成型して、前記フィルタの前記供給口側の面および該面と対向する面の両面を支持する支持部を形成るための第1パターンを形成する第5工程と、
前記第1樹脂層を覆い、かつ、前記第1パターンに樹脂材料を流入させて第2樹脂層を形成し、前記素子に対応する位置に、液体を吐出するための吐出口を形成するとともに、前記第1樹脂層および前記穴埋め部材を除去して前記支持部を形成する第6工程と
を有することを特徴とする液体吐出ヘッドの製造方法。 - 前記第5工程では、前記第1樹脂層により、前記フィルタ上に前記供給口と連通する流路を形成する第2パターンを形成し、
前記第6工程では、前記第1樹脂層および前記穴埋め部材を除去することで、前記支持部とともに、前記流路を形成する、請求項4に記載の液体吐出ヘッドの製造方法。 - 前記第5工程では、前記穴埋め部材を収縮させて成型する、請求項4または5に記載の液体吐出ヘッドの製造方法。
- 前記第3工程では、前記基板の前記第1面と対向する第2面から、前記基板および前記フィルタを貫通させて前記孔部を形成する、請求項4から6のいずれか1項に記載の液体吐出ヘッドの製造方法。
- 前記支持部は、前記第2樹脂層から延在し、前記孔部を介して前記フィルタを貫通して前記供給口まで達するように形成される、請求項4から7のいずれか1項に記載の液体吐出ヘッドの製造方法。
- 前記フィルタを貫通する前記支持部の貫通部は、前記第2樹脂層から延在する前記支持部の延在部および前記供給口に位置する前記支持部の先端部よりも小径である、請求項8に記載の液体吐出ヘッドの製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018127514A JP7150500B2 (ja) | 2018-07-04 | 2018-07-04 | 液体吐出ヘッドおよび液体吐出ヘッドの製造方法 |
US16/425,052 US10981392B2 (en) | 2018-07-04 | 2019-05-29 | Liquid ejection head and method of manufacturing liquid ejection head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2018127514A JP7150500B2 (ja) | 2018-07-04 | 2018-07-04 | 液体吐出ヘッドおよび液体吐出ヘッドの製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2020006535A JP2020006535A (ja) | 2020-01-16 |
JP7150500B2 true JP7150500B2 (ja) | 2022-10-11 |
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JP2018127514A Active JP7150500B2 (ja) | 2018-07-04 | 2018-07-04 | 液体吐出ヘッドおよび液体吐出ヘッドの製造方法 |
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US (1) | US10981392B2 (ja) |
JP (1) | JP7150500B2 (ja) |
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CN111572203B (zh) * | 2020-04-03 | 2021-06-08 | 北京泰微华赢技术有限公司 | 一种透明喷墨头的基于mems及印刷工艺的制备方法 |
JP7520581B2 (ja) | 2020-06-08 | 2024-07-23 | キヤノン株式会社 | 記録ヘッドおよびその製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020149650A1 (en) | 2000-06-20 | 2002-10-17 | Cruz-Uribe Antonio S. | Fluid ejection device having an integrated filter and method of manufacture |
JP2011110765A (ja) | 2009-11-25 | 2011-06-09 | Canon Inc | 液体吐出ヘッドの製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
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US6692109B2 (en) * | 2002-02-15 | 2004-02-17 | Brother Kogyo Kabushiki Kaisha | Ink-jet head |
JP4455282B2 (ja) | 2003-11-28 | 2010-04-21 | キヤノン株式会社 | インクジェットヘッドの製造方法、インクジェットヘッドおよびインクジェットカートリッジ |
KR100765315B1 (ko) * | 2004-07-23 | 2007-10-09 | 삼성전자주식회사 | 기판과 일체로 이루어진 필터링 부재를 구비하는 잉크젯헤드 및 그 제조방법. |
JP2007203623A (ja) | 2006-02-02 | 2007-08-16 | Canon Inc | インクジェット記録ヘッド及びその製造方法 |
US8037603B2 (en) * | 2006-04-27 | 2011-10-18 | Canon Kabushiki Kaisha | Ink jet head and producing method therefor |
JP2009208393A (ja) | 2008-03-05 | 2009-09-17 | Canon Inc | インクジェット記録ヘッド |
US8608303B2 (en) * | 2010-12-07 | 2013-12-17 | Canon Kabushiki Kaisha | Ink jet recording head |
JP5701119B2 (ja) * | 2011-03-23 | 2015-04-15 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP5901444B2 (ja) * | 2012-06-22 | 2016-04-13 | キヤノン株式会社 | 液体吐出ヘッド |
JP6478763B2 (ja) * | 2015-03-30 | 2019-03-06 | キヤノン株式会社 | 液体吐出ヘッド |
-
2018
- 2018-07-04 JP JP2018127514A patent/JP7150500B2/ja active Active
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- 2019-05-29 US US16/425,052 patent/US10981392B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020149650A1 (en) | 2000-06-20 | 2002-10-17 | Cruz-Uribe Antonio S. | Fluid ejection device having an integrated filter and method of manufacture |
JP2011110765A (ja) | 2009-11-25 | 2011-06-09 | Canon Inc | 液体吐出ヘッドの製造方法 |
Also Published As
Publication number | Publication date |
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US10981392B2 (en) | 2021-04-20 |
US20200009875A1 (en) | 2020-01-09 |
JP2020006535A (ja) | 2020-01-16 |
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