CN111572203B - 一种透明喷墨头的基于mems及印刷工艺的制备方法 - Google Patents
一种透明喷墨头的基于mems及印刷工艺的制备方法 Download PDFInfo
- Publication number
- CN111572203B CN111572203B CN202010257427.5A CN202010257427A CN111572203B CN 111572203 B CN111572203 B CN 111572203B CN 202010257427 A CN202010257427 A CN 202010257427A CN 111572203 B CN111572203 B CN 111572203B
- Authority
- CN
- China
- Prior art keywords
- ink
- cavity plate
- ink cavity
- piezoelectric ceramic
- jet head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000034 method Methods 0.000 title claims abstract description 47
- 238000002360 preparation method Methods 0.000 title claims abstract description 26
- 238000007639 printing Methods 0.000 title claims abstract description 17
- 239000000919 ceramic Substances 0.000 claims abstract description 33
- 239000011521 glass Substances 0.000 claims abstract description 29
- 235000012431 wafers Nutrition 0.000 claims abstract description 27
- 239000004065 semiconductor Substances 0.000 claims abstract description 9
- 230000007613 environmental effect Effects 0.000 claims abstract description 8
- 238000007650 screen-printing Methods 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 230000010287 polarization Effects 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 238000005245 sintering Methods 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 3
- 238000010329 laser etching Methods 0.000 claims description 3
- 238000001259 photo etching Methods 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical group [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000000126 substance Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000001514 detection method Methods 0.000 abstract description 4
- 238000012423 maintenance Methods 0.000 abstract description 4
- 238000001704 evaporation Methods 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000003292 glue Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010257427.5A CN111572203B (zh) | 2020-04-03 | 2020-04-03 | 一种透明喷墨头的基于mems及印刷工艺的制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010257427.5A CN111572203B (zh) | 2020-04-03 | 2020-04-03 | 一种透明喷墨头的基于mems及印刷工艺的制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN111572203A CN111572203A (zh) | 2020-08-25 |
CN111572203B true CN111572203B (zh) | 2021-06-08 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010257427.5A Active CN111572203B (zh) | 2020-04-03 | 2020-04-03 | 一种透明喷墨头的基于mems及印刷工艺的制备方法 |
Country Status (1)
Country | Link |
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CN (1) | CN111572203B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114248550A (zh) * | 2022-01-18 | 2022-03-29 | 麦科帕姆智能科技(淄博)有限公司 | 一种压电喷墨头 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7828417B2 (en) * | 2007-04-23 | 2010-11-09 | Hewlett-Packard Development Company, L.P. | Microfluidic device and a fluid ejection device incorporating the same |
WO2015064341A1 (ja) * | 2013-10-29 | 2015-05-07 | コニカミノルタ株式会社 | 圧電素子、インクジェットヘッド、インクジェットプリンタおよび圧電素子の製造方法 |
CN107399166B (zh) * | 2016-05-18 | 2019-05-17 | 中国科学院苏州纳米技术与纳米仿生研究所 | 一种mems剪切式压电喷墨打印头及其制备方法 |
JP6714851B2 (ja) * | 2016-06-28 | 2020-07-01 | セイコーエプソン株式会社 | Memsデバイス、液体噴射ヘッド、memsデバイスの製造方法、及び、液体噴射ヘッドの製造方法 |
JP2018057148A (ja) * | 2016-09-29 | 2018-04-05 | セイコーエプソン株式会社 | 振動子、圧電アクチュエーター、圧電モーター、ロボット、電子部品搬送装置およびプリンター |
CN106739505B (zh) * | 2016-11-09 | 2018-08-14 | 西安交通大学 | 一种复合腔体压电喷墨打印头及其制造方法 |
JP6897089B2 (ja) * | 2016-12-21 | 2021-06-30 | セイコーエプソン株式会社 | Memsデバイス、液体噴射ヘッド、液体噴射装置、memsデバイスの製造方法、液体噴射ヘッドの製造方法、及び、液体噴射装置の製造方法 |
JP7150500B2 (ja) * | 2018-07-04 | 2022-10-11 | キヤノン株式会社 | 液体吐出ヘッドおよび液体吐出ヘッドの製造方法 |
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2020
- 2020-04-03 CN CN202010257427.5A patent/CN111572203B/zh active Active
Also Published As
Publication number | Publication date |
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CN111572203A (zh) | 2020-08-25 |
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Effective date of registration: 20210204 Address after: 1 / F 162, building 1, yard 35, Huilongguan West Street, Changping District, Beijing Applicant after: Beijing Taiwei Huaying Technology Co.,Ltd. Address before: 101300 Beijing Shunyi District Niulanshan Town Tengren Road 22 4 Building 1 Floor Applicant before: BEIJING AORUN LIANCHUANG MICROELECTRONIC TECHNOLOGY DEVELOPMENT Co.,Ltd. |
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Effective date of registration: 20210716 Address after: 271000 No.123 Keji North Street, Eastern New District, Tai'an City, Shandong Province Patentee after: Shandong Zhongkang Jihong Technology Development Co.,Ltd. Address before: 1 / F 162, building 1, yard 35, Huilongguan West Street, Changping District, Beijing Patentee before: Beijing Taiwei Huaying Technology Co.,Ltd. |
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