JP7068409B2 - 切断装置及び切断品の製造方法 - Google Patents
切断装置及び切断品の製造方法 Download PDFInfo
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- JP7068409B2 JP7068409B2 JP2020158840A JP2020158840A JP7068409B2 JP 7068409 B2 JP7068409 B2 JP 7068409B2 JP 2020158840 A JP2020158840 A JP 2020158840A JP 2020158840 A JP2020158840 A JP 2020158840A JP 7068409 B2 JP7068409 B2 JP 7068409B2
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- package substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
<切断装置1の全体構成>
ここで、第一位置確認カメラ5dによる確認は、例えば、パッケージ基板Pに設けられた切断位置を示すマークの位置を確認することができる。第二位置確認カメラ6bによる確認は、例えば、パッケージ基板Pの切断された位置、切断された幅等を確認することができる。
なお、上記確認カメラによる確認は、第一位置確認カメラ5dを使用せずに、第二位置確認カメラ6bのみで確認を行ってもよい。
次に、図2、図3を参照して、本実施形態の切断テーブル5の要部の構成について説明する。図2に示すように、この切断テーブル5は、吸着ラバー50とベースプレート511を備えた保持部材5aと、支持部材SMとを備えている。吸着ラバーは、パッケージ基板Pを吸着して保持するための吸着部50aを備えている。支持部材SMは、吸着部50aに通じる空間SPと、空間SPと真空ポンプ(図示なし)との間に接続される吸引孔VHとを備えている。本実施形態のパッケージ基板Pは湾曲しており、保持部材5aの吸着ラバー50はパッケージ基板Pの湾曲に対応した湾曲形状となっている。また、吸着ラバー50を上方から投影した面積と湾曲したパッケージ基板Pを上方から投影した面積とが同一である。
体パッケージSを製造することができる。
A 切断モジュール
B 検査モジュール
5 切断テーブル
5a 保持部材
50 吸着ラバー
51 ベースプレート
50a 吸着部
SM 支持部材
SP 空間
VH 吸引孔
6 切断機構
Claims (5)
- 樹脂成形されたパッケージ基板を複数の半導体パッケージに切断する切断装置であって、
前記パッケージ基板を吸着保持する保持部材を備えた切断テーブルと、
前記保持部材に吸着保持された前記パッケージ基板を切断する切断機構とを備え、
前記パッケージ基板は、湾曲しており、
前記保持部材は、前記パッケージ基板を吸着していない状態で、前記パッケージ基板を吸着する面が前記パッケージ基板の湾曲に対応した湾曲形状であり、前記パッケージ基板を吸着する面の反対側の面が平面形状である吸着ラバーを備える、切断装置。 - 前記吸着ラバーは、硬度を低くすることにより前記パッケージ基板の湾曲に倣わせたものでない、請求項1に記載の切断装置。
- 前記吸着ラバーは、前記パッケージ基板を吸着する面が中央に向かって出っ張った曲面形状である、請求項1又は2のいずれか一項に記載の切断装置。
- 前記吸着ラバーは、前記パッケージ基板を吸着する面が中央に向かって窪んだ曲面形状である、請求項1又は2のいずれか一項に記載の切断装置。
- 請求項1~4に記載の切断装置の前記切断テーブルに吸着保持された前記湾曲した半導体パッケージを前記切断機構により切断し切断品を製造する、切断品の製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020158840A JP7068409B2 (ja) | 2020-09-23 | 2020-09-23 | 切断装置及び切断品の製造方法 |
CN202110898171.0A CN114256122A (zh) | 2020-09-23 | 2021-08-05 | 切断装置及切断品的制造方法 |
TW110129743A TWI799942B (zh) | 2020-09-23 | 2021-08-12 | 切斷裝置及切斷品的製造方法 |
KR1020210122937A KR20220040393A (ko) | 2020-09-23 | 2021-09-15 | 절단 장치 및 절단품의 제조 방법 |
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JP2020158840A JP7068409B2 (ja) | 2020-09-23 | 2020-09-23 | 切断装置及び切断品の製造方法 |
Publications (2)
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JP2022052438A JP2022052438A (ja) | 2022-04-04 |
JP7068409B2 true JP7068409B2 (ja) | 2022-05-16 |
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JP2020158840A Active JP7068409B2 (ja) | 2020-09-23 | 2020-09-23 | 切断装置及び切断品の製造方法 |
Country Status (4)
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JP (1) | JP7068409B2 (ja) |
KR (1) | KR20220040393A (ja) |
CN (1) | CN114256122A (ja) |
TW (1) | TWI799942B (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012147343A1 (ja) | 2011-04-26 | 2012-11-01 | 株式会社ニコン | 基板貼り合わせ装置、基板保持装置、基板貼り合わせ方法、基盤保持方法、積層半導体装置および重ね合わせ基板 |
JP2016083717A (ja) | 2014-10-24 | 2016-05-19 | Towa株式会社 | ワーク吸着板、ワーク切断装置、ワーク切断方法、およびワーク吸着板の製造方法 |
JP2019021703A (ja) | 2017-07-13 | 2019-02-07 | 株式会社ディスコ | 板状の被加工物の切断方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5666947B2 (ja) | 2011-03-09 | 2015-02-12 | アピックヤマダ株式会社 | ワーク吸引治具及びワーク把持方法 |
-
2020
- 2020-09-23 JP JP2020158840A patent/JP7068409B2/ja active Active
-
2021
- 2021-08-05 CN CN202110898171.0A patent/CN114256122A/zh active Pending
- 2021-08-12 TW TW110129743A patent/TWI799942B/zh active
- 2021-09-15 KR KR1020210122937A patent/KR20220040393A/ko not_active Application Discontinuation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012147343A1 (ja) | 2011-04-26 | 2012-11-01 | 株式会社ニコン | 基板貼り合わせ装置、基板保持装置、基板貼り合わせ方法、基盤保持方法、積層半導体装置および重ね合わせ基板 |
JP2016083717A (ja) | 2014-10-24 | 2016-05-19 | Towa株式会社 | ワーク吸着板、ワーク切断装置、ワーク切断方法、およびワーク吸着板の製造方法 |
JP2019021703A (ja) | 2017-07-13 | 2019-02-07 | 株式会社ディスコ | 板状の被加工物の切断方法 |
Also Published As
Publication number | Publication date |
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JP2022052438A (ja) | 2022-04-04 |
CN114256122A (zh) | 2022-03-29 |
TW202213478A (zh) | 2022-04-01 |
TWI799942B (zh) | 2023-04-21 |
KR20220040393A (ko) | 2022-03-30 |
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