JP7005939B2 - コンタクトプローブ - Google Patents
コンタクトプローブ Download PDFInfo
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- JP7005939B2 JP7005939B2 JP2017104033A JP2017104033A JP7005939B2 JP 7005939 B2 JP7005939 B2 JP 7005939B2 JP 2017104033 A JP2017104033 A JP 2017104033A JP 2017104033 A JP2017104033 A JP 2017104033A JP 7005939 B2 JP7005939 B2 JP 7005939B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06716—Elastic
- G01R1/06722—Spring-loaded
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06716—Elastic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06755—Material aspects
- G01R1/06761—Material aspects related to layers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2863—Contacting devices, e.g. sockets, burn-in boards or mounting fixtures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R35/00—Testing or calibrating of apparatus covered by the other groups of this subclass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
Description
10:Ni-P層
10a:Ni-P層の最内側
10b:Ni-P層の表層
11:第1部分
12:第2部分
13:第3部分
14:スプリング部
20:プランジャ
30:Ni-P層とプランジャの接合箇所
40:芯材
50:ハウジング
51:穴
60:ホットプレート
Claims (9)
- 軸方向に延在する筒部材と、軸方向に延在し検体と接触するプランジャと、を備え、
前記プランジャは、前記筒部材の内方の空間に挿通されており、
前記筒部材は、筒部と、軸方向における前記筒部の下部にコイル形状であって軸方向に収縮するスプリング部と、軸方向における前記スプリング部の下部に筒部と、を有し、
前記筒部材は、Ni-P層を有しており、
前記Ni-P層の厚さ方向の位置によってPの濃度が異なるコンタクトプローブ。 - 前記Ni-P層の厚さ方向に、前記Ni-P層の内側から順に第1部分および第2部分を有し、
前記第2部分は、前記第1部分よりもPの濃度が低い請求項1に記載のコンタクトプローブ。 - 前記Ni-P層の厚さ方向に、前記Ni-P層の内側から順に第1部分、第2部分、および第3部分を有し、
前記第2部分は、前記第1部分および前記第3部分よりもPの濃度が低い請求項2に記載のコンタクトプローブ。 - 前記Ni-P層の厚さ方向に、前記Ni-P層の内側から順に第1部分、第2部分、第3部分、第4部分および第5部分を有し、
前記第2部分および前記第4部分は、前記第1部分、前記第3部分および前記第5部分よりもPの濃度が低い請求項3に記載のコンタクトプローブ。 - 前記第1部分のPの平均濃度は、1.0質量%以上5.0質量%以下である請求項2~4のいずれか一項に記載のコンタクトプローブ。
- 前記第2部分は、前記Ni-P層の最内側から前記Ni-P層の厚みの1/4以上離れた位置にあり、
前記第2部分のPの平均濃度は、0.5質量%以上5.0質量%以下である請求項2~4のいずれか一項に記載のコンタクトプローブ。 - 前記Ni-P層の所定箇所の厚さ方向におけるPの最大濃度は、前記厚さ方向におけるPの最小濃度の1.2倍以上である請求項1~6のいずれか一項に記載のコンタクトプローブ。
- 前記Ni-P層の最内側からの距離が前記Ni-P層の厚みの1/8以上1/4以下の部分のPの平均濃度は、前記Ni-P層の最内側からの距離が前記Ni-P層の厚みの5/8以上3/4以下の部分のPの平均濃度よりも高い請求項1~7のいずれか一項に記載のコンタクトプローブ。
- 前記Ni-P層の外方に、前記Ni-P層とは異なる層をさらに備える請求項1~8のいずれか一項に記載のコンタクトプローブ。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017104033A JP7005939B2 (ja) | 2017-05-25 | 2017-05-25 | コンタクトプローブ |
KR1020180051167A KR102597115B1 (ko) | 2017-05-25 | 2018-05-03 | 콘택트 프로브 |
TW107117761A TWI775857B (zh) | 2017-05-25 | 2018-05-24 | 接觸探針 |
CN202210859753.2A CN115236369A (zh) | 2017-05-25 | 2018-05-24 | 接触探针 |
CN201810509356.6A CN108931673A (zh) | 2017-05-25 | 2018-05-24 | 接触探针 |
US15/989,271 US10782317B2 (en) | 2017-05-25 | 2018-05-25 | Contact probe |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017104033A JP7005939B2 (ja) | 2017-05-25 | 2017-05-25 | コンタクトプローブ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018200194A JP2018200194A (ja) | 2018-12-20 |
JP7005939B2 true JP7005939B2 (ja) | 2022-01-24 |
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JP2017104033A Active JP7005939B2 (ja) | 2017-05-25 | 2017-05-25 | コンタクトプローブ |
Country Status (5)
Country | Link |
---|---|
US (1) | US10782317B2 (ja) |
JP (1) | JP7005939B2 (ja) |
KR (1) | KR102597115B1 (ja) |
CN (2) | CN108931673A (ja) |
TW (1) | TWI775857B (ja) |
Families Citing this family (2)
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---|---|---|---|---|
USD847757S1 (en) * | 2017-08-30 | 2019-05-07 | Kabushiki Kaisha Nihon Micronics | Probe pin |
JP7101608B2 (ja) * | 2018-12-21 | 2022-07-15 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
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2017
- 2017-05-25 JP JP2017104033A patent/JP7005939B2/ja active Active
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2018
- 2018-05-03 KR KR1020180051167A patent/KR102597115B1/ko active IP Right Grant
- 2018-05-24 CN CN201810509356.6A patent/CN108931673A/zh active Pending
- 2018-05-24 TW TW107117761A patent/TWI775857B/zh active
- 2018-05-24 CN CN202210859753.2A patent/CN115236369A/zh active Pending
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JP2018200194A (ja) | 2018-12-20 |
KR102597115B1 (ko) | 2023-11-01 |
TW201901161A (zh) | 2019-01-01 |
KR20180129636A (ko) | 2018-12-05 |
CN108931673A (zh) | 2018-12-04 |
US20180340960A1 (en) | 2018-11-29 |
US10782317B2 (en) | 2020-09-22 |
CN115236369A (zh) | 2022-10-25 |
TWI775857B (zh) | 2022-09-01 |
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