JP6976111B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP6976111B2 JP6976111B2 JP2017173957A JP2017173957A JP6976111B2 JP 6976111 B2 JP6976111 B2 JP 6976111B2 JP 2017173957 A JP2017173957 A JP 2017173957A JP 2017173957 A JP2017173957 A JP 2017173957A JP 6976111 B2 JP6976111 B2 JP 6976111B2
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- 239000004065 semiconductor Substances 0.000 title claims description 74
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000000758 substrate Substances 0.000 claims description 64
- 239000002184 metal Substances 0.000 claims description 58
- 229910052751 metal Inorganic materials 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 26
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 13
- 230000007547 defect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- H—ELECTRICITY
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32131—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by physical means only
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
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- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
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- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68368—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used in a transfer process involving at least two transfer steps, i.e. including an intermediate handle substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
- H01L2223/5446—Located in scribe lines
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- High Energy & Nuclear Physics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Dicing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Laser Beam Processing (AREA)
Description
図1(a)〜(g)は、本発明の第1の実施形態の半導体装置の製造方法を示す工程断面図であり、特に、半導体基板の裏面にメタルを形成し、これを個片化する工程を説明するための工程断面図である。
図5は、本発明の第2の実施形態の半導体装置の製造方法を示す工程断面図である。
図6(a)〜(c)は、本発明の第3の実施形態の半導体装置の製造方法を示す工程断面図である。
本実施形態による半導体装置の製造方法は、図1に示す第1の実施形態の半導体装置の製造方法の図1(d)に示す工程までは同一であるため、同様の構成要素には同一の符号を付し、重複する説明は適宜省略する。
12 改質層
13 メタル層
20 サポート基板
21 バックグラインドテープ
22 ブレード
23 エキスパンドテープ
Claims (2)
- 半導体基板のストリートに沿ってレーザーを照射し、前記半導体基板内部に改質層を形成する工程と、
前記半導体基板の裏面にメタル層を形成する工程と、
前記メタル層を前記ストリートに沿ってブレードによりダイシングする工程と、
前記改質層が形成された半導体基板に外力を加えて前記半導体基板をダイシングする工程と、
を備え、
前記外力は、前記メタル層をダイシングする工程において、前記ブレードにより加えられることを特徴とする半導体装置の製造方法。 - 前記メタル層の形成は、前記改質層を形成する工程よりも後に行われ、
前記レーザーは、前記半導体基板の裏面から照射されることを特徴とする請求項1に記載の半導体装置の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017173957A JP6976111B2 (ja) | 2017-09-11 | 2017-09-11 | 半導体装置の製造方法 |
TW107129370A TW201921453A (zh) | 2017-09-11 | 2018-08-23 | 半導體裝置的製造方法 |
KR1020180105952A KR20190029452A (ko) | 2017-09-11 | 2018-09-05 | 반도체 장치의 제조 방법 |
CN201811035569.6A CN109494188A (zh) | 2017-09-11 | 2018-09-06 | 半导体装置的制造方法 |
US16/124,637 US10636707B2 (en) | 2017-09-11 | 2018-09-07 | Method of manufacturing a semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017173957A JP6976111B2 (ja) | 2017-09-11 | 2017-09-11 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019050296A JP2019050296A (ja) | 2019-03-28 |
JP6976111B2 true JP6976111B2 (ja) | 2021-12-08 |
Family
ID=65632316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017173957A Active JP6976111B2 (ja) | 2017-09-11 | 2017-09-11 | 半導体装置の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10636707B2 (ja) |
JP (1) | JP6976111B2 (ja) |
KR (1) | KR20190029452A (ja) |
CN (1) | CN109494188A (ja) |
TW (1) | TW201921453A (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7398242B2 (ja) * | 2019-10-28 | 2023-12-14 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理システム |
JP2022034898A (ja) | 2020-08-19 | 2022-03-04 | キオクシア株式会社 | 半導体装置の製造方法および半導体装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0456149A (ja) | 1990-06-21 | 1992-02-24 | Sharp Corp | 半導体基板 |
JPH04335550A (ja) | 1991-05-13 | 1992-11-24 | Sumitomo Electric Ind Ltd | 半導体装置の製造方法 |
JP2763441B2 (ja) * | 1992-02-06 | 1998-06-11 | 三菱電機株式会社 | 半導体装置の製造方法 |
JP4561605B2 (ja) * | 2005-11-16 | 2010-10-13 | 株式会社デンソー | 半導体ウェハ加圧治具およびその使用方法 |
US8680653B2 (en) * | 2007-11-12 | 2014-03-25 | Infineon Technologies Ag | Wafer and a method of dicing a wafer |
JP2009200140A (ja) * | 2008-02-20 | 2009-09-03 | Disco Abrasive Syst Ltd | 半導体チップの製造方法 |
JP5888870B2 (ja) * | 2011-04-25 | 2016-03-22 | 株式会社ディスコ | ウエーハの分割方法 |
US20130140592A1 (en) * | 2011-12-01 | 2013-06-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Light emitting diode with improved light extraction efficiency and methods of manufacturing same |
US10325861B2 (en) * | 2016-09-30 | 2019-06-18 | Intel IP Corporation | Methods and structures for dicing integrated circuits from a wafer |
-
2017
- 2017-09-11 JP JP2017173957A patent/JP6976111B2/ja active Active
-
2018
- 2018-08-23 TW TW107129370A patent/TW201921453A/zh unknown
- 2018-09-05 KR KR1020180105952A patent/KR20190029452A/ko unknown
- 2018-09-06 CN CN201811035569.6A patent/CN109494188A/zh not_active Withdrawn
- 2018-09-07 US US16/124,637 patent/US10636707B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20190029452A (ko) | 2019-03-20 |
US10636707B2 (en) | 2020-04-28 |
US20190080964A1 (en) | 2019-03-14 |
CN109494188A (zh) | 2019-03-19 |
TW201921453A (zh) | 2019-06-01 |
JP2019050296A (ja) | 2019-03-28 |
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