JP6879929B2 - 光機能性膜およびその製造方法 - Google Patents
光機能性膜およびその製造方法 Download PDFInfo
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- JP6879929B2 JP6879929B2 JP2017551125A JP2017551125A JP6879929B2 JP 6879929 B2 JP6879929 B2 JP 6879929B2 JP 2017551125 A JP2017551125 A JP 2017551125A JP 2017551125 A JP2017551125 A JP 2017551125A JP 6879929 B2 JP6879929 B2 JP 6879929B2
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- polysiloxane
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- 239000002105 nanoparticle Substances 0.000 claims description 40
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 35
- 239000002904 solvent Substances 0.000 claims description 35
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- 125000003118 aryl group Chemical group 0.000 claims description 3
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 4
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Images
Classifications
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- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
- C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/398—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing boron or metal atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J3/28—Treatment by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/858—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
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Description
これら、ガラス表面への映り込み、光取り込み効率または光取り出し効率の低下は、屈折率が異なる2つの層の界面で起こる反射に起因している。このような反射は、これらの問題の他にも、層内での多重反射による透過率の波長依存性を引き起こすこともある。
Rf=(n1−n0)2/(n1+n0)2
この反射防止膜により、低屈折率層(たとえば空気層)と反射防止膜との界面における反射と、反射防止膜と高屈折率層(たとえばガラス)との界面における反射との光学干渉により反射率を低減させることができる。上記条件で、反射防止膜に最適な屈折率n2は
n2=(n1/n0)1/2
であらわされる。たとえば、空気層とガラスとの間には、屈折率1.22の非常に低い屈折率層が要求される。さらに、低屈折率層と高屈折率層の各々の反射光を逆位相にするためには、低屈折率層の膜厚はλ/4(ここでλは入射光波長である)であり、波長を可視光域の中心のλ=550nmに設定した場合の最適膜厚は0.14μmである。
しかし、膜厚を完全に一定にし、反射光を完全に逆位相にして打ち消し合わせるのは困難であり、また、単一の波長の光ではなく、複数の波長の光等を用いることも想定され、反射防止膜を用いた場合に透過率の波長依存性を小さくすることは課題である。
また、本発明による光機能性膜は、生産性にすぐれ、大面積の膜を形成可能であり、経済性および汎用性の面においても優れたものである。
本発明による光機能性膜は、シリカ質材料を含んでなる。ここでシリカ質材料とは、シロキサンを主体とした材料であり、このようなシリカ質材料を含む光機能性膜の形成方法は後述する。
したがって、この光機能性膜の表面Aおよび表面Bは、種々の媒体と接触するように配置される。たとえば、太陽電池などの受光素子の表面に用いられる場合には、通常、屈折率の高い表面Aが半導体素子の表面に接触し、屈折率の低い表面Bは空気に接触する。また、本発明による光機能性膜が発光素子の表面に用いられる場合には、発光素子の発光面に屈折率の高い表面Aが発光素子の表面に接触し、屈折率の低い表面Bは、さらに光機能性膜の上に設けられたガラス保護膜に接触することがある。
このとき、表面Aに接触する媒体Xの屈折率がnXであり、表面Bに接触する媒体Yの屈折率がnYであるとき、
nY≦nB<nA≦nX
の関係を満たすことが好ましい。特に、表面Bが空気に接触している時には、
1≦nB<nA≦nX
であることが好ましい。そして、一表面の屈折率と、その表面に接触する媒体の屈折率との差が大きいと、その接触界面において光反射が大きくなる。したがって、nYとnBの差、およびnAとnXの差は小さいことが好ましい。理想的には、nB−nY=0、nx−nA=0である。なお、nAとnXの差が1%未満であれば、nA<nXであったとしても、本発明の効果は実質的に失われない。ここで、各屈折率は、光を利用する場合は、波長が555nmの光に対するものである。
本発明による光機能性膜は、任意の方法により形成させることができる。形成方法に応じて、たとえば図2〜図4に示されるような屈折率の変化を示す光機能性膜を形成させることができるが、特に図2に示されるような屈折率変化を示す光機能性膜を形成させることが比較的簡便であり、生産性に優れている。
R11 n1Si(OR12)4−n1 (1)(式中、
R11は、任意のメチレンが酸素で置き換えられてもよい炭素数1〜20の直鎖状、分岐状あるいは環状のアルキル基、または炭素数6〜20で任意の水素がフッ素で置き換えられていてもよいアリール基を表し、
R12は、水素または炭素数1〜10のアルキル基、好ましくは炭素数1〜6のアルキル基、を表し、
n1は0〜2を表す。)
であらわされるシラン化合物を、酸性あるいは塩基性触媒の存在下で加水分解・縮合させて得られるものである。このようなポリシロキサンからは、一般に屈折率が1.30〜1.60程度のシリカ質材料を得ることができる。
これらの中で、メチルトリメトキシシラン、メチルトリエトキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシランは、入手しやすく好ましい化合物である。
このような複合体を含む被膜を焼成すると、ナノ粒子の周囲に空隙が形成されるのである。このような複合体を用いることにより、空隙率に応じて屈折率が1.05〜1.40程度のシリカ質材料を得ることができる。
そのほか、ユーロピウム酸化物を用いた場合には、硬化膜に蛍光特性を付与することができ、酸化亜鉛を用いた場合は、UV吸収特性が付与され、酸化ホウ素を用いた場合は、フィルムの誘電率が低くなり、酸化アルミニウムを用いた場合は、赤外吸収特性が付与される。これらの特性改善または特性付与の観点から、チタン、ジルコニウム、亜鉛、ホウ素、またはアルミニウムの酸化物を用いることが好ましい。
MxOy(OR3)z (3)(式中、
MはTi、Zr、Eu、Zn、B、Al、Ta、およびHfからなる群から選択される元素であり、
R3は、水素、またはC1〜C10の、好ましくはC1〜C6の、アルキル基またはアルケニル基であり、
2y+z=x×[Mの価数]を満たす)
本発明による光機能性膜は光反射が少ないため、半導体素子などの表面に用いるのに有用である。そして、シリカ質材料から形成されていることから、透過率、強度、誘電率などにも優れている。このため、本発明による光機能性膜を具備した半導体素子、たとえば太陽電池、LED及びOLEDなどは優れた特性を示すものである。そして、特に発光素子や太陽電池などの光を利用する素子には、高温耐性、環境耐性、光耐性、または化学薬品耐性等が要求されるため、シリカ質材料から形成されている本発明による光機能性膜は特に有用である。
撹拌機、温度計、冷却管を備えた2Lのフラスコ中で、水酸化ナトリウム20g、イソプロピルアルコール(以下、IPAという)300ml、および水13.5gを混合して反応溶媒を調製し、10℃に維持した。さらに、メチルトリメトキシシラン68gを加え混合溶液を調製した。その混合溶液を10℃にて滴下ロートを用いて反応溶媒に滴下し、10℃に維持しながら2時間撹拌した後、10%HCl水溶液を加え中和した。反応液にトルエン200ml、および水300mlを添加して振とうした後、2層に分離させた。
得られた有機層を減圧下濃縮することで溶媒を除去し、濃縮物に固形分濃度10重量%なるようにPGMEAを添加して、メチルシルセスキオキサン含有組成物A(以下、組成物Aという)を調整した。得られたメチルシルセスキオキサンの平均重量分子量(ポリスチレン換算)は3,562であった。
撹拌機、温度計、冷却管を備えた2Lのフラスコ中で、25重量%テトラメチルアンモニウムヒドロキシド水溶液36.5g、IPA300ml、および水1.5gを混合して反応溶媒を調製し、10℃に維持した。さらに、フェニルトリメトキシシラン44.6g、メチルトリメトキシシラン34.1g、およびテトラメトキシシラン3.8gの混合溶液を調製した。その混合溶液を10℃にて滴下ロートを用いて反応溶媒に滴下し、10℃に維持しながら2時間撹拌した後、10%HCl水溶液を加え中和した。反応液にトルエン200ml、および水300mlを添加して振とうした後、2層に分離させた。得られた有機層を減圧下濃縮することで溶媒を除去し、濃縮物に固形分濃度10重量%なるようにPGMEAを添加して、メチルフェニルシルセスキオキサン含有組成物B(以下、組成物Bという)を含む溶液を調整した。得られたメチルフェニルシルセスキオキサンの平均重量分子量(ポリスチレン換算)は2,180であった。
ガラス基板の表面に、組成物Aを塗布し、100℃90秒間プリベーク後、300℃1時間加熱して、厚さ1μmの被膜を形成させた。ガラス基板の屈折率は1.48、被膜の屈折率は1.38であった。
このとき、透過率は図6に示す通りであり、450nmから800nmの平均は、93.3%であった。これは、透過光が、入射光とガラスの界面の反射(屈折率より計算した理論値3.87%)、ガラスの界面と被膜の界面の反射(理論値0.15%)、および被膜と空気の界面の反射(理論値2.55%)によって減少した結果と考えられる。なお、透過率の理論値は92.38%である。
ガラス基板の表面に、組成物Bを塗布し、100℃90秒間プリベーク後、300℃30分間加熱して、厚さ1μmの被膜を形成させた。被膜の屈折率は1.49であった。
このとき、透過率は図6に示す通りであり、450nmから800nmの透過率の平均は92.3%であった。これは、透過光が、入射光とガラスの界面の反射(屈折率より計算した理論値3.87%)、ガラスの界面と被膜の界面の反射(理論値0.00%)、および被膜と空気の界面の反射(理論値3.75%)によって減少した結果と考えられる。
なお、透過率の理論値は92.23%である。
また、図6に示すように、比較例2では、ガラス単独のときと同様に、波長依存はほとんど確認されなかった。これは、被膜の屈折率はガラスの屈折率とほぼ同等のため、ガラスと被膜の間で反射が起こらず、反射光の干渉が起こらなかったためと推測される。
ガラス基板の表面に、組成物Bを500nmの厚さとなるように塗布し、150℃90秒間加熱して第1層を形成させた。次いで、組成物Aを500nmの厚さとなるように塗布し、200℃90秒間プリベーク後、300℃1時間加熱して、第1層および第2層を完全に硬化させた。すなわち、異なる屈折率を有する第1層と第2層とが積層され、それらの界面部分が相溶した光機能性膜を形成させた。
このとき、透過率は図7に示す通りであり、450nmから800nmの透過率の平均は93.2%であった。これは、透過光が、入射光とガラスの界面の反射(屈折率より計算した理論値3.87%)、ガラスの界面と光機能性膜の界面の反射(光機能性膜のガラスに近い部分の屈折率を1.49とすると、理論値0.00%)、および光機能性膜と空気の界面の反射(光機能性膜の空気に近い部分の屈折率を1.38とすると、理論値2.55%)によって減少した結果と考えられる。なお、透過率の理論値は93.58%である。
また、図7に示すように、透過率の波長依存はほとんど観測されなかった。これは、これは、被膜の屈折率はガラスの屈折率とほぼ同等のため、ガラスと被膜の間で反射が起こらず、反射光の干渉が起こらなかったためと推測される。
以上より、実施例1は、透過率に優れ、かつ透過率が波長依存性のない優れた光機能性膜であると言える。
第一層の組成物B塗布直後の加熱温度以外は実施例1と同様にして、光機能性膜を形成した。参考例1、2、および3の加熱温度は、それぞれ130℃、170℃、および200℃であった。
このとき、透過率は図8に示す通りであり、450nmから800nmの透過率の平均は実施例と同等であった。
参考例1は、図8に示すように透過率の波長依存性が若干見られた。これは、組成物B塗布直後の加熱温度が低いために、第2層の組成物Aの塗布時に、第1層の一部が溶解してしまい、結果として、実施例1で認められる程度の構造による波長依存性改良効果が得られなかったためと考えられる。
透過率の波長依存性は少ない光機能性膜が求められるので、第一層塗布後の加熱温度の最適化が必要と考えられる。
Claims (8)
- シリカ質材料を含んでなる光機能性膜の製造方法であって、
前記シリカ質材料が、シラノール基を有するポリシロキサンを原料として形成されたものであり、
前記光機能性膜は、基材の上にポリシロキサンと溶媒とを含む組成物を塗布し、100〜200℃で加熱することにより表面の難溶化処理をして第1層を形成させる第1層形成工程、前記第1層の表面に前記ポリシロキサンとは異なるポリシロキサンと、前記溶媒と同一または異なる溶媒とを含む組成物を塗布して第2層を形成させる第2層形成工程、および前記第1層および前記第2層を加熱して硬化させる加熱工程を含んでなり、前記第2層形成工程開始後から加熱工程終了までの間に、150℃以上で加熱することにより前記第1層と前記第2層の接触部分を相溶化させることを含んでなることによって製造され、
前記光機能性膜の一方の表面Aの光に対する屈折率nAが、反対側表面Bの光に対する屈折率nBに対して大きく、前記表面Aから前記表面Bまで、光に対する屈折率が連続的に減少するものであり、
前記表面Aに接触する媒体Xの屈折率がnXであり、前記表面Bに接触する媒体Yの屈折率がnYであるとき、
nY≦nB<nA≦nXの関係を満たすことを特徴とする光機能性膜の製造方法。 - 前記ポリシロキサンが、一般式(1)
R11 nSi(OR12)4−n (1)
(式中、
R11は、任意のメチレンが酸素で置き換えられてもよい炭素数1〜20の直鎖状、分岐状あるいは環状のアルキル基、または炭素数6〜20で任意の水素がフッ素で置き換えられていてもよいアリール基を表し、
R12は、炭素数1〜6のアルキル基を表し、
nは0または1または2を表す。)
であらわされるシラン化合物を、酸性あるいは塩基性触媒の存在下で加水分解・縮合させて得られるものである、請求項1に記載の方法。 - 前記ポリシロキサンが、シラノール基を有するシロキサンポリマー、シラノール基を有するシランモノマー、またはそれらの混合物と、表面に水酸基またはアルコキシ基を有するケイ素酸化物ナノ粒子とを、水性溶媒と有機性溶媒との混合溶媒中、相間移動触媒の存在下で反応させることにより得られることを特徴とするケイ素酸化物ナノ粒子とシロキサンポリマーの複合体である、請求項1または2に記載の方法。
- 前記ポリシロキサンが、シラノール基を有するシロキサンポリマー、シラノール基を有するシランモノマー、またはそれらの混合物と、表面に水酸基またはアルコキシ基を有する金属酸化物ナノ粒子とを、水性溶媒と有機性溶媒との混合溶媒中、相間移動触媒の存在下で反応させることにより得られることを特徴とする金属酸化物ナノ粒子とシロキサンポリマーとの複合体である、請求項1〜3のいずれか一項に記載の方法。
- 前記金属酸化物ナノ粒子が、下記一般式(3)
MxOy(OR3)z (3)
(式中、
MはTi、Zr、Eu、Zn、B、Al、Ta、およびHfからなる群から選択される元素であり、
R3は、水素、またはC1〜C10のアルキル基またはアルケニル基であり、
2y+z=x×[Mの価数]を満たす)
で表される、請求項4に記載の方法。 - 基材表面に、請求項1〜5のいずれか1項に記載の方法で製造された光機能性膜を具備してなる、半導体素子の製造方法。
- 前記光機能性膜の表面Aが前記基板表面に接触している、請求項6に記載の方法。
- 前記基板の屈折率nSが、表面Aの屈折率nAよりも大きい、請求項7に記載の方法。
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