JP6832666B2 - 半導体パッケージの製造方法 - Google Patents
半導体パッケージの製造方法 Download PDFInfo
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- JP6832666B2 JP6832666B2 JP2016194250A JP2016194250A JP6832666B2 JP 6832666 B2 JP6832666 B2 JP 6832666B2 JP 2016194250 A JP2016194250 A JP 2016194250A JP 2016194250 A JP2016194250 A JP 2016194250A JP 6832666 B2 JP6832666 B2 JP 6832666B2
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Description
上記した構成において、該側壁は、該上面と該下面との双方に対して傾斜して延びる第1側面と、第1側面から該下面に向けて垂直に延びる第2側面とを備えてもよい。
図1は、第1実施形態に係る半導体パッケージの製造方法の手順を示すフローチャートである。半導体パッケージは、詳細は後述するが、半導体チップを封止する樹脂層と、この樹脂層の外表面を被覆する導電性シールド層とを備えるパッケージ型の半導体装置(例えばCSP、BGA等)である。本実施形態では、半導体パッケージの製造方法は、図1に示すように、接合工程S1、封止基板作成工程S2、個片化工程S3、および、シールド層形成工程S4を備える。本実施形態の製造方法は、少なくともこれらの各工程を備えていればよく、各工程間に他の工程を設けてもよい。次に、これらの各工程について説明する。
図2は、配線基板に半導体チップを接合した状態を示す側断面図である。接合工程S1では、配線基板10の表面(一面)10a上に半導体チップ11をボンディングにより実装する。配線基板10には、相互に交差する複数のストリート(分割予定ライン)Sによって区画された複数の実装領域(領域)Aがマトリクス状に形成されている。各実装領域Aには、図示は省略するが、半導体チップ11の端子と接続される電極や、グラウンドラインを含む配線が施されている。半導体チップ11は、例えば、シリコン、サファイア、ガリウムなどで形成された基板上に、半導体デバイスを備えたウエーハを分割して形成された、いわゆるダイである。
図3は、半導体チップが実装された配線基板に封止のための液状樹脂を供給する構成を示す図であり、図4は、樹脂で封止された封止基板の側断面図である。封止基板作成工程S2では、配線基板10に形成された実装領域Aに実装された半導体チップ11を封止する。本実施形態では、図3に示すように、半導体チップ11が実装された配線基板10は、封止用治具20の上に保持され、この配線基板10の上方に型枠12が配置される。この型枠12は上面に注入口12Aを備え、この注入口12Aの上方に樹脂供給ノズル15が配置されている。そして、樹脂供給ノズル15から供給された液状樹脂(モールド樹脂)16は、注入口12Aを通じて、配線基板10と型枠12との隙間に充填される。液状樹脂16は、硬化性を有するものが用いられ、例えば、エポキシ樹脂、シリコーン樹脂、ウレタン樹脂、不飽和ポリエステル樹脂、アクリルウレタン樹脂、又はポリイミド樹脂等から選択することができる。型枠12内に充填された液状樹脂16により、配線基板10上に実装された複数の半導体チップ11を一括して封止することができる。
図6は、封止基板を切削により個片化する構成の一例を示す側断面図であり、図7は、切削により個片化された封止チップを示す側断面図である。図6に示すように、配線基板10は、バンプBPが形成された裏面10bを下面として個片化用治具21に保持される。この個片化用治具21は、上面に複数の穴部21Aがマトリクス状に形成されており、これら穴部21Aに各半導体チップ11に対応するバンプBPが収容される。また、各穴部21Aには、真空吸引源(不図示)に連なる吸引路21Bが連結されており、配線基板10を吸引して保持する。また、個片化用治具21は、各穴部21Aの間に切削用溝21Cが形成されている。この切削用溝21Cは、配線基板10を個片化用治具21に保持した際に、配線基板10のストリートSに対応して形成されている。
図11は、導電性シールド層が形成された封止チップを示す側断面図である。まず、導電性シールド層45を形成する前に、個片化された封止チップ40を保持している個片化用治具21から封止チップ40をピックアップし、この封止チップ40を別の被覆用治具22上に並べて配置する。この被覆用治具22は、個片化用治具21と同様に、上面に複数の穴部22Aがマトリクス状に形成されており、これら穴部22Aにそれぞれ封止チップ40のバンプBPが収容される。被覆用治具22では、封止チップ40が、隣接する封止チップ40,40間に所定の間隔Pを設けて配置される。この間隔Pは、封止チップ40の側面40cの下端にまで導電性シールド層45を形成できるに十分な距離を有する。なお、図11には、図示を省略したが、被覆用治具22は、各穴部22Aに連結されて封止チップ40を吸引保持するための吸引路を備えてもよい。
図15は、第2実施形態に係る半導体パッケージの製造方法の手順を示すフローチャートである。第2実施形態の製造方法で作成される半導体パッケージは、半導体チップを封止する樹脂層と、この樹脂層の外表面を被覆する導電性シールド層とを備えるパッケージ型の半導体装置(例えばFO−WLP等)である。本実施形態では、半導体パッケージの製造方法は、図15に示すように、チップ配設工程S11、封止体作成工程S12、再配線工程S13、個片化工程S14、および、シールド層形成工程S15を備える。本実施形態の製造方法は、少なくともこれらの各工程を備えていればよく、各工程間に他の工程を設けてもよい。次に、これらの各工程について説明する。
図16は、支持基板に半導体チップを配設した状態を示す側断面図である。支持基板25は、この支持基板25上に配置された複数の半導体チップ11を保持するものであり、ある程度の剛性を有する硬質な材料(例えばガラス)で形成される。支持基板25には、相互に交差する複数のストリートSによって区画された複数のデバイス配設領域A1がマトリクス状に設定されている。これらストリートS、デバイス配設領域A1の位置や大きさは、作成される半導体パッケージに応じて決定されている。
図17は、樹脂で封止された封止体の側断面図である。封止体作成工程S12では、支持基板25に設定されたデバイス配設領域A1に配設された半導体チップ11を封止する。例えば、半導体チップ11が配設された支持基板25の上方に型枠(不図示)を配置し、型枠の注入口を通じて、液状樹脂16(図3参照;封止材)を支持基板25(保護テープ26)と型枠との隙間に充填する。
図18は、封止体の半導体チップ側に再配線層およびバンプが形成された状態を示す側断面図である。再配線層60を形成する場合、封止体19の裏面となる半導体チップ11の表面11a側から支持基板25および保護テープ26を剥離し、封止体19は、表面19A側を下方に向けて治具(不図示)に載置される。この治具は、例えば、吸引機構を有し、封止体19を保持する。これにより、図18に示すように、封止体19の半導体チップ11側が上面として露出される。
図19は、再配線層を設けた封止体を示す側断面図であり、図20は、封止体を切削により個片化する構成の一例を示す側断面図であり、図21は、切削により個片化された封止チップを示す側断面図である。封止体19は、図19に示すように、再配線層60を下面として個片化用治具21に保持される。この個片化用治具21は、上面に複数の穴部21Aがマトリクス状に形成されており、これら穴部21Aに各半導体チップ11に対応する再配線層60のバンプBPが収容される。また、各穴部21Aには、吸引源(不図示)に連なる吸引路21Bが連結されており、再配線層60および封止体19を吸引して保持する。また、個片化用治具21は、各穴部21Aの間に切削用溝21Cが形成されている。この切削用溝21Cは、再配線層60および封止体19を個片化用治具21に保持した際に、上記したストリートSに対応して形成されている。
図22は、導電性シールド層が形成された封止チップを示す側断面図である。導電性シールド層45を形成する前に、個片化された封止チップ70を保持している個片化用治具21から封止チップ70をピックアップし、この封止チップ70を別の被覆用治具22上に並べて配置する。この被覆用治具22は、個片化用治具21と同様に、上面に複数の穴部22Aがマトリクス状に形成されており、これら穴部22Aにそれぞれ封止チップ70のバンプBPが収容される。被覆用治具22では、封止チップ70が、隣接する封止チップ70,70間に所定の間隔Pを設けて配置される。この間隔Pは、封止チップ70の側面70cの下端にまで導電性シールド層45を形成できるに十分な距離を有する。なお、図22には、図示を省略したが、被覆用治具22は、各穴部22Aに連結されて封止チップ70を吸引保持するための真空吸引路を備えてもよい。
θ1(度)=90−θ (1)
step coverage=(t2/t1)×100(%) (2)
10a 表面
10b 裏面
11 半導体チップ
12 型枠
16 液状樹脂(封止材)
17 封止樹脂層
18 封止基板
18S、19S 領域(分割予定ラインに対応する領域)
19 封止体
25 支持基板
32、32A 切削ブレード
33 切れ刃
34 レーザー光線照射装置
35 集光器
40、70 封止チップ
40a、70a 上面
40b、70b 下面
40c、70c 側面
45 導電性シールド層
50、80 半導体パッケージ
60 再配線層
61 配線
62 絶縁膜
S1 接合工程
S2 封止基板作成工程
S3 個片化工程
S4 シールド層形成工程
S11 チップ配設工程
S12 封止体作成工程
S13 再配線工程
S14 個片化工程
S15 シールド層形成工程
BP バンプ
S ストリート(分割予定ライン)
θ1 傾斜角度
Claims (7)
- 封止剤により封止された半導体パッケージを作成する半導体パッケージの製造方法であって、
交差する分割予定ラインによって区画された配線基板上の複数領域に複数の半導体チップをボンディングする接合工程と、
該複数の半導体チップがボンディングされた該配線基板の表面側に封止剤を供給して一括で封止し封止基板を作成する封止基板作成工程と、
該封止基板上の該分割予定ラインに対応する領域に沿って該封止基板を該配線基板まで切削し、該封止された半導体チップが上面と該上面よりも大きな下面を有し該上面から該下面に向かって傾斜した側壁を備えるように、複数の封止チップに個片化する個片化工程と、
該複数の封止チップの該上面および該配線基板の側面を含む該側壁に導電性シールド層を形成するシールド層形成工程と、
を備える半導体パッケージの製造方法。 - 該個片化工程は、環状の切れ刃を備えた切削ブレードを回転しつつ該封止基板に切り込んで個片化する、請求項1に記載の半導体パッケージの製造方法。
- 該個片化工程は、該封止基板のレーザー光線照射面に垂直な方向に対して加工送り方向と直交する方向に所定角度傾斜させてレーザービームを該封止基板に照射して個片化する、請求項1に記載の半導体パッケージの製造方法。
- 該側壁は、該上面と該下面との双方に対して傾斜して延びる第1側面と、第1側面から該下面に向けて垂直に延びる第2側面とを備える、請求項1から請求項3のうちいずれか一項に記載の半導体パッケージの製造方法。
- 封止剤により封止された半導体パッケージを作成する半導体パッケージの製造方法であって、
交差する複数の分割予定ラインによって区画された支持基板上の各デバイス配設領域に半導体チップを配設するチップ配設工程と、
該チップ配設工程を実施した後、該半導体チップを封止剤で封止することで該支持基板上に封止体を作成する封止体作成工程と、
該封止体から該支持基板を除去した後、該封止体の半導体チップ側に再配線層およびバンプを形成する再配線工程と、
該封止体上の該分割予定ラインに対応する領域に沿って切削し、封止された半導体チップが上面と該上面よりも大きな下面を有し該上面から該下面に向かって傾斜した側壁を備えるように個片化する個片化工程と、
該複数の封止された半導体チップの該上面および該側壁に導電性シールド層を形成するシールド層形成工程と、
を備える半導体パッケージの製造方法。 - 該個片化工程は、環状の切れ刃を備えた切削ブレードを回転しつつ該封止体に切り込んで個片化する、請求項5に記載の半導体パッケージの製造方法。
- 該個片化工程は、該封止体のレーザー光線照射面に垂直な方向に対して加工送り方向と直交する方向に所定角度傾斜させてレーザービームを該封止体に照射して個片化する、請求項5に記載の半導体パッケージの製造方法。
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US20180269159A1 (en) | 2018-09-20 |
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US10707176B2 (en) | 2020-07-07 |
CN107887283A (zh) | 2018-04-06 |
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US10700014B2 (en) | 2020-06-30 |
KR20180036542A (ko) | 2018-04-09 |
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