JP6802691B2 - インプリント装置および物品製造方法 - Google Patents

インプリント装置および物品製造方法 Download PDF

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Publication number
JP6802691B2
JP6802691B2 JP2016225377A JP2016225377A JP6802691B2 JP 6802691 B2 JP6802691 B2 JP 6802691B2 JP 2016225377 A JP2016225377 A JP 2016225377A JP 2016225377 A JP2016225377 A JP 2016225377A JP 6802691 B2 JP6802691 B2 JP 6802691B2
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JP
Japan
Prior art keywords
substrate
mold
peripheral member
holding portion
mode
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Active
Application number
JP2016225377A
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English (en)
Japanese (ja)
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JP2018082128A (ja
Inventor
雅見 米川
雅見 米川
江本　圭司
圭司 江本
敏宏 前田
敏宏 前田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2016225377A priority Critical patent/JP6802691B2/ja
Priority to KR1020170149266A priority patent/KR102206846B1/ko
Publication of JP2018082128A publication Critical patent/JP2018082128A/ja
Application granted granted Critical
Publication of JP6802691B2 publication Critical patent/JP6802691B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2016225377A 2016-11-18 2016-11-18 インプリント装置および物品製造方法 Active JP6802691B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016225377A JP6802691B2 (ja) 2016-11-18 2016-11-18 インプリント装置および物品製造方法
KR1020170149266A KR102206846B1 (ko) 2016-11-18 2017-11-10 임프린트 장치 및 물품 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016225377A JP6802691B2 (ja) 2016-11-18 2016-11-18 インプリント装置および物品製造方法

Publications (2)

Publication Number Publication Date
JP2018082128A JP2018082128A (ja) 2018-05-24
JP6802691B2 true JP6802691B2 (ja) 2020-12-16

Family

ID=62199100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016225377A Active JP6802691B2 (ja) 2016-11-18 2016-11-18 インプリント装置および物品製造方法

Country Status (2)

Country Link
JP (1) JP6802691B2 (ko)
KR (1) KR102206846B1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7154839B2 (ja) * 2018-06-26 2022-10-18 キヤノン株式会社 インプリント装置、インプリント方法および、物品製造方法
JP7495814B2 (ja) * 2020-05-13 2024-06-05 キヤノン株式会社 インプリント装置、および物品の製造方法
US11150564B1 (en) * 2020-09-29 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. EUV wafer defect improvement and method of collecting nonconductive particles

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007017895A (ja) * 2005-07-11 2007-01-25 Fujifilm Holdings Corp 露光装置
JP2011040464A (ja) * 2009-08-07 2011-02-24 Canon Inc 異物除去装置、露光装置及びデバイス製造方法
JP6171412B2 (ja) * 2013-03-06 2017-08-02 大日本印刷株式会社 インプリント方法、インプリント用のモールドおよびインプリント装置
JP6123396B2 (ja) * 2013-03-18 2017-05-10 大日本印刷株式会社 インプリント方法およびインプリント装置
JP6244742B2 (ja) * 2013-08-26 2017-12-13 大日本印刷株式会社 膜検査方法、インプリント方法、パターン構造体の製造方法、インプリント用のモールド、インプリント用の転写基板、および、インプリント装置
JP2014017534A (ja) * 2013-10-31 2014-01-30 Fujikura Ltd 配線板の製造方法
JP2015149390A (ja) * 2014-02-06 2015-08-20 キヤノン株式会社 インプリント装置、型、および物品の製造方法
WO2016170729A1 (en) * 2015-04-22 2016-10-27 Canon Kabushiki Kaisha Imprint apparatus, method of imprinting, and method of manufacturing article
JP6661397B2 (ja) * 2015-04-22 2020-03-11 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6789772B2 (ja) * 2016-02-29 2020-11-25 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法

Also Published As

Publication number Publication date
KR20180056372A (ko) 2018-05-28
JP2018082128A (ja) 2018-05-24
KR102206846B1 (ko) 2021-01-25

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