JP6595406B2 - Electrostatic adsorption member - Google Patents

Electrostatic adsorption member Download PDF

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JP6595406B2
JP6595406B2 JP2016106611A JP2016106611A JP6595406B2 JP 6595406 B2 JP6595406 B2 JP 6595406B2 JP 2016106611 A JP2016106611 A JP 2016106611A JP 2016106611 A JP2016106611 A JP 2016106611A JP 6595406 B2 JP6595406 B2 JP 6595406B2
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layer
recess
electrostatic attraction
internal electrode
conductive layer
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JP2017212406A (en
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茂伸 古川
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Kyocera Corp
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Description

本開示は、静電吸着用部材に関する。   The present disclosure relates to an electrostatic adsorption member.

従来、半導体集積回路の製造工程や液晶表示装置の製造工程では、半導体ウエハ等の各試料を保持するための部品として、静電チャック等の静電吸着用部材が用いられている。   Conventionally, in the manufacturing process of a semiconductor integrated circuit and the manufacturing process of a liquid crystal display device, an electrostatic chuck member such as an electrostatic chuck is used as a component for holding each sample such as a semiconductor wafer.

このような静電吸着用部材では、例えばセラミック等からなる誘電体部材の内部に静電吸着用の電極層が設けられている。またこのような静電吸着用部材では、電極層に静電吸着用の電圧を印加するための給電端子が、誘電体部材の外部から内部の電極層まで連続して配置されている。例えば特許文献１では、対象物が吸着される吸着面を有する基材の内部に、吸着面と平行な電極層が設けられており、吸着面と反対側の面から電極層まで基材を貫通した貫通孔に柱状の給電端子が挿入されている。特許文献１では、給電端子の端部が電極層に当接した状態で、給電端子が貫通孔内に機械的に固定されている。   In such an electrostatic chucking member, an electrode layer for electrostatic chucking is provided inside a dielectric member made of, for example, ceramic. In such an electrostatic chucking member, a power supply terminal for applying an electrostatic chucking voltage to the electrode layer is continuously arranged from the outside of the dielectric member to the internal electrode layer. For example, in Patent Document 1, an electrode layer parallel to the adsorption surface is provided inside a substrate having an adsorption surface on which an object is adsorbed, and penetrates the substrate from the surface opposite to the adsorption surface to the electrode layer. A columnar power supply terminal is inserted into the through-hole. In Patent Document 1, the power supply terminal is mechanically fixed in the through hole in a state where the end of the power supply terminal is in contact with the electrode layer.

特開２００４−３１１５２２号公報JP 2004-311522 A

特許文献１で提案された静電チャックは、昇温および冷却にともなって給電端子が伸縮するため、給電端子の端部に当接した電極層が給電端子の伸縮によって押圧されたり逆に引っ張られたりする場合があった。このため従来は、この押圧や引っ張りによって、電極層に割れや欠け等の破損が発生するという問題があった。   In the electrostatic chuck proposed in Patent Document 1, since the power supply terminal expands and contracts as the temperature rises and cools, the electrode layer in contact with the end of the power supply terminal is pressed or stretched reversely by the expansion and contraction of the power supply terminal. There was a case. For this reason, conventionally, there has been a problem that the electrode layer is broken or broken due to the pressing or pulling.

上記課題を解決するため、本願は、セラミックスからなり、対象物が吸着される吸着面を有し、該吸着面以外の面に開口した凹部を有する基体と、前記吸着面に垂直な方向を高さ方向としたときに、該基体における前記吸着面よりも低く前記凹部よりも高い位置に位置する内部電極と、前記凹部内から前記内部電極につながる導電層と、前記凹部に挿入されており、前記導電層と接続された給電端子とを備える静電吸着用部材であって、前記凹部の底面に開口しており、該底面における開口面積が前記給電端子の端面の面積よりも小さく、前記底面から前記内部電極へ延びる中空領域を有することを特徴とする静電吸着用部材を提供する。 In order to solve the above problem, the present application is made of ceramics , has a suction surface on which an object is sucked , and has a base having a recess opened on a surface other than the suction surface, and a direction perpendicular to the suction surface is increased. The inner electrode positioned at a position lower than the suction surface of the substrate and higher than the recess, a conductive layer connected to the internal electrode from the recess, and the recess, A member for electrostatic attraction comprising a power feeding terminal connected to the conductive layer , wherein the bottom surface of the concave portion is open, and an opening area in the bottom surface is smaller than an area of an end surface of the power feeding terminal; There is provided a member for electrostatic attraction having a hollow region extending from the inside to the internal electrode .

本実施形態の静電吸着用部材は、内部電極の破損を抑制することができる。   The electrostatic attraction member of this embodiment can suppress damage to the internal electrode.

本実施形態の静電吸着用部材である真空チャックの一例を示す、（ａ）は斜視図であり、（ｂ）は平面透視図である。An example of the vacuum chuck which is the member for electrostatic attraction of this embodiment is shown, (a) is a perspective view, (b) is a plane perspective view. 図１に示す真空チャックのＡＡ’線における断面の一例を示す、（ａ）は断面図であり、（ｂ）は（ａ）に示す内部電極の一部を拡大した断面図である。FIGS. 1A and 1B are cross-sectional views showing an example of a cross section taken along line AA ′ of the vacuum chuck shown in FIG. 1, and FIG. 2B is an enlarged cross-sectional view of a part of the internal electrode shown in FIG. 図１に示す真空チャックのＡＡ’線における断面の他の例を示す、（ａ）は断面図であり、（ｂ）は（ａ）に示す内部電極の一部を拡大した断面図である。1A and 1B show another example of a cross section taken along line AA ′ of the vacuum chuck shown in FIG. 1, and FIG. 4B is an enlarged cross sectional view of a part of the internal electrode shown in FIG. 図１に示す真空チャックのＡＡ’線における断面の他の例を示す断面図であり、（ｂ）は（ａ）に示す内部電極の一部を拡大した断面図であり、（ｃ）は（ａ）に示す導電層の一部を拡大した断面図であり、（ｄ）は（ａ）に示すＢ部を拡大した断面図である。It is sectional drawing which shows the other example of the cross section in the AA 'line of the vacuum chuck shown in FIG. 1, (b) is sectional drawing to which some internal electrodes shown to (a) were expanded, (c) is ( It is sectional drawing to which a part of electrically conductive layer shown to a) was expanded, (d) is sectional drawing to which the B section shown to (a) was expanded.

以下、図面を参照して、本開示の実施形態について詳細に説明する。ただし、本明細書の全図において、混同を生じない限り、同一部分には同一符号を付し、その説明を適時省略する。   Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. However, in all the drawings in this specification, the same parts are denoted by the same reference symbols unless the confusion occurs, and the description thereof is omitted as appropriate.

図１および図２は、本実施形態の静電吸着用部材である真空チャックの一例を示す、図１（ａ）は斜視図であり、図１（ｂ）は平面透視図である。また、図２は、図１に示す真空チャックのＡＡ’線における断面の一例を示す、（ａ）は断面図であり、（ｂ）は（ａ）に示す内部電極の一部を拡大した断面図である。   1 and 2 show an example of a vacuum chuck that is a member for electrostatic attraction according to the present embodiment. FIG. 1 (a) is a perspective view, and FIG. 1 (b) is a plan perspective view. 2 shows an example of a cross section taken along line AA ′ of the vacuum chuck shown in FIG. 1, (a) is a cross-sectional view, and (b) is an enlarged cross section of a part of the internal electrode shown in (a). FIG.

図１、２に示す静電吸着用部材は、セラミックスからなり、対象物（図示しない）が吸着される吸着面１ａおよび吸着面１ａ以外の面に開口した凹部２ａを有する基体（１，２）と、基体（１，２）における吸着面１ａと凹部２ａとの間に位置する内部電極３と、凹部２ａ内から内部電極３につながる導電層４とを備える静電吸着用部材であり、凹部２ａと内部電極３との間に中空領域２ｂを有する。   The electrostatic attraction member shown in FIGS. 1 and 2 is made of ceramics, and has a suction surface 1a on which an object (not shown) is attracted and a base (1,2) having a recess 2a opened on a surface other than the suction surface 1a. And an internal electrode 3 positioned between the suction surface 1a and the recess 2a of the base (1, 2), and a conductive layer 4 connected to the internal electrode 3 from the recess 2a. A hollow region 2b is provided between 2a and the internal electrode 3.

基体（１，２）は、対象物（図示しない）が吸着される吸着面１ａを有するセラミックスからなる第１構造体１と、吸着面１ａと反対側に設けられたセラミックスからなる第２構造体２とを備え、内部電極３は第１構造体１と第２構造体２との間に配置されている。内部電極３は、１対の分離された内部電極３a、３ｂからなり、一方が給電端子５ａを介
して電源（図示しない）の正極に接続され、他方が給電端子５ｂを介して電源の負極に接続される。例えば、電源の正極に接続される側の電極が内部電極３ａ(以下、内部電極３
ａを正電極３ａという。)であり、負極に接続される側の電極を内部電極３ｂ(以下、内部電極３ｂを負電極３ｂという。)である。また、これとは逆に、内部電極３ａが負極に接
続され、内部電極３ｂが正極に接続されていてもよい。 The bases (1, 2) are a first structure 1 made of ceramics having an adsorption surface 1a on which an object (not shown) is adsorbed, and a second structure made of ceramics provided on the opposite side of the adsorption surface 1a. 2, and the internal electrode 3 is disposed between the first structure 1 and the second structure 2. The internal electrode 3 is composed of a pair of separated internal electrodes 3a and 3b, one of which is connected to the positive electrode of a power source (not shown) via a power supply terminal 5a, and the other is connected to the negative electrode of the power supply via a power supply terminal 5b. Connected. For example, the electrode on the side connected to the positive electrode of the power source is an internal electrode 3a (hereinafter referred to as internal electrode 3a).
a is referred to as a positive electrode 3a. The electrode on the side connected to the negative electrode is the internal electrode 3b (hereinafter, the internal electrode 3b is referred to as the negative electrode 3b). Conversely, the internal electrode 3a may be connected to the negative electrode, and the internal electrode 3b may be connected to the positive electrode.

正電極３ａおよび負電極３ｂは、それぞれ半円板状に形成され、半円の弦同士が対向するように配置される。正電極３ａおよび負電極３ｂがこのように配置されることによって、内部電極３全体の外形が円形状となる。内部電極３全体の中心は、第１構造体１の中心に一致するか、第１構造体１の中心の近傍に位置する。また、内部電極３は、第２構造体２の上面に形成され、樹脂からなる接合層６を介して第１構造体１の下面に接合されている。   The positive electrode 3a and the negative electrode 3b are each formed in a semicircular shape, and are arranged so that the semicircular chords face each other. By arranging the positive electrode 3a and the negative electrode 3b in this way, the entire outer shape of the internal electrode 3 becomes circular. The center of the entire internal electrode 3 coincides with the center of the first structure 1 or is located near the center of the first structure 1. The internal electrode 3 is formed on the upper surface of the second structure 2 and is bonded to the lower surface of the first structure 1 via a bonding layer 6 made of resin.

静電吸着用部材１０は、凹部２ａと内部電極３との間に中空領域２ｂを有している。これにより、給電端子５ａや５ｂが熱膨張した場合なども、給電端子５ａや５ｂの端部が正電極３ａや３ｂに当接せず、この中空領域２ｂに、給電端子５ａや５ｂおよび第２構造体２の変形が留まるため、内部電極３における割れや欠け等の破損が抑制されている。   The member for electrostatic attraction 10 has a hollow region 2 b between the recess 2 a and the internal electrode 3. Thereby, even when the power supply terminals 5a and 5b are thermally expanded, the end portions of the power supply terminals 5a and 5b are not in contact with the positive electrodes 3a and 3b. Since the deformation of the structure 2 remains, breakage such as cracks and chips in the internal electrode 3 is suppressed.

静電吸着用部材１０は、より具体的には、第２構造体２は、内部電極３と反対側の面から内部電極３に向かって凹んだ凹部２ａは柱状であり、凹部２ａの内部電極３の側の端面から内部電極３まで貫通した貫通孔を備えており、この貫通孔の内部空間が中空領域２ｂとなっている。導電層４は、柱状の凹部２ａの内側側面および中空領域（貫通孔２ｂ）の内側側面に連続して被着するとともに、内部電極３に電気的に接続している。凹部２ａおよび中空領域２ｂの形状は、例えば、円柱状である。導電層４は、厚みが、例えば、０．５５μｍ以上０．８５μｍ以下の板状であっても、円筒状の導体であってもよい。   More specifically, the electrostatic attraction member 10 is such that the second structure 2 has a columnar recess 2a that is recessed from the surface opposite to the internal electrode 3 toward the internal electrode 3, and the internal electrode of the recess 2a. 3 is provided with a through hole penetrating from the end face on the side 3 to the internal electrode 3, and the internal space of the through hole is a hollow region 2b. The conductive layer 4 is continuously deposited on the inner side surface of the columnar recess 2a and the inner side surface of the hollow region (through hole 2b), and is electrically connected to the internal electrode 3. The shapes of the recess 2a and the hollow region 2b are, for example, cylindrical. The conductive layer 4 may be a plate having a thickness of, for example, 0.55 μm or more and 0.85 μm or less, or may be a cylindrical conductor.

また、図２に示す静電吸着用部材１０、および後述する図３、４に示す１０ａ、１０ｂでは、内部電極３は、チタンを主成分とする第１電極層３Ａと、窒化チタン、炭化チタンまたは炭窒化チタンを主成分とする第２電極層３Ｂとを有し、第１電極層３Ａ上に第２電
極層３Ｂが位置し、第１電極層３Ａは第２構造体２に接合していることが好適である。このような構成であると、第１電極層３Ａを形成するチタンは活性が高く、第２構造体２を形成するセラミックスに対して良好な濡れ性を示すことから、第２電極層３Ｂは、第２構造体２に対する密着強度が高い。 In the electrostatic attraction member 10 shown in FIG. 2 and 10a and 10b shown in FIGS. 3 and 4 to be described later, the internal electrode 3 includes a first electrode layer 3A mainly composed of titanium, titanium nitride, and titanium carbide. Or the second electrode layer 3B mainly composed of titanium carbonitride, the second electrode layer 3B is located on the first electrode layer 3A, and the first electrode layer 3A is joined to the second structure 2 It is preferable that With such a configuration, titanium forming the first electrode layer 3A has high activity and exhibits good wettability with respect to the ceramic forming the second structure 2, so the second electrode layer 3B The adhesion strength to the second structure 2 is high.

図３は、図１に示す真空チャックのＡＡ’線における断面の他の例を示す断面図であり（ｂ）は（ａ）に示す内部電極の一部を拡大した断面図である。   FIG. 3 is a cross-sectional view showing another example of a cross section taken along the line AA ′ of the vacuum chuck shown in FIG. 1, and FIG. 3B is a cross-sectional view in which a part of the internal electrode shown in FIG.

図３に示す静電吸着用部材１０ａは、凹部２ａにおける導電層４がねじ山部４ａを有する。この場合、導電層４の表面積が比較的大きくなり、給電端子５ｂの側面との電気的接合面積が大きくなるため、比較的安定した給電を行うことができる。また、側面にねじ山部４ａを設けた給電端子５ｂを用いることで、この給電端子５ｂをねじ山部４ａに係合させて、給電端子５ｂを第２構造体２に対して強固に締結することができる。また、ねじによる締結のため、給電端子５ｂを容易に繰り返し脱着させることが可能であり、給電端子５ｂの洗浄などのメンテナンス作業を比較的容易に長期間にわたって繰り返し実施することができる。   In the electrostatic attraction member 10a shown in FIG. 3, the conductive layer 4 in the recess 2a has a threaded portion 4a. In this case, since the surface area of the conductive layer 4 is relatively large and the area of electrical connection with the side surface of the power supply terminal 5b is large, relatively stable power supply can be performed. Further, by using the power supply terminal 5b provided with the screw thread portion 4a on the side surface, the power supply terminal 5b is engaged with the screw thread portion 4a and the power supply terminal 5b is firmly fastened to the second structure 2. be able to. In addition, since the power supply terminal 5b can be easily and repeatedly detached by fastening with screws, maintenance work such as cleaning of the power supply terminal 5b can be performed relatively easily over a long period of time.

図４は、図１に示す真空チャックのＡＡ’線における断面の他の例を示す断面図であり、（ｂ）は（ａ）に示す内部電極の一部を拡大した断面図であり、（ｃ）は（ａ）に示す導電層の一部を拡大した断面図であり、（ｄ）は（ａ）に示すＢ部を拡大した断面図である。   4 is a cross-sectional view showing another example of the cross section taken along the line AA ′ of the vacuum chuck shown in FIG. 1, and FIG. 4B is a cross-sectional view in which a part of the internal electrode shown in FIG. (c) is sectional drawing to which a part of conductive layer shown to (a) was expanded, (d) is sectional drawing to which the B section shown to (a) was expanded.

図４に示す静電吸着用部材１０ｂは、凹部２ａにおける導電層４の内周面に当接する螺旋状の導電性線材７を備えてなるものである。凹部２ａ内部の導電層４は交換が比較的困難で手間を要するが、螺旋状の導電性線材７を備えた構成とした場合、例えば給電端子５ａや５ｂを繰り返し着脱して導電性線材７が摩耗しても、この導電性線材７を交換するだけで、給電端子５ａや５ｂと当接する部分の状態（形状や腐食具合など）をリフレッシュすることができる。   The electrostatic attraction member 10b shown in FIG. 4 includes a spiral conductive wire 7 that contacts the inner peripheral surface of the conductive layer 4 in the recess 2a. The conductive layer 4 inside the recess 2a is relatively difficult to replace and requires a lot of work. However, when the conductive layer 4 is provided with a spiral conductive wire 7, for example, the conductive wire 7 can be removed by repeatedly attaching and detaching the power supply terminals 5a and 5b. Even if it wears out, the state (shape, corrosion condition, etc.) of the portion in contact with the power supply terminals 5a and 5b can be refreshed by simply replacing the conductive wire 7.

ここで、螺旋状の導電性線材７とは、例えば、ヘリサート(登録商標、(株)ツガミ製)、Ｅ−サート(登録商標、(株)ツガミ製)、イリサート（登録商標、(有)広杉精機）等である。   Here, the spiral conductive wire 7 is, for example, Helisart (registered trademark, manufactured by Tsugami Co., Ltd.), E-Sert (registered trademark, manufactured by Tsugami Co., Ltd.), Irisert (registered trademark, (existing) wide) Sugi Seiki).

螺旋状の導電性線材７は、例えば、１８−８ステンレス鋼からなるものであるが、磁性の影響を受けにくくする場合には、リン青銅からなるものを用いればよい。   The spiral conductive wire 7 is made of, for example, 18-8 stainless steel. However, if it is difficult to be affected by magnetism, a material made of phosphor bronze may be used.

また、静電吸着用部材１０ｂは、導電性線材７が接合剤８を介して固定されていると、導電性線材７が凹部２ａから外れ難い点で好適である。特に、接合剤８は導電性を有することが好適である。接合剤８を含む領域は、導電性線材７の高さｈに対して、例えば、導電性線材７の上端からｈ／２以内の領域である。   Moreover, the member 10b for electrostatic attraction is suitable in that the conductive wire 7 is not easily detached from the recess 2a when the conductive wire 7 is fixed via the bonding agent 8. In particular, the bonding agent 8 is preferably conductive. The region including the bonding agent 8 is, for example, a region within h / 2 from the upper end of the conductive wire 7 with respect to the height h of the conductive wire 7.

また、図４に示す静電吸着用部材１０ｂでは、図４（ｂ）に示すように、導電層４は、チタンを主成分とする第１層４Ａと、窒化チタン、炭化チタンまたは炭窒化チタンを主成分とする第２層４Ｂとを有し、第１層４Ａ上に第２層４Ｂが位置し、第１層４Ａはセラミックスからなる基体（第２構造体２）に接合されていることが好適である。このような構成であると、第１層４Ａを形成するチタンは活性が高く、第２構造体２を形成するセラミックスに対して良好な濡れ性を示すことから、第１層４Ａは、基体（第２構造体２）に対する密着強度が高くなる。例えば、第１層４Ａの厚みは０．１５μｍ以上０．２５μｍ以下であり、第２層４Ｂの厚みは０．４μｍ以上０．６μｍ以下である。   In the electrostatic attraction member 10b shown in FIG. 4, as shown in FIG. 4 (b), the conductive layer 4 includes the first layer 4A mainly composed of titanium, titanium nitride, titanium carbide, or titanium carbonitride. And the second layer 4B is located on the first layer 4A, and the first layer 4A is bonded to the base body (second structure 2) made of ceramics. Is preferred. With such a configuration, titanium forming the first layer 4A has high activity and exhibits good wettability with respect to the ceramic forming the second structure 2, and therefore the first layer 4A is formed of the base ( The adhesion strength to the second structure 2) is increased. For example, the thickness of the first layer 4A is 0.15 μm or more and 0.25 μm or less, and the thickness of the second layer 4B is 0.4 μm or more and 0.6 μm or less.

また、図４に示す静電吸着用部材１０ｂでは、導電性線材７の内周側の表面は、露出してなることが好適である。   Also, in the electrostatic attraction member 10b shown in FIG. 4, it is preferable that the inner peripheral surface of the conductive wire 7 is exposed.

内周側の表面が露出してなる状態とは、接合剤８等が内周側の表面に付着していない状態をいい、このような状態にすることで、接合剤８に起因するパーティクルの発生を抑制することができる。   The state in which the inner peripheral surface is exposed refers to a state in which the bonding agent 8 or the like is not attached to the inner peripheral surface. By making such a state, the particle caused by the bonding agent 8 Occurrence can be suppressed.

なお、第１層４Ａ、第２層４Ｂ、第１電極層３Ａ、および第２電極層３Ｂにおける主成分とは、これら各層を構成する成分の合計１００質量％のうち、９５％以上を占める成分をいい、主成分以外の成分として、不可避不純物を含んでいてもよい。これらの各層を構成する成分は、薄膜Ｘ線回折法によって同定し、各成分の含有量はリートベルト法で求めればよい。   The main component in the first layer 4A, the second layer 4B, the first electrode layer 3A, and the second electrode layer 3B is a component that occupies 95% or more of the total 100% by mass of the components constituting each layer. Inevitable impurities may be included as components other than the main component. The components constituting each of these layers are identified by a thin film X-ray diffraction method, and the content of each component may be obtained by a Rietveld method.

また、図２、３、４に示す静電吸着用部材１０、１０ａ、１０ｂにおいて、吸着面１ａの算術平均粗さＲａは０．８５μｍ以下（但し、０μｍを除く。）であるときには、吸着面１ａにおける凹凸が小さくなるため、対象物に対する吸着力を向上させることができる。吸着面１ａの算術平均粗さＲａは０．４μｍ以下、特に０．２μｍ以下であることがより好適である。   2, 3, and 4, when the arithmetic average roughness Ra of the suction surface 1 a is 0.85 μm or less (excluding 0 μm), the suction surface. Since the unevenness | corrugation in 1a becomes small, the attraction | suction force with respect to a target object can be improved. The arithmetic average roughness Ra of the suction surface 1a is 0.4 μm or less, and more preferably 0.2 μm or less.

なお、算術平均粗さＲａはＪＩＳ Ｂ ０６０１−２０１３に準拠して測定すればよく、測定長さおよびカットオフ値をそれぞれ５ｍｍおよび０．８ｍｍとし、触針式の表面粗さ計を用いて測定する場合であれば、例えば、吸着面１ａに、触針先端半径が２μｍの触針を当て、触針の走査速度は０．５ｍｍ／秒に設定し、この測定で得られた５箇所の平均値を算術平均粗さＲａの値とすればよい。   The arithmetic average roughness Ra may be measured in accordance with JIS B 0601-2013. The measurement length and the cut-off value are 5 mm and 0.8 mm, respectively, and are measured using a stylus type surface roughness meter. If this is the case, for example, a stylus having a stylus tip radius of 2 μm is applied to the suction surface 1a, and the scanning speed of the stylus is set to 0.5 mm / second. The value may be the value of the arithmetic average roughness Ra.

また、図２、３、４に示す静電吸着用部材１０、１０ａ、１０ｂでは、基体（第１構造体１，第２構造体２）が、吸着面１ａを有する第１構造体１と、凹部２ａが位置する第２構造体２からなり、第１構造体１を形成するセラミックスは、第２構造体２を形成するセラミックスよりも絶縁破壊強さが大きいことが好適である。   In addition, in the electrostatic chucking members 10, 10a, and 10b shown in FIGS. 2, 3, and 4, the base body (first structure 1, second structure 2) includes the first structure 1 having the suction surface 1a; It is preferable that the ceramic forming the first structure 1 including the second structure 2 in which the recess 2 a is located has a higher dielectric breakdown strength than the ceramic forming the second structure 2.

このような構成であると、対象物はジョンソンラーベック力よりも吸着力の小さいクーロン力によって吸着面１ａに吸着されるので、高い脱離応答性が求められる静電吸着用部材に有効である。   With such a configuration, the object is adsorbed to the adsorption surface 1a by a Coulomb force having an adsorption force smaller than the Johnson Rabeck force, which is effective for an electrostatic adsorption member that requires high desorption response. .

例えば、第１構造体１を形成するセラミックスの絶縁破壊強さは、１４ＫＶ／ｍｍ以上１５ＫＶ／ｍｍ以下であり、第２構造体１を形成するセラミックスの絶縁破壊強さは、１５ＫＶ／ｍｍよりも大きく、５０ＫＶ／ｍｍ以下である。特に、第１構造体１を形成するセラミックスは、多結晶の酸化アルミニウムが主成分であり、例えば、酸化マグネシウム、酸化カルシウム、酸化珪素等の焼結助剤を含むセラミックスである。第２構造体３を形成するセラミックスは多結晶の酸化アルミニウムが主成分であり前記焼結助剤を含まないセラミックス、または単結晶の酸化アルミニウムを主成分とするセラミックス（サファイア）であることが好適である。それぞれのセラミックスの絶縁破壊強さは、ＪＩＳ Ｃ ２１４１−１９９２に準拠して求めればよい。   For example, the dielectric breakdown strength of the ceramics forming the first structure 1 is 14 KV / mm or more and 15 KV / mm or less, and the dielectric breakdown strength of the ceramics forming the second structure 1 is more than 15 KV / mm. Large, 50 KV / mm or less. In particular, the ceramic forming the first structure 1 is mainly composed of polycrystalline aluminum oxide, and is, for example, a ceramic containing a sintering aid such as magnesium oxide, calcium oxide, or silicon oxide. The ceramic forming the second structure 3 is preferably a ceramic mainly composed of polycrystalline aluminum oxide and not containing the sintering aid, or a ceramic mainly composed of single crystal aluminum oxide (sapphire). It is. The dielectric breakdown strength of each ceramic may be determined in accordance with JIS C 2141-1992.

また、上記構成とは別に、図２、３、４に示す静電吸着用部材１０、１０ａ、１０ｂでは、第１構造体１を形成するセラミックスは、吸着面１ａを含む表層部の少なくとも一部が導電性または半導電性を有することが好適である。このような構成の場合、ジョンソンラーベック力によって対象物を吸着面１ａに吸着する場合、吸着力を比較的高くできる点で好適である。   In addition, in the electrostatic attraction members 10, 10 a, and 10 b shown in FIGS. 2, 3, and 4, the ceramic forming the first structure 1 is at least a part of the surface layer portion including the attraction surface 1 a. Is preferably conductive or semiconductive. In the case of such a configuration, when the object is adsorbed on the adsorption surface 1a by the Johnson Rabeck force, it is preferable in that the adsorption force can be made relatively high.

なお、本実施形態における導電性とは、体積固有抵抗が１０−２Ω・ｃｍ未満をいい、半導電性とは、体積固有抵抗が１０−２Ω・ｃｍ以上１０１３Ω・ｃｍ未満の範囲をいう。 In this embodiment, the term “conductive” refers to a volume resistivity of less than 10 −2 Ω · cm, and the term “semiconductive” refers to a range in which the volume resistivity is 10 −2 Ω · cm or more and less than 10 13 Ω · cm. Say.

ここで、第１構造体１を形成するセラミックスは、例えば、多結晶の酸化アルミニウムを主成分とし、金属元素としてチタンおよびニオブの少なくともいずれかを含んでなり、表層部における前記金属元素の含有量が、内部における前記金属元素の含有量よりも多い。   Here, the ceramic forming the first structure 1 includes, for example, polycrystalline aluminum oxide as a main component, and includes at least one of titanium and niobium as a metal element, and the content of the metal element in the surface layer portion However, there is more content of the said metallic element in an inside.

なお、第１構造体１を形成するセラミックスが上記セラミックスである場合、セラミックスの全体、表層部、内部におけるアルミナや金属元素の含有量は、ＩＣＰ（Inductively Coupled Plasma）発光分光分析装置または蛍光Ｘ線分析装置を用いて、Ａｌ，Ｔｉ，Ｎｂの含有量を求め、アルミナについては、ＡｌをＡｌ２Ｏ３に換算し、ＴｉおよびＮｂは得られた測定値をそのまま含有量とすればよい。なお、セラミックスの全体における含有量を求めるときは、表層部および内部を含む焼結体を満遍なく粉砕した試料を用いればよく、表層部および内部であれば、表層部および内部に相当する領域から試料を採取して粉砕した試料を用いればよい。 In addition, when the ceramics which form the 1st structure 1 are the said ceramics, content of the alumina and the metal element in the whole ceramics, surface layer part, inside is an ICP (Inductively Coupled Plasma) emission spectroscopic analyzer or fluorescent X-rays Using an analyzer, the contents of Al, Ti, and Nb are obtained. For alumina, Al is converted to Al 2 O 3 , and Ti and Nb may be obtained with the obtained measured values as they are. In addition, when calculating | requiring content in the whole ceramics, what is necessary is just to use the sample which grind | pulverized the sintered compact including a surface layer part and the inside uniformly, and if it is a surface layer part and the inside, it will sample from the area | region corresponding to a surface layer part and an inside. A sample obtained by collecting and pulverizing can be used.

次に、本実施形態の静電吸着用部材の製造方法の一例について説明する。   Next, an example of a method for manufacturing the electrostatic attraction member of the present embodiment will be described.

まず、第１構造体１および第２構造体２に対応するセラミック部材を準備する。第２構造体２には、一方の主面に、所定の形状の凹部２と、凹部２と他方の主面との間に中空領域２ｂに対応する貫通孔を形成しておく。凹部２の内面には、必要に応じてねじ山部を形成してもよい。   First, ceramic members corresponding to the first structure 1 and the second structure 2 are prepared. In the second structure 2, a concave portion 2 having a predetermined shape is formed on one main surface, and a through hole corresponding to the hollow region 2b is formed between the concave portion 2 and the other main surface. You may form a thread part in the inner surface of the recessed part 2 as needed.

この第２構造体２に、例えばイオンプレーティング法によって金属膜を形成することで、内部電極３および導電層４を形成する。例えば第２構造体２の一方の主面に、内部電極３となる以外の部分にマスキングを施した状態で、チタンを主成分とする第１電極層３Ａと、窒化チタン、炭化チタンまたは炭窒化チタンを主成分とする第２電極層３Ｂとを形成した後、マスキングを除去する。また第２構造体２の、凹部２が設けられている側の面から、イオンプレーティング法によって、チタンを主成分とする第１層４Ａと、窒化チタン、炭化チタンまたは炭窒化チタンを主成分とする第２層４Ｂとを形成する。   The internal electrode 3 and the conductive layer 4 are formed by forming a metal film on the second structure 2 by, for example, an ion plating method. For example, the first electrode layer 3A mainly composed of titanium and titanium nitride, titanium carbide, or carbonitride with one main surface of the second structure 2 masked on a portion other than the internal electrode 3 After forming the second electrode layer 3B mainly composed of titanium, the masking is removed. Further, from the surface of the second structure 2 on the side where the concave portion 2 is provided, the first layer 4A containing titanium as a main component and titanium nitride, titanium carbide, or titanium carbonitride as the main components by ion plating. The second layer 4B is formed.

または、第２セラミック構造体２を回転させながら、イオンプレーティング法で金属膜を形成することで、内部電極３と導電層４とを同時に形成してもよい。この際、例えば、所定の領域にマスキングを施した第２構造体２を、第２構造体２の厚みの半分の位置における径方向の直線を軸心として回転させながら、すなわち、イオンプレーティング法におけるターゲット金属に対して、第２構造体の２つの主面が交互に対面するように第２構造体を回転させながら金属膜を成膜すればよい。この場合、チタンを主成分とする金属膜として、第１電極層３Ａと第１層４Ａとを同時に形成し、窒化チタン、炭化チタンまたは炭窒化チタンを主成分とする金属膜として、第２電極層３Ｂと第２層４Ｂとを同時に形成することができる。   Alternatively, the internal electrode 3 and the conductive layer 4 may be formed simultaneously by forming a metal film by an ion plating method while rotating the second ceramic structure 2. At this time, for example, the second structure 2 masked in a predetermined region is rotated while a radial straight line at the half position of the thickness of the second structure 2 is used as an axis, that is, an ion plating method. The metal film may be formed while rotating the second structure so that the two main surfaces of the second structure alternately face the target metal. In this case, the first electrode layer 3A and the first layer 4A are simultaneously formed as a metal film mainly composed of titanium, and the second electrode is formed as a metal film mainly composed of titanium nitride, titanium carbide, or titanium carbonitride. The layer 3B and the second layer 4B can be formed simultaneously.

この後、第２構造体２の他方の主面にエポキシ系接着剤を塗布する。そして、第２構造体２の他方の主面上に、第１構造体１を対向配置して押圧することにより、第１構造体１と第２構造体２とを接合することにより接合体を得る。この後、接合体の表面を研削することによって、本実施形態の静電吸着用部材を得ることができる。   Thereafter, an epoxy adhesive is applied to the other main surface of the second structure 2. Then, the first structure 1 and the second structure 2 are joined to each other by pressing the first structure 1 on the other main surface of the second structure 2 so as to face each other. obtain. Then, the member for electrostatic attraction of this embodiment can be obtained by grinding the surface of the joined body.

ここで、吸着面の算術平均粗さＲａが０．８５μｍ以下（但し、０μｍを除く。）である静電吸着用部材を得るには、例えば、平均粒径が３μｍ以下のダイヤモンド砥粒で研磨
することによって得ることができる。 Here, in order to obtain a member for electrostatic adsorption having an arithmetic average roughness Ra of the adsorption surface of 0.85 μm or less (excluding 0 μm), for example, polishing with diamond abrasive grains having an average particle diameter of 3 μm or less. Can be obtained.

本発明は前述した実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲において種々の変更、改良、組合せ等が可能である。   The present invention is not limited to the above-described embodiments, and various modifications, improvements, combinations, and the like can be made without departing from the scope of the present invention.

１ 第１構造体
１ａ 吸着面
２ 第２構造体
２ａ 凹部
２ｂ 内部領域
３ 内部電極
３Ａ 第１電極層
３Ｂ 第２電極層
４ 導電層
４ａ ねじ山部
４Ａ 第１層
４Ｂ 第２層
５ａ、５ｂ 給電端子
６ 接合層
７ 導電性線材
８ 接合剤 DESCRIPTION OF SYMBOLS 1 1st structure 1a Adsorption surface 2 2nd structure 2a Recessed part 2b Internal area 3 Internal electrode 3A 1st electrode layer 3B 2nd electrode layer 4 Conductive layer 4a Thread part 4A 1st layer 4B 2nd layer 5a, 5b Terminal 6 Bonding layer 7 Conductive wire 8 Bonding agent

Claims (8)

セラミックスからなり、対象物が吸着される吸着面を有し、該吸着面以外の面に開口した凹部を有する基体と、
前記吸着面に垂直な方向を高さ方向としたときに、該基体における前記吸着面よりも低く前記凹部よりも高い位置に位置する内部電極と、
前記凹部内から前記内部電極につながる導電層と、
前記凹部内に挿入されており、前記導電層と接続された給電端子とを備える静電吸着用部材であって、
前記凹部の底面に開口しており、該底面における開口面積が前記給電端子の端面の面積よりも小さく、前記底面から前記内部電極へ延びる中空領域を有することを特徴とする静電吸着用部材。 A substrate made of ceramics , having a suction surface on which an object is adsorbed , and having a recess opened on a surface other than the adsorption surface;
When the direction perpendicular to the adsorption surface is the height direction, the internal electrode located at a position lower than the adsorption surface and higher than the recess in the substrate;
A conductive layer connected from the inside of the recess to the internal electrode ;
A member for electrostatic attraction comprising a feeding terminal inserted into the recess and connected to the conductive layer ,
An electrostatic attraction member characterized by having an opening in the bottom surface of the recess, an opening area in the bottom surface being smaller than an area of an end surface of the power supply terminal, and a hollow region extending from the bottom surface to the internal electrode . 前記凹部における導電層が、ねじ山部を有することを特徴とする請求項１に記載の静電吸着用部材。   The member for electrostatic attraction according to claim 1, wherein the conductive layer in the recess has a thread portion. 前記凹部における導電層に当接する螺旋状の導電性線材を備えることを特徴とする請求項１または請求項２に記載の静電吸着用部材。   The electrostatic attraction member according to claim 1, further comprising a spiral conductive wire contacting the conductive layer in the recess. 前記導電性線材が、接合剤を介して前記凹部における導電層に固定されていることを特徴とする請求項３に記載の静電吸着用部材。 Wherein the conductive wire material, electrostatic attraction member according to 請 Motomeko 3, characterized in that it is fixed to the conductive layer in the recess via the bonding agent. 前記導電層は、チタンを主成分とする第１層と、窒化チタン、炭化チタンまたは炭窒化チタンを主成分とする第２層とを有し、前記第１層上に前記第２層が位置し、前記第１層はセラミックスからなる前記基体に接合されていることを特徴とする請求項１乃至請求項４のいずれかに記載の静電吸着用部材。   The conductive layer has a first layer mainly composed of titanium and a second layer mainly composed of titanium nitride, titanium carbide, or titanium carbonitride, and the second layer is positioned on the first layer. 5. The electrostatic attraction member according to claim 1, wherein the first layer is bonded to the base body made of ceramics. 6. 前記吸着面の算術平均粗さＲａは０．８５μｍ以下（但し、０μｍを除く。）であることを特徴とする請求項１乃至請求項５のいずれかに記載の静電吸着用部材。   6. The electrostatic attraction member according to claim 1, wherein an arithmetic average roughness Ra of the attraction surface is 0.85 μm or less (excluding 0 μm). 前記基体が、前記吸着面を有する第１構造体と、前記凹部が位置する第２構造体からなり、前記第１構造体が前記第２構造体よりも絶縁破壊強さが大きい請求項１乃至請求項６のいずれかに記載の静電吸着用部材。   The said base | substrate consists of the 1st structure which has the said adsorption surface, and the 2nd structure in which the said recessed part is located, The said 1st structure has a dielectric breakdown strength larger than the said 2nd structure. The member for electrostatic attraction according to claim 6. 前記基体が、前記吸着面を有する第１構造体と、前記凹部が位置する第２構造体からな
り、前記第１構造体における前記吸着面を含む表層部の少なくとも一部が導電性または半導電性を有する請求項１乃至請求項６のいずれかに記載の静電吸着用部材。 The base includes a first structure having the adsorption surface and a second structure in which the concave portion is located, and at least a part of a surface layer portion including the adsorption surface in the first structure is conductive or semiconductive. The member for electrostatic attraction in any one of Claims 1 thru | or 6 which has property.
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