JP6507653B2 - 検査装置及び検査装置の制御方法 - Google Patents

検査装置及び検査装置の制御方法 Download PDF

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Publication number
JP6507653B2
JP6507653B2 JP2015004253A JP2015004253A JP6507653B2 JP 6507653 B2 JP6507653 B2 JP 6507653B2 JP 2015004253 A JP2015004253 A JP 2015004253A JP 2015004253 A JP2015004253 A JP 2015004253A JP 6507653 B2 JP6507653 B2 JP 6507653B2
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projection
inspection
pattern image
imaging
field
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Japanese (ja)
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JP2016130663A (ja
Inventor
心平 藤井
心平 藤井
貴行 西
貴行 西
優人 川島
優人 川島
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Omron Corp
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Omron Corp
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Priority to JP2015004253A priority Critical patent/JP6507653B2/ja
Priority to DE102015116047.1A priority patent/DE102015116047A1/de
Priority to CN201510648233.7A priority patent/CN105783784B/zh
Publication of JP2016130663A publication Critical patent/JP2016130663A/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/08—Testing mechanical properties
    • G01M11/081—Testing mechanical properties by using a contact-less detection method, i.e. with a camera
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8829—Shadow projection or structured background, e.g. for deflectometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
    • G01N2021/95646—Soldering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0635—Structured illumination, e.g. with grating

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  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Supply And Installment Of Electrical Components (AREA)
JP2015004253A 2015-01-13 2015-01-13 検査装置及び検査装置の制御方法 Active JP6507653B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2015004253A JP6507653B2 (ja) 2015-01-13 2015-01-13 検査装置及び検査装置の制御方法
DE102015116047.1A DE102015116047A1 (de) 2015-01-13 2015-09-23 Prüfvorrichtung und Steuerverfahren für eine Prüfvorrichtung
CN201510648233.7A CN105783784B (zh) 2015-01-13 2015-10-09 检查装置及检查装置的控制方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015004253A JP6507653B2 (ja) 2015-01-13 2015-01-13 検査装置及び検査装置の制御方法

Publications (2)

Publication Number Publication Date
JP2016130663A JP2016130663A (ja) 2016-07-21
JP6507653B2 true JP6507653B2 (ja) 2019-05-08

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JP2015004253A Active JP6507653B2 (ja) 2015-01-13 2015-01-13 検査装置及び検査装置の制御方法

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JP (1) JP6507653B2 (zh)
CN (1) CN105783784B (zh)
DE (1) DE102015116047A1 (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018146449A (ja) * 2017-03-07 2018-09-20 オムロン株式会社 ３次元形状計測装置及び３次元形状計測方法
JP6658625B2 (ja) * 2017-03-08 2020-03-04 オムロン株式会社 ３次元形状計測装置及び３次元形状計測方法
JP6702234B2 (ja) * 2017-03-10 2020-05-27 オムロン株式会社 ３次元測定装置、３次元測定方法、およびプログラム
JP6782194B2 (ja) * 2017-06-02 2020-11-11 株式会社日立製作所 自動点検システム
JP7053366B2 (ja) * 2018-05-10 2022-04-12 株式会社荏原製作所 検査装置及び検査方法
JP7145444B2 (ja) * 2018-06-20 2022-10-03 パナソニックＩｐマネジメント株式会社 投影システム、投影調整プログラム及び投影方法
KR102267919B1 (ko) 2018-06-28 2021-06-23 주식회사 고영테크놀러지 기판에 실장된 부품의 실장 불량 원인을 결정하는 전자 장치 및 방법
WO2020005001A1 (ko) * 2018-06-28 2020-01-02 주식회사 고영테크놀러지 기판에 실장된 부품의 실장 불량 원인을 결정하는 전자 장치 및 방법
WO2020111756A1 (ko) 2018-11-27 2020-06-04 주식회사 고영테크놀러지 기판에 대한 검사 결과를 표시하는 전자 장치 및 방법
US11682584B2 (en) 2018-12-26 2023-06-20 Camtek Ltd. Measuring buried layers
EP4007480A4 (en) * 2019-07-26 2022-08-03 Fuji Corporation INSPECTION DEVICE
WO2021059438A1 (ja) * 2019-09-26 2021-04-01 株式会社Ｆｕｊｉ 高さ測定装置
JP7364439B2 (ja) * 2019-11-25 2023-10-18 ファナック株式会社 Ｔｏｆセンサを用いた物体検出システム
JP7088232B2 (ja) * 2020-04-28 2022-06-21 オムロン株式会社 検査装置、検査方法、およびプログラム
KR102631655B1 (ko) * 2020-12-17 2024-02-01 (주)메티스 공정효율성을 높인 비전검사장치
KR20240060825A (ko) 2022-03-09 2024-05-08 야마하하쓰도키 가부시키가이샤 삼차원 계측용 연산 장치, 삼차원 계측용 프로그램, 기록 매체, 삼차원 계측 장치 및 삼차원 계측용 연산 방법

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62291513A (ja) * 1986-06-11 1987-12-18 Shinko Electric Co Ltd 光切断法による距離計測方法
US5617209A (en) * 1995-04-27 1997-04-01 View Engineering, Inc. Method and system for triangulation-based, 3-D imaging utilizing an angled scaning beam of radiant energy
US5812269A (en) * 1996-07-29 1998-09-22 General Scanning, Inc. Triangulation-based 3-D imaging and processing method and system
JP2000329521A (ja) * 1999-05-18 2000-11-30 Nikon Corp パターン測定方法および位置合わせ方法
US7111783B2 (en) * 2004-06-25 2006-09-26 Board Of Trustees Operating Michigan State University Automated dimensional inspection
JP2006090756A (ja) * 2004-09-21 2006-04-06 Victor Co Of Japan Ltd カメラキャリブレーション装置
JP4611782B2 (ja) * 2005-03-28 2011-01-12 シチズンホールディングス株式会社 ３次元形状測定方法及び測定装置
US7898651B2 (en) * 2005-10-24 2011-03-01 General Electric Company Methods and apparatus for inspecting an object
JP4103921B2 (ja) * 2006-08-11 2008-06-18 オムロン株式会社 フィレット検査のための検査基準データの設定方法、およびこの方法を用いた基板外観検査装置
US7465916B2 (en) * 2006-10-19 2008-12-16 Fujikura Ltd. Optical detection sensor
JP2008309551A (ja) * 2007-06-13 2008-12-25 Nikon Corp 形状測定方法、記憶媒体、および形状測定装置
CN101960253B (zh) * 2008-02-26 2013-05-01 株式会社高永科技 三维形状测量装置及测量方法
JP2009281824A (ja) * 2008-05-21 2009-12-03 Hitachi Kokusai Electric Inc 試料検査装置
KR101174676B1 (ko) 2010-11-19 2012-08-17 주식회사 고영테크놀러지 표면형상 측정방법 및 측정장치
JP5765651B2 (ja) * 2011-02-01 2015-08-19 Ｊｕｋｉオートメーションシステムズ株式会社 ３次元測定装置
JP5869281B2 (ja) * 2011-04-11 2016-02-24 株式会社ミツトヨ 光学式プローブ
JP6071363B2 (ja) * 2012-09-19 2017-02-01 キヤノン株式会社 距離計測装置及び方法
US9857166B2 (en) * 2012-09-19 2018-01-02 Canon Kabushiki Kaisha Information processing apparatus and method for measuring a target object
US9041914B2 (en) * 2013-03-15 2015-05-26 Faro Technologies, Inc. Three-dimensional coordinate scanner and method of operation

Also Published As

Publication number Publication date
CN105783784B (zh) 2019-12-13
JP2016130663A (ja) 2016-07-21
DE102015116047A1 (de) 2016-07-14
CN105783784A (zh) 2016-07-20

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