JP6444504B2 - 積層磁芯及びその製造方法 - Google Patents
積層磁芯及びその製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 75
- 238000000034 method Methods 0.000 claims description 22
- 238000012545 processing Methods 0.000 claims description 14
- 238000010030 laminating Methods 0.000 claims description 11
- 230000008859 change Effects 0.000 claims description 6
- 239000002932 luster Substances 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 description 64
- 239000000956 alloy Substances 0.000 description 64
- 239000000203 mixture Substances 0.000 description 52
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 51
- 239000011162 core material Substances 0.000 description 38
- 239000013078 crystal Substances 0.000 description 20
- 230000004907 flux Effects 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 10
- 238000002425 crystallisation Methods 0.000 description 6
- 230000008025 crystallization Effects 0.000 description 6
- 239000002159 nanocrystal Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052742 iron Inorganic materials 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 238000000113 differential scanning calorimetry Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000010791 quenching Methods 0.000 description 4
- 230000000171 quenching effect Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000007709 nanocrystallization Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910001339 C alloy Inorganic materials 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000002076 thermal analysis method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000000700 radioactive tracer Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- H01F41/0206—Manufacturing of magnetic cores by mechanical means
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- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/26—Methods of annealing
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- C21D6/00—Heat treatment of ferrous alloys
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- C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
- C21D9/52—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
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- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
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- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/02—Ferrous alloys, e.g. steel alloys containing silicon
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- C22C38/16—Ferrous alloys, e.g. steel alloys containing copper
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- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
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- H01F41/0206—Manufacturing of magnetic cores by mechanical means
- H01F41/0213—Manufacturing of magnetic circuits made from strip(s) or ribbon(s)
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- H01F41/0206—Manufacturing of magnetic cores by mechanical means
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- H01F41/0226—Manufacturing of magnetic circuits made from strip(s) or ribbon(s) from amorphous ribbons
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- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
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Description
アモルファス薄帯を形状加工する形状加工工程と、
前記形状加工されたアモルファス薄帯を熱処理する熱処理工程と、
前記熱処理されたアモルファス薄帯を積層する積層工程と、
を含み、前記熱処理工程における昇温速度は、毎秒80℃以上である積層磁芯の製造方法を提供する。
アモルファス薄帯を形状加工する形状加工工程と、
前記形状加工されたアモルファス薄帯を熱処理する熱処理工程と、
前記熱処理されたアモルファス薄帯を積層する積層工程と、
を含み、前記熱処理工程において、前記アモルファル薄帯の両面を実質的にヒータと接触させて、前記アモルファス薄帯を加熱する積層磁芯の製造方法を提供する。
本実施の形態による合金組成物の熱処理方法を具現化した装置の模式図を用いて熱処理工程の手順を説明する。
まず、Fe,Si,B,P,Cu,Cの原料を合金組成Fe84.3Si0.5B9.4P4Cu0.8C1となるように秤量し、高周波誘導溶解処理により溶解した。その後、溶解した合金組成物を大気中において単ロール液体急冷法にて処理し、厚さ約25μm程度の厚さを持つ薄帯状合金組成物を作製した。これらの薄帯状合金組成物を幅10mm、長さ50mmに切り出し(形状加工工程)、X線回折法により相を同定した。これらの加工された薄帯状合金組成物は、いずれも主相としてアモルファス相を有していた。次に、表1記載の熱処理条件の下で、実施例1〜8及び比較例1〜12の条件で図4に示す装置を用いて熱処理した(熱処理工程)。熱処理前後での薄帯状合金組成物をDSC装置により40℃/分程度の昇温速度で熱分析評価し、得られた第一ピーク面積比により析出したbccFe結晶の体積分率を算出した。さらに、加工・熱処理された薄帯状合金組成物夫々の飽和磁束密度(Bs)は振動試料型磁力計(VMS)を用いて800kA/mの磁場にて測定した。各合金組成物の保磁力(Hc)は直流BHトレーサーを用い2kA/mの磁場にて測定した。測定結果を表1に併せて示す。
モータ用磁芯として、より実用的な形状に加工した薄帯状合金組成物を、本発明で規定する条件で図4に示した装置を用いて実施例2及び比較例3の条件で熱処理する。図2の製造方法のフローチャートに従い、これらを複数積層する。
2 上側ヒータ
3 下側ヒータ
4 排出機構
5 積層治具
6 加熱部
7 薄帯
Claims (5)
- アモルファス薄帯を形状加工する形状加工工程と、
前記形状加工されたアモルファス薄帯を毎秒80℃以上の昇温速度で熱処理する熱処理工程と、
前記熱処理されたアモルファス薄帯を積層する積層工程と、
を含み、前記熱処理工程において、前記アモルファス薄帯の両面をヒータと接触させて、昇温制御し、前記アモルファス薄帯を加熱する積層磁芯の製造方法。 - 前記熱処理工程で、前記アモルファス薄帯を上側ヒータと下側ヒータとで挟み込んで加熱する請求項1記載の積層磁芯の製造方法。
- 前記熱処理工程で、前記アモルファス薄帯を前記上側ヒータと前記下側ヒータとで挟み込む前に、前記上側ヒータと前記下側ヒータは加熱されている請求項2記載の積層磁芯の製造方法。
- 前記熱処理工程において、前記アモルファス薄帯の前記両面は、金属光沢を失い、変色する請求項1記載の積層磁芯の製造方法。
- 前記熱処理されたアモルファス薄帯の色により、前記アモルファス薄帯の結晶状態の良否を判断する工程を、さらに有する請求項1記載の積層磁芯の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015134309 | 2015-07-03 | ||
JP2015134309 | 2015-07-03 | ||
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EP3584332B1 (en) * | 2017-02-14 | 2023-05-10 | Panasonic Holdings Corporation | Thin strip component, method for manufacturing same, and motor using thin strip component |
JP6245394B1 (ja) * | 2017-02-27 | 2017-12-13 | Tdk株式会社 | 軟磁性合金 |
JP6881269B2 (ja) * | 2017-12-06 | 2021-06-02 | トヨタ自動車株式会社 | 軟磁性材料の製造方法 |
JP7143635B2 (ja) * | 2018-05-30 | 2022-09-29 | トヨタ自動車株式会社 | 軟磁性材料及びその製造方法 |
EP3932582A4 (en) * | 2019-03-01 | 2022-11-30 | Hitachi Metals, Ltd. | AMORPHIC METAL THIN STRIP, LAMINATED CORE AND METHOD OF STAMPING AMORPHIC METAL THIN STRIP |
JP7131516B2 (ja) * | 2019-09-18 | 2022-09-06 | トヨタ自動車株式会社 | 磁石埋込型モータおよびその製造方法 |
WO2021132254A1 (ja) | 2019-12-25 | 2021-07-01 | 株式会社東北マグネットインスティテュート | ナノ結晶軟磁性合金 |
WO2021132272A1 (ja) | 2019-12-25 | 2021-07-01 | 株式会社東北マグネットインスティテュート | 合金 |
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JP7207347B2 (ja) * | 2020-02-13 | 2023-01-18 | トヨタ自動車株式会社 | 被打ち抜き材の製造方法 |
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