JP5991267B2 - Work cutting method and cutting device - Google Patents

Work cutting method and cutting device Download PDF

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JP5991267B2
JP5991267B2 JP2013111207A JP2013111207A JP5991267B2 JP 5991267 B2 JP5991267 B2 JP 5991267B2 JP 2013111207 A JP2013111207 A JP 2013111207A JP 2013111207 A JP2013111207 A JP 2013111207A JP 5991267 B2 JP5991267 B2 JP 5991267B2
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workpiece
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和弥 冨井
和弥 冨井
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Shin Etsu Handotai Co Ltd
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本発明は、ワイヤソーによってワークをウェーハ状に切断する切断方法及び切断装置に関する。   The present invention relates to a cutting method and a cutting apparatus for cutting a workpiece into a wafer shape with a wire saw.

半導体インゴットなどの硬脆材を薄板状のウェーハに切断する切断装置の一つにワイヤソーがある。
ワイヤソーは所定のピッチで張架されたワイヤ列を高速走行させ、ワイヤ列にワークを押し当て、ワイヤとワークが接触している部分に遊離砥粒を吹き付けながら、多数枚のウェーハに同時に切断する装置である。
One of the cutting devices for cutting a hard and brittle material such as a semiconductor ingot into a thin wafer is a wire saw.
A wire saw runs at a high speed through a wire array stretched at a predetermined pitch, presses the workpiece against the wire array, and simultaneously blows loose abrasive grains onto the portion where the wire and the workpiece are in contact, and simultaneously cuts into multiple wafers. Device.

特許文献1には、使用されるワイヤとして、ワイヤの外周面を砥粒キャリア樹脂皮膜で被覆したものが開示されている。このワイヤを使用すれば、砥粒(遊離砥粒)が砥粒キャリア樹脂皮膜に食い込むため、安定して砥粒をワイヤとワークが接触している部分に引き込むことができるとされている。   Patent Document 1 discloses a wire used in which the outer peripheral surface of the wire is coated with an abrasive carrier resin film. If this wire is used, the abrasive grains (free abrasive grains) bite into the abrasive carrier resin film, so that the abrasive grains can be stably drawn into the portion where the wire and the workpiece are in contact.

また、特許文献2には、砥粒の吹き付けによりワイヤ表面を粗面化する前処理手段を実施することで、一定量の加工用スラリをワイヤに付着させることが可能であると記載されている。   Patent Document 2 describes that a predetermined amount of processing slurry can be attached to the wire by performing pretreatment means for roughening the surface of the wire by spraying abrasive grains. .

特開2006−179677号公報JP 2006-179677 A 特開平11−099462号公報Japanese Patent Application Laid-Open No. 11-099462 特開2011−5624号公報JP 2011-5624 A

特許文献1に記載の樹脂皮膜の被覆ワイヤを用いて、シリコン単結晶インゴットを切断した場合、従来の樹脂皮膜の無いピアノ線での遊離砥粒切断と比較し、切り出したウェーハの表面粗さやダメージ深さにおいては良好な品質が得られるものの、ウェーハの全体形状を示すうねりや反りは劣る。これは切断中に砥粒キャリア樹脂皮膜に食い込む砥粒の数が少ないことに起因している。   When the silicon single crystal ingot is cut using the coated wire of the resin film described in Patent Document 1, the surface roughness and damage of the cut wafer are compared with conventional free abrasive grain cutting with a piano wire without a resin film. Although good quality can be obtained at the depth, the waviness and warpage indicating the entire shape of the wafer are inferior. This is due to the small number of abrasive grains that bite into the abrasive carrier resin film during cutting.

切り出されたウェーハのうねりや反りは一般的にワイヤの蛇行が原因である。砥粒キャリア樹脂皮膜に砥粒を食い込ませてワーク切断を進める切断方法においても、砥粒キャリア樹脂皮膜に食い込む砥粒が少量であれば、食い込む砥粒の偏りが生じ、ワイヤが蛇行し、うねりや反りが悪化する。   The waviness and warpage of the cut wafer is generally caused by the meandering of the wire. Even in the cutting method of cutting the workpiece by cutting the abrasive particles into the abrasive carrier resin film, if there is a small amount of abrasive particles that bite into the abrasive carrier resin film, the abrasive grains will be biased, causing the wires to meander and swell. And warpage gets worse.

特許文献1に記載の被覆ワイヤの表面、つまり砥粒キャリア樹脂皮膜の表面は、凹凸が無く滑らかで、光沢の有る状態である。このような表面状態で加工を開始すると、砥粒キャリア樹脂皮膜に食い込む砥粒が少なくなり、食い込む砥粒の偏りが発生し、うねりや反りが強く表れてしまう。   The surface of the covered wire described in Patent Document 1, that is, the surface of the abrasive carrier resin film, is smooth and glossy with no irregularities. When processing is started in such a surface state, the number of abrasive grains that bite into the abrasive carrier resin film is reduced, and the deviation of the abrasive grains that bite occurs, resulting in strong undulation and warpage.

また、この被覆ワイヤに特許文献2に記載の砥粒またはスラリの吹き付け方式の前処理手段を施したとしても、砥粒キャリア樹脂皮膜は一般的なピアノ線表面と比べて柔軟であるため、うねりや反りの抑制は期待できない。   Moreover, even if the pretreatment means of the abrasive grain or slurry spraying method described in Patent Document 2 is applied to the coated wire, the abrasive carrier resin film is more flexible than a general piano wire surface, so And suppression of warpage cannot be expected.

本発明は前述のような問題に鑑みてなされたもので、切り出されたウェーハのうねりや反りなどの全体形状を良好にできるワークの切断方法および切断装置を提供することを目的とする。   The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a workpiece cutting method and a cutting apparatus that can improve the overall shape of the cut wafer such as waviness and warpage.

上記目的を達成するために、本発明によれば、複数のワイヤガイド間に螺旋状に巻回されたワイヤによって形成されるワイヤ列を軸方向に走行させ、円柱状ワークと前記ワイヤとの接触部に加工液を供給しながら、前記ワイヤ列に前記ワークを押し当てて切込み送りし、前記ワークをウェーハ状に切断するワークの切断方法であって、前記ワイヤはベースワイヤ表面に有機皮膜または無機皮膜を被覆したものを用い、前記切断されるワークより前記ワイヤ列のワイヤ操出側に、前記ワイヤ表面を粗面化するための粗面化部材を配置し、前記ワイヤと前記粗面化部材を接触させることで、前記ワイヤ表面を粗面化させながら前記ワークを切断することを特徴としたワークの切断方法を提供する。   In order to achieve the above object, according to the present invention, a wire row formed by wires wound spirally between a plurality of wire guides is caused to travel in the axial direction, and the cylindrical workpiece and the wire are brought into contact with each other. A workpiece cutting method in which the workpiece is pressed against the wire row and fed into the wafer row while supplying a machining fluid to the section, and the workpiece is cut into a wafer shape. A surface-roughening member for roughening the surface of the wire is disposed on the wire operation side of the wire row from the workpiece to be cut, using a coating film, and the wire and the surface-roughening member A workpiece cutting method characterized by cutting the workpiece while roughening the surface of the wire by bringing the wire into contact with each other.

このような切断方法であれば、ワーク切断に使用される被覆ワイヤが、ワークに接触する前に粗面化部材と接触することで、被覆ワイヤ表面の皮膜が粗面化され、皮膜に食い込む砥粒数を大幅に増やすことができる。その結果、被覆ワイヤは直線的に切り進むことが可能となり、切り出されたウェーハのうねりや反りなどの全体形状を大幅に改善することができる。また、ワイヤが皮膜を有することで、切り出したウェーハの表面粗さやダメージ深さの品質も良好となる。   With such a cutting method, the coated wire used for workpiece cutting comes into contact with the roughening member before coming into contact with the workpiece, so that the coating on the surface of the coated wire is roughened and the abrasive bites into the coating. The number of grains can be greatly increased. As a result, the covered wire can be cut linearly, and the overall shape of the cut wafer, such as waviness and warpage, can be greatly improved. Moreover, since the wire has a film, the quality of the surface roughness and damage depth of the cut wafer is improved.

このとき、粗面化部材を樹脂、シリコン、カーボン及びセラミックスのいずれかとすることが好ましい。
このようにすれば、ワイヤを良好に粗面化できるとともに、粗面化部材の摩耗を抑制することができ、粗面化部材の寿命が長くなり、コストを抑えることができる。
At this time, the roughening member is preferably any one of resin, silicon, carbon, and ceramics.
In this way, the wire can be roughened satisfactorily, the wear of the roughened member can be suppressed, the life of the roughened member can be prolonged, and the cost can be reduced.

また本発明によれば、複数のワイヤガイド間に螺旋状に巻回された軸方向に走行するワイヤによって形成されるワイヤ列と、円柱状ワークと前記ワイヤとの接触部に加工液を供給するノズルと、前記ワークを保持しつつ押圧することで前記ワークを前記ワイヤ列に押し当てるワーク送り手段を具備し、前記ノズルから前記ワークと前記ワイヤとの接触部に加工液を供給しつつ、前記ワーク送り手段により保持された前記ワークを、走行する前記ワイヤ列に押し当てて切込み送りし、前記ワークをウェーハ状に切断するワークの切断装置であって、前記ワイヤはベースワイヤ表面に有機皮膜または無機皮膜を被覆したものであり、前記ワークより前記ワイヤ列のワイヤ操出側に、前記ワイヤ表面を粗面化するための粗面化部材を具備し、前記ワイヤと前記粗面化部材を接触させることで、前記ワイヤ表面を粗面化させながら前記ワークを切断するものであることを特徴としたワークの切断装置が提供される。   Further, according to the present invention, the machining fluid is supplied to a wire row formed by a wire that is wound spirally between a plurality of wire guides and travels in an axial direction, and a contact portion between the cylindrical workpiece and the wire. A nozzle, and a workpiece feeding means for pressing the workpiece against the wire row by pressing the workpiece while holding the workpiece, while supplying a working fluid from the nozzle to the contact portion between the workpiece and the wire, A workpiece cutting device that presses and feeds the workpiece held by the workpiece feeding means to the traveling wire row and cuts the workpiece into a wafer shape, wherein the wire is formed on the surface of the base wire with an organic film or An inorganic film is coated, and a roughening member for roughening the surface of the wire is provided on the wire operation side of the wire row from the workpiece. By contacting Ya and the roughening member, the cutting device of a work which is characterized in that the wire surface is to cut the workpiece while roughening is provided.

このようなものであれば、ワーク切断に使用される被覆ワイヤが、ワークに接触する前に粗面化部材と接触することで、被覆ワイヤ表面の皮膜が粗面化され、皮膜に食い込む砥粒数を大幅に増やすことができる。その結果、被覆ワイヤは直線的に切り進むことが可能となり、切り出されたウェーハのうねりや反りなどの全体形状を大幅に改善することができるとともに、切り出されたウェーハの表面粗さやダメージ深さも改善できる。   If this is the case, the coated wire used for cutting the workpiece comes into contact with the roughening member before coming into contact with the workpiece, so that the coating on the surface of the coated wire is roughened and the abrasive grains bite into the coating. The number can be increased significantly. As a result, the coated wire can be cut linearly, greatly improving the overall shape of the cut wafer, such as undulation and warping, and improving the surface roughness and damage depth of the cut wafer. it can.

このとき、粗面化部材が樹脂、シリコン、カーボン及びセラミックスのいずれかであることが好ましい。
このようなものであれば、ワイヤを均一に粗面化できるとともに粗面化部材の摩耗を抑制することができ、粗面化部材の寿命が長くなり、コストを抑えることができる。
At this time, it is preferable that the roughening member is any one of resin, silicon, carbon, and ceramics.
With such a configuration, the wire can be uniformly roughened, wear of the roughened member can be suppressed, the life of the roughened member can be extended, and cost can be reduced.

本発明では、ワイヤソーによるワークの切断において、切断用のワイヤとしてベースワイヤ表面に有機皮膜または無機皮膜を被覆したものを用いる。そして、切断されるワークよりワイヤ列のワイヤ操出側に、ワイヤ表面を粗面化するための粗面化部材を配置し、ワイヤと粗面化部材を接触させることで、ワイヤ表面を粗面化させながらワークを切断する。このようにすることで、被覆ワイヤ表面の皮膜が粗面化され、皮膜に凹凸が作られ、皮膜に食い込む砥粒数を大幅に増やすことができる。これにより、ワイヤは直線的に切り進むことが可能となる。その結果、切り出されたウェーハのうねりや反りなどの全体形状を大幅に改善することができる。しかも、ワイヤが皮膜を有することで、切り出したウェーハの表面粗さやダメージ深さの品質も良好となる。   In the present invention, when a workpiece is cut by a wire saw, a base wire surface coated with an organic film or an inorganic film is used as a cutting wire. Then, a roughening member for roughening the wire surface is arranged on the wire operation side of the wire row from the workpiece to be cut, and the wire surface is roughened by bringing the wire and the roughening member into contact with each other. The workpiece is cut while making it. By doing in this way, the coating | coated film | membrane on the surface of a covering wire is roughened, an unevenness | corrugation is made in a coating | film | coat, and the number of the abrasive grains which bite into a coating | film | coat can be increased significantly. As a result, the wire can be cut linearly. As a result, the overall shape of the cut wafer, such as waviness and warpage, can be greatly improved. Moreover, since the wire has a film, the quality of the surface roughness and damage depth of the cut wafer is improved.

本発明に係るワークの切断装置の一例を示した概略図である。It is the schematic which showed an example of the workpiece | work cutting device which concerns on this invention. 本発明に係るワークの切断装置の要部を示した拡大図である。It is the enlarged view which showed the principal part of the cutting device of the workpiece | work which concerns on this invention. 粗面化部材との接触が無い被覆ワイヤの一例を示すSEM写真である。It is a SEM photograph which shows an example of the covering wire without a contact with a roughening member. 粗面化部材と接触後の被覆ワイヤの一例を示すSEM写真である。It is a SEM photograph which shows an example of the covering wire after contact with a roughening member.

以下、本発明について実施の形態を説明するが、本発明はこれに限定されるものではない。
上記したように、樹脂皮膜が被覆されたワイヤを用いて、シリコン単結晶インゴットを切断した場合、従来の樹脂皮膜の無いピアノ線での遊離砥粒切断と比較して、切り出したウェーハの表面粗さやダメージ深さにおいては良好な品質が得られるものの、ウェーハの全体形状を示すうねりや反りが悪化してしまうという問題があった。
Hereinafter, although an embodiment is described about the present invention, the present invention is not limited to this.
As described above, when a silicon single crystal ingot is cut using a wire coated with a resin film, the surface roughness of the cut wafer is compared with conventional free abrasive grain cutting with a piano wire without a resin film. Although good quality was obtained at the sheath depth, there was a problem that the waviness and warpage indicating the entire shape of the wafer deteriorated.

そこで、本発明者はワイヤソーによるワークの切断において、切り出されたウェーハの表面粗さやダメージ深さの良好な品質を得つつ、ウェーハのうねりや反りなどの全体形状の悪化を抑制するために鋭意検討を重ねた。その結果、ワイヤはベースワイヤ表面に有機皮膜または無機皮膜を被覆した被覆ワイヤを用い、切断されるワークよりワイヤ列のワイヤ操出側に、被覆ワイヤ表面、すなわち皮膜表面を粗面化するための粗面化部材を配置し、被覆ワイヤと粗面化部材を接触させることで、被覆ワイヤ表面を粗面化させながらワークを切断することで、切り出されたウェーハのうねりや反りなどの全体形状を大幅に改善できることに想到し、本発明を完成させた。   Therefore, the present inventor diligently studied in order to suppress the deterioration of the overall shape such as the waviness and warpage of the wafer while obtaining a good quality of the surface roughness and damage depth of the cut wafer when cutting the workpiece with a wire saw Repeated. As a result, a coated wire with an organic film or an inorganic film coated on the surface of the base wire is used as the wire, and the coated wire surface, that is, the coated surface is roughened on the wire operation side of the wire row from the workpiece to be cut. By placing the roughened member and bringing the coated wire and the roughened member into contact with each other, cutting the workpiece while roughening the surface of the coated wire makes it possible to shape the entire shape of the cut wafer, such as undulation and warpage. The present invention was completed by conceiving that it can be greatly improved.

以下、本発明のワークの切断方法について図を参照して詳細に説明するが、本発明はこれらに限定されるものではない。   Hereinafter, although the cutting method of the workpiece | work of this invention is demonstrated in detail with reference to figures, this invention is not limited to these.

本発明のワークの切断装置について説明する。
図1に示すように、本発明の切断装置1は主に、複数のワイヤガイド2間に螺旋状に巻回された軸方向に走行する被覆ワイヤ3によって形成されるワイヤ列4、切断時にワークWと被覆ワイヤ3との接触部に加工液を供給する加工液供給手段5、ワークWを保持しつつ押圧することでワークWをワイヤ列に押し当てるワーク送り手段6、被覆ワイヤ3に張力を付与するための張力付与機構7、7’等で構成されている。
The workpiece cutting device of the present invention will be described.
As shown in FIG. 1, the cutting device 1 of the present invention mainly includes a wire row 4 formed by a covered wire 3 that is spirally wound between a plurality of wire guides 2 and travels in an axial direction. The working fluid supply means 5 for supplying the working fluid to the contact portion between W and the covered wire 3, the workpiece feeding means 6 for pressing the workpiece W against the wire row by pressing the workpiece W while holding the workpiece W, and tension on the covered wire 3 It is comprised by the tension | tensile_strength provision mechanisms 7 and 7 'for providing.

被覆ワイヤ3はベースワイヤ表面に有機皮膜または無機皮膜を被覆したものである。この皮膜としては、特に限定されるものではないが、有機皮膜は、例えば、フェノール系、ポリアミド系、エポキシ系、ウレタン系等の熱硬化性樹脂、または、エポキシ系、ウレタン系等の光硬化性樹脂を用いることができる。無機皮膜は、例えば、SiO皮膜、ガラス(ソーダガラス)皮膜、CrN皮膜などを用いることができる(特許文献3)。 The covered wire 3 is obtained by coating the base wire surface with an organic film or an inorganic film. The film is not particularly limited, but the organic film is, for example, a thermosetting resin such as phenol, polyamide, epoxy, or urethane, or photocurable such as epoxy or urethane. Resin can be used. As the inorganic film, for example, a SiO 2 film, a glass (soda glass) film, a CrN film, or the like can be used (Patent Document 3).

被覆ワイヤ3は、一方のワイヤリールボビン8から繰り出され、トラバーサを介して定トルクモーターやダンサローラ(デッドウェイト)等からなる張力付与機構7を経て、ワイヤガイド2に入っている。被覆ワイヤ3はもう一方の張力付与機構7’を経てワイヤリールボビン8’に巻き取られている。   The covered wire 3 is fed out from one wire reel bobbin 8 and enters the wire guide 2 via a traverser and a tension applying mechanism 7 including a constant torque motor, a dancer roller (dead weight), and the like. The covered wire 3 is wound around a wire reel bobbin 8 'through another tension applying mechanism 7'.

加工液供給手段5はスラリチラー9、スラリタンク10、ノズル11等から構成される。ノズル11はワイヤガイド2に巻回された被覆ワイヤ3の上方に配置されている。この、ノズル11はスラリタンク10に接続されており、加工液はスラリタンク10で攪拌されスラリチラー9により温調された後ノズル11から被覆ワイヤ3に供給できるようになっている。そして、加工液はワイヤ列4に乗りワークWとワイヤ列4との接触部に送られる。また、供給された加工液はスラリタンク10に戻り循環利用される。   The processing liquid supply means 5 includes a slurry chiller 9, a slurry tank 10, a nozzle 11 and the like. The nozzle 11 is disposed above the covered wire 3 wound around the wire guide 2. The nozzle 11 is connected to the slurry tank 10, and the machining liquid is stirred in the slurry tank 10 and adjusted in temperature by the slurry chiller 9, and then can be supplied from the nozzle 11 to the covered wire 3. Then, the machining fluid rides on the wire row 4 and is sent to the contact portion between the workpiece W and the wire row 4. Further, the supplied machining fluid is returned to the slurry tank 10 for circulation.

また、ワイヤガイド2は鉄鋼製円筒の周囲にポリウレタン樹脂を圧入し、その表面に所定のピッチで溝を切ったローラーであり、駆動モータ12によって、巻回された被覆ワイヤ3が軸方向に往復走行できるようになっている。ここで、被覆ワイヤ3を往復走行させる際、ワイヤ新線が供給されるように、被覆ワイヤ3の両方向への走行距離を同じにするのではなく、片方向への走行距離の方が長くなるようにする。このようにして、被覆ワイヤ3の往復走行を行いながら長い走行距離の方向に新線が供給される。   Further, the wire guide 2 is a roller in which polyurethane resin is press-fitted around a steel cylinder and grooves are cut at a predetermined pitch on the surface thereof, and the covered wire 3 wound by the drive motor 12 is reciprocated in the axial direction. You can run. Here, when the covered wire 3 is reciprocally traveled, the travel distance in both directions of the covered wire 3 is not the same so that a new wire is supplied, but the travel distance in one direction is longer. Like that. In this way, a new line is supplied in the direction of a long travel distance while reciprocating the covered wire 3.

例えば、図2に示すように、A方向に新線が供給されていく場合、図2中に示すB側がワイヤ操出側となり、C側がワイヤ巻取側となる。
また、図2に示すように、ワークWよりワイヤ列4のワイヤ操出側(図2のB側)には被覆ワイヤ3の表面を粗面化するための粗面化部材14及び、その粗面化部材14を保持するための粗面化部材容器13を有している。粗面化部材容器13はステンレス製で、ワイヤガイド2を固定するブロック(不図示)に固定されており、その容器部はワイヤ列4側が開口されている。この粗面化部材容器13の開口部に保持された粗面化部材14と被覆ワイヤ3は接触できるようになっている。また粗面化部材容器13内にはスプリング(不図示)が設置されており、粗面化部材14が摩耗してもワイヤ列4方向に一定の押し圧で繰り出すことが可能である。
For example, as shown in FIG. 2, when a new line is supplied in the A direction, the B side shown in FIG. 2 is the wire steering side, and the C side is the wire winding side.
Further, as shown in FIG. 2, a roughening member 14 for roughening the surface of the covered wire 3 on the wire operation side (B side in FIG. 2) of the wire row 4 from the work W, and the roughening member 14 A roughening member container 13 for holding the surfaceizing member 14 is provided. The roughening member container 13 is made of stainless steel, and is fixed to a block (not shown) for fixing the wire guide 2, and the container part is opened on the wire row 4 side. The roughening member 14 held in the opening of the roughening member container 13 and the covered wire 3 can come into contact with each other. Further, a spring (not shown) is installed in the roughening member container 13, and even if the roughening member 14 is worn, it can be fed out in the direction of the wire row 4 with a constant pressing pressure.

ワークWの切断を行う際、ノズル11からワークWと被覆ワイヤ3との接触部に加工液を供給しつつ、ワーク送り手段6により保持されたワークWを、走行するワイヤ列4に押し当てて切込み送りし、ワークWをウェーハ状に切断する。この際、本発明ではワークWよりワイヤ列4のワイヤ操出側(図2のB側)で、被覆ワイヤ3が粗面化部材14に接触するため、ワークWと接触する被覆ワイヤ3はその皮膜表面が粗面化しているものとなる。   When cutting the workpiece W, the workpiece W held by the workpiece feeding means 6 is pressed against the traveling wire row 4 while supplying the machining fluid from the nozzle 11 to the contact portion between the workpiece W and the covered wire 3. Cut and feed to cut the workpiece W into a wafer. At this time, in the present invention, since the covered wire 3 comes into contact with the roughening member 14 on the wire operation side (B side in FIG. 2) of the wire row 4 from the work W, the covered wire 3 in contact with the work W is The coating surface is roughened.

このような本発明のワークの切断装置であれば、ワーク切断に使用される被覆ワイヤが、ワークに接触する前に粗面化部材と接触することで、被覆ワイヤ表面の皮膜が粗面化され、皮膜に食い込む砥粒数を大幅に増やすことができ、皮膜に食い込む砥粒の偏りが低減し、ワイヤの蛇行が減少する。従って、被覆ワイヤは直線的に切り進むことが可能となる。その結果、切り出したウェーハの表面粗さやダメージ深さにおいて良好な品質を得ることができると同時に、うねりや反りなどの全体形状を大幅に改善することができるものとなる。   With such a workpiece cutting device of the present invention, the coated wire used for workpiece cutting comes into contact with the roughening member before contacting the workpiece, so that the coating on the surface of the coated wire is roughened. The number of abrasive grains that bite into the film can be greatly increased, the deviation of the abrasive grains that bite into the film is reduced, and the meandering of the wire is reduced. Therefore, the covered wire can be cut straight. As a result, good quality can be obtained in terms of the surface roughness and damage depth of the cut wafer, and at the same time, the overall shape such as waviness and warpage can be greatly improved.

このとき、粗面化部材14が樹脂、シリコン、カーボン及びセラミックスのいずれかであることが好ましい。
このようにすれば、粗面化を均一にかつ容易に実施できるとともに、粗面化部材14の摩耗を抑制することができ、粗面化部材14の寿命が長くなり、コストを抑えることができるものとなる。
At this time, it is preferable that the roughening member 14 is any one of resin, silicon, carbon, and ceramics.
In this way, the roughening can be performed uniformly and easily, the wear of the roughening member 14 can be suppressed, the life of the roughening member 14 can be prolonged, and the cost can be reduced. It will be a thing.

次に本発明のワークの切断方法について説明する。ここでは、図1に示すような切断装置1を用いた場合について述べる。
まず、図2に示すように、ワークWよりワイヤ列4のワイヤ操出側に、粗面化部材容器13で保持した粗面化部材14が被覆ワイヤ3と接触できるように配置しておく。次に、ワーク送り手段6によりワークWを保持する。そして、被覆ワイヤ3を張力付与機構7、7’によって張力を付与しながら軸方向へ往復走行させ、加工液供給手段5により被覆ワイヤ3への加工液供給を行った状態で、ワーク送り手段6によりワークWを相対的に押し下げて、ワークWをワイヤ列4に対して切り込み送りさせてワークWを切断していく。
Next, the workpiece cutting method of the present invention will be described. Here, the case where the cutting device 1 as shown in FIG. 1 is used will be described.
First, as shown in FIG. 2, the roughening member 14 held by the roughening member container 13 is arranged on the wire operation side of the wire row 4 from the workpiece W so as to be in contact with the covered wire 3. Next, the workpiece W is held by the workpiece feeding means 6. The coated wire 3 is reciprocated in the axial direction while applying tension by the tension applying mechanisms 7 and 7 ′, and the workpiece feeding means 6 is supplied with the machining liquid supplied to the coated wire 3 by the machining liquid supply means 5. Thus, the workpiece W is relatively pushed down, and the workpiece W is cut and fed into the wire row 4 to cut the workpiece W.

この際、ワークWよりワイヤ列4のワイヤ操出側で、被覆ワイヤ3を粗面化部材14に接触させることで、ワークWと接触する前の被覆ワイヤ3の皮膜表面が常に粗面化している状態にする。ワイヤ操出側から供給される新線は、この方法で常に粗面化することができるがワークWの切断開始直後から切断に用いるワイヤについて、例えば、ワイヤ交換した後のように、粗面化未実施のワイヤに対しても粗面化部材14により事前に粗面化しておくことが好ましい。これは、本発明の装置を用いれば容易に実施することができる。   At this time, by bringing the coated wire 3 into contact with the roughening member 14 on the wire operation side of the wire row 4 from the workpiece W, the coating surface of the coated wire 3 before contacting with the workpiece W is always roughened. To be in a state. The new line supplied from the wire feeding side can always be roughened by this method, but the wire used for cutting immediately after the start of cutting of the workpiece W is roughened, for example, after wire replacement. It is preferable that the unfinished wire is roughened in advance by the roughening member 14. This can be easily performed using the apparatus of the present invention.

このようなワークの切断方法であれば、ワーク切断に使用される被覆ワイヤが、ワークに接触する前に粗面化部材と接触することで、被覆ワイヤ表面の皮膜が粗面化され、皮膜に食い込む砥粒数を大幅に増やすことができ、皮膜に食い込む砥粒の偏りが低減することで、ワイヤの蛇行が減少する。従って、被覆ワイヤは直線的に切り進むことが可能となる。その結果、切り出したウェーハの表面粗さやダメージ深さにおいて良好な品質を得ることができると同時に、うねりや反りなどの全体形状を大幅に改善することができる。   With such a workpiece cutting method, the coated wire used for workpiece cutting comes into contact with the roughening member before coming into contact with the workpiece, so that the coating on the surface of the coated wire is roughened. The number of abrasive grains that bite in can be greatly increased, and the bias of the abrasive grains that bite into the film is reduced, thereby reducing the meandering of the wire. Therefore, the covered wire can be cut straight. As a result, good quality can be obtained in terms of the surface roughness and damage depth of the cut wafer, and at the same time, the overall shape such as undulation and warpage can be greatly improved.

このとき、粗面化部材が樹脂、シリコン、カーボン及びセラミックスのいずれかであることが好ましい。
このような材質であれば、簡単かつ均一にワイヤを粗面化することができるとともに、過度に粗面化されないので、粗面化部材の摩耗を抑制することができ、粗面化部材の寿命が長くなり、コストを抑えることができる。
At this time, it is preferable that the roughening member is any one of resin, silicon, carbon, and ceramics.
With such a material, the wire can be roughened easily and uniformly, and since it is not excessively roughened, the wear of the roughened member can be suppressed, and the life of the roughened member can be reduced. Can lengthen the cost.

以下、本発明の実施例及び比較例を示して本発明をより具体的に説明するが、本発明はこれらに限定されるものではない。   EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples and comparative examples of the present invention, but the present invention is not limited to these.

(実施例)
図1に示すような本発明の切断装置を用い、本発明のワークの切断方法に従ってワークの切断を行い、切り出したウェーハのうねりWtを測定した。ここで、切断するワークとして直径200mm、長さ160mmの単結晶シリコンインゴットを用いた。被覆ワイヤは芯線径0.14mmのピアノ線に膜厚10μmのポリアミド系樹脂皮膜を被覆したものを用いた。
(Example)
Using the cutting apparatus of the present invention as shown in FIG. 1, the work was cut according to the work cutting method of the present invention, and the waviness Wt of the cut wafer was measured. Here, a single crystal silicon ingot having a diameter of 200 mm and a length of 160 mm was used as a workpiece to be cut. The covered wire used was a piano wire with a core wire diameter of 0.14 mm coated with a polyamide resin film having a thickness of 10 μm.

また、被覆ワイヤが、ワイヤ操出側から前進および後退を繰り返しながら、ワイヤ巻取側に送られる往復走行を採用した。ここでワイヤの平均走行速度は600m/min、ワイヤ新線を繰り出す供給速度は5m/minに設定した。ワイヤ張力は張力付与機構で調節し、25Nに設定した。   In addition, a reciprocating travel in which the coated wire is sent to the wire winding side while repeating the forward and backward movements from the wire operating side is adopted. Here, the average traveling speed of the wire was set to 600 m / min, and the supply speed for feeding the new wire was set to 5 m / min. The wire tension was adjusted with a tension applying mechanism and set to 25N.

加工液として、平均粒径8μmのダイヤモンドをグリコール系水溶液に懸濁させたスラリを用いた。また、スラリ中のダイヤモンド濃度は5質量%とした。また、粗面化部材として、単結晶シリコンを使用し、粗面化部材の押し圧は、ワイヤ1本に対して約0.06kgfの荷重をかけた。これはワイヤ列が約2mmたわむ値である。   As a processing liquid, a slurry in which diamond having an average particle diameter of 8 μm was suspended in a glycol-based aqueous solution was used. The diamond concentration in the slurry was 5% by mass. Moreover, single crystal silicon was used as the roughening member, and the pressing force of the roughening member applied a load of about 0.06 kgf to one wire. This is the value at which the wire array bends about 2 mm.

まず、ワークの切断を開始する前に、粗面化部材との接触が無い被覆ワイヤと、粗面化部材と接触後でワークと接触前の被覆ワイヤの表面状態を評価した。
図3は、粗面化部材との接触が無い被覆ワイヤを示すSEM写真である。図3に示すように、粗面化部材との接触が無い被覆ワイヤは光沢のある滑らかな表面状態である。
図4は粗面化部材と接触後の被覆ワイヤを示すSEM写真である。図4に示すように粗面化部材に接触後の被覆ワイヤの表面には凹凸が付き、粗面化されたことが分かる。
First, before starting the cutting of the workpiece, the surface condition of the covered wire without contact with the roughened member and the surface of the covered wire after contacting with the roughened member and before contacting with the workpiece were evaluated.
FIG. 3 is an SEM photograph showing a covered wire without contact with the roughening member. As shown in FIG. 3, the covered wire without contact with the roughening member has a glossy and smooth surface state.
FIG. 4 is an SEM photograph showing the coated wire after contact with the roughened member. As shown in FIG. 4, it can be seen that the surface of the coated wire after contact with the roughening member is uneven and roughened.

次に、ワークを切断し、切り出したウェーハのうねりWtを測定した。うねりWtの測定は、触針式の粗さ計を用いた。測定長は190mmで切断方向を測定した。測定後の数値処理は、JIS’01規格ろ波うねり、カットオフ0.8mm、ガウシアンフィルタを使用した。ウェーハのサンプリング方法はインゴットブロック内で両端のワイヤ操出側とワイヤ巻取側から各5枚を抜き取った。
(比較例)
切断装置が粗面化部材を具備していないこと、すなわち図3に示すように被覆ワイヤが粗面化されないままワークの切断を行うこと以外、実施例と同様な条件でワークの切断を行い、切り出したウェーハのうねりWtを測定した。
Next, the workpiece was cut, and the waviness Wt of the cut wafer was measured. For measuring the waviness Wt, a stylus type roughness meter was used. The cutting length was 190 mm and the cutting direction was measured. For the numerical processing after the measurement, a JIS'01 standard filtering swell, a cutoff of 0.8 mm, and a Gaussian filter were used. In the sampling method of the wafer, 5 pieces each were extracted from the wire feeding side and the wire winding side at both ends in the ingot block.
(Comparative example)
The cutting device is not equipped with a roughening member, that is, the workpiece is cut under the same conditions as in the example, except that the workpiece is cut while the coated wire is not roughened as shown in FIG. The waviness Wt of the cut wafer was measured.

表1に、実施例、比較例の測定結果をまとめたもの示す。
比較例では、ワイヤ巻取側よりワイヤ操出側のうねりが劣る。これはインゴットブロックのワイヤ操出側から無垢の被覆ワイヤが入るためである。しかし、本発明の実施例では、被覆ワイヤ表面の砥粒キャリア樹脂皮膜を事前に粗面化しているため、インゴットブロック位置によるうねりの差も無くなり、比較例より約30%のうねり改善を達成した。
Table 1 summarizes the measurement results of Examples and Comparative Examples.
In the comparative example, the undulation on the wire feeding side is inferior to that on the wire winding side. This is because a solid coated wire enters from the wire operation side of the ingot block. However, in the embodiment of the present invention, since the abrasive carrier resin film on the surface of the coated wire is roughened in advance, the difference in waviness due to the position of the ingot block is eliminated, and the waviness improvement of about 30% is achieved compared with the comparative example. .

実施例では粗面化部材として単結晶シリコンを使用したが、粗面化部材として樹脂、シリコン、カーボン及びセラミックスのいずれかを用いても同様の効果が得られることが確認された。   In the examples, single crystal silicon was used as the roughening member, but it was confirmed that the same effect can be obtained even if any of resin, silicon, carbon and ceramics is used as the roughening member.

また、図4に示す被覆ワイヤは粗面化部材と40回(20往復)の接触があったため全面の粗面化が行われたが、接触回数が少なく粗面化が部分的であっても、粗面化された部分が主にワークの加工に関与するため同様の効果が得られることが確認された。   In addition, the coated wire shown in FIG. 4 was roughened on the entire surface because it was contacted with the roughened member 40 times (20 reciprocations). It has been confirmed that the same effect can be obtained because the roughened portion is mainly involved in workpiece processing.

Figure 0005991267
Figure 0005991267

なお、本発明は、上記実施形態に限定されるものではない。上記実施形態は例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に包含される。   The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has any configuration that has substantially the same configuration as the technical idea described in the claims of the present invention and that exhibits the same effects. Are included in the technical scope.

1…切断装置、2…ワイヤガイド、3…被覆ワイヤ、
4…ワイヤ列、5…加工液供給手段、6…ワーク送り手段、
7、7’…張力付与機構、8、8’…ワイヤリールボビン、
9…スラリチラー、10…スラリタンク、11…ノズル、
12…駆動モータ、13…粗面化部材容器、14…粗面化部材、
W…ワーク。
DESCRIPTION OF SYMBOLS 1 ... Cutting device, 2 ... Wire guide, 3 ... Coated wire,
4 ... wire row, 5 ... working fluid supply means, 6 ... work feeding means,
7, 7 '... tension applying mechanism, 8, 8' ... wire reel bobbin,
9 ... Slurry chiller, 10 ... Slurry tank, 11 ... Nozzle,
12 ... Drive motor, 13 ... Roughening member container, 14 ... Roughening member,
W ... Work.

Claims (4)

複数のワイヤガイド間に螺旋状に巻回されたワイヤによって形成されるワイヤ列を軸方向に走行させ、円柱状ワークと前記ワイヤとの接触部に加工液を供給しながら、前記ワイヤ列に前記ワークを押し当てて切込み送りし、前記ワークをウェーハ状に切断するワークの切断方法であって、
前記ワイヤはベースワイヤ表面に有機皮膜を被覆したものを用い、前記切断されるワークより前記ワイヤ列のワイヤ操出側に、前記ワイヤ表面を粗面化するための粗面化部材を配置し、前記粗面化部材としてワイヤ列方向に一定の押し圧で繰り出すことが可能なものを用い、前記ワイヤと前記粗面化部材を接触させることで、前記ワイヤ表面を粗面化させながら前記ワークを切断することを特徴としたワークの切断方法。
A wire row formed by wires wound spirally between a plurality of wire guides is run in the axial direction, and while supplying a working fluid to a contact portion between a cylindrical workpiece and the wire, A method of cutting a workpiece by pressing and feeding the workpiece and cutting the workpiece into a wafer shape,
The wire base surface of the wire used after coating the organic skin film, the wire Feeding side of the wire row from the work to be the cut, place the roughening member for roughening the surface of the wire The roughening member that can be fed in a wire row direction with a constant pressing force is used, and the wire and the roughening member are brought into contact with each other to roughen the surface of the wire while the workpiece is roughened. A method of cutting a workpiece characterized by cutting the workpiece.
前記粗面化部材を樹脂、シリコン、カーボン及びセラミックスのいずれかとすることを特徴とした請求項1に記載のワークの切断方法。   2. The workpiece cutting method according to claim 1, wherein the roughening member is any one of resin, silicon, carbon, and ceramics. 複数のワイヤガイド間に螺旋状に巻回された軸方向に走行するワイヤによって形成されるワイヤ列と、円柱状ワークと前記ワイヤとの接触部に加工液を供給するノズルと、前記ワークを保持しつつ押圧することで前記ワークを前記ワイヤ列に押し当てるワーク送り手段を具備し、前記ノズルから前記ワークと前記ワイヤとの接触部に加工液を供給しつつ、前記ワーク送り手段により保持された前記ワークを、走行する前記ワイヤ列に押し当てて切込み送りし、前記ワークをウェーハ状に切断するワークの切断装置であって、
前記ワイヤはベースワイヤ表面に有機皮膜を被覆したものであり、前記ワークより前記ワイヤ列のワイヤ操出側に、前記ワイヤ表面を粗面化するための粗面化部材を具備し、前記粗面化部材はワイヤ列方向に一定の押し圧で繰り出すことが可能なものであり、前記ワイヤと前記粗面化部材を接触させることで、前記ワイヤ表面を粗面化させながら前記ワークを切断するものであることを特徴としたワークの切断装置。
A wire array formed by wires running in an axial direction spirally wound between a plurality of wire guides, a nozzle for supplying a machining fluid to a contact portion between a cylindrical workpiece and the wire, and holding the workpiece The workpiece feeding means that presses the workpiece against the wire row by pressing the workpiece while being pressed, while being supplied to the contact portion between the workpiece and the wire from the nozzle, is held by the workpiece feeding means. The workpiece is a workpiece cutting device that presses and feeds the workpiece against the wire row that travels, and cuts the workpiece into a wafer shape,
Said wire is obtained by coating the organic skin layer on the base wire surface, the wire Feeding side of the from the work wire row, comprises roughening member for roughening the wire surface, the rough The chamfering member can be fed out with a constant pressing force in the wire row direction, and the workpiece is cut while the wire surface is roughened by bringing the wire into contact with the roughening member. A workpiece cutting device characterized by being a thing.
前記粗面化部材が樹脂、シリコン、カーボン及びセラミックスのいずれかであることを特徴とした請求項3に記載のワークの切断装置。   4. The workpiece cutting device according to claim 3, wherein the roughening member is one of resin, silicon, carbon, and ceramics.
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