JP5977489B2 - 散乱防止x線グリッド装置の製造方法 - Google Patents
散乱防止x線グリッド装置の製造方法 Download PDFInfo
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- JP5977489B2 JP5977489B2 JP2011140248A JP2011140248A JP5977489B2 JP 5977489 B2 JP5977489 B2 JP 5977489B2 JP 2011140248 A JP2011140248 A JP 2011140248A JP 2011140248 A JP2011140248 A JP 2011140248A JP 5977489 B2 JP5977489 B2 JP 5977489B2
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- 238000000034 method Methods 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 18
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- 238000000576 coating method Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 239000004593 Epoxy Substances 0.000 claims description 3
- 229920000052 poly(p-xylylene) Polymers 0.000 claims description 3
- 229910052770 Uranium Inorganic materials 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 229920001296 polysiloxane Polymers 0.000 claims description 2
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- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- 230000005855 radiation Effects 0.000 description 19
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
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- 238000009607 mammography Methods 0.000 description 3
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
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- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
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- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
- G21K1/025—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators using multiple collimators, e.g. Bucky screens; other devices for eliminating undesired or dispersed radiation
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Description
QIF=Tp 2/Tt
Tpは、グリッドを通る1次X線透過、Ttは全透過である。この式は、高い1次透過を達成する重要度を示している。1次X線が損失した場合、イメージング情報も失われ、従って、X線量を増大させなければならないか、或いは、画像品質の劣化を受け入れなければならない。QIFが1又はそれ以上であることは、画像品質が改善されたことを示し、QIF<1であることは、グリッドが実際に画像の品質に悪影響を与えていることを示している。
12 X線吸収要素
14 基材/透光材料
16 部分
18 チャンネル
20 側壁
30 線源
32 施工段階
34 第2の材料
36 残存チャンネル
40 供給源
42 第3の材料
44 施工段階
49 上面
50 管体
52 X線
90身体
54 吸収X線
56,58,60 経路
62 感光フィルム
64 増感スクリーン
Claims (10)
- 散乱防止X線グリッド装置(10)の製造方法であって、
X線を実質的に吸収しない第1の材料(16)を含み、複数の溝(18)を内部に有する基材(14)を準備する段階と、
前記複数の溝(18)の側壁(20)上にX線を実質的に吸収しない第2の材料(34)を含む層を施工する段階(32)と、
X線を実質的に吸収する第3の材料(42)を前記複数の溝(18)の一部に施行してこれにより複数のX線吸収要素(12)を形成する段階(44)と
を含む方法。 - 前記第2の材料(34)がコンフォーマルコーティングである、請求項1記載の方法。
- 前記第3の材料(42)が、鉛、タングステン、ウラニウム、金、鉛含有ポリマー、タングステン含有ポリマー及び金含有ポリマーのうちの少なくとも1種を含む、請求項1または2に記載の方法。
- 前記複数のX線吸収要素(12)の幅が約20μm未満である、請求項1乃至3のいずれかに記載の方法。
- 前記複数のX線吸収要素(12)の幅が約5μm〜約10μmである、請求項1乃至3のいずれかに記載の方法。
- 前記コンフォーマルコーティング(34)が、酸化物、窒化物、ポリマー、アクリル、エポキシ、ウレタン、シリコーン及びこれらの組合せを含む、
請求項2記載の方法。 - 前記コンフォーマルコーティング(34)がParylene(登録商標)である、請求項2記載の方法。
- 前記複数のX線吸収要素(12)が角度方向で構成される、請求項1乃至7のいずれか記載の方法。
- 層を施工する段階(32)が、前記複数の溝(18)の両側壁(20)上に層を施工する段階を含む、請求項1乃至8のいずれかに記載の方法。
- 前記グリッド装置(10)の上面(49)を平坦化する段階を更に含む、請求項1乃至9のいずれかに記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/824,811 | 2010-06-28 | ||
US12/824,811 US8265228B2 (en) | 2010-06-28 | 2010-06-28 | Anti-scatter X-ray grid device and method of making same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012005839A JP2012005839A (ja) | 2012-01-12 |
JP2012005839A5 JP2012005839A5 (ja) | 2014-07-31 |
JP5977489B2 true JP5977489B2 (ja) | 2016-08-24 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2011140248A Active JP5977489B2 (ja) | 2010-06-28 | 2011-06-24 | 散乱防止x線グリッド装置の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8265228B2 (ja) |
JP (1) | JP5977489B2 (ja) |
CN (1) | CN102389320B (ja) |
DE (1) | DE102011050963A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
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US9418022B2 (en) | 2012-07-26 | 2016-08-16 | Kabushiki Kaisha Toshiba | Storage system in which information is prevented |
US8959615B2 (en) | 2013-02-25 | 2015-02-17 | Kabushiki Kaisha Toshiba | Storage system in which fictitious information is prevented |
US8990530B2 (en) | 2013-02-28 | 2015-03-24 | Kabushiki Kaisha Toshiba | Storage system in which fictitious information is prevented |
US9204852B2 (en) | 2013-12-31 | 2015-12-08 | General Electric Company | Systems and methods for increased energy separation in multi-energy X-ray imaging |
DE102014202330B3 (de) * | 2014-02-10 | 2015-06-03 | Siemens Aktiengesellschaft | Single Source DualEnergy mit zwei Filtern zur Röntgenspektrumsdifferenzierung bei Strahlerblenden mit Schlitzplatte |
JP6448206B2 (ja) * | 2014-03-31 | 2019-01-09 | 株式会社フジキン | 積層型x線グリッド、その製造装置及び製法 |
CN107530036B (zh) * | 2015-12-25 | 2021-02-19 | 上海联影医疗科技股份有限公司 | 用于放射成像的装置、***和方法 |
US11211180B2 (en) * | 2017-04-28 | 2021-12-28 | Shanghai United Imaging Healthcare Co., Ltd. | Anti-scatter grid device and method for making the same |
JP6629372B2 (ja) * | 2018-03-15 | 2020-01-15 | 日本信号株式会社 | 放射線検査装置及び手荷物検査装置 |
DE102018107969B3 (de) | 2018-04-04 | 2019-06-19 | Leonhardt e. K. | Verfahren zum Herstellen eines Strahlleitrasters |
KR101997862B1 (ko) * | 2018-12-26 | 2019-07-08 | 제이피아이헬스케어 주식회사 | 격자형 x선 그리드 제조 방법 |
CN110236587B (zh) * | 2019-07-11 | 2024-03-01 | 上海联影医疗科技股份有限公司 | 防散射栅格制备方法、探测器装置及医疗影像设备 |
EP3796335A1 (en) * | 2019-09-18 | 2021-03-24 | Koninklijke Philips N.V. | X-ray anti scatter grid |
CN111337769B (zh) * | 2020-03-11 | 2022-03-29 | 西北核技术研究院 | 一种水平极化有界波电磁脉冲模拟器、线栅极板及线栅布置方法 |
JP7467178B2 (ja) * | 2020-03-16 | 2024-04-15 | キヤノンメディカルシステムズ株式会社 | コリメータ及びコリメータモジュール |
CN112378933B (zh) * | 2020-10-30 | 2023-01-10 | 中建材光芯科技有限公司 | 三维聚焦玻璃基防散射滤线栅及其制造方法 |
CN112409826A (zh) * | 2020-11-11 | 2021-02-26 | 上海酷聚科技有限公司 | 过滤杂射x射线的滤线栅及其制备方法、x射线探测器 |
CN112599283A (zh) * | 2020-12-17 | 2021-04-02 | 上海酷聚科技有限公司 | X射线滤线栅的制备方法、装置及x射线滤线栅 |
DE102022104180A1 (de) * | 2022-02-22 | 2023-08-24 | Schott Ag | Abschirmmaske für ionisierende Streustrahlung und Verfahren zu dessen Herstellung |
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US5418833A (en) | 1993-04-23 | 1995-05-23 | The Regents Of The University Of California | High performance x-ray anti-scatter grid |
IN187505B (ja) * | 1995-03-10 | 2002-05-11 | Gen Electric | |
US5581592A (en) * | 1995-03-10 | 1996-12-03 | General Electric Company | Anti-scatter X-ray grid device for medical diagnostic radiography |
US5557650A (en) | 1995-03-10 | 1996-09-17 | General Electric Company | Method for fabricating an anti-scatter X-ray grid device for medical diagnostic radiography |
DE19729596A1 (de) * | 1997-07-10 | 1999-01-14 | Siemens Ag | Streustrahlenraster |
US6177237B1 (en) | 1998-06-26 | 2001-01-23 | General Electric Company | High resolution anti-scatter x-ray grid and laser fabrication method |
US6366643B1 (en) * | 1998-10-29 | 2002-04-02 | Direct Radiography Corp. | Anti scatter radiation grid for a detector having discreet sensing elements |
JP2000217812A (ja) * | 1999-01-27 | 2000-08-08 | Fuji Photo Film Co Ltd | 散乱線除去グリッドおよびその製造方法 |
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DE10202987A1 (de) | 2002-01-26 | 2003-07-31 | Philips Intellectual Property | Gitter zur Absorption von Röntgenstrahlung |
DE10241424B4 (de) | 2002-09-06 | 2004-07-29 | Siemens Ag | Streustrahlenraster oder Kollimator sowie Verfahren zur Herstellung |
US7256402B1 (en) | 2004-04-15 | 2007-08-14 | Denny Lee | Flat panel X-ray imager with a grid structure |
DE102004027158B4 (de) | 2004-06-03 | 2010-07-15 | Siemens Ag | Verfahren zur Herstellung eines Streustrahlenrasters oder Kollimators aus absorbierendem Material |
US7463712B2 (en) | 2006-05-18 | 2008-12-09 | The Board Of Trustees Of The Leland Stanford Junior University | Scatter correction for x-ray imaging using modulation of primary x-ray spatial spectrum |
-
2010
- 2010-06-28 US US12/824,811 patent/US8265228B2/en active Active
-
2011
- 2011-06-09 DE DE102011050963A patent/DE102011050963A1/de not_active Withdrawn
- 2011-06-24 JP JP2011140248A patent/JP5977489B2/ja active Active
- 2011-06-28 CN CN201110190671.5A patent/CN102389320B/zh active Active
Also Published As
Publication number | Publication date |
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US20110317819A1 (en) | 2011-12-29 |
JP2012005839A (ja) | 2012-01-12 |
CN102389320A (zh) | 2012-03-28 |
CN102389320B (zh) | 2017-05-10 |
DE102011050963A1 (de) | 2012-01-12 |
US8265228B2 (en) | 2012-09-11 |
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