JP5922447B2 - Multiple wiring board - Google Patents

Multiple wiring board Download PDF

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JP5922447B2
JP5922447B2 JP2012054605A JP2012054605A JP5922447B2 JP 5922447 B2 JP5922447 B2 JP 5922447B2 JP 2012054605 A JP2012054605 A JP 2012054605A JP 2012054605 A JP2012054605 A JP 2012054605A JP 5922447 B2 JP5922447 B2 JP 5922447B2
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groove
wiring board
film
ceramic
metallized film
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JP2013191600A (en
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祐貴 鶴田
祐貴 鶴田
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NGK Electronics Devices Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting

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Description

本発明は、セラミック基体の上面とセラミック枠体の内周壁面で形成されるキャビティ部に、半導体素子や、圧電振動片等の電子部品素子が搭載された後に、蓋体が接合されて電子部品素子が気密に封止されるための複数の個片体のセラミックパッケージが分割溝で区切られて平面的に縦横方向に隣接して配列する母基板を備える多数個取り配線基板に関する。   According to the present invention, after an electronic component element such as a semiconductor element or a piezoelectric vibrating piece is mounted on a cavity formed by the upper surface of the ceramic base and the inner peripheral wall surface of the ceramic frame, the lid is joined to the electronic component. The present invention relates to a multi-piece wiring board including a mother board in which a plurality of individual ceramic packages for hermetically sealing elements are divided by dividing grooves and arranged adjacently in a vertical and horizontal direction in a plane.

近年、半導体素子や、圧電振動片等の電子部品素子を気密に収納させるためのセラミックパッケージは、電子部品素子を搭載させた装置、例えば、携帯電話や、パソコン等の小型化、高信頼性化等の要求に伴い、ますます軽薄短小化、高信頼性化等への対応が求められている。これに対応するために、セラミックパッケージには、アルミナ(Al)や、窒化アルミニウム(AlN)等のセラミック製からなるセラミック基体と、セラミック枠体の接合体で構成され、金属製の蓋体でシールする小型化であっても気密信頼性の高いセラミックパッケージが用いられている。 In recent years, ceramic packages for airtightly storing semiconductor components and electronic component elements such as piezoelectric vibrating reeds have become smaller and more reliable devices such as mobile phones and personal computers equipped with electronic component elements. In response to demands such as these, it is required to respond to increasingly lighter, smaller and more reliable devices. In order to cope with this, the ceramic package is composed of a ceramic base body made of ceramic such as alumina (Al 2 O 3 ) or aluminum nitride (AlN) and a ceramic frame body, and is made of a metal lid. A ceramic package with high hermetic reliability is used even if it is miniaturized to be sealed with a body.

このセラミックパッケージは、従来、金属製の蓋体でシールしてキャビティ部内の気密信頼性を確保するために、額縁状のセラミック枠体の上面に設けたメタライズ膜に金属製の枠体をろう付けさせた後、この金属製の枠体に金属製の蓋体を接合させていた。しかしながら、セラミックパッケージは、小型化の対応のために、額縁状のセラミック枠体の上面にめっき被膜で被覆された比較的膜厚みの厚いメタライズ膜に直接金属製の蓋体を接合させることが行われるようになってきた。しかも、セラミックパッケージは、安価に作製するために、複数枚の大型のセラミックグリーンシートの積層体に多数個の個片体のセラミックパッケージが縦横方向に配列する分割溝を押圧刃で押圧して設け、焼成、めっき被膜を形成した後に個片体に分割できるようにした多数個取り配線基板として形成されている。そして、この多数個取り配線基板は、隣接するセラミックパッケージの間に隙間を作ることなく設けた分割溝で分割することでそれぞれが所定の大きさになるようにしている。   This ceramic package has been conventionally brazed with a metal frame to the metallized film provided on the upper surface of the frame-shaped ceramic frame in order to seal with a metal lid and ensure airtight reliability in the cavity. Then, a metal lid was joined to the metal frame. However, in order to reduce the size of the ceramic package, a metal lid is directly bonded to a metallized film having a relatively thick film coated with a plating film on the upper surface of the frame-shaped ceramic frame. It has come to be. Moreover, in order to produce the ceramic package at a low cost, a plurality of large ceramic green sheet laminates are provided with a plurality of individual ceramic packages arranged in vertical and horizontal directions by pressing with a pressing blade. It is formed as a multi-piece wiring board that can be divided into individual pieces after firing, plating, and forming a plating film. The multi-piece wiring board is divided by a dividing groove provided without creating a gap between adjacent ceramic packages so that each of them has a predetermined size.

上記のセラミックパッケージは、小型化の対応のために、金属製の蓋体を接合させて気密を確保させるためのメタライズ膜のシールパス幅が狭くなるので、セラミック枠体の上面にメタライズ膜の引き下がり部分を設けることが難しくなっている。そこで、多数個取り配線基板は、隣接するセラミックパッケージの間の位置に、大型のセラミックグリーンシートの積層体に設けられたメタライズ印刷膜の上面から押圧刃で押圧させてセラミックグリーンシートに設け、焼成して、めっき被膜を形成した後に個片体に分割できるようにした分割溝を設けている。   In order to reduce the size of the ceramic package, the metallized film seal path width is reduced by joining a metal lid to ensure airtightness. It has become difficult to establish. Therefore, the multi-piece wiring substrate is provided on the ceramic green sheet by pressing with a pressing blade from the upper surface of the metallized printed film provided on the laminate of large ceramic green sheets at a position between adjacent ceramic packages. Thus, a dividing groove is provided so that it can be divided into individual pieces after the plating film is formed.

従来の多数個取り配線基板およびその製造方法、ならびに配線基板およびその製造方法には、複数の配線基板領域を有するセラミック基体と、セラミック基体の上面の複数の配線基板領域の境界線にレーザーで形成されたV字状の分割溝と、分割溝に接するそれぞれの配線基板領域の周縁部に形成された、金属めっき膜で被覆された環状導体とを備え、分割溝の内面がセラミック基板から金属めっき膜にかけてガラス層で覆われているものが提案されている(例えば、特許文献1参照)。これによると、金属めっき膜で被覆された環状導体およびV字状の分割溝が精度良く形成された多数個取り配線基板およびその製造方法、ならびに配線基板およびその製造方法を提供できるとしている。   The conventional multi-cavity wiring board and its manufacturing method, and the wiring board and its manufacturing method include a ceramic substrate having a plurality of wiring substrate regions and a laser formed on the boundary line between the plurality of wiring substrate regions on the upper surface of the ceramic substrate. And a ring-shaped conductor coated with a metal plating film formed at the peripheral edge of each wiring board region in contact with the dividing groove, and the inner surface of the dividing groove is metal-plated from the ceramic substrate. The thing covered with the glass layer over the film | membrane is proposed (for example, refer patent document 1). According to this, it is possible to provide a multi-piece wiring board in which an annular conductor covered with a metal plating film and a V-shaped dividing groove are accurately formed, a manufacturing method thereof, and a wiring board and a manufacturing method thereof.

また、従来の多数個取り配線基板の製造方法には、セラミック母基板の上面に、各々主面(上面)外周部に枠状の封止用メタライズ層が形成された複数の配線基板領域を配列形成するとともに、セラミック母基板の上面に配線基板領域を個々に区切る分割溝を形成した多数個取りセラミック配線基板の製造方法であって、セラミック母基板用の未焼成セラミック成形体の上面に、未焼成セラミック成形体より大きな焼成収縮率を有する封止用メタライズ層用の金属ペーストを塗布する工程と、未焼成セラミック成形体の上面に分割溝用の切り込みを形成する工程と、未焼成セラミック成形体および金属ペーストを焼成する工程を含むものが提案されている(例えば、特許文献2参照)。これによると、セラミック母基板を分割溝に沿って容易かつ正確に分割することができるとしている。   In addition, in the conventional method for manufacturing a multi-piece wiring board, a plurality of wiring board regions each having a frame-shaped sealing metallization layer formed on the outer periphery of the main surface (upper surface) are arranged on the upper surface of the ceramic mother board A multi-cavity ceramic wiring board manufacturing method in which a dividing groove for individually dividing a wiring board region is formed on an upper surface of a ceramic mother board, wherein the upper surface of an unfired ceramic molded body for the ceramic mother board A step of applying a metal paste for a sealing metallization layer having a larger firing shrinkage ratio than the fired ceramic molded body, a step of forming cuts for dividing grooves on the upper surface of the unfired ceramic molded body, and an unfired ceramic molded body And the thing including the process of baking a metal paste is proposed (for example, refer patent document 2). According to this, the ceramic mother board can be easily and accurately divided along the dividing grooves.

特開2012−9767号公報JP 2012-9767 A 特開2001−44599号公報JP 2001-44599 A

しかしながら、前述したような従来の多数個取り配線基板には、次のような問題がある。
上記の分割溝を設けた多数個取り配線基板は、比較的膜厚みの厚いメタライズ印刷膜が押圧刃で押圧されてセラミックグリーンシートに設けられた分割溝の壁面にタングステンや、モリブデン等の高融点金属からなるメタライズ印刷膜が付着することで、焼成時のセラミックグリーンシートの収縮で分割溝の壁面同士を接着させるようになっている。また、付着したメタライズ膜には、めっき被膜が形成されるので、さらに分割溝を塞ぐようになっている。従って、多数個取り配線基板は、個片体に分割させるときの分割性が悪くなると共に、分割後のセラミックパッケージの端面に欠けや、バリを発生させることとなっている。
However, the conventional multi-cavity wiring board as described above has the following problems.
The multi-cavity wiring board provided with the above-mentioned dividing grooves has a high melting point such as tungsten or molybdenum on the wall surface of the dividing grooves provided in the ceramic green sheet by pressing a relatively thick metallized printed film with a pressing blade. By attaching a metallized printing film made of metal, the wall surfaces of the divided grooves are bonded to each other by shrinkage of the ceramic green sheet during firing. In addition, since the plating film is formed on the attached metallized film, the dividing groove is further closed. Therefore, the multi-cavity wiring board is not easily divided when it is divided into individual pieces, and chipping or burrs are generated on the end face of the divided ceramic package.

また、特開2012−9767号公報で開示されるような多数個取り配線基板は、分割溝を焼成、めっき被膜形成後にレーザーで形成し、しかも、分割溝の壁面にはガラス層が形成されているので、個片体に分割させるときの分割性を阻害するものがなく、分割後のセラミックパッケージの端面に欠けや、バリの発生を防止することができる。しかしながら、レーザーで分割溝を形成する多数個取り配線基板には、レーザーで溶融されためっき被膜や、メタライズ膜や、セラミック基板の溶融屑が電子部品を収納するためのキャビティ部の外周部上面である蓋体を接合させる部分に飛び散って、蓋体を接合させるときの接合性を阻害し、気密信頼性を低下させることとなっている。   In addition, a multi-cavity wiring board as disclosed in Japanese Patent Application Laid-Open No. 2012-9767 is formed with a laser after baking the dividing groove and forming a plating film, and a glass layer is formed on the wall surface of the dividing groove. Therefore, there is nothing that hinders the splitting property when splitting into individual pieces, and it is possible to prevent the end face of the ceramic package after splitting and the occurrence of burrs. However, the multi-cavity wiring board that forms the dividing grooves with a laser has a plating film melted with a laser, a metallized film, and a molten scrap of a ceramic substrate on the upper surface of the outer peripheral part of the cavity part for storing electronic components. It is scattered to the part which joins a certain cover body, the joining property when joining a cover body is inhibited, and airtight reliability is reduced.

更に、特開2001−44599号公報で開示されるような多数個取り配線基板の製造方法は、セラミックグリーンシートより大きな焼成収縮率を有するメタライズ印刷膜を設けて焼成して形成するものである。この製造方法で作製された多数個取り配線基板は、分割溝の隙間を広げて分割性を向上できるものの、セラミックグリーンシートとメタライズ印刷膜の焼成収縮率差によって、多数個取り配線基板には反りを発生させることとなり、蓋体を接合させるときの接合性を阻害し、気密信頼性を低下させることとなっている。   Furthermore, the method for manufacturing a multi-piece wiring board as disclosed in Japanese Patent Laid-Open No. 2001-44599 is formed by providing a metallized printed film having a firing shrinkage ratio larger than that of a ceramic green sheet and firing it. The multi-cavity wiring board produced by this manufacturing method can improve the splitting ability by widening the gaps of the dividing grooves, but warps the multi-cavity wiring board due to the difference in firing shrinkage between the ceramic green sheet and the metallized printed film. Therefore, the bonding property when the lid is bonded is hindered, and the airtight reliability is lowered.

本発明は、かかる事情に鑑みてなされたものであって、分割溝の分割性を確保すると共に、分割後のセラミックパッケージに欠けや、バリの発生を防止する気密信頼性を高くできる多数個取り配線基板を提供することを目的とする。   The present invention has been made in view of such circumstances, and ensures multiple parts that can be divided and can improve the hermetic reliability to prevent chipping and burrs from occurring in the divided ceramic package. An object is to provide a wiring board.

前記目的に沿う本発明に係る多数個取り配線基板は、一方の主面側の中央部に電子部品素子を収納するための四角形状のキャビティ部と、キャビティ部の外周部上面にめっき被膜で被覆されたメタライズ膜を有する複数の個片体のセラミックパッケージが縦横方向に隣接して配列する母基板の両主面の少なくとも一方の主面側のセラミックパッケージの境界に形成されV字状の分割溝を備える多数個取り配線基板において、
外周部上面は、その全域がメタライズ膜により被覆され、メタライズ膜は、分割溝と符合する位置に、分割溝よりも溝幅が広い凹溝部を有していることを特徴とするものである。
The multi-cavity wiring board according to the present invention that meets the above-mentioned object is a quadrangular cavity portion for housing an electronic component element in the central portion on one main surface side, and the upper surface of the outer peripheral portion of the cavity portion is covered with a plating film. has been of a plurality of pieces having a metallized film ceramic package of both main surfaces of the mother substrate to be arranged adjacent to the vertical and horizontal directions of the at least one main surface side V-shaped where Ru made form the boundary of the ceramic package In the multi-cavity wiring board with division grooves,
The entire upper surface of the outer peripheral portion is covered with a metallized film, and the metallized film has a groove having a groove width wider than that of the divided groove at a position coinciding with the divided groove.

上記の多数個取り配線基板において、凹溝部は、メタライズ膜の複数層で構成され、凹溝部の底部を構成する下層側メタライズ膜の膜厚みTが凹溝部の溝深さ部を構成する上層側メタライズ膜の膜厚みT以下(T≦Tであり、凹溝部において上層メタライズ膜の端面間の距離は0.07〜0.15mmの範囲内であり、溝幅の二等分線部に分割溝を有するのがよい。
In multiple patterning wiring board of the concave groove portion is composed of a plurality of layers of metallized film, the upper layer film thickness T 1 of the lower side metallized film constituting the bottom of the groove portion constituting the groove depth of the concave groove The thickness of the side metallized film is equal to or less than T 2 (T 1 ≦ T 2 ) , and the distance between the end surfaces of the upper metallized film in the concave groove is in the range of 0.07 to 0.15 mm. It is good to have a dividing groove in the line part.

上記の多数個取り配線基板では、分割溝は、隣接して配列するそれぞれのセラミックパッケージを区分する領域に位置し、分割溝を設けた部位のめっき被膜で被覆されたメタライズ膜には、凹溝部が設けられているので、薄くなったメタライズ膜に設けられた分割溝の隙間を広げることができると共に、セラミックグリーンシートに達している分割溝の壁面にタングステンや、モリブデン等の高融点金属からなるメタライズ印刷膜の付着を少なくできて、焼成時のセラミックグリーンシートの収縮で分割溝の壁面同士の接着を防止でき、しかも、めっき被膜の被覆でも分割溝を塞ぐのを防止でき、個片体に分割させるときの分割性を良好にできる多数個取り配線基板を提供することができる。そして、分割後のセラミックパッケージの端面に欠けや、バリの発生を防止して蓋体接合時の接合性を確保できると共に、接合後の気密信頼性を確保できる多数個取り配線基板を提供することができる。   In the multi-cavity wiring board described above, the dividing groove is located in a region where each adjacent ceramic package is divided, and the metallized film coated with the plating film of the portion where the dividing groove is provided has a groove portion. Since the gap between the divided grooves provided in the thinned metallized film can be widened, the wall surface of the divided groove reaching the ceramic green sheet is made of a refractory metal such as tungsten or molybdenum. The adhesion of the metallized printed film can be reduced, the ceramic green sheet shrinks during firing to prevent adhesion between the walls of the split grooves, and even with the plating film covering, the split grooves can be prevented from being blocked. It is possible to provide a multi-piece wiring board that can improve the dividing property when divided. To provide a multi-cavity wiring board that can prevent chipping and burrs from occurring on the end face of a divided ceramic package to ensure the bonding property at the time of lid bonding, and can also ensure hermetic reliability after bonding. Can do.

特に、上記の多数個取り配線基板では、凹溝部は、メタライズ膜の複数層で構成され、凹溝部の底部を構成する下層側メタライズ膜の膜厚みTが凹溝部の溝深さ部を構成する上層側メタライズ膜の膜厚みT以下(T≦T)と、凹溝部の溝幅が0.07〜0.15mmを有し、溝幅の二等分線部に分割溝を有するので、メタライズ膜の全体膜厚みの半分以下の膜厚み部分に形成された分割溝であり、分割溝の隙間を広げることができると共に、焼成前のセラミックグリーンシートに達している分割溝の壁面にタングステンや、モリブデン等の高融点金属からなるメタライズ印刷膜の付着を少なくでき、焼成時のセラミックグリーンシートの収縮で分割溝の壁面同士の接着を防止でき、しかも、焼成後のめっき被膜の被覆でも分割溝を塞ぐのを防止でき、個片体に分割させるときの分割性を良好にできる多数個取り配線基板を提供することができる。また、0.07〜0.15mmの溝幅の二等分線部に形成された分割溝であり、分割溝形成時の押圧刃へのメタライズ印刷膜の付着を少なくできて焼成時のセラミックグリーンシートの収縮での分割溝壁面同士の接着を防止でき、分割性を良好にできる多数個取り配線基板を提供することができる。そして、分割後のセラミックパッケージの端面に欠けや、バリの発生を防止して蓋体接合時の接合性を確保できると共に、接合後の気密信頼性を確保できる多数個取り配線基板を提供することができる。 In particular, the multi-cavity circuit board of the concave groove portion is composed of a plurality of layers of metallized film, film thickness T 1 of the lower side metallized film constituting the bottom of the groove portion constituting the groove depth of the concave groove a film thickness of the upper side metallized film T 2 follows (T 1T 2), the groove width of the groove portion has a 0.07~0.15Mm, the dividing grooves on the bisector of the groove width Therefore, it is a split groove formed in a film thickness portion that is less than half of the total film thickness of the metallized film, can widen the gap of the split groove, and on the wall surface of the split groove reaching the ceramic green sheet before firing Adhesion of metallized printed films made of refractory metals such as tungsten and molybdenum can be reduced, and the adhesion of the wall surfaces of the split grooves can be prevented by shrinkage of the ceramic green sheet during firing, and even after coating of the plated coating after firing Dividing groove Closing the can be prevented, it is possible to provide a multi-piece wiring substrate capable of satisfactorily split of when to split into pieces body. In addition, it is a divided groove formed in a bisector having a groove width of 0.07 to 0.15 mm, and can reduce the adhesion of the metallized printed film to the pressing blade when forming the divided groove, and ceramic green during firing It is possible to provide a multi-piece wiring board that can prevent adhesion between the wall surfaces of the dividing grooves due to contraction of the sheet and can improve the dividing property. To provide a multi-cavity wiring board that can prevent chipping and burrs from occurring on the end face of a divided ceramic package to ensure the bonding property at the time of lid bonding, and can also ensure hermetic reliability after bonding. Can do.

本発明の一実施の形態に係る多数個取り配線基板の斜視説明図である。It is a perspective explanatory view of a multi-piece wiring board according to an embodiment of the present invention. (A)、(B)はそれぞれ同多数個取り配線基板の部分拡大平面図、A−A’線拡大縦断面図である。(A) and (B) are a partial enlarged plan view and an A-A 'line enlarged vertical sectional view of the same multi-piece wiring board, respectively.

続いて、添付した図面を参照しつつ、本発明を具体化した実施するための形態について説明し、本発明の理解に供する。
図1、図2(A)、(B)に示すように、本発明の一実施の形態に係る多数個取り配線基板10は、複数の個片体のセラミックパッケージ11が縦方向と横方向に隣接して配列する母基板12と、母基板12の外周部にダミー部13を有している。そして、多数個取り配線基板10には、両主面の少なくとも一方の主面にセラミックパッケージ11の境界に押圧刃(図示せず)で縦方向と、この縦方向と直交する横方向に押圧して形成された断面視してV字状の分割溝14を備えている。
Next, with reference to the accompanying drawings, embodiments for embodying the present invention will be described for understanding of the present invention.
As shown in FIGS. 1, 2A and 2B, a multi-piece wiring board 10 according to an embodiment of the present invention has a plurality of pieces of ceramic packages 11 in a vertical direction and a horizontal direction. The mother board 12 arranged adjacently and the dummy part 13 are provided on the outer periphery of the mother board 12. The multi-piece wiring board 10 is pressed in the vertical direction and the horizontal direction perpendicular to the vertical direction by a pressing blade (not shown) at the boundary of the ceramic package 11 on at least one main surface of both main surfaces. A V-shaped dividing groove 14 is provided as viewed in cross section.

上記の多数個取り配線基板10は、母基板12を上記の分割溝14で分割したときに個片体のセラミックパッケージ11となる中央部に、セラミック基体15の上面とセラミック枠体16の内周壁面で形成され、半導体素子や、圧電振動片等の電子部品素子を搭載させるためのキャビティ部17を有している。また、このセラミックパッケージ11には、通常、平板状のセラミック基体15の上面に、タングステン(W)や、モリブデン(Mo)等の高融点金属からなるメタライズ膜18で形成された電子部品素子接続用パッドを含む配線導体が設けられている。また、セラミックパッケージ11には、セラミック基体15の下面に、上記と同様の高融点金属からなるメタライズ膜18で形成された外部接続端子パッドが設けられている。更に、セラミックパッケージ11には、キャビティ部17の外周部である額縁状のセラミック枠体16の上面に上記と同様のメタライズ膜18で形成された蓋体接合用パッドが設けられている。更には、セラミックパッケージ11には、セラミック基体15の上面と、下面のメタライズ膜18間や、セラミック基体15と、セラミック枠体16のメタライズ膜18間を電気的に導通状態とするための配線導体が設けられている。なお、多数個取り配線基板10に設けられたメタライズ膜18の外部に露出する部分には、その上面を被覆するNi及びAuめっきからなるめっき被膜19を有している。   The multi-cavity wiring board 10 has the upper surface of the ceramic substrate 15 and the inner periphery of the ceramic frame 16 at the central portion that becomes the single-piece ceramic package 11 when the mother board 12 is divided by the dividing grooves 14. It is formed of a wall surface, and has a cavity portion 17 for mounting an electronic component element such as a semiconductor element or a piezoelectric vibrating piece. The ceramic package 11 is usually used for connecting an electronic component element formed of a metallized film 18 made of a refractory metal such as tungsten (W) or molybdenum (Mo) on the upper surface of a flat ceramic substrate 15. A wiring conductor including a pad is provided. The ceramic package 11 is provided with an external connection terminal pad formed of a metallized film 18 made of a refractory metal similar to the above on the lower surface of the ceramic substrate 15. Further, the ceramic package 11 is provided with a lid bonding pad formed of a metallized film 18 similar to the above on the upper surface of a frame-shaped ceramic frame 16 which is the outer peripheral portion of the cavity portion 17. Further, in the ceramic package 11, a wiring conductor for electrically connecting between the upper and lower metallized films 18 of the ceramic substrate 15 and between the ceramic substrate 15 and the metallized film 18 of the ceramic frame 16. Is provided. Note that a portion exposed to the outside of the metallized film 18 provided on the multi-piece wiring substrate 10 has a plating film 19 made of Ni and Au plating covering its upper surface.

多数個取り配線基板10は、めっき被膜19を形成した後、分割溝14で分割することで、ダミー部13が除去されると共に、複数の個片体のセラミックパッケージ11が作製されるようになっている。そして、セラミックパッケージ11には、キャビティ部17の電子部品素子接続用パッドに電子部品素子が搭載されるようになっている。更に、セラミックパッケージ11は、蓋体接合用パッドにセラミックと熱膨張係数が近似するKV(Fe−Ni−Co系合金、商品名「Kover(コバール)」)や、42アロイ(Fe−Ni系合金)等からなる金属板からなる蓋体を直接AuSn等のロー材でシーム溶接してキャビティ部17内に電子部品素子が気密に封止されるようになっている。   The multi-cavity wiring board 10 is divided by the dividing grooves 14 after the plating film 19 is formed, whereby the dummy portion 13 is removed and a plurality of individual ceramic packages 11 are produced. ing. In the ceramic package 11, electronic component elements are mounted on the electronic component element connection pads of the cavity portion 17. Further, the ceramic package 11 is made of KV (Fe—Ni—Co based alloy, trade name “Kover”) or 42 alloy (Fe—Ni based alloy) whose thermal expansion coefficient is close to that of the ceramic bonding pad. The lid made of a metal plate made of or the like is directly seam welded with a brazing material such as AuSn so that the electronic component element is hermetically sealed in the cavity portion 17.

多数個取り配線基板10は、そこに設けられた分割溝14が隣接して配列するセラミックパッケージ11を区分する領域に位置している。そして、多数個取り配線基板10は、分割溝14を設けた部位のめっき被膜19で被覆されたメタライズ膜18には、凹溝部20が設けられている。この多数個取り配線基板10は、焼成する前の分割溝14を焼成する前の複数枚の大型のセラミックグリーンシートの積層体に設けられた焼成する前のメタライズ膜18の上面から押圧刃で押圧して多数個の個片体の焼成する前のセラミックパッケージ11が縦横方向に隣接して配列するように設けている。更に、多数個取り配線基板10は、この積層体をセラミックグリーンシートと、焼成する前のメタライズを還元雰囲気中で同時焼成して焼成体を形成し、焼成体の外部に露出しているメタライズ膜18の上面にNiめっき被膜、及びNiめっき被膜の上面にAuめっき被膜からなるめっき被膜19を形成している。そして、多数個取り配線基板10は、個片体のセラミックパッケージ11を分割溝14で分割させることで形成できるようにしている。   The multi-cavity wiring substrate 10 is located in a region that divides the ceramic package 11 in which the division grooves 14 provided in the wiring substrate 10 are adjacently arranged. In the multi-piece wiring board 10, a concave groove portion 20 is provided in the metallized film 18 covered with the plating film 19 in the portion where the dividing groove 14 is provided. The multi-piece wiring board 10 is pressed by a pressing blade from the upper surface of the metallized film 18 before firing provided in the laminate of a plurality of large ceramic green sheets before firing the dividing grooves 14 before firing. The ceramic packages 11 before firing a large number of individual pieces are arranged so as to be adjacent to each other in the vertical and horizontal directions. Further, the multi-piece wiring substrate 10 is formed by simultaneously firing this laminate in a reducing atmosphere with a ceramic green sheet and metallization before firing to form a fired body, and the metallized film exposed to the outside of the fired body. An Ni plating film is formed on the upper surface of 18, and a plating film 19 made of an Au plating film is formed on the upper surface of the Ni plating film. The multi-piece wiring substrate 10 can be formed by dividing the single-piece ceramic package 11 by the dividing grooves 14.

なお、上記の多数個取り配線基板10を形成するためのセラミックグリーンシートは、通常、アルミナや、窒化アルミニウムや、低温焼成セラミック等があり、特に材料が限定されるものではない。例えば、セラミック基材にアルミナを用いる場合には、先ず、酸化アルミニウム粉末にマグネシア、シリカ、カルシア等の焼結助剤を適当量加えた粉末に、ジオクチフタレート等の可塑剤と、アクリル樹脂等のバインダー、及びトルエン、キシレン、アルコール類等の溶剤を加え、十分に混練して脱泡し、粘度2000〜40000cpsのスラリーを作製し、ドクターブレード法等によって所望の厚み、例えば、0.25mmのシート状に乾燥させ、所望の大きさの矩形状に切断してセラミックグリーンシートを形成している。この多数個取り配線基板10では、セラミック基体15用と、セラミック枠体16用の複数枚のセラミックグリーンシートを用い、それぞれのセラミックグリーンシートにキャビティ部17や、上下層の配線導体を電気的に導通させるためのビアや、スルーホール導体を形成するための貫通孔等を打ち抜きプレスや、パンチングマシーン等を用いて形成し、スクリーン印刷機を用いてメタライズペーストで配線導体を形成している。そして、これらのセラミックグリーンシートは、重ね合わせて温度と、圧力を掛けて接着し、積層体を形成し、この積層体に焼成する前の分割溝14が形成されるようになっている。   The ceramic green sheet for forming the multi-piece wiring board 10 is usually alumina, aluminum nitride, low-temperature fired ceramic, etc., and the material is not particularly limited. For example, when using alumina as the ceramic substrate, first, a powder obtained by adding an appropriate amount of a sintering aid such as magnesia, silica, calcia to aluminum oxide powder, a plasticizer such as dioctiphthalate, an acrylic resin, etc. And a solvent such as toluene, xylene, alcohols, etc. are added, kneaded thoroughly and defoamed to prepare a slurry having a viscosity of 2000 to 40000 cps, and a desired thickness, for example, 0.25 mm, is obtained by a doctor blade method or the like. The ceramic green sheet is formed by drying into a sheet and cutting into a rectangular shape of a desired size. In this multi-cavity wiring board 10, a plurality of ceramic green sheets for the ceramic substrate 15 and the ceramic frame 16 are used, and the cavity portion 17 and upper and lower wiring conductors are electrically connected to each ceramic green sheet. Vias for conducting, through holes for forming through-hole conductors, and the like are formed using a punching press, a punching machine, or the like, and a wiring conductor is formed with a metallized paste using a screen printer. These ceramic green sheets are superposed and bonded by applying temperature and pressure to form a laminated body, and the divided grooves 14 before firing are formed on the laminated body.

上記の多数個取り配線基板10は、焼成する前の積層体に分割溝14を、焼成する前の凹溝部20の底部である薄くなった焼成前のメタライズ膜18に押圧刃で押圧して設けるので、焼成する前の分割溝14のメタライズ膜18間の隙間を広げると共に、セラミックグリーンシートに達している焼成する前の分割溝14の壁面にタングステンや、モリブデン等の高融点金属からなる焼成する前のメタライズ膜18の付着を少なくできて、焼成時のセラミックグリーンシートの収縮による焼成時の分割溝14の壁面同士の接着を防止できる。しかも、多数個取り配線基板10は、分割溝14の壁面へのメタライズ膜18の付着が少ないことで、焼成後のめっき被膜19の被覆においてもメタライズ膜18に付着するめっき被膜19が少ないので、分割溝14を塞ぐのを防止できる。従って、上記の分割溝14は、個片体に分割させるときの分割性を良好にできる多数個取り配線基板10を提供することができる。そして、上記の分割溝14は、分割後のセラミックパッケージ11の端面に欠けや、バリの発生を防止する多数個取り配線基板10を提供することができる。   The multi-cavity wiring board 10 is provided with the dividing grooves 14 in the laminate before baking, and the metallized film 18 before baking, which is the bottom of the concave groove 20 before baking, by pressing with a pressing blade. Therefore, the gap between the metallized films 18 in the divided grooves 14 before firing is widened, and the wall surface of the divided grooves 14 reaching the ceramic green sheet is fired made of a refractory metal such as tungsten or molybdenum. The adhesion of the previous metallized film 18 can be reduced, and adhesion of the wall surfaces of the dividing grooves 14 during firing due to shrinkage of the ceramic green sheet during firing can be prevented. In addition, since the multi-piece wiring board 10 has less adhesion of the metallized film 18 to the wall surface of the dividing groove 14, the plating film 19 that adheres to the metallized film 18 is less in the coating of the plated film 19 after firing. It is possible to prevent the dividing groove 14 from being blocked. Therefore, the dividing groove 14 can provide the multi-piece wiring board 10 that can improve the dividing property when the dividing groove 14 is divided into individual pieces. And the said division | segmentation groove | channel 14 can provide the multi-piece wiring board 10 which prevents a chip | tip and the generation | occurrence | production of a burr | flash on the end surface of the ceramic package 11 after a division | segmentation.

上記の多数個取り配線基板10では、凹溝部20は、メタライズ膜18の複数層で構成され、凹溝部20の底部を構成する下層側メタライズ膜18aの膜厚みTが凹溝部20の溝深さ部を構成する上層側メタライズ膜18bの膜厚みT以下、すなわちT≦Tとであるのがよい。下層側メタライズ膜18aの膜厚みT、及び上層側メタライズ膜18bの膜厚みTは、特に、その値を限定するものではないが、Tが5〜11μm程度、Tが11〜18μm程度、T+Tでは17〜28μm程度で、Tの部分に分割溝14が設けられており、めっき被膜19が被覆されたT+Tの部分に蓋体が直接AuSn等のロー材でシーム溶接されるようになっている。また、上記の多数個取り配線基板10では、凹溝部20は、凹溝部20の溝幅が0.07〜0.15mmを有し、この溝幅の二等分線部に分割溝14を有するのがよい。 In the multi-cavity wiring board 10 described above, the groove 20 is composed of a plurality of layers of the metallized film 18, and the film thickness T 1 of the lower metallized film 18 a constituting the bottom of the groove 20 is the groove depth of the groove 20. It is preferable that the thickness of the upper metallization film 18b constituting the thickness portion is equal to or less than T 2 , that is, T 1 ≦ T 2 . The film thickness T 1 of the lower metallization film 18 a and the film thickness T 2 of the upper metallization film 18 b are not particularly limited, but T 1 is about 5 to 11 μm and T 2 is 11 to 18 μm. extent, T 1 + T 2 in the order of 17~28Myuemu, and the dividing grooves 14 is provided in a portion of the T 1, the lid body portion of the T 1 + T 2 where the plating film 19 is coated brazing material directly such as AuSn With seam welding. Further, in the multi-cavity wiring board 10 described above, the recessed groove portion 20 has a groove width of 0.07 to 0.15 mm, and the dividing groove 14 is provided at a bisector of the groove width. It is good.

上記の分割溝14は、焼成前のそれぞれのセラミックグリーンシートにメタライズペーストで印刷して形成され、複数枚のセラミックグリーンシート積層体となった焼成前の凹溝部20底部に露出する焼成前の下層側メタライズ膜18aの溝幅の二等分線部の上面から、通常、15〜50°程度の刃先角度、0.25〜0.8mm程度の刃厚の押圧刃で押圧して形成している。従って、焼成前の分割溝14は、焼成後の凹溝部20の溝幅が0.07〜0.15mmであれば、焼成前の上層側メタライズ膜18bに接触させることなく、焼成後の分割性を確保できる深さの焼成前の分割溝14を形成することができる。なお、焼成後の凹溝部20の溝幅が0.07mmを下まわる場合には、焼成前の上層側メタライズ膜18bに接触させることなく、焼成後の分割性を確保できる深さの焼成前の分割溝14を形成することが難しくなる。また、焼成後の凹溝部20の溝幅が0.15mmを超える場合には、めっき被膜19が被覆されたT+Tの部分に蓋体を直接AuSn等のロー材でシーム溶接してキャビティ部17内に電子部品素子を気密に封止させるシールパス幅が狭くなり、キャビティ部17の気密信頼性を確保することが難しくなる。 The dividing groove 14 is formed by printing with a metallized paste on each ceramic green sheet before firing, and is a lower layer before firing exposed at the bottom of the recessed groove portion 20 before firing that is a laminate of a plurality of ceramic green sheets. It is usually formed by pressing from the upper surface of the bisector of the groove width of the side metallized film 18a with a pressing blade having a blade edge angle of about 15 to 50 ° and a blade thickness of about 0.25 to 0.8 mm. . Therefore, if the groove width of the groove 20 after baking is 0.07 to 0.15 mm, the dividing groove 14 before baking does not come into contact with the upper metallized film 18b before baking and is divided after baking. It is possible to form the dividing groove 14 before firing with a depth that can ensure the above. In addition, when the groove width of the recessed groove part 20 after baking is less than 0.07 mm, the depth before baking of the depth which can ensure the division | segmentation property after baking is ensured, without contacting the upper layer side metallized film 18b before baking. It becomes difficult to form the dividing groove 14. Further, when the groove width of the recessed groove portion 20 after firing exceeds 0.15 mm, the lid is directly seam welded to the portion of T 1 + T 2 coated with the plating film 19 with a brazing material such as AuSn, and the cavity is formed. The seal path width for hermetically sealing the electronic component element in the portion 17 becomes narrow, and it becomes difficult to ensure the hermetic reliability of the cavity portion 17.

本発明の多数個取り配線基板は、分割溝で分割して個片体としたセラミックパッケージに半導体素子や、圧電振動片等の電子部品素子を収納し、蓋体で気密に封止し実装させて、小型で、高信頼性が要求される、例えば、携帯電話や、ノートブック型のパソコン等の電子装置に組み込まれて用いることができる。   The multi-cavity wiring board of the present invention contains a semiconductor element and an electronic component element such as a piezoelectric vibrating piece in a ceramic package divided into individual pieces by dividing grooves, and hermetically sealed and mounted by a lid. For example, it can be used by being incorporated in an electronic device such as a mobile phone or a notebook personal computer, which is small and requires high reliability.

10:多数個取り配線基板、11:セラミックパッケージ、12:母基板、13:ダミー部、14:分割溝、15:セラミック基体、16:セラミック枠体、17:キャビティ部、18:メタライズ膜、18a:下層側メタライズ膜、18b:上層側メタライズ膜、19:めっき被膜、20:凹溝部   10: Multi-cavity wiring board, 11: Ceramic package, 12: Mother board, 13: Dummy part, 14: Dividing groove, 15: Ceramic substrate, 16: Ceramic frame, 17: Cavity part, 18: Metallized film, 18a : Lower layer side metallized film, 18b: Upper layer side metallized film, 19: Plating film, 20: Concave groove

Claims (2)

一方の主面側の中央部に電子部品素子を収納するための四角形状のキャビティ部と、該キャビティ部の外周部上面にめっき被膜で被覆されたメタライズ膜を有する複数の個片体のセラミックパッケージが縦横方向に隣接して配列する母基板の両主面の少なくとも前記一方の主面側の前記セラミックパッケージの境界に形成されV字状の分割溝を備える多数個取り配線基板において、
前記外周部上面は、その全域が前記メタライズ膜により被覆され、
前記メタライズ膜は、前記分割溝と符合する位置に、前記分割溝よりも溝幅が広い凹溝部を有していることを特徴とする多数個取り配線基板。
A plurality of single-piece ceramic packages having a rectangular cavity portion for housing an electronic component element in the central portion on one main surface side, and a metallized film coated with a plating film on the upper surface of the outer peripheral portion of the cavity portion in multiple patterning wiring board comprising but the ceramic package V-shaped dividing grooves Ru made form the boundaries of at least the one main surface side of both the main surfaces of the mother substrate to be arranged adjacent to the vertical and horizontal directions,
The upper surface of the outer peripheral portion is entirely covered with the metallized film,
The multi-piece wiring board according to claim 1, wherein the metallized film has a concave groove portion having a groove width wider than the divided groove at a position coinciding with the divided groove .
請求項1記載の多数個取り配線基板において、
前記凹溝部は、前記メタライズ膜の複数層で構成され、前記凹溝部の底部を構成する下層側メタライズ膜の膜厚みTが前記凹溝部の溝深さ部を構成する上層側メタライズ膜の膜厚みT以下(T≦Tであり
前記凹溝部において前記上層メタライズ膜の端面間の距離は0.07〜0.15mmの範囲内であり、
前記溝幅の二等分線部に前記分割溝を有すること特徴とする多数個取り配線基板。
In the multi-piece wiring board according to claim 1,
The groove portion, the is composed of a plurality of layers of metallized film, film of the upper metallization film layer thickness T 1 of the lower side metallized film constituting the bottom of the groove portion constituting the groove depth of the groove portion and a thickness T 2 or less (T 1T 2),
The distance between the end faces of the upper metallized film in the concave groove is in the range of 0.07 to 0.15 mm,
Multiple patterning wiring board characterized by having the dividing groove on a bisector of said groove width.
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