JP5794803B2 - 分光光学計及びその校正方法 - Google Patents
分光光学計及びその校正方法 Download PDFInfo
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- JP5794803B2 JP5794803B2 JP2011069808A JP2011069808A JP5794803B2 JP 5794803 B2 JP5794803 B2 JP 5794803B2 JP 2011069808 A JP2011069808 A JP 2011069808A JP 2011069808 A JP2011069808 A JP 2011069808A JP 5794803 B2 JP5794803 B2 JP 5794803B2
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- 238000000034 method Methods 0.000 title claims description 11
- 230000006870 function Effects 0.000 claims description 23
- 230000003287 optical effect Effects 0.000 claims description 20
- 238000001514 detection method Methods 0.000 claims description 17
- 230000031700 light absorption Effects 0.000 claims description 12
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 12
- 238000005259 measurement Methods 0.000 description 12
- 238000000411 transmission spectrum Methods 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000002835 absorbance Methods 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 238000001745 non-dispersive infrared spectroscopy Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
- G01N21/274—Calibration, base line adjustment, drift correction
- G01N21/276—Calibration, base line adjustment, drift correction with alternation of sample and standard in optical path
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Engineering & Computer Science (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
光源2は、例えばフィラメントを熱して発光させる白熱タイプのものである。光源2は単一であり、実ガスに照射されると吸収されて減衰する測定光L1及び実ガスに照射されても実質的に減衰しないリファレンス光L2を含むブロードな帯域の光Lを照射する。
2・・・光源
4・・・光学フィルタ
51、52・・・光検出器
6・・・演算装置
Claims (3)
- サンプルガスに光を射出する光源と、前記サンプルガスを透過した光を検出する光検出器と、前記光源と前記光検出器との間に配置された光学フィルタと、前記光検出器により得られた検出信号値に基づいて前記サンプルガス中の測定対象とする実ガスの濃度を算出する演算装置と、を備えた分光光学計であって、
基準となる一の機体である基準機において得られた、代替ガス濃度と校正時に流す実ガス濃度とを関係付ける関数αと、
前記基準機における前記校正時に流す実ガスと前記代替ガスとの光吸収率の関係と、校正対象となる一の機体である校正機に前記校正時に流す実ガスを流すことなく算出された前記校正機における前記校正時に流す実ガスと前記代替ガスとの光吸収率の関係とを関係付ける関数βと、
前記校正機における前記代替ガスの濃度と検出信号値との関係をあらわす関数と、
前記校正機において、前記測定対象とする実ガスを流したときに得られる検出信号値と、
に基づいて前記測定対象とする実ガスの濃度を算出することを特徴とする分光光学計。 - 非分散型赤外分光光度計である請求項1記載の分光光学計。
- サンプルガスに光を射出する光源と、前記サンプルガスを透過した光を検出する光検出器と、前記光源と前記光検出器との間に配置された光学フィルタと、前記光検出器により得られた検出信号値に基づいて前記サンプルガス中の測定対象とする実ガスの濃度を算出する演算装置と、を備えた分光光学計の校正方法であって、
基準となる一の機体である基準機において、代替ガス濃度と校正時に流す実ガス濃度とを関係付ける関数αを求める工程と、
前記基準機における前記校正時に流す実ガスと前記代替ガスとの光吸収率の関係と、校正対象となる一の機体である校正機に前記校正時に流す実ガスを流すことなく算出された前記校正機における前記校正時に流す実ガスと前記代替ガスとの光吸収率の関係とを関係付ける関数βを求める工程と、
前記校正機における前記代替ガスの濃度と検出信号値との関係をあらわす関数を求める工程と、
これらの関数に基づいて前記測定対象とする実ガスの濃度を算出する工程と、を備えていることを特徴とする校正方法。
Priority Applications (2)
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JP2011069808A JP5794803B2 (ja) | 2011-03-28 | 2011-03-28 | 分光光学計及びその校正方法 |
US13/431,718 US8629397B2 (en) | 2011-03-28 | 2012-03-27 | Spectrophotometer and method for calibrating the same |
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JP2011069808A JP5794803B2 (ja) | 2011-03-28 | 2011-03-28 | 分光光学計及びその校正方法 |
Publications (2)
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JP2012202918A JP2012202918A (ja) | 2012-10-22 |
JP5794803B2 true JP5794803B2 (ja) | 2015-10-14 |
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JP2011069808A Active JP5794803B2 (ja) | 2011-03-28 | 2011-03-28 | 分光光学計及びその校正方法 |
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US (1) | US8629397B2 (ja) |
JP (1) | JP5794803B2 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR112015019859A2 (pt) | 2013-03-28 | 2017-07-18 | Halliburton Energy Services Inc | sistema de calibração de sensor de ferramenta, e, método de calibração de ferramenta |
EP3165905B1 (en) | 2014-07-03 | 2019-10-02 | Murata Manufacturing Co., Ltd. | Gas concentration measurement device |
CN104535183B (zh) * | 2014-12-09 | 2016-09-28 | 中国科学院上海技术物理研究所 | 一种适用于热红外高光谱成像仪光谱定标*** |
DE102015106632A1 (de) * | 2015-04-29 | 2016-11-03 | Smartgas Mikrosensorik Gmbh | Sensor zur Detektion der Konzentration wenigstens eines Mediums sowie Verfahren zum Betreiben eines solchen Sensors |
US9917955B2 (en) | 2016-02-03 | 2018-03-13 | Onyx Graphics, Inc. | Spectral transmissive measurement of media |
CN106092320B (zh) * | 2016-05-30 | 2017-11-17 | 北京环境特性研究所 | 一种长波红外光谱仪的光谱定标方法 |
KR101907890B1 (ko) | 2017-08-24 | 2018-12-18 | 한국표준과학연구원 | 모드 매칭과 시간 분해 커플링 효율 모델링을 이용한 가스분석용 광공동 감쇄 분광기의 설계 방법 |
US11187585B2 (en) * | 2018-10-12 | 2021-11-30 | Mls Acq, Inc. | FTIR spectrometer with optical filter for low level gas detection such as formaldehyde and ethylene oxide |
CN111855606B (zh) * | 2020-07-15 | 2021-05-18 | 中国计量科学研究院 | 红外光谱麻醉气体浓度检测仪的校准方法 |
CN113917519B (zh) * | 2021-09-08 | 2024-02-02 | 中国船舶重工集团公司第七一九研究所 | 一种用于源检***的在线校准方法 |
Family Cites Families (10)
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BE786029A (fr) * | 1971-09-28 | 1973-01-08 | Schlumberger Compteurs | Perfectionnements aux analyseurs de gaz a infrarouge |
US5206511A (en) * | 1990-10-18 | 1993-04-27 | Cascadia Technology Corporation | Calibrators for infrared-type gas analyzers |
US5340987A (en) * | 1991-03-15 | 1994-08-23 | Li-Cor, Inc. | Apparatus and method for analyzing gas |
JPH08136453A (ja) * | 1994-11-04 | 1996-05-31 | Chino Corp | 水分計 |
FI100827B (fi) * | 1995-03-22 | 1998-02-27 | Vaisala Oy | NDIR-laitteiston kalibrointimenetelmä sekä kalibrointilaitteisto |
DE19840345B4 (de) * | 1998-09-04 | 2004-09-30 | Dräger Medical AG & Co. KGaA | Verfahren und Vorrichtung zum quantitativen Aufspüren eines vorgegebenen Gases |
JP2000241346A (ja) * | 1999-02-22 | 2000-09-08 | Chino Corp | 光学的測定装置 |
JP2005257358A (ja) | 2004-03-10 | 2005-09-22 | Matsushita Electric Ind Co Ltd | ガス測定装置およびガス測定方法 |
JP2007108018A (ja) * | 2005-10-13 | 2007-04-26 | Energy Support Corp | ガス分析装置の校正方法 |
JP5241009B2 (ja) * | 2008-12-17 | 2013-07-17 | 理研計器株式会社 | シアン化水素ガス検出器用硫化水素除去フィルタ |
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2011
- 2011-03-28 JP JP2011069808A patent/JP5794803B2/ja active Active
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2012
- 2012-03-27 US US13/431,718 patent/US8629397B2/en active Active
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Publication number | Publication date |
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US8629397B2 (en) | 2014-01-14 |
JP2012202918A (ja) | 2012-10-22 |
US20120250014A1 (en) | 2012-10-04 |
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