JP5744545B2 - 固体撮像装置およびカメラ - Google Patents
固体撮像装置およびカメラ Download PDFInfo
- Publication number
- JP5744545B2 JP5744545B2 JP2011019145A JP2011019145A JP5744545B2 JP 5744545 B2 JP5744545 B2 JP 5744545B2 JP 2011019145 A JP2011019145 A JP 2011019145A JP 2011019145 A JP2011019145 A JP 2011019145A JP 5744545 B2 JP5744545 B2 JP 5744545B2
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- Prior art keywords
- insulator
- imaging device
- solid
- state imaging
- semiconductor region
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 238000003384 imaging method Methods 0.000 title claims description 30
- 239000012212 insulator Substances 0.000 claims description 47
- 238000001514 detection method Methods 0.000 claims description 45
- 238000006243 chemical reaction Methods 0.000 claims description 41
- 239000004065 semiconductor Substances 0.000 claims description 39
- 239000004020 conductor Substances 0.000 claims description 9
- 238000009792 diffusion process Methods 0.000 description 13
- 230000003321 amplification Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000003199 nucleic acid amplification method Methods 0.000 description 9
- 230000007423 decrease Effects 0.000 description 6
- 230000035945 sensitivity Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 210000000887 face Anatomy 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14623—Optical shielding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
- H04N23/672—Focus control based on electronic image sensor signals based on the phase difference signals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/703—SSIS architectures incorporating pixels for producing signals other than image signals
- H04N25/704—Pixels specially adapted for focusing, e.g. phase difference pixel sets
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Automatic Focus Adjustment (AREA)
- Focusing (AREA)
Description
Claims (6)
- 位相差検出方式による焦点検出のための複数の画素を含む固体撮像装置であって、
前記画素は、
互いに独立して信号の読み出しが可能な複数の光電変換部を含む半導体領域と、
マイクロレンズと、
前記マイクロレンズと前記半導体領域とを接続する部分と、を含み、
前記部分は、レンズ面を含み、
前記レンズ面を含む前記部分は、前記マイクロレンズを通過して前記半導体領域に向かう光に対して負のパワーを有する、
ことを特徴とする固体撮像装置。 - 前記レンズ面は、前記マイクロレンズと前記半導体領域との間に配置された第1絶縁体と、前記マイクロレンズと前記第1絶縁体との間に配置された第2絶縁体との境界面によって構成され、前記半導体領域から離れる方向に向かって凸形状を有し、
前記第1絶縁体の屈折率は、前記第2絶縁体の屈折率よりも小さい、
ことを特徴とする請求項1に記載の固体撮像装置。 - 前記レンズ面は、前記マイクロレンズと前記半導体領域との間に配置された第1絶縁体と、前記マイクロレンズと前記第1絶縁体との間に配置された第2絶縁体との境界面によって構成され、前記半導体領域から離れる方向に向かって凹形状を有し、
前記第1絶縁体の屈折率は、前記第2絶縁体の屈折率よりも大きい、
ことを特徴とする請求項1に記載の固体撮像装置。 - 前記第1絶縁体の上面は、前記レンズ面を構成する中央面と、前記中央面の外側に配置された外側面とを含み、
前記外側面と前記半導体領域の上面との間に導電体パターンが配置されている、
ことを特徴とする請求項2又は3に記載の固体撮像装置。 - 前記導電体パターンは、ゲート電極を含む、
ことを特徴とする請求項4に記載の固体撮像装置。 - 請求項1乃至5のいずれか1項に記載の固体撮像装置と、
前記固体撮像装置から出力される信号を処理する処理部と、
を備えることを特徴とするカメラ。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011019145A JP5744545B2 (ja) | 2011-01-31 | 2011-01-31 | 固体撮像装置およびカメラ |
US13/353,620 US9117718B2 (en) | 2011-01-31 | 2012-01-19 | Solid-state image sensor with a plurality of pixels for focus detection |
CN201210019881.2A CN102625053B (zh) | 2011-01-31 | 2012-01-21 | 固态图像传感器和照相机 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011019145A JP5744545B2 (ja) | 2011-01-31 | 2011-01-31 | 固体撮像装置およびカメラ |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015094437A Division JP5974136B2 (ja) | 2015-05-01 | 2015-05-01 | 固体撮像装置およびカメラ |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012160906A JP2012160906A (ja) | 2012-08-23 |
JP2012160906A5 JP2012160906A5 (ja) | 2014-03-20 |
JP5744545B2 true JP5744545B2 (ja) | 2015-07-08 |
Family
ID=46564719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011019145A Expired - Fee Related JP5744545B2 (ja) | 2011-01-31 | 2011-01-31 | 固体撮像装置およびカメラ |
Country Status (3)
Country | Link |
---|---|
US (1) | US9117718B2 (ja) |
JP (1) | JP5744545B2 (ja) |
CN (1) | CN102625053B (ja) |
Families Citing this family (25)
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JP5864990B2 (ja) | 2011-10-03 | 2016-02-17 | キヤノン株式会社 | 固体撮像装置およびカメラ |
JP6023437B2 (ja) | 2012-02-29 | 2016-11-09 | キヤノン株式会社 | 固体撮像装置及びカメラ |
JP6264616B2 (ja) * | 2013-01-30 | 2018-01-24 | パナソニックIpマネジメント株式会社 | 撮像装置及び固体撮像装置 |
JP6222949B2 (ja) * | 2013-03-15 | 2017-11-01 | キヤノン株式会社 | 撮像素子および撮像装置 |
JP6216147B2 (ja) | 2013-04-24 | 2017-10-18 | キヤノン株式会社 | 固体撮像装置およびカメラ |
US20140375852A1 (en) * | 2013-06-20 | 2014-12-25 | Canon Kabushiki Kaisha | Solid-state imaging apparatus, method of manufacturing the same, camera, imaging device, and imaging apparatus |
JP6305028B2 (ja) * | 2013-11-22 | 2018-04-04 | キヤノン株式会社 | 光電変換装置の製造方法および光電変換装置 |
JP6294648B2 (ja) | 2013-12-06 | 2018-03-14 | キヤノン株式会社 | 固体撮像装置及びカメラ |
JP6137316B2 (ja) | 2014-02-26 | 2017-05-31 | パナソニックIpマネジメント株式会社 | 深さ位置検出装置、撮像素子、及び深さ位置検出方法 |
JP6385126B2 (ja) | 2014-05-02 | 2018-09-05 | キヤノン株式会社 | 固体撮像装置 |
JP2016001682A (ja) | 2014-06-12 | 2016-01-07 | ソニー株式会社 | 固体撮像装置およびその製造方法、並びに電子機器 |
JP6609113B2 (ja) | 2014-06-18 | 2019-11-20 | キヤノン株式会社 | 撮像装置及びその制御方法 |
JP6415187B2 (ja) | 2014-08-29 | 2018-10-31 | キヤノン株式会社 | 固体撮像装置および撮像システム |
KR102306670B1 (ko) | 2014-08-29 | 2021-09-29 | 삼성전자주식회사 | 이미지 센서 및 그 제조 방법 |
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KR102363433B1 (ko) | 2015-01-15 | 2022-02-16 | 삼성전자주식회사 | 이미지 센서 |
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KR102390836B1 (ko) | 2015-10-05 | 2022-04-26 | 삼성전자주식회사 | 이미지 데이터를 생성하는 전자 장치 및 방법 |
JP2017142356A (ja) * | 2016-02-10 | 2017-08-17 | ソニー株式会社 | 撮像装置、および、撮像装置の制御方法 |
CN107040724B (zh) * | 2017-04-28 | 2020-05-15 | Oppo广东移动通信有限公司 | 双核对焦图像传感器及其对焦控制方法和成像装置 |
KR102614851B1 (ko) * | 2018-07-23 | 2023-12-19 | 삼성전자주식회사 | 이미지 센서 |
KR20220043556A (ko) * | 2020-09-29 | 2022-04-05 | 에스케이하이닉스 주식회사 | 이미지 센싱 장치 |
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-
2011
- 2011-01-31 JP JP2011019145A patent/JP5744545B2/ja not_active Expired - Fee Related
-
2012
- 2012-01-19 US US13/353,620 patent/US9117718B2/en not_active Expired - Fee Related
- 2012-01-21 CN CN201210019881.2A patent/CN102625053B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN102625053A (zh) | 2012-08-01 |
JP2012160906A (ja) | 2012-08-23 |
US9117718B2 (en) | 2015-08-25 |
CN102625053B (zh) | 2015-11-18 |
US20120194696A1 (en) | 2012-08-02 |
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