JP5639926B2 - 炭化珪素半導体装置及びその製造方法 - Google Patents
炭化珪素半導体装置及びその製造方法 Download PDFInfo
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- JP5639926B2 JP5639926B2 JP2011041091A JP2011041091A JP5639926B2 JP 5639926 B2 JP5639926 B2 JP 5639926B2 JP 2011041091 A JP2011041091 A JP 2011041091A JP 2011041091 A JP2011041091 A JP 2011041091A JP 5639926 B2 JP5639926 B2 JP 5639926B2
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- 229910010271 silicon carbide Inorganic materials 0.000 title claims description 180
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims description 176
- 239000004065 semiconductor Substances 0.000 title claims description 90
- 238000004519 manufacturing process Methods 0.000 title claims description 45
- 229910052751 metal Inorganic materials 0.000 claims description 184
- 239000002184 metal Substances 0.000 claims description 184
- 229910021332 silicide Inorganic materials 0.000 claims description 162
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 162
- 238000000034 method Methods 0.000 claims description 127
- 239000000758 substrate Substances 0.000 claims description 87
- 239000003963 antioxidant agent Substances 0.000 claims description 47
- 230000003078 antioxidant effect Effects 0.000 claims description 47
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 18
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 14
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 14
- 238000005530 etching Methods 0.000 claims description 4
- 229910052582 BN Inorganic materials 0.000 claims description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 3
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 3
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 194
- 238000010586 diagram Methods 0.000 description 42
- 238000009792 diffusion process Methods 0.000 description 20
- 229910004298 SiO 2 Inorganic materials 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 14
- 230000003647 oxidation Effects 0.000 description 14
- 238000007254 oxidation reaction Methods 0.000 description 14
- 239000012535 impurity Substances 0.000 description 13
- 239000011229 interlayer Substances 0.000 description 13
- 229910052799 carbon Inorganic materials 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 10
- 238000001039 wet etching Methods 0.000 description 10
- 238000001312 dry etching Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 230000004913 activation Effects 0.000 description 7
- 238000000137 annealing Methods 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000007772 electrode material Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000001151 other effect Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000009279 wet oxidation reaction Methods 0.000 description 2
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010893 electron trap Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
- H01L21/0475—Changing the shape of the semiconductor body, e.g. forming recesses
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- H01L21/0445—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising crystalline silicon carbide
- H01L21/048—Making electrodes
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66053—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide
- H01L29/66068—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
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- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
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- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1608—Silicon carbide
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- H01L29/42312—Gate electrodes for field effect devices
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- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
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- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
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- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
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- H01L29/51—Insulating materials associated therewith
- H01L29/511—Insulating materials associated therewith with a compositional variation, e.g. multilayer structures
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Description
Claims (16)
- 裏面にドレイン領域を設ける炭化珪素半導体基板上に形成されている炭化珪素半導体層上に、第1領域を除いて金属シリサイド層を形成する第一工程と、
前記炭化珪素半導体層上に前記金属シリサイド層の酸化防止膜を形成する第二工程と、
前記第1領域上の前記酸化防止膜の一部を除去する第三工程と、
前記酸化防止膜が除去された領域の前記炭化珪素半導体層表面を酸化することで酸化膜を形成する第四工程と、
前記酸化膜上に縦型MOSFETのゲート電極を形成する第五工程を備えることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項1記載の炭化珪素半導体装置の製造方法において、
さらに、前記酸化防止膜上に酸化珪素膜を形成する第六工程を備え、
前記第三工程は、さらに前記複数の金属シリサイド層間の前記酸化珪素膜の一部を除去する工程を有することを特徴とする炭化珪素半導体装置の製造方法。 - 請求項1記載の炭化珪素半導体装置の製造方法において、
さらに、前記酸化膜上に800℃以下の基板温度でCVD酸化膜を形成する工程を備え、
前記ゲート電極は、前記CVD酸化膜上に形成されることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項1記載の炭化珪素半導体装置の製造方法において、
さらに、前記第五工程後に、前記金属シリサイド層上の前記酸化防止膜の一部を除去しコンタクトホールを形成する工程と、前記コンタクトホールに前記金属シリサイド層と接続する金属プラグを形成する工程とを備えることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項1記載の炭化珪素半導体装置の製造方法において、
さらに、前記第三工程後に、前記酸化防止膜をマスクとして、前記炭化珪素半導体層をエッチングし溝を形成する工程を備え、前記第四工程は、前記溝の底面および側壁に酸化膜を形成する工程であることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項2記載の炭化珪素半導体装置の製造方法において、
さらに、前記第六工程後に、前記酸化珪素膜および前記酸化防止膜をマスクとして、前記炭化珪素半導体層をエッチングし溝を形成する工程を備え、前記第四工程は、前記溝の底面および側壁に酸化膜を形成する工程であることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項5記載の炭化珪素半導体装置の製造方法において、
前記ゲート電極は、前記溝の外部に溝よりも幅広の部分を有し、前記第五工程は、前記金属シリサイド層の端部が、前記幅広の部分の端部よりもゲート絶縁膜側に配置されるようにゲート電極を形成する工程であることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項5記載の炭化珪素半導体装置の製造方法において、
前記溝を形成する工程は、前記金属シリサイド層の端部と、前記溝との距離が、露光装置の位置合わせマージンの2倍未満の距離で形成する工程であって、前記第五工程は、前記金属シリサイド層と一部オーバーラップして前記ゲート電極を形成する工程であることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項1記載の炭化珪素半導体装置の製造方法において、
さらに、前記炭化珪素半導体層を含む基板の裏面に前記MOSFETのドレイン層となる金属シリサイド層を形成する工程を備えることを特徴とする炭化珪素半導体装置の製造方法。 - 請求項9記載の炭化珪素半導体装置の製造方法において、
前記ドレイン層を前記第五工程の後に形成し、前記ドレイン層は、レーザー光を照射することで前記金属シリサイド層を形成することを特徴とする炭化珪素半導体装置の製造方法。 - 請求項1記載の炭化珪素半導体装置の製造方法において、
前記酸化防止膜は、窒化珪素膜、窒化アルミニウム膜、窒化ホウ素膜、炭化珪素膜のいずれかであることを特徴とする炭化珪素半導体装置の製造方法。 - 炭化珪素基板上に形成された炭化珪素半導体層と、
前記炭化珪素半導体層上に第1領域を除いて形成された金属シリサイド層と、
前記金属シリサイド層上に形成されたコンタクトプラグと、
前記コンタクトプラグが形成された領域を除く前記金属シリサイド層上に前記シリサイド層の端部を覆うように延伸して形成された前記金属シリサイド層の酸化防止膜と、
前記酸化防止膜上に形成された酸化珪素膜と、
前記第1領域に形成されたMOSFETのゲート電極と、
前記炭化珪素半導体層上に形成されたゲート絶縁膜界面層と、
前記ゲート絶縁膜界面層と前記ゲート電極との間に、前記シリサイド層の端部と間隔を空けて形成されたゲート絶縁膜と、
前記炭化珪素基板の前記炭化珪素半導体層が形成されている面と反対側の面に形成された前記MOSFETのドレイン電極を備えることを特徴とする炭化珪素半導体装置。 - 請求項12記載の炭化珪素半導体装置において、
前記ゲート電極は、前記複数の金属シリサイド層間の前記炭化珪素基板に形成された溝に埋め込まれていることを特徴とする炭化珪素半導体装置。 - 請求項13記載の炭化珪素半導体装置において、
前記ゲート電極は、前記溝の外部に溝よりも幅広の部分を有し、前記金属シリサイド層の端部が、前記幅広の部分の端部よりもゲート絶縁膜側に形成されていることを特徴とする炭化珪素半導体装置。 - 請求項12記載の炭化珪素半導体装置において、
前記酸化防止膜は、窒化珪素膜、窒化アルミニウム膜、窒化ホウ素膜、炭化珪素膜のいずれかであることを特徴とする炭化珪素半導体装置。 - 請求項12記載の炭化珪素半導体装置において、
前記ゲート絶縁膜界面層の窒化量は、0.1〜10%であることを特徴とする炭化珪素半導体装置。
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