JP5635234B2 - ポリαオレフィン組成物およびこれを生成するためのプロセス - Google Patents
ポリαオレフィン組成物およびこれを生成するためのプロセス Download PDFInfo
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- JP5635234B2 JP5635234B2 JP2008522781A JP2008522781A JP5635234B2 JP 5635234 B2 JP5635234 B2 JP 5635234B2 JP 2008522781 A JP2008522781 A JP 2008522781A JP 2008522781 A JP2008522781 A JP 2008522781A JP 5635234 B2 JP5635234 B2 JP 5635234B2
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- Prior art keywords
- polyalphaolefin
- less
- catalyst
- mol
- olefin
- Prior art date
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- 229920013639 polyalphaolefin Polymers 0.000 title claims description 245
- 238000000034 method Methods 0.000 title claims description 96
- 230000008569 process Effects 0.000 title claims description 74
- 239000000203 mixture Substances 0.000 title claims description 59
- -1 1-uneicosene Natural products 0.000 claims description 218
- 239000003054 catalyst Substances 0.000 claims description 199
- 239000012190 activator Substances 0.000 claims description 142
- 239000004711 α-olefin Substances 0.000 claims description 97
- 150000001336 alkenes Chemical class 0.000 claims description 93
- 239000000178 monomer Substances 0.000 claims description 91
- 150000001875 compounds Chemical class 0.000 claims description 78
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 75
- 229910052739 hydrogen Inorganic materials 0.000 claims description 69
- 239000001257 hydrogen Substances 0.000 claims description 69
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical compound CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 claims description 60
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 59
- 238000006116 polymerization reaction Methods 0.000 claims description 50
- 238000005984 hydrogenation reaction Methods 0.000 claims description 49
- 229920000642 polymer Polymers 0.000 claims description 46
- 239000002904 solvent Substances 0.000 claims description 46
- 239000000314 lubricant Substances 0.000 claims description 36
- 239000012968 metallocene catalyst Substances 0.000 claims description 36
- 229910052794 bromium Inorganic materials 0.000 claims description 32
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 30
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 30
- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 claims description 25
- 125000004432 carbon atom Chemical group C* 0.000 claims description 25
- 125000005842 heteroatom Chemical group 0.000 claims description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 20
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 239000003085 diluting agent Substances 0.000 claims description 17
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 claims description 16
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical compound CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 claims description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N 1-Heptene Chemical compound CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 claims description 11
- 125000000129 anionic group Chemical group 0.000 claims description 10
- HFDVRLIODXPAHB-UHFFFAOYSA-N 1-tetradecene Chemical compound CCCCCCCCCCCCC=C HFDVRLIODXPAHB-UHFFFAOYSA-N 0.000 claims description 9
- OFHCOWSQAMBJIW-AVJTYSNKSA-N alfacalcidol Chemical compound C1(/[C@@H]2CC[C@@H]([C@]2(CCC1)C)[C@H](C)CCCC(C)C)=C\C=C1\C[C@@H](O)C[C@H](O)C1=C OFHCOWSQAMBJIW-AVJTYSNKSA-N 0.000 claims description 9
- JLTDJTHDQAWBAV-UHFFFAOYSA-O dimethyl(phenyl)azanium Chemical group C[NH+](C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-O 0.000 claims description 9
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 9
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 9
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 claims description 9
- 229910052759 nickel Inorganic materials 0.000 claims description 9
- VQOXUMQBYILCKR-UHFFFAOYSA-N 1-Tridecene Chemical compound CCCCCCCCCCCC=C VQOXUMQBYILCKR-UHFFFAOYSA-N 0.000 claims description 8
- 229940069096 dodecene Drugs 0.000 claims description 8
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 claims description 7
- VXNZUUAINFGPBY-UHFFFAOYSA-N ethyl ethylene Natural products CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 claims description 7
- 150000002431 hydrogen Chemical class 0.000 claims description 7
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 claims description 6
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 6
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- VPGLGRNSAYHXPY-UHFFFAOYSA-L zirconium(2+);dichloride Chemical compound Cl[Zr]Cl VPGLGRNSAYHXPY-UHFFFAOYSA-L 0.000 claims description 5
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 claims description 4
- 239000004927 clay Substances 0.000 claims description 4
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 claims description 4
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- OBAJXDYVZBHCGT-UHFFFAOYSA-N tris(pentafluorophenyl)borane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1B(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F OBAJXDYVZBHCGT-UHFFFAOYSA-N 0.000 claims description 4
- VWOTWOPAYZNLIU-UHFFFAOYSA-L C[SiH]C.Cl[Zr](Cl)(C1C=CC=C1)C1C=CC=C1 Chemical group C[SiH]C.Cl[Zr](Cl)(C1C=CC=C1)C1C=CC=C1 VWOTWOPAYZNLIU-UHFFFAOYSA-L 0.000 claims description 3
- 229910052570 clay Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 2
- GHUNGDAEQRFFMV-UHFFFAOYSA-L CC(C)=[Zr](Cl)(Cl)(C1C=CC=C1)C1C=CC=C1 Chemical compound CC(C)=[Zr](Cl)(Cl)(C1C=CC=C1)C1C=CC=C1 GHUNGDAEQRFFMV-UHFFFAOYSA-L 0.000 claims description 2
- SVHPGKHHBXQFLQ-UHFFFAOYSA-L Cl[Zr](Cl)(C1C=CC=C1)(C1c2ccccc2-c2ccccc12)=C(c1ccccc1)c1ccccc1 Chemical compound Cl[Zr](Cl)(C1C=CC=C1)(C1c2ccccc2-c2ccccc12)=C(c1ccccc1)c1ccccc1 SVHPGKHHBXQFLQ-UHFFFAOYSA-L 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- SPURMHFLEKVAAS-UHFFFAOYSA-N 1-docosene Chemical compound CCCCCCCCCCCCCCCCCCCCC=C SPURMHFLEKVAAS-UHFFFAOYSA-N 0.000 claims 2
- ADOBXTDBFNCOBN-UHFFFAOYSA-N 1-heptadecene Chemical compound CCCCCCCCCCCCCCCC=C ADOBXTDBFNCOBN-UHFFFAOYSA-N 0.000 claims 2
- GQEZCXVZFLOKMC-UHFFFAOYSA-N 1-hexadecene Chemical compound CCCCCCCCCCCCCCC=C GQEZCXVZFLOKMC-UHFFFAOYSA-N 0.000 claims 2
- PJLHTVIBELQURV-UHFFFAOYSA-N 1-pentadecene Chemical compound CCCCCCCCCCCCCC=C PJLHTVIBELQURV-UHFFFAOYSA-N 0.000 claims 2
- VAMFXQBUQXONLZ-UHFFFAOYSA-N n-alpha-eicosene Natural products CCCCCCCCCCCCCCCCCCC=C VAMFXQBUQXONLZ-UHFFFAOYSA-N 0.000 claims 2
- NHLUYCJZUXOUBX-UHFFFAOYSA-N nonadec-1-ene Chemical compound CCCCCCCCCCCCCCCCCC=C NHLUYCJZUXOUBX-UHFFFAOYSA-N 0.000 claims 2
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 claims 2
- SJDSOBWGZRPKSB-UHFFFAOYSA-N tricos-1-ene Chemical compound CCCCCCCCCCCCCCCCCCCCCC=C SJDSOBWGZRPKSB-UHFFFAOYSA-N 0.000 claims 2
- 229940106006 1-eicosene Drugs 0.000 claims 1
- FIKTURVKRGQNQD-UHFFFAOYSA-N 1-eicosene Natural products CCCCCCCCCCCCCCCCCC=CC(O)=O FIKTURVKRGQNQD-UHFFFAOYSA-N 0.000 claims 1
- PBGVMIDTGGTBFS-UHFFFAOYSA-N but-3-enylbenzene Chemical compound C=CCCC1=CC=CC=C1 PBGVMIDTGGTBFS-UHFFFAOYSA-N 0.000 claims 1
- 229910003455 mixed metal oxide Inorganic materials 0.000 claims 1
- RURREWSZSUQSNB-UHFFFAOYSA-N pent-4-enylbenzene Chemical compound C=CCCCC1=CC=CC=C1 RURREWSZSUQSNB-UHFFFAOYSA-N 0.000 claims 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 claims 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 claims 1
- 125000005208 trialkylammonium group Chemical group 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 69
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 47
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 46
- 239000007788 liquid Substances 0.000 description 44
- 239000000243 solution Substances 0.000 description 43
- 239000000047 product Substances 0.000 description 39
- 239000003446 ligand Substances 0.000 description 38
- AQZWEFBJYQSQEH-UHFFFAOYSA-N 2-methyloxaluminane Chemical compound C[Al]1CCCCO1 AQZWEFBJYQSQEH-UHFFFAOYSA-N 0.000 description 36
- 150000003254 radicals Chemical class 0.000 description 34
- 239000012018 catalyst precursor Substances 0.000 description 29
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Natural products C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 26
- 229910052782 aluminium Inorganic materials 0.000 description 25
- 125000001183 hydrocarbyl group Chemical group 0.000 description 25
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 25
- 150000001450 anions Chemical class 0.000 description 24
- 238000006384 oligomerization reaction Methods 0.000 description 22
- 239000000523 sample Substances 0.000 description 22
- 229910052796 boron Inorganic materials 0.000 description 21
- 239000005977 Ethylene Substances 0.000 description 20
- 125000001424 substituent group Chemical group 0.000 description 20
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 19
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 18
- 239000000126 substance Substances 0.000 description 17
- 238000005481 NMR spectroscopy Methods 0.000 description 16
- 229910052799 carbon Inorganic materials 0.000 description 16
- 239000002002 slurry Substances 0.000 description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 15
- 230000007935 neutral effect Effects 0.000 description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 15
- 238000001228 spectrum Methods 0.000 description 15
- HFKJQIJFRMRSKM-UHFFFAOYSA-N [3,5-bis(trifluoromethyl)phenoxy]boronic acid Chemical compound OB(O)OC1=CC(C(F)(F)F)=CC(C(F)(F)F)=C1 HFKJQIJFRMRSKM-UHFFFAOYSA-N 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- 229910052726 zirconium Inorganic materials 0.000 description 14
- OKTJSMMVPCPJKN-OUBTZVSYSA-N Carbon-13 Chemical compound [13C] OKTJSMMVPCPJKN-OUBTZVSYSA-N 0.000 description 13
- 150000001768 cations Chemical class 0.000 description 13
- NMLGKEDSNASIHM-UHFFFAOYSA-N (2,3,4,5,6,7,8-heptafluoronaphthalen-1-yl)oxyboronic acid Chemical compound FC1=C(F)C(F)=C2C(OB(O)O)=C(F)C(F)=C(F)C2=C1F NMLGKEDSNASIHM-UHFFFAOYSA-N 0.000 description 12
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 12
- 230000002000 scavenging effect Effects 0.000 description 12
- MCULRUJILOGHCJ-UHFFFAOYSA-N triisobutylaluminium Chemical compound CC(C)C[Al](CC(C)C)CC(C)C MCULRUJILOGHCJ-UHFFFAOYSA-N 0.000 description 12
- LFXVBWRMVZPLFK-UHFFFAOYSA-N trioctylalumane Chemical compound CCCCCCCC[Al](CCCCCCCC)CCCCCCCC LFXVBWRMVZPLFK-UHFFFAOYSA-N 0.000 description 12
- 239000002841 Lewis acid Substances 0.000 description 11
- 239000013543 active substance Substances 0.000 description 11
- 229910052735 hafnium Inorganic materials 0.000 description 11
- 150000007517 lewis acids Chemical class 0.000 description 11
- 150000003623 transition metal compounds Chemical class 0.000 description 11
- 229910007926 ZrCl Inorganic materials 0.000 description 10
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 10
- 239000003921 oil Substances 0.000 description 10
- 239000011148 porous material Substances 0.000 description 10
- 229920006395 saturated elastomer Polymers 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 9
- 125000004122 cyclic group Chemical group 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 9
- 229910052723 transition metal Inorganic materials 0.000 description 9
- ORYGRKHDLWYTKX-UHFFFAOYSA-N trihexylalumane Chemical compound CCCCCC[Al](CCCCCC)CCCCCC ORYGRKHDLWYTKX-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical class [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- 239000000654 additive Substances 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 8
- 238000002474 experimental method Methods 0.000 description 8
- 229930195733 hydrocarbon Natural products 0.000 description 8
- 230000001050 lubricating effect Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 229910052752 metalloid Inorganic materials 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 239000013638 trimer Substances 0.000 description 8
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 7
- 238000001994 activation Methods 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- 125000004429 atom Chemical group 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 238000005227 gel permeation chromatography Methods 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 150000002367 halogens Chemical class 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- 238000005461 lubrication Methods 0.000 description 7
- 150000002738 metalloids Chemical class 0.000 description 7
- 239000002808 molecular sieve Substances 0.000 description 7
- 239000012041 precatalyst Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 7
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 7
- GGQQNYXPYWCUHG-RMTFUQJTSA-N (3e,6e)-deca-3,6-diene Chemical compound CCC\C=C\C\C=C\CC GGQQNYXPYWCUHG-RMTFUQJTSA-N 0.000 description 6
- 239000004215 Carbon black (E152) Substances 0.000 description 6
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 230000004913 activation Effects 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 230000003197 catalytic effect Effects 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 239000012954 diazonium Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 6
- 150000002430 hydrocarbons Chemical class 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 6
- 125000003367 polycyclic group Chemical group 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 238000006467 substitution reaction Methods 0.000 description 6
- 150000003624 transition metals Chemical class 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 5
- 239000007848 Bronsted acid Substances 0.000 description 5
- 239000002879 Lewis base Substances 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- OJOSABWCUVCSTQ-UHFFFAOYSA-N cyclohepta-2,4,6-trienylium Chemical compound C1=CC=C[CH+]=C[CH]1 OJOSABWCUVCSTQ-UHFFFAOYSA-N 0.000 description 5
- 230000009849 deactivation Effects 0.000 description 5
- 239000002270 dispersing agent Substances 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910021482 group 13 metal Inorganic materials 0.000 description 5
- 229910052809 inorganic oxide Inorganic materials 0.000 description 5
- 150000007527 lewis bases Chemical class 0.000 description 5
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- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
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- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012956 testing procedure Methods 0.000 description 1
- 229940095068 tetradecene Drugs 0.000 description 1
- 125000005063 tetradecenyl group Chemical group C(=CCCCCCCCCCCCC)* 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 1
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- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- VALAJCQQJWINGW-UHFFFAOYSA-N tri(propan-2-yl)alumane Chemical compound CC(C)[Al](C(C)C)C(C)C VALAJCQQJWINGW-UHFFFAOYSA-N 0.000 description 1
- JXTPJDDICSTXJX-UHFFFAOYSA-N triacontane Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCCCC JXTPJDDICSTXJX-UHFFFAOYSA-N 0.000 description 1
- 125000002469 tricosyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005040 tridecenyl group Chemical group C(=CCCCCCCCCCCC)* 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- MXSVLWZRHLXFKH-UHFFFAOYSA-N triphenylborane Chemical compound C1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 MXSVLWZRHLXFKH-UHFFFAOYSA-N 0.000 description 1
- RERMPCBBVZEPBS-UHFFFAOYSA-N tris(2,6-dimethylphenyl)phosphane Chemical compound CC1=CC=CC(C)=C1P(C=1C(=CC=CC=1C)C)C1=C(C)C=CC=C1C RERMPCBBVZEPBS-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
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Description
a)40モル%以上のmmトライアド(triads)と、
b)Y以上の臭素価であって、Yが89.92*(V)−0.5863であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である臭素価と、
c)7モル%以上で存在する1,2−二置換オレフィンであって、好ましくは、Zモル%以上で存在し、Z=8.420*Log(V)−4.048であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である、1,2−二置換オレフィンと、を有する。
a)40モル%以上のmmトライアドと、
b)1.8以下の臭素価と、
c)以下の式で提示されるZモル%以上の単位とを有し:
a)40モル%以上のmmトライアドと、
b)Y以上の臭素価であって、Yが89.92*(V)−0.5863であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である臭素価と、
c)1,2−二置換オレフィンであって、好ましくは、以下の式で提示されるZモル%以上の単位で存在する1,2−二置換オレフィンと、
を有し:
Z=8.420*Log(V)−4.048であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である。
a)40モル%未満のmmトライアドと、
b)1.8以下の臭素価と、
c)以下の式で提示されるZモル%以上の単位とを有し:
Z=8.420*Log(V)−4.048であり、Vは100℃で測定されたcStでのポリαオレフィンの動粘性係数である。
Z=8.420*Log(V)−4.048であり、Vは100℃で測定されたcStでのポリαオレフィンの動粘性係数である。
a)40モル%未満のmmトライアドと、
b)Y以上の臭素価であって、Yが89.92*(V)−0.5863であり、Vが100℃で測定されたcStでの動粘性係数である臭素価と、
c)Zモル%以上で存在する1,2−二置換オレフィンであって、Z=8.420*Log(V)−4.048であり、Vは100℃で測定されたcStでのポリαオレフィンの動粘性係数である1,2−二置換オレフィンと、を有する。
好ましい実施形態では、本発明は、炭素−13NMRによって測定した場合、ポリαオレフィンに存在するモノマーの総モルに対して、50モル%を超える1つ以上のC5〜C24αオレフィンモノマー、好ましくは55モル%以上、好ましくは60モル%以上、好ましくは65モル%以上、好ましくは70モル%以上、好ましくは75モル%以上、好ましくは80モル%以上、好ましくは85モル%以上、好ましくは90モル%以上、好ましくは95モル%以上、好ましくは100モル%を含むポリαオレフィンに関する。
Z=8.420*Log(V)−4.048であり、Vは100℃で測定されたcStでのポリαオレフィンの動粘性係数であり、好ましくはZ=0.990*V(0.627)である。
本発明の一実施形態は、固有の化学的組成を有する新規なクラスのポリαオレフィンを生成するための改善されたプロセスを開示する。この改善されたプロセスは、1つ以上の活性剤(例えば、アルモキサンまたは非配位陰イオン)と一緒にメタロセン触媒を使用する。このメタロセン触媒は、架橋または非架橋の、置換または非置換のシクロペンタジエニル、インデニルまたはフルオレニル化合物であってもよい。1つの好ましいクラスの触媒は、高い触媒生産性およびより高い生成物粘性を得る高度に置換されたメタロセンである。別の好ましいクラスのメタロセンは、架橋されかつ、置換されるシクロペンタジエンである。別の好ましいクラスのメタロセンは、架橋されそして置換されたインデンまたはフルオレンである。本明細書に記載されるプロセスのある特徴にはまた、過酸化物、酸素、イオウ、窒素含有有機化合物および/またはアセチレン化合物のような触媒毒(poison)を除去するための供給オレフィンの処理を含む。この処理は、触媒の生産性を典型的には5倍より大きく、より好ましくは10倍より大きく増大させると考えられる。
1)5〜24炭素原子を有する少なくとも1つのαオレフィンモノマーと、ラセミ体メタロセン化合物(好ましくは、高度に置換された化合物)および活性剤とを、重合化条件下で接触させる工程であって、もし水素が存在するならば、水素は、リアクターの全圧力に基づいて、200psi(1379kPa)以下の分圧で存在し(好ましくは、150psi(1034kPa)以下、好ましくは100psi(690kPa)以下、好ましくは50psi(345kPa)以下、好ましくは25psi(173kPa)以下、好ましくは10psi(69kPa)以下(あるいは、もし水素が存在するならば、水素は、リアクター中に重量で1000ppm以下、好ましくは750ppm以下、好ましくは500ppm以下、好ましくは250ppm以下、好ましくは100ppm以下、好ましくは50ppm以下、好ましくは25ppm以下、好ましくは10ppm以下、好ましくは5ppm以下で存在し)、そして5〜24個の炭素原子を有するこのαオレフィンモノマーが、リアクター中に存在する触媒/活性剤/補助活性剤溶液、モノマーおよび任意の希釈液または溶媒の総容積に基づいて10容積%以上存在する工程と;
2)ポリαオレフィンを得る工程であって、必要に応じてPAOを水素化して、PAOを得る工程であって、ポリαオレフィンが少なくとも50モル%のC5〜C24αオレフィンモノマーを含み、このポリαオレフィンが、5000cSt以下という100℃での動粘性係数を有し、かつこのポリαオレフィンが以下の式で提示されるZモル%以上の単位を含み:
を包含する。
1)5〜24個の炭素原子を有する少なくとも1つのαオレフィンモノマーを含む供給ストリームと、メタロセン触媒化合物および非配位性陰イオン性活性剤、またはアルキルアルモキサン活性剤、および必要に応じてアルキル−アルミニウム化合物とを重合化条件下で接触させる工程であって、5〜24個の炭素原子を有するこのαオレフィンモノマーが、リアクター中に存在する触媒/活性剤/補助活性剤溶液、モノマーおよび任意の希釈液または溶媒の総容積に基づいて10容積%以上存在し、この供給αオレフィン、希釈剤または溶媒のストリームが、300ppm未満のヘテロ原子含有化合物を含み;少なくとも50モル%のC5〜C24αオレフィンモノマーを含むポリαオレフィンを得、このポリαオレフィンが5000cSt未満という100℃での動粘性係数を有する工程と、を包含する。好ましくは、水素が存在する場合、水素は、リアクター中に重量で1000ppm以下、好ましくは750ppm以下、好ましくは500ppm以下、好ましくは250ppm以下、好ましくは100ppm以下、好ましくは50ppm以下、好ましくは25ppm以下、好ましくは10ppm以下、好ましくは5ppm以下で存在する。
1)5〜24個の炭素原子を有する少なくとも1つのαオレフィンモノマーを含む供給ストリームと、メタロセン触媒化合物および非配位性陰イオン性活性剤、またはアルキルアルモキサン活性剤、および必要に応じてアルキル−アルミニウム化合物とを重合化条件のもとで接触させ、5〜24個の炭素原子を有するこのαオレフィンモノマーが、リアクター中に存在する触媒/活性剤/補助活性剤溶液、モノマーおよび任意の希釈液または溶媒の総容積に基づいて10容積%以上存在し、この供給αオレフィン、希釈剤または溶媒のストリームが、300ppm未満のヘテロ原子含有化合物を含み; 少なくとも50モル%のC5〜C24αオレフィンモノマーを含むポリαオレフィンを得、このポリαオレフィンが5000cSt以下という100℃での動粘性係数を有する工程と;
2)この潤滑画分ポリマーを単離し、次いでこの潤滑画分と水素とを水素化触媒を有する典型的な水素化条件下で接触させて1.8未満の臭素価を有する液体を得る工程、あるいは、この潤滑画分ポリマーを単離し、次いでこの潤滑画分と水素とを、水素化触媒を含むさらに厳しい条件下で水素と接触させて、1.8未満の臭素価を有し、かつ非水素化ポリマーよりもmm成分のモル%が低い液体を得る工程と、を包含する。
本発明の目的およびそれに対する特許請求の範囲については、「ヒドロカルビルラジカル(hydrocarbyl radical)」、「ヒドロカルビル(hydrocarbyl)」、および「ヒドロカルビル基(hydrocarbyl group)」の用語は、本明細書全体にわたって交換可能に用いられる。同様に、「基(group)」、「ラジカル(radical)」、および「置換基(substituent)」の用語はまた、本明細書全体にわたって交換可能に用いられる。本開示の目的については、「ヒドロカルビルラジカル」は、C1−C100ラジカルであると規定され、そして直鎖状であっても分枝であっても、または環状であってもよい。環状の場合、炭化水素ラジカルは、芳香族でも非芳香族でもよい。「炭化水素ラジカル(hydrocarbon radical)」は、置換されたヒドロカルビルラジカル、ヒドロカルビルラジカル、置換ハロカルビルラジカル、シリルカルビルラジカル、およびゲルミルカルビルラジカルを含むと規定され、それらの用語は下に規定されるとおりである。置換されたヒドロカルビルラジカルとは、少なくとも1つの水素原子が、少なくとも1つの官能基、例えば、NR* 2、OR*、SeR*、TeR*、PR* 2、AsR* 2、SbR* 2、SR*、BR* 2、SiR* 3、GeR* 3、SnR* 3、PbR* 3などで置換されているか、または少なくとも1つの非炭化水素原子もしくは基がヒドロカルビルラジカル内に、例えば、−O−、−S−、−Se−、−Te−、−N(R*)−、=N−、−P(R*)−、=P−、−As(R*)−、=As−、−Sb(R*)−、=Sb−、−B(R*)−、=B−、−Si(R*)2−、−Ge(R*)2−、−Sn(R*)2−、−Pb(R*)2−などが挿入されているラジカルであり、ここでR*は独立して、ヒドロカルビルまたはハロカルビルラジカルであり、2つ以上のR*が一緒になって、置換または非置換の、飽和された、部分的に不飽和のまたは芳香族環状もしくは多環式の環構造を形成し得る。
シクロヘ゜ンタ[b]チエニル(Z=S) シクロヘ゜ンタ[c]チエニル(Z=S)
シクロヘ゜ンタ[b]フラニル(Z=O) シクロヘ゜ンタ[c]フラニル(Z=O)
シクロヘ゜ンタ[b]セレノフェニル(Z=Se) シクロヘ゜ンタ[c]セレノフェニル(Z=Se)
シクロヘ゜ンタ[b]テルロフェニル(Z=Te) シクロヘ゜ンタ[c]テルロフェニル(Z=Te)
6-メチル-シクロヘ゜ンタ[b]ヒ゜ロリル(Z=N-Me) 5-メチル-シクロヘ゜ンタ[c]ヒ゜ロリル(Z=N-Me)
6-メチル-シクロヘ゜ンタ[b]ホスホリル(Z=P-Me) 5-メチル-シクロヘ゜ンタ[c]ホスホリル(Z=P-Me)
6-メチル-シクロヘ゜ンタ[b]アルソリル(Z=As-Me) 5-メチル-シクロヘ゜ンタ[c]アルソリル(Z=As-Me)
6-メチル-シクロヘ゜ンタ[b]スチホ゛リル(Z=Sb-Me) 5-メチル-シクロヘ゜ンタ[c]スチホ゛リル(Z=Sb-Me)
アザシクロペンタジエン(G=N)
ホスファシクロペンタジエン(G=P)
スチバシクロペンタジエン(G=Sb)
アルサシクロペンタジエン(G=As)
ボラシクロペンタジエン(G=B)
1,3-シ゛アサ゛シクロヘ゜ンタシ゛エン(G=J=N) 1,2-シ゛アサ゛シクロヘ゜ンタシ゛エン(G=J=N)
1,3-シ゛ホスファシクロヘ゜ンタシ゛エン(G=J=P) 1,2-シ゛ホスファシクロヘ゜ンタシ゛エン(G=J=P)
1,3-シ゛スチハ゛シクロヘ゜ンタシ゛エン(G=J=Sb) 1,2-シ゛スチハ゛シクロヘ゜ンタシ゛エン(G=J=Sb)
1,3-シ゛アルサシクロヘ゜ンタシ゛エン(G=J=As) 1,2-シ゛アルサシクロヘ゜ンタシ゛エン(G=J=As)
1,3-シ゛ホ゛ラシクロヘ゜ンタシ゛エン(G=J=B) 1,2-シ゛ホ゛ラシクロヘ゜ンタシ゛エン(G=J=B)
1,3-アサ゛ホスファシクロヘ゜ンタシ゛エン(G=N;J=P) 1,2-アサ゛ホスファシクロヘ゜ンタシ゛エン(G=N;J=P)
1,3-アサ゛スチハ゛シクロヘ゜ンタシ゛エン(G=N;J=Sb) 1,2-アサ゛スチハ゛シクロヘ゜ンタシ゛エン(G=N;J=Sb)
1,3-アサ゛ルサシクロヘ゜ンタシ゛エン(G=N;J=As) 1,2-アサ゛ルサシクロヘ゜ンタシ゛エン(G=N;J=As)
1,3-アサ゛ホ゛ラシクロヘ゜ンタシ゛エン(G=N;J=B) 1,2-アサ゛ホ゛ラシクロヘ゜ンタシ゛エン(G=N;J=B)
1,3-アルサホスファシクロヘ゜ンタシ゛エン(G=As;J=P) 1,2-アルサホスファシクロヘ゜ンタシ゛エン(G=As;J=P)
1,3-アルサスチハ゛シクロヘ゜ンタシ゛エン(G=As;J=Sb) 1,2-アルサスチハ゛シクロヘ゜ンタシ゛エン(G=As;J=Sb)
1,3-アルサホ゛ラシクロヘ゜ンタシ゛エン(G=As;J=B) 1,2-アルサホ゛ラシクロヘ゜ンタシ゛エン(G=As;J=B)
1,3-ホ゛ラホスファシクロヘ゜ンタシ゛エン(G=B;J=P) 1,2-ホ゛ラホスファシクロヘ゜ンタシ゛エン(G=B;J=P)
1,3-ホ゛ラスチハ゛シクロヘ゜ンタシ゛エン(G=B;J=Sb) 1,2-ホ゛ラスチハ゛シクロヘ゜ンタシ゛エン(G=B;J=Sb)
1,3-ホスファスチハ゛シクロヘ゜ンタシ゛エン(G=P;J=Sb) 1,2-ホスファスチハ゛シクロヘ゜ンタシ゛エン(G=P;J=Sb)
(Cp−A’−Cp*)MX1X2(1)
(CpCp*)MX1X2(2)
によって提示されてもよく、
ここで:
Mは金属中心であり、かつ第4族金属、好ましくはチタニウム、ジルコニウムまたはハスニウム、好ましくはジルコニウムまたはハフニウムである;
CpおよびCp*は各々がMに結合されている同じまたは異なるシクロペンタジエニル環であり、式(1)については0〜4つの置換基S”で、そして式(2)については0〜5つの置換基で置換され、各々の置換基S”は独立して、ラジカル基であり、これは、ヒドロカルビル、置換されたヒドロカルビル、ハロカルビル、置換されたハロカルビル、シリルカルビルもしくはゲルミルカルビルであり、またはCpおよびCp*は同じまたは異なるシクロペンタジエニル環であり、ここで任意の2つの隣接するS”基は必要に応じて、連結されて、置換されたまたは非置換の、飽和した、部分的に不飽和の、または芳香族の環状もしくは多環式の置換基を形成する;A’は、架橋基であり;X1およびX2は独立して、水素化物ラジカル、ヒドロカルビルラジカル、置換されたヒドロカルビルラジカル、ハロカルビルラジカル、置換されたハロカルビルラジカル、シリルカルビルラジカル、置換されたシリルカルビルラジカル、ゲルミルカルビルラジカル、もしくは置換されたゲルミルカルビルラジカルであり;または両方のXが一緒にされて金属原子に接合及び結合されて、約3〜約20の炭素原子を含むメタラサイクル(metallacycle)環を形成するか;または両方が一緒になって、オレフィン、ジオレフィンもしくはアライン(aryne)リガンドであってもよく;またはルイス酸活性剤、例えば、遷移金属成分に対して上記のようなXリガンドを付与し得るメチルアルモキサンが用いられる場合、両方のXは独立に、ハロゲン、アルコキシド、アリールオキシド、アミド、ホスフィドまたは他の一価の陰イオン性リガンドであってもよく、または両方のXはまた、一緒になって、陰イオン性キレートリガンドを形成してもよい。
R’C=CR’CR’2CR’2、R’2CSiR’2、R’2SiSiR’2、R’2CSiR’2CR’2、R’2SiCR’2SiR’2、R’C=CR’SiR’2、R’2CGeR’2、R’2GeGeR’2、R’2CGeR’2CR’2、R’2GeCR’2GeR’2、R’2SiGeR’2、R’C=CR’GeR’2、R’B,R’2C−BR’、R’2C−BR’−CR’2、R’N、R’P、O、S、Se、R’2C−O−CR’2、R’2CR’2C−O−CR’2CR’2、R’2C−O−CR’2CR’2、R’2C−O−CR’=CR’、R’2C−S−CR’2、R’2CR’2C−S−CR’2CR’2、R’2C−S−CR’2CR’2、R’2C−S−CR’=CR’、R’2C−Se−CR’2、R’2CR’2C−Se−CR’2CR’2、R’2C−Se−CR’2CR’2、R’2C−Se−CR’=CR’、R’2C−N=CR’、R’2C−NR’−CR’2、R’2C−NR’−CR’2CR’2、R’2C−NR’−CR’=CR’、R’2CR’2C−NR’−CR’2CR’2、R’2C−P=CR’、およびR’2C−PR’−CR’2から選択され、ここでCpが、Cp*と異なるならば、R’は、C1−C5含有ヒドロカルビル、置換されたヒドロカルビル、ハロカルビル、置換されたハロカルビル、シリルカルビルまたはゲルミルカルビル置換基であり、そしてCpがCp*と同じであるならば、R’は、水素、C1−C20含有ヒドロカルビル、置換されたヒドロカルビル、ハロカルビル、置換されたハロカルビル、シリルカルビルまたはゲルミルカルビル置換基から選択され、そして必要に応じて、2つ以上の隣接するR’が一緒になって、置換されたまたは非置換の、飽和されるか、部分的に不飽和の、環状のまたは多環式の置換基を形成し得る。
触媒前駆体は、メチルアルモキサンのような周知の活性剤によって活性化される場合、オレフィンの重合化またはオリゴマー化のための活性な触媒を形成する。用いられ得る活性剤としては、アルモキサン、例えば、メチルアルモキサン、修飾されたメチルアルモキサン、エチルアルモキサン、イソ−ブチルアルモキサンなどが挙げられる;ルイス酸活性剤としては、トリフェニルボロン、tris−ペルフルオロフェニルボロン、tris−ペルフルオロフェニルアルミニウムなどが挙げられる;イオン性活性剤としてはジメチルアニリニウムテトラキスペルフルオロフェニルボレート、トリフェニルカルボニウムテトラキスペルフルオロフェニルボレート、ジメチルアニリニウムテトラキスペルフルオロフェニルアミネートなどが挙げられる。
支持(担持)される触媒(支持触媒)および/または支持触媒系がPAOを調製するために用いられてもよい。均一に支持された触媒を調製するために、この触媒前駆体を好ましくは、選択された溶媒に溶解するのが良い。「均一に支持された触媒(uniform supported catalyst)」という用語は、触媒前駆体、活性剤および/または活性化触媒が、多孔性支持体の内部細孔表面を含む支持体の接近可能な表面積に均一に分布されているのに近いことを意味する。支持される触媒のいくつかの実施形態では均一な支持触媒が好ましい;他の実施形態では、このような選好は求められない。
好ましい実施形態では、本明細書に記載される触媒化合物は、任意の不飽和モノマー(単数または複数)を重合化またはオリゴマー化するために用いられる。好ましいモノマーとしては、C5〜C24オレフィン、好ましくはC6〜C14オレフィン、より好ましくはC8〜C12オレフィンが挙げられる。ある実施形態では、好ましいモノマーとしては、直鎖状、分枝または環状のαオレフィン、好ましくはC6〜C20αオレフィン、好ましくはC6〜C14αオレフィン、およびより好ましくはC8〜C12αオレフィンが挙げられる。好ましいオレフィンモノマーは、1つ以上のヘキセン、ヘプテン、オクテン、ノネン、デセン、ドデセン、3−メチル−1−ブテン、およびテトラデセンであってもよい。
処理される溶液、スラリーおよびバルクの重合化またはオリゴマー化のような、メタロセン触媒重合化またはオリゴマー化のために用いられる多くの重合化/オリゴマー化プロセスおよびリアクタータイプが、本発明において用いられ得る。ある実施形態では、固体または支持された触媒が用いられる場合、スラリーまたは連続的固定床(bed)もしくはプラグフロープロセスが適切である。好ましい実施形態では、モノマーは、液相、バルク相またはスラリー相中の、好ましくは連続攪拌スラリータンクリアクター、連続管状リアクター、またはバッチ リアクター中のメタロセン化合物および活性剤と接触させられる。好ましい実施形態では、本明細書で用いられる任意のリアクターの温度は−10℃〜250℃、好ましくは30℃〜220℃、好ましくは50℃〜180℃、好ましくは60℃〜170℃である。好ましい実施形態では、本明細書で用いられる任意のリアクター中の圧力は、0.1〜100気圧、好ましくは0.5〜75気圧、好ましくは1〜50気圧である。別の実施形態では、本明細書において用いられる任意のリアクター中の圧力は、1〜50,000気圧、好ましくは1〜25,000気圧である。別の実施形態では、モノマー(単数または複数)、メタロセンおよび活性剤は、1秒〜100時間の残留時間、好ましくは30秒〜50時間、好ましくは2分〜6時間、好ましくは1分〜4時間接触させられる。別の実施形態では、溶媒または希釈液がリアクターに存在し、そして好ましくは、ブタン、ペンタン、ヘキサン、ヘプタン、オクタン、ノナン、デカン、ウンデカン、ドデカン、トリデカン、テトラデカン、ペンタデカン、ヘキサデカン、トルエン、o−キシレン、m−キシレン、p−キシレン、エチルベンゼン、イソプロピルベンゼン、およびn−ブチルベンゼン;好ましくはトルエンおよび/またはキシレンおよび/またはエチルベンゼン、直鎖パラフィン(例えば、テキサス州ヒューストンのExxonMobil Chemical Companyから入手可能なNorpar溶媒)、またはイソパラフィン溶媒(例えば、テキサス州ヒューストンのExxonMobil Chemical Companyから入手可能なIsopar溶媒)からなる群より選択される。これらの溶媒または希釈液は一般に、供給オレフィンと同じ方式で前処理される。
Kv@100℃(cSt)=0.13+0.005578*Mw+1.37*10−6*(Mw)2
*触媒のタイプ
A ビスシクロペンタジエニルジルコニウムジクロリド
B ジメチルシリルビス(シクロペンタジエニル)ジルコニウムジクロリド
C ビス(1,3−ジメチルシクロペンタジエニル)ジルコニウムジクロリド
D イソ−プロピリデンビス(シクロペンタジエニル)ジルコニウムジクロリド
E rac−エチレンビス(1−インデニル)ジルコニウムジクロリド
F rac−ジメチルシリルビス(テトラヒドロインデニル)ジルコニウムジクロリド
G ジフェニルメチリデン(シクロペンタジエニル)(9−フルオレニル)ジルコニウムジクロリド
**粘度は、以下の式を用いてGPCによって決定されたMwに基づいて算出した:
Kv@100℃(cSt)=0.13+0.005578*Mw+1.37*10−6*(Mw)2
H ビス(メチルシクロペンタジエニル)ジルコニウムジクロリド
I ビス(エチルシクロペンタジエニル)ジルコニウムジクロリド
J ビス(n−ブチルシクロペンタジエニル)ジルコニウムジクロリド
K ビス(n−ドデシルシクロペンタジエニル)ジルコニウムジクロリド
L (メチルシクロペンタジエニル)(プロピルシクロペンタジエニル)ジルコニウムジクロリド
**粘度は、以下の式を用いてGPCによって決定したMwに基づいて算出した:
Kv@100℃(cSt)=0.13+0.005578*Mw+1.37*10−6*(Mw)2
***生成物の収率重量%=100(残留重量/供給1−デセンの重量)
M ビス(インデニル)ジルコニウムジクロリド
N シクロペンタジエニル(インデニル)ジルコニウムジクロリド
O ビス(1,2,4−トリメチルシクロペンタジエニル)ジルコニウムジクロリド
P ビス(ペンタメチルシクロペンタジエニル)ジルコニウムジクロリド
Q ビス(1−メチル−3−n−プロピルシクロペンタジエニル)ジルコニウムジクロリド
R ビス(シクロペンタジエニル)ハフニウムジクロリド
S ビス(インデニル)ハフニウムジクロリド
**粘度は、以下の式を用いてGPCによって決定したMwに基づいて算出した:
Kv@100℃(cSt)=0.13+0.005578*Mw+1.37*10−6*(Mw)2
***生成物の収率の重量%=100(残留重量/供給1−デセンの重量)
A ビスシクロペンタジエニルジルコニウムジクロリド
B ジメチルシリルビス(シクロペンタジエニル)ジルコニウムジクロリド
I ビス(エチルシクロペンタジエニル)ジルコニウムジクロリド
F rac−ジメチルシリルビス(テトラヒドロインデニル)ジルコニウムジクロリド
T Rac−ジメチルシリルビス(2−メチルインデニル)ZrCl2
U ビス(テトラメチルシクロペンタジエニル)ZrCl2
V meso−ジメチルシリルビス(2−メチルインデニル)ZrCl2
W meso−エチレンビス(インデニル)ZrCl2
**この表中のサンプルは、水素化されておらず、そして臭素価は、水素化前に測定した。
***NCA活性剤Aを用いた。
Claims (20)
- 50モル%を超える一以上のC5〜C24モノマー単位を含むポリαオレフィンであって、該ポリαオレフィンが:
a)40モル%以上のmmトライアド(triad)と、
b)Y以上の臭素価であって、Yが89.92*(V)−0.5863であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である、臭素価と、
c)7モル%以上で存在する1,2−二置換オレフィンと、
を有する前記ポリαオレフィンであって、
C5〜C24炭素原子を持つ少なくとも一つのαオレフィンモノマーを架橋ラセミ体メタロセン触媒化合物及び活性剤と重合条件下において接触させることを含むプロセスにより生成される、前記ポリαオレフィン。 - 50モル%を超える一以上のC5〜C24モノマー単位を含むポリαオレフィンであって、該ポリαオレフィンが:
a)40モル%以上のmmトライアドと、
b)Y以上の臭素価であって、Yが89.92×(V)−0.5863であり、Vが100℃で測定されたcStでの動粘性係数である、臭素価と、
c)水素化後、以下の式:
ここでj、kおよびmは各々が独立して、3、4、5、6、7、8、9、10、11、12、13、14、15、または16であり、nが1〜350の整数であり、かつ
Z=8.420*Log(V)−4.048であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である、
前記ポリαオレフィンであって、C5〜C24炭素原子を持つ少なくとも一つのαオレフィンモノマーを架橋ラセミ体メタロセン触媒化合物及び活性剤と重合条件下において接触させることを含むプロセスにより生成される、前記ポリαオレフィン。 - 50モル%を超える一以上のC5〜C24モノマー単位を含むポリαオレフィンであって、該ポリαオレフィンが水素化後、以下の式:
ここでj、kおよびmは各々が独立して、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20、21または22であり、nが1〜350の整数であり、かつ
Z=8.420*Log(V)−4.048であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である、
前記ポリαオレフィンであって、C5〜C24炭素原子を持つ少なくとも一つのαオレフィンモノマーを架橋ラセミ体メタロセン触媒化合物及び活性剤と重合条件下において接触させることを含むプロセスにより生成される、前記ポリαオレフィン。 - 前記ポリαオレフィンが1.5〜5000cStの100℃での動粘性係数を有する、請求項1乃至3のいずれか1項に記載のポリαオレフィン。
- 前記ポリαオレフィンが4〜1000,000cStの40℃での動粘性係数を有する、請求項1乃至4のいずれか1項に記載のポリαオレフィン。
- 前記ポリαオレフィンが100以上の粘度係数を有する、請求項1乃至5のいずれか1項に記載のポリαオレフィン。
- 前記ポリαオレフィンが0℃以下の流動点を有する、請求項1乃至6のいずれか1項に記載のポリαオレフィン。
- 前記ポリαオレフィンが100,000g/mol以下の重量平均分子量を有する、請求項1乃至7のいずれか1項に記載のポリαオレフィン。
- 5〜24個の炭素原子を有する前記モノマーが55モル%以上で存在する、請求項1乃至8のいずれか1項に記載のポリαオレフィン。
- 前記モノマーが、1−ブテン、1−ペンテン、1−ヘキセン、1−ヘプテン、1−オクテン、1−ノネン、1−デセン、1−ウンデセン、1−ドデセン、1−トリデセン、1−テトラデセン、1−ペンタデセン、1−ヘキサデセン、1−ヘプタデセン、1−オクタデセン、1−ノナデセン、1−エイコセン、1−ウンエイコセン、1−ドコセン、1−トリコセン、1−テトラコセン、1−ペンタコセン、1−ヘキサコセン、4−メチル−1−ペンテン、4−フェニル−1−ブテン、および5−フェニル−1−ペンテンからなる群より選択される、請求項1乃至9のいずれか1項に記載のポリαオレフィン。
- 請求項1乃至3のいずれか1項に記載のポリαオレフィンを生成するためのプロセスであって:
1)5〜24個の炭素原子を有する少なくとも1つのαオレフィンモノマーと、ラセミ体メタロセン触媒化合物および活性剤とを重合化条件のもとで接触させる工程であって、水素が存在する場合、水素がリアクターの全圧力に基づいて690kPa(100psia)以下の分圧で存在し、及び5〜24個の炭素原子を有する該αオレフィンモノマーが、リアクター中に(存在する触媒、モノマーおよび任意の希釈液または溶媒の総容積に基づいて)10容積%以上存在する工程と;
2)少なくとも50モル%のC5〜C24モノマー単位を含むポリαオレフィンであって、該ポリαオレフィンが、5000cSt以下の100℃での動粘性係数を有し、かつ該ポリαオレフィンが水素化後、以下の式:
で示されるZモル%以上の単位を有するポリαオレフィンを得る工程であって、
ここでj、kおよびmは各々が独立して、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20、21または22であり、nが1〜350の整数であり、かつZ=8.420*Log(V)−4.048であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である工程と、
を包含する、前記プロセス。 - 請求項1乃至3のいずれか1項に記載のポリαオレフィンを生成するためのプロセスであって:
1)5〜24個の炭素原子を有する少なくとも1つのαオレフィンモノマーを含む供給ストリームと、ラセミ体メタロセン触媒化合物および非配位性陰イオン性活性剤、および必要に応じてアルキル−アルミニウム化合物とを重合化条件のもとで接触させる工程であって、5〜24個の炭素原子を有する該αオレフィンモノマーが、リアクター中に(存在する触媒、モノマーおよび任意の希釈液または溶媒の総容積に基づいて)10容積%以上存在し、水素が存在する場合、水素がリアクターの全圧力に基づいて690kPa(100psia)以下の分圧で存在し、かつ供給ストリームが、300ppm未満のヘテロ原子含有化合物を含む工程と;少なくとも50モル%のC5〜C2モノマー単位を含むポリαオレフィンであって、5000cSt以下の100℃での動粘性係数を有するポリαオレフィンを得る工程と、
を包含する、前記プロセス。 - 請求項1乃至3のいずれか1項に記載のポリαオレフィンを生成するためのプロセスであって:
1)5〜24個の炭素原子を有する少なくとも1つのαオレフィンモノマーを含む供給ストリームと、ラセミ体メタロセン触媒化合物およびアルモキサン活性剤、ならびに必要に応じてアルキル−アルミニウム化合物とを重合化条件のもとで接触させる工程であって、水素が存在する場合、水素がリアクターの全圧力に基づいて、690kPa(100psia)以下の分圧で存在し、かつ5〜24個の炭素原子を有する該αオレフィンモノマーが、リアクター中に(存在する触媒、モノマーおよび任意の希釈液または溶媒の総容積に基づいて)10容積%以上存在し、かつ供給ストリームが、600ppm未満のヘテロ原子含有化合物を含む工程と;
2)少なくとも50モル%のC5〜C24モノマー単位を含むポリαオレフィンであって、該ポリαオレフィンが、5000cSt以下の100℃での動粘性係数を有し、かつ該ポリαオレフィンが水素化後、以下の式:
ここでj、kおよびmは各々が独立して、3、4、5、6、7、8、9、10、11、12、13、14、15、16、17、18、19、20、21または22であり、nが1〜350の整数であり、かつZ=8.420*Log(V)−4.048であり、Vが100℃で測定されたcStでのポリαオレフィンの動粘性係数である工程と、
を包含する、前記プロセス。 - 前記活性剤が、N,N−ジメチルアニリニウムテトラ(ペンタフルオロフェニル)ボレート、N,N−ジアルキルフェニルアニリニウムテトラ(ペンタフルオロフェニル)ボレート(ここで、前記アルキルは、C1〜C18アルキル基である)、トリチルテトラ(ペンタフルオロフェニル)ボレート、トリス(ペンタフルオロフェニル)ボロン、トリ−アルキルアンモニウムテトラ(ペンタフルオロフェニル)ボレート(ここで、アルキルは、C1〜C18アルキル基である)、テトラ−アルキルアンモニウムテトラ(ペンタフルオロフェニル)ボレート(ここで、前記アルキルは、C1〜C18アルキル基である)のうちの一以上を含む、請求項11乃至13のいずれか1項に記載のプロセス。
- 前記メタロセンが、ジメチルシリルビス(シクロペンタジエニル)ジルコニウムジクロリド;イソプロピリデンビス(シクロペンタジエニル)ジルコニウムジクロリド;rac−エチレンビス(1−インデニル)ジルコニウムジクロリド;rac−ジメチルシリルビス(テトラヒドロインデニル)ジルコニウムジクロリド;又はジフェニルメチリデン(シクロペンタジエニル)(9−フルオレニル)ジルコニウムジクロリドのうちの一以上を含む、請求項11乃至14のいずれか1項に記載のプロセス。
- アルキルアルミニウム化合物が存在し、該アルキルアルミニウム化合物が、式R3Alによって示され、各々のRが独立して、メチル、エチル、n−プロピル、イソ−プロピル、イソ−ブチル、n−ブチル、t−ブチル、n−ペンチル、イソ−ペンチル、ネオペンチル、n−ヘキシル、イソ−ヘキシル、n−ヘプチル、イソ−ヘプチル、n−オクチル、イソ−オクチル、n−ノニル、n−デシル、n−ウンデシル、n−ドデシル、n−トリデシル、n−テトラデシル、n−ペンタデシル、n−ヘキサデシル、n−ヘプタデシル、n−オクタデシル、およびそれらのイソ−アナログからなる群より選択される、請求項11乃至15のいずれか1項に記載のプロセス。
- 前記ポリαオレフィンが、水素および支持された第7、8、9および10族金属からなる群より選択される水素化触媒と接触させられる、請求項11乃至16のいずれか1項に記載のプロセス。
- 前記ポリαオレフィンが、水素ならびにシリカ、アルミナ、粘土、チタニア、ジルコニア、または混合された金属酸化物支持体上に担持される、Ni、Pd、Pt、Co、Rh、Fe、Ru、Os、Cr、Mo、およびWの内の一以上からなる群より選択される水素化触媒と接触させられる、請求項11乃至17のいずれか1項に記載のプロセス。
- ポリαオレフィン中のmmトライアド基のモル%を減少させるためのプロセスであって、請求項1乃至10のいずれか1項に記載のポリマーと、水素化触媒および水素とを接触させ、該水素および水素化触媒との接触の前に前記ポリαオレフィンよりも1〜80%少ないmmトライアド基を有するポリαオレフィンを回収することを包含する、前記プロセス。
- 潤滑剤であって、
第I族、第II族、第III族、第IV族、第V族、またはGTL潤滑油のベースストックおよびその混合物から選択されるベースストックと;
請求項1乃至19のいずれか1項に記載のポリαオレフィン、
を含む前記潤滑剤。
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EP1910431A1 (en) | 2008-04-16 |
EP1910432B1 (en) | 2014-11-12 |
WO2007011973A1 (en) | 2007-01-25 |
US20070043248A1 (en) | 2007-02-22 |
JP4914894B2 (ja) | 2012-04-11 |
US20130245343A1 (en) | 2013-09-19 |
US9409834B2 (en) | 2016-08-09 |
US20090005279A1 (en) | 2009-01-01 |
AU2006270436A1 (en) | 2007-01-25 |
US8748361B2 (en) | 2014-06-10 |
AU2006269945B2 (en) | 2011-10-20 |
EP1910431B1 (en) | 2013-11-27 |
WO2007011459A1 (en) | 2007-01-25 |
CA2616009A1 (en) | 2007-01-25 |
AU2006269945A1 (en) | 2007-01-25 |
CA2616009C (en) | 2012-02-21 |
MX2008000842A (es) | 2008-04-04 |
CA2615982C (en) | 2012-02-21 |
EP1910432A1 (en) | 2008-04-16 |
MX2008000841A (es) | 2008-04-04 |
CA2615982A1 (en) | 2007-01-25 |
JP2009503147A (ja) | 2009-01-29 |
AU2006270436B2 (en) | 2011-12-15 |
JP2009501836A (ja) | 2009-01-22 |
US20140378720A1 (en) | 2014-12-25 |
US9796645B2 (en) | 2017-10-24 |
US8207390B2 (en) | 2012-06-26 |
US20130158307A1 (en) | 2013-06-20 |
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