JP5545782B2 - リソグラフィ装置の焦点測定方法、散乱計、リソグラフィシステム、およびリソグラフィセル - Google Patents
リソグラフィ装置の焦点測定方法、散乱計、リソグラフィシステム、およびリソグラフィセル Download PDFInfo
- Publication number
- JP5545782B2 JP5545782B2 JP2012522153A JP2012522153A JP5545782B2 JP 5545782 B2 JP5545782 B2 JP 5545782B2 JP 2012522153 A JP2012522153 A JP 2012522153A JP 2012522153 A JP2012522153 A JP 2012522153A JP 5545782 B2 JP5545782 B2 JP 5545782B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- radiation
- scatterometer
- image
- lithographic apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001459 lithography Methods 0.000 title claims description 20
- 238000000691 measurement method Methods 0.000 title description 6
- 239000000758 substrate Substances 0.000 claims description 155
- 230000005855 radiation Effects 0.000 claims description 141
- 238000000034 method Methods 0.000 claims description 95
- 238000005259 measurement Methods 0.000 claims description 46
- 230000008569 process Effects 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 claims description 40
- 238000001228 spectrum Methods 0.000 claims description 38
- 238000001514 detection method Methods 0.000 claims description 23
- 238000005286 illumination Methods 0.000 claims description 21
- 238000007493 shaping process Methods 0.000 claims description 16
- 230000000737 periodic effect Effects 0.000 claims description 12
- 238000004088 simulation Methods 0.000 claims description 7
- 230000001419 dependent effect Effects 0.000 claims description 4
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000000059 patterning Methods 0.000 description 24
- 239000010410 layer Substances 0.000 description 20
- 230000000694 effects Effects 0.000 description 19
- 238000007689 inspection Methods 0.000 description 15
- 230000008859 change Effects 0.000 description 13
- 210000001747 pupil Anatomy 0.000 description 11
- 238000004626 scanning electron microscopy Methods 0.000 description 10
- 230000006870 function Effects 0.000 description 8
- 238000000399 optical microscopy Methods 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- 230000010363 phase shift Effects 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000004627 transmission electron microscopy Methods 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 239000003550 marker Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011295 pitch Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000000513 principal component analysis Methods 0.000 description 2
- 238000004621 scanning probe microscopy Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004422 calculation algorithm Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000013455 disruptive technology Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000000306 recurrent effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000007619 statistical method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/22—Measuring arrangements characterised by the use of optical techniques for measuring depth
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
Description
リソグラフィプロセスを用いて基板上に構造体を形成するステップであって、構造体は、リソグラフィ装置の基板上の焦点に依存する非対称性を有するプロファイルを持つ少なくとも一つのフィーチャを有する、ステップと、
構造体を第1放射ビームで照射する間に周期的な構造体の第1の像を形成および検出することを備える第1測定ステップであって、第1の像は、ゼロ次回折放射を除きながら非ゼロ次回折放射の第1部分を用いて形成される、ステップと、
構造体を第2放射ビームで照射する間に周期的な構造体の第2の像を形成および検出することを備える第2測定ステップであって、第2の像は、回折スペクトルにおいて第1部分と対称的に向かい合う非ゼロ次回折放射の第2部分を用いて形成される、ステップと、
第1および第2測定ステップにおいて検出された第1および第2の像を用いて、周期的な構造体のプロファイルにおける非対称性を測定する、および/または基板上の焦点の表示を提供するステップと、を備える。
第1および第2測定ステップで用いるために基板上に第1および第2放射ビームを供給する照明構成と、
第1および第2測定ステップの間に基板から回折した放射を用いて基板の第1および第2の像それぞれを形成および検出する検出構成と、
検出構成内の絞り構成と、を備える。
照明構成および絞り構成は共同して、非ゼロ次回折放射の第1および第2部分をそれぞれ用いて第1および第2の像が形成される間に、第1および第2の像に寄与するゼロ次回折放射を遮断するのに有効であり、第1および第2部分は、回折放射の回折スペクトルにおいて互いに対称的に向かい合っている。
散乱計はさらに、第1および第2の像からフィーチャに対するプロファイルの非対称性を測定し、および/または測定された非対称性と、焦点と各フィーチャに関する非対称性との間の関係とを用いて、基板上の焦点の表示を提供するコンピュータ構成を備える。
リソグラフィ装置は、
パターンを照射するよう配置された照明光学系と、
パターンの像を基板上に投影するよう配置された投影光学系と、
上述の発明に係る角度分解散乱計と、を備える。
放射感応性層で基板をコートするコータと、
コータによりコートされた基板の放射感応層上に像を露光するよう配置されたリソグラフィ装置と、
リソグラフィ装置により露光された像を現像するよう配置されたディベロッパと、
上述の発明に係る散乱計と、を備える。
「課題を解決する手段」及び「要約書」の項ではなく「発明の詳細な説明」の項が請求項を解釈するのに使用されるように意図されていることを理解されたい。「課題を解決する手段」及び「要約書」の欄は本発明者が考えた本発明の実施例の1つ以上を示すものであるが、すべてを説明するものではない。よって、本発明及び請求項をいかなる形にも限定するものではない。
Claims (23)
- 基板へのリソグラフィプロセスに用いられるリソグラフィ装置の焦点を測定する方法であって、
リソグラフィプロセスを用いて基板上に構造体を形成するステップであって、前記構造体は、前記リソグラフィ装置の基板上の焦点に依存する非対称性を有するプロファイルを持つ少なくとも一つのフィーチャを有する、ステップと、
前記構造体を第1放射ビームで照射する間に周期的な前記構造体の第1の像を形成および検出することを備える第1測定ステップであって、前記第1の像は、ゼロ次回折放射を除きながら非ゼロ次回折放射の第1部分を用いて形成される、ステップと、
前記構造体を第2放射ビームで照射する間に周期的な前記構造体の第2の像を形成および検出することを備える第2測定ステップであって、前記第2の像は、回折スペクトルにおいて前記第1部分と対称的に向かい合う前記非ゼロ次回折放射の第2部分を用いて形成される、ステップと、
前記第1および第2測定ステップにおいて検出された前記第1および第2の像を用いて、周期的な前記構造体のプロファイルにおける非対称性を測定する、および/または前記基板上の焦点の表示を提供するステップと、
を備え、
前記第1放射ビームは、放射源と前記基板の間に設けられた開口を有するビーム整形構成と、前記基板とが第1の相対位置にあるときに、前記構造体に照射され、
前記第2放射ビームは、前記ビーム整形構成または前記基板が回転されることにより前記ビーム整形構成と前記基板とが第2の相対位置にあるときに、前記構造体に照射される、
ことを特徴とする方法。 - 前記非ゼロ次回折放射の前記第1および第2部分は、+1次および−1次回折放射のそれぞれの少なくとも一部の異なる部分であることを特徴とする請求項1に記載の方法。
- 非対称性は、前記第1および第2の像の選択された部分の強度を測定することにより測定されることを特徴とする請求項1に記載の方法。
- 前記構造体の領域は、前記基板上の前記放射ビームの領域未満であることを特徴とする請求項1に記載の方法。
- 前記第1および第2測定ステップは、異なる焦点値を用いて前記リソグラフィ装置により形成された構造体に対して複数回繰り返され、前記構造体それぞれは、前記リソグラフィ装置の基板上の焦点に依存する非対称性を有するプロファイルを持つ少なくとも一つのフィーチャを有しており、繰り返された前記第1および第2測定ステップにおいて検出された像は、非対称性と前記基板上の焦点との間の関係の測定に用いられる、ことを特徴とする請求項1に記載の方法。
- 非対称性と前記基板上の焦点との間の関係の測定に、リソグラフィシミュレーションが用いられることを特徴とする請求項5に記載の方法。
- 前記第1および第2測定ステップは、異なる焦点値を用いて前記リソグラフィ装置により形成された構造体に対して複数回繰り返され、前記構造体それぞれは、前記リソグラフィ装置の基板上の焦点に依存する非対称性を有するプロファイルを持つ少なくとも一つのフィーチャを有しており、繰り返された前記第1および第2測定ステップにおいて検出された像は、前記像の選択された部分の強度と前記基板上の焦点との間の関係の測定に用いられる、ことを特徴とする請求項1に記載の方法。
- 前記選択された部分の強度と前記基板上の焦点との間の関係の測定に、リソグラフィシミュレーションが用いられることを特徴とする請求項7に記載の方法。
- 非ゼロ次回折放射の対称的に向かい合った前記第1および第2の部分は、実質的に+1次および−1次回折放射を備えることを特徴とする請求項1から8のいずれかに記載の方法。
- 前記測定ステップに用いられる光学系において、前記第1および第2放射ビームは、前記光学系に関して対称的に軸外である前記構造体への入射角を有し、前記第1および第2の像は、周期的な前記構造体により前記光学系の軸を中心としたより狭い角度範囲内に回折した該放射を用いて形成および検出されることを特徴とする請求項1から9のいずれかに記載の方法。
- 前記第1および第2測定ステップにおいて、前記ゼロ次回折放射は、前記第1および第2の像を検出する検出装置と前記基板の間に設けられた絞り装置により遮断される、ことを特徴とする請求項1から10のいずれかに記載の方法。
- 基板へのリソグラフィプロセスに用いられるリソグラフィ装置の焦点を測定するよう構成された角度分解散乱計であって、前記リソグラフィプロセスは、基板上に構造体を形成するために用いられ、前記構造体は、前記リソグラフィ装置の基板上の焦点に依存する非対称性を有するプロファイルを持つ少なくとも一つのフィーチャを有しており、当該散乱計は、
第1および第2測定ステップで用いるために前記基板上に第1および第2放射ビームを供給する照明構成であって、放射源と前記基板の間に設けられた開口を有するビーム整形構成と、前記ビーム整形構成または前記基板を回転させる回転装置と、を備え、前記ビーム整形構成と前記基板とが第1の相対位置にあるときに前記第1放射ビームを前記基板上に供給し、前記ビーム整形構成または前記基板を回転することにより前記ビーム整形構成と前記基板とが第2の相対位置にあるときに前記第2放射ビームを前記基板上に供給する照明構成と、
前記第1および第2測定ステップの間に前記基板から回折した放射を用いて前記基板の第1および第2の像それぞれを形成および検出する検出構成と、
前記検出構成内の絞り構成と、を備え、
前記照明構成および前記絞り構成は共同して、非ゼロ次回折放射の第1および第2部分をそれぞれ用いて前記第1および第2の像が形成される間に、前記第1および第2の像に寄与するゼロ次回折放射を遮断するのに有効であり、前記第1および第2部分は、回折放射の回折スペクトルにおいて互いに対称的に向かい合っており、
当該散乱計はさらに、
前記第1および第2の像からフィーチャに対するプロファイルの非対称性を測定し、および/または測定された非対称性と、焦点と各フィーチャに関する非対称性との間の関係とを用いて、前記基板上の焦点の表示を提供するコンピュータ構成を備える、ことを特徴とする散乱計。 - 前記構造体は、特定の周期性を有しており、前記検出構成は、前記回折放射の第1および第2部分として1次および2次回折放射を測定するよう構成されることを特徴とする請求項12に記載の散乱計。
- 非対称性は、前記構造体の前記第1および第2の像の強度の測定から測定されることを特徴とする請求項12に記載の散乱計。
- 前記コンピュータ構成は、前記構造体の領域が前記第1および第2の像に表される基板の領域未満のとき、前記第1および第2の像の選択された部分を比較することを特徴とする請求項12に記載の散乱計。
- 前記コンピュータ構成は、異なる焦点値を用いて形成された複数の構造体のそれぞれに対し、前記第1および第2の像のそれぞれの一部を選択および比較し、そして非対称性と前記基板上の焦点との間の関係の測定に前記像の選択された部分を用いるよう構成されており、各構造体はリソグラフィ装置の焦点に依存する非対称性を持つ少なくとも一つのフィーチャを有している、ことを特徴とする請求項12に記載の散乱計。
- 非対称性と前記基板上の焦点との間の関係の測定に、リソグラフィシミュレーションが用いられることを特徴とする請求項16に記載の散乱計。
- 前記コンピュータ構成は、異なる焦点値を用いて形成された複数の構造体のそれぞれに対し、前記第1および第2の像のそれぞれの一部を選択および比較し、そして検出された部分の強度と前記基板上の焦点との間の関係の測定に前記像の選択された部分を用いるよう構成されており、各構造体はリソグラフィ装置の焦点に依存する非対称性を持つ少なくとも一つのフィーチャを有している、ことを特徴とする請求項12,13,14および15のいずれかに記載の散乱計。
- 検出された部分の強度と前記基板上の焦点との間の関係の測定に、リソグラフィシミュレーションが用いられることを特徴とする請求項18に記載の散乱計。
- 非ゼロ次回折放射の対称的に向かい合った前記第1および第2の部分は、実質的に+1次および−1次回折放射を備えることを特徴とする請求項12から19のいずれかに記載の散乱計。
- 前記測定ステップに用いられる光学系において、前記第1および第2放射ビームは、前記光学系に関して対称的に軸外である前記構造体への入射角を有し、前記第1および第2の像は、周期的な前記構造体により前記光学系の軸を中心としたより狭い角度範囲内に回折した該放射を用いて形成および検出されることを特徴とする請求項12から20のいずれかに記載の散乱計。
- リソグラフィ装置を備えるリソグラフィシステムであって、
前記リソグラフィ装置は、
パターンを照射するよう配置された照明光学系と、
前記パターンの像を基板上に投影するよう配置された投影光学系と、
請求項12から21のいずれかに記載の角度分解散乱計と、
を備えることを特徴とするリソグラフィシステム。 - 放射感応性層で基板をコートするコータと、
前記コータによりコートされた基板の放射感応層上に像を露光するよう配置されたリソグラフィ装置と、
前記リソグラフィ装置により露光された像を現像するよう配置されたディベロッパと、
請求項12から21のいずれかに記載の散乱計と、
を備えることを特徴とするリソグラフィセル。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23033109P | 2009-07-31 | 2009-07-31 | |
US61/230,331 | 2009-07-31 | ||
PCT/EP2010/060894 WO2011012624A1 (en) | 2009-07-31 | 2010-07-27 | Metrology method and apparatus, lithographic system, and lithographic processing cell |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013207180A Division JP5695153B2 (ja) | 2009-07-31 | 2013-10-02 | プロセス変動検出方法、角度分解散乱計、リソグラフィシステムおよびリソグラフィセル |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013501355A JP2013501355A (ja) | 2013-01-10 |
JP5545782B2 true JP5545782B2 (ja) | 2014-07-09 |
Family
ID=42830753
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012522153A Active JP5545782B2 (ja) | 2009-07-31 | 2010-07-27 | リソグラフィ装置の焦点測定方法、散乱計、リソグラフィシステム、およびリソグラフィセル |
JP2013207180A Active JP5695153B2 (ja) | 2009-07-31 | 2013-10-02 | プロセス変動検出方法、角度分解散乱計、リソグラフィシステムおよびリソグラフィセル |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013207180A Active JP5695153B2 (ja) | 2009-07-31 | 2013-10-02 | プロセス変動検出方法、角度分解散乱計、リソグラフィシステムおよびリソグラフィセル |
Country Status (7)
Country | Link |
---|---|
US (2) | US9081303B2 (ja) |
JP (2) | JP5545782B2 (ja) |
KR (2) | KR101429629B1 (ja) |
CN (1) | CN102498441B (ja) |
IL (3) | IL217288A (ja) |
NL (1) | NL2005162A (ja) |
WO (1) | WO2011012624A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014030048A (ja) * | 2009-07-31 | 2014-02-13 | Asml Netherlands Bv | プロセス変動検出方法、角度分解散乱計、リソグラフィシステムおよびリソグラフィセル |
JP2018517920A (ja) * | 2015-04-21 | 2018-07-05 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジ方法及び装置、コンピュータプログラム、並びにリソグラフィシステム |
Families Citing this family (573)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2004094A (en) | 2009-02-11 | 2010-08-12 | Asml Netherlands Bv | Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method. |
EP2470960A1 (en) * | 2009-08-24 | 2012-07-04 | ASML Netherlands BV | Metrology method and apparatus, lithographic apparatus, lithographic processing cell and substrate comprising metrology targets |
NL2007425A (en) * | 2010-11-12 | 2012-05-15 | Asml Netherlands Bv | Metrology method and apparatus, and device manufacturing method. |
US9140998B2 (en) | 2010-11-12 | 2015-09-22 | Asml Netherlands B.V. | Metrology method and inspection apparatus, lithographic system and device manufacturing method |
US9568872B2 (en) * | 2011-01-12 | 2017-02-14 | Nova Measuring Instruments Ltd. | Process control using non-zero order diffraction |
NL2008317A (en) | 2011-03-24 | 2012-09-25 | Asml Netherlands Bv | Substrate and patterning device for use in metrology, metrology method and device manufacturing method. |
US8681413B2 (en) | 2011-06-27 | 2014-03-25 | Kla-Tencor Corporation | Illumination control |
NL2008936A (en) | 2011-07-28 | 2013-01-29 | Asml Netherlands Bv | Illumination source for use in inspection methods and/or lithography inspection and lithographic apparatus and inspection method. |
CN103748515A (zh) * | 2011-08-23 | 2014-04-23 | Asml荷兰有限公司 | 量测方法和设备以及器件制造方法 |
EP2579100A3 (en) | 2011-10-03 | 2017-12-06 | ASML Holding N.V. | Inspection apparatus, lithographic apparatus, and device manufacturing method |
NL2009508A (en) | 2011-10-24 | 2013-04-25 | Asml Netherlands Bv | Metrology method and apparatus, and device manufacturing method. |
NL2010401A (en) | 2012-03-27 | 2013-09-30 | Asml Netherlands Bv | Metrology method and apparatus, lithographic system and device manufacturing method. |
NL2010458A (en) | 2012-04-16 | 2013-10-17 | Asml Netherlands Bv | Lithographic apparatus, substrate and device manufacturing method background. |
NL2010717A (en) | 2012-05-21 | 2013-11-25 | Asml Netherlands Bv | Determining a structural parameter and correcting an asymmetry property. |
NL2010734A (en) * | 2012-05-29 | 2013-12-02 | Asml Netherlands Bv | Metrology method and apparatus, substrate, lithographic system and device manufacturing method. |
US9466100B2 (en) * | 2012-06-06 | 2016-10-11 | Kla-Tencor Corporation | Focus monitoring method using asymmetry embedded imaging target |
CN104380203B (zh) * | 2012-06-12 | 2017-09-08 | Asml荷兰有限公司 | 光子源、检查设备、光刻***以及器件制造方法 |
NL2010905A (en) * | 2012-06-22 | 2013-12-24 | Asml Netherlands Bv | Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method. |
US9714827B2 (en) | 2012-07-05 | 2017-07-25 | Asml Netherlands B.V. | Metrology method and apparatus, lithographic system, device manufacturing method and substrate |
JP6169176B2 (ja) * | 2012-07-23 | 2017-07-26 | エーエスエムエル ネザーランズ ビー.ブイ. | 検査方法及び装置、リソグラフィシステム並びにデバイス製造方法 |
KR20140014509A (ko) * | 2012-07-24 | 2014-02-06 | 삼성전자주식회사 | 노광 장치의 높이 센서 및 이를 이용한 웨이퍼 고저 측량 방법 |
JP5992103B2 (ja) | 2012-07-30 | 2016-09-14 | エーエスエムエル ネザーランズ ビー.ブイ. | 位置測定装置、位置測定方法、リソグラフィ装置およびデバイス製造方法 |
US9778025B2 (en) | 2012-08-16 | 2017-10-03 | Asml Netherlands B.V. | Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method |
CN104919372A (zh) * | 2012-11-30 | 2015-09-16 | Asml荷兰有限公司 | 用于确定结构的光刻品质的光刻方法和设备 |
NL2011816A (en) | 2012-11-30 | 2014-06-04 | Asml Netherlands Bv | Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method. |
CN104076613B (zh) * | 2013-03-27 | 2016-12-28 | 上海微电子装备有限公司 | 基于圆形掩模的步进扫描光刻机及其曝光方法 |
US10180628B2 (en) | 2013-06-12 | 2019-01-15 | Asml Netherlands B.V. | Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method |
KR101855243B1 (ko) | 2013-08-07 | 2018-05-04 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
CN104423173B (zh) * | 2013-08-27 | 2016-09-28 | 上海微电子装备有限公司 | 套刻测量装置和方法 |
WO2015031337A1 (en) | 2013-08-27 | 2015-03-05 | Kla-Tencor Corporation | Removing process-variation-related inaccuracies from scatterometry measurements |
US9814126B2 (en) | 2013-10-17 | 2017-11-07 | Asml Netherlands B.V. | Photon source, metrology apparatus, lithographic system and device manufacturing method |
US9958791B2 (en) | 2013-10-30 | 2018-05-01 | Asml Netherlands B.V. | Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method |
NL2013737A (en) | 2013-11-26 | 2015-05-27 | Asml Netherlands Bv | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method. |
KR101872752B1 (ko) * | 2013-12-13 | 2018-06-29 | 에이에스엠엘 네델란즈 비.브이. | 방사선 소스, 계측 장치, 리소그래피 시스템 및 디바이스 제조 방법 |
WO2015086258A1 (en) | 2013-12-13 | 2015-06-18 | Asml Netherlands B.V. | Radiation source, metrology apparatus, lithographic system and device manufacturing method |
US10254075B2 (en) | 2013-12-16 | 2019-04-09 | Ravin Crossbows, Llc | Reduced length crossbow |
US10254073B2 (en) | 2013-12-16 | 2019-04-09 | Ravin Crossbows, Llc | Crossbow |
US10712118B2 (en) | 2013-12-16 | 2020-07-14 | Ravin Crossbows, Llc | Crossbow |
WO2015090838A1 (en) | 2013-12-19 | 2015-06-25 | Asml Netherlands B.V. | Inspection methods, substrates having metrology targets, lithographic system and device manufacturing method |
NL2014071A (en) | 2014-02-03 | 2015-08-06 | Asml Netherlands Bv | Metrology method and apparatus, substrate, lithographic system and device manufacturing method. |
KR102006316B1 (ko) | 2014-02-17 | 2019-08-01 | 에이에스엠엘 네델란즈 비.브이. | 에지 배치 오차를 결정하는 방법, 검사 장치, 패터닝 디바이스, 기판 및 디바이스 제조 방법 |
US10331043B2 (en) | 2014-02-21 | 2019-06-25 | Asml Netherlands B.V. | Optimization of target arrangement and associated target |
US9784690B2 (en) * | 2014-05-12 | 2017-10-10 | Kla-Tencor Corporation | Apparatus, techniques, and target designs for measuring semiconductor parameters |
JP6412163B2 (ja) | 2014-05-13 | 2018-10-24 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジーに用いられる基板及びパターニングデバイス、メトロロジー方法、及びデバイス製造方法 |
SG11201609566VA (en) | 2014-06-02 | 2016-12-29 | Asml Netherlands Bv | Method of designing metrology targets, substrates having metrology targets, method of measuring overlay, and device manufacturing method |
WO2016000914A1 (en) | 2014-06-30 | 2016-01-07 | Asml Netherlands B.V. | Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing method |
KR101948912B1 (ko) | 2014-07-09 | 2019-02-15 | 에이에스엠엘 네델란즈 비.브이. | 검사 장치, 검사 방법 및 디바이스 제조 방법 |
NL2015160A (en) | 2014-07-28 | 2016-07-07 | Asml Netherlands Bv | Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method. |
WO2016030205A1 (en) | 2014-08-28 | 2016-03-03 | Vrije Universiteit Amsterdam | Inspection apparatus, inspection method and manufacturing method |
KR101986258B1 (ko) | 2014-08-29 | 2019-06-07 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법, 타겟 및 기판 |
WO2016030227A1 (en) | 2014-08-29 | 2016-03-03 | Asml Netherlands B.V. | Method for controlling a distance between two objects, inspection apparatus and method |
US10680311B2 (en) | 2014-08-30 | 2020-06-09 | Huawei Technologies Co., Ltd. | Communications terminal |
CN107077079B (zh) | 2014-09-01 | 2018-12-14 | Asml荷兰有限公司 | 测量目标结构的属性的方法、检查设备、光刻***和器件制造方法 |
WO2016045945A1 (en) | 2014-09-26 | 2016-03-31 | Asml Netherlands B.V. | Inspection apparatus and device manufacturing method |
WO2016050453A1 (en) | 2014-10-03 | 2016-04-07 | Asml Netherlands B.V. | Focus monitoring arrangement and inspection apparatus including such an arragnement |
WO2016078862A1 (en) | 2014-11-21 | 2016-05-26 | Asml Netherlands B.V. | Metrology method and apparatus |
KR102355347B1 (ko) | 2014-11-26 | 2022-01-24 | 에이에스엠엘 네델란즈 비.브이. | 계측 방법, 컴퓨터 제품 및 시스템 |
EP3234694B1 (en) | 2014-12-15 | 2022-10-12 | ASML Holding N.V. | Method and apparatuses for optical pupil symmetrization |
WO2016096524A1 (en) | 2014-12-19 | 2016-06-23 | Asml Netherlands B.V. | Method of measuring asymmetry, inspection apparatus, lithographic system and device manufacturing method |
WO2016124393A1 (en) | 2015-02-04 | 2016-08-11 | Asml Netherlands B.V. | Metrology method and apparatus, computer program and lithographic system |
WO2016124345A1 (en) | 2015-02-04 | 2016-08-11 | Asml Netherlands B.V. | Metrology method, metrology apparatus and device manufacturing method |
NL2016121A (en) | 2015-02-06 | 2016-09-29 | Asml Netherlands Bv | A method and apparatus for improving measurement accuracy |
US9927722B2 (en) | 2015-02-25 | 2018-03-27 | Asml Netherlands B.V. | Method and apparatus for inspection and metrology |
KR102030100B1 (ko) | 2015-03-05 | 2019-10-08 | 에이에스엠엘 네델란즈 비.브이. | 검사와 계측을 위한 방법 및 장치 |
KR102125284B1 (ko) | 2015-03-11 | 2020-07-08 | 에이에스엠엘 네델란즈 비.브이. | 검사와 계측을 위한 방법 및 장치 |
US9766554B2 (en) * | 2015-03-16 | 2017-09-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for estimating focus and dose of an exposure process |
CN104655019B (zh) * | 2015-03-23 | 2018-05-29 | 京东方科技集团股份有限公司 | 关键尺寸测量方法和*** |
JP6602388B6 (ja) * | 2015-03-25 | 2020-01-15 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジ方法、メトロロジ装置、及びデバイス製造装置 |
WO2016156360A1 (en) | 2015-04-03 | 2016-10-06 | Asml Netherlands B.V. | Inspection apparatus for measuring properties of a target structure |
CN107567584B (zh) | 2015-05-04 | 2020-07-17 | Asml荷兰有限公司 | 用于检查及量测的方法和设备 |
US10520832B2 (en) * | 2015-05-19 | 2019-12-31 | Kla-Tencor Corporation | Topographic phase control for overlay measurement |
NL2016864A (en) | 2015-06-12 | 2016-12-12 | Asml Netherlands Bv | Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method |
KR102162234B1 (ko) | 2015-06-17 | 2020-10-07 | 에이에스엠엘 네델란즈 비.브이. | 레시피간 일치도에 기초한 레시피 선택 |
NL2016925A (en) | 2015-06-18 | 2016-12-22 | Asml Netherlands Bv | Method of metrology, inspection apparatus, lithographic system and device manufacturing method |
US10248029B2 (en) * | 2015-07-17 | 2019-04-02 | Asml Netherlands B.V. | Method and apparatus for inspection and metrology |
WO2017016839A1 (en) | 2015-07-24 | 2017-02-02 | Asml Netherlands B.V. | Inspection apparatus, inspection method, lithographic apparatus and manufacturing method |
WO2017024158A1 (en) * | 2015-08-06 | 2017-02-09 | Kla-Tencor Corporation | Focus metrology and targets which utilize transformations based on aerial images of the targets |
US10216096B2 (en) | 2015-08-14 | 2019-02-26 | Kla-Tencor Corporation | Process-sensitive metrology systems and methods |
WO2017029110A1 (en) | 2015-08-20 | 2017-02-23 | Asml Netherlands B.V. | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method |
NL2017300A (en) | 2015-08-27 | 2017-03-01 | Asml Netherlands Bv | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method |
CN108292107B (zh) | 2015-09-28 | 2020-12-08 | Asml荷兰有限公司 | 二维或三维形状的分层式表示 |
NL2017466A (en) | 2015-09-30 | 2017-04-05 | Asml Netherlands Bv | Metrology method, target and substrate |
WO2017055086A1 (en) | 2015-09-30 | 2017-04-06 | Asml Netherlands B.V. | Metrology method for process window definition |
KR102104843B1 (ko) | 2015-10-02 | 2020-04-28 | 에이에스엠엘 네델란즈 비.브이. | 계측 방법 및 장치, 컴퓨터 프로그램 및 리소그래피 시스템 |
NL2017505A (en) | 2015-10-09 | 2017-04-11 | Asml Netherlands Bv | Method and apparatus for inspection and metrology |
WO2017089105A1 (en) | 2015-11-27 | 2017-06-01 | Asml Netherlands B.V. | Metrology target, method and apparatus, computer program and lithographic system |
NL2017766A (en) | 2015-12-09 | 2017-06-14 | Asml Holding Nv | A flexible illuminator |
US11016397B2 (en) | 2015-12-17 | 2021-05-25 | Asml Netherlands B.V. | Source separation from metrology data |
WO2017102428A1 (en) | 2015-12-18 | 2017-06-22 | Asml Netherlands B.V. | Focus monitoring arrangement and inspection apparatus including such an arrangement |
WO2017108395A1 (en) | 2015-12-21 | 2017-06-29 | Asml Netherlands B.V. | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
NL2017844A (en) | 2015-12-22 | 2017-06-28 | Asml Netherlands Bv | Focus control arrangement and method |
NL2017949A (en) | 2015-12-23 | 2017-06-28 | Asml Netherlands Bv | Metrology method, target and substrate |
CN108431692B (zh) * | 2015-12-23 | 2021-06-18 | Asml荷兰有限公司 | 量测方法、量测设备和器件制造方法 |
WO2017114672A1 (en) | 2015-12-31 | 2017-07-06 | Asml Netherlands B.V. | Metrology by reconstruction |
JP6742413B2 (ja) | 2015-12-31 | 2020-08-19 | エーエスエムエル ホールディング エヌ.ブイ. | 検査システムの焦点合わせ方法及び装置 |
WO2017140528A1 (en) | 2016-02-19 | 2017-08-24 | Asml Netherlands B.V. | Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein |
CN108700829B (zh) | 2016-02-26 | 2021-05-18 | Asml荷兰有限公司 | 测量结构的方法、检查设备、光刻***、器件制造方法 |
US10546790B2 (en) * | 2016-03-01 | 2020-01-28 | Asml Netherlands B.V. | Method and apparatus to determine a patterning process parameter |
WO2017148665A1 (en) | 2016-03-01 | 2017-09-08 | Asml Netherlands B.V. | Metrology apparatus, method of measuring a structure and lithographic apparatus |
US10831111B2 (en) | 2016-03-03 | 2020-11-10 | Asml Netherlands B.V. | Metrology method and lithographic method, lithographic cell and computer program |
WO2017148759A1 (en) | 2016-03-04 | 2017-09-08 | Asml Netherlands B.V. | Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer program |
KR102169436B1 (ko) | 2016-03-07 | 2020-10-26 | 에이에스엠엘 네델란즈 비.브이. | 조명 시스템 및 계측 시스템 |
US11022896B2 (en) | 2016-03-11 | 2021-06-01 | Asml Netherlands B.V. | Mark position determination method |
WO2017178220A1 (en) | 2016-04-11 | 2017-10-19 | Asml Netherlands B.V. | Metrology target, method and apparatus, target design method, computer program and lithographic system |
US10942460B2 (en) | 2016-04-12 | 2021-03-09 | Asml Netherlands B.V. | Mark position determination method |
WO2017178285A1 (en) | 2016-04-15 | 2017-10-19 | Asml Netherlands B.V. | Method for adjusting actuation of a lithographic apparatus |
CN109073992B (zh) | 2016-04-22 | 2021-09-28 | Asml荷兰有限公司 | 堆叠差异的确定和使用堆叠差异的校正 |
CN109073568B (zh) | 2016-04-29 | 2022-01-11 | Asml荷兰有限公司 | 用于确定结构的特性的方法和装置、器件制造方法 |
WO2017198422A1 (en) | 2016-05-17 | 2017-11-23 | Asml Netherlands B.V. | Metrology robustness based on through-wavelength similarity |
US10983440B2 (en) | 2016-05-23 | 2021-04-20 | Asml Netherlands B.V. | Selection of substrate measurement recipes |
WO2017211545A1 (en) | 2016-06-09 | 2017-12-14 | Asml Netherlands B.V. | Metrology apparatus |
WO2017215944A1 (en) | 2016-06-15 | 2017-12-21 | Asml Netherlands B.V. | Substrate measurement recipe configuration to improve device matching |
EP3475972A4 (en) * | 2016-06-27 | 2020-02-26 | KLA-Tencor Corporation | APPARATUS AND METHOD FOR MEASURING PATTERN PLACEMENT AND PATTERN SIZE, AND CORRESPONDING COMPUTER PROGRAM |
WO2018001751A1 (en) | 2016-06-30 | 2018-01-04 | Asml Holding N.V. | Method and device for pupil illumination in overlay and critical dimension sensors |
WO2018001747A1 (en) | 2016-07-01 | 2018-01-04 | Asml Netherlands B.V. | Illumination system for a lithographic or inspection apparatus |
CN113552779A (zh) | 2016-07-15 | 2021-10-26 | Asml荷兰有限公司 | 用于量测目标场的设计的方法和设备 |
JP6716779B2 (ja) | 2016-07-21 | 2020-07-01 | エーエスエムエル ネザーランズ ビー.ブイ. | ターゲットの測定方法、基板、計測装置およびリソグラフィ装置 |
WO2018015181A1 (en) | 2016-07-22 | 2018-01-25 | Asml Netherlands B.V. | Method of predicting patterning defects caused by overlay error |
EP3279736A1 (en) | 2016-08-01 | 2018-02-07 | ASML Netherlands B.V. | Device and method for processing a radiation beam with coherence |
WO2018028971A1 (en) | 2016-08-11 | 2018-02-15 | Asml Holding N.V. | Variable corrector of a wave front |
WO2018033342A1 (en) | 2016-08-17 | 2018-02-22 | Asml Netherlands B.V. | Substrate measurement recipe design of, or for, a target including a latent image |
KR102221714B1 (ko) | 2016-08-23 | 2021-03-03 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 공정에 의해 기판 상에 형성된 구조체를 측정하는 메트롤로지 장치, 리소그래피 시스템, 및 리소그래피 공정에 의해 기판 상에 형성된 구조체를 측정하는 방법 |
WO2018041550A1 (en) | 2016-09-01 | 2018-03-08 | Asml Netherlands B.V. | Automatic selection of metrology target measurement recipes |
EP3290911A1 (en) | 2016-09-02 | 2018-03-07 | ASML Netherlands B.V. | Method and system to monitor a process apparatus |
WO2018046278A1 (en) | 2016-09-06 | 2018-03-15 | Asml Holding N.V. | Method and device for focusing in an inspection system |
EP3291008A1 (en) | 2016-09-06 | 2018-03-07 | ASML Netherlands B.V. | Method and apparatus to monitor a process apparatus |
EP3293574A1 (en) | 2016-09-09 | 2018-03-14 | ASML Netherlands B.V. | Metrology method, apparatus and computer program |
KR102323045B1 (ko) | 2016-09-12 | 2021-11-08 | 에이에스엠엘 네델란즈 비.브이. | 구조체의 속성 결정 방법, 검사 장치 및 디바이스 제조 방법 |
US11243470B2 (en) | 2016-09-12 | 2022-02-08 | Asml Netherlands B.V. | Method and apparatus for deriving corrections, method and apparatus for determining a property of a structure, device manufacturing method |
EP3293575A1 (en) | 2016-09-12 | 2018-03-14 | ASML Netherlands B.V. | Differential target design and method for process metrology |
EP3299890A1 (en) | 2016-09-27 | 2018-03-28 | ASML Netherlands B.V. | Metrology recipe selection |
IL265585B (en) | 2016-09-27 | 2022-09-01 | Asml Netherlands Bv | Choosing a metrological recipe |
EP3309616A1 (en) | 2016-10-14 | 2018-04-18 | ASML Netherlands B.V. | Method of inspecting a substrate, metrology apparatus, and lithographic system |
US10775323B2 (en) * | 2016-10-18 | 2020-09-15 | Kla-Tencor Corporation | Full beam metrology for X-ray scatterometry systems |
EP3321736A1 (en) | 2016-11-10 | 2018-05-16 | ASML Netherlands B.V. | Measurement system, lithographic system, and method of measuring a target |
WO2018087207A1 (en) | 2016-11-10 | 2018-05-17 | Asml Netherlands B.V. | Design and correction using stack difference |
EP3321738A1 (en) | 2016-11-10 | 2018-05-16 | ASML Netherlands B.V. | Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method |
EP3321737A1 (en) | 2016-11-10 | 2018-05-16 | ASML Netherlands B.V. | Method for determining an optimized set of measurement locations for measurement of a parameter of a lithographic process, metrology system |
WO2018095705A1 (en) | 2016-11-23 | 2018-05-31 | Asml Netherlands B.V. | Metrology using a plurality of metrology target measurement recipes |
WO2018099690A1 (en) * | 2016-12-02 | 2018-06-07 | Asml Netherlands B.V. | A method to change an etch parameter |
EP3333632A1 (en) | 2016-12-08 | 2018-06-13 | ASML Netherlands B.V. | Metrology apparatus |
EP3333633A1 (en) | 2016-12-09 | 2018-06-13 | ASML Netherlands B.V. | Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus |
US10983005B2 (en) | 2016-12-15 | 2021-04-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Spectroscopic overlay metrology |
EP3336605A1 (en) | 2016-12-15 | 2018-06-20 | ASML Netherlands B.V. | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method |
EP3336606A1 (en) | 2016-12-16 | 2018-06-20 | ASML Netherlands B.V. | Method for monitoring a characteristic of illumination from a metrology apparatus |
EP3336607A1 (en) | 2016-12-16 | 2018-06-20 | ASML Netherlands B.V. | Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method |
EP3796088A1 (en) | 2019-09-23 | 2021-03-24 | ASML Netherlands B.V. | Method and apparatus for lithographic process performance determination |
EP3343294A1 (en) | 2016-12-30 | 2018-07-04 | ASML Netherlands B.V. | Lithographic process & apparatus and inspection process and apparatus |
US10209627B2 (en) * | 2017-01-06 | 2019-02-19 | Kla-Tencor Corporation | Systems and methods for focus-sensitive metrology targets |
CN108333880B (zh) * | 2017-01-19 | 2020-08-04 | 上海微电子装备(集团)股份有限公司 | 光刻曝光装置及其焦面测量装置和方法 |
CN110249268B (zh) | 2017-02-02 | 2021-08-24 | Asml荷兰有限公司 | 量测方法和设备以及关联的计算机产品 |
EP3358413A1 (en) | 2017-02-02 | 2018-08-08 | ASML Netherlands B.V. | Metrology method, apparatus and computer program |
US10139205B2 (en) | 2017-02-15 | 2018-11-27 | Ravin Crossbows, Llc | High impact strength nock assembly |
USD839374S1 (en) | 2017-02-15 | 2019-01-29 | Ravin Crossbow, LLC | Nock for an archery arrow |
KR102370339B1 (ko) | 2017-02-22 | 2022-03-04 | 에이에스엠엘 네델란즈 비.브이. | 전산 계측 |
WO2018172027A1 (en) | 2017-03-23 | 2018-09-27 | Asml Netherlands B.V. | Asymmetry monitoring of a structure |
EP3388896A1 (en) | 2017-04-14 | 2018-10-17 | ASML Netherlands B.V. | Method of measuring |
JP6933725B2 (ja) | 2017-04-14 | 2021-09-08 | エーエスエムエル ネザーランズ ビー.ブイ. | 測定方法、デバイス製造方法、計測装置およびリソグラフィシステム |
IL270171B2 (en) | 2017-04-28 | 2023-12-01 | Asml Netherlands Bv | Method and apparatus for metrology and related computer software |
WO2018202388A1 (en) | 2017-05-03 | 2018-11-08 | Asml Netherlands B.V. | Metrology parameter determination and metrology recipe selection |
US11016396B2 (en) | 2017-05-04 | 2021-05-25 | Asml Holding N.V | Method, substrate and apparatus to measure performance of optical metrology |
JP2020519928A (ja) | 2017-05-08 | 2020-07-02 | エーエスエムエル ネザーランズ ビー.ブイ. | 構造を測定する方法、検査装置、リソグラフィシステム、及びデバイス製造方法 |
EP3401733A1 (en) | 2017-05-08 | 2018-11-14 | ASML Netherlands B.V. | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method |
WO2018215177A1 (en) | 2017-05-24 | 2018-11-29 | Asml Netherlands B.V. | Method of measuring a parameter of interest, inspection apparatus, lithographic system and device manufacturing method |
CN108962776B (zh) * | 2017-05-26 | 2021-05-18 | 台湾积体电路制造股份有限公司 | 半导体装置及其制造方法和覆盖误差的测量方法 |
US11092902B2 (en) | 2017-06-21 | 2021-08-17 | Asml Netherlands B.V. | Method and apparatus for detecting substrate surface variations |
US10274836B2 (en) | 2017-06-23 | 2019-04-30 | International Business Machines Corporation | Determination of lithography effective dose uniformity |
EP3422102A1 (en) | 2017-06-26 | 2019-01-02 | ASML Netherlands B.V. | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
EP3422103A1 (en) | 2017-06-26 | 2019-01-02 | ASML Netherlands B.V. | Method of determining a performance parameter of a process |
EP3422105A1 (en) | 2017-06-30 | 2019-01-02 | ASML Netherlands B.V. | Metrology parameter determination and metrology recipe selection |
EP3432072A1 (en) | 2017-07-18 | 2019-01-23 | ASML Netherlands B.V. | Methods and apparatus for measurement of a parameter of a feature fabricated on a semiconductor substrate |
WO2019015995A1 (en) | 2017-07-18 | 2019-01-24 | Asml Netherlands B.V. | METHODS AND APPARATUS FOR MEASURING A PARAMETER OF A CHARACTERISTIC MANUFACTURED ON A SEMICONDUCTOR SUBSTRATE |
EP3435161A1 (en) * | 2017-07-24 | 2019-01-30 | ASML Netherlands B.V. | Determining an edge roughness parameter of a periodic structure |
WO2019020484A1 (en) | 2017-07-25 | 2019-01-31 | Asml Netherlands B.V. | METHOD FOR DETERMINING PARAMETERS AND ASSOCIATED APPARATUS |
CN107449740A (zh) * | 2017-07-26 | 2017-12-08 | 嘉兴申宁精密科技有限公司 | 一种用于测量样品的衍射结构的装置及方法 |
EP3435162A1 (en) | 2017-07-28 | 2019-01-30 | ASML Netherlands B.V. | Metrology method and apparatus and computer program |
EP3441819A1 (en) | 2017-08-07 | 2019-02-13 | ASML Netherlands B.V. | Computational metrology |
US11067902B2 (en) | 2017-08-07 | 2021-07-20 | Asml Netherlands B.V. | Computational metrology |
EP3444674A1 (en) | 2017-08-14 | 2019-02-20 | ASML Netherlands B.V. | Method and apparatus to determine a patterning process parameter |
EP3444676A1 (en) | 2017-08-15 | 2019-02-20 | ASML Netherlands B.V. | Metrology method, apparatus and computer program |
EP3447580A1 (en) | 2017-08-21 | 2019-02-27 | ASML Netherlands B.V. | Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method |
WO2019038054A1 (en) | 2017-08-23 | 2019-02-28 | Asml Netherlands B.V. | METHOD FOR DETERMINING A PARAMETER OF A PATTERN TRANSFER PROCESS, DEVICE MANUFACTURING METHOD |
EP3451060A1 (en) | 2017-08-28 | 2019-03-06 | ASML Netherlands B.V. | Substrate, metrology apparatus and associated methods for a lithographic process |
CN111066096A (zh) | 2017-09-01 | 2020-04-24 | Asml荷兰有限公司 | 光学***、量测装置及相关联的方法 |
EP3451061A1 (en) | 2017-09-04 | 2019-03-06 | ASML Netherlands B.V. | Method for monitoring a manufacturing process |
EP3454123A1 (en) | 2017-09-06 | 2019-03-13 | ASML Netherlands B.V. | Metrology method and apparatus |
EP3454124A1 (en) | 2017-09-07 | 2019-03-13 | ASML Netherlands B.V. | Method to determine a patterning process parameter |
EP3462239A1 (en) | 2017-09-27 | 2019-04-03 | ASML Netherlands B.V. | Metrology in lithographic processes |
EP3454127A1 (en) | 2017-09-11 | 2019-03-13 | ASML Netherlands B.V. | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
IL273110B2 (en) | 2017-09-11 | 2024-03-01 | Asml Netherlands Bv | Patterning methods and devices and devices for measuring focus performance of a lithographic device, method of device manufacture |
IL273145B2 (en) | 2017-09-11 | 2024-03-01 | Asml Netherlands Bv | Lithographic processes in meteorology |
EP3457211A1 (en) | 2017-09-13 | 2019-03-20 | ASML Netherlands B.V. | A method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatus |
EP3457212A1 (en) | 2017-09-18 | 2019-03-20 | ASML Netherlands B.V. | Method of controlling a patterning process, device manufacturing method |
WO2019057578A1 (en) | 2017-09-22 | 2019-03-28 | Asml Netherlands B.V. | METHOD FOR DETERMINING A PARAMETER OF PATTERN CREATION PROCESS |
EP3460574A1 (en) | 2017-09-22 | 2019-03-27 | ASML Netherlands B.V. | Method to determine a patterning process parameter |
CN111149062B (zh) | 2017-09-28 | 2022-11-04 | Asml控股股份有限公司 | 量测方法和装置 |
JP7124071B2 (ja) | 2017-10-05 | 2022-08-23 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板上の1つ又は複数の構造の特性を決定するためのメトロロジシステムおよび方法 |
EP3480554A1 (en) | 2017-11-02 | 2019-05-08 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
TW201923332A (zh) | 2017-10-10 | 2019-06-16 | 荷蘭商Asml荷蘭公司 | 度量衡方法和設備、電腦程式及微影系統 |
EP3470923A1 (en) | 2017-10-10 | 2019-04-17 | ASML Netherlands B.V. | Metrology method |
EP3470924A1 (en) | 2017-10-11 | 2019-04-17 | ASML Netherlands B.V. | Method of optimizing the position and/or size of a measurement illumination spot relative to a target on a substrate, and associated apparatus |
EP3474074A1 (en) * | 2017-10-17 | 2019-04-24 | ASML Netherlands B.V. | Scatterometer and method of scatterometry using acoustic radiation |
CN111279268B (zh) | 2017-10-26 | 2022-04-01 | Asml荷兰有限公司 | 确定所关注的参数的值的方法、清除包含关于所关注的参数的信息的信号的方法 |
EP3477391A1 (en) | 2017-10-26 | 2019-05-01 | ASML Netherlands B.V. | Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest |
WO2019086221A1 (en) | 2017-10-31 | 2019-05-09 | Asml Netherlands B.V. | Metrology apparatus, method of measuring a structure, device manufacturing method |
EP3477392A1 (en) | 2017-10-31 | 2019-05-01 | ASML Netherlands B.V. | Metrology apparatus, method of measuring a structure, device manufacturing method |
EP3480659A1 (en) | 2017-11-01 | 2019-05-08 | ASML Netherlands B.V. | Estimation of data in metrology |
KR102408786B1 (ko) | 2017-11-07 | 2022-06-13 | 에이에스엠엘 네델란즈 비.브이. | 관심 특성을 결정하는 계측 장치 및 방법 |
EP3499312A1 (en) | 2017-12-15 | 2019-06-19 | ASML Netherlands B.V. | Metrology apparatus and a method of determining a characteristic of interest |
EP3489756A1 (en) | 2017-11-23 | 2019-05-29 | ASML Netherlands B.V. | Method and apparatus to determine a patterning process parameter |
WO2019110211A1 (en) | 2017-12-04 | 2019-06-13 | Asml Netherlands B.V. | Measurement method, patterning device and device manufacturing method |
EP3492985A1 (en) | 2017-12-04 | 2019-06-05 | ASML Netherlands B.V. | Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets |
EP3492984A1 (en) | 2017-12-04 | 2019-06-05 | ASML Netherlands B.V. | Measurement method, inspection apparatus, patterning device, lithographic system and device manufacturing method |
EP3495888A1 (en) | 2017-12-06 | 2019-06-12 | ASML Netherlands B.V. | Method for controlling a lithographic apparatus and associated apparatuses |
EP3495889A1 (en) | 2017-12-07 | 2019-06-12 | ASML Netherlands B.V. | Method for controlling a manufacturing apparatus and associated apparatuses |
CN111480113A (zh) | 2017-12-12 | 2020-07-31 | Asml荷兰有限公司 | 用于确定与表膜相关的状态的设备和方法 |
EP3499311A1 (en) | 2017-12-14 | 2019-06-19 | ASML Netherlands B.V. | Method for controlling a manufacturing apparatus and associated aparatuses |
JP2021508078A (ja) | 2017-12-19 | 2021-02-25 | エーエスエムエル ネザーランズ ビー.ブイ. | 計算メトロロジに基づく補正および制御 |
WO2019121486A1 (en) | 2017-12-22 | 2019-06-27 | Asml Netherlands B.V. | Process window based on defect probability |
CN111512238B (zh) | 2017-12-28 | 2024-01-30 | Asml荷兰有限公司 | 从设备部件中移除污染物颗粒的设备和方法 |
EP3528048A1 (en) | 2018-02-15 | 2019-08-21 | ASML Netherlands B.V. | A metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate |
CN111542783A (zh) | 2017-12-28 | 2020-08-14 | Asml荷兰有限公司 | 用于确定衬底上的结构的感兴趣的特性的量测设备与方法 |
WO2019129468A1 (en) | 2017-12-29 | 2019-07-04 | Asml Netherlands B.V. | Method of processing data, method of obtaining calibration data |
WO2019129485A1 (en) | 2017-12-29 | 2019-07-04 | Asml Netherlands B.V. | Method and device for determining adjustments to sensitivity parameters |
CN111615667A (zh) | 2018-01-17 | 2020-09-01 | Asml荷兰有限公司 | 测量目标的方法和量测设备 |
EP3514628A1 (en) | 2018-01-18 | 2019-07-24 | ASML Netherlands B.V. | Method of measuring a target, and metrology apparatus |
CN110068446B (zh) * | 2018-01-23 | 2020-11-13 | 舜宇光学(浙江)研究院有限公司 | 基于图像的衍射光学元件的衍射效率测试方法 |
WO2019145092A1 (en) | 2018-01-24 | 2019-08-01 | Asml Netherlands B.V. | Computational metrology based sampling scheme |
NL2022264A (en) | 2018-01-26 | 2019-07-30 | Asml Netherlands Bv | Apparatus and methods for determining the position of a target structure on a substrate |
WO2019149586A1 (en) | 2018-01-30 | 2019-08-08 | Asml Netherlands B.V. | Method of patterning at least a layer of a semiconductor device |
EP3518040A1 (en) | 2018-01-30 | 2019-07-31 | ASML Netherlands B.V. | A measurement apparatus and a method for determining a substrate grid |
EP3521930A1 (en) | 2018-02-02 | 2019-08-07 | ASML Netherlands B.V. | Method of optimizing a metrology process |
EP3521929A1 (en) | 2018-02-02 | 2019-08-07 | ASML Netherlands B.V. | Method of determining an optimal focus height for a metrology apparatus |
EP3528047A1 (en) | 2018-02-14 | 2019-08-21 | ASML Netherlands B.V. | Method and apparatus for measuring a parameter of interest using image plane detection techniques |
EP3531205A1 (en) | 2018-02-22 | 2019-08-28 | ASML Netherlands B.V. | Control based on probability density function of parameter |
WO2019162280A1 (en) | 2018-02-23 | 2019-08-29 | Asml Netherlands B.V. | Guided patterning device inspection |
US11379970B2 (en) | 2018-02-23 | 2022-07-05 | Asml Netherlands B.V. | Deep learning for semantic segmentation of pattern |
EP3531191A1 (en) | 2018-02-27 | 2019-08-28 | Stichting VU | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
WO2019166190A1 (en) | 2018-02-27 | 2019-09-06 | Stichting Vu | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
EP3547031A1 (en) | 2018-03-29 | 2019-10-02 | ASML Netherlands B.V. | Method for evaluating control strategies in a semicondcutor manufacturing process |
EP3547029A1 (en) | 2018-03-29 | 2019-10-02 | ASML Netherlands B.V. | Control method for a scanning exposure apparatus |
WO2019185230A1 (en) | 2018-03-29 | 2019-10-03 | Asml Netherlands B.V. | Control method for a scanning exposure apparatus |
EP3547030A1 (en) | 2018-03-29 | 2019-10-02 | ASML Netherlands B.V. | Method for evaluating control strategies in a semicondcutor manufacturing process |
EP3553602A1 (en) * | 2018-04-09 | 2019-10-16 | ASML Netherlands B.V. | Model based reconstruction of semiconductor structures |
EP3553603A1 (en) | 2018-04-13 | 2019-10-16 | ASML Netherlands B.V. | Metrology method and apparatus, computer program and lithographic system |
EP3557327A1 (en) | 2018-04-18 | 2019-10-23 | ASML Netherlands B.V. | Method of determining a value of a parameter of interest of a target formed by a patterning process |
WO2019211827A1 (en) * | 2018-04-30 | 2019-11-07 | B. G. Negev Technologies And Applications Ltd., At Ben-Gurion University | Scatterometry with high harmonic generation (hhg) sources |
EP3570109A1 (en) | 2018-05-14 | 2019-11-20 | ASML Netherlands B.V. | Illumination source for an inspection apparatus, inspection apparatus and inspection method |
TWI791196B (zh) | 2018-05-24 | 2023-02-01 | 荷蘭商Asml荷蘭公司 | 判定基板之堆疊組態之方法及其相關非暫時性電腦可讀媒體 |
EP3575874A1 (en) | 2018-05-29 | 2019-12-04 | ASML Netherlands B.V. | Metrology method, apparatus and computer program |
EP3575875A1 (en) | 2018-05-31 | 2019-12-04 | ASML Netherlands B.V. | Measurement apparatus and method of measuring a target |
EP3579052A1 (en) | 2018-06-08 | 2019-12-11 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
CN116758012A (zh) | 2018-06-08 | 2023-09-15 | Asml荷兰有限公司 | 确定与在衬底上的结构相关的感兴趣的特性的方法、掩模版、衬底 |
CN112262345B (zh) | 2018-06-13 | 2024-03-12 | Asml荷兰有限公司 | 量测设备 |
EP3614207A1 (en) | 2018-08-21 | 2020-02-26 | ASML Netherlands B.V. | Metrology apparatus |
EP3582009A1 (en) | 2018-06-15 | 2019-12-18 | ASML Netherlands B.V. | Reflector and method of manufacturing a reflector |
EP3584637A1 (en) | 2018-06-19 | 2019-12-25 | ASML Netherlands B.V. | Method for controlling a manufacturing apparatus and associated apparatuses |
KR20210013605A (ko) | 2018-06-19 | 2021-02-04 | 에이에스엠엘 네델란즈 비.브이. | 제조 장치 및 연계된 장치를 제어하는 방법 |
EP3588190A1 (en) | 2018-06-25 | 2020-01-01 | ASML Netherlands B.V. | Method for performing a manufacturing process and associated apparatuses |
EP3598235A1 (en) | 2018-07-18 | 2020-01-22 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate |
WO2020020759A1 (en) | 2018-07-26 | 2020-01-30 | Asml Netherlands B.V. | Method for determining an etch profile of a layer of a wafer for a simulation system |
NL2021852A (en) | 2018-08-01 | 2018-11-09 | Asml Netherlands Bv | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
EP3605230A1 (en) | 2018-08-01 | 2020-02-05 | Stichting VU | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
EP3611570A1 (en) | 2018-08-16 | 2020-02-19 | ASML Netherlands B.V. | Method for controlling a manufacturing process and associated apparatuses |
EP3611569A1 (en) | 2018-08-16 | 2020-02-19 | ASML Netherlands B.V. | Metrology apparatus and photonic crystal fiber |
TWI824334B (zh) | 2018-08-17 | 2023-12-01 | 荷蘭商Asml荷蘭公司 | 非暫時性電腦可讀媒體 |
EP3614194A1 (en) | 2018-08-24 | 2020-02-26 | ASML Netherlands B.V. | Matching pupil determination |
CN112639622B (zh) | 2018-09-04 | 2024-03-19 | Asml荷兰有限公司 | 量测设备 |
EP3620857A1 (en) | 2018-09-04 | 2020-03-11 | ASML Netherlands B.V. | Metrology apparatus |
EP3623868A1 (en) | 2018-09-12 | 2020-03-18 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
EP3623869A1 (en) | 2018-09-14 | 2020-03-18 | ASML Netherlands B.V. | Method for measuring a parameter of a structure formed using a lithographic process |
WO2020057900A1 (en) | 2018-09-19 | 2020-03-26 | Asml Netherlands B.V. | Metrology sensor for position metrology |
EP3627226A1 (en) | 2018-09-20 | 2020-03-25 | ASML Netherlands B.V. | Optical system, metrology apparatus and associated method |
EP3629086A1 (en) | 2018-09-25 | 2020-04-01 | ASML Netherlands B.V. | Method and apparatus for determining a radiation beam intensity profile |
US11087065B2 (en) | 2018-09-26 | 2021-08-10 | Asml Netherlands B.V. | Method of manufacturing devices |
EP3629087A1 (en) | 2018-09-26 | 2020-04-01 | ASML Netherlands B.V. | Method of manufacturing devices |
TW202020577A (zh) | 2018-09-28 | 2020-06-01 | 荷蘭商Asml荷蘭公司 | 基於晶圓量測判定熱點排序 |
US10996570B2 (en) | 2018-10-08 | 2021-05-04 | Asml Netherlands B.V. | Metrology method, patterning device, apparatus and computer program |
EP3637187A1 (en) | 2018-10-12 | 2020-04-15 | ASML Netherlands B.V. | Method for measuring focus performance of a lithographic apparatus |
EP3647874A1 (en) | 2018-11-05 | 2020-05-06 | ASML Netherlands B.V. | Optical fibers and production methods therefor |
SG11202103803QA (en) | 2018-10-24 | 2021-05-28 | Asml Netherlands Bv | Optical fibers and production methods therefor |
EP3647871A1 (en) | 2018-10-31 | 2020-05-06 | ASML Netherlands B.V. | Method of determing a value of a parameter of interest of a patterning process, device manufacturing method |
WO2020094385A1 (en) | 2018-11-08 | 2020-05-14 | Asml Netherlands B.V. | Prediction of out of specification based on spatial characteristic of process variability |
EP3650941A1 (en) | 2018-11-12 | 2020-05-13 | ASML Netherlands B.V. | Method of determining the contribution of a processing apparatus to a substrate parameter |
EP3654103A1 (en) | 2018-11-14 | 2020-05-20 | ASML Netherlands B.V. | Method for obtaining training data for training a model of a semicondcutor manufacturing process |
WO2020099050A1 (en) | 2018-11-16 | 2020-05-22 | Asml Netherlands B.V. | Method for monitoring lithographic apparatus |
EP3654104A1 (en) | 2018-11-16 | 2020-05-20 | ASML Netherlands B.V. | Method for monitoring lithographic apparatus |
EP3657256A1 (en) | 2018-11-20 | 2020-05-27 | ASML Netherlands B.V. | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
EP3657257A1 (en) | 2018-11-26 | 2020-05-27 | ASML Netherlands B.V. | Method for of measuring a focus parameter relating to a structure formed using a lithographic process |
WO2020114684A1 (en) | 2018-12-03 | 2020-06-11 | Asml Netherlands B.V. | Method of manufacturing devices |
CN113168119B (zh) | 2018-12-04 | 2024-05-14 | Asml荷兰有限公司 | 用于测量光刻过程的参数的目标 |
EP3663856A1 (en) | 2018-12-07 | 2020-06-10 | ASML Netherlands B.V. | Method for adjusting a target feature in a model of a patterning process based on local electric fields |
US20220028052A1 (en) | 2018-12-14 | 2022-01-27 | Asml Netherlands B.V. | Apparatus and method for grouping image patterns to determine wafer behavior in a patterning process |
EP3671346A1 (en) | 2018-12-18 | 2020-06-24 | ASML Netherlands B.V. | Method of measuring a parameter of a patterning process, metrology apparatus, target |
WO2020126266A1 (en) | 2018-12-18 | 2020-06-25 | Asml Netherlands B.V. | Method of measuring a parameter of a patterning process, metrology apparatus, target |
CN113196177B (zh) | 2018-12-20 | 2024-04-30 | Asml荷兰有限公司 | 量测传感器、照射***、和产生具有能够配置的照射斑直径的测量照射的方法 |
CN113227907A (zh) | 2018-12-28 | 2021-08-06 | Asml荷兰有限公司 | 基于来自经印刷的衬底的测量反馈确定图案分级 |
WO2020141049A1 (en) | 2018-12-31 | 2020-07-09 | Asml Netherlands B.V. | Method for metrology optimization |
WO2020141085A1 (en) | 2018-12-31 | 2020-07-09 | Asml Netherlands B.V. | Method for overlay metrology and apparatus thereof |
EP3715951A1 (en) | 2019-03-28 | 2020-09-30 | ASML Netherlands B.V. | Position metrology apparatus and associated optical elements |
US11892776B2 (en) | 2018-12-31 | 2024-02-06 | Asml Netherlands B.V. | Imaging via zeroth order suppression |
WO2020141050A1 (en) | 2018-12-31 | 2020-07-09 | Asml Netherlands B.V. | Position metrology apparatus and associated optical elements |
KR20210096659A (ko) | 2018-12-31 | 2021-08-05 | 에이에스엠엘 네델란즈 비.브이. | 계측 방법 |
US11733615B2 (en) | 2019-01-03 | 2023-08-22 | Asml Netherlands B.V. | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
US11333982B2 (en) | 2019-01-28 | 2022-05-17 | Kla Corporation | Scaling metric for quantifying metrology sensitivity to process variation |
EP3703114A1 (en) | 2019-02-26 | 2020-09-02 | ASML Netherlands B.V. | Reflector manufacturing method and associated reflector |
EP3702840A1 (en) | 2019-03-01 | 2020-09-02 | ASML Netherlands B.V. | Alignment method and associated metrology device |
EP3705945A1 (en) | 2019-03-08 | 2020-09-09 | ASML Netherlands B.V. | Methods and apparatus for estimating substrate shape |
US20220146946A1 (en) | 2019-03-22 | 2022-05-12 | Asml Netherlands B.V. | Method for controlling a lithographic apparatus and associated apparatuses |
EP3764164A1 (en) | 2019-07-11 | 2021-01-13 | ASML Netherlands B.V. | Method for controlling a lithographic apparatus and associated apparatuses |
JP7281553B2 (ja) | 2019-03-25 | 2023-05-25 | エーエスエムエル ネザーランズ ビー.ブイ. | 周波数拡大装置及び方法 |
EP3715944A1 (en) | 2019-03-25 | 2020-09-30 | ASML Netherlands B.V. | Frequency broadening apparatus and method |
EP3719551A1 (en) | 2019-04-03 | 2020-10-07 | ASML Netherlands B.V. | Optical fiber |
EP3948373A1 (en) | 2019-04-03 | 2022-02-09 | ASML Netherlands B.V. | Optical fiber |
JP7288974B2 (ja) | 2019-04-04 | 2023-06-08 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィプロセスのサブフィールド制御および関連する装置 |
EP3734366A1 (en) | 2019-05-03 | 2020-11-04 | ASML Netherlands B.V. | Sub-field control of a lithographic process and associated apparatus |
WO2020224882A1 (en) | 2019-05-06 | 2020-11-12 | Asml Netherlands B.V. | Dark field microscope |
EP3739389A1 (en) | 2019-05-17 | 2020-11-18 | ASML Netherlands B.V. | Metrology tools comprising aplanatic objective singlet |
EP3751342A1 (en) | 2019-06-13 | 2020-12-16 | Stichting VU | Metrology method and method for training a data structure for use in metrology |
EP3754427A1 (en) | 2019-06-17 | 2020-12-23 | ASML Netherlands B.V. | Metrology method and apparatus for of determining a complex-valued field |
CN114008531A (zh) | 2019-06-17 | 2022-02-01 | Asml荷兰有限公司 | 用于确定复值场的量测方法和装置 |
CN114008533A (zh) | 2019-06-20 | 2022-02-01 | Asml荷兰有限公司 | 用于图案化过程建模的方法 |
EP3767347A1 (en) | 2019-07-17 | 2021-01-20 | ASML Netherlands B.V. | Mounted hollow-core fibre arrangement |
KR20220008912A (ko) | 2019-06-21 | 2022-01-21 | 에이에스엠엘 네델란즈 비.브이. | 장착된 중공 코어 섬유 배열체 |
WO2021001102A1 (en) | 2019-07-02 | 2021-01-07 | Asml Netherlands B.V. | Metrology method and associated metrology and lithographic apparatuses |
EP3994526A1 (en) | 2019-07-03 | 2022-05-11 | ASML Netherlands B.V. | Method for applying a deposition model in a semiconductor manufacturing process |
US20220244649A1 (en) | 2019-07-04 | 2022-08-04 | Asml Netherlands B.V. | Sub-field control of a lithographic process and associated apparatus |
EP3767391A1 (en) | 2019-07-17 | 2021-01-20 | ASML Netherlands B.V. | Sub-field control of a lithographic process and associated apparatus |
CN114080536A (zh) | 2019-07-08 | 2022-02-22 | Asml荷兰有限公司 | 量测方法和相关的计算机产品 |
EP3611567A3 (en) | 2019-07-23 | 2020-05-13 | ASML Netherlands B.V. | Improvements in metrology targets |
KR20220024908A (ko) | 2019-07-24 | 2022-03-03 | 에이에스엠엘 네델란즈 비.브이. | 방사선 소스 |
EP3796080A1 (en) | 2019-09-18 | 2021-03-24 | ASML Netherlands B.V. | Radiation source |
US11581264B2 (en) * | 2019-08-21 | 2023-02-14 | Micron Technology, Inc. | Electronic devices comprising overlay marks, memory devices comprising overlay marks, and related methods |
EP3783439A1 (en) | 2019-08-22 | 2021-02-24 | ASML Netherlands B.V. | Metrology device and detection apparatus therefor |
CN114341739A (zh) | 2019-08-30 | 2022-04-12 | Asml控股股份有限公司 | 计量***和方法 |
EP3786713A1 (en) | 2019-09-02 | 2021-03-03 | ASML Netherlands B.V. | Metrology method and device for determining a complex-valued field |
CN114303102B (zh) | 2019-09-03 | 2024-06-11 | Asml荷兰有限公司 | 用于准直宽带辐射的组件 |
EP3792673A1 (en) | 2019-09-16 | 2021-03-17 | ASML Netherlands B.V. | Assembly for collimating broadband radiation |
US20220326152A1 (en) | 2019-09-05 | 2022-10-13 | Asml Netherlands B.V. | An improved high harmonic generation apparatus |
EP3790364A1 (en) | 2019-09-05 | 2021-03-10 | ASML Netherlands B.V. | An improved high harmonic generation apparatus |
EP3792693A1 (en) | 2019-09-16 | 2021-03-17 | ASML Netherlands B.V. | Sub-field control of a lithographic process and associated apparatus |
EP3805857A1 (en) | 2019-10-09 | 2021-04-14 | ASML Netherlands B.V. | Improved broadband radiation generation in hollow-core fibres |
EP3796089A1 (en) * | 2019-09-18 | 2021-03-24 | ASML Holding N.V. | A method for filtering an image and associated metrology apparatus |
CN114514465A (zh) | 2019-09-18 | 2022-05-17 | Asml荷兰有限公司 | 中空芯部光纤中的改进的宽带辐射生成 |
EP3798729A1 (en) | 2019-09-26 | 2021-03-31 | ASML Netherlands B.V. | Method for inferring a processing parameter such as focus and associated appratuses and manufacturing method |
WO2021063728A1 (en) | 2019-10-02 | 2021-04-08 | Asml Netherlands B.V. | Process monitoring and tuning using prediction models |
US20240118629A1 (en) | 2019-10-17 | 2024-04-11 | Asml Netherlands B.V. | Methods of fitting measurement data to a model and modeling a performance parameter distribution and associated apparatuses |
CN114830026A (zh) | 2019-10-17 | 2022-07-29 | Asml荷兰有限公司 | 照射源和相关的量测设备 |
EP3839621A1 (en) | 2019-12-16 | 2021-06-23 | ASML Netherlands B.V. | An illumination source and associated metrology apparatus |
EP3809203A1 (en) | 2019-10-17 | 2021-04-21 | ASML Netherlands B.V. | Methods of fitting measurement data to a model and modeling a performance parameter distribution and associated apparatuses |
EP3816721A1 (en) | 2019-10-29 | 2021-05-05 | ASML Netherlands B.V. | Method and apparatus for efficient high harmonic generation |
KR20220065872A (ko) | 2019-11-01 | 2022-05-20 | 에이에스엠엘 네델란즈 비.브이. | 계측 방법 및 리소그래피 장치 |
EP3869270A1 (en) | 2020-02-18 | 2021-08-25 | ASML Netherlands B.V. | Assemblies and methods for guiding radiation |
CN114651214A (zh) | 2019-11-05 | 2022-06-21 | Asml荷兰有限公司 | 测量方法和测量设备 |
JP7357151B2 (ja) | 2019-11-07 | 2023-10-05 | エーエスエムエル ホールディング エヌ.ブイ. | リソグラフィ装置の一部を洗浄するためのシステム |
KR20220079662A (ko) | 2019-11-11 | 2022-06-13 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 시스템을 위한 교정 방법 |
EP3828632A1 (en) | 2019-11-29 | 2021-06-02 | ASML Netherlands B.V. | Method and system for predicting electric field images with a parameterized model |
US20230004096A1 (en) | 2019-11-29 | 2023-01-05 | Asml Netherlands B.V. | Method and system for predicting process information with a parameterized model |
US11762305B2 (en) | 2019-12-05 | 2023-09-19 | Asml Netherlands B.V. | Alignment method |
CN114830039A (zh) | 2019-12-12 | 2022-07-29 | Asml荷兰有限公司 | 对准方法以及相关对准和光刻设备 |
CN114868084A (zh) | 2019-12-16 | 2022-08-05 | Asml荷兰有限公司 | 量测方法和相关联的量测和光刻设备 |
EP3839635A1 (en) | 2019-12-17 | 2021-06-23 | ASML Netherlands B.V. | Dark field digital holographic microscope and associated metrology method |
CN114830043A (zh) | 2019-12-17 | 2022-07-29 | Asml荷兰有限公司 | 暗场数字全息显微镜和相关联的量测方法 |
WO2021121906A1 (en) | 2019-12-18 | 2021-06-24 | Asml Netherlands B.V. | Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses |
EP3851915A1 (en) | 2020-01-14 | 2021-07-21 | ASML Netherlands B.V. | Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses |
EP3839631A1 (en) | 2019-12-19 | 2021-06-23 | ASML Netherlands B.V. | Determining relative positions of different layers in a structure |
KR20220093360A (ko) | 2019-12-19 | 2022-07-05 | 에이에스엠엘 네델란즈 비.브이. | 구조체 내에서 서로 상이한 층에 있는 금속성 피처 사이의 전기적 접촉을 광학적으로 결정하는 방법 |
IL279727A (en) | 2019-12-24 | 2021-06-30 | Asml Netherlands Bv | Method of determining information about pattern procedure, method of error reduction in measurement data, metrology process calibration method, method of selecting metrology targets |
WO2021130315A1 (en) | 2019-12-24 | 2021-07-01 | Asml Netherlands B.V. | Method of determining a value of a parameter of interest of a target formed by a patterning process |
EP3865931A1 (en) | 2020-02-12 | 2021-08-18 | ASML Netherlands B.V. | Method, assembly, and apparatus for improved control of broadband radiation generation |
IL293985B1 (en) | 2020-01-15 | 2024-06-01 | Asml Netherlands Bv | Method, assembly and device for improved control of broadband radiation generation |
WO2021151565A1 (en) | 2020-01-28 | 2021-08-05 | Asml Netherlands B.V. | Metrology method and associated metrology and lithographic apparatuses |
EP3876037A1 (en) | 2020-03-06 | 2021-09-08 | ASML Netherlands B.V. | Metrology method and device for measuring a periodic structure on a substrate |
KR20220122743A (ko) | 2020-01-29 | 2022-09-02 | 에이에스엠엘 네델란즈 비.브이. | 기판 상의 주기적 구조체를 측정하는 메트롤로지 방법 및 디바이스 |
CN115023654A (zh) | 2020-02-07 | 2022-09-06 | Asml荷兰有限公司 | 工作台***、工作台***操作方法、检查工具、光刻设备、校准方法和装置制造方法 |
EP3869271A1 (en) | 2020-02-20 | 2021-08-25 | ASML Netherlands B.V. | Method for controlling a manufacturing process and associated apparatuses |
EP4104018B1 (en) | 2020-02-12 | 2023-10-25 | ASML Netherlands B.V. | Computer-implemented method for controlling a manufacturing process |
US20230076218A1 (en) | 2020-02-21 | 2023-03-09 | Asml Netherlands B.V. | Method for calibrating simulation process based on defect-based process window |
EP3872567A1 (en) | 2020-02-25 | 2021-09-01 | ASML Netherlands B.V. | Systems and methods for process metric aware process control |
WO2021175521A1 (en) | 2020-03-02 | 2021-09-10 | Asml Netherlands B.V. | Method for inferring a local uniformity metric |
EP3879342A1 (en) | 2020-03-10 | 2021-09-15 | ASML Netherlands B.V. | Method for inferring a local uniformity metric and associated appratuses |
CN115244467A (zh) | 2020-03-03 | 2022-10-25 | Asml荷兰有限公司 | 用于控制制造过程的方法和相关联的设备 |
EP3882701A1 (en) | 2020-03-19 | 2021-09-22 | ASML Netherlands B.V. | Method for controlling a manufacturing process and associated apparatuses |
EP3876036A1 (en) | 2020-03-04 | 2021-09-08 | ASML Netherlands B.V. | Vibration isolation system and associated applications in lithography |
EP3879343A1 (en) | 2020-03-11 | 2021-09-15 | ASML Netherlands B.V. | Metrology measurement method and apparatus |
EP3889681A1 (en) | 2020-03-31 | 2021-10-06 | ASML Netherlands B.V. | An assembly including a non-linear element and a method of use thereof |
CN115552221A (zh) | 2020-05-07 | 2022-12-30 | Asml荷兰有限公司 | 包括目标布置的衬底和相关联的至少一个图案形成装置、光刻方法和量测方法 |
WO2021239334A1 (en) | 2020-05-26 | 2021-12-02 | Asml Netherlands B.V. | Method for optimizing a sampling scheme and associated apparatuses |
TW202331426A (zh) | 2020-06-01 | 2023-08-01 | 荷蘭商Asml控股公司 | 用於清潔微影設備之一部分之清潔工具及方法 |
US20230236515A1 (en) | 2020-06-09 | 2023-07-27 | Asml Netherlands B.V. | A target for measuring a parameter of a lithographic process |
WO2021249711A1 (en) | 2020-06-10 | 2021-12-16 | Asml Netherlands B.V. | Metrology method, metrology apparatus and lithographic apparatus |
US20230259042A1 (en) | 2020-06-24 | 2023-08-17 | Asml Netherlands B.V. | Metrology method and associated metrology and lithographic apparatuses |
WO2022002599A1 (en) | 2020-07-03 | 2022-01-06 | Asml Netherlands B.V. | Process window based on failure rate |
KR20230035034A (ko) | 2020-07-06 | 2023-03-10 | 에이에스엠엘 네델란즈 비.브이. | 조명 장치 및 연관된 계측 및 리소그래피 장치 |
JP7511033B2 (ja) | 2020-07-09 | 2024-07-04 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジ方法及び装置並びにコンピュータプログラム |
EP3945548A1 (en) | 2020-07-30 | 2022-02-02 | ASML Netherlands B.V. | Method for classifying semiconductor wafers |
CN116134972A (zh) | 2020-07-21 | 2023-05-16 | Asml荷兰有限公司 | 照射源和相关联的量测设备 |
EP3962241A1 (en) | 2020-08-26 | 2022-03-02 | ASML Netherlands B.V. | An illumination source and associated metrology apparatus |
WO2022017705A1 (en) | 2020-07-22 | 2022-01-27 | Asml Netherlands B.V. | Method for controlling a manufacturing process and associated apparatuses |
EP3945367A1 (en) | 2020-07-31 | 2022-02-02 | ASML Netherlands B.V. | Method for controlling a manufacturing process and associated apparatuses |
WO2022022949A1 (en) | 2020-07-28 | 2022-02-03 | Asml Netherlands B.V. | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method |
WO2022033793A1 (en) | 2020-08-11 | 2022-02-17 | Asml Netherlands B.V. | Method and apparatus for identifying contamination in a semiconductor fab |
EP3961303A1 (en) | 2020-08-27 | 2022-03-02 | ASML Netherlands B.V. | Method and apparatus for identifying contamination in a semiconductor fab |
EP3958052A1 (en) | 2020-08-20 | 2022-02-23 | ASML Netherlands B.V. | Metrology method for measuring an exposed pattern and associated metrology apparatus |
EP3961304A1 (en) | 2020-08-31 | 2022-03-02 | ASML Netherlands B.V. | Mapping metrics between manufacturing systems |
EP3964892A1 (en) | 2020-09-02 | 2022-03-09 | Stichting VU | Illumination arrangement and associated dark field digital holographic microscope |
EP3964809A1 (en) | 2020-09-02 | 2022-03-09 | Stichting VU | Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses |
EP3988996A1 (en) | 2020-10-20 | 2022-04-27 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
IL300587A (en) | 2020-09-03 | 2023-04-01 | Asml Netherlands Bv | Photonic crystal radiation generator based on broadband hollow crystal fibers |
EP3971555A1 (en) | 2020-09-16 | 2022-03-23 | ASML Netherlands B.V. | Method of performing metrology |
US20230280662A1 (en) | 2020-09-16 | 2023-09-07 | Asml Netherlands B.V. | Method of performing metrology, method of training a machine learning model, method of providing a layer comprising a two-dimensional material, metrology apparatus |
CN116209958A (zh) | 2020-09-28 | 2023-06-02 | Asml荷兰有限公司 | 目标结构以及相关联的方法和设备 |
US20230359127A1 (en) | 2020-09-28 | 2023-11-09 | Asml Netherlands B.V. | Metrology tool with position control of projection system |
EP3978964A1 (en) | 2020-10-01 | 2022-04-06 | ASML Netherlands B.V. | Achromatic optical relay arrangement |
EP4002015A1 (en) | 2020-11-16 | 2022-05-25 | ASML Netherlands B.V. | Dark field digital holographic microscope and associated metrology method |
KR20230104889A (ko) | 2020-11-17 | 2023-07-11 | 에이에스엠엘 네델란즈 비.브이. | 계측 시스템 및 리소그래피 시스템 |
EP4252073A1 (en) | 2020-11-24 | 2023-10-04 | ASML Netherlands B.V. | Method of determining mark structure for overlay fingerprints |
EP4006640A1 (en) | 2020-11-26 | 2022-06-01 | Stichting Nederlandse Wetenschappelijk Onderzoek Instituten | Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure |
US20240012342A1 (en) | 2020-11-27 | 2024-01-11 | Asml Netherlands B.V. | Metrology method and associated metrology and lithographic apparatuses |
EP4006641A1 (en) | 2020-11-30 | 2022-06-01 | Stichting Nederlandse Wetenschappelijk Onderzoek Instituten | Metrology apparatus based on high harmonic generation and associated method |
US20240004312A1 (en) | 2020-11-30 | 2024-01-04 | Asml Netherlands B.V. | Metrology apparatus based on high harmonic generation and associated method |
EP4009107A1 (en) | 2020-12-01 | 2022-06-08 | ASML Netherlands B.V. | Method and apparatus for imaging nonstationary object |
JP2023551776A (ja) | 2020-12-08 | 2023-12-13 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジの方法及び関連装置 |
EP4012492A1 (en) | 2020-12-10 | 2022-06-15 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
JP2023553078A (ja) | 2020-12-10 | 2023-12-20 | エーエスエムエル ネザーランズ ビー.ブイ. | 中空コアフォトニック結晶ファイバに基づく広帯域放射生成器 |
EP4016186A1 (en) | 2020-12-18 | 2022-06-22 | ASML Netherlands B.V. | Metrology method for measuring an etched trench and associated metrology apparatus |
KR20230121053A (ko) | 2020-12-21 | 2023-08-17 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 공정을 모니터링하는 방법 |
EP4030236A1 (en) | 2021-01-18 | 2022-07-20 | ASML Netherlands B.V. | A method of monitoring a lithographic process and associated apparatuses |
EP4017221A1 (en) | 2020-12-21 | 2022-06-22 | ASML Netherlands B.V. | Methods and apparatus for controlling electron density distributions |
EP4020084A1 (en) | 2020-12-22 | 2022-06-29 | ASML Netherlands B.V. | Metrology method |
EP4030230A1 (en) | 2021-01-18 | 2022-07-20 | ASML Netherlands B.V. | Methods and apparatus for providing a broadband light source |
IL303950A (en) | 2020-12-23 | 2023-08-01 | Asml Netherlands Bv | Methods and devices for providing a broadband light source |
CN112729113B (zh) * | 2020-12-25 | 2022-03-18 | 长江存储科技有限责任公司 | 套合精度的测量方法及测量装置 |
EP4075341A1 (en) | 2021-04-18 | 2022-10-19 | ASML Netherlands B.V. | Modular autoencoder model for manufacturing process parameter estimation |
KR20230125793A (ko) | 2020-12-30 | 2023-08-29 | 에이에스엠엘 네델란즈 비.브이. | 제조 프로세스 파라미터 추정을 위한 모듈식 오토인코더모델 |
EP4075340A1 (en) | 2021-04-15 | 2022-10-19 | ASML Netherlands B.V. | Modular autoencoder model for manufacturing process parameter estimation |
EP4075339A1 (en) | 2021-04-15 | 2022-10-19 | ASML Netherlands B.V. | Modular autoencoder model for manufacturing process parameter estimation |
EP4030237A1 (en) | 2021-01-19 | 2022-07-20 | ASML Netherlands B.V. | Metrology method and system and lithographic system |
EP4036619A1 (en) | 2021-01-27 | 2022-08-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber |
WO2022161703A1 (en) | 2021-01-27 | 2022-08-04 | Asml Netherlands B.V. | Hollow-core photonic crystal fiber |
EP4036646A1 (en) | 2021-01-29 | 2022-08-03 | ASML Netherlands B.V. | Metrology methods and appratuses |
EP4040233A1 (en) | 2021-02-03 | 2022-08-10 | ASML Netherlands B.V. | A method of determining a measurement recipe and associated metrology methods and appratuses |
US20240134182A1 (en) | 2021-02-04 | 2024-04-25 | Asml Netherlands B.V. | Methods and apparatuses for spatially filtering optical pulses |
EP4067968A1 (en) | 2021-03-29 | 2022-10-05 | ASML Netherlands B.V. | Methods and apparatuses for spatially filtering optical pulses |
EP4047400A1 (en) | 2021-02-17 | 2022-08-24 | ASML Netherlands B.V. | Assembly for separating radiation in the far field |
KR20230146536A (ko) | 2021-02-17 | 2023-10-19 | 에이에스엠엘 네델란즈 비.브이. | 원거리 필드에서 방사선을 분리하기 위한 어셈블리 |
EP4057069A1 (en) | 2021-03-11 | 2022-09-14 | ASML Netherlands B.V. | Methods and apparatus for characterizing a semiconductor manufacturing process |
EP4086698A1 (en) | 2021-05-06 | 2022-11-09 | ASML Netherlands B.V. | Hollow-core optical fiber based radiation source |
EP4060408A1 (en) | 2021-03-16 | 2022-09-21 | ASML Netherlands B.V. | Method and system for predicting process information with a parameterized model |
EP4060403A1 (en) | 2021-03-16 | 2022-09-21 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based multiple wavelength light source device |
IL305428A (en) | 2021-03-16 | 2023-10-01 | Asml Netherlands Bv | A radiation source based on hollow-core optical fibers |
KR20230159438A (ko) | 2021-03-22 | 2023-11-21 | 에이에스엠엘 네델란즈 비.브이. | 디지털 홀로그래픽 현미경 및 연관된 계측 방법 |
EP4063971A1 (en) | 2021-03-22 | 2022-09-28 | ASML Netherlands B.V. | Digital holographic microscope and associated metrology method |
EP4071553A1 (en) | 2021-04-07 | 2022-10-12 | ASML Netherlands B.V. | Method of determining at least a target layout and associated metrology apparatus |
EP4080284A1 (en) | 2021-04-19 | 2022-10-26 | ASML Netherlands B.V. | Metrology tool calibration method and associated metrology tool |
JP2024514054A (ja) | 2021-04-19 | 2024-03-28 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジツール較正方法及び関連するメトロロジツール |
EP4170421A1 (en) | 2021-10-25 | 2023-04-26 | ASML Netherlands B.V. | A cleaning method and associated illumination source metrology apparatus |
EP4330768A1 (en) | 2021-04-26 | 2024-03-06 | ASML Netherlands B.V. | A cleaning method and associated illumination source metrology apparatus |
EP4334766A1 (en) | 2021-05-03 | 2024-03-13 | ASML Netherlands B.V. | Optical element for generation of broadband radiation |
EP4105696A1 (en) | 2021-06-15 | 2022-12-21 | ASML Netherlands B.V. | Optical element for generation of broadband radiation |
JP2024519281A (ja) | 2021-05-04 | 2024-05-10 | エーエスエムエル ネザーランズ ビー.ブイ. | 計測装置およびリソグラフィ装置 |
EP4089484A1 (en) | 2021-05-12 | 2022-11-16 | ASML Netherlands B.V. | System and method to ensure parameter measurement matching across metrology tools |
KR20240016285A (ko) | 2021-05-31 | 2024-02-06 | 에이에스엠엘 네델란즈 비.브이. | 계측 측정 방법 및 장치 |
EP4187321A1 (en) | 2021-11-24 | 2023-05-31 | ASML Netherlands B.V. | Metrology method and associated metrology tool |
KR20240016967A (ko) | 2021-05-31 | 2024-02-06 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 연관된 메트롤로지 툴 |
KR20240007276A (ko) | 2021-06-14 | 2024-01-16 | 에이에스엠엘 네델란즈 비.브이. | 조명 소스 및 연관된 방법, 장치 |
EP4134734A1 (en) | 2021-08-11 | 2023-02-15 | ASML Netherlands B.V. | An illumination source and associated method apparatus |
KR20240023593A (ko) | 2021-06-18 | 2024-02-22 | 에이에스엠엘 네델란즈 비.브이. | 계측 방법 및 디바이스 |
EP4124909A1 (en) | 2021-07-28 | 2023-02-01 | ASML Netherlands B.V. | Metrology method and device |
EP4112572A1 (en) | 2021-06-28 | 2023-01-04 | ASML Netherlands B.V. | Method of producing photonic crystal fibers |
EP4113210A1 (en) | 2021-07-01 | 2023-01-04 | ASML Netherlands B.V. | A method of monitoring a measurement recipe and associated metrology methods and apparatuses |
WO2023285322A1 (en) | 2021-07-16 | 2023-01-19 | Asml Netherlands B.V. | Metrology method and apparatus |
EP4130880A1 (en) | 2021-08-03 | 2023-02-08 | ASML Netherlands B.V. | Methods of data mapping for low dimensional data analysis |
EP4374226A1 (en) | 2021-07-20 | 2024-05-29 | ASML Netherlands B.V. | Methods and computer programs for data mapping for low dimensional data analysis |
WO2023001448A1 (en) | 2021-07-23 | 2023-01-26 | Asml Netherlands B.V. | Metrology method and metrology device |
EP4124911A1 (en) | 2021-07-29 | 2023-02-01 | ASML Netherlands B.V. | Metrology method and metrology device |
WO2023011905A1 (en) | 2021-08-02 | 2023-02-09 | Asml Netherlands B.V. | Optical element for use in metrology systems |
WO2023012338A1 (en) | 2021-08-06 | 2023-02-09 | Asml Netherlands B.V. | Metrology target, patterning device and metrology method |
WO2023020856A1 (en) | 2021-08-18 | 2023-02-23 | Universiteit Van Amsterdam | Metrology method and apparatus |
IL309622A (en) | 2021-08-25 | 2024-02-01 | Asml Netherlands Bv | Improving broadband radiation generation in photonic crystal or nonlinear fibers |
EP4163715A1 (en) | 2021-10-05 | 2023-04-12 | ASML Netherlands B.V. | Improved broadband radiation generation in photonic crystal or highly non-linear fibres |
EP4191337A1 (en) | 2021-12-01 | 2023-06-07 | ASML Netherlands B.V. | A method of monitoring a lithographic process and associated apparatuses |
WO2023036526A1 (en) | 2021-09-07 | 2023-03-16 | Asml Netherlands B.V. | A method of monitoring a lithographic process and associated apparatuses |
CN117999517A (zh) | 2021-09-08 | 2024-05-07 | Asml荷兰有限公司 | 量测方法以及相关联的量测和光刻设备 |
EP4184426A1 (en) | 2021-11-22 | 2023-05-24 | ASML Netherlands B.V. | Metrology method and device |
WO2023041274A1 (en) | 2021-09-14 | 2023-03-23 | Asml Netherlands B.V. | Metrology method and device |
IL311255A (en) | 2021-09-15 | 2024-05-01 | Asml Netherlands Bv | Separation of sources from metrology data |
CN117980829A (zh) | 2021-09-22 | 2024-05-03 | Asml荷兰有限公司 | 源选择模块以及相关联的量测和光刻设备 |
EP4155822A1 (en) | 2021-09-28 | 2023-03-29 | ASML Netherlands B.V. | Metrology method and system and lithographic system |
EP4163687A1 (en) | 2021-10-06 | 2023-04-12 | ASML Netherlands B.V. | Fiber alignment monitoring tool and associated fiber alignment method |
EP4167031A1 (en) | 2021-10-18 | 2023-04-19 | ASML Netherlands B.V. | Method of determining a measurement recipe in a metrology method |
EP4170429A1 (en) | 2021-10-19 | 2023-04-26 | ASML Netherlands B.V. | Out-of-band leakage correction method and metrology apparatus |
EP4170430A1 (en) | 2021-10-25 | 2023-04-26 | ASML Netherlands B.V. | Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure |
EP4174568A1 (en) | 2021-11-01 | 2023-05-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
EP4174577A1 (en) | 2021-11-01 | 2023-05-03 | ASML Netherlands B.V. | Method of determining a performance parameter distribution |
IL312129A (en) | 2021-11-02 | 2024-06-01 | Asml Netherlands Bv | Broadband radiation generator based on photonic fibers with a photonic core |
EP4174567A1 (en) | 2021-11-02 | 2023-05-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
EP4181018A1 (en) | 2021-11-12 | 2023-05-17 | ASML Netherlands B.V. | Latent space synchronization of machine learning models for in-device metrology inference |
EP4184250A1 (en) | 2021-11-23 | 2023-05-24 | ASML Netherlands B.V. | Obtaining a parameter characterizing a fabrication process |
EP4191338A1 (en) | 2021-12-03 | 2023-06-07 | ASML Netherlands B.V. | Metrology calibration method |
WO2023104504A1 (en) | 2021-12-09 | 2023-06-15 | Asml Netherlands B.V. | Surrounding pattern and process aware metrology |
WO2023110318A1 (en) | 2021-12-17 | 2023-06-22 | Asml Netherlands B.V. | Machine learning model for asymmetry-induced overlay error correction |
EP4202550A1 (en) | 2021-12-22 | 2023-06-28 | ASML Netherlands B.V. | Substrate comprising a target arrangement, associated patterning device, lithographic method and metrology method |
WO2023131589A1 (en) | 2022-01-10 | 2023-07-13 | Asml Netherlands B.V. | Mechanically controlled stress-engineered optical systems and methods |
WO2023138916A1 (en) | 2022-01-21 | 2023-07-27 | Asml Netherlands B.V. | Systems and methods for inspecting a portion of a lithography apparatus |
EP4224254A1 (en) | 2022-02-04 | 2023-08-09 | ASML Netherlands B.V. | Metrology method and associated metrology device |
EP4224255A1 (en) | 2022-02-08 | 2023-08-09 | ASML Netherlands B.V. | Metrology method |
WO2023151973A1 (en) | 2022-02-10 | 2023-08-17 | Asml Netherlands B.V. | Systems and methods for generating sem-quality metrology data from optical metrology data using machine learning |
WO2023160924A1 (en) | 2022-02-22 | 2023-08-31 | Asml Netherlands B.V. | Method and apparatus for reflecting pulsed radiation |
WO2023160925A1 (en) | 2022-02-25 | 2023-08-31 | Asml Netherlands B.V. | Systems and methods for cleaning a portion of a lithography apparatus |
WO2023165783A1 (en) | 2022-03-01 | 2023-09-07 | Asml Netherlands B.V. | Apparatus and methods for filtering measurement radiation |
EP4250010A1 (en) | 2022-03-25 | 2023-09-27 | ASML Netherlands B.V. | Apparatus and methods for filtering measurement radiation |
EP4242744A1 (en) | 2022-03-09 | 2023-09-13 | ASML Netherlands B.V. | Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses |
EP4246231A1 (en) | 2022-03-18 | 2023-09-20 | Stichting VU | A method for determining a vertical position of a structure on a substrate and associated apparatuses |
WO2023174648A1 (en) | 2022-03-18 | 2023-09-21 | Stichting Vu | Illumination arrangement for a metrology device and associated method |
EP4246232A1 (en) | 2022-03-18 | 2023-09-20 | Stichting VU | Illumination arrangement for a metrology device and associated method |
EP4254068A1 (en) | 2022-03-28 | 2023-10-04 | ASML Netherlands B.V. | Method for determining a spatial distribution of a parameter of interest over at least one substrate or portion thereof |
EP4254266A1 (en) | 2022-03-29 | 2023-10-04 | ASML Netherlands B.V. | Methods related to an autoencoder model or similar for manufacturing process parameter estimation |
EP4296780A1 (en) | 2022-06-24 | 2023-12-27 | ASML Netherlands B.V. | Imaging method and metrology device |
WO2023194036A1 (en) | 2022-04-05 | 2023-10-12 | Asml Netherlands B.V. | Imaging method and metrology device |
WO2023194049A1 (en) | 2022-04-08 | 2023-10-12 | Asml Netherlands B.V. | Hollow-core optical fiber based radiation source |
EP4273622A1 (en) | 2022-05-02 | 2023-11-08 | ASML Netherlands B.V. | Hollow-core optical fiber based radiation source |
EP4261618A1 (en) | 2022-04-14 | 2023-10-18 | ASML Netherlands B.V. | A method of determining a correction for control of a lithography and/or metrology process, and associated devices |
WO2023208487A1 (en) | 2022-04-25 | 2023-11-02 | Asml Netherlands B.V. | Source selection module and associated metrology apparatus |
EP4279993A1 (en) | 2022-05-18 | 2023-11-22 | ASML Netherlands B.V. | Source selection module and associated metrology apparatus |
WO2023213527A1 (en) | 2022-05-03 | 2023-11-09 | Asml Netherlands B.V. | Illumination mode selector and associated optical metrology tool |
EP4276537A1 (en) | 2022-05-09 | 2023-11-15 | ASML Netherlands B.V. | Illumination mode selector and associated optical metrology tool |
EP4279992A1 (en) | 2022-05-18 | 2023-11-22 | ASML Netherlands B.V. | Method of optimizing maintenance of a lithographic apparatus |
WO2023222310A1 (en) | 2022-05-16 | 2023-11-23 | Asml Netherlands B.V. | Method of optimizing maintenance of a lithographic apparatus |
EP4279994A1 (en) | 2022-05-20 | 2023-11-22 | ASML Netherlands B.V. | Illumination module and associated methods and metrology apparatus |
WO2023222349A1 (en) | 2022-05-20 | 2023-11-23 | Asml Netherlands B.V. | Single pad overlay measurement |
WO2023222342A1 (en) | 2022-05-20 | 2023-11-23 | Asml Netherlands B.V. | Measurement of fabrication parameters based on moiré interference pattern components |
WO2023222328A1 (en) | 2022-05-20 | 2023-11-23 | Asml Netherlands B.V. | Illumination module and associated methods and metrology apparatus |
EP4303655A1 (en) | 2022-07-04 | 2024-01-10 | ASML Netherlands B.V. | A membrane and associated method and apparatus |
WO2023232408A1 (en) | 2022-05-31 | 2023-12-07 | Asml Netherlands B.V. | A membrane and associated method and apparatus |
WO2023232360A1 (en) | 2022-05-31 | 2023-12-07 | Asml Netherlands B.V. | Method for determining a failure event on a lithography system and associated failure detection module |
EP4328670A1 (en) | 2022-08-23 | 2024-02-28 | ASML Netherlands B.V. | Method for parameter reconstruction of a metrology device and associated metrology device |
WO2023232478A1 (en) | 2022-06-02 | 2023-12-07 | Asml Netherlands B.V. | Method for parameter reconstruction of a metrology device and associated metrology device |
WO2023232397A1 (en) | 2022-06-02 | 2023-12-07 | Asml Netherlands B.V. | Method for aligning an illumination-detection system of a metrology device and associated metrology device |
EP4296779A1 (en) | 2022-06-21 | 2023-12-27 | ASML Netherlands B.V. | Method for aligning an illumination-detection system of a metrology device and associated metrology device |
EP4289798A1 (en) | 2022-06-07 | 2023-12-13 | ASML Netherlands B.V. | Method of producing photonic crystal fibers |
EP4300193A1 (en) | 2022-06-27 | 2024-01-03 | ASML Netherlands B.V. | Focus measurment and control in metrology and associated wedge arrangement |
EP4300183A1 (en) | 2022-06-30 | 2024-01-03 | ASML Netherlands B.V. | Apparatus for broadband radiation generation |
EP4303658A1 (en) | 2022-07-05 | 2024-01-10 | ASML Netherlands B.V. | Method of correction metrology signal data |
WO2024012772A1 (en) | 2022-07-14 | 2024-01-18 | Asml Netherlands B.V. | Metrology target and associated metrology method |
EP4312079A1 (en) | 2022-07-29 | 2024-01-31 | ASML Netherlands B.V. | Methods of mitigating crosstalk in metrology images |
EP4312005A1 (en) | 2022-07-29 | 2024-01-31 | Stichting VU | Method and apparatuses for fourier transform spectrometry |
EP4318131A1 (en) | 2022-08-01 | 2024-02-07 | ASML Netherlands B.V. | Sensor module, illuminator, metrology device and associated metrology method |
WO2024033036A1 (en) | 2022-08-08 | 2024-02-15 | Asml Netherlands B.V. | Metrology method and associated metrology device |
EP4361726A1 (en) | 2022-10-24 | 2024-05-01 | ASML Netherlands B.V. | Inference model training |
WO2024033005A1 (en) | 2022-08-09 | 2024-02-15 | Asml Netherlands B.V. | Inference model training |
EP4321933A1 (en) | 2022-08-09 | 2024-02-14 | ASML Netherlands B.V. | A radiation source |
WO2024033035A1 (en) | 2022-08-10 | 2024-02-15 | Asml Netherlands B.V. | Metrology method and associated metrology device |
EP4332678A1 (en) | 2022-09-05 | 2024-03-06 | ASML Netherlands B.V. | Holographic metrology apparatus and method |
CN115147596B (zh) * | 2022-09-06 | 2023-04-07 | 南通鼎彩新材料科技有限公司 | 用于热收缩管生产工艺的辐照剂量控制方法及*** |
WO2024052057A1 (en) | 2022-09-06 | 2024-03-14 | Asml Netherlands B.V. | Method for monitoring proper functioning of one or more components of a lithography system |
EP4336262A1 (en) | 2022-09-07 | 2024-03-13 | ASML Netherlands B.V. | Metrology method and associated metrology device |
WO2024052012A1 (en) | 2022-09-07 | 2024-03-14 | Asml Netherlands B.V. | Metrology method and associated metrology device |
EP4336251A1 (en) | 2022-09-12 | 2024-03-13 | ASML Netherlands B.V. | A multi-pass radiation device |
WO2024056296A1 (en) | 2022-09-13 | 2024-03-21 | Asml Netherlands B.V. | Metrology method and associated metrology device |
EP4354200A1 (en) | 2022-10-11 | 2024-04-17 | ASML Netherlands B.V. | An aberration correction optical system |
WO2024078813A1 (en) | 2022-10-11 | 2024-04-18 | Asml Netherlands B.V. | An aberration correction optical system |
EP4354224A1 (en) | 2022-10-11 | 2024-04-17 | ASML Netherlands B.V. | Method for operating a detection system of a metrology device and associated metrology device |
WO2024083559A1 (en) | 2022-10-17 | 2024-04-25 | Asml Netherlands B.V. | Apparatus and methods for filtering measurement radiation |
EP4357853A1 (en) | 2022-10-17 | 2024-04-24 | ASML Netherlands B.V. | Apparatus and methods for filtering measurement radiation |
EP4361703A1 (en) | 2022-10-27 | 2024-05-01 | ASML Netherlands B.V. | An illumination module for a metrology device |
EP4372462A1 (en) | 2022-11-16 | 2024-05-22 | ASML Netherlands B.V. | A broadband radiation source |
EP4371951A1 (en) | 2022-11-17 | 2024-05-22 | ASML Netherlands B.V. | A method of producing photonic crystal fibers |
EP4371949A1 (en) | 2022-11-17 | 2024-05-22 | ASML Netherlands B.V. | A fiber manufacturing intermediate product and method of producing photonic crystal fibers |
EP4372463A1 (en) | 2022-11-21 | 2024-05-22 | ASML Netherlands B.V. | Method and source modul for generating broadband radiation |
EP4375744A1 (en) | 2022-11-24 | 2024-05-29 | ASML Netherlands B.V. | Photonic integrated circuit for generating broadband radiation |
WO2024115048A1 (en) | 2022-12-02 | 2024-06-06 | Asml Netherlands B.V. | Method for labeling time series data relating to one or more machines |
WO2024120709A1 (en) | 2022-12-07 | 2024-06-13 | Asml Netherlands B.V. | Supercontinuum radiation source |
Family Cites Families (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3854539B2 (ja) * | 2002-05-29 | 2006-12-06 | 株式会社日立ハイテクノロジーズ | 半導体ウェハの微細パターンの寸法及び3次元形状測定方法とその測定装置 |
US5963329A (en) | 1997-10-31 | 1999-10-05 | International Business Machines Corporation | Method and apparatus for measuring the profile of small repeating lines |
JP2001174409A (ja) * | 1999-12-15 | 2001-06-29 | Internatl Business Mach Corp <Ibm> | 2波長管、検査用照明装置、検査装置及び該方法 |
JP3368265B2 (ja) * | 2000-03-02 | 2003-01-20 | キヤノン株式会社 | 露光方法、露光装置、およびデバイス製造方法 |
IL138552A (en) * | 2000-09-19 | 2006-08-01 | Nova Measuring Instr Ltd | Measurement of transverse displacement by optical method |
KR100857931B1 (ko) * | 2000-10-10 | 2008-09-09 | 가부시키가이샤 니콘 | 결상성능의 평가방법 |
JP2002131185A (ja) * | 2000-10-20 | 2002-05-09 | Nec Corp | コマ収差の測定用マスク及びコマ収差の測定方法 |
US7515279B2 (en) | 2001-03-02 | 2009-04-07 | Nanometrics Incorporated | Line profile asymmetry measurement |
US6980300B1 (en) | 2001-04-11 | 2005-12-27 | Advanced Micro Devices, Inc. | Method and apparatus for generating a polishing process endpoint signal using scatterometry |
US6451700B1 (en) | 2001-04-25 | 2002-09-17 | Advanced Micro Devices, Inc. | Method and apparatus for measuring planarity of a polished layer |
US7382447B2 (en) * | 2001-06-26 | 2008-06-03 | Kla-Tencor Technologies Corporation | Method for determining lithographic focus and exposure |
WO2003001297A2 (en) * | 2001-06-26 | 2003-01-03 | Kla-Tencor Corporation | Method for determining lithographic focus and exposure |
US6773939B1 (en) | 2001-07-02 | 2004-08-10 | Advanced Micro Devices, Inc. | Method and apparatus for determining critical dimension variation in a line structure |
JP2003224057A (ja) * | 2002-01-30 | 2003-08-08 | Hitachi Ltd | 半導体装置の製造方法 |
US7046376B2 (en) | 2002-07-05 | 2006-05-16 | Therma-Wave, Inc. | Overlay targets with isolated, critical-dimension features and apparatus to measure overlay |
US7352453B2 (en) * | 2003-01-17 | 2008-04-01 | Kla-Tencor Technologies Corporation | Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
US6859746B1 (en) | 2003-05-01 | 2005-02-22 | Advanced Micro Devices, Inc. | Methods of using adaptive sampling techniques based upon categorization of process variations, and system for performing same |
US7508976B1 (en) | 2003-12-29 | 2009-03-24 | Nanometric Incorporated | Local process variation correction for overlay measurement |
JP4216220B2 (ja) * | 2004-04-12 | 2009-01-28 | 株式会社 日立ディスプレイズ | 液晶表示素子の製造方法 |
US7298496B2 (en) * | 2004-05-21 | 2007-11-20 | Zetetic Institute | Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry |
JP4658670B2 (ja) * | 2004-05-26 | 2011-03-23 | 株式会社リコー | 干渉露光装置および画像形成装置 |
US7791727B2 (en) * | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
US7532307B2 (en) * | 2005-06-30 | 2009-05-12 | Asml Netherlands B.V. | Focus determination method, device manufacturing method, and mask |
US7528941B2 (en) * | 2006-06-01 | 2009-05-05 | Kla-Tencor Technolgies Corporation | Order selected overlay metrology |
US20080018897A1 (en) | 2006-07-20 | 2008-01-24 | Nanometrics Incorporated | Methods and apparatuses for assessing overlay error on workpieces |
US7532331B2 (en) * | 2006-09-14 | 2009-05-12 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
JP2008171960A (ja) * | 2007-01-10 | 2008-07-24 | Canon Inc | 位置検出装置及び露光装置 |
US7858404B2 (en) * | 2007-03-14 | 2010-12-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Measurement of overlay offset in semiconductor processing |
US7570358B2 (en) * | 2007-03-30 | 2009-08-04 | Asml Netherlands Bv | Angularly resolved scatterometer, inspection method, lithographic apparatus, lithographic processing cell device manufacturing method and alignment sensor |
US8189195B2 (en) * | 2007-05-09 | 2012-05-29 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
JP5270109B2 (ja) * | 2007-05-23 | 2013-08-21 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置の製造方法 |
CN100587608C (zh) * | 2007-07-24 | 2010-02-03 | 上海微电子装备有限公司 | 一种用于光刻设备的对准*** |
TWI347428B (en) * | 2007-11-02 | 2011-08-21 | Ind Tech Res Inst | Overlay alignment structure and method for overlay metrology using the same |
NL1036123A1 (nl) * | 2007-11-13 | 2009-05-14 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
NL1036245A1 (nl) * | 2007-12-17 | 2009-06-18 | Asml Netherlands Bv | Diffraction based overlay metrology tool and method of diffraction based overlay metrology. |
NL1036857A1 (nl) * | 2008-04-21 | 2009-10-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
US20090296075A1 (en) | 2008-05-29 | 2009-12-03 | Nanometrics Incorporated | Imaging Diffraction Based Overlay |
NL1036905A1 (nl) * | 2008-06-03 | 2009-12-04 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
JP2010079166A (ja) * | 2008-09-29 | 2010-04-08 | Casio Computer Co Ltd | 音色指定装置、電子楽器及び音色指定処理のプログラム |
JP2010087166A (ja) * | 2008-09-30 | 2010-04-15 | Toshiba Corp | 露光装置の検査方法 |
WO2010076232A2 (en) * | 2008-12-30 | 2010-07-08 | Asml Netherlands B.V. | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
NL2004094A (en) * | 2009-02-11 | 2010-08-12 | Asml Netherlands Bv | Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method. |
KR101257453B1 (ko) * | 2009-05-12 | 2013-04-23 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피에 사용하는 검사 방법 |
WO2011011511A1 (en) * | 2009-07-22 | 2011-01-27 | Kla-Tencor Corporation | Angle-resolved antisymmetric scatterometry |
CN102498441B (zh) | 2009-07-31 | 2015-09-16 | Asml荷兰有限公司 | 量测方法和设备、光刻***以及光刻处理单元 |
EP2470960A1 (en) * | 2009-08-24 | 2012-07-04 | ASML Netherlands BV | Metrology method and apparatus, lithographic apparatus, lithographic processing cell and substrate comprising metrology targets |
US8896832B2 (en) * | 2010-06-17 | 2014-11-25 | Kla-Tencor Corp. | Discrete polarization scatterometry |
NL2007088A (en) * | 2010-07-19 | 2012-01-23 | Asml Netherlands Bv | Method and apparatus for determining an overlay error. |
NL2007425A (en) * | 2010-11-12 | 2012-05-15 | Asml Netherlands Bv | Metrology method and apparatus, and device manufacturing method. |
US9223227B2 (en) * | 2011-02-11 | 2015-12-29 | Asml Netherlands B.V. | Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method |
NL2009004A (en) * | 2011-07-20 | 2013-01-22 | Asml Netherlands Bv | Inspection method and apparatus, and lithographic apparatus. |
CN103748515A (zh) * | 2011-08-23 | 2014-04-23 | Asml荷兰有限公司 | 量测方法和设备以及器件制造方法 |
NL2009508A (en) * | 2011-10-24 | 2013-04-25 | Asml Netherlands Bv | Metrology method and apparatus, and device manufacturing method. |
NL2010401A (en) * | 2012-03-27 | 2013-09-30 | Asml Netherlands Bv | Metrology method and apparatus, lithographic system and device manufacturing method. |
NL2010717A (en) * | 2012-05-21 | 2013-11-25 | Asml Netherlands Bv | Determining a structural parameter and correcting an asymmetry property. |
NL2010734A (en) * | 2012-05-29 | 2013-12-02 | Asml Netherlands Bv | Metrology method and apparatus, substrate, lithographic system and device manufacturing method. |
NL2010905A (en) * | 2012-06-22 | 2013-12-24 | Asml Netherlands Bv | Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method. |
US9778025B2 (en) * | 2012-08-16 | 2017-10-03 | Asml Netherlands B.V. | Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method |
-
2010
- 2010-07-27 CN CN201080034105.9A patent/CN102498441B/zh active Active
- 2010-07-27 WO PCT/EP2010/060894 patent/WO2011012624A1/en active Application Filing
- 2010-07-27 KR KR1020127001018A patent/KR101429629B1/ko active IP Right Grant
- 2010-07-27 JP JP2012522153A patent/JP5545782B2/ja active Active
- 2010-07-27 KR KR1020137023683A patent/KR101461457B1/ko active IP Right Grant
- 2010-07-27 NL NL2005162A patent/NL2005162A/en unknown
- 2010-07-29 US US12/846,652 patent/US9081303B2/en active Active
-
2011
- 2011-12-29 IL IL217288A patent/IL217288A/en active IP Right Grant
- 2011-12-29 IL IL244012A patent/IL244012B/en active IP Right Grant
-
2013
- 2013-10-02 JP JP2013207180A patent/JP5695153B2/ja active Active
-
2014
- 2014-01-07 US US14/149,723 patent/US8994944B2/en active Active
-
2016
- 2016-02-08 IL IL244012A patent/IL244012A0/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014030048A (ja) * | 2009-07-31 | 2014-02-13 | Asml Netherlands Bv | プロセス変動検出方法、角度分解散乱計、リソグラフィシステムおよびリソグラフィセル |
JP2018517920A (ja) * | 2015-04-21 | 2018-07-05 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジ方法及び装置、コンピュータプログラム、並びにリソグラフィシステム |
Also Published As
Publication number | Publication date |
---|---|
IL244012A0 (en) | 2016-04-21 |
KR101429629B1 (ko) | 2014-08-12 |
US9081303B2 (en) | 2015-07-14 |
IL217288A (en) | 2016-02-29 |
JP2014030048A (ja) | 2014-02-13 |
CN102498441B (zh) | 2015-09-16 |
US8994944B2 (en) | 2015-03-31 |
US20110027704A1 (en) | 2011-02-03 |
IL217288A0 (en) | 2012-02-29 |
KR101461457B1 (ko) | 2014-11-13 |
CN102498441A (zh) | 2012-06-13 |
JP5695153B2 (ja) | 2015-04-01 |
JP2013501355A (ja) | 2013-01-10 |
KR20120018227A (ko) | 2012-02-29 |
WO2011012624A1 (en) | 2011-02-03 |
IL244012B (en) | 2019-05-30 |
NL2005162A (en) | 2011-02-02 |
US20140139814A1 (en) | 2014-05-22 |
KR20130106449A (ko) | 2013-09-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5695153B2 (ja) | プロセス変動検出方法、角度分解散乱計、リソグラフィシステムおよびリソグラフィセル | |
JP6577086B2 (ja) | メトロロジ方法および装置、リソグラフィシステムならびにデバイス製造方法 | |
JP5412528B2 (ja) | 検査方法、検査システム、基板、およびマスク | |
JP5584689B2 (ja) | 2次元ターゲットを用いたリソグラフィの焦点及びドーズ測定 | |
JP4778021B2 (ja) | インスペクション方法および装置、リソグラフィ装置、リソグラフィ処理セル、ならびにデバイス製造方法 | |
JP4912241B2 (ja) | インスペクション方法およびインスペクション装置、リソグラフィ装置、リソグラフィ処理セルならびにデバイス製造方法 | |
JP4787232B2 (ja) | 測定方法、検査装置、およびリソグラフィ装置 | |
KR102030100B1 (ko) | 검사와 계측을 위한 방법 및 장치 | |
JP5663027B2 (ja) | 基板上のオブジェクトの概略構造を決定する方法、検査装置、コンピュータプログラム、及びコンピュータ可読媒体 | |
KR101654599B1 (ko) | 오버레이 오차를 결정하는 방법 및 디바이스 제조 방법 | |
JP4578495B2 (ja) | オーバーレイ測定品質表示を使用するリソグラフィ装置およびデバイス製造方法 | |
US7724370B2 (en) | Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell | |
US10691030B2 (en) | Measurement method, inspection apparatus, patterning device, lithographic system and device manufacturing method | |
JP4875685B2 (ja) | ターゲットパターンのパラメータを割り出す方法、ライブラリを生成する方法、検査装置、リソグラフィ装置、リソグラフィセル、及びコンピュータプログラム | |
NL2007127A (en) | Inspection apparatus and method, lithographic apparatus and lithographic processing cell. | |
JP2009081436A (ja) | オーバレイエラーの測定方法、検査装置及びリソグラフィ装置 | |
WO2011012412A1 (en) | Inspection method for lithography |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20130626 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130702 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20131002 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140507 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140508 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5545782 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |