JP5531614B2 - メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 - Google Patents
メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 Download PDFInfo
- Publication number
- JP5531614B2 JP5531614B2 JP2009509353A JP2009509353A JP5531614B2 JP 5531614 B2 JP5531614 B2 JP 5531614B2 JP 2009509353 A JP2009509353 A JP 2009509353A JP 2009509353 A JP2009509353 A JP 2009509353A JP 5531614 B2 JP5531614 B2 JP 5531614B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- coating
- polysiloxane
- formula
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/26—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/42—Gloss-reducing agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Silicon Polymers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009509353A JP5531614B2 (ja) | 2007-04-10 | 2008-04-09 | メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007103296 | 2007-04-10 | ||
JP2007103296 | 2007-04-10 | ||
JP2009509353A JP5531614B2 (ja) | 2007-04-10 | 2008-04-09 | メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 |
PCT/JP2008/056987 WO2008126851A1 (ja) | 2007-04-10 | 2008-04-09 | メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008126851A1 JPWO2008126851A1 (ja) | 2010-07-22 |
JP5531614B2 true JP5531614B2 (ja) | 2014-06-25 |
Family
ID=39863948
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009509353A Active JP5531614B2 (ja) | 2007-04-10 | 2008-04-09 | メルカプト基で修飾したポリシロキサンを含有する反射防止被膜形成用塗布液 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5531614B2 (zh) |
KR (2) | KR101538177B1 (zh) |
CN (1) | CN101652442B (zh) |
TW (1) | TWI433899B (zh) |
WO (1) | WO2008126851A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013161829A1 (ja) * | 2012-04-27 | 2013-10-31 | 旭硝子株式会社 | 部分加水分解縮合物、撥インク剤、ネガ型感光性樹脂組成物、硬化膜、隔壁および光学素子 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04250401A (ja) * | 1991-01-28 | 1992-09-07 | Mitsubishi Rayon Co Ltd | 反射防止層を有する基板 |
JP2005249982A (ja) * | 2004-03-03 | 2005-09-15 | Hitachi Ltd | 反射防止膜及びそれを有する画像表示装置,光記録媒体,太陽発電モジュール並びに反射防止膜形成方法 |
JP2007009216A (ja) * | 2006-07-25 | 2007-01-18 | Shin Etsu Chem Co Ltd | 被膜形成用組成物用フロロオルガノポリシロキサン樹脂の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101014582B1 (ko) * | 2002-11-13 | 2011-02-16 | 아사히 가라스 가부시키가이샤 | 활성 에너지선 경화형 피복용 조성물 및 그 조성물의경화물로 이루어지는 피막을 갖는 성형품 |
TW200530350A (en) * | 2003-12-18 | 2005-09-16 | Nissan Chemical Ind Ltd | Water repellent coating film having low refractive index |
JP4526126B2 (ja) | 2004-12-17 | 2010-08-18 | 日東電工株式会社 | ハードコートフィルム及びその製造方法 |
-
2008
- 2008-04-09 JP JP2009509353A patent/JP5531614B2/ja active Active
- 2008-04-09 KR KR1020097021077A patent/KR101538177B1/ko active IP Right Grant
- 2008-04-09 KR KR1020157007630A patent/KR101607446B1/ko active IP Right Grant
- 2008-04-09 CN CN200880011429.3A patent/CN101652442B/zh active Active
- 2008-04-09 WO PCT/JP2008/056987 patent/WO2008126851A1/ja active Application Filing
- 2008-04-10 TW TW097113037A patent/TWI433899B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04250401A (ja) * | 1991-01-28 | 1992-09-07 | Mitsubishi Rayon Co Ltd | 反射防止層を有する基板 |
JP2005249982A (ja) * | 2004-03-03 | 2005-09-15 | Hitachi Ltd | 反射防止膜及びそれを有する画像表示装置,光記録媒体,太陽発電モジュール並びに反射防止膜形成方法 |
JP2007009216A (ja) * | 2006-07-25 | 2007-01-18 | Shin Etsu Chem Co Ltd | 被膜形成用組成物用フロロオルガノポリシロキサン樹脂の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI433899B (zh) | 2014-04-11 |
TW200909542A (en) | 2009-03-01 |
CN101652442A (zh) | 2010-02-17 |
KR101538177B1 (ko) | 2015-07-20 |
KR20150040374A (ko) | 2015-04-14 |
KR101607446B1 (ko) | 2016-03-29 |
WO2008126851A1 (ja) | 2008-10-23 |
KR20100015446A (ko) | 2010-02-12 |
JPWO2008126851A1 (ja) | 2010-07-22 |
CN101652442B (zh) | 2014-03-26 |
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