JP5280614B2 - 単一のステップmocvdによって製造される導波格子を組み込んだ埋め込みヘテロ構造デバイス - Google Patents
単一のステップmocvdによって製造される導波格子を組み込んだ埋め込みヘテロ構造デバイス Download PDFInfo
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Description
本出願は、2004年2月25日付けの「Buried Heterostructure Device Fabricated by single Step MOCVD」と題する米国出願第10/787,349号の一部継続出願であり、この文献は、参照により本願に組み込まれる。
光電子デバイスは、遠隔通信、データ保存および情報伝達を含む多くの用途で使用されている。光電子デバイスの特定のタイプ、例えばレーザダイオード、光電子変調器、半導体光学増幅器、半導体利得媒体などは、光導波路内に配置された活性領域を有している。光導波路は、典型的には、異なる構造を組み込んでおり、その上にデバイスを製造する基板の主平面に対する横方向、つまり平行方向に、かつ基板の主平面に対する横切り方向、つまり直交方向に光を導く。横切り方向には、半導体材料と活性層を挟んでいる活性領域のクラッド層との間の屈折率コントラストによって光が導かれる。横方向には、クラッド層および活性層を含む層構造内で少なくとも部分的に画定されているリッジ導波構造または埋め込みヘテロ構造導波路によって光が導かれる。
n型バッファ層151は、厚み約100nmのn型InPの層であって、n型クラッド層120の成長面122上に、成長窓134内に成長させたものである。
Claims (8)
- 成長面(222)、
前記成長面(222)上に設けられた成長マスク(230)であって、一定幅の細長い成長窓(234)を画定するマスク層(245)と、当該マスク層(245)上に形成された、周期的な格子の輪郭形状(235、236)を有するマスクストライプ(232)とを含む成長マスク(230)、
前記成長窓(234)内に配置され、台形の断面形状を有している光導波コアメサ(240)、および
前記光導波コアメサ(240)を覆い、前記成長マスク(230)の少なくとも一部上に延び、平らな主表面を有するクラッド層(160)を備えており、
前記成長面(222)が[100]結晶配向を有しており、
前記光導波コアメサ(240)が、[111]結晶配向を有するサイドウォールを有しており、
前記成長マスク(230)が、前記成長面(222)の[011]結晶配向に平行に整列された向かい合うエッジを有している、デバイス(100)。 - 前記光導波コアメサ(240)が、構造内で均一であり、前記クラッド層(160)より大きい屈折率を有している、請求項1に記載のデバイス(100)。
- 分布帰還型(DFB)レーザであり、
前記光導波コアメサ(240)が、量子井戸構造(154)を有している、請求項1又は2に記載のデバイス(100)。 - 前記量子井戸構造(154)が、アルミニウム、ガリウム、インジウムおよびヒ素を含む量子井戸層(157)を有している、請求項3に記載のデバイス(100)。
- 前記量子井戸構造(154)が、ガリウム、インジウム、ヒ素およびリンを含む量子井戸層(157)を有している、請求項4に記載のデバイス(100)。
- 前記光導波コアメサ(240)が、分離閉じ込めヘテロ構造(159)を追加的に有しており、該構造内に前記量子井戸が配置されている、請求項3から5のいずれか1項に記載のデバイス(100)。
- 前記光導波コアメサ(240)が、クラッド層(160)より大きな屈折率を有する材料を含み、前記周期的な格子の輪郭形状(235、236)が、0.001〜0.002の屈折率差をもたらす、請求項3から6のいずれか1項に記載のデバイス(100)。
- 成長チャンバを準備し、
成長面(222)を有しているウェハ(210)を設け、
前記成長面(222)上に成長マスク(230)を形成し、該成長マスク(230)が、一定幅の細長い成長窓(234)を画定するマスク層(245)と、当該マスク層(245)上に形成された、周期的な格子の輪郭形状(235、236)を有するマスクストライプ(232)とを含み、
前記成長チャンバにおいて製造プロセスを行うことを含む、デバイス(100)の製造方法であって、
前記製造プロセスが、
マイクロ選択領域成長によって前記成長面(222)上に光導波コアメサ(240)を成長させ、
製造後に前記成長チャンバからウェハ(210)を取り出すことなく、前記光導波コアメサ(240)を、前記成長マスク(230)の少なくとも一部上に延びるようクラッド材料(160)で覆い、前記クラッド材料が平らな主表面を有することを含み、
前記成長面(222)が[100]結晶配向を有しており、
前記光導波コアメサ(240)が、[111]結晶配向を有するサイドウォールを有しており、
前記成長マスク(230)が、前記成長面(222)の[011]結晶配向に平行に整列された向かい合うエッジを有している、デバイス(100)の製造方法。
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US11/154,034 US7440666B2 (en) | 2004-02-25 | 2005-06-16 | Buried heterostucture device having integrated waveguide grating fabricated by single step MOCVD |
US11/154034 | 2005-06-16 |
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JP2007019492A JP2007019492A (ja) | 2007-01-25 |
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EP (1) | EP1742314A3 (ja) |
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KR (1) | KR101252469B1 (ja) |
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WO2010068476A2 (en) * | 2008-11-25 | 2010-06-17 | The Regents Of The University Of California | Ultra-low loss hollow core waveguide using high-contrast gratings |
JP5373585B2 (ja) * | 2009-12-21 | 2013-12-18 | 日本電信電話株式会社 | 半導体レーザ及び電界吸収型変調器集積分布帰還型レーザ |
JP4917157B2 (ja) * | 2010-02-26 | 2012-04-18 | Nttエレクトロニクス株式会社 | リッジ型半導体レーザ及びリッジ型半導体レーザの製造方法 |
KR101758141B1 (ko) * | 2010-09-17 | 2017-07-14 | 삼성전자주식회사 | 수직 슬랩들을 포함하는 광전자 장치 |
US8934512B2 (en) | 2011-12-08 | 2015-01-13 | Binoptics Corporation | Edge-emitting etched-facet lasers |
RU2529450C2 (ru) * | 2012-07-04 | 2014-09-27 | Федеральное Государственное Бюджетное Образовательное Учреждение Высшего Профессионального Образования "Нижегородский Государственный Университет Им. Н.И. Лобачевского" | Полупроводниковый лазер (варианты) |
US8927306B2 (en) * | 2013-02-28 | 2015-01-06 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Etched-facet lasers having windows with single-layer optical coatings |
WO2017192718A1 (en) * | 2016-05-05 | 2017-11-09 | Macom Technology Solutions Holdings, Inc. | Semiconductor laser incorporating an electron barrier with low aluminum content |
US11552217B2 (en) | 2018-11-12 | 2023-01-10 | Epistar Corporation | Semiconductor device |
TWI821302B (zh) * | 2018-11-12 | 2023-11-11 | 晶元光電股份有限公司 | 半導體元件及其封裝結構 |
US11133649B2 (en) * | 2019-06-21 | 2021-09-28 | Palo Alto Research Center Incorporated | Index and gain coupled distributed feedback laser |
CA3194961A1 (en) * | 2020-10-05 | 2022-04-14 | National Research Council Of Canada | Corrugated buried heterostructure laser and method for fabricating the same |
CN113668050A (zh) * | 2021-08-18 | 2021-11-19 | 福建中科光芯光电科技有限公司 | 激光辅助加热mocvd装置及其工作方法 |
CN117613663B (zh) * | 2024-01-19 | 2024-05-10 | 武汉云岭光电股份有限公司 | 激光器及其制作方法 |
CN117805968B (zh) * | 2024-02-29 | 2024-05-17 | 江苏南里台科技有限公司 | 一种光子芯片图案结构的制作方法及*** |
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WO2005011076A1 (en) | 2003-07-31 | 2005-02-03 | Bookham Technology Plc | Weakly guiding ridge waveguides with vertical gratings |
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2005
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2006
- 2006-06-09 TW TW095120586A patent/TWI333306B/zh not_active IP Right Cessation
- 2006-06-12 EP EP06012066A patent/EP1742314A3/en not_active Withdrawn
- 2006-06-15 KR KR1020060054080A patent/KR101252469B1/ko not_active IP Right Cessation
- 2006-06-16 JP JP2006166847A patent/JP5280614B2/ja not_active Expired - Fee Related
- 2006-06-16 CN CN2006101422932A patent/CN1945365B/zh not_active Expired - Fee Related
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US20090068778A1 (en) | 2009-03-12 |
US7941024B2 (en) | 2011-05-10 |
EP1742314A3 (en) | 2008-11-12 |
KR101252469B1 (ko) | 2013-04-17 |
EP1742314A2 (en) | 2007-01-10 |
KR20060131683A (ko) | 2006-12-20 |
US20050276557A1 (en) | 2005-12-15 |
JP2007019492A (ja) | 2007-01-25 |
TW200735495A (en) | 2007-09-16 |
CN1945365A (zh) | 2007-04-11 |
US7440666B2 (en) | 2008-10-21 |
CN1945365B (zh) | 2010-10-13 |
TWI333306B (en) | 2010-11-11 |
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