JP5271611B2 - 研磨装置及び研磨方法 - Google Patents
研磨装置及び研磨方法 Download PDFInfo
- Publication number
- JP5271611B2 JP5271611B2 JP2008155997A JP2008155997A JP5271611B2 JP 5271611 B2 JP5271611 B2 JP 5271611B2 JP 2008155997 A JP2008155997 A JP 2008155997A JP 2008155997 A JP2008155997 A JP 2008155997A JP 5271611 B2 JP5271611 B2 JP 5271611B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- tape
- polished
- polishing head
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000005498 polishing Methods 0.000 title claims abstract description 282
- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000003825 pressing Methods 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 31
- 230000005540 biological transmission Effects 0.000 claims description 11
- 238000000227 grinding Methods 0.000 abstract description 24
- 238000004804 winding Methods 0.000 abstract description 14
- 230000000452 restraining effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 38
- 239000004065 semiconductor Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 230000006378 damage Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 230000037303 wrinkles Effects 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
- B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
- B24B21/12—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces involving a contact wheel or roller pressing the belt against the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Description
図1の研磨ヘッドのX−X断面図、図3(a)は図2のA−A断面図、図3(b)は図2のB−B断面図、図4(a)は図2のA−A断面における駆動伝達経路説明図、図4(b)は図2のC−C断面における駆動伝達経路説明図、図5(a)は図2のD−D矢視図、図5(b)は図2のE−E矢視図である。
2 支持ユニット
3 ワークテーブルユニット
4 研磨ヘッド
5 上部フレーム
6 下部フレーム
10a 左側ブロック
10b 右側ブロック
41a、41b コンタクトローラ
61a、61b 巻取りリール
62a、62b 供給リール
T1、T2 研磨テープ
Z 回転軸
Claims (3)
- 走行する研磨テープが装着される研磨ヘッドと、前記研磨テープを被研磨材に押圧して前記研磨ヘッドを回転させる支持ユニットと、前記被研磨材が回転可能に装着されるワーク回転ユニットとを備えてなる研磨装置であって、
前記研磨ヘッドは、研磨テープと、該研磨テープを供給する供給リールと、供給された研磨テープを前記被研磨材に当接させるコンタクトローラと、該コンタクトローラを経た研磨テープを巻き取る巻取りリールと、を各2組有し、
前記被研磨材に押圧される前記研磨テープが、前記研磨ヘッドの回転軸と左右対称に、かつ所定の距離をおいて配置されると共に、それぞれ逆方向に走行可能とであり、
前記供給リール及び前記巻取りリールは、同期回転可能となるように、前記供給リール及び前記巻取りリールを駆動させる駆動モータ及び該駆動を伝達する駆動伝達装置に連結されて成り、
前記駆動モータは、前記研磨ヘッドの回転軸の一方の側に配置されると共に、前記回転軸の他方の側に前記駆動モータ及び前記伝達装置との重量平衡をとる重量平衡用部材を配置したことを特徴とする研磨装置。 - 請求項1に記載の研磨装置を使用してなる研磨方法であって、
逆方向に走行する2本の前記研磨テープの前記コンタクトローラに当接する位置において、前記研磨ヘッドの回転方向と対向する向きに走行して前記被研磨部材を研磨することを特徴とする研磨方法。 - 前記2本の研磨テープのうち、一方の研磨テープの外側と、他方の研磨テープの外側との間が、薄板円形である被研磨材の半径を超えた長さであって、かつ前記被研磨材の直径の長さよりも小さい範囲に設定してなることを特徴とする請求項2に記載の研磨方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008155997A JP5271611B2 (ja) | 2008-06-13 | 2008-06-13 | 研磨装置及び研磨方法 |
TW098109947A TW201000255A (en) | 2008-06-13 | 2009-03-26 | Polishing apparatus and polishing method |
KR1020090033937A KR20090129938A (ko) | 2008-06-13 | 2009-04-20 | 연마 장치 및 연마 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008155997A JP5271611B2 (ja) | 2008-06-13 | 2008-06-13 | 研磨装置及び研磨方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009297844A JP2009297844A (ja) | 2009-12-24 |
JP5271611B2 true JP5271611B2 (ja) | 2013-08-21 |
Family
ID=41545275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008155997A Active JP5271611B2 (ja) | 2008-06-13 | 2008-06-13 | 研磨装置及び研磨方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5271611B2 (ja) |
KR (1) | KR20090129938A (ja) |
TW (1) | TW201000255A (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013026247A (ja) * | 2011-07-15 | 2013-02-04 | Sumitomo Electric Ind Ltd | 半導体装置の製造方法 |
US10144109B2 (en) * | 2015-12-30 | 2018-12-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Polisher, polishing tool, and polishing method |
CN108857746A (zh) * | 2018-09-18 | 2018-11-23 | 天津冰科技有限公司 | 一种模具零件打磨装置 |
CN114505751B (zh) * | 2021-12-30 | 2023-06-09 | 河南豫科光学科技股份有限公司 | 一种自动蒙砂玻璃生产线 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3024947B2 (ja) * | 1997-07-03 | 2000-03-27 | 日本ミクロコーティング株式会社 | 研磨装置 |
JPH11216654A (ja) * | 1998-02-02 | 1999-08-10 | Speedfam Co Ltd | 研磨装置 |
JP2006272546A (ja) * | 2000-06-30 | 2006-10-12 | Ebara Corp | 研磨装置及び研磨方法 |
-
2008
- 2008-06-13 JP JP2008155997A patent/JP5271611B2/ja active Active
-
2009
- 2009-03-26 TW TW098109947A patent/TW201000255A/zh unknown
- 2009-04-20 KR KR1020090033937A patent/KR20090129938A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
TW201000255A (en) | 2010-01-01 |
JP2009297844A (ja) | 2009-12-24 |
KR20090129938A (ko) | 2009-12-17 |
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