JP5097427B2 - 金属ケイ素粉末の製造方法、球状シリカ粉末の製造方法及び樹脂組成物の製造方法 - Google Patents
金属ケイ素粉末の製造方法、球状シリカ粉末の製造方法及び樹脂組成物の製造方法 Download PDFInfo
- Publication number
- JP5097427B2 JP5097427B2 JP2007095135A JP2007095135A JP5097427B2 JP 5097427 B2 JP5097427 B2 JP 5097427B2 JP 2007095135 A JP2007095135 A JP 2007095135A JP 2007095135 A JP2007095135 A JP 2007095135A JP 5097427 B2 JP5097427 B2 JP 5097427B2
- Authority
- JP
- Japan
- Prior art keywords
- metal silicon
- powder
- producing
- spherical silica
- silica powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 91
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 89
- 229910052751 metal Inorganic materials 0.000 title claims description 77
- 239000002184 metal Substances 0.000 title claims description 77
- 239000011863 silicon-based powder Substances 0.000 title claims description 53
- 239000000843 powder Substances 0.000 title claims description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 48
- 239000000377 silicon dioxide Substances 0.000 title claims description 45
- 239000011342 resin composition Substances 0.000 title claims description 11
- 238000000034 method Methods 0.000 claims description 42
- 229910052710 silicon Inorganic materials 0.000 claims description 38
- 239000010703 silicon Substances 0.000 claims description 38
- 229910052770 Uranium Inorganic materials 0.000 claims description 22
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 22
- 238000004140 cleaning Methods 0.000 claims description 21
- 238000010298 pulverizing process Methods 0.000 claims description 19
- 239000002994 raw material Substances 0.000 claims description 17
- 238000002844 melting Methods 0.000 claims description 15
- 230000008018 melting Effects 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 13
- 238000000746 purification Methods 0.000 claims description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 12
- 238000007711 solidification Methods 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 230000008023 solidification Effects 0.000 claims description 10
- 150000007522 mineralic acids Chemical class 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 238000005406 washing Methods 0.000 claims description 7
- 239000012159 carrier gas Substances 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 4
- 238000007654 immersion Methods 0.000 claims description 2
- 238000007670 refining Methods 0.000 claims description 2
- 238000005204 segregation Methods 0.000 claims description 2
- 239000012535 impurity Substances 0.000 description 24
- 239000003822 epoxy resin Substances 0.000 description 14
- 229920000647 polyepoxide Polymers 0.000 description 14
- 239000002245 particle Substances 0.000 description 12
- -1 cyclic ether compounds Chemical class 0.000 description 10
- 238000001816 cooling Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 239000002893 slag Substances 0.000 description 3
- CQOZJDNCADWEKH-UHFFFAOYSA-N 2-[3,3-bis(2-hydroxyphenyl)propyl]phenol Chemical compound OC1=CC=CC=C1CCC(C=1C(=CC=CC=1)O)C1=CC=CC=C1O CQOZJDNCADWEKH-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000004294 cyclic thioethers Chemical class 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000010309 melting process Methods 0.000 description 2
- 150000002921 oxetanes Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 150000004873 thianes Chemical class 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 description 1
- ZXHDVRATSGZISC-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane Chemical compound C=COCCOC=C ZXHDVRATSGZISC-UHFFFAOYSA-N 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- AUAGGMPIKOZAJZ-UHFFFAOYSA-N 1,3,6-trioxocane Chemical compound C1COCOCCO1 AUAGGMPIKOZAJZ-UHFFFAOYSA-N 0.000 description 1
- SDRZFSPCVYEJTP-UHFFFAOYSA-N 1-ethenylcyclohexene Chemical compound C=CC1=CCCCC1 SDRZFSPCVYEJTP-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- CXURGFRDGROIKG-UHFFFAOYSA-N 3,3-bis(chloromethyl)oxetane Chemical compound ClCC1(CCl)COC1 CXURGFRDGROIKG-UHFFFAOYSA-N 0.000 description 1
- RVGLUKRYMXEQAH-UHFFFAOYSA-N 3,3-dimethyloxetane Chemical compound CC1(C)COC1 RVGLUKRYMXEQAH-UHFFFAOYSA-N 0.000 description 1
- RPRIYERFOHERFT-UHFFFAOYSA-N 3,3-dimethylthietane Chemical class CC1(C)CSC1 RPRIYERFOHERFT-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000007848 Bronsted acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical class [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- VEZXCJBBBCKRPI-UHFFFAOYSA-N beta-propiolactone Chemical compound O=C1CCO1 VEZXCJBBBCKRPI-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004200 deflagration Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 150000002924 oxiranes Chemical class 0.000 description 1
- 239000006072 paste Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 229960000380 propiolactone Drugs 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000002285 radioactive effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- VOVUARRWDCVURC-UHFFFAOYSA-N thiirane Chemical compound C1CS1 VOVUARRWDCVURC-UHFFFAOYSA-N 0.000 description 1
- 150000003553 thiiranes Chemical class 0.000 description 1
- 150000003572 thiolanes Chemical class 0.000 description 1
- 238000010977 unit operation Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 229960000834 vinyl ether Drugs 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
前記凝固物を粉砕して粉砕物を得る粉砕工程と、
少なくともフッ酸を含む無機酸に前記粉砕物を所定時間浸漬処理した後、洗浄して被処理物を得る除去洗浄工程と、
を有する精製工程を2回以上繰り返すことで、当初の純度が90%以上の金属ケイ素原料を精製して前記金属ケイ素粉末を得ることを特徴とする。
得られた各実施例及び比較例の金属ケイ素粉末についての分析結果を表1に示す。
実施例1及び比較例の金属ケイ素粉末を用いてVMC法にて球状シリカ粉末を製造した。
Claims (4)
- 金属ケイ素粉末を火炎中で酸素と反応させて球状シリカ粉末を製造するときに用いる前記金属ケイ素粉末を製造する方法であって、
金属ケイ素原料を溶融した後、凝固して凝固物を得る溶融凝固工程と、
前記凝固物を粉砕して粉砕物を得る粉砕工程と、
少なくともフッ酸を含む無機酸に前記粉砕物を所定時間浸漬処理した後、洗浄して被処理物を得る除去洗浄工程と、
を有する精製工程を2回以上繰り返すことで、当初の純度が90%以上の金属ケイ素原料を精製して前記金属ケイ素粉末を得ることを特徴とする金属ケイ素粉末の製造方法。 - 前記溶融凝固工程はケイ素の融点近傍で溶融物を保持して相対的に高純度な金属ケイ素を凝固させて偏析させる偏析工程を有し、
前記除去洗浄工程は相対的にウラン含有濃度が高い前記粉砕物の表面部分を溶解除去する工程であり、
製造される金属ケイ素粉末中のウラン濃度が質量基準で0.5ppb以下である請求項1に記載の金属ケイ素粉末の製造方法。 - 請求項1又は2に記載の製造方法にて製造された金属ケイ素粉末をキャリヤガスと共に酸素過剰の酸化炎中に投入することで球状シリカ粉末を得ることを特徴とする球状シリカ粉末の製造方法。
- 請求項3に記載の製造方法にて製造された球状シリカ粉末と有機樹脂材料とを混合し、前記球状シリカ粉末を前記有機樹脂材料中に分散させる工程を有することを特徴とする樹脂組成物の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007095135A JP5097427B2 (ja) | 2007-03-30 | 2007-03-30 | 金属ケイ素粉末の製造方法、球状シリカ粉末の製造方法及び樹脂組成物の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007095135A JP5097427B2 (ja) | 2007-03-30 | 2007-03-30 | 金属ケイ素粉末の製造方法、球状シリカ粉末の製造方法及び樹脂組成物の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008247723A JP2008247723A (ja) | 2008-10-16 |
JP5097427B2 true JP5097427B2 (ja) | 2012-12-12 |
Family
ID=39973120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007095135A Active JP5097427B2 (ja) | 2007-03-30 | 2007-03-30 | 金属ケイ素粉末の製造方法、球状シリカ粉末の製造方法及び樹脂組成物の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5097427B2 (ja) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60195016A (ja) * | 1984-03-16 | 1985-10-03 | Agency Of Ind Science & Technol | 金属けい素の精製法 |
JPH0761856B2 (ja) * | 1990-09-25 | 1995-07-05 | 信越化学工業株式会社 | 二酸化珪素粉末の製造方法 |
JPH0867510A (ja) * | 1994-08-31 | 1996-03-12 | Tokuyama Corp | 多結晶シリコン機械的加工物 |
WO1998016466A1 (fr) * | 1996-10-14 | 1998-04-23 | Kawasaki Steel Corporation | Procede et appareil de preparation de silicium polycristallin et procede de preparation d'un substrat en silicium pour cellule solaire |
JP3415382B2 (ja) * | 1996-12-25 | 2003-06-09 | トヨタ自動車株式会社 | 高純度珪素粉末の製造方法 |
JP2006206722A (ja) * | 2005-01-27 | 2006-08-10 | Admatechs Co Ltd | 低反応性シリカ粉体、それを用いたエポキシ樹脂組成物、およびエポキシ樹脂成形体 |
-
2007
- 2007-03-30 JP JP2007095135A patent/JP5097427B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2008247723A (ja) | 2008-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102595535B1 (ko) | 구상 결정성 실리카 입자 및 그의 제조 방법 | |
JP5825145B2 (ja) | 合成非晶質シリカ粉末及びその製造方法 | |
JP4815209B2 (ja) | 硬化剤及び樹脂組成物 | |
JP4766837B2 (ja) | シリコンからのホウ素除去方法 | |
RU2451635C2 (ru) | Способ получения высокочистого элементного кремния | |
JP2009073728A (ja) | シリコンの製造方法 | |
JP5140835B2 (ja) | 高純度シリコンの製造方法 | |
BRPI0609475A2 (pt) | processo para converter sici4 em si metálico | |
JPWO2011083710A1 (ja) | 合成非晶質シリカ粉末及びその製造方法 | |
CN104058405B (zh) | 一种去除金属硅中杂质磷和硼的方法 | |
JP4436904B2 (ja) | Si製造方法 | |
JP2006282498A (ja) | 高純度シリコンの製造方法 | |
JP4958404B2 (ja) | 球状シリカ粒子、樹脂組成物及び半導体液状封止材 | |
JP2001220126A (ja) | 結晶質合成シリカ粉体及びこれを用いたガラス成形体 | |
JP5265097B2 (ja) | 球状シリカ粒子、樹脂組成物及び半導体液状封止材及び球状シリカ粒子の製造方法 | |
CN103526049A (zh) | 一种火法冶炼锑除砷的方法 | |
EP2460772A2 (en) | Method of manufacturing granulated silica powder, method of manufacturing vitreous silica crucible | |
JP5097427B2 (ja) | 金属ケイ素粉末の製造方法、球状シリカ粉末の製造方法及び樹脂組成物の製造方法 | |
WO2007020855A1 (ja) | 球状化無機物粉末の製造方法 | |
JP5094184B2 (ja) | 金属ケイ素粉末及びその製造方法、球状シリカ粉末並びに樹脂組成物 | |
JP5094183B2 (ja) | 金属ケイ素粉末及びその製造方法、球状シリカ粉末並びに樹脂組成物 | |
JP4731818B2 (ja) | 高純度SiO固体の製造方法及び製造装置 | |
CN104583124A (zh) | 用于纯化硅的方法 | |
RU2588627C1 (ru) | Способ рафинирования металлургического кремния | |
KR20110052564A (ko) | 규소-기재 그린 바디 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100108 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111028 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111101 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111226 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120828 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120924 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5097427 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150928 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |