JP5088060B2 - Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same - Google Patents

Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same Download PDF

Info

Publication number
JP5088060B2
JP5088060B2 JP2007242503A JP2007242503A JP5088060B2 JP 5088060 B2 JP5088060 B2 JP 5088060B2 JP 2007242503 A JP2007242503 A JP 2007242503A JP 2007242503 A JP2007242503 A JP 2007242503A JP 5088060 B2 JP5088060 B2 JP 5088060B2
Authority
JP
Japan
Prior art keywords
organic solvent
resin composition
thermosetting resin
component
prepreg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007242503A
Other languages
Japanese (ja)
Other versions
JP2008163308A (en
Inventor
智彦 小竹
信次 土川
雅則 秋山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2007242503A priority Critical patent/JP5088060B2/en
Publication of JP2008163308A publication Critical patent/JP2008163308A/en
Application granted granted Critical
Publication of JP5088060B2 publication Critical patent/JP5088060B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Epoxy Resins (AREA)
  • Reinforced Plastic Materials (AREA)
  • Laminated Bodies (AREA)

Description

本発明は、有機溶剤への溶解性が良く、金属箔接着性、耐熱性、耐湿性、難燃性、金属付き耐熱性及び誘電特性(比誘電率、誘電正接)の全てにおいてバランスがとれ、電子部品等に好適に用いられる熱硬化性樹脂組成物並びに、これを用いたプリプレグ、積層板及びプリント配線板に関する。   The present invention has good solubility in organic solvents, and is well balanced in all of metal foil adhesion, heat resistance, moisture resistance, flame resistance, heat resistance with metal and dielectric properties (dielectric constant, dielectric loss tangent), The present invention relates to a thermosetting resin composition suitably used for electronic parts and the like, and a prepreg, a laminate and a printed wiring board using the same.

熱硬化性樹脂は、その特有な架橋構造が高い耐熱性や寸法安定性を発現するため、電子部品等の高い信頼性を要求される分野において広く使われているが、特に銅張積層板や層間絶縁材料においては、近年の高密度化への要求から、微細配線形成のための高い銅箔接着性や、ドリル又は打ち抜きにより穴あけ等の加工をする際の加工性も必要とされる。また、近年の環境問題から、鉛フリーはんだによる電子部品の搭載やハロゲンフリーによる難燃化が要求され、そのため従来のものよりも高い耐熱性及び難燃性が必要とされる。さらに、製品の安全性や作業環境の向上化のため、毒性の低い成分のみで構成され、毒性ガス等が発生しない熱硬化性樹脂組成物が望まれている。   Thermosetting resins are widely used in fields that require high reliability, such as electronic parts, because their unique cross-linked structure exhibits high heat resistance and dimensional stability. In the interlayer insulating material, due to the recent demand for higher density, high copper foil adhesiveness for forming fine wiring and workability when drilling or punching is required. Moreover, due to recent environmental problems, mounting of electronic parts using lead-free solder and flame resistance using halogen-free are required, and therefore higher heat resistance and flame resistance than conventional ones are required. Furthermore, in order to improve the safety of the product and the working environment, there is a demand for a thermosetting resin composition that is composed only of low-toxic components and does not generate toxic gases.

また、熱硬化性樹脂であるメラミン樹脂やグアナミン化合物は、接着性、難燃性、耐熱性に優れる樹脂であるが、有機溶剤への溶解性が不足し、毒性の高いN,N−ジメチルホルムアミド等の窒素原子含有有機溶剤を多量に使用しないと熱硬化性樹脂組成物の作製が困難であったり、また保存安定性が不足する問題がある。   Melamine resins and guanamine compounds, which are thermosetting resins, are resins that are excellent in adhesiveness, flame retardancy, and heat resistance, but are poorly soluble in organic solvents and highly toxic N, N-dimethylformamide. Unless a nitrogen atom-containing organic solvent such as a large amount is used, it is difficult to produce a thermosetting resin composition, and storage stability is insufficient.

メラミン樹脂やグアナミン化合物を使用した熱硬化性樹脂に関する多くの事例が知られている(例えば、特許文献1〜5参照)。
しかしながら、これらの熱硬化性樹脂はメラミン樹脂やグアナミン化合物をホルムアルデヒド等のアルデヒド類を用いて縮合させたものであり、有機溶剤への溶解性は改良されているものの、熱分解温度が低く、近年要求される鉛フリーはんだへの耐熱性や銅付き耐熱性が不足する。また微細な加工処理・配線形成において、銅箔接着性や可とう性、靭性が不足し、回路パターンが断線や剥離を生じたり、ドリルや打ち抜きにより穴あけ等の加工をする際にクラックが発生する等の不具合が生じる。
また、メチロール化グアナミン樹脂に関する事例が開示されているが(例えば、特許文献6参照)、これも上記と同様に耐熱性や接着性、加工性等の問題がある。
Many examples relating to thermosetting resins using melamine resins and guanamine compounds are known (see, for example, Patent Documents 1 to 5).
However, these thermosetting resins are those obtained by condensing melamine resins and guanamine compounds using aldehydes such as formaldehyde, and although the solubility in organic solvents has been improved, the thermal decomposition temperature is low, The required heat resistance to lead-free solder and heat resistance with copper are insufficient. Also, in fine processing and wiring formation, copper foil adhesion, flexibility, and toughness are insufficient, circuit patterns are broken or peeled off, and cracks occur when drilling or punching is performed. Such problems occur.
Moreover, although the example regarding a methylolation guanamine resin is disclosed (for example, refer patent document 6), this also has problems, such as heat resistance, adhesiveness, workability, like the above.

一方、臭素含有難燃剤に代わるハロゲンフリーの難燃剤として、リン化合物が提案されている。しかし、リン酸又はリン酸エステル等を用いる場合、ブリードや加水分解性、耐熱性及び電気的信頼性の低下等の問題から、その使用量が限られ十分な難燃性が得られない等の問題がある。また赤リンは、打撃衝撃による発火等の安全上の理由や耐電食性等の信頼性を著しく劣化させる等の問題がある。   On the other hand, phosphorus compounds have been proposed as halogen-free flame retardants to replace bromine-containing flame retardants. However, when using phosphoric acid or phosphoric acid ester, the amount of use is limited and sufficient flame retardancy cannot be obtained due to problems such as bleed, hydrolyzability, heat resistance and electrical reliability degradation. There's a problem. In addition, red phosphorus has problems such as safety reasons such as ignition due to impact and significant deterioration in reliability such as electric corrosion resistance.

特公昭62−46584号公報Japanese Examined Patent Publication No. 62-46584 特開平10−67942号公報Japanese Patent Laid-Open No. 10-67942 特開2001−11672号公報JP 2001-11672 A 特開平02−258820号公報Japanese Patent Laid-Open No. 02-258820 特開平03−145476号公報Japanese Patent Laid-Open No. 03-145476 特公昭62−61051号公報Japanese Examined Patent Publication No. 62-61051

本発明の目的は、こうした現状に鑑み、熱硬化性樹脂組成物作製時におけるグアナミン化合物の有機溶剤に対する溶解性を向上させ、金属箔接着性、耐熱性、耐湿性、難燃性、金属付き耐熱性、低誘電特性及び低誘電正接性の全てにおいてバランスのとれた熱硬化性樹脂組成物並びにこれを用いたプリプレグ、積層板及びプリント配線板を提供することである。   In view of the current situation, the object of the present invention is to improve the solubility of a guanamine compound in an organic solvent at the time of preparing a thermosetting resin composition, and adhere to metal foil, heat resistance, moisture resistance, flame resistance, and heat resistance with metal. It is to provide a thermosetting resin composition balanced in all of the properties, low dielectric properties and low dielectric loss tangent, and a prepreg, a laminate and a printed wiring board using the same.

本発明者らは、前記目的を達成するために鋭意研究を重ねた結果、6−置換グアナミン化合物に、フェノール性化合物及びエポキシ樹脂を配合し、有機溶剤にて均一に溶解した樹脂組成物又はこの樹脂組成物にN−置換マレイミド基を有するマレイミド化合物を加えてグアナミン化合物と反応させて得られた均一溶液である樹脂組成物が、積層板用熱硬化性樹脂組成物として有利に用いられることを見出した。   As a result of intensive studies to achieve the above object, the present inventors have blended a 6-substituted guanamine compound with a phenolic compound and an epoxy resin and uniformly dissolved in an organic solvent, or this A resin composition that is a homogeneous solution obtained by adding a maleimide compound having an N-substituted maleimide group to a resin composition and reacting with a guanamine compound is advantageously used as a thermosetting resin composition for laminates. I found it.

すなわち、本発明は、以下の熱硬化性樹脂組成物並びにプリプレグ、積層板及びプリント配線板を提供するものである。
1.下記一般式(I)に示す6−置換グアナミン化合物(a)、軟化点が120℃以下であるフェノール性化合物(b)、1分子中に少なくとも2個のエポキシ基を有するエポキシ樹脂(c)及び有機溶剤(d)を含有し、成分(a)、成分(b)及び成分(c)の総合計量100質量部に対して成分(a)の含有量が20〜79質量部であり、均一溶液であることを特徴とする熱硬化性樹脂組成物(これを「熱硬化性樹脂組成物A」と称する。)。
That is, the present invention provides the following thermosetting resin composition, prepreg, laminate and printed wiring board.
1. A 6-substituted guanamine compound (a) represented by the following general formula (I) , a phenolic compound (b) having a softening point of 120 ° C. or lower, an epoxy resin (c) having at least two epoxy groups in one molecule, and The organic solvent (d) is contained, the content of the component (a) is 20 to 79 parts by mass with respect to 100 parts by mass of the total weight of the component (a), the component (b) and the component (c), and a uniform solution A thermosetting resin composition (referred to as “thermosetting resin composition A”).

Figure 0005088060
(式中、R1はフェニル基、メチル基、ブチル基、アリル基、メトキシ基又はベンジルオキシ基を示す。)
Figure 0005088060
(In the formula, R 1 represents a phenyl group, a methyl group, a butyl group, an allyl group, a methoxy group, or a benzyloxy group.)

2.有機溶剤(d)が窒素非含有有機溶剤である上記1の熱硬化性樹脂組成物。
3.窒素非含有有機溶剤が、アルコール系有機溶剤(d1)又はアルコール系有機溶剤(d1)と、エーテル系有機溶剤(d2)、ケトン系有機溶剤(d3)及び芳香族系有機溶剤(d4)のうち少なくとも一種とを含む有機溶剤である上記2の熱硬化性樹脂組成物。
4.窒素非含有有機溶剤が、プロピレングリコールモノメチルエーテル及び/又はメチルセロソルブと、メチルエチルケトン、メチルイソブチルケトン及びシクロヘキサノンのうち少なくとも一種とを含む有機溶剤である上記3の熱硬化性樹脂組成物。
5.上記1〜4のいずれかの熱硬化性樹脂組成物に、1分子中に少なくとも2個のN−置換マレイミド基を有するマレイミド化合物(e)を加え、前記の6−置換グアナミン化合物(a)と反応させて得られ、均一溶液であることを特徴とする熱硬化性樹脂組成物(これを「熱硬化性樹脂組成物B」と称する。)。
6.上記1〜5のいずれかの熱硬化性樹脂組成物を、基材に含浸又は塗工した後、Bステージ化して得られたプリプレグ。
7.上記6のプリプレグを積層成形して得られた積層板。
8.プリプレグの少なくとも一方に金属箔を重ねた後、加熱加圧成形して得られた金属張積層板である上記7の積層板。
9.上記7又は8の金属張積層板を用い、配線加工して得られたプリント配線板。
2. The thermosetting resin composition according to 1 above, wherein the organic solvent (d) is a nitrogen-free organic solvent.
3. The nitrogen-free organic solvent is an alcohol organic solvent (d1) or an alcohol organic solvent (d1), an ether organic solvent (d2), a ketone organic solvent (d3), and an aromatic organic solvent (d4). 2. The thermosetting resin composition according to 2 above, which is an organic solvent containing at least one kind.
4). 3. The thermosetting resin composition according to 3 above, wherein the nitrogen-free organic solvent is an organic solvent containing propylene glycol monomethyl ether and / or methyl cellosolve and at least one of methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone.
5. A maleimide compound (e) having at least two N-substituted maleimide groups in one molecule is added to the thermosetting resin composition of any one of 1 to 4, and the 6-substituted guanamine compound (a) A thermosetting resin composition obtained by reacting and being a homogeneous solution (referred to as “thermosetting resin composition B”).
6). A prepreg obtained by impregnating or coating the thermosetting resin composition according to any one of the above 1 to 5 on a base material and then forming a B-stage.
7). A laminate obtained by laminating the prepreg of 6 above.
8). 8. The laminate as described in 7 above, which is a metal-clad laminate obtained by heating and pressing after a metal foil is laminated on at least one of the prepregs.
9. The printed wiring board obtained by carrying out wiring processing using the said 7 or 8 metal-clad laminated board.

本発明の熱硬化性樹脂組成物は、金属箔接着性、耐熱性、耐湿性、難燃性、金属付き耐熱性、比誘電率及び低誘電正接の全てにおいてバランスのとれたものである。
また、本発明の熱硬化性樹脂組成物は(a)〜(d)成分の均一溶液又は更に(e)成分を加えて(a)成分と反応させて得られた均一溶液であり、毒性の高いN,N−ジメチルホルムアミド等の窒素含有有機溶剤を用いることがなく、安全性や作業環境にも優れるものであることから、上記の優れた性能を有するプリプレグや積層板、プリント配線板などを有利に提供することができる。
The thermosetting resin composition of the present invention is well balanced in all of metal foil adhesion, heat resistance, moisture resistance, flame resistance, heat resistance with metal, relative dielectric constant and low dielectric loss tangent.
The thermosetting resin composition of the present invention is a homogeneous solution obtained by reacting the component (a) to the component (a) to the component (a) to the component (a) by adding the component (a) to the component (a). Since it does not use a high nitrogen-containing organic solvent such as N, N-dimethylformamide and is excellent in safety and working environment, prepregs, laminates, printed wiring boards, etc. having the above-mentioned excellent performance are used. Can be advantageously provided.

以下、本発明について詳細に説明する。
先ず本発明の熱硬化性樹脂組成物Aは、下記一般式(I)に示す6−置換グアナミン化合物(a)、軟化点が120℃以下であるフェノール性化合物(b)、1分子中に少なくとも2個のエポキシ基を有するエポキシ樹脂(c)及び有機溶剤(d)を含有し、成分(a)、成分(b)及び成分(c)の総合計量100質量部に対して成分(a)の含有量が20〜79質量部である均一溶液である。
Hereinafter, the present invention will be described in detail.
First, the thermosetting resin composition A of the present invention includes a 6-substituted guanamine compound (a) represented by the following general formula (I) , a phenolic compound (b) having a softening point of 120 ° C. or lower, and at least one molecule. It contains an epoxy resin (c) having two epoxy groups and an organic solvent (d), and the component (a) with respect to 100 parts by mass of the total weight of component (a), component (b) and component (c). It is a uniform solution having a content of 20 to 79 parts by mass .

Figure 0005088060
(式中、R1はフェニル基、メチル基、アリル基、ブチル基、メトキシ基又はベンジルオキシ基を示す。)
Figure 0005088060
(In the formula, R 1 represents a phenyl group, a methyl group, an allyl group, a butyl group, a methoxy group, or a benzyloxy group.)

(a)成分の一般式(I)に示す6−置換グアナミン化合物〔以下、6−置換グアナミン化合物(a)とも云う〕としては、例えばベンゾグアナミン(2,4−ジアミノ−6−フェニル−s−トリアジン)、アセトグアナミン(2,4−ジアミノ−6−メチル−s−トリアジン)、2,4−ジアミノ−6−ビニル−s−トリアジン等が挙げられ、これらの中で、反応の反応率が高く、より高耐熱性化できるベンゾグアナミン、2,4−ジアミノ−6−ビニル−s−トリアジンがより好ましく、安価である点からベンゾグアナミンが特に好ましい。   Examples of the 6-substituted guanamine compound (hereinafter also referred to as 6-substituted guanamine compound (a)) represented by the general formula (I) of the component (a) include, for example, benzoguanamine (2,4-diamino-6-phenyl-s-triazine). ), Acetoguanamine (2,4-diamino-6-methyl-s-triazine), 2,4-diamino-6-vinyl-s-triazine, etc., among these, the reaction rate of the reaction is high, Benzoguanamine and 2,4-diamino-6-vinyl-s-triazine, which can have higher heat resistance, are more preferable, and benzoguanamine is particularly preferable from the viewpoint of low cost.

(b)成分のフェノール性化合物は、1分子中に1個以上のフェノール性ヒドロキシ基を有するフェノール性化合物であり、熱硬化性樹脂組成物Aが均一溶液であるためには、フェノール樹脂では軟化点120℃以下のものが用いられる。
(b)成分のフェノール性化合物としては、例えば、フェノール、2,4−ジヒドロキシ安息香酸、ナフトール、(o−,m−,p−)クレゾール、ビスフェノールA及びビスフェノールF並びに軟化点120℃以下のフェノールノボラック樹脂、クレゾールノボラック樹脂、ビスフェノールノボラック樹脂、フェノールアラルキル樹脂、トリフェニルメタンフェノール樹脂、ビフェニレンフェノールアラルキル樹脂及びナフトールアラルキル樹脂等が挙げられる。
これらの中で、グアナミン化合物の溶解性を高める効果が大きく、誘電特性、耐熱性、接着性から、軟化点120℃以下のフェノールノボラック樹脂、クレゾールノボラック樹脂及びフェノールアラルキル樹脂がより好ましく、より安価であり難燃性に優れる点から軟化点120℃以下のクレゾールノボラック樹脂が特に好ましい。
The phenolic compound (b) is a phenolic compound having one or more phenolic hydroxy groups in one molecule, and since the thermosetting resin composition A is a homogeneous solution, the phenolic resin is softened. Those having a point of 120 ° C. or lower are used.
Examples of the phenolic compound (b) include phenol, 2,4-dihydroxybenzoic acid, naphthol, (o-, m-, p-) cresol, bisphenol A and bisphenol F, and phenol having a softening point of 120 ° C or lower. Examples thereof include novolak resin, cresol novolak resin, bisphenol novolak resin, phenol aralkyl resin, triphenylmethane phenol resin, biphenylene phenol aralkyl resin, and naphthol aralkyl resin.
Among these, phenol novolac resin, cresol novolac resin and phenol aralkyl resin having a softening point of 120 ° C. or less are more preferable and cheaper because of their large effect of increasing the solubility of the guanamine compound, in terms of dielectric properties, heat resistance, and adhesiveness. A cresol novolac resin having a softening point of 120 ° C. or lower is particularly preferred from the viewpoint of excellent flame retardancy.

なお、本発明で規定する軟化点は環球法を用いて測定されるものである。具体的には、試料約50gを乳鉢に入れ、細かく粉砕し、これを100mlのビーカーに移し、サンドバス上で溶融する。予め試料とほぼ同程度に加温しておいた肩付き環を金属製平板に置いて、直ちに溶融試料を環に注ぎ込み、室温(0〜30℃)で30〜40分間放冷又は水で5分間冷却する。過剰の試料を除き、ガード、温度計を取り付け、環台を加熱浴に浸す。加熱開始後3分間を除き、昇温速度3〜5℃/分で加熱する。試料が次第に軟化して落下し始め、底板に触れたときの温度計の示度を軟化点とする。   In addition, the softening point prescribed | regulated by this invention is measured using the ring and ball method. Specifically, about 50 g of a sample is put in a mortar, finely pulverized, transferred to a 100 ml beaker, and melted on a sand bath. Place the shoulder ring, which has been heated to the same degree as the sample, on a metal plate and immediately pour the molten sample into the ring and let it cool at room temperature (0-30 ° C) for 30-40 minutes or with water 5 Cool for minutes. Excess sample is removed, a guard and a thermometer are attached, and the platform is immersed in a heating bath. Except for 3 minutes after the start of heating, it is heated at a heating rate of 3 to 5 ° C./min. The softening point is defined as the reading of the thermometer when the sample starts to soften and falls and touches the bottom plate.

ここで、6−置換グアナミン化合物(a)とフェノール性化合物(b)の使用量比は、6−置換グアナミン化合物(a)の−NH2基の当量と、フェノール性化合物(b)のヒドロキシ基当量との当量比が次式:
0.5≦〔−NH2基の当量〕/〔ヒドロキシ基当量〕≦5.0
に示す範囲内であることが望ましい。該当量比を5.0以下とすることにより、有機溶剤への溶解性が不足したり、ゲル化を起こすことがなく、0.5以上とすることにより熱硬化性樹脂の耐熱性が低下することがない。
Here, the amount ratio of the 6-substituted guanamine compound (a) and the phenolic compound (b) is such that the equivalent of —NH 2 group of the 6-substituted guanamine compound (a) and the hydroxy group of the phenolic compound (b). The equivalent ratio with the equivalent is:
0.5 ≦ [-NH 2 group equivalent] / [hydroxy group equivalent] ≦ 5.0
It is desirable to be within the range shown in. By setting the corresponding amount ratio to 5.0 or less, the solubility in the organic solvent is not insufficient or gelation is not caused. By setting the ratio to 0.5 or more, the heat resistance of the thermosetting resin is lowered. There is nothing.

エポキシ樹脂(c)は、1分子中に2個以上のエポキシ基を有するエポキシ樹脂であれば、特に限定されず、例えば、ビスフェノールA系、ビスフェノールF系、ビフェニル系、ノボラック系、多官能フェノール系、ナフタレン系、脂環式系及びアルコール系等のグリシジルエーテル、グリシジルアミン系並びにグリシジルエステル系等が挙げられ、1種又は2種以上を混合して使用することができる。
これらの中で、誘電特性、耐熱性、耐湿性及び金属箔接着性の点からビスフェノールF型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビフェニル型エポキシ樹脂、ビフェニルアラルキル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂及びクレゾールノボラック型エポキシ樹脂等が好ましく、難燃性や成形加工性の点からビスフェノールF型エポキシ樹脂、ビフェニルアラルキル型エポキシ樹脂、ビフェニル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂及びクレゾールノボラック型エポキシ樹脂がより好ましく、安価であることからフェノールノボラック型エポキシ樹脂及びビスフェノールF型エポキシ樹脂が特に好ましい。
The epoxy resin (c) is not particularly limited as long as it is an epoxy resin having two or more epoxy groups in one molecule. For example, bisphenol A, bisphenol F, biphenyl, novolac, polyfunctional phenol And glycidyl ethers such as naphthalene-based, alicyclic-based and alcohol-based, glycidylamine-based and glycidyl ester-based ones can be used, and one or a mixture of two or more can be used.
Among these, bisphenol F type epoxy resin, dicyclopentadiene type epoxy resin, bisphenol A novolak type epoxy resin, biphenyl type epoxy resin, biphenyl aralkyl type epoxy from the viewpoint of dielectric properties, heat resistance, moisture resistance and metal foil adhesion Resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, etc. are preferable, and bisphenol F type epoxy resin, biphenyl aralkyl type epoxy resin, biphenyl type epoxy resin, phenol novolak type epoxy resin and the like from the viewpoint of flame retardancy and moldability A cresol novolac type epoxy resin is more preferable, and a phenol novolac type epoxy resin and a bisphenol F type epoxy resin are particularly preferable because they are inexpensive.

熱硬化性樹脂組成物Aにはエポキシ樹脂の硬化剤及び硬化促進剤を使用してもよい。
エポキシ樹脂の硬化剤の例としては、無水マレイン酸、無水マレイン酸共重合体等の酸無水物、ジシアノジアミド等のアミン化合物、フェノールノボラック、クレゾールノボラック、フェノールアラルキル樹脂等のフェノール化合物等が挙げられる。これらの中で、耐熱性、誘電特性が良好となるフェノールノボラック、クレゾールノボラック、フェノールアラルキル樹脂等のフェノール化合物が好ましく、安価であり、難燃性や接着性が向上することからクレゾールノボラック型フェノール樹脂が特に好ましい。
エポキシ樹脂の硬化促進剤の例としては、イミダゾール類及びその誘導体、第三級アミン類及び第四級アンモニウム塩等が挙げられる。
In the thermosetting resin composition A, an epoxy resin curing agent and a curing accelerator may be used.
Examples of curing agents for epoxy resins include acid anhydrides such as maleic anhydride and maleic anhydride copolymers, amine compounds such as dicyanodiamide, phenolic compounds such as phenol novolac, cresol novolac, and phenol aralkyl resins. . Of these, phenolic compounds such as phenol novolac, cresol novolak, and phenol aralkyl resins that have good heat resistance and dielectric properties are preferable, and are inexpensive and have improved flame retardancy and adhesion, so that cresol novolac type phenol resins Is particularly preferred.
Examples of epoxy resin curing accelerators include imidazoles and derivatives thereof, tertiary amines and quaternary ammonium salts.

熱硬化性樹脂組成物Aにおいては、成分(a)、成分(b)及び成分(c)の総合計量100質量部に対して、成分(a)の含有量を1〜98質量部とすることが好ましく、10〜89質量部とすることがより好ましく、20〜79質量部とすることが特に好ましい。また、成分(b)の含有量を1〜50質量部とすることが好ましく、1〜30質量部とすることがより好ましく、1〜25質量部とすることが特に好ましい。成分(c)の含有量を1〜98質量部とすることが好ましく、10〜89質量部とすることがより好ましく、20〜79質量部とすることが特に好ましい。但し、成分(a)と成分(b)は、成分(a)の−NH2基の当量と、成分(b)のヒドロキシ基当量が前記の当量比を満たす必要がある。
成分(a)及び成分(b)の含有量を、難燃性や接着性、比誘電率の観点より1質量部以上とし、耐熱性の観点より98質量部以上とする。また成分(c)の含有量を、難燃性や接着性、耐熱性の観点より1質量部以上とし、比誘電率の観点より98質量部以下とする。
In the thermosetting resin composition A, the content of the component (a) is 1 to 98 parts by mass with respect to 100 parts by mass of the total weight of the component (a), the component (b), and the component (c). Is preferable, it is more preferable to set it as 10-89 mass parts, and it is especially preferable to set it as 20-79 mass parts. Moreover, it is preferable that content of a component (b) shall be 1-50 mass parts, it is more preferable to set it as 1-30 mass parts, and it is especially preferable to set it as 1-25 mass parts. The content of the component (c) is preferably 1 to 98 parts by mass, more preferably 10 to 89 parts by mass, and particularly preferably 20 to 79 parts by mass. However, as for the component (a) and the component (b), the equivalent of the —NH 2 group of the component (a) and the hydroxy group equivalent of the component (b) must satisfy the above equivalent ratio.
Content of a component (a) and a component (b) shall be 1 mass part or more from a viewpoint of a flame retardance, adhesiveness, and a dielectric constant, and shall be 98 mass parts or more from a heat resistant viewpoint. Moreover, content of a component (c) shall be 1 mass part or more from a viewpoint of a flame retardance, adhesiveness, and heat resistance, and is 98 mass parts or less from a viewpoint of a dielectric constant.

本発明の熱硬化性樹脂組成物Aにおいては、有機溶剤(c)として窒素非含有有機溶剤を用いることが好ましい。
即ち、従来はメラミン樹脂やグアナミン化合物の溶剤として、ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等の窒素原子含有有機溶剤が用いられていたが、このような窒素原子含有有機溶剤を併用することは、本発明の目的にそぐわないものであり、窒素非含有有機溶剤を使用することが好ましい。
本発明において用いられる窒素非含有有機溶剤としては、アルコール系有機溶剤(d1)又はアルコール系有機溶剤(d1)と、エーテル系有機溶剤(d2)、ケトン系有機溶剤(d3)及び芳香族系有機溶剤(d4)のうち少なくとも一種とを含む有機溶剤であることが好ましい。
アルコール系有機溶剤(d1)としては、エタノール、プロパノール、ブタノール、メチルセロソルブ、ブチルセロソルブ及びプロピレングリコールモノメチルエーテルなどが挙げられ、これらの中で、溶解性や低毒性である点からブチルセロソルブ及びプロピレングリコールモノメチルエーテルがより好ましく、揮発性が高くプリプレグの製造時に残溶剤として残りにくいプロピレングリコールモノメチルエーテルが特に好ましい。
In the thermosetting resin composition A of the present invention, it is preferable to use a nitrogen-free organic solvent as the organic solvent (c).
That is, conventionally, nitrogen-containing organic solvents such as dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like have been used as solvents for melamine resins and guanamine compounds. Therefore, it is not suitable for the purpose of the present invention, and it is preferable to use a nitrogen-free organic solvent.
The nitrogen-free organic solvent used in the present invention includes alcohol-based organic solvent (d1) or alcohol-based organic solvent (d1), ether-based organic solvent (d2), ketone-based organic solvent (d3), and aromatic-based organic solvent. An organic solvent containing at least one of the solvents (d4) is preferable.
Examples of the alcohol-based organic solvent (d1) include ethanol, propanol, butanol, methyl cellosolve, butyl cellosolve, and propylene glycol monomethyl ether. Among these, butyl cellosolve and propylene glycol monomethyl ether are mentioned because of their solubility and low toxicity. More preferred is propylene glycol monomethyl ether, which is highly volatile and hardly remains as a residual solvent during the production of a prepreg.

熱硬化性樹脂組成物Aにおいては、アルコール系有機溶剤(d1)の他に、任意に有機溶剤を使用することができ、エーテル系有機溶剤(d2)、ケトン系有機溶剤(d3)及び芳香族系有機溶剤(d4)のうち少なくとも一種を含むものであることが好ましい。
エーテル系有機溶剤(d2)としてはテトラヒドロフラン等、ケトン系有機溶剤(d3)としては、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等、芳香族系有機溶剤(d4)としては、トルエン、キシレン、メシチレン等が挙げられる。これらの有機溶剤は1種又は2種以上を混合して使用できる。
(d2)〜(d4)の有機溶剤中で、溶解性や低毒性である点から、メチルエチルケトン、メチルイソブチルケトン及びシクロヘキサノンが好ましく、また、副反応を抑制する点からメチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤がより好ましく、揮発性が高くプリプレグの製造時に残溶剤として残りにくいメチルエチルケトンが特に好ましい。
In the thermosetting resin composition A, in addition to the alcohol-based organic solvent (d1), an organic solvent can be arbitrarily used. The ether-based organic solvent (d2), the ketone-based organic solvent (d3), and the aromatic The organic solvent (d4) preferably contains at least one kind.
The ether organic solvent (d2) is tetrahydrofuran, etc. The ketone organic solvent (d3) is acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc. The aromatic organic solvent (d4) is toluene, xylene, mesitylene, etc. Is mentioned. These organic solvents can be used alone or in combination of two or more.
In the organic solvents (d2) to (d4), methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone are preferable from the viewpoint of solubility and low toxicity, and methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and the like from the viewpoint of suppressing side reactions. More preferred is a ketone solvent, and methyl ethyl ketone, which is highly volatile and hardly remains as a residual solvent during the production of a prepreg, is particularly preferred.

有機溶剤(d)の使用量は、(a)〜(c)成分の総和100質量部に対し、10〜1000質量部とすることが好ましく、100〜500質量部とすることがより好ましく、200〜500質量部とすることが特に好ましい。有機溶剤(d)の使用量は、溶解性の観点から10質量部以上とし、また耐熱性の観点から1000重量部以下とすることが好ましい。   The amount of the organic solvent (d) used is preferably 10 to 1000 parts by mass, more preferably 100 to 500 parts by mass, with respect to 100 parts by mass of the sum of the components (a) to (c). It is especially preferable to set it as -500 mass parts. The amount of the organic solvent (d) used is preferably 10 parts by mass or more from the viewpoint of solubility and 1000 parts by weight or less from the viewpoint of heat resistance.

熱硬化性樹脂組成物Aは、6−置換グアナミン化合物(a)、フェノール性化合物(b)、エポキシ樹脂(c)及び有機溶剤(d)を含有する均一溶液であるが、6−置換グアナミン化合物(a)に上記のフェノール性化合物(b)およびエポキシ樹脂(c)を配合することにより、グアナミン化合物(a)の有機溶剤に対する溶解性を向上させることができ、均一に溶解した組成物が得られる。
均一に溶解するためには20〜130℃に加熱することが好ましく、40〜100℃に加熱することがさらに好ましい。
The thermosetting resin composition A is a homogeneous solution containing a 6-substituted guanamine compound (a), a phenolic compound (b), an epoxy resin (c) and an organic solvent (d). By adding the phenolic compound (b) and the epoxy resin (c) to (a), the solubility of the guanamine compound (a) in the organic solvent can be improved, and a uniformly dissolved composition is obtained. It is done.
In order to melt | dissolve uniformly, it is preferable to heat at 20-130 degreeC, and it is more preferable to heat at 40-100 degreeC.

本発明の熱硬化性樹脂組成物Bは、熱硬化性樹脂組成物Aに、1分子中に少なくとも2個のN−置換マレイミド基を有するマレイミド化合物〔N−置換マレイミド化合物(e)とも云う〕を反応させて得られた均一な溶液である。
この反応では、N−置換マレイミド化合物(e)に対し、6−置換グアナミン化合物(a)が、Michael付加することにより、N−置換マレイミド基を有するグアナミン化合物となる。N−置換マレイミド化合物(e)とグアナミン化合物の反応物は、熱硬化性樹脂との硬化反応性を有するものとなり、この反応物を熱硬化性樹脂に使用することにより、ビスマレイミド構造とグアナミン構造を有する、誘電特性、難燃性及び耐熱性に優れた熱硬化性樹脂が得られる。
N−置換マレイミド化合物(e)としては、ビス(4−マレイミドフェニル)メタン、ビス(4−マレイミドフェニル)エーテル、ビス(4−マレイミドフェニル)スルホン、3,3−ジメチル−5,5−ジエチル−4,4−ジフェニルメタンビスマレイミド、4−メチル−1,3−フェニレンビスマレイミド、m−フェニレンビスマレイミド、2,2−ビス(4−(4−マレイミドフェノキシ)フェニル)プロパン等が挙げられ、これらの中で、反応率が高く、より高耐熱性化できるビス(4−マレイミドフェニル)メタン、m−フェニレンビスマレイミド及びビス(4−マレイミドフェニル)スルホンが好ましく、安価である点からm−フェニレンビスマレイミド及びビス(4−マレイミドフェニル)メタンがより好ましく、溶剤への溶解性の点からビス(4−マレイミドフェニル)メタンが特に好ましい。
In the thermosetting resin composition B of the present invention, a maleimide compound having at least two N-substituted maleimide groups in one molecule (also referred to as an N-substituted maleimide compound (e)) is added to the thermosetting resin composition A. Is a homogeneous solution obtained by reacting.
In this reaction, the 6-substituted guanamine compound (a) is Michael-added to the N-substituted maleimide compound (e) to form a guanamine compound having an N-substituted maleimide group. The reaction product of the N-substituted maleimide compound (e) and the guanamine compound has a curing reactivity with the thermosetting resin. By using this reaction product for the thermosetting resin, a bismaleimide structure and a guanamine structure are obtained. A thermosetting resin excellent in dielectric properties, flame retardancy and heat resistance can be obtained.
Examples of the N-substituted maleimide compound (e) include bis (4-maleimidophenyl) methane, bis (4-maleimidophenyl) ether, bis (4-maleimidophenyl) sulfone, 3,3-dimethyl-5,5-diethyl- 4,4-diphenylmethane bismaleimide, 4-methyl-1,3-phenylene bismaleimide, m-phenylene bismaleimide, 2,2-bis (4- (4-maleimidophenoxy) phenyl) propane, and the like. Among them, bis (4-maleimidophenyl) methane, m-phenylenebismaleimide and bis (4-maleimidophenyl) sulfone, which have a high reaction rate and can have higher heat resistance, are preferable, and m-phenylenebismaleimide is preferable because it is inexpensive. And bis (4-maleimidophenyl) methane are more preferable. Bis from sexual point (4-maleimide phenyl) methane are particularly preferred.

反応温度は70〜200℃であることが好ましく、70〜160℃であることがさらに好ましい。反応時間は0.5〜10時間であることが好ましく、0.5〜6時間であることがさらに好ましい。反応に際してはN−置換マレイミド化合物(e)を少量ずつ添加することが好ましい。
6−置換グアナミン化合物(a)とN−置換マレイミド化合物(e)との使用量比は、6−置換グアナミン化合物(a)の−NH2基の当量と、N−置換マレイミド化合物(e)のC=C基の当量の当量比が、次式
0.1≦〔C=C基当量の総和〕/〔−NH2基の当量〕≦1.2
に示す範囲内となる量であることが望ましい。該当量比を0.1以上とすることにより有機溶剤への溶解性が不足することがなく、1.2以下とすることにより熱硬化性樹脂の接着性及び耐熱性が低下することがない。
また、この反応には、必要により任意に反応触媒を使用することができる。反応触媒の例としては、トリエチルアミン、ピリジン、トリブチルアミン等のアミン類、メチルイミダゾール、フェニルイミダゾール等のイミダゾール類、トリフェニルホスフィン等のリン系触媒等が挙げられ、1種又は2種以上を混合して使用できる。
The reaction temperature is preferably 70 to 200 ° C, more preferably 70 to 160 ° C. The reaction time is preferably 0.5 to 10 hours, more preferably 0.5 to 6 hours. In the reaction, it is preferable to add the N-substituted maleimide compound (e) little by little.
The amount ratio between the 6-substituted guanamine compound (a) and the N-substituted maleimide compound (e) is such that the equivalent of the —NH 2 group of the 6-substituted guanamine compound (a) and the N-substituted maleimide compound (e). The equivalent ratio of equivalents of C = C groups is the following formula: 0.1 ≦ [total of C = C group equivalents] / [equivalent of —NH 2 groups] ≦ 1.2
It is desirable that the amount be within the range shown in. By setting the corresponding ratio to be 0.1 or more, the solubility in an organic solvent is not insufficient, and by setting it to 1.2 or less, the adhesiveness and heat resistance of the thermosetting resin are not reduced.
In this reaction, a reaction catalyst can be optionally used as necessary. Examples of the reaction catalyst include amines such as triethylamine, pyridine, and tributylamine, imidazoles such as methylimidazole and phenylimidazole, and phosphorus-based catalysts such as triphenylphosphine. Can be used.

これらの熱硬化性樹脂組成物(熱硬化性樹脂組成物Aおよび熱硬化性樹脂組成物B、「本発明の熱硬化性樹脂組成物」とも云う)には、任意に無機充填剤を含有させることができる。無機充填剤の例としては、シリカ、マイカ、タルク、ガラス短繊維又は微粉末及び中空ガラス、三酸化アンチモン、炭酸カルシウム、石英粉末、水酸化アルミニウム、水酸化マグネシウム等が挙げられ、これらの中で誘電特性、耐熱性及び難燃性の点からシリカ、水酸化アルミニウム及び水酸化マグネシウムが好ましく、安価であることからシリカ及び水酸化アルミニウムがより好ましい。
無機充填剤の含有量は、(a)〜(d)成分の合計量(熱硬化性樹脂組成物Aの場合)又は(a)〜(e)成分の合計量(熱硬化性樹脂組成物Bの場合)100質量部に対し、0〜300質量部とすることが好ましく、20〜200質量部とすることがより好ましく、20〜150質量部とすることが特に好ましい。無機充填剤の含有量を300質量部以下とすることにより、成形性や接着性の低下がなくなる。
These thermosetting resin compositions (thermosetting resin composition A and thermosetting resin composition B, also referred to as “thermosetting resin composition of the present invention”) optionally contain an inorganic filler. be able to. Examples of inorganic fillers include silica, mica, talc, short glass fiber or fine powder and hollow glass, antimony trioxide, calcium carbonate, quartz powder, aluminum hydroxide, magnesium hydroxide and the like. Silica, aluminum hydroxide and magnesium hydroxide are preferable from the viewpoint of dielectric properties, heat resistance and flame retardancy, and silica and aluminum hydroxide are more preferable from the viewpoint of low cost.
The content of the inorganic filler is the total amount of the components (a) to (d) (in the case of the thermosetting resin composition A) or the total amount of the components (a) to (e) (the thermosetting resin composition B). In the case of) 100 parts by mass, preferably 0 to 300 parts by mass, more preferably 20 to 200 parts by mass, and particularly preferably 20 to 150 parts by mass. When the content of the inorganic filler is 300 parts by mass or less, the moldability and adhesiveness are not lowered.

さらに、本発明の熱硬化性樹脂組成物には、樹脂組成物として熱硬化性の性質を損なわない程度に、任意に公知の熱可塑性樹脂、エラストマー、難燃剤、有機充填剤等を含有させることができる。
熱可塑性樹脂の例としては、ポリテトラフルオロエチレン、ポリエチレン、ポリプロピレン、ポリスチレン、ポリフェニレンエーテル樹脂、フェノキシ樹脂、ポリカーボネート樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、キシレン樹脂、石油樹脂、シリコーン樹脂等が挙げられる。
Furthermore, the thermosetting resin composition of the present invention may contain a known thermoplastic resin, elastomer, flame retardant, organic filler, etc., as long as the thermosetting properties of the resin composition are not impaired. Can do.
Examples of the thermoplastic resin include polytetrafluoroethylene, polyethylene, polypropylene, polystyrene, polyphenylene ether resin, phenoxy resin, polycarbonate resin, polyester resin, polyamide resin, polyimide resin, xylene resin, petroleum resin, silicone resin, and the like. .

エラストマーの例としては、ポリブタジエン、ポリアクリロニトリル、エポキシ変性ポリブタジエン、無水マレイン酸変性ポリブタジエン、フェノール変性ポリブタジエン、カルボキシ変性ポリアクリロニトリル等が挙げられる。   Examples of the elastomer include polybutadiene, polyacrylonitrile, epoxy-modified polybutadiene, maleic anhydride-modified polybutadiene, phenol-modified polybutadiene, carboxy-modified polyacrylonitrile, and the like.

難燃剤の例としては、臭素や塩素を含有する含ハロゲン系難燃剤、トリフェニルホスフェート、トリクレジルホスフェート、トリスジクロロプロピルホスフェート、ホスファゼン、赤リン等のリン系難燃剤、三酸化アンチモン、水酸化アルミニウム、水酸化マグネシウム等の無機物の難燃剤等が挙げられる。これらの難燃剤の中で、非ハロゲン系難燃剤であるリン系難燃剤、無機物の難燃剤等が環境上から好ましい。また、リン系難燃剤と水酸化アルミニウムなどの無機物の難燃剤を併用して用いることが、安価であり、難燃性、耐熱性等の他特性との両立の点から特に好ましい。
有機充填剤の例としては、シリコーンパウダー、ポリテトラフルオロエチレン、ポリエチレン、ポリプロピレン、ポリスチレン、ポリフェニレンエーテル等の有機物粉末などが挙げられる。
Examples of flame retardants include halogen-containing flame retardants containing bromine and chlorine, triphenyl phosphate, tricresyl phosphate, trisdichloropropyl phosphate, phosphazenes, red phosphorus and other phosphorus flame retardants, antimony trioxide, hydroxylation Examples include inorganic flame retardants such as aluminum and magnesium hydroxide. Among these flame retardants, phosphorus-based flame retardants that are non-halogen flame retardants, inorganic flame retardants, and the like are preferable from the viewpoint of the environment. Further, it is particularly preferable to use a phosphorus-based flame retardant in combination with an inorganic flame retardant such as aluminum hydroxide from the viewpoint of compatibility with other characteristics such as flame retardancy and heat resistance.
Examples of the organic filler include organic powders such as silicone powder, polytetrafluoroethylene, polyethylene, polypropylene, polystyrene, and polyphenylene ether.

なお、本発明の熱硬化性樹脂組成物には、希釈溶剤として有機溶剤を任意に使用することができる。該有機溶剤は特に制限されないが、例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤、メチルセロソルブ等のアルコール系溶剤、テトラヒドロフランなどのエーテル系溶剤、トルエン、キシレン、メシチレン等の芳香族系溶剤等が挙げられ、1種又は2種以上を混合して使用できる。   In the thermosetting resin composition of the present invention, an organic solvent can be arbitrarily used as a dilution solvent. The organic solvent is not particularly limited. For example, ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone, alcohol solvents such as methyl cellosolve, ether solvents such as tetrahydrofuran, aromatic solvents such as toluene, xylene, and mesitylene. Examples of the solvent include one type or a mixture of two or more types.

更にまた、本発明の熱硬化性樹脂組成物に対して任意に紫外線吸収剤、酸化防止剤、光重合開始剤、蛍光増白剤及び密着性向上剤等を含有させることも可能であり、特に制限されないが、例えば、ベンゾトリアゾール系等の紫外線吸収剤、ヒンダードフェノール系やスチレン化フェノール等の酸化防止剤、ベンゾフェノン類、ベンジルケタール類、チオキサントン系等の光重合開始剤、スチルベン誘導体等の蛍光増白剤、尿素シランなどの尿素化合物、シランカップリング剤等の密着性向上剤等が挙げられる。   Furthermore, the thermosetting resin composition of the present invention can optionally contain an ultraviolet absorber, an antioxidant, a photopolymerization initiator, a fluorescent whitening agent, an adhesion improver, etc. Although not limited, for example, ultraviolet absorbers such as benzotriazoles, antioxidants such as hindered phenols and styrenated phenols, photopolymerization initiators such as benzophenones, benzyl ketals, thioxanthones, and fluorescence such as stilbene derivatives Examples include brighteners, urea compounds such as urea silane, and adhesion improvers such as silane coupling agents.

本発明のプリプレグは、本発明の熱硬化性樹脂組成物を、基材に含浸又は塗工した後、Bステージ化してなるものである。すなわち、本発明の熱硬化性樹脂組成物を、基材に含浸又は塗工した後、加熱等により半硬化(Bステージ化)させて本発明のプリプレグを製造する。以下、本発明のプリプレグについて詳述する。   The prepreg of the present invention is formed by impregnating or coating the thermosetting resin composition of the present invention on a base material and then forming a B-stage. That is, after impregnating or coating the thermosetting resin composition of the present invention on a substrate, it is semi-cured (B-staged) by heating or the like to produce the prepreg of the present invention. Hereinafter, the prepreg of the present invention will be described in detail.

本発明のプリプレグに用いられる基材には、各種の電気絶縁材料用積層板に用いられている周知のものが使用できる。その材質の例としては、Eガラス、Dガラス、Sガラス及びQガラス等の無機物の繊維、ポリイミド、ポリエステル及びポリテトラフルオロエチレン等の有機物の繊維、並びにそれらの混合物等が挙げられる。これらの基材は、例えば、織布、不織布、ロービンク、チョップドストランドマット及びサーフェシングマット等の形状を有するが、材質及び形状は、目的とする成形物の用途や性能により選択され、必要により、単独又は2種類以上の材質及び形状を組み合わせることができる。
基材の厚さは、特に制限されないが、例えば、約0.03〜0.5mmのものを使用することができ、シランカップリング剤等で表面処理したもの又は機械的に開繊処理を施したものが、耐熱性や耐湿性、加工性の面から好適である。該基材に対する樹脂組成物の付着量が、乾燥後のプリプレグの樹脂含有率で、20〜90質量%となるように、基材に含浸又は塗工した後、通常、100〜200℃の温度で1〜30分加熱乾燥し、半硬化(Bステージ化)させて、本発明のプリプレグを得ることができる。
As the base material used for the prepreg of the present invention, known materials used for various types of laminates for electrical insulating materials can be used. Examples of the material include inorganic fibers such as E glass, D glass, S glass, and Q glass, organic fibers such as polyimide, polyester, and polytetrafluoroethylene, and mixtures thereof. These base materials have, for example, shapes such as woven fabric, non-woven fabric, robink, chopped strand mat, and surfacing mat, but the material and shape are selected depending on the intended use and performance of the molded product, and if necessary, A single material or two or more materials and shapes can be combined.
The thickness of the substrate is not particularly limited. For example, a substrate having a thickness of about 0.03 to 0.5 mm can be used, and the substrate is surface-treated with a silane coupling agent or the like, or mechanically opened. Is suitable from the viewpoints of heat resistance, moisture resistance and processability. After impregnating or coating the base material so that the amount of the resin composition attached to the base material is 20 to 90% by mass in terms of the resin content of the prepreg after drying, the temperature is usually 100 to 200 ° C. Can be heated and dried for 1 to 30 minutes and semi-cured (B-stage) to obtain the prepreg of the present invention.

本発明の積層板は、本発明のプリプレグを積層成形して得られるものである。すなわち、本発明のプリプレグを、例えば、1〜20枚重ね、その片面又は両面に銅及びアルミニウム等の金属箔を配置した構成で積層成形したものである。成形条件は、例えば、電気絶縁材料用積層板及び多層板の手法が適用でき、例えば多段プレス、多段真空プレス、連続成形、オートクレーブ成形機等を使用し、温度100〜250℃、圧力0.2〜10MPa、加熱時間0.1〜5時間の範囲で成形することができる。また、本発明のプリプレグと内層用配線板とを組合せ、積層成形して、多層板を製造することもできる。   The laminate of the present invention is obtained by laminating the prepreg of the present invention. That is, for example, the prepreg of the present invention is laminated and molded in a configuration in which, for example, 1 to 20 sheets are stacked and a metal foil such as copper and aluminum is disposed on one side or both sides thereof. As the molding conditions, for example, a method of a laminated plate for an electrical insulating material and a multilayer plate can be applied. For example, a multistage press, a multistage vacuum press, a continuous molding, an autoclave molding machine or the like is used, a temperature of 100 to 250 ° C., a pressure of 0.2 It can shape | mold in the range of 10-10 MPa and heating time 0.1-5 hours. Further, the prepreg of the present invention and the inner layer wiring board can be combined and laminated to produce a multilayer board.

本発明のプリント配線板は、積層板表面に回路を形成して製造される。すなわち、本発明の積層板の導体層を通常のエッチング法によって配線加工し、前述のプリプレグを介して配線加工した積層板を複数積層し、加熱プレス加工することによって一括して多層化する。その後、ドリル加工またはレーザー加工によるスルーホールまたはブラインドビアホールの形成とメッキまたは導電性ペーストによる層間配線の形成を経て多層プリント配線板を製造することができる。   The printed wiring board of the present invention is manufactured by forming a circuit on the surface of the laminated board. That is, the conductor layer of the laminated board of the present invention is subjected to wiring processing by a normal etching method, a plurality of laminated boards subjected to wiring processing through the above-described prepreg are laminated, and then multilayered by heating press processing. Thereafter, a multilayer printed wiring board can be manufactured through formation of through holes or blind via holes by drilling or laser processing and formation of interlayer wiring by plating or conductive paste.

次に、下記の実施例により本発明を更に詳しく説明するが、これらの実施例は本発明を制限するものではない。
なお、以下の実施例で得られた銅張積層板は、以下の方法で性能を測定・評価した。
Next, the present invention will be described in more detail with reference to the following examples, but these examples do not limit the present invention.
The copper clad laminate obtained in the following examples was measured and evaluated for performance by the following method.

(1)銅箔接着性(銅箔ピール強度)の評価
銅張積層板を銅エッチング液に浸漬することにより、1cm幅の帯部分を残して銅箔を取り除いた評価基板を作製し、オートグラフ〔島津製作所(株)製AG−100C〕を用いて帯部分のピール強度を測定した。
(2)ガラス転移温度(Tg)の測定
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた5mm角の評価基板を作製し、TMA試験装置〔デュポン(株)製TMA2940〕を用い、評価基板の熱膨張特性を観察することにより評価した。
(1) Evaluation of copper foil adhesiveness (copper foil peel strength) By immersing a copper-clad laminate in a copper etching solution, an evaluation board was prepared by removing the copper foil while leaving a 1 cm wide band portion. The peel strength of the belt portion was measured using [AG-100C manufactured by Shimadzu Corporation].
(2) Measurement of glass transition temperature (Tg) A 5 mm square evaluation substrate from which copper foil was removed by immersing a copper clad laminate in a copper etching solution was prepared, and a TMA test apparatus [TMA2940 manufactured by DuPont Co., Ltd.] was used. Used and evaluated by observing the thermal expansion characteristics of the evaluation substrate.

(3)はんだ耐熱性の評価
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた5cm角の評価基板を作製し、プレッシャー・クッカー試験装置〔平山製作所(株)製〕を用いて、121℃、0.2MPaの条件に4時間放置した後、温度288℃のはんだ浴に、評価基板を20秒間浸漬した後、外観を観察することによりはんだ耐熱性を評価した。
(4)銅付き耐熱性(T−288)の評価
銅張積層板から5mm角の評価基板を作製し、TMA試験装置〔デュポン(株)製TMA2940〕を用い、288℃で評価基板の膨れが発生するまでの時間を測定することにより評価した。
(3) Evaluation of solder heat resistance A 5 cm square evaluation board from which the copper foil has been removed is prepared by immersing a copper clad laminate in a copper etching solution, and a pressure cooker test apparatus (manufactured by Hirayama Manufacturing Co., Ltd.) is used. The test substrate was left for 4 hours under conditions of 121 ° C. and 0.2 MPa, and then the evaluation substrate was immersed in a solder bath at a temperature of 288 ° C. for 20 seconds, and then the solder heat resistance was evaluated by observing the appearance.
(4) Evaluation of heat resistance with copper (T-288) An evaluation board of 5 mm square was prepared from a copper clad laminate, and the evaluation board was swollen at 288 ° C. using a TMA test apparatus (TMA2940 manufactured by DuPont). It was evaluated by measuring the time until it occurred.

(5)吸湿性(吸水率)の評価
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた評価基板を作製し、プレッシャー・クッカー試験装置〔平山製作所(株)製〕を用いて、121℃、0.2MPaの条件に4時間放置した後、評価基板の吸水率を測定した。
(6)難燃性の評価
銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた評価基板から、長さ127mm、幅12.7mmに切り出した評価基板を作製し、UL94の試験法(V法)に準じて評価した。
(7)比誘電率及び誘電正接の測定
得られた銅張積層板を銅エッチング液に浸漬することにより銅箔を取り除いた評価基板を作製し、比誘電率測定装置(Hewllet・Packerd社製、HP4291B)を用いて、周波数1GHzでの比誘電率及び誘電正接を測定した。
(5) Evaluation of hygroscopicity (water absorption rate) A copper-clad laminate was immersed in a copper etching solution to prepare an evaluation board from which the copper foil was removed, and a pressure cooker test apparatus (manufactured by Hirayama Seisakusho) was used. Then, after leaving for 4 hours under the conditions of 121 ° C. and 0.2 MPa, the water absorption rate of the evaluation substrate was measured.
(6) Flame Retardancy Evaluation An evaluation board cut out to a length of 127 mm and a width of 12.7 mm was prepared from an evaluation board obtained by removing a copper foil by immersing a copper-clad laminate in a copper etching solution, and tested for UL94. Evaluation was made according to the method (Method V).
(7) Measurement of relative dielectric constant and dielectric loss tangent An evaluation substrate from which the copper foil was removed by immersing the obtained copper-clad laminate in a copper etching solution was prepared, and a relative dielectric constant measuring device (manufactured by Hewlett-Packard Company, The relative dielectric constant and dielectric loss tangent at a frequency of 1 GHz were measured using HP4291B).

実施例1
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、フェノールノボラック樹脂〔大日本インキ工業(株)製、商品名:TD−2093、軟化点100℃〕:146.0g、フェノールノボラック型エポキシ樹脂〔大日本インキ化学工業(株)製、商品名:エピクロンN−770〕:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 1
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.0 g, phenol novolak resin [Dainippon Ink Industries, Ltd., trade name : TD-2093, softening point 100 ° C.]: 146.0 g, phenol novolac type epoxy resin [manufactured by Dainippon Ink & Chemicals, Inc., trade name: Epicron N-770]: 490.0 g, propylene glycol monomethyl ether: 210 0.0 g and methyl ethyl ketone: 210.0 g were added, and the mixture was heated to 80 ° C. and dissolved uniformly to obtain a varnish of a thermosetting resin composition for printed wiring boards. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例2
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:245.0g、クレゾールノボラック樹脂〔大日本インキ化学工業(株)製、商品名:KA−1160、軟化点85℃〕:245.0g、フェノールノボラック型エポキシ樹脂〔エピクロンN−770〕:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 2
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture quantifier with a reflux condenser, benzoguanamine: 245.0 g, cresol novolak resin [Dainippon Ink Chemical Co., Ltd., product Name: KA-1160, softening point 85 ° C.]: 245.0 g, phenol novolac type epoxy resin [Epiclone N-770]: 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g, 80 The temperature was raised to ° C. and the solution was uniformly dissolved to obtain a varnish of a thermosetting resin composition for printed wiring boards. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例3
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、クレゾールノボラック樹脂〔大日本インキ化学工業(株)製、商品名:KA−1160、軟化点85℃〕:146.0g、フェノールノボラック型エポキシ樹脂〔エピクロンN−770〕:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 3
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.0 g, cresol novolak resin [Dainippon Ink Chemical Co., Ltd., product Name: KA-1160, softening point 85 ° C.]: 146.0 g, phenol novolac type epoxy resin [Epiclon N-770]: 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g, 80 The temperature was raised to ° C. and the solution was uniformly dissolved to obtain a varnish of a thermosetting resin composition for printed wiring boards. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例4
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、クレゾールノボラック樹脂(KA−1163、軟化点110℃):146.0g、フェノールノボラック型エポキシ樹脂〔エピクロンN−770〕:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 4
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.0 g, cresol novolac resin (KA-1163, softening point 110 ° C.): 146 0.0 g, phenol novolac type epoxy resin [Epiclon N-770]: 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g, heated to 80 ° C. and uniformly dissolved, printed wiring A varnish of a thermosetting resin composition for plates was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例5
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.00g、クレゾールノボラック樹脂(KA−1163、軟化点110℃):146.0g、フェノールノボラック型エポキシ樹脂〔エピクロンN−770〕:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解した。次いで、ビス(4−マレイミドフェニル)メタン〔大和化成工業(株)製、商品名:BMI−1000〕:330.0gを添加し、80℃で8時間反応を行い、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 5
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture quantifier with a reflux condenser, benzoguanamine: 344.00 g, cresol novolac resin (KA-1163, softening point 110 ° C.): 146 0.0 g, phenol novolac type epoxy resin [Epiclon N-770]: 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g were added, and the mixture was heated to 80 ° C. and uniformly dissolved. Next, bis (4-maleimidophenyl) methane [manufactured by Daiwa Kasei Kogyo Co., Ltd., trade name: BMI-1000]: 330.0 g was added, and the reaction was carried out at 80 ° C. for 8 hours. A varnish of the resin composition was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例6
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、フェノールアラルキル樹脂〔明和化成(株)製、商品名:MEH−7800H、軟化点:85℃〕:146.0g、フェノールノボラック型エポキシ樹脂〔エピクロンN−770〕:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 6
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.0 g, phenol aralkyl resin [Maywa Kasei Co., Ltd., trade name: MEH -7800H, softening point: 85 ° C.]: 146.0 g, phenol novolac type epoxy resin [Epiclon N-770]: 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g were put at 80 ° C. It heated up and melt | dissolved uniformly and the varnish of the thermosetting resin composition for printed wiring boards was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例7
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、フェノールノボラック樹脂〔TD−2093、軟化点100℃〕:146.0g、クレゾールノボラック型エポキシ樹脂〔エピクロンN−673〕:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 7
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture quantifier with a reflux condenser, benzoguanamine: 344.0 g, phenol novolac resin [TD-2093, softening point 100 ° C.]: 146 0.0 g, Cresol novolak type epoxy resin [Epiclon N-673]: 490.0 g, Propylene glycol monomethyl ether: 210.0 g and Methyl ethyl ketone: 210.0 g, heated to 80 ° C. and uniformly dissolved, printed wiring A varnish of a thermosetting resin composition for plates was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例8
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0gとクレゾールノボラック樹脂〔大日本インキ化学工業(株)、商品名:KA−1163、軟化点110℃〕:146.0g、クレゾールノボラック型エポキシ樹脂〔エピクロンN−673〕:490.0g、プロピレングリコールモノメチルエーテル:210.00g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 8
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.0 g and cresol novolak resin [Dainippon Ink Chemical Co., Ltd., trade name : KA-1163, softening point 110 ° C.]: 146.0 g, cresol novolac epoxy resin [Epiclon N-673]: 490.0 g, propylene glycol monomethyl ether: 210.00 g and methyl ethyl ketone: 210.0 g, 80 ° C. The solution was heated to a uniform temperature and dissolved uniformly to obtain a varnish of a thermosetting resin composition for printed wiring boards. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例9
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.00g、フェノール〔和光純薬工業(株)製〕:146.00g、フェノールノボラック型エポキシ樹脂〔N-770〕:490.00g、プロピレングリコールモノメチルエーテル:210.00g及びメチルエチルケトン:210.00gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 9
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture quantifier with a reflux condenser, benzoguanamine: 344.00 g, phenol (manufactured by Wako Pure Chemical Industries, Ltd.): 146.00 g , Phenol novolac type epoxy resin [N-770]: 490.00 g, propylene glycol monomethyl ether: 210.00 g and methyl ethyl ketone: 210.00 g, heated to 80 ° C. and uniformly dissolved, heat for printed wiring board A varnish of a curable resin composition was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例10
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.00g、2−ナフトール〔関東化学(株)製〕:146.00g、フェノールノボラック型エポキシ樹脂〔N-770〕:490.00g、プロピレングリコールモノメチルエーテル:210.00g及びメチルエチルケトン:210.00gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 10
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.00 g, 2-naphthol (manufactured by Kanto Chemical Co., Inc.): 146.00 g , Phenol novolac type epoxy resin [N-770]: 490.00 g, propylene glycol monomethyl ether: 210.00 g and methyl ethyl ketone: 210.00 g, heated to 80 ° C. and uniformly dissolved, heat for printed wiring board A varnish of a curable resin composition was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例11
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.00g、2,4−ジヒドロキシ安息香酸〔関東化学(株)製〕:146.00g、フェノールノボラック型エポキシ樹脂〔N-770〕:490.00g、プロピレングリコールモノメチルエーテル:210.00g及びメチルエチルケトン:210.00gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 11
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.00 g, 2,4-dihydroxybenzoic acid (manufactured by Kanto Chemical Co., Inc.) 146.00 g, phenol novolac epoxy resin [N-770]: 490.00 g, propylene glycol monomethyl ether: 210.00 g and methyl ethyl ketone: 210.00 g were added, heated to 80 ° C., and dissolved uniformly. A varnish of a thermosetting resin composition for wiring boards was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

実施例12
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.00g、ビスフェノールF〔三井化学(株)製〕:146.00g、フェノールノボラック型エポキシ樹脂〔N-770〕:490.00g、プロピレングリコールモノメチルエーテル:210.00g及びメチルエチルケトン:210.00gを入れ、80℃に昇温して均一に溶解し、プリント配線板用熱硬化性樹脂組成物のワニスを得た。この溶液は室温まで放冷しても結晶は析出しなかった。
Example 12
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture quantifier with a reflux condenser, benzoguanamine: 344.00 g, bisphenol F (manufactured by Mitsui Chemicals): 146.00 g, Phenol novolac type epoxy resin [N-770]: 490.00 g, propylene glycol monomethyl ether: 210.00 g and methyl ethyl ketone: 210.00 g were added, heated to 80 ° C. and uniformly dissolved, and thermosetting for printed wiring board The varnish of the functional resin composition was obtained. Crystals did not precipitate even when this solution was allowed to cool to room temperature.

比較例1
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、クレゾールノボラック樹脂〔大日本インキ化学工業(株)製、商品名:KA−1165、軟化点126℃〕:146.0g、フェノールノボラック型エポキシ樹脂(エピクロンN−770):490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解した溶液を得たが、放冷し温度が下がるに従いベンゾグアナミンが析出し、均一に溶解した熱硬化性樹脂組成物のワニスを得られなかった。
Comparative Example 1
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture meter with a reflux condenser, benzoguanamine: 344.0 g, cresol novolak resin [Dainippon Ink Chemical Co., Ltd., product Name: KA-1165, softening point 126 ° C.]: 146.0 g, phenol novolac type epoxy resin (Epiclon N-770): 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g, 80 The solution was uniformly heated by raising the temperature to 0 ° C., but benzoguanamine was precipitated as it was allowed to cool and the temperature was lowered, and a uniformly dissolved thermosetting resin composition varnish could not be obtained.

比較例2
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、クレゾールノボラック樹脂〔旭有機材工業(株)製、商品名:EP−6050G、軟化点137℃〕:146.0g、フェノールノボラック型エポキシ樹脂(エピクロンN−770):490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解した溶液を得たが、放冷し温度が下がるに従いベンゾグアナミンが析出し、均一に溶解した熱硬化性樹脂組成物のワニスを得られなかった。
Comparative Example 2
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture quantifier with a reflux condenser, benzoguanamine: 344.0 g, cresol novolac resin [trade name, manufactured by Asahi Organic Materials Co., Ltd. : EP-6050G, softening point 137 ° C.]: 146.0 g, phenol novolac type epoxy resin (Epiclon N-770): 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g, 80 ° C. The solution was uniformly heated to obtain a uniformly dissolved solution, but as it was allowed to cool and the temperature decreased, benzoguanamine was precipitated, and a uniformly dissolved thermosetting resin composition varnish could not be obtained.

比較例3
温度計、攪拌装置、還流冷却管付き水分定量器の付いた加熱及び冷却可能な容積2リットルの反応容器に、ベンゾグアナミン:344.0g、アミノトリアジンノボラック樹脂〔大日本インキ化学工業(株)製、商品名:LA−1356、軟化点138℃〕:146.0g、フェノールノボラック型エポキシ樹脂:490.0g、プロピレングリコールモノメチルエーテル:210.0g及びメチルエチルケトン:210.0gを入れ、80℃に昇温して均一に溶解した溶液を得たが、放冷し温度が下がるに従いベンゾグアナミンが析出し、均一に溶解した熱硬化性樹脂組成物のワニスを得られなかった。
Comparative Example 3
In a reaction vessel with a volume of 2 liters that can be heated and cooled, equipped with a thermometer, a stirrer, and a moisture quantifier with a reflux condenser, benzoguanamine: 344.0 g, aminotriazine novolak resin [Dainippon Ink Chemical Co., Ltd., Product name: LA-1356, softening point 138 ° C.]: 146.0 g, phenol novolac type epoxy resin: 490.0 g, propylene glycol monomethyl ether: 210.0 g and methyl ethyl ketone: 210.0 g, and heated to 80 ° C. The solution was uniformly dissolved, but benzoguanamine was precipitated as the temperature was lowered after cooling, and a uniformly dissolved thermosetting resin composition varnish could not be obtained.

以上のように、実施例1〜12で得られた、ベンゾグアナミン(a)、フェノール性化合物(b)としてフェノール、フェノール誘導体又は軟化点が120℃以下であるフェノール樹脂、エポキシ樹脂(c)及び有機溶剤(d)を含有する組成物、或いは該組成物にN−置換マレイミド化合物(e)を加えベンゾグアナミン(a)と反応させた組成物は、均一に溶解した溶液であり、電子部品等に用いられる熱硬化性樹脂組成物の製造に好適に用いられることが分かる。
比較例1〜3は、(b)成分に軟化点が120℃を超えるフェノール樹脂を用い場合であり、均一に溶解した熱硬化性樹脂組成物のワニスを得られず、電子部品等に用いられる熱硬化性樹脂組成物に使用するには適当でないことが分かる。
As described above, benzoguanamine (a) obtained in Examples 1 to 12, phenolic compound (b) as phenol, phenol derivative or phenol resin having a softening point of 120 ° C. or lower, epoxy resin (c), and organic The composition containing the solvent (d), or the composition obtained by adding the N-substituted maleimide compound (e) to the composition and reacting with the benzoguanamine (a) is a uniformly dissolved solution, and is used for electronic components and the like. It turns out that it is used suitably for manufacture of the thermosetting resin composition obtained.
Comparative Examples 1 to 3 are cases where a phenol resin having a softening point exceeding 120 ° C. is used as the component (b), and a varnish of a thermosetting resin composition that has been uniformly dissolved cannot be obtained, and is used for an electronic component or the like. It turns out that it is not suitable for using for a thermosetting resin composition.

実施例13〜24、比較例4〜7
実施例13〜24では、実施例1〜12で使用したベンゾグアナミン(a)、フェノール性化合物(b)、エポキシ樹脂(c)、有機溶剤(d)および置換マレイミド化合物(e)を用い、更にエポキシ硬化剤としてクレゾールノボラックフェノール樹脂〔大日本インキ化学工業(株)、商品名:KA−1165〕、無機充填剤として溶融シリカ〔C−1:アドマテック(株)製、商品名:SC2050−KC〕および水酸化アルミニウム(C−2:昭和電工(株)製、商品名:HP−360、平均粒径2.7μm)、また有機溶剤としてメチルエチルケトン(MEK)を使用して第1〜3表に示す配合割合(質量部)で混合して樹脂分70質量%の均一なワニスを得た。
比較例4〜7では、(a)成分対応として、ベンゾグアナミン、ベンゾグアナミンとホルムアルデヒドの縮合物(日本触媒(株)製、商品名:FP−100B)又はヘキサメトキシメチロール化メラミン樹脂(三井サイアナミッド(株)製、商品名:C−300)、更に難燃剤としてトリフェニルホスフェート〔東京化成工業(株)製〕を使用し、有機溶剤としては、メチルエチルケトン(MEK)を使用して、第4表に示す配合割合(質量部)で混合して樹脂分70質量%の均一なワニスを得た。
次に、得られたワニスを厚さ0.2mmのEガラスクロスに含浸塗工し、160℃で10分加熱乾燥して樹脂含有量55質量%のプリプレグを得た。このプリプレグを4枚重ね、厚さ18μmの電解銅箔を上下に配置し、圧力2.45MPa(25kgf/cm2)、温度185℃で90分間プレスを行って、銅張積層板を得た。
このようにして得られた銅張積層板を用いて、銅箔接着性(銅箔ピール強度)、ガラス転移温度(Tg)、はんだ耐熱性、吸湿性(吸水率)、難燃性、比誘電率(1GHz)及び誘電正接(1GHz)について前記の方法で測定・評価した。評価結果を第1表〜第4表に示す。
なお、第1表〜第4表において(d)有機溶剤(MEK)の配合割合は、ワニス中の樹脂分が70質量%となる量である(*で示す)。
Examples 13-24, Comparative Examples 4-7
In Examples 13 to 24, the benzoguanamine (a), phenolic compound (b), epoxy resin (c), organic solvent (d) and substituted maleimide compound (e) used in Examples 1 to 12 were used. Cresol novolac phenol resin [Dainippon Ink Chemical Co., Ltd., trade name: KA-1165] as a curing agent, fused silica [C-1: Admatech Co., Ltd., trade name: SC2050-KC] as an inorganic filler, and Aluminum hydroxide (C-2: Showa Denko Co., Ltd., trade name: HP-360, average particle size: 2.7 μm) and methyl ethyl ketone (MEK) as an organic solvent are shown in Tables 1 to 3 Mixing at a ratio (parts by mass), a uniform varnish having a resin content of 70% by mass was obtained.
In Comparative Examples 4 to 7, as a component (a), benzoguanamine, a condensate of benzoguanamine and formaldehyde (manufactured by Nippon Shokubai Co., Ltd., trade name: FP-100B) or hexamethoxymethylolated melamine resin (Mitsui Cyanamid Co., Ltd.) Product name: C-300), triphenyl phosphate [manufactured by Tokyo Chemical Industry Co., Ltd.] is used as a flame retardant, methyl ethyl ketone (MEK) is used as an organic solvent, and the formulation shown in Table 4 Mixing at a ratio (parts by mass), a uniform varnish having a resin content of 70% by mass was obtained.
Next, the obtained varnish was impregnated and applied to an E glass cloth having a thickness of 0.2 mm and dried by heating at 160 ° C. for 10 minutes to obtain a prepreg having a resin content of 55% by mass. Four prepregs were stacked and 18 μm thick electrolytic copper foils were placed one above the other and pressed at a pressure of 2.45 MPa (25 kgf / cm 2 ) and a temperature of 185 ° C. for 90 minutes to obtain a copper clad laminate.
Using the copper-clad laminate thus obtained, copper foil adhesion (copper foil peel strength), glass transition temperature (Tg), solder heat resistance, moisture absorption (water absorption), flame retardancy, relative dielectric constant The rate (1 GHz) and dielectric loss tangent (1 GHz) were measured and evaluated by the methods described above. The evaluation results are shown in Tables 1 to 4.
In Tables 1 to 4, (d) the proportion of organic solvent (MEK) is such that the resin content in the varnish is 70% by mass (indicated by *).

Figure 0005088060
Figure 0005088060

Figure 0005088060
Figure 0005088060

Figure 0005088060
Figure 0005088060

Figure 0005088060
Figure 0005088060

第1表及び第2表から明らかなように、本発明の実施例の熱硬化性樹脂組成物では、ガラス転移温度(Tg)、銅箔ピール強度、耐熱性、耐湿性、難燃性、銅付き耐熱性(T−288)、低誘電特性及び低誘電正接性の全てにバランスがとれている。
一方、第3表から明らかなように、比較例の熱硬化性樹脂組成物では、プリプレグを作製できなかったり、また、ガラス転移温度(Tg)、銅箔ピール強度、耐熱性、耐湿性、難燃性、銅付き耐熱性(T−288)、低誘電特性及び低誘電正接性の全てにバランスがとれたものは無く、いずれかの特性に劣っている。
本発明の熱硬化性樹脂組成物を基材に含浸、又は塗工して得たプリプレグ、及び該プリプレグを積層成形することにより製造された積層板は、ガラス転移温度(Tg)、金属箔接着性、耐熱性、耐湿性、難燃性、金属付き耐熱性(T−288)、低誘電特性及び低誘電正接性の全てにおいてバランスがとれており、電子機器用プリント配線板として有用である。
As is apparent from Tables 1 and 2, in the thermosetting resin compositions of the examples of the present invention, glass transition temperature (Tg), copper foil peel strength, heat resistance, moisture resistance, flame resistance, copper The heat resistance (T-288), low dielectric properties and low dielectric loss tangent are all balanced.
On the other hand, as is apparent from Table 3, the thermosetting resin composition of the comparative example cannot produce a prepreg, and has a glass transition temperature (Tg), copper foil peel strength, heat resistance, moisture resistance, difficulty. None of the flammability, heat resistance with copper (T-288), low dielectric properties, and low dielectric loss tangent are balanced, and any of the properties is inferior.
A prepreg obtained by impregnating or coating a base material with the thermosetting resin composition of the present invention, and a laminate produced by laminating the prepreg, have a glass transition temperature (Tg), a metal foil adhesion It is balanced in all of the properties, heat resistance, moisture resistance, flame resistance, heat resistance with metal (T-288), low dielectric properties and low dielectric loss tangent, and is useful as a printed wiring board for electronic equipment.

Claims (9)

下記一般式(I)に示す6−置換グアナミン化合物(a)、軟化点が120℃以下であるフェノール性化合物(b)、1分子中に少なくとも2個のエポキシ基を有するエポキシ樹脂(c)及び有機溶剤(d)を含有し、成分(a)、成分(b)及び成分(c)の総合計量100質量部に対して成分(a)の含有量が20〜79質量部であり、均一溶液であることを特徴とする熱硬化性樹脂組成物。
Figure 0005088060
(式中、R1はフェニル基、メチル基、ブチル基、アリル基、メトキシ基又はベンジルオキシ基を示す。)
A 6-substituted guanamine compound (a) represented by the following general formula (I) , a phenolic compound (b) having a softening point of 120 ° C. or lower, an epoxy resin (c) having at least two epoxy groups in one molecule, and The organic solvent (d) is contained, the content of the component (a) is 20 to 79 parts by mass with respect to 100 parts by mass of the total weight of the component (a), the component (b) and the component (c), and a uniform solution A thermosetting resin composition characterized by being:
Figure 0005088060
(In the formula, R 1 represents a phenyl group, a methyl group, a butyl group, an allyl group, a methoxy group, or a benzyloxy group.)
有機溶剤(d)が窒素非含有有機溶剤である請求項1に記載の熱硬化性樹脂組成物。   The thermosetting resin composition according to claim 1, wherein the organic solvent (d) is a nitrogen-free organic solvent. 窒素非含有有機溶剤がアルコール系有機溶剤(d1)又はアルコール系有機溶剤(d1)と、エーテル系有機溶剤(d2)、ケトン系有機溶剤(d3)及び芳香族系有機溶剤(d4)のうちの少なくとも一種とを含む有機溶剤である請求項2に記載の熱硬化性樹脂組成物。   The nitrogen-free organic solvent is an alcohol-based organic solvent (d1) or an alcohol-based organic solvent (d1), an ether-based organic solvent (d2), a ketone-based organic solvent (d3), or an aromatic-based organic solvent (d4). The thermosetting resin composition according to claim 2, which is an organic solvent containing at least one kind. 窒素非含有有機溶剤が、プロピレングリコールモノメチルエーテル又はメチルセロソルブと、メチルエチルケトン、メチルイソブチルケトン及びシクロヘキサノンのうちの少なくとも一種とを含む有機溶剤である請求項2に記載の熱硬化性樹脂組成物。   The thermosetting resin composition according to claim 2, wherein the nitrogen-free organic solvent is an organic solvent containing propylene glycol monomethyl ether or methyl cellosolve and at least one of methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone. 請求項1〜4のいずれかに記載の熱硬化性樹脂組成物に、1分子中に少なくとも2個のN−置換マレイミド基を有するマレイミド化合物(e)を加え、前記の6−置換グアナミン化合物(a)と反応させて得られ、均一溶液であることを特徴とする熱硬化性樹脂組成物。   A maleimide compound (e) having at least two N-substituted maleimide groups in one molecule is added to the thermosetting resin composition according to any one of claims 1 to 4, and the 6-substituted guanamine compound ( A thermosetting resin composition obtained by reacting with a) and being a homogeneous solution. 請求項1〜5のいずれかに記載の熱硬化性樹脂組成物を、基材に含浸又は塗工した後、Bステージ化して得られたプリプレグ。   A prepreg obtained by impregnating or applying the thermosetting resin composition according to any one of claims 1 to 5 to a B-stage. 請求項6に記載のプリプレグを積層成形して得られた積層板。   A laminate obtained by laminating the prepreg according to claim 6. プリプレグの少なくとも一方に金属箔を重ねた後、加熱加圧成形して得られた金属張積層板である請求項7に記載の積層板。   The laminate according to claim 7, wherein the laminate is a metal-clad laminate obtained by superposing metal foil on at least one of the prepregs and then heating and pressing. 請求項7又は請求項8に記載の積層板を用い、配線加工して得られたプリント配線板。   The printed wiring board obtained by carrying out wiring processing using the laminated board of Claim 7 or Claim 8.
JP2007242503A 2006-12-04 2007-09-19 Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same Expired - Fee Related JP5088060B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007242503A JP5088060B2 (en) 2006-12-04 2007-09-19 Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006326789 2006-12-04
JP2006326789 2006-12-04
JP2007242503A JP5088060B2 (en) 2006-12-04 2007-09-19 Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same

Publications (2)

Publication Number Publication Date
JP2008163308A JP2008163308A (en) 2008-07-17
JP5088060B2 true JP5088060B2 (en) 2012-12-05

Family

ID=39693193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007242503A Expired - Fee Related JP5088060B2 (en) 2006-12-04 2007-09-19 Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same

Country Status (1)

Country Link
JP (1) JP5088060B2 (en)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60184522A (en) * 1984-03-02 1985-09-20 Mitsubishi Gas Chem Co Inc Curable resin composition
JPH08269173A (en) * 1995-03-29 1996-10-15 Matsushita Electric Works Ltd Epoxy resin composition
JPH10193516A (en) * 1997-01-06 1998-07-28 Toshiba Chem Corp Production of glass epoxy copper plated laminated sheet
JP2002179772A (en) * 2000-12-08 2002-06-26 Mitsui Mining & Smelting Co Ltd Resin compound for composing insulating interlayer of print circuit board, resin sheet for forming insulating layer using the resin compound and copper-plated laminate using them
JP4055424B2 (en) * 2001-01-30 2008-03-05 日立化成工業株式会社 Thermosetting resin composition and use thereof
JP4273894B2 (en) * 2003-09-18 2009-06-03 日立化成工業株式会社 Resin composition
JP2006143850A (en) * 2004-11-18 2006-06-08 Hitachi Chem Co Ltd Flame-retardant resin composition, prepreg and metal-clad laminated sheet

Also Published As

Publication number Publication date
JP2008163308A (en) 2008-07-17

Similar Documents

Publication Publication Date Title
JP5298462B2 (en) Method for producing curing agent having acidic substituent and unsaturated maleimide group, thermosetting resin composition, prepreg and laminate
KR101398731B1 (en) Thermosetting resin composition and prepreg and laminate obtained with the same
JP5320699B2 (en) Thermosetting resin composition, prepreg and laminate using the same
WO2009081601A1 (en) Thermosetting resin composition and prepreg and laminate both made with the same
US8796473B2 (en) Method for producing curing agent having acidic substituent and unsaturated maleimide group, thermosetting resin composition, prepreg, and laminate
JP4968044B2 (en) Method for producing polyimide compound, thermosetting resin composition, and prepreg and laminate using the same
JP5381438B2 (en) Thermosetting insulating resin composition, and prepreg, film with resin, laminated board, and multilayer printed wiring board using the same
JP5540494B2 (en) Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same
JP2008133353A (en) Thermosetting resin composition, and prepreg and laminate using the resin composition
JP5028971B2 (en) (Modified) Guanamine compound solution, thermosetting resin composition, and prepreg and laminate using the same
JP5266685B2 (en) Thermosetting resin composition, prepreg and laminate using the same
JP6311922B2 (en) Thermosetting resin composition, prepreg using the same, laminate, and printed wiring board
JP5682664B2 (en) Thermosetting resin composition, prepreg and laminate using the same
JP2017155122A (en) Thermosetting resin composition, prepreg, laminate and printed wiring board
JP2012236908A (en) Thermosetting resin composition, prepreg and laminated board
JP5200488B2 (en) Copper foil with resin for multilayer printed wiring board and multilayer printed wiring board produced using the same
JP6575151B2 (en) Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same
JP4923862B2 (en) Method for producing epoxy-modified guanamine compound solution, thermosetting resin composition, and prepreg and laminate using the same
JP2007131834A (en) Thermosetting guanamine resin, method for producing the same, thermosetting resin composition, and prepreg and laminated board using the composition
JP4725347B2 (en) Phosphorus-containing guanamine resin, thermosetting resin composition using the same, and prepreg and laminate using the same
JP5088060B2 (en) Thermosetting resin composition, and prepreg, laminate and printed wiring board using the same
JP5447268B2 (en) Thermosetting resin composition, prepreg and laminate
JP2008150575A (en) Guanamine compound-comtaining solution, thermosetting resin composition and prepreg, laminated plate, and printed wiring board using the same
JP2006008753A (en) Resin composition, prepreg and lamianted board

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100825

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110804

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120210

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120214

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120411

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120814

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120827

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150921

Year of fee payment: 3

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150921

Year of fee payment: 3

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150921

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

LAPS Cancellation because of no payment of annual fees