JP5068924B2 - ガラスパネル組立体の連続封着処理炉および封着処理方法 - Google Patents
ガラスパネル組立体の連続封着処理炉および封着処理方法 Download PDFInfo
- Publication number
- JP5068924B2 JP5068924B2 JP2004045513A JP2004045513A JP5068924B2 JP 5068924 B2 JP5068924 B2 JP 5068924B2 JP 2004045513 A JP2004045513 A JP 2004045513A JP 2004045513 A JP2004045513 A JP 2004045513A JP 5068924 B2 JP5068924 B2 JP 5068924B2
- Authority
- JP
- Japan
- Prior art keywords
- glass panel
- panel assembly
- chamber
- forced convection
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/26—Sealing together parts of vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/26—Sealing together parts of vessels
- H01J9/261—Sealing together parts of vessels the vessel being for a flat panel display
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
- C03C27/06—Joining glass to glass by processes other than fusing
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/02—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity of multiple-track type; of multiple-chamber type; Combinations of furnaces
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/04—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity adapted for treating the charge in vacuum or special atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
- F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D21/00—Arrangements of monitoring devices; Arrangements of safety devices
- F27D21/0014—Devices for monitoring temperature
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/48—Sealing, e.g. seals specially adapted for leading-in conductors
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D9/00—Cooling of furnaces or of charges therein
- F27D2009/0002—Cooling of furnaces
- F27D2009/0005—Cooling of furnaces the cooling medium being a gas
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Geochemistry & Mineralogy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Tunnel Furnaces (AREA)
Description
2 ガラスパネル組立体
3 搬送手段
4 第1強制対流加熱室
5 真空排気室
6 第2強制対流加熱室
7 強制対流冷却室
8 第1置換室
9 第2置換室
T1 予備加熱温度
T2 封着処理温度
P1 減圧状態
Claims (2)
- 一対のガラス基板をそれら間にシールフリットを介在させて重ね合わせたガラスパネル組立体を搬送する搬送手段を有し、該搬送手段で該ガラスパネル組立体を順次連続的に搬送しつつ、当該シールフリットを融着させる封着処理を行うガラスパネル組立体の連続封着処理炉において、
上記搬送手段による上記ガラスパネル組立体の搬送方向に順次、
大気圧状態であって、上記ガラスパネル組立体の搬送方向に隣接するもの同士でそれらの内部温度が順次高温となるように温度制御される複数の区画領域を有し、各区画領域は、供給管から導入され排気管から排気される熱媒を強制的に流動させつつ、この熱媒によって該ガラスパネル組立体を、不純ガスが放出される上記シールフリットの溶融開始温度未満でその近傍の予備加熱温度まで加熱する第1強制対流加熱室と、
予備加熱温度を維持した状態で減圧されて、上記ガラスパネル組立体内に残留している不純ガスを強制的に除去する真空排気室と、
大気圧状態であって、熱媒を強制的に流動させつつ、この熱媒によって該ガラスパネル組立体を予備加熱温度から封着処理温度まで加熱する第2強制対流加熱室と、
大気圧状態であって、冷媒を強制的に流動させつつ、この冷媒によって該ガラスパネル組立体を冷却する強制対流冷却室とを連設するとともに、
上記第1強制対流加熱室と上記真空排気室との間および該真空排気室と上記第2強制対流加熱室との間にそれぞれ、開閉される扉を介して、予備加熱温度を維持しつつ加減圧可能な第1置換室及び第2置換室を設けたことを特徴とするガラスパネル組立体の連続封着処理炉。 - 請求項1に記載のガラスパネル組立体の連続封着処理炉を用い、
一対のガラス基板をそれら間にシールフリットを介在させて重ね合わせたガラスパネル組立体を前記搬送手段で順次連続的に搬送しつつ、当該シールフリットを溶融化させて封着処理するに際し、
前記第1強制対流加熱室にて、大気圧状態下で、熱媒を強制的に流動させつつ、この熱媒によって上記ガラスパネル組立体を、不純ガスが放出される上記シールフリットの溶融開始温度未満でその近傍の予備加熱温度まで加熱し、
次いで、上記ガラスパネル組立体が前記第1置換室を介して装入される前記真空排気室にて、予備加熱温度を維持した状態で減圧して、上記ガラスパネル組立体内に残留している不純ガスを強制的に除去し、
次いで、上記ガラスパネル組立体が前記第2置換室を介して装入される前記第2強制対流加熱室にて、大気圧状態下で、熱媒を強制的に流動させつつ、この熱媒によって上記ガラスパネル組立体を予備加熱温度から封着処理温度まで加熱し、
その後、前記強制対流冷却室にて、大気圧状態下で、冷媒を強制的に流動させつつ、この冷媒によって上記ガラスパネル組立体を冷却するようにしたことを特徴とするガラスパネル組立体の封着処理方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004045513A JP5068924B2 (ja) | 2004-02-20 | 2004-02-20 | ガラスパネル組立体の連続封着処理炉および封着処理方法 |
PCT/JP2005/002145 WO2005080286A1 (ja) | 2004-02-20 | 2005-02-14 | ガラスパネル組立体の封着処理方法および封着処理炉 |
US10/589,914 US7625260B2 (en) | 2004-02-20 | 2005-02-14 | Method of sealing glass panel assembly and sealing process furnace |
KR1020067016562A KR101086081B1 (ko) | 2004-02-20 | 2005-02-14 | 유리 패널 조립체의 연속 봉착 처리로 및 봉착 처리 방법 |
CN2005800054551A CN1922116B (zh) | 2004-02-20 | 2005-02-14 | 玻璃面板组装体的封接处理方法及封接处理炉 |
EP05719092A EP1717214A4 (en) | 2004-02-20 | 2005-02-14 | METHOD FOR SEALING GLASS PANEL ASSEMBLY AND SEALING FURNACE |
TW094104805A TWI307112B (en) | 2004-02-20 | 2005-02-18 | Method of sealing treatment and a sealing treatment furnace for a glass panel assembly |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004045513A JP5068924B2 (ja) | 2004-02-20 | 2004-02-20 | ガラスパネル組立体の連続封着処理炉および封着処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005235660A JP2005235660A (ja) | 2005-09-02 |
JP5068924B2 true JP5068924B2 (ja) | 2012-11-07 |
Family
ID=34879396
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004045513A Expired - Fee Related JP5068924B2 (ja) | 2004-02-20 | 2004-02-20 | ガラスパネル組立体の連続封着処理炉および封着処理方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7625260B2 (ja) |
EP (1) | EP1717214A4 (ja) |
JP (1) | JP5068924B2 (ja) |
KR (1) | KR101086081B1 (ja) |
CN (1) | CN1922116B (ja) |
TW (1) | TWI307112B (ja) |
WO (1) | WO2005080286A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8109761B1 (en) * | 2006-02-13 | 2012-02-07 | Whip Mix Corporation | Dental furnace with cooling system |
KR100857268B1 (ko) | 2007-04-06 | 2008-09-08 | 주식회사 비아트론 | 평판표시장치용 유리기판 제조방법 및 이에 의한 유리기판 |
JP2008269939A (ja) * | 2007-04-19 | 2008-11-06 | Nippon Hoso Kyokai <Nhk> | プラズマディスプレイパネルおよびプラズマディスプレイパネルの製造方法 |
CN102072644A (zh) * | 2011-01-20 | 2011-05-25 | 宋维明 | 一种烧结电炉 |
KR101604802B1 (ko) * | 2014-04-25 | 2016-03-21 | 주식회사 이건창호 | 진공유리패널 제조장치 및 이를 이용한 진공유리패널의 제조 방법 |
CN106431018A (zh) * | 2015-08-10 | 2017-02-22 | 东元奈米应材股份有限公司 | 真空绝缘玻璃封着及抽气方法 |
JP6950279B2 (ja) * | 2017-05-24 | 2021-10-13 | 日本電気硝子株式会社 | 焼結体の製造方法及び焼結体 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1136202A (en) | 1978-06-15 | 1982-11-23 | Henry E. Franklin | Method of sealing a gas discharge display without a tubulation |
JPH0636688A (ja) | 1992-07-14 | 1994-02-10 | Hitachi Ltd | ガラス封止デバイス製造方法およびガス放電表示パネルの製造装置 |
EP0738420B1 (fr) | 1994-11-09 | 1997-12-17 | Pixel International S.A. | PROCEDE et installation d'ASSEMBLAGE D'UN ECRAN PLAT DE VISUALISATION |
US5697825A (en) | 1995-09-29 | 1997-12-16 | Micron Display Technology, Inc. | Method for evacuating and sealing field emission displays |
JP3745880B2 (ja) | 1997-07-17 | 2006-02-15 | 中外炉工業株式会社 | ローラハース型連続封着炉 |
JP3946319B2 (ja) | 1997-08-29 | 2007-07-18 | 中外炉工業株式会社 | プラズマディスプレイパネルの処理方法 |
DE69917081T2 (de) | 1998-06-15 | 2005-04-21 | Matsushita Electric Ind Co Ltd | Verfahren zur Herstellung einer Plasma-Anzeigevorrichtung mit guten Emissionseigenschaften |
JP3553903B2 (ja) * | 1998-06-15 | 2004-08-11 | 松下電器産業株式会社 | プラズマディスプレイパネルの製造方法 |
CN1153243C (zh) * | 1999-03-01 | 2004-06-09 | 中外炉工业株式会社 | 等离子显示装置面板的排气密封方法 |
AU5406399A (en) * | 1999-08-27 | 2001-03-26 | Qingdao Synergy Technology Appliance Co., Ltd. | The method for manufacturing vacuum glazing and its application mechanical system |
JP3754859B2 (ja) * | 2000-02-16 | 2006-03-15 | キヤノン株式会社 | 画像表示装置の製造法 |
JP3696505B2 (ja) | 2000-12-15 | 2005-09-21 | 光洋サーモシステム株式会社 | 熱処理装置および熱処理方法 |
JP2002245941A (ja) * | 2001-02-13 | 2002-08-30 | Nec Corp | プラズマディスプレイパネルの製造方法 |
-
2004
- 2004-02-20 JP JP2004045513A patent/JP5068924B2/ja not_active Expired - Fee Related
-
2005
- 2005-02-14 CN CN2005800054551A patent/CN1922116B/zh not_active Expired - Fee Related
- 2005-02-14 US US10/589,914 patent/US7625260B2/en not_active Expired - Fee Related
- 2005-02-14 KR KR1020067016562A patent/KR101086081B1/ko not_active IP Right Cessation
- 2005-02-14 EP EP05719092A patent/EP1717214A4/en not_active Withdrawn
- 2005-02-14 WO PCT/JP2005/002145 patent/WO2005080286A1/ja not_active Application Discontinuation
- 2005-02-18 TW TW094104805A patent/TWI307112B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI307112B (en) | 2009-03-01 |
WO2005080286A1 (ja) | 2005-09-01 |
TW200532742A (en) | 2005-10-01 |
EP1717214A1 (en) | 2006-11-02 |
KR101086081B1 (ko) | 2011-11-25 |
JP2005235660A (ja) | 2005-09-02 |
CN1922116B (zh) | 2010-05-05 |
KR20070007787A (ko) | 2007-01-16 |
EP1717214A4 (en) | 2008-04-02 |
US20070161315A1 (en) | 2007-07-12 |
CN1922116A (zh) | 2007-02-28 |
US7625260B2 (en) | 2009-12-01 |
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