JP5037013B2 - 窒化物半導体発光素子 - Google Patents
窒化物半導体発光素子 Download PDFInfo
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- JP5037013B2 JP5037013B2 JP2005379215A JP2005379215A JP5037013B2 JP 5037013 B2 JP5037013 B2 JP 5037013B2 JP 2005379215 A JP2005379215 A JP 2005379215A JP 2005379215 A JP2005379215 A JP 2005379215A JP 5037013 B2 JP5037013 B2 JP 5037013B2
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- 150000004767 nitrides Chemical class 0.000 title claims description 123
- 239000004065 semiconductor Substances 0.000 title claims description 115
- 238000000149 argon plasma sintering Methods 0.000 claims description 72
- 239000000758 substrate Substances 0.000 claims description 66
- 239000002184 metal Substances 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 12
- 238000002834 transmittance Methods 0.000 claims description 11
- 239000011810 insulating material Substances 0.000 claims description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910003460 diamond Inorganic materials 0.000 claims description 5
- 239000010432 diamond Substances 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- 229910003465 moissanite Inorganic materials 0.000 claims description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 4
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 229910016553 CuOx Inorganic materials 0.000 claims description 3
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000002861 polymer material Substances 0.000 claims description 2
- 229910004205 SiNX Inorganic materials 0.000 claims 1
- 230000005284 excitation Effects 0.000 claims 1
- 229910052594 sapphire Inorganic materials 0.000 description 36
- 239000010980 sapphire Substances 0.000 description 36
- 238000000605 extraction Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 229910002704 AlGaN Inorganic materials 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 229910052771 Terbium Inorganic materials 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000002223 garnet Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 230000001443 photoexcitation Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- -1 rare earths) Inorganic materials 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
- F16K3/0227—Packings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K27/00—Construction of housing; Use of materials therefor
- F16K27/04—Construction of housing; Use of materials therefor of sliding valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/30—Details
- F16K3/314—Forms or constructions of slides; Attachment of the slide to the spindle
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0091—Scattering means in or on the semiconductor body or semiconductor body package
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
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- Led Device Packages (AREA)
Description
11、31、51、61、71 サファイア基板
21、41 パッケージ基板
12、32、52、62、72 バッファ層
22a、42a 第1導電ライン
22b、42b 第2導電ライン
14、34、54、64、74 第1導電型クラッド層
15、35、55、65、75 活性層
16、36、56、66、76 第2導電型クラッド層
37、57、67、77 絶縁性光散乱層
68、78 反射メタル層
θC 臨界角
Claims (17)
- 光透過性基板上に順次に形成された第1導電型窒化物半導体層、活性層及び第2導電型窒化物半導体層を備えた窒化物発光素子において、
前記窒化物半導体発光素子の少なくとも一面に形成された、光透過率が50%以上の絶縁性物質を用いて成り、光を散乱させるための凹凸パターンが形成された絶縁性の光散乱層を備え、
前記窒化物半導体発光素子の光放出面を除く少なくとも一面に形成される反射メタル層をさらに含み、
前記反射メタル層は前記絶縁性の光散乱層の前記凹凸パターンの表面上に形成されることを特徴とする窒化物半導体発光素子。 - 前記絶縁性光散乱層は、光透過率が70%以上であることを特徴とする請求項1に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、ポリマー物質であることを特徴とする請求項1または2に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、エポキシ樹脂、シリコン樹脂及びPMMA樹脂物質であることを特徴とする請求項1〜3のいずれか一項に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、光励起用蛍光体をさらに備えたことを特徴とする請求項1〜4のいずれか一項に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層はGaN、AlN、InN、SiNx、SiC、ダイアモンド、Al2O3、SiO2、SnO2、TiO2、ZrO2、MgO、InOx、及びCuOxの群から選ばれた物質の少なくとも一つを含むことを特徴とする請求項1または請求項2に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層の凹凸パターンの周期は約0.001〜50μm範囲であることを特徴とする請求項1〜6のいずれか一項に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層の凹凸パターンは周期が約0.001〜50μm範囲である粒子を用いて成ることを特徴とする請求項1〜6のいずれか一項に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、少なくとも前記光透過性基板の下面に形成される請求項1〜8のいずれか一項に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、前記光透過性基板より高い屈折率を有する物質を用いて成ることを特徴とする請求項1〜9のいずれか一項に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、前記光透過性基板と対向する前記窒化物発光素子の上面に形成されていることを特徴とする請求項1〜8のいずれか一項に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、前記窒化物発光素子の上面からその側面の少なくとも一部まで延長され形成されていることを特徴とする請求項11に記載の窒化物半導体発光素子。
- 前記絶縁性光散乱層は、前記第1及び第2導電型窒化物半導体層より高い屈折率を有する物質から成ることを特徴とする請求項11または12に記載の窒化物半導体発光素子。
- 前記反射メタル層は少なくとも90%の反射率を有することを特徴とする請求項1〜13のいずれか一項に記載の窒化物半導体発光素子。
- 前記反射メタル層はAg、Al、Rh、Ru、Pt、Au、Cu、Pd、Cr、Ni、Co、Ti、In及びMoの群から選ばれた少なくとも1種の金属またはその合金からなる層を備えたことを特徴とする請求項1〜14のいずれか一項に記載の窒化物半導体発光素子。
- 前記光透過性基板はその側端の少なくとも一部が傾斜面とされ、
前記絶縁性光散乱層は少なくとも前記光透過性基板の下面とその傾斜面に形成される
ことを特徴とする請求項1に記載の窒化物半導体発光素子。 - 前記絶縁性光散乱層は、前記光透過性基板より高い屈折率を有する物質用いて成ることを特徴とする請求項16に記載の窒化物半導体発光素子。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050000266A KR100638666B1 (ko) | 2005-01-03 | 2005-01-03 | 질화물 반도체 발광소자 |
KR10-2005-266 | 2005-01-03 |
Publications (2)
Publication Number | Publication Date |
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JP2006191103A JP2006191103A (ja) | 2006-07-20 |
JP5037013B2 true JP5037013B2 (ja) | 2012-09-26 |
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JP2005379215A Expired - Fee Related JP5037013B2 (ja) | 2005-01-03 | 2005-12-28 | 窒化物半導体発光素子 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20060145170A1 (ja) |
JP (1) | JP5037013B2 (ja) |
KR (1) | KR100638666B1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101843726B1 (ko) | 2011-10-06 | 2018-03-30 | 엘지이노텍 주식회사 | 발광소자 |
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- 2005-01-03 KR KR1020050000266A patent/KR100638666B1/ko active IP Right Grant
- 2005-12-28 US US11/319,973 patent/US20060145170A1/en not_active Abandoned
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KR101843726B1 (ko) | 2011-10-06 | 2018-03-30 | 엘지이노텍 주식회사 | 발광소자 |
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KR100638666B1 (ko) | 2006-10-30 |
KR20060079737A (ko) | 2006-07-06 |
US20060145170A1 (en) | 2006-07-06 |
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