JP4977912B2 - 流体温調装置 - Google Patents
流体温調装置 Download PDFInfo
- Publication number
- JP4977912B2 JP4977912B2 JP2007036592A JP2007036592A JP4977912B2 JP 4977912 B2 JP4977912 B2 JP 4977912B2 JP 2007036592 A JP2007036592 A JP 2007036592A JP 2007036592 A JP2007036592 A JP 2007036592A JP 4977912 B2 JP4977912 B2 JP 4977912B2
- Authority
- JP
- Japan
- Prior art keywords
- heat transfer
- transfer plate
- heater
- temperature
- temperature control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000012530 fluid Substances 0.000 title claims description 83
- 238000010438 heat treatment Methods 0.000 claims description 38
- 238000001816 cooling Methods 0.000 claims description 12
- 239000000126 substance Substances 0.000 description 39
- 239000000243 solution Substances 0.000 description 27
- 239000007788 liquid Substances 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000020169 heat generation Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000005485 electric heating Methods 0.000 description 3
- 239000008155 medical solution Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 230000036760 body temperature Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B21/00—Machines, plants or systems, using electric or magnetic effects
- F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
- F25B21/04—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect reversible
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2400/00—General features or devices for refrigeration machines, plants or systems, combined heating and refrigeration systems or heat-pump systems, i.e. not limited to a particular subgroup of F25B
- F25B2400/01—Heaters
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Instantaneous Water Boilers, Portable Hot-Water Supply Apparatuses, And Control Of Portable Hot-Water Supply Apparatuses (AREA)
Description
図1は、本発明に関わる流体温調装置を、半導体装置の製造プロセスにおいて使用される薬液(被温調流体)、具体的にはアンモニア過水や塩酸過水等、ウェットプロセス(RCA洗浄)やウェットエッチング等に使用される酸系の薬液を対象とし、これらの薬液を約10℃〜約80℃の範囲に亘って温度調節を行なうための流体温調装置に適用した例を示している。
因みに、上記耐蝕プレート3Pは、酸性の薬液に対する耐蝕性とともに良好な熱伝導性を備えたアモルファスカーボンから形成されている。
2…流路ブロック、
2a…表面、
2g…流路溝、
2P…流路、
3…伝熱板、
3P…耐食プレート、
4…ヒータ、
5…ペルチェモジュール(熱電モジュール)、
6…ウォータジャケット。
Claims (2)
- 流路溝を形成した本体ブロックと、
前記本体ブロックの表面に設置されて被温調流体の通過する流路を形成する伝熱板と、
前記伝熱板を介在して前記流路を通過する被温調流体を加熱するヒータと、
前記伝熱板を介在して前記流路を通過する被温調流体を加熱および冷却する熱電モジュールとを具備して成り、
前記ヒータを前記伝熱板の内部に設置するとともに、内部にヒータを設置した前記伝熱板の外面に前記熱電モジュールを設置したことを特徴とする流体温調装置。 - 前記ヒータにおける被温調流体への加熱能力を、前記熱電モジュールにおける被温調流体への加熱能力よりも大きく設定したことを特徴とする請求項1記載の流体温調装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007036592A JP4977912B2 (ja) | 2007-02-16 | 2007-02-16 | 流体温調装置 |
US12/071,047 US8109328B2 (en) | 2007-02-16 | 2008-02-14 | Fluid temperature control device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007036592A JP4977912B2 (ja) | 2007-02-16 | 2007-02-16 | 流体温調装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008202816A JP2008202816A (ja) | 2008-09-04 |
JP4977912B2 true JP4977912B2 (ja) | 2012-07-18 |
Family
ID=39705649
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007036592A Active JP4977912B2 (ja) | 2007-02-16 | 2007-02-16 | 流体温調装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8109328B2 (ja) |
JP (1) | JP4977912B2 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5496925B2 (ja) * | 2011-01-25 | 2014-05-21 | 東京エレクトロン株式会社 | めっき処理装置、めっき処理方法および記憶媒体 |
JP5901275B2 (ja) * | 2011-12-20 | 2016-04-06 | 株式会社Kelk | 流体温度調整装置 |
JP5901276B2 (ja) * | 2011-12-20 | 2016-04-06 | 株式会社Kelk | 流体温度調整装置 |
JP5951979B2 (ja) * | 2011-12-20 | 2016-07-13 | 株式会社Kelk | 流体温度調整装置 |
KR101498047B1 (ko) * | 2013-04-19 | 2015-03-11 | 주식회사 리빙케어 | 순간 냉수용 냉각장치 |
WO2015182819A1 (ko) * | 2014-05-29 | 2015-12-03 | 주식회사 리빙케어 | 순간 냉각 및 순간 가열 기능이 구비된 정수기 |
KR101628042B1 (ko) * | 2014-05-29 | 2016-06-08 | 주식회사 리빙케어 | 정수기용 순간 냉각 유닛 |
KR102174312B1 (ko) * | 2015-12-15 | 2020-11-04 | 주식회사 리빙케어 | 순간 가열 및 순간 냉각 방식의 정수기 |
JP7236846B2 (ja) * | 2018-11-15 | 2023-03-10 | 株式会社Kelk | 温調装置及び温調装置の製造方法 |
JP7309036B2 (ja) * | 2020-03-19 | 2023-07-14 | 三菱電機株式会社 | 空気調和装置の室外機 |
KR102413795B1 (ko) * | 2020-07-20 | 2022-06-28 | 글로벌라이트 주식회사 | 반도체 처리액 온도 유지 장치 |
CN112588521B (zh) * | 2020-12-24 | 2021-11-16 | 上海建为历保科技股份有限公司 | 一种壁画修复用胶液注射装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3262492A (en) * | 1964-06-15 | 1966-07-26 | Westinghouse Electric Corp | Apparatus for maintaining a liquid at a constant low temperature |
SU1736483A1 (ru) * | 1989-05-31 | 1992-05-30 | Днепропетровский инженерно-строительный институт | Устройство дл локального термовоздействи |
JP3701478B2 (ja) * | 1998-10-15 | 2005-09-28 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4026265B2 (ja) * | 1999-02-16 | 2007-12-26 | 株式会社小松製作所 | 温度制御プレート |
JP2001237284A (ja) * | 2000-02-24 | 2001-08-31 | Komatsu Ltd | 温度制御装置及び半導体ウェハ検査用のプローバ装置 |
JP2001297977A (ja) * | 2000-04-17 | 2001-10-26 | Ferrotec Corp | 急速加熱・冷却板 |
JP4759168B2 (ja) * | 2001-06-07 | 2011-08-31 | シスメックス株式会社 | 液体加温器およびそれを備えた分析装置 |
JP3863116B2 (ja) * | 2002-03-14 | 2006-12-27 | 株式会社小松製作所 | 流体温度調節装置 |
US6666031B2 (en) * | 2002-03-14 | 2003-12-23 | Komatsu, Ltd. | Fluid temperature control apparatus |
US6782195B2 (en) * | 2002-04-03 | 2004-08-24 | Applied Integrated Systems, Inc. | Heat exchanger for high purity fluid handling systems |
JP3808072B2 (ja) * | 2003-12-05 | 2006-08-09 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP4662448B2 (ja) | 2005-03-23 | 2011-03-30 | 大日本スクリーン製造株式会社 | 基板処理装置 |
CN1861357A (zh) * | 2006-06-07 | 2006-11-15 | 陆雨 | 可控制非均温硫化加热装置 |
-
2007
- 2007-02-16 JP JP2007036592A patent/JP4977912B2/ja active Active
-
2008
- 2008-02-14 US US12/071,047 patent/US8109328B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20080196863A1 (en) | 2008-08-21 |
JP2008202816A (ja) | 2008-09-04 |
US8109328B2 (en) | 2012-02-07 |
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