JP4805740B2 - 振動に敏感な要素を支持する支持装置 - Google Patents
振動に敏感な要素を支持する支持装置 Download PDFInfo
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- JP4805740B2 JP4805740B2 JP2006193740A JP2006193740A JP4805740B2 JP 4805740 B2 JP4805740 B2 JP 4805740B2 JP 2006193740 A JP2006193740 A JP 2006193740A JP 2006193740 A JP2006193740 A JP 2006193740A JP 4805740 B2 JP4805740 B2 JP 4805740B2
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- Prior art keywords
- pressure
- support device
- support
- pressure chamber
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
- F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
- F16F15/0275—Control of stiffness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Acoustics & Sound (AREA)
- Aviation & Aerospace Engineering (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Vibration Prevention Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Diaphragms And Bellows (AREA)
- Fluid-Damping Devices (AREA)
Description
・オープンガス(開放ガス)システムであり、漏れがある。静的(固定式)気体ベアリングは、空気供給ユニットからの連続した気体流を必要とする。
・このシステムは、リソグラフィ/計測ツールのウェハ及びその他の汚染に敏感な部分/要素のための汚染を防止するために、超微細(<0.003um)粒子フィルタを有する必要がある。
・既知のシステムに対して大きな変更を行わずして、真空用途で使用することができない。
・使用される気体ベアリングは、高精度部(許容範囲はおよそ+/−1μm)を必要とする。
・気体ベアリングは、汚染に非常に敏感である。
2 ベースフレーム
3 ペイロード
5 支持装置
8 気体バネ(圧力室)
8a 上部室
8b 下部室
8c 縁溶接ベローズ
8d 追加容積部
8e 接続管路
9 弾性ヒンジ
11 一次元バネ
12 ローレンツモータ
23 バネ/負の剛性モジュール
24 絞り
26 圧力供給装置
31 加圧器
32 圧力供給室
33 プランジャ
34 コントローラ
Claims (23)
- リソグラフィ装置又は計測装置で使用し、基部に対して荷重を相対的に支持する支持装置であって、
荷重側部分と、基部側部分と、前記荷重側部分に支持を与え、前記基部側及び前記荷重側を基準にして支持方向を規定する中間部分とを備え、
該中間部分は、室壁で囲まれた圧力室を有し、
前記支持方向に平行に変形可能に設けられ、かつ前記支持方向に垂直な方向には実質的に変形せず、さらに、前記支持方向に直交する2つの垂直軸まわりに屈曲可能とされていて、前記荷重側部分よりも前記基部側部分の近くに配置される部分を、該室壁が少なくとも有し、
前記室壁の部分は、前記圧力室の一部分を囲む鉛直部分を含み、該鉛直部分の主要部分は、前記荷重側部分よりも前記基部側部分の近くに配置され、
前記室壁の部分は、前記圧力室を上部圧力室と流通圧力室とに分割し、前記上部圧力室は剛性の室壁で囲まれ、接続部材を介して前記荷重側部分に接続され、
前記支持方向に平行な方向においては屈曲せず、前記支持方向に直交する2つの垂直軸まわりに屈曲することができる前記接続部材により、前記上部圧力室が前記荷重側部分に接続される、
支持装置。 - 前記圧力室は、流通圧力室に連通接続する下部圧力室をさらに備える、請求項1に記載の支持装置。
- 前記室壁の部分はダイアフラム状構造で構成されている、請求項1に記載の支持装置。
- 前記ダイアフラム状構造はダイアフラムリングを備え、該ダイアフラムリングは、内側及び外側が共に縁溶接されて縁溶接ベローズを形成する、請求項3に記載の支持装置。
- 前記ダイアフラムリングは金属で形成されている、請求項4に記載の支持装置。
- 前記圧力室に接続する外部圧力室をさらに備える、請求項1ないし5のいずれか一項に記載の支持装置。
- 前記圧力室に流体圧力を供給する手段を備え、前記圧力室に流体が封入される、請求項1ないし6のいずれか一項に記載の支持装置。
- 前記圧力供給手段は、圧力発生手段と、前記圧力室を該圧力供給手段に相互接続する供給管路とを備える、請求項7に記載の支持装置。
- 前記圧力供給手段は、前記供給管路を制限する絞りをさらに備える、請求項8に記載の支持装置。
- 前記圧力供給手段は、前記圧力を低圧から高圧に変える手段をさらに備える、請求項8又は9に記載の支持装置。
- 前記圧力発生手段は、或る容積を含む圧力供給室及び該室の該容積を低減する手段を備える、請求項8に記載の支持装置。
- 前記圧力供給手段は、圧力調整手段及び/又は圧力制御手段を備える、請求項7ないし11のいずれか一項に記載の支持装置。
- 前記接続部材は金属で形成された弾性ヒンジである、請求項1に記載の支持装置。
- 前記支持方向に垂直な方向において前記荷重側部分に作用する少なくとも1つの一次元バネを備える、請求項1ないし13のいずれか一項に記載の支持装置。
- 前記圧力室は負の剛性モジュールに連結される、請求項1に記載の支持装置。
- 前記負の剛性モジュールは前記支持方向に平行に作用する、請求項15に記載の支持装置。
- 一対のローレンツアクチュエータを前記荷重側部分と前記基部側部分の間にさらに備える、請求項1ないし16のいずれか一項に記載の支持装置。
- 音響雑音を含む外乱力とステージ及びモータからの残留力とを含む静的力、前記圧力室内の圧力変化、及び/又は前記圧力室内の気体を含む圧力流体の温度変化を制御する制御手段が設けられる、請求項1ないし17のいずれか一項に記載の支持装置。
- 振動に敏感な装置を担持する荷重担持組立体であって、
ベースフレームと、
振動に敏感な装置を担持するペイロードと、
少なくとも3つの、請求項1ないし18のいずれか一項に記載の支持装置と
を備える、振動に敏感な装置を担持する荷重担持組立体。 - 請求項19に記載の荷重担持組立体であって、
前記支持装置は、前記ベースフレームと前記ペイロードとの間、及び/又は該荷重担持組立体の設置場所と前記ベースフレームとの間に設けられる、請求項19に記載の荷重担持組立体。 - 前記支持装置及び/又は前記組立体は真空室に設けられる、請求項19又は20に記載の荷重担持組立体。
- 請求項19ないし21のいずれか一項に記載の荷重担持組立体を備える計測装置。
- 請求項19ないし21のいずれか一項に記載の荷重担持組立体を備えるリソグラフィ装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05015497A EP1744215B1 (en) | 2005-07-16 | 2005-07-16 | Supporting device for supporting vibration sensitive components |
EP05015497.0 | 2005-07-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007024313A JP2007024313A (ja) | 2007-02-01 |
JP4805740B2 true JP4805740B2 (ja) | 2011-11-02 |
Family
ID=36264024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006193740A Active JP4805740B2 (ja) | 2005-07-16 | 2006-07-14 | 振動に敏感な要素を支持する支持装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8256735B2 (ja) |
EP (1) | EP1744215B1 (ja) |
JP (1) | JP4805740B2 (ja) |
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EP1803963B1 (de) * | 2005-12-30 | 2009-08-26 | Integrated Dynamics Engineering GmbH | Hybrides Steifigkeitsmodul zur Schwingungsisolation |
US20080061948A1 (en) * | 2006-08-18 | 2008-03-13 | Daniel Perez | System and method for communicating with gate operators via a power line |
US20080094186A1 (en) * | 2006-10-04 | 2008-04-24 | Viking Access Systems, Llc | Apparatus and method for monitoring and controlling gate operators via power line communication |
US20080106370A1 (en) * | 2006-11-02 | 2008-05-08 | Viking Access Systems, Llc | System and method for speech-recognition facilitated communication to monitor and control access to premises |
US20090085719A1 (en) * | 2007-09-28 | 2009-04-02 | Daniel Perez | System and method for monitoring and controlling a movable barrier operator utilizing satellite communication capabilities |
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US7816875B2 (en) * | 2008-01-24 | 2010-10-19 | Viking Access Systems, Llc | High torque gearless actuation at low speeds for swing gate, roll-up gate, slide gate, and vehicular barrier operators |
US20090188166A1 (en) * | 2008-01-24 | 2009-07-30 | Hassan Taheri | System for gearless operation of a movable barrier utilizing lorentz forces |
US7816879B2 (en) * | 2008-02-19 | 2010-10-19 | Viking Access Systems, Llc | High torque movable barrier actuation at low speeds utilizing a hub motor |
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2005
- 2005-07-16 EP EP05015497A patent/EP1744215B1/en active Active
-
2006
- 2006-07-14 JP JP2006193740A patent/JP4805740B2/ja active Active
- 2006-07-14 US US11/457,582 patent/US8256735B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US8256735B2 (en) | 2012-09-04 |
EP1744215A1 (en) | 2007-01-17 |
JP2007024313A (ja) | 2007-02-01 |
EP1744215B1 (en) | 2012-09-12 |
US20070052946A1 (en) | 2007-03-08 |
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