JP4713262B2 - 感光性の樹脂組成物 - Google Patents
感光性の樹脂組成物 Download PDFInfo
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- JP4713262B2 JP4713262B2 JP2005212655A JP2005212655A JP4713262B2 JP 4713262 B2 JP4713262 B2 JP 4713262B2 JP 2005212655 A JP2005212655 A JP 2005212655A JP 2005212655 A JP2005212655 A JP 2005212655A JP 4713262 B2 JP4713262 B2 JP 4713262B2
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- Japan
- Prior art keywords
- resin composition
- photosensitive resin
- meth
- acrylate
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011342 resin composition Substances 0.000 title claims description 54
- -1 nitrogen-containing compound Chemical class 0.000 claims description 53
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 47
- 150000001875 compounds Chemical class 0.000 claims description 45
- 229920000642 polymer Polymers 0.000 claims description 36
- 229920001577 copolymer Polymers 0.000 claims description 21
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 16
- 239000011229 interlayer Substances 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 15
- 238000006116 polymerization reaction Methods 0.000 claims description 15
- 125000004464 hydroxyphenyl group Chemical group 0.000 claims description 13
- 229920005989 resin Polymers 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 13
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical group [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 claims description 12
- 125000003700 epoxy group Chemical group 0.000 claims description 10
- 229920001187 thermosetting polymer Polymers 0.000 claims description 10
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims description 2
- 239000010408 film Substances 0.000 description 50
- 239000000243 solution Substances 0.000 description 25
- 238000000576 coating method Methods 0.000 description 19
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 239000011248 coating agent Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 18
- 238000010438 heat treatment Methods 0.000 description 14
- 238000003786 synthesis reaction Methods 0.000 description 13
- 238000011156 evaluation Methods 0.000 description 9
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 8
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000011161 development Methods 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000004793 Polystyrene Substances 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- ALVGSDOIXRPZFH-UHFFFAOYSA-N [(1-diazonioimino-3,4-dioxonaphthalen-2-ylidene)hydrazinylidene]azanide Chemical compound C1=CC=C2C(=N[N+]#N)C(=NN=[N-])C(=O)C(=O)C2=C1 ALVGSDOIXRPZFH-UHFFFAOYSA-N 0.000 description 4
- 238000002845 discoloration Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 150000005673 monoalkenes Chemical class 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 3
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000004640 Melamine resin Substances 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229920001807 Urea-formaldehyde Polymers 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000002723 alicyclic group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- CPEXFJVZFNYXGU-UHFFFAOYSA-N 2,4,6-trihydroxybenzophenone Chemical compound OC1=CC(O)=CC(O)=C1C(=O)C1=CC=CC=C1 CPEXFJVZFNYXGU-UHFFFAOYSA-N 0.000 description 2
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000007974 melamines Chemical class 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000003303 reheating Methods 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 150000003672 ureas Chemical class 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- UYBDKTYLTZZVEB-UHFFFAOYSA-N (2,3,4,5,6-pentahydroxyphenyl)-phenylmethanone Chemical compound OC1=C(O)C(O)=C(O)C(O)=C1C(=O)C1=CC=CC=C1 UYBDKTYLTZZVEB-UHFFFAOYSA-N 0.000 description 1
- QWRVAXMLZCMVSL-UHFFFAOYSA-N (2,4,6-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC(O)=C1C(=O)C1=CC(O)=C(O)C(O)=C1 QWRVAXMLZCMVSL-UHFFFAOYSA-N 0.000 description 1
- HZBSQYSUONRRMW-UHFFFAOYSA-N (2-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1O HZBSQYSUONRRMW-UHFFFAOYSA-N 0.000 description 1
- IUSXXDHQFMPZQX-UHFFFAOYSA-N (2-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=CC=C1OC(=O)C=C IUSXXDHQFMPZQX-UHFFFAOYSA-N 0.000 description 1
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- NTHRHRINERQNSR-UHFFFAOYSA-N (3-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC(O)=C1 NTHRHRINERQNSR-UHFFFAOYSA-N 0.000 description 1
- DRZPXZMMDBMTHL-UHFFFAOYSA-N (3-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=CC(OC(=O)C=C)=C1 DRZPXZMMDBMTHL-UHFFFAOYSA-N 0.000 description 1
- NIUHGYUFFPSEOW-UHFFFAOYSA-N (4-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=C(OC(=O)C=C)C=C1 NIUHGYUFFPSEOW-UHFFFAOYSA-N 0.000 description 1
- WNHHRXSVKWWRJY-UHFFFAOYSA-N (5-methyl-5-bicyclo[2.2.1]hept-2-enyl)methanol Chemical compound C1C2C(C)(CO)CC1C=C2 WNHHRXSVKWWRJY-UHFFFAOYSA-N 0.000 description 1
- QYGBYAQGBVHMDD-XQRVVYSFSA-N (z)-2-cyano-3-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C/C1=CC=CS1 QYGBYAQGBVHMDD-XQRVVYSFSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- LGJCFVYMIJLQJO-UHFFFAOYSA-N 1-dodecylperoxydodecane Chemical compound CCCCCCCCCCCCOOCCCCCCCCCCCC LGJCFVYMIJLQJO-UHFFFAOYSA-N 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- PECUPOXPPBBFLU-UHFFFAOYSA-N 1-ethenyl-3-methoxybenzene Chemical compound COC1=CC=CC(C=C)=C1 PECUPOXPPBBFLU-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- VBSNQEZPXZKHGV-UHFFFAOYSA-N 2,3-diethoxybicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(OCC)C2OCC VBSNQEZPXZKHGV-UHFFFAOYSA-N 0.000 description 1
- WFDBQLSDFKLLEC-UHFFFAOYSA-N 2,3-dimethoxybicyclo[2.2.1]hept-5-ene Chemical compound C1C2C=CC1C(OC)C2OC WFDBQLSDFKLLEC-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- VBZBISQOWJYWCC-UHFFFAOYSA-N 2-(2-carboxypropan-2-yldiazenyl)-2-methylpropanoic acid Chemical compound OC(=O)C(C)(C)N=NC(C)(C)C(O)=O VBZBISQOWJYWCC-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- CZYVCAJKUNEWLC-UHFFFAOYSA-N 2-(5-bicyclo[2.2.1]hept-2-enyl)ethanol Chemical compound C1C2C(CCO)CC1C=C2 CZYVCAJKUNEWLC-UHFFFAOYSA-N 0.000 description 1
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Description
即ち、本発明は、
(1)ヒドロキシフェニル(メタ)アクリレートを重合成分として含む重合体(ただし、重合成分が、(x1)不飽和カルボン酸及び/又は不飽和カルボン酸無水物、(x2)エポキシ基含有不飽和化合物、(x3)下記式で表される不飽和化合物、並びに、(x4)前記(x1)、(x2)及び(x3)以外のオレフィン系不飽和化合物、である共重合体を除く)[A]、キノンジアジド基含有化合物[B]及び熱硬化性樹脂[C]を含有することを特徴とする感光性の樹脂組成物、
(2)[A]がヒドロキシフェニル(メタ)アクリレートとスチレン又はメタクリル酸メチルとの共重合体である上記(1)の感光性の樹脂組成物、
(3)[C]が含窒素化合物である上記(1)又は(2)の感光性の樹脂組成物、
(4)[A]100質量部に対し、[B]10〜30質量部及び[C]1〜20質量部を含有する上記(1)〜(3)のいずれかの感光性の樹脂組成物、
(5)マイクロレンズ形成用である上記(1)〜(4)のいずれかの感光性の樹脂組成物、及び
(6)層間絶縁膜形成用である上記(1)〜(4)のいずれかの感光性の樹脂組成物、
を提供するものである。
本発明の感光性の樹脂組成物に必須成分として含有される重合体[A]は、ヒドロキシフェニル(メタ)アクリレートを必須の重合成分として含むものであり、ヒドロキシフェニル(メタ)アクリレートとしては、具体的には、o−ヒドロキシフェニルアクリレート、m−ヒドロキシフェニルアクリレート、p−ヒドロキシフェニルアクリレート、o−ヒドロキシフェニルメタクリレート、m−ヒドロキシフェニルメタクリレート及びp−ヒドロキシフェニルメタクリレートが挙げられ、これらは単独又は2種以上を組み合わせて使用できる。
重合開始剤としては、例えば、2,2'−アゾビス(2,4−ジメチルバレロニトリル)、2,2'−アゾビス(2−ブチロニトリル)、2,2'−アゾビスイソブチロニトリル、ジメチル−2,2'−アゾビスイソブチレート、1,1'−アゾビス(シクロヘキサン−1−カルボニトリル)等のアゾ系開始剤等やベンゾイルパーオキサイド、ラウリルパーオキサイド、オクタノイルパーオキサイド、アセチルパーオキサイド、ジ−t−ブチルパーオキサイド、t−ブチルクミルパーオキサイド、ジクミルパーオキサイド、t−ブチルパーオキシアセテート、t−ブチルパーオキシベンゾエート等の有機過酸化物が挙げられる。
また、重合体[A]の分子量分布(Mw/Mn)は、良好なパターンを形成するためには、1.1〜5.0の範囲が好ましく、1.1〜4.0の範囲が特に好ましい。
分子量の調整は、溶媒量、開始剤量、重合温度を調整することにより、可能であるが、オクチルメルカプタン、ノニルメルカプタン、デシルメルカプタン、ドデシルメルカプタン等のアルキルメルカプタン類に代表される連鎖移動剤を使用することにより行うことも出来る。
これらのキノンジアジド基含有化合物[B]は、単独でまたは2種以上を組み合わせて用いることができる。
組成物溶液の塗布方法としては、特に限定されず、例えばスプレー法、ロールコート法、回転塗布法、バー塗布法等の適宜の方法が挙げられる。乾燥条件は、各成分の種類、使用割合等によっても異なるが、例えば60〜110℃で30秒間〜15分間程度とするのが適当である。
形成される塗膜の膜厚は、層間絶縁膜を形成する場合には、例えば3〜6μmの範囲が、マイクロレンズを形成する場合には、例えば0.5〜3μmの範囲が好ましい。
現像処理に用いられる現像液としては、例えば水酸化ナトリウム、水酸化カリウム、ケイ酸ナトリウム、メタケイ酸ナトリウム、アンモニア、エチルアミン、n−プロピルアミン、ジエチルアミン、ジエチルアミノエタノール、ジ−n−プロピルアミン、トリエチルアミン、メチルジエチルアミン、ジメチルエタノールアミン、トリエタノールアミン、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、ピロール、ピペリジン、1,8−ジアザビシクロ〔5,4,0〕−ウンデセ−7−エン、1,5−ジアザビシクロ〔4,3,0〕−ノネ−5−エン等のアルカリ(塩基性化合物)の水溶液を用いることができ、また、上記のアルカリの水溶液にメタノール、エタノール等の水溶性有機溶媒や界面活性剤を適当量添加した水溶液、または本発明の組成物を溶解する各種有機溶媒を現像液として使用することができる。
さらに、現像方法としては、液盛り法、ディッピング法、揺動浸漬法、シャワー法等の適宜の方法を利用することができる。このときの現像時間は、組成物の組成によって異なるが、例えば30〜120秒間とすることができる。
なお、質量平均分子量(Mw)及び分子量分布(Mw/Mn)は、次の方法により測定した。
[質量平均分子量(Mw)及び分子量分布(Mw/Mn)の測定]
ゲル・パーミッション・クロマトグラフィー(GPC)を用いて、下記の条件にて測定し、ポリスチレン換算で算出した。
カラム:ショーデックス KF−801+KF-802+KF−802+KF−803
カラム温度:40℃
展開溶媒:テトラヒドロフラン
検出器:示差屈折計(ショーデックス RI−101)
流速:1mL/min
合成例1
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート100質量部、メチルエチルケトン300質量部、2,2'−アゾビスイソブチロニトリル8質量部、ドデシルメルカプタン4質量部を仕込み、窒素置換した後、攪拌しながら液温を還流温度まで上昇させ、還流温度で8時間反応した。ゲルパーミッションクロマトグラフィーによりモノマーの消失を確認し、プロピレングリコールモノメチルエーテルアセテート500質量部を仕込んだ。メチルエチルケトンを蒸留で除きながら液温を100℃に昇温して、更に100℃減圧下でメチルエチルケトンを蒸留により取り除き、固形分濃度を30質量%に調整し、下記の化学式で表される重合体[A−1]を含む重合体溶液を得た。
重合体[A−1]のポリスチレン換算質量平均分子量(Mw)は5,600、分子量分布(Mw/Mn)は3.2であった。
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート72.0質量部、スチレン28.0質量部、メチルエチルケトン500質量部、2,2'−アゾビスイソブチロニトリル8質量部を仕込み、合成例1と同様に反応を行い、下記の化学式で表される共重合体[A−2]を含む重合体溶液を得た。
共重合体[A−2]のポリスチレン換算質量平均分子量(Mw)は5,400、分子量分布(Mw/Mn)は3.1であった。
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート72.8質量部、メタクリル酸メチル27.2質量部、メチルエチルケトン500質量部、2,2'−アゾビスイソブチロニトリル8質量部を仕込み、合成例1と同様に反応を行い、下記の化学式で表される共重合体[A−3]を含む重合体溶液を得た。
共重合体[A−3]のポリスチレン換算質量平均分子量(Mw)は9,600、分子量分布(Mw/Mn)は3.3であった。
[感光性の樹脂組成物の調製]
合成例1で得られた重合体[A−1]を含む重合体溶液(30質量%濃度)100質量部、1−[1−(4−ヒドロキシフェニル)イソプロピル]−4−[1,1−ビス(4−ヒドロキシフェニル)エチル]ベンゼン−1,2−ナフトキノンジアジド−5−スルホン酸エステル6.25質量部、メチル化メラミン樹脂(三和ケミカル社製:ニカラックMW−30)2.10質量部、プロピレングリコールモノメチルエーテルアセテート80質量部を混合溶解し、0.2μmのメンブランフィルターで濾過を行い、感光性の樹脂組成物の溶液(S−1)を調製した。
[感放射線性樹脂組成物の調製]
合成例1で得られた重合体[A−1]を含む重合体溶液100質量部を、合成例2で得られた重合体[A−2]を含む重合体溶液(30質量%濃度)100質量部に代えた以外は実施例1と全く同様に行い、感光性の樹脂組成物の溶液(S−2)を調製した。
[感放射線性樹脂組成物の調製]
合成例1で得られた重合体[A−1]を含む重合体溶液100質量部を、合成例3で得られた重合体[A−3]を含む重合体溶液(30質量%濃度)100質量部に代えた以外は実施例1と全く同様に行い、感光性の樹脂組成物の溶液(S−3)を調製した。
[感放射線性樹脂組成物の調製]
合成例1で得られた重合体[A−1]を含む重合体溶液100質量部を、ヒドロキシスチレンとスチレンとのモル比6:4の共重合体を含む重合体溶液(30質量%濃度)100質量部に代えた以外は実施例1と全く同様に行い、感光性の樹脂組成物の溶液(S−4)を調製した。
実施例1〜3及び比較例1で得られた感光性の樹脂組成物の溶液(S−1)〜(S−4)についての特性の評価を、下記の方法で行い、その結果を第1表に記載した。
感光性の樹脂組成物の溶液をガラス基板上に、膜厚3μmとなるように塗布し、ホットプレート上で、110℃で90秒間乾燥した。何れの溶液も塗膜は透明であり、厚さ均一な塗膜が得られ、塗布性は良好であった。(評価:○)
上記〈塗布性〉の評価における、乾燥した塗膜にポジパターンマスクを介して超高圧水銀灯で露光し、2.38%テトラメチルアンモニウムヒドロキシドの水溶液にて10秒間浸漬して現像し、純水でリンスを行った。何れの塗膜も格子状の凹凸パターンが転写され、現像性は良好であった。(評価:○)
上記〈現像性〉の評価における、現像した塗膜にポジパターンマスクを介さずに全面露光し未反応の感光剤を反応させた。次いで、ホットプレート上で150℃、5分間加熱することで、何れの塗膜も格子状の凹凸パターンが流動し、丸みを帯びた集光性に優れた形状となった。(評価:○)
上記〈塗布性〉の評価における、乾燥した塗膜にポジパターンマスクを介さずに全面露光し、次いで、200℃、30分間での加熱硬化をさせた後、再び230℃で2時間、更に250℃で1時間加熱処理し、膜厚測定を行った。200℃、30分間加熱硬化後の膜厚に対して、再加熱後の膜厚変化を膜厚減少率で算出した。再加熱後の膜厚減少率が20%未満の場合を○、20%以上の場合を×とした。
上記〈塗布性〉の評価における、乾燥した塗膜にポジパターンマスクを介さずに全面露光し、200℃、30分間オーブンで加熱硬化させた。得られた硬化塗膜付きのガラス基板について、分光光度計を使用して波長400〜800nmの最低透過率を、ガラス基板をブランクとして測定した。
上記〈透明性〉の評価における、硬化塗膜付きのガラス基板を、再び230℃で2時間、更に250℃で1時間加熱処理し、波長400〜800nmの最低透過率を、ガラス基板をブランクとして測定した。
Claims (6)
- ヒドロキシフェニル(メタ)アクリレートを重合成分として含む重合体(ただし、重合成分が、(x1)不飽和カルボン酸及び/又は不飽和カルボン酸無水物、(x2)エポキシ基含有不飽和化合物、(x3)下記式で表される不飽和化合物、並びに、(x4)前記(x1)、(x2)及び(x3)以外のオレフィン系不飽和化合物、である共重合体を除く)[A]、キノンジアジド基含有化合物[B]及び熱硬化性樹脂[C]を含有することを特徴とする感光性の樹脂組成物。
- [A]がヒドロキシフェニル(メタ)アクリレートとスチレン又はメタクリル酸メチルとの共重合体である請求項1に記載の感光性の樹脂組成物。
- [C]が含窒素化合物である請求項1又は2に記載の感光性の樹脂組成物。
- [A]100質量部に対し、[B]10〜30質量部及び[C]1〜20質量部を含有する請求項1〜3のいずれかに記載の感光性の樹脂組成物。
- マイクロレンズ形成用である請求項1〜4のいずれかに記載の感光性の樹脂組成物。
- 層間絶縁膜形成用である請求項1〜4のいずれかに記載の感光性の樹脂組成物。
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JPH08259627A (ja) * | 1995-03-04 | 1996-10-08 | Hoechst Ag | ポリマーおよびそれから調製した感光性混合物 |
JPH10293398A (ja) * | 1997-03-24 | 1998-11-04 | Agfa Gevaert Ag | 放射線感応性混合物およびそこから製造したオフセット印刷板用の記録材料 |
JP2005049640A (ja) * | 2003-07-29 | 2005-02-24 | Fuji Photo Film Co Ltd | 樹脂組成物及び平版印刷版原版 |
JP2005049691A (ja) * | 2003-07-30 | 2005-02-24 | Jsr Corp | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 |
JP2006308612A (ja) * | 2005-04-26 | 2006-11-09 | Jsr Corp | 感放射線性樹脂組成物、それから形成された突起およびスペーサー、ならびにそれらを具備する液晶表示素子 |
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