JP4696710B2 - 蒸着成膜装置および蒸着源 - Google Patents
蒸着成膜装置および蒸着源 Download PDFInfo
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- JP4696710B2 JP4696710B2 JP2005174526A JP2005174526A JP4696710B2 JP 4696710 B2 JP4696710 B2 JP 4696710B2 JP 2005174526 A JP2005174526 A JP 2005174526A JP 2005174526 A JP2005174526 A JP 2005174526A JP 4696710 B2 JP4696710 B2 JP 4696710B2
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- Prior art keywords
- vapor deposition
- crucible
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- organic
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- 238000007740 vapor deposition Methods 0.000 title claims description 107
- 239000000758 substrate Substances 0.000 claims description 33
- 239000000463 material Substances 0.000 claims description 32
- 238000010438 heat treatment Methods 0.000 claims description 18
- 230000008021 deposition Effects 0.000 claims description 17
- 238000001704 evaporation Methods 0.000 claims description 12
- 230000008020 evaporation Effects 0.000 claims description 12
- 239000010408 film Substances 0.000 description 71
- 239000011521 glass Substances 0.000 description 27
- 239000012044 organic layer Substances 0.000 description 19
- 239000011368 organic material Substances 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000126 substance Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
本発明による蒸着源は、天面に複数の開口がライン状に配列されている外箱と、蒸着物質を収容して当該外箱内に収納されるルツボと、当該外箱を加熱する熱源とを備え、ルツボには、外箱の床面との間に間隔を設けるための脚部が設けられ、脚部は、複数の開口の配列方向における両端側に設けられているものである。
Claims (4)
- 天面に複数の開口がライン状に配列されている外箱と、当該外箱内に収納されるルツボと、当該外箱を加熱する熱源とを備えた蒸着源を有し、
前記ルツボには、前記外箱の床面との間に間隔を設けるための脚部が設けられ、
前記脚部は、前記複数の開口の配列方向における両端側に設けられている
蒸着成膜装置。 - 成膜対象となる基板を、前記蒸着源の上方に対向配置した状態で前記開口の配列方向と直交する方向に相対的に移動させて当該基板上に蒸着膜が成膜されるように構成された
請求項1記載の蒸着成膜装置。 - 前記ルツボに設けられた脚部は、前記開口が配列されている領域よりも外側に位置する
請求項1または2記載の蒸着成膜装置。 - 天面に複数の開口がライン状に配列されている外箱と、蒸着物質を収容して当該外箱内に収納されるルツボと、当該外箱を加熱する熱源とを備え、
前記ルツボには、前記外箱の床面との間に間隔を設けるための脚部が設けられ、
前記脚部は、前記複数の開口の配列方向における両端側に設けられている
蒸着源。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005174526A JP4696710B2 (ja) | 2005-06-15 | 2005-06-15 | 蒸着成膜装置および蒸着源 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005174526A JP4696710B2 (ja) | 2005-06-15 | 2005-06-15 | 蒸着成膜装置および蒸着源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006348337A JP2006348337A (ja) | 2006-12-28 |
JP4696710B2 true JP4696710B2 (ja) | 2011-06-08 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2005174526A Expired - Fee Related JP4696710B2 (ja) | 2005-06-15 | 2005-06-15 | 蒸着成膜装置および蒸着源 |
Country Status (1)
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JP (1) | JP4696710B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150044961A (ko) | 2012-08-29 | 2015-04-27 | 캐논 톡키 가부시키가이샤 | 증발원 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4468474B1 (ja) * | 2008-12-24 | 2010-05-26 | 三菱重工業株式会社 | 真空蒸着装置及び温度調整方法 |
EP2325348B1 (en) * | 2009-11-20 | 2012-10-24 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Device and method for thermal evaporation of silicon |
WO2014174803A1 (ja) * | 2013-04-22 | 2014-10-30 | パナソニック株式会社 | El表示装置の製造方法 |
CN106062240B (zh) * | 2014-03-11 | 2018-09-28 | 株式会社日本有机雷特显示器 | 蒸镀装置以及使用了蒸镀装置的蒸镀方法、以及器件的制造方法 |
CN104018123B (zh) * | 2014-06-16 | 2016-05-11 | 深圳市华星光电技术有限公司 | 侦测和防止高温金属材料泄漏的加热装置 |
JP7223632B2 (ja) * | 2019-05-21 | 2023-02-16 | 株式会社アルバック | 真空蒸着装置用の蒸着源 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58197270A (ja) * | 1982-05-12 | 1983-11-16 | Mitsubishi Electric Corp | 蒸発源るつぼ |
JP2003513169A (ja) * | 1999-10-22 | 2003-04-08 | カート・ジェイ・レスカー・カンパニー | 真空で基板を被覆するための方法及び装置 |
JP2004095275A (ja) * | 2002-08-30 | 2004-03-25 | Sony Corp | 有機電界発光素子の製造装置 |
-
2005
- 2005-06-15 JP JP2005174526A patent/JP4696710B2/ja not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58197270A (ja) * | 1982-05-12 | 1983-11-16 | Mitsubishi Electric Corp | 蒸発源るつぼ |
JP2003513169A (ja) * | 1999-10-22 | 2003-04-08 | カート・ジェイ・レスカー・カンパニー | 真空で基板を被覆するための方法及び装置 |
JP2004095275A (ja) * | 2002-08-30 | 2004-03-25 | Sony Corp | 有機電界発光素子の製造装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150044961A (ko) | 2012-08-29 | 2015-04-27 | 캐논 톡키 가부시키가이샤 | 증발원 |
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JP2006348337A (ja) | 2006-12-28 |
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