JP4680915B2 - 過フッ素化多官能性アニオンを有する光酸発生剤 - Google Patents
過フッ素化多官能性アニオンを有する光酸発生剤 Download PDFInfo
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- JP4680915B2 JP4680915B2 JP2006532863A JP2006532863A JP4680915B2 JP 4680915 B2 JP4680915 B2 JP 4680915B2 JP 2006532863 A JP2006532863 A JP 2006532863A JP 2006532863 A JP2006532863 A JP 2006532863A JP 4680915 B2 JP4680915 B2 JP 4680915B2
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- Prior art keywords
- photoacid generator
- acid
- pag
- monomers
- sulfonium
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
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Description
−O3S−Rf−Z (I)
(式中、
Rfが、場合により鎖中に(以下「カテナリー(catenary)の」とも言う)SまたはNを含有する、ペルフッ素化(以下「過フッ素化」とも言う)二価アルキレン部分、シクロアルキレン部分またはそれらの組合せであり、
Zが−SO3 -または−CO2 -である)
のアニオンとを有するイオン性光酸発生剤が提供される。
A−O3S−Rf−SO3−B(II)
(式中、
Rfが、場合によりカテナリーのSまたはNを含有する、過フッ素化二価アルキレン部分、シクロアルキレン部分またはそれらの組合せであり、
Aが、化学線に露光した時に遊離過フッ素化スルホン酸部分を生じる、共有結合した有機基であり、
BがAまたは有機オニウムカチオンである)
の光酸発生剤を提供する。
a)(本明細書に記載された)PAGと、
b)レジストポリマーと、
c)場合によりコーティング溶剤と、を含むフォトレジストコーティング組成物を含む。
「多反応性」は、単一モノマーに共有結合した2種の異なった反応性官能基の2個以上の存在を意味する。
用語「酸触媒(acid catalyst)」または「酸触媒による(acid catalyzed)」は、ブレンステッド酸種またはルイス酸種による触媒作用を意味する。
用語「分子量」は、特に記載しない限り、数平均分子量(Mn)を意味する。
-O3S−Rf−Z(I)
式中、Rfが、場合によりカテナリーのSまたはNを含有する、過フッ素化二価アルキレン部分、シクロアルキレン部分またはそれらの組合せであり、
Zが−SO3 -または−CO2 -である。イオン性PAGの熱安定性が重要であるかまたは最大酸性度が望ましい用途において、式(I)の基Zは好ましくはSO3 -である。
A−O3S−Rf−SO3−B(II)
(式中、
Rfが、式(I)について記載したように、場合によりカテナリーのSまたはNを含有する、過フッ素化二価アルキレン部分、シクロアルキレン部分またはそれらの組合せであり、
Aが、化学線に露光した時に遊離過フッ素化スルホン酸部分を生じる、共有結合した有機基であり、Bが、本明細書に記載したように、Aまたは有機オニウムカチオンである)
の光酸発生剤を提供する。
(1)カチオン重合性モノマー、エチレン性不飽和フリーラジカル重合性モノマー、酸触媒による逐次重合によって重合可能な多官能性または多反応性モノマー、これらの重合機構の任意の組合せによって重合可能な多官能性または多反応性モノマー、またはそれらの混合物の少なくとも1つと、
(2)本発明のPAGと、を含む重合性コーティング組成物を提供する。
(a)カチオン重合性モノマー、エチレン性不飽和フリーラジカル重合性モノマー、または酸触媒による逐次重合によって重合可能な多官能性または多反応性モノマー、またはこれらの重合機構の任意の組合せによって重合可能な多官能性または多反応性モノマー、およびそれらの混合物の少なくとも1つを含むモノマー混合物と、本発明のPAGの少なくとも1つを含む硬化剤の、前記モノマー混合物に対する触媒有効量(および前述の成分の混合の順序の全ての順列)とを提供し、それによって重合性組成物を形成する工程と、
(b)十分な量の化学線によって混合組成物を重合させる工程と、を含む重合方法を提供する。
(a)基板を提供する工程と、
(b)上述のような、本発明のエネルギー重合性組成物を前記基板の少なくとも1つの表面の上に、バー、ナイフ、リバースロール、刻み付きロール、カーテン、またはスピンコーティングなどの本技術分野に公知の方法によって、または浸漬、噴霧、ブラッシング等によって、コーティング溶剤を用いてまたは用いずに、コーティングする工程と、
(c)エネルギーを(必要に応じて、溶剤の蒸発後に)コーティングに、必要に応じて、前記物品に適用してコーティングの重合を起こさせる工程と、を含む、本発明の硬化組成物を含有するコーティングされた物品の作製方法を提供する。
NMR
1Hについて400MHzおよび19Fについて376MHzにおいて運転するバリアン・ユニティ(Varian UNITY)プラス400FT−NMR分光計を用いて1Hおよび19FNMRスペクトルが得られた。p−ビス(トリフルオロメチル)ベンゼンまたは2,2,2−トリフルオロエタノールのどちらかをPAG試料のNMR定量分析において交叉積分の基準として使用した。
白金オープンパン内でパーキン・エルマー・インストルメンツ(Perkin−Elmer Instruments)TGAモデル7でTGAを行なった。熱分解の開始点Tdを光酸発生剤の熱分解温度として取り、毎分10℃の温度傾斜を用いて窒素雰囲気下で確認した。重量%対温度の曲線において基線の低温部分に対する接線と第1の変曲点との交点によって開始温度を求める。
純試料で標準クリンプアルミニウムパンを用いてパーキン・エルマー・インストルメンツDSCモデル7でDSCを行なった。光酸発生剤の融点m.p.を毎分20℃の温度傾斜を用いて窒素雰囲気下でDSCによって確認した。最高温度吸熱のピーク最大が融点であるとされた。
機械的撹拌機、温度計、冷却器および添加漏斗を備えた500mLの3首フラスコにLiOH・H2O(53.091g)、および脱イオン水(275mL)を入れ、60℃に加熱した。ヘキサフルオロ−1,3−プロパンジスルホニルフルオリド(80.00g)を、撹拌しながら1時間にわたってゆっくりと添加し、得られた撹拌混合物を60℃に一晩保持した。次に混合物を室温に冷却し、1.0Lのエルレンマイヤーフラスコに移し、撹拌しながら過剰なドライアイスで処理し、未反応LiOHをLi2CO3に変換した。セライト(Celite)(登録商標)を得られたスラリーに添加し、次いでそれを濾過によって焼結ガラスフリットを通して除去した。
米国特許第4,423,197、実施例1に記載されたて手順によって前駆物質2を調製したが、ただし、FO2S(CF2)3SO2Fを等モル量のFO2S(CF2)4SO2Fと取り替えた。376MHzにおいての19FNMR分光分析法による特性決定は、それがKO3S(CF2)4SO3K(99.31%)、KF(0.53%)、およびKO3SCF2CF2CF(CF3)SO3K(0.043%)からなることを示した。
添加漏斗、磁気撹拌バーおよび還流冷却器を備えた500mLのフラスコに、イソプロパノール(200mL)およびCF3N(CF2CF2SO2F)2(11.4g、メチルアミノビス−エチルスルホニルフルオリドの電気化学的フッ素化によって調製されたが、それは、クルタク(Krutak)ら著、J.Org.Chem.,44(2):3847〜58(1979年)に記載されているようにメチルアミンをビニルスルホニルフルオリドに2回添加して調製された)を入れた。得られた2相混合物に、2つのアリコートでLiOH(180mL、1Maq)が添加された。次いで、得られた混合物を室温において一晩、撹拌し、その後、それを減圧下で乾燥状態に蒸発させた。残りの白色固体をジエチルエーテル(500mL)によって、その後、テトラヒドロフラン(300mL)によって抽出した。次に、混合抽出物を減圧下で蒸発させ、CF3N(CF2CF2SO3Li)2(11.5g)(1Hおよび19FNMRによって確認)に相応する白色固体を生じた。
500mLのフラスコに、FSO2(CF2)3COF(188.5g、粗原料)およびメタノール(200mL)を入れ、温度を0〜25℃に保持した。水(250mL)を添加した後、下方の相を分離し、3回、脱イオン水(各々、100mL)で洗浄し、その後、無水シリカゲルで乾燥させた。濾過した後、中間体、FSO2(CF2)3COOCH3を分留によって精製した(140〜145℃、>99.5%のglc純度)。次に、水に溶かした過剰なKOHで処理することによってFSO2(CF2)3COOCH3をKO3S(CF2)3COOKに加水分解した。
1.0Lエルレンマイヤーフラスコに、前駆物質1(10.000g)、(p−(CH3)3CC6H4)2I+-OCOCH3(25.385g)、脱イオン水(300mL)および塩化メチレン:メチル−t−ブチルエーテル(50:50v/v混合物300mL)を入れた。内容物を室温において約1時間、撹拌し、次いで1.0Lの分液漏斗に移し、激しく振った。有機相を単離し、新しい脱イオン水で4回(各々、300mL)洗浄し、1時間、撹拌しながらシリカゲルで乾燥させた。得られた溶液を0.2ミクロンのテフセプ(Tefsep)(登録商標)フィルターを通して濾過してシリカゲルを除去し、濾液を50℃および約20トールにおいて回転式蒸発器で乾燥状態に蒸発させた。残りの残留物をエチルアセテート(50mL)に溶解し、次いで、撹拌しながらヘキサン(300mL)を徐々に添加して沈殿させた。白色の結晶性沈殿物を濾過し、ヘキサン:エチルアセテート(7:1混合物)で洗浄し、吸引によって部分的に乾燥させた。残留溶剤を50℃において一晩、10ミリトールで真空乾燥させることによって除去した。白色粉末(27.1g、88.1%の収量、193℃m.p.)が単離された。
PAG−2を前駆物質2(7.500g)および(p−(CH3)3CC6H4)2I+-OCOCH3(14.073g)を用いてPAG−1について記載された手順によって調製した。未精製材料を再結晶させるために、それをエチルアセテート(75mL)と塩化メチレン(90mL)との混合物中に溶解し、ヘキサン(360mL)を徐々に添加した。真空乾燥させた後、白色粉末が単離された(13.3g、74.6%の収量、m.p.178℃)。メタノール−d4での定量的1Hおよび19FNMR分光分析法は、生成物が99.5%より大きい高純度であることを示した。単離された材料は、事実上100%の線状(−CF2−)4異性体であることが確認されたが、一官能性アニオンn−C4F9SO3−の微量(0.068重量%)も観察された。ICPおよびICP−MSによる微量金属分析は、最終生成物中のKイオンレベルが検出限界より低い(<720ppb)ことを明らかにした。(走査された22の金属の)全金属レベルは16ppmより少なかった。熱重量分析(TGA)によって窒素下で確認された熱分解の開始は237℃であった。融点をDSCによって確認すると178℃であった。生成物は、4重量%超までPGMEAに可溶性であった。
500mLのエルレンマイヤーフラスコに、前駆物質3(5.000g)、(C6H5)3S+Br-(7.135g)、脱イオン水(150mL)および塩化メチレン(150ml)を入れた。得られた混合物を室温において約1時間、撹拌し、次いで500mL分液漏斗に移し、激しく振った。有機相を単離し、新しい脱イオン水で4回(各々、150mL)洗浄し、次いで撹拌しながらシリカゲルで約1時間、乾燥させた。乾燥された溶液を濾過し、得られた濾液を50℃および約20トールにおいて回転式蒸発器で乾燥状態に蒸発させた。残りの油質残留物をエチルアセテートと塩化メチレンとの混合物(それぞれ、25mLおよび50mL)中に溶解し、次いで、ヘキサン(175mL)を徐々に添加することによって油として沈殿させた。油相を単離し、次いでヘキサンで2回研和し(各々、250mL)、それによって生成物を結晶化させた。
この実施例は、二官能性フルオロ有機スルホネートアニオンを含有する本発明のPAGの相対的なカチオン硬化反応性を、同じカチオンと一官能性ペルフルオロアルカンスルホネートアニオンとを有する関連PAGと定量的に比較するようにされた光DSC/DSC実験について記載する。相対的な反応性は、2つの異なったタイプのエポキシおよび1つのビニルエーテルを含有する、3つの異なったカチオン重合性モノマー系において測定された。
0.1%(w/w)イソプロピルチオキサントン(ITX)を有する、3つのカチオン硬化性モノマーの原液を表3に示すように調製した。エポン(Epon)828はシェル(Shell)製の二官能性グリシジルエーテルエポキシであり、ERL−4221はユニオン・カーバイド(Union Carbide)製の二官能性脂環式エポキシであり、ヴェックス(VEX)5015は、アライド・シグナル(Allied Signal)製の三官能性ビニルエーテルである。室内照明に対するこれらの組成物の感度が低いので、実験室用照明は点けたがボンネットライトを消して全ての試料の調製を行なった。全てのPAGを、原料モノマー/増感剤溶液中1.0重量%において調合した。小さなアルミニウムパンに、0.02gのPAGと、モノマー中へのPAGの溶解を促進するために用いられた0.04gのプロピレンカーボネートとを秤量した。前記パンを、100℃に設定された熱板上で簡単に加熱してPAGを溶解し、次いで2.0gの原料モノマー/増感剤溶液を添加した。前記溶液を、100℃に設定された熱板上で再び簡単に加熱して成分を完全に混合させ、次いで溶液を使用前に室温に冷却させた。
この実施例は、二官能性ペルフルオロ有機二スルホン酸、HO3S(CF2)4SO3Hを真空蒸留する試みが不成功となることを記載し、C8F17SO3Hのような、さらにより高分子量の一官能性ペルフルオロアルカンスルホン酸と比べて、この二酸の非常に低い揮発性を示す。二カリウム塩、KO3S(CF2)4SO3K(40.0g)および100%のH2SO4(241g)を、加熱用マントル、磁気撹拌バー、絶縁短行程蒸留ヘッドおよび100mLの受けフラスコを備えた250mLの3首フラスコを含む真空蒸留装置に入れた。ポット温度およびヘッド温度を、J−タイプ熱電対プローブで連続的にモニタした。8.0トールの開始圧力において、ポット温度を徐々に171℃まで上げたが、沸騰または蒸留は観察されなかった。圧力を3.6トールまで下げ、ポット温度を178℃まで上げたが、まだ沸騰または蒸留はなかった。圧力をさらに下げ、さらに熱をポットに加えて蒸留を促進した。蒸留物は最終的に、196℃のポット温度および1.75トールの圧力において集まり始めた。合計73.3gの蒸留物が、蒸留が終了するまで184〜186℃(ヘッド温度)で集められた。これは理論HO3S(CF2)4SO3H収量の222%を示すので、蒸留物はおそらく主に硫酸であると推測された。蒸留物中にかなりのH2SO4の存在が、BaCl2で蒸留物の水溶液を処理した時にBaSO4の沈殿によって確認された。
この研究の目的は、雄のSDラットで1回の経口投薬後のKO3SCF2CF2CF2CF2SO3KおよびLiO3SCF2CF2CF2COOLiの経口吸収、分布の可能性、および血清および肝臓除去率を評価することである。血清および肝臓中のフッ素化塩レベルおよび潜在代謝物の定量が、全有機フッ素分析によって行なわれた。
生後6〜8週および約150〜250gの体重の21匹の雄のSDラット(ハーラン(Harlan))が、0mg/kg(対照用)または30mg/kg体重(グループ1)のどちらかで経口補給によってプロピレングリコール(6mg/mlプロピレングリコール中の懸濁液)中で調製された試験化合物を1回投薬して処理された(指定された処理段階につき投薬グループ当たり3匹の動物)。投薬後0日、1日、4日、8日、および15日に剖検を行なった。それらの日の各々に全フッ素分析のために肝臓および血清試料が集められた。剖検のときに集められた全ての被検物は、−70℃に一時的に保管された。この研究のための完全なプロトコルは入手可能である(戦略トキシコロジープロトコル番号ST−88)。尿試料を集め、各過フッ素化アニオンの濃度を確認するために投薬後1日および4日(それぞれ、0〜4、4〜24および76〜100時間)に19F NMRによって分析した。
Claims (7)
- (a)スルホキソニウム、ヨードニウム、スルホニウム、セレノニウム、ピリジニウム、カルボニウムおよびホスホニウムから選択された有機オニウムカチオンと、
(b)式:
−O3S−Rf−Z
(式中、Rfが、場合により鎖中にSまたはNを含有する、ペルフッ素化二価アルキレン部分、シクロアルキレン部分またはそれらの組合せであり、Zが−SO3 −または−CO2 −である)
のアニオンを含む、イオン性光酸発生剤。 - 前記スルホニウムカチオンが、トリアリールスルホニウム、ジアルキルアリールスルホニウム、ジアリールアルキルスルホニウム、またはトリアルキルスルホニウムカチオンである、請求項1に記載のイオン性光酸発生剤。
- 式:
A−O3S−Rf−SO3−B (II)
(式中、Rfが、場合により鎖中にSまたはNを含有する、ペルフッ素化二価アルキレン部分、シクロアルキレン部分またはそれらの組合せであり、Aが、化学線に露光した時に遊離ペルフッ素化スルホン酸部分を生じる、共有結合した有機基であり、Bが、A、またはスルホキソニウム、ヨードニウム、スルホニウム、セレノニウム、ピリジニウム、カルボニウムおよびホスホニウムから選択された有機オニウムカチオンである)の化合物を含む、光酸発生剤。 - 前記化合物が、シアノ置換オキシムスルホネートエステル、N−ヒドロキシイミドスルホネートエステル、ニトロベンジルスルホネートエステルおよびフェニルスルホネートエステルからなる群から選択される、請求項3に記載の光酸発生剤。
- i)請求項1または2に記載のイオン性光酸発生剤、或いは請求項3または4に記載の光酸発生剤と、
ii)レジストポリマーと
を含む、フォトレジスト組成物。 - 前記レジストポリマーが、酸に暴露した時に開裂する酸不安定性官能基を含有するポジ型レジストポリマー、または架橋可能な官能基を有するネガ型レジストポリマーである、請求項5に記載のフォトレジスト組成物。
- 1)請求項1または2に記載のイオン性光酸発生剤、或いは請求項3または4に記載の光酸発生剤と、
2)カチオン重合性モノマー、エチレン性不飽和フリーラジカル重合性モノマー、または酸触媒による逐次重合によって重合可能な多官能性または多反応性モノマー、またはこれらの重合機構の任意の組合せによって重合可能な多官能性または多反応性モノマー、およびそれらの混合物の少なくとも1つを含む1つ以上のモノマーと
を含む、硬化性組成物。
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- 2004-05-07 JP JP2006532863A patent/JP4680915B2/ja not_active Expired - Fee Related
- 2004-05-07 CN CN200480014082XA patent/CN1802607B/zh not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
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JP2007507580A (ja) | 2007-03-29 |
WO2004107051A2 (en) | 2004-12-09 |
US20040234888A1 (en) | 2004-11-25 |
KR20060013672A (ko) | 2006-02-13 |
EP1625447B1 (en) | 2014-04-23 |
KR101070032B1 (ko) | 2011-10-04 |
EP1625447A2 (en) | 2006-02-15 |
CN1802607B (zh) | 2011-10-05 |
WO2004107051A3 (en) | 2006-03-09 |
US7122294B2 (en) | 2006-10-17 |
CN1802607A (zh) | 2006-07-12 |
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