JP4680501B2 - 共焦点ウェハ検査系 - Google Patents
共焦点ウェハ検査系 Download PDFInfo
- Publication number
- JP4680501B2 JP4680501B2 JP2003538682A JP2003538682A JP4680501B2 JP 4680501 B2 JP4680501 B2 JP 4680501B2 JP 2003538682 A JP2003538682 A JP 2003538682A JP 2003538682 A JP2003538682 A JP 2003538682A JP 4680501 B2 JP4680501 B2 JP 4680501B2
- Authority
- JP
- Japan
- Prior art keywords
- confocal
- wafer
- chromaticity
- height
- bump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0052—Optical details of the image generation
- G02B21/006—Optical details of the image generation focusing arrangements; selection of the plane to be imaged
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/026—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0028—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders specially adapted for specific applications, e.g. for endoscopes, ophthalmoscopes, attachments to conventional microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
- G01B2210/50—Using chromatic effects to achieve wavelength-dependent depth resolution
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- Ophthalmology & Optometry (AREA)
- Radiology & Medical Imaging (AREA)
- Surgery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
(a)検査用ウェハを置くための、2つの上下の自由度を有し、XY軸移動が可能なテーブルと、
(b)前記上下の自由度に沿って前記テーブルを移動させるための移動手段と、
(c)前記テーブルに対して垂直であり、前記被検査ウェハの表面上の点までの距離を測定するための、前記ウェハが前記テーブルと共に移動する間、表面高さの変化を認識することが出来る共焦点高さ測定系と、
(d)
(i)前記被検査ウェハのバンプマップを保持し、
(ii)前記移動手段を制御し、
(iii)前記共焦点高さ測定系の測定点が前記ウェハの各バンプと交差するように前記テーブルを移動させ、
(iv)各バンプの高さプロフィールを記憶し、
(v)前記高さプロフィールを比較し、所定の基準に従って各高さプロフィールを調べ、
(vi)結果を表示する、
ように機能するコンピュータと、
を含む共焦点高さ測定系ウェハ検査系が提供される。
(e)前記共焦点高さ測定系と一体化され、前記被検査ウェハ表面を観察するための顕微鏡と、
(f)前記観察された表面を撮影するための第1のカメラと、
を含む。
Claims (7)
- 共焦点色度ウェハ検査系であって、
(a)検査用ウェハを置くための、2つの上下の自由度を有し、XY軸移動が可能なテーブルと、
(b)前記上下の自由度に沿って前記テーブルを移動させるための移動手段と、
(c)前記テーブルに対して垂直であり、前記ウェハの表面上の点までの距離を測定するための、前記ウェハが前記テーブルと共に移動する間、表面高さの変化を認識することが出来る共焦点色度高さ測定系と、
(d)
(i)前記ウェハのバンプマップを保持し、
(ii)前記移動手段を制御し、
(iii)前記共焦点色度高さ測定系の測定点が前記ウェハの各バンプと交差するように前記テーブルを移動させ、
(iv)各バンプの高さプロフィールを記憶し、
(v)前記高さプロフィールを比較する、または所定の基準に従って各高さプロフィールを調べる、またはこの両方を行い、
(vi)結果出力を可能にする、
ように機能するコンピュータと、
(e)前記共焦点色度高さ測定系と一体化され、前記ウェハ表面を観察するための顕微鏡と、
(g)前記顕微鏡及び前記共焦点色度高さ測定系を昇降させるための昇降手段と、
を含み、
前記顕微鏡と前記共焦点色度高さ測定系とが同じ点に向けられていることを特徴とする共焦点色度ウェハ検査系。 - (f)前記観察された表面を撮影するための第1のカメラを更に含み、前記コンピュータは前記高さプロフィールを比較する請求項1に記載の共焦点色度ウェハ検査系。
- 前記コンピュータは、前記各バンプと複数回交差するバンプトラックを前記ウェハ表面に沿って設計する請求項1に記載の共焦点色度ウェハ検査系。
- 前記ウェハを走査するための第2のカメラを更に含み、前記走査の像または複数の像は前記コンピュータによってバンプを認識するために用いられ、前記コンピュータは前記認識されたバンプの位置を記憶し、バンプマップを作成して保持する請求項1に記載の共焦点色度ウェハ検査系。
- 前記第2のカメラはデジタルカメラである請求項4に記載の共焦点色度ウェハ検査系。
- 前記第2のカメラは線走査またはアレイカメラである請求項4に記載の共焦点色度ウェハ検査系。
- 前記昇降手段は前記第2のカメラを昇降させることが出来る請求項4に記載の共焦点色度ウェハ検査系。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL146174A IL146174A (en) | 2001-10-25 | 2001-10-25 | Confocal system for testing woofers |
PCT/IL2002/000841 WO2003036227A1 (en) | 2001-10-25 | 2002-10-21 | Confocal wafer-inspection system and method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005506710A JP2005506710A (ja) | 2005-03-03 |
JP2005506710A5 JP2005506710A5 (ja) | 2005-12-22 |
JP4680501B2 true JP4680501B2 (ja) | 2011-05-11 |
Family
ID=11075841
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003538682A Expired - Lifetime JP4680501B2 (ja) | 2001-10-25 | 2002-10-21 | 共焦点ウェハ検査系 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6934019B2 (ja) |
EP (1) | EP1440285A1 (ja) |
JP (1) | JP4680501B2 (ja) |
IL (1) | IL146174A (ja) |
WO (1) | WO2003036227A1 (ja) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6324298B1 (en) | 1998-07-15 | 2001-11-27 | August Technology Corp. | Automated wafer defect inspection system and a process of performing such inspection |
DE102004049541A1 (de) * | 2004-10-12 | 2006-04-20 | Precitec Optronik Gmbh | Meßsystem zur Vermessung von Oberflächen sowie Kalibrierverfahren hierfür |
US7477401B2 (en) * | 2004-11-24 | 2009-01-13 | Tamar Technology, Inc. | Trench measurement system employing a chromatic confocal height sensor and a microscope |
CN1300563C (zh) * | 2005-03-24 | 2007-02-14 | 华中科技大学 | 一种微型三维自扫描共焦显微镜 |
US7551272B2 (en) * | 2005-11-09 | 2009-06-23 | Aceris 3D Inspection Inc. | Method and an apparatus for simultaneous 2D and 3D optical inspection and acquisition of optical inspection data of an object |
JP2007225481A (ja) * | 2006-02-24 | 2007-09-06 | Hitachi High-Technologies Corp | ボールバンプウエハ検査装置 |
DE102006036504A1 (de) * | 2006-08-04 | 2008-02-07 | Vistec Semiconductor Systems Gmbh | Vorrichtung und Verfahren zur Messung des Höhenprofils eines strukturierten Substrats |
JP2008170366A (ja) | 2007-01-15 | 2008-07-24 | Disco Abrasive Syst Ltd | チャックテーブルに保持された被加工物の計測装置およびレーザー加工機 |
US7535560B2 (en) * | 2007-02-26 | 2009-05-19 | Aceris 3D Inspection Inc. | Method and system for the inspection of integrated circuit devices having leads |
DE202007014435U1 (de) | 2007-10-16 | 2009-03-05 | Gurny, Eric | Optischer Sensor für eine Messvorrichtung |
US7990522B2 (en) | 2007-11-14 | 2011-08-02 | Mitutoyo Corporation | Dynamic compensation of chromatic point sensor intensity profile data selection |
US7873488B2 (en) * | 2008-12-08 | 2011-01-18 | Mitutoyo Corporation | On-site calibration method and object for chromatic point sensors |
US8144968B2 (en) * | 2009-01-12 | 2012-03-27 | Aceris 3D Inspection Inc. | Method and apparatus for scanning substrates |
TWI490444B (zh) * | 2009-01-23 | 2015-07-01 | Univ Nat Taipei Technology | 線型多波長共焦顯微方法與系統 |
FR2942533B1 (fr) * | 2009-02-25 | 2011-06-24 | Altatech Semiconductor | Dispositif et procede d'inspection de plaquettes semi-conductrices |
US7876456B2 (en) * | 2009-05-11 | 2011-01-25 | Mitutoyo Corporation | Intensity compensation for interchangeable chromatic point sensor components |
US8928874B2 (en) | 2012-02-24 | 2015-01-06 | Mitutoyo Corporation | Method for identifying abnormal spectral profiles measured by a chromatic confocal range sensor |
US8860931B2 (en) | 2012-02-24 | 2014-10-14 | Mitutoyo Corporation | Chromatic range sensor including measurement reliability characterization |
PL3004820T3 (pl) * | 2013-05-27 | 2017-09-29 | Gasporox Ab | Układ i sposób określania stężenia gazu w opakowaniu |
US9772297B2 (en) | 2014-02-12 | 2017-09-26 | Kla-Tencor Corporation | Apparatus and methods for combined brightfield, darkfield, and photothermal inspection |
US9885671B2 (en) | 2014-06-09 | 2018-02-06 | Kla-Tencor Corporation | Miniaturized imaging apparatus for wafer edge |
US9645097B2 (en) | 2014-06-20 | 2017-05-09 | Kla-Tencor Corporation | In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning |
US9261351B1 (en) * | 2015-03-04 | 2016-02-16 | Mitutoyo Corporation | Chromatic range sensor including high sensitivity measurement mode |
EP3222965B1 (en) | 2016-03-25 | 2020-01-15 | Fogale Nanotech | Chromatic confocal device and method for 2d/3d inspection of an object such as a wafer with variable spatial resolution |
EP3222964B1 (en) | 2016-03-25 | 2020-01-15 | Fogale Nanotech | Chromatic confocal device and method for 2d/3d inspection of an object such as a wafer |
US10317344B2 (en) | 2016-09-07 | 2019-06-11 | Kla-Tencor Corporation | Speed enhancement of chromatic confocal metrology |
JP6919458B2 (ja) * | 2017-09-26 | 2021-08-18 | オムロン株式会社 | 変位計測装置、計測システム、および変位計測方法 |
CN112147622B (zh) * | 2020-09-02 | 2024-02-06 | Oppo广东移动通信有限公司 | 测距装置、测距方法、摄像头及电子设备 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH0540821A (ja) * | 1991-08-03 | 1993-02-19 | Omron Corp | 三次元計測装置 |
US5479252A (en) | 1993-06-17 | 1995-12-26 | Ultrapointe Corporation | Laser imaging system for inspection and analysis of sub-micron particles |
JPH07190753A (ja) * | 1993-12-27 | 1995-07-28 | Olympus Optical Co Ltd | 走査型プローブ顕微鏡 |
FR2716727B1 (fr) | 1994-02-25 | 1996-04-19 | Cohen Sabban Joseph | Dispositif de tomographie optique en champ coloré. |
WO1997002466A1 (de) | 1995-06-30 | 1997-01-23 | Siemens Aktiengesellschaft | Optischer abstandssensor |
FR2738343B1 (fr) | 1995-08-30 | 1997-10-24 | Cohen Sabban Joseph | Dispositif de microstratigraphie optique |
JPH09306977A (ja) * | 1996-05-14 | 1997-11-28 | Komatsu Ltd | ウエハ検査装置等におけるウエハの位置決め方法 |
ATE272224T1 (de) * | 1997-11-17 | 2004-08-15 | Max Planck Gesellschaft | Konfokales spektroskopiesystem und -verfahren |
JP3767161B2 (ja) * | 1998-04-02 | 2006-04-19 | オムロン株式会社 | 高さ測定装置および高さ測定方法および観測装置 |
US6167148A (en) | 1998-06-30 | 2000-12-26 | Ultrapointe Corporation | Method and system for inspecting the surface of a wafer |
JP3501672B2 (ja) * | 1999-04-02 | 2004-03-02 | 株式会社東京精密 | 表面画像投影装置及び方法 |
JP3544892B2 (ja) * | 1999-05-12 | 2004-07-21 | 株式会社東京精密 | 外観検査方法及び装置 |
JP3706504B2 (ja) * | 1999-06-14 | 2005-10-12 | 博明 土屋 | 高さ計測装置 |
WO2001020252A1 (en) * | 1999-09-16 | 2001-03-22 | On-Line Technologies, Inc. | Method and apparatus for performing optical measurements of layers and surface properties |
IL134008A0 (en) * | 2000-01-12 | 2001-04-30 | Inspectech Ltd | A method and system for measuring bump height |
JP2001194321A (ja) * | 2000-01-12 | 2001-07-19 | Tokyo Seimitsu Co Ltd | 半導体ウエハの検査装置 |
-
2001
- 2001-10-25 IL IL146174A patent/IL146174A/en active IP Right Grant
-
2002
- 2002-10-21 JP JP2003538682A patent/JP4680501B2/ja not_active Expired - Lifetime
- 2002-10-21 EP EP02777765A patent/EP1440285A1/en not_active Withdrawn
- 2002-10-21 WO PCT/IL2002/000841 patent/WO2003036227A1/en active Application Filing
-
2004
- 2004-04-07 US US10/820,367 patent/US6934019B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
IL146174A (en) | 2007-08-19 |
US20050030528A1 (en) | 2005-02-10 |
WO2003036227A1 (en) | 2003-05-01 |
EP1440285A1 (en) | 2004-07-28 |
US6934019B2 (en) | 2005-08-23 |
IL146174A0 (en) | 2002-07-25 |
JP2005506710A (ja) | 2005-03-03 |
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