JP4554694B2 - プラズマ処理装置 - Google Patents
プラズマ処理装置 Download PDFInfo
- Publication number
- JP4554694B2 JP4554694B2 JP2008080983A JP2008080983A JP4554694B2 JP 4554694 B2 JP4554694 B2 JP 4554694B2 JP 2008080983 A JP2008080983 A JP 2008080983A JP 2008080983 A JP2008080983 A JP 2008080983A JP 4554694 B2 JP4554694 B2 JP 4554694B2
- Authority
- JP
- Japan
- Prior art keywords
- antenna
- plasma
- container
- antenna elements
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Description
以上、本発明のプラズマ処理装置について詳細に説明したが、本発明は上記実施形態に限定されず、本発明の主旨を逸脱しない範囲において、種々の改良や変更をしてもよいのはもちろんである。
12 成膜容器
15 ガス供給部
17 排気部
19 供給管
21 供給孔
23 排気管
25 排気孔
26 アンテナ素子
28 アンテナアレイ
30 ヒータ
32 基板ステージ
34 高周波電力供給部
36 分配器
38 インピーダンス整合器
39 アンテナ本体
40 円筒部材
42 処理対象基板(基板)
47 ガス拡散室
48 成膜室
Claims (2)
- モノポールアンテナを用いて電磁波を放射することによりプラズマを生成するプラズマ処理装置であって、
反応ガスが供給される容器と、
前記容器内に配設されると共にそれぞれ導電体のモノポールアンテナ本体が誘電体で被覆され、かつ互いに平行に配列された棒状の複数のアンテナ素子と、
前記複数のアンテナ素子に高周波電力を供給して各アンテナ素子から電磁波を放射させることにより前記容器内にプラズマを生成させる高周波電力供給部と、
を備え、
隣接する2本のアンテナ素子が、互いに接触しない間隔であり、かつ互いの中心間の間隔r≦20mm、前記モノポールアンテナ本体の半径aと前記中心間の間隔rとの比率r/a≦6.7にすると共に、隣接するアンテナ素子間における前記高周波電力供給部からの高周波電力の給電方向が互いに逆向きとなるように前記複数のアンテナ素子を配列することにより前記隣接する2本のアンテナ素子間で放電を発生させることを特徴とするプラズマ処理装置。 - 前記複数のアンテナ素子は、前記容器内の上壁側に水平に配設されてアンテナアレイを構成し、
前記容器内の下壁側に水平に配設されると共に基板が載置される基板ステージと、
前記容器内の上壁と前記アンテナアレイとの間に水平に配設されると共に形成された複数の孔から前記容器内に前記反応ガスを供給するシャワーヘッドと
をさらに備え、前記容器内に生成されたプラズマを用いて前記基板上に膜を形成する請求項1に記載のプラズマ処理装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008080983A JP4554694B2 (ja) | 2008-03-26 | 2008-03-26 | プラズマ処理装置 |
PCT/JP2009/053572 WO2009119241A1 (ja) | 2008-03-26 | 2009-02-26 | プラズマ処理装置 |
TW98108447A TWI469695B (zh) | 2008-03-26 | 2009-03-16 | Plasma processing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008080983A JP4554694B2 (ja) | 2008-03-26 | 2008-03-26 | プラズマ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009238898A JP2009238898A (ja) | 2009-10-15 |
JP4554694B2 true JP4554694B2 (ja) | 2010-09-29 |
Family
ID=41113447
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008080983A Expired - Fee Related JP4554694B2 (ja) | 2008-03-26 | 2008-03-26 | プラズマ処理装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4554694B2 (ja) |
TW (1) | TWI469695B (ja) |
WO (1) | WO2009119241A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012176242A1 (ja) * | 2011-06-24 | 2012-12-27 | 日新電機株式会社 | プラズマ処理装置 |
US20140360670A1 (en) * | 2013-06-05 | 2014-12-11 | Tokyo Electron Limited | Processing system for non-ambipolar electron plasma (nep) treatment of a substrate with sheath potential |
JP6240042B2 (ja) * | 2014-08-05 | 2017-11-29 | 東芝メモリ株式会社 | 半導体製造装置および半導体装置の製造方法 |
JP7135529B2 (ja) * | 2018-07-19 | 2022-09-13 | 日新電機株式会社 | プラズマ処理装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001274101A (ja) * | 2000-03-27 | 2001-10-05 | Mitsubishi Heavy Ind Ltd | 棒状電極を有するプラズマ化学蒸着装置 |
JP2005149887A (ja) * | 2003-11-14 | 2005-06-09 | Mitsui Eng & Shipbuild Co Ltd | プラズマ発生装置用アンテナの整合方法及びプラズマ発生装置 |
JP2007273773A (ja) * | 2006-03-31 | 2007-10-18 | Mitsui Eng & Shipbuild Co Ltd | プラズマ処理装置およびプラズマ処理装置のクリーニング方法 |
-
2008
- 2008-03-26 JP JP2008080983A patent/JP4554694B2/ja not_active Expired - Fee Related
-
2009
- 2009-02-26 WO PCT/JP2009/053572 patent/WO2009119241A1/ja active Application Filing
- 2009-03-16 TW TW98108447A patent/TWI469695B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001274101A (ja) * | 2000-03-27 | 2001-10-05 | Mitsubishi Heavy Ind Ltd | 棒状電極を有するプラズマ化学蒸着装置 |
JP2005149887A (ja) * | 2003-11-14 | 2005-06-09 | Mitsui Eng & Shipbuild Co Ltd | プラズマ発生装置用アンテナの整合方法及びプラズマ発生装置 |
JP2007273773A (ja) * | 2006-03-31 | 2007-10-18 | Mitsui Eng & Shipbuild Co Ltd | プラズマ処理装置およびプラズマ処理装置のクリーニング方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2009119241A1 (ja) | 2009-10-01 |
TWI469695B (zh) | 2015-01-11 |
TW200948218A (en) | 2009-11-16 |
JP2009238898A (ja) | 2009-10-15 |
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