JP4323955B2 - 波面を測定するためのシステムおよび方法 - Google Patents
波面を測定するためのシステムおよび方法 Download PDFInfo
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- 238000003384 imaging method Methods 0.000 claims description 13
- 238000005259 measurement Methods 0.000 claims description 9
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
- A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
- A61B3/1015—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions for wavefront analysis
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
- A61B3/0016—Operational features thereof
- A61B3/0025—Operational features thereof characterised by electronic signal processing, e.g. eye models
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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Description
11、18 波面
12 システムまたは素子
20 レチクル
22 光センサまたは検出器
24 データ・プロセッサ
26 ソフトウェアが実装されたモジュール
28 出力装置
Claims (22)
- 電磁波面の形を決定するためのシステムであって、
分析する電磁波面の経路内に位置していて、格子を有する少なくとも1つのレチクルと、
前記レチクルを通過する前記電磁波面によって生成される回折パターンを検出するために、前記レチクルに対して所定の距離だけ離れた回折パターン自己画像形成面のところに位置する少なくとも1つの光検出器と、
前記光検出器から出力信号を受信し、それに基づいて前記電磁波面の形を計算する少なくとも1つのプロセッサとを備え、
前記プロセッサは、前記電磁波面の方向導関数を決定するステップを含む手順を実行するためのロジックを実行し、
前記方向導関数は、少なくとも2つの方向で決定され、
前記手順が、前記方向導関数を決定する前に前記光検出器のところでの前記電磁波面の回折パターンを空間画像領域から空間周波数領域に変換するステップをさらに含む
ことを特徴とするシステム。 - 前記レチクルは、格子間隔がpの格子を備えていて、
前記回折パターン自己画像形成面の位置が、前記電磁波面の波長および前記レチクルの格子間隔の関数である、請求項1に記載のシステム。 - 前記レチクルが、グリッド状のパターンを有する格子を備える、請求項1に記載のシステム。
- 前記空間周波数領域内の選択した部分が、前記方向導関数を決定するために使用される、請求項1に記載のシステム。
- 前記方向導関数が前記電磁波面の勾配を表す、請求項1に記載のシステム。
- 前記方向導関数が、前記電磁波面の収差を表す多項式の係数を入手するために前記プロセッサに使用される、請求項6に記載のシステム。
- 前記手順が、ノイズをフィルタリングするための計算による艶消しスクリーンを実施するステップをさらに含む、請求項1に記載のシステム。
- 少なくとも1つの光学素子を備える光学システム装置(人を除く)内の収差を測定するための方法であって、
前記光学素子が試験ビームにより照射されるように、前記試験ビームを前記光学システム装置の経路に沿って伝搬させるステップと、
前記光学システム装置から格子を有するレチクルを通して前記試験ビームが伝搬するように、前記光学システム装置に対する所定位置に前記レチクルを配置するステップと、
前記レチクルに対して所定の距離だけ離れた回折パターン自己画像形成面のところで前記レチクルの自己画像を検出するステップと、
前記レチクルの前記自己画像から少なくとも2つの方向で方向導関数を決定するステップと、
前記収差の測定値を出力するために前記方向導関数を使用するステップとを含み、
前記レチクルを通過する前記試験ビームによる前記自己画像の回折パターンを空間画像から空間周波数分布に変換するステップをさらに含む
ことを特徴とする方法。 - 前記方向導関数に基づいて、前記収差を示す多項式の係数を決定するステップをさらに含む、請求項9に記載の方法。
- 前記レチクルの自己画像を検出するために、前記経路内のある位置に光検出器を設置するステップを含む、請求項9に記載の方法。
- 計算による艶消しスクリーンをフィルタとして使用するステップをさらに含む、請求項9に記載の方法。
- コンピュータ・プログラム製品であって、
デジタル処理装置に電磁波面内の収差を決定するための方法ステップを実行させるために、その上に記憶している命令のプログラムを有するコンピュータ可読媒体を備え、該コンピュータ可読媒体が、
前記電磁波面が形成する画像の少なくとも一部を特定するステップと、
前記特定された前記画像の少なくとも一部の方向導関数を決定するステップと、
前記電磁波面の形を示す多項式の係数を入手するために、既知の前記多項式に前記方向導関数をあてはめるステップと、
少なくとも一部は前記係数に基づいて、前記電磁波面内の収差を表す電磁波面の特徴を供給するステップと、
前記電磁波面の周波数領域の表示を生成するステップとを含み、
前記方向導関数が2つの方向で決定され、
前記電磁波面の周波数領域の表示を生成するステップは、格子を有するレチクルを通過する前記電磁波面の回折パターンを空間画像領域から空間周波数領域に変換するステップをさらに含む
ことを特徴とするプログラム製品。 - 前記対象物からの電磁波面により前記対象物の特徴を表示するための装置であって、
前記電磁波面の経路内に位置していて、格子を有する少なくとも1つのレチクルと、
前記電磁波面が形成する前記レチクルの自己画像回折パターンを検出するために、前記レチクルに対して位置する少なくとも1つの光検出器と、
前記自己画像回折パターンを表す前記光検出器からの信号を受信し、それに関連する方向導関数を入手する少なくとも1つのプロセッサとを備え、該プロセッサが前記対象物の特徴を示す前記方向導関数を使用し、かつ2つの方向で前記方向導関数を決定し、
前記プロセッサが、前記電磁波面の形の各種方向の勾配を示す情報を、空間周波数領域に分布させるために、前記電磁波面の自己画像回折パターンを空間画像領域から空間周波数領域に変換する周波数変換を行い、空間周波数領域内の分布から前記電磁波面の前記方向導関数を導く
ことを特徴とする装置。 - 前記対象物が目である、請求項14に記載の装置。
- 前記レチクルの位置が、前記レチクルの前記電磁波面の波長および空間周波数に関連する、請求項14に記載の装置。
- 前記プロセッサが、前記電磁波面の収差を表す多項式の係数を入手するために、一組の既知の方向導関数と、前記プロセッサが決定した前記方向導関数とを使用して計算する、請求項14に記載の装置。
- 反射または内反射対象物システム装置(人を除く)内の収差を決定するための方法であって、
前記対象物システム装置からの光ビームを、格子を有するレチクルを通して通過させるステップであって、前記光ビームがタルボット面のところに近視野回折パターンを形成するステップと、
前記タルボット面のところに前記近視野回折パターンを画像形成するステップと、
前記光ビーム内の収差の測定値を出力するために、前記近視野回折パターンを使用して、少なくとも2つの方向で前記光ビームの電磁波面の方向導関数を決定するステップとを含み、
前記近視野回折パターンを、空間画像領域から空間周波数領域に変換するステップをさらに含む
ことを特徴とする方法。 - 前記方法が前記対象物システム装置の収差を決定するためのものである、請求項18に記載の方法。
- 前記空間周波数領域内の選択した部分だけが、前記方向導関数を決定するために使用される、請求項18に記載の方法。
- 前記近視野回折パターンを検出するために、前記タルボット面のところに光検出器を設置するステップを含む、請求項18に記載の方法。
- 前記収差を低減するために、前記光ビーム内の収差の前記測定値に基づいて、修正光学系を設計するステップをさらに含む、請求項18に記載の方法。
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US10/014,037 US6781681B2 (en) | 2001-12-10 | 2001-12-10 | System and method for wavefront measurement |
PCT/US2002/039526 WO2003050472A1 (en) | 2001-12-10 | 2002-12-09 | Systems and methods for wavefront measurement |
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JP2005513425A JP2005513425A (ja) | 2005-05-12 |
JP4323955B2 true JP4323955B2 (ja) | 2009-09-02 |
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US (1) | US6781681B2 (ja) |
EP (1) | EP1451523A4 (ja) |
JP (1) | JP4323955B2 (ja) |
AU (1) | AU2002362137B2 (ja) |
WO (1) | WO2003050472A1 (ja) |
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-
2001
- 2001-12-10 US US10/014,037 patent/US6781681B2/en not_active Expired - Lifetime
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2002
- 2002-12-09 AU AU2002362137A patent/AU2002362137B2/en not_active Ceased
- 2002-12-09 JP JP2003551478A patent/JP4323955B2/ja not_active Expired - Lifetime
- 2002-12-09 EP EP02797270A patent/EP1451523A4/en not_active Ceased
- 2002-12-09 WO PCT/US2002/039526 patent/WO2003050472A1/en active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US9107637B2 (en) | 2010-01-28 | 2015-08-18 | Canon Kabushiki Kaisha | X-ray imaging apparatus and wavefront measuring apparatus |
Also Published As
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US6781681B2 (en) | 2004-08-24 |
EP1451523A4 (en) | 2006-10-04 |
AU2002362137A1 (en) | 2003-06-23 |
WO2003050472A8 (en) | 2003-09-04 |
US20030231298A1 (en) | 2003-12-18 |
AU2002362137B2 (en) | 2008-11-20 |
EP1451523A1 (en) | 2004-09-01 |
JP2005513425A (ja) | 2005-05-12 |
WO2003050472A1 (en) | 2003-06-19 |
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