JP4282518B2 - 感光性絶縁ペースト組成物、およびそれを用いた感光性フィルム - Google Patents
感光性絶縁ペースト組成物、およびそれを用いた感光性フィルム Download PDFInfo
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- JP4282518B2 JP4282518B2 JP2004082416A JP2004082416A JP4282518B2 JP 4282518 B2 JP4282518 B2 JP 4282518B2 JP 2004082416 A JP2004082416 A JP 2004082416A JP 2004082416 A JP2004082416 A JP 2004082416A JP 4282518 B2 JP4282518 B2 JP 4282518B2
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- 229940072049 amyl acetate Drugs 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- FWXDJLWIMSYZNW-UHFFFAOYSA-M benzyl(dimethyl)sulfanium;hydroxide Chemical compound [OH-].C[S+](C)CC1=CC=CC=C1 FWXDJLWIMSYZNW-UHFFFAOYSA-M 0.000 description 1
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
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- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 210000001787 dendrite Anatomy 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- PCYQQSKDZQTOQG-NXEZZACHSA-N dibutyl (2r,3r)-2,3-dihydroxybutanedioate Chemical compound CCCCOC(=O)[C@H](O)[C@@H](O)C(=O)OCCCC PCYQQSKDZQTOQG-NXEZZACHSA-N 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- IHFXZTUFRVUOSG-UHFFFAOYSA-M diethyl(methyl)sulfanium;hydroxide Chemical compound [OH-].CC[S+](C)CC IHFXZTUFRVUOSG-UHFFFAOYSA-M 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- YGTOVECNNXAGIC-UHFFFAOYSA-N ethyl (1-phenyltetrazol-5-yl)sulfanylformate Chemical compound CCOC(=O)SC1=NN=NN1C1=CC=CC=C1 YGTOVECNNXAGIC-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- FKIRSCKRJJUCNI-UHFFFAOYSA-N ethyl 7-bromo-1h-indole-2-carboxylate Chemical compound C1=CC(Br)=C2NC(C(=O)OCC)=CC2=C1 FKIRSCKRJJUCNI-UHFFFAOYSA-N 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019326 ethyl hydroxyethyl cellulose Nutrition 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- UACSZOWTRIJIFU-UHFFFAOYSA-N hydroxymethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCO UACSZOWTRIJIFU-UHFFFAOYSA-N 0.000 description 1
- GJIDOLBZYSCZRX-UHFFFAOYSA-N hydroxymethyl prop-2-enoate Chemical compound OCOC(=O)C=C GJIDOLBZYSCZRX-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003903 lactic acid esters Chemical class 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- LXTZRIBXKVRLOA-UHFFFAOYSA-N padimate a Chemical compound CCCCCOC(=O)C1=CC=C(N(C)C)C=C1 LXTZRIBXKVRLOA-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- NQKRZUPZIGCOFV-UHFFFAOYSA-N s-(2-phenyltetrazol-5-yl) benzenecarbothioate Chemical compound C=1C=CC=CC=1C(=O)SC(=N1)N=NN1C1=CC=CC=C1 NQKRZUPZIGCOFV-UHFFFAOYSA-N 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- LPSWFOCTMJQJIS-UHFFFAOYSA-N sulfanium;hydroxide Chemical compound [OH-].[SH3+] LPSWFOCTMJQJIS-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000375 suspending agent Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Plasma & Fusion (AREA)
- Materials For Photolithography (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Polymerisation Methods In General (AREA)
Description
前記PDPは、対向配置された基板の表面に絶縁材料からなる隔壁が設けられ多数の表示セルに区画され、そのセル内に蛍光体が保持され、プラズマ放電による紫外線の作用で発光し各セルを表示単位とする装置である。このPDPの前記基板やセル内にはプラズマを発生させるための電極、抵抗体、誘電体等が設けられている。このPDPを高精密化するにはそれを構成する隔壁、電極、抵抗体、誘電体、蛍光体、カラーフィルター、ブラックマトリックス(以下、「隔壁等」という。)を高精密に作成する必要があり、そのために隔壁等を作成するためのパターンをより高精度に形成することが望まれる。
前記有機成分と前記無機粉末の総和100質量部に対し、前記有機成分は5〜35質量部、前記無機粉末が95〜65質量部であることが好ましい。
本発明の感光性絶縁ペースト組成物は、有機成分と無機粉末とを含有する感光性絶縁ペースト組成物であり、有機成分と無機粉末とを含有する感光性絶縁ペースト組成物において、前記有機成分が(A)水溶性セルロース誘導体と、(B)分子量20000以下のヒドロキシル基を有するアクリル系樹脂と、(C)光重合性単量体と、(D)光重合開始剤とからなることを特徴とする。
本発明の感光性絶縁ペースト組成物は、水溶性セルロース誘導体をバインダー樹脂として含有することから、従来のアクリル系樹脂を含有する感光性絶縁ペースト組成物より紫外線、エキシマレーザー、X線、電子線などの活性光線の透過率が高く、耐現像性が向上し、精度の高いパターンが形成できる。
また、アクリル酸又はメタクリル酸と炭素数1〜10のグリコールとのモノエステル化物やグリセロールアクリレート、グリセロールメタクリレート、ジペンタエリトリトールモノアクリレート、ジペンタエリトリトールモノメタクリレート、ε−カプロラクトン変性ヒドロキシルエチルアクリレート、ε−カプロラクトン変性ヒドロキシルエチルメタクリレート、2―ヒドロキシ―3−フェノキシプロピルアクリレートなどのエポキシエステル化合物を挙げることができる。
ヒドロキシ基を有するアクリル系樹脂成分が前記範囲未満又は前記範囲を超える場合には必要なパターンの形成精度が得られない。ヒドロキシ基を有するアクリル系樹脂50質量部以下であると耐現像性が低下する。ヒドロキシ基を有するアクリル系樹脂90質量部以上にすると現像性が低下し、現像残渣が発生する。例えば、光重合性単量体が50質量部未満の場合、光重合不足となり現像時に画像部が溶出し、画像形成ができない。また、光重合性単量体が90質量部を超える場合には微細な画像の解像性が低下する。
(感光性絶縁ペースト組成物の調製)
水溶性セルロース誘導体としてヒドロキシプロピルセルロース15質量部、ヒドロキシ基を有するアクリル樹脂としてスチレン/ヒドロキシエチルメタクリレート=55/45(質量%)共重合体(Mw=8500)33質量部、光重合性単量体として2−ヒドロキシ−3−フェノキシプロピルアクリレート(商品名M−600A、共栄社化学株式会社製)39質量部、光重合開始剤として2,2−ジメトキシ−2−フェニルアセトフェノン(商品名IR‐651、チバガイギー社製)1.0質量部、可塑剤としてフタル酸ジシクロヘキシル12質量部、及び溶剤として3−メトキシ−3−メチルブタノール100質量部をかきまぜ機で3時間混合して有機成分液を調製した。次いで、この有機成分液(固形分50%)35質量部と無機粉末としてガラスフリット82.5質量部と混練することで感光性絶縁ペースト組成物を調製した。
次いで、上記調整した感光性絶縁ペースト組成物をポリエチレンテレフタレートからなる支持フィルム上にリップコーターを用いて塗布し、塗膜を100℃で6分間乾燥して溶剤を完全に除去し、厚さ27μmの感光性絶縁ペースト膜を支持フィルム上に形成した。次に感光性絶縁ペースト膜上に25μm厚みのポリエチレンフィルムを張り合わせ感光性フィルムを製造した。
次いで、上記製造した感光性フィルムのポリエチレンフィルムを剥がしながら、予め80℃に加熱しておいたガラス基板にホットロールラミネーターにより105℃でラミネートした。エア圧力は3kg/cm2とし、ラミネート速度は1.0m/minとした。続いて支持フィルムであるポリエチレンテレフタレートを剥離し、感光性銅膜に試験角パターンマスクを介して、超高圧水銀灯により500mJ/cm2の照射量で紫外線露光を行った。液温30℃の水を用いて3kg/cm2の噴射圧で、ブレイクポイントの5倍スプレー現像を行いパターン形成した。ここでブレイクポイントとは、露光処理において未露光部が完全になくなるまでの時間のことをいう。
(感光性絶縁ペースト組成物の調製)
水溶性セルロース誘導体としてヒドロキシプロピルセルロース15質量部、ヒドロキシ基を有するアクリル樹脂としてスチレン/ヒドロキシエチルメタクリレート=55/45(質量%)共重合体(Mw=25000)33質量部、光重合性単量体として2−ヒドロキシ−3−フェノキシプロピルアクリレート(商品名M−600A、共栄社化学株式会社製)39質量部、光重合開始剤として2,2−ジメトキシ−2−フェニルアセトフェノン(商品名IR‐651、チバガイギー社製)1.0質量部、可塑剤としてフタル酸ジシクロヘキシル12質量部、及び溶剤として3−メトキシ−3−メチルブタノール100質量部をかきまぜ機で3時間混合して有機成分液を調製した。次いでこの有機成分液35質量部と無機粉末としてガラスフリット82.5質量部を混練して感光性絶縁ペースト組成物を得た。
上記感光性絶縁ペースト組成物をポリエチレンテレフタレートからなる支持フィルム上にリップコーターを用いて塗布し、塗膜を100℃で6分間乾燥して溶剤を完全に除去し、厚さ27μmの感光性絶縁ペースト膜を支持フィルム上に形成した。次に、感光性絶縁ペースト膜上に25μm厚みのポリエチレンフィルムを張り合わせ感光性フィルムを製造した。
上記製造した感光性フィルムのポリエチレンフィルムを剥がしながら、予め80℃に加熱しておいたガラス基板にホットロールラミネーターにより105℃で感光性絶縁ペースト膜をラミネートした。その時のエア圧力は3kg/cm2、ラミネート速度は1.0m/minであった。続いて支持フィルムであるポリエチレンテレフタレートを剥離し、感光性銅膜に試験角パターンマスクを介して、超高圧水銀灯により500mJ/cm2の照射量で紫外線露光を行った。液温30℃の水を用いて3kg/cm2の噴射圧で、ブレイクポイントの5倍スプレー現像を行いパターン形成した。
Claims (6)
- 有機成分と無機粉末とを含有する感光性絶縁ペースト組成物において、前記有機成分が(A)水溶性セルロース誘導体と、(B)分子量20000以下のヒドロキシル基を有するアクリル系樹脂と、(C)光重合性単量体と、(D)光重合開始剤とからなることを特徴とする感光性絶縁ペースト組成物。
- 前記有機成分中の(A)成分と(B)成分の総和100質量部に対し、(A)成分が10〜50質量部、(B)成分が90〜50質量部であることを特徴とする請求項1に記載の感光性絶縁ペースト組成物。
- 前記無機粉末がガラス粉末であることを特徴とする請求項1または2に記載の感光性絶縁ペースト組成物。
- 前記有機成分中の(A)成分と(C)成分の総和100質量部に対し、(A)成分が10〜50質量部、(C)成分が90〜50質量部であることを特徴とする請求項1から3のいずれか1項に記載の感光性絶縁ペースト組成物。
- 前記有機成分と前記無機粉末の総和100質量部に対し、前記有機成分が5〜35質量部、前記無機粉末が95〜65質量部であることを特徴とする請求項1から4のいずれか1項に記載の感光性絶縁ペースト組成物。
- 請求項1から5のいずれか1項に記載の感光性絶縁ペースト組成物の層が支持フィルム上に形成された感光性フィルム。
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JP2004082416A JP4282518B2 (ja) | 2004-03-22 | 2004-03-22 | 感光性絶縁ペースト組成物、およびそれを用いた感光性フィルム |
PCT/JP2005/004888 WO2005091071A1 (en) | 2004-03-22 | 2005-03-14 | Photosensitive insulative paste composition and photosensitive film using the same |
CN200580009109.0A CN1934496B (zh) | 2004-03-22 | 2005-03-14 | 光敏性绝缘膏体组合物和相应的光敏性膜 |
KR1020067019360A KR100868550B1 (ko) | 2004-03-22 | 2005-03-14 | 감광성 절연 페이스트 조성물 및 이를 사용하는 감광성 막 |
TW94108645A TWI311688B (en) | 2004-03-22 | 2005-03-21 | Photosensitive insulative paste composition and photosensitive film using the same |
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KR20100135861A (ko) * | 2008-05-02 | 2010-12-27 | 코니카 미놀타 옵토 인코포레이티드 | 광학 필름의 제조 방법, 광학 필름, 편광판 및 액정 표시 장치 |
CN106773533A (zh) * | 2017-02-09 | 2017-05-31 | 中国科学院上海微***与信息技术研究所 | 一种光刻胶及其应用方法 |
CN113039628A (zh) | 2018-11-15 | 2021-06-25 | 东京应化工业株式会社 | 等离子体切割用保护膜形成剂及半导体芯片的制造方法 |
CN112500156B (zh) * | 2020-12-08 | 2022-06-03 | 北京科技大学 | 一种蓝色氧化锆陶瓷及制备方法 |
CN115185160B (zh) * | 2022-09-09 | 2023-06-27 | 之江实验室 | 基于纤维素衍生物的激光直写光刻胶组合物及图案化方法 |
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CN1934496A (zh) | 2007-03-21 |
KR100868550B1 (ko) | 2008-11-13 |
TWI311688B (en) | 2009-07-01 |
CN1934496B (zh) | 2010-10-20 |
TW200602807A (en) | 2006-01-16 |
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