JP4224498B2 - UV irradiation equipment - Google Patents

UV irradiation equipment Download PDF

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JP4224498B2
JP4224498B2 JP2006107854A JP2006107854A JP4224498B2 JP 4224498 B2 JP4224498 B2 JP 4224498B2 JP 2006107854 A JP2006107854 A JP 2006107854A JP 2006107854 A JP2006107854 A JP 2006107854A JP 4224498 B2 JP4224498 B2 JP 4224498B2
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JP2007275825A (en
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裕司 山越
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Photoscience Japan Corp
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Description

本発明は、紫外線照射により被処理液体中のＴＯＣ（全有機体炭素）の分解処理を行う紫外線照射装置に関し、例えば、半導体ウェハー製造過程において洗浄水として使用する超純水の製造等に用いられるものである。   The present invention relates to an ultraviolet irradiation apparatus that decomposes TOC (total organic carbon) in a liquid to be treated by ultraviolet irradiation, and is used, for example, in the manufacture of ultrapure water used as cleaning water in a semiconductor wafer manufacturing process. Is.

半導体ウェハーの製造過程において使用する洗浄水には超純水が用いられる。超純水の水質には、ＴＯＣ（全有機体炭素）、ＤＯ（溶存酸素）、細菌がいずれも所定水準以下であることが求められ、紫外線照射装置により被処理水に所定波長の紫外線を照射することにより、ＴＯＣ除去及び殺菌処理を行うことで超純水を製造している。典型的には、ＴＯＣの酸化分解のためには１８５ｎｍ波長の紫外線が寄与し、殺菌には２５４ｎｍ波長の紫外線が寄与する。ＴＯＣ酸化分解に用いられる１８５ｎｍ光を放射する紫外線ランプからは同時に２５４ｎｍ光も放射されるため、１つのランプでＴＯＣ除去とＵＶ殺菌の機能を果たすことができる。なお、紫外線ランプには主に低圧水銀灯が用いられているが、稀に中庄水銀灯、高圧水銀灯が用いられる場合もある。また、２２０ｎｍ以下の紫外線を発するランプであれば液体中の有機物を低減することができる。   Ultrapure water is used as the cleaning water used in the manufacturing process of the semiconductor wafer. The quality of ultrapure water requires that TOC (total organic carbon), DO (dissolved oxygen), and bacteria are all below a predetermined level, and the water to be treated is irradiated with ultraviolet rays of a predetermined wavelength by an ultraviolet irradiation device. Thus, ultrapure water is produced by performing TOC removal and sterilization treatment. Typically, UV light having a wavelength of 185 nm contributes to oxidative decomposition of TOC, and UV light having a wavelength of 254 nm contributes to sterilization. The ultraviolet lamp that emits 185 nm light used for the TOC oxidative decomposition also emits 254 nm light at the same time, so that one lamp can perform the functions of TOC removal and UV sterilization. Note that low-pressure mercury lamps are mainly used as ultraviolet lamps, but rarely Nakasho mercury lamps and high-pressure mercury lamps may be used. In addition, organic substances in the liquid can be reduced if the lamp emits ultraviolet light of 220 nm or less.

ところで、ＴＯＣ酸化分解においては、１８５ｎｍ波長光により水のＨ2Ｏからヒドロキシルラジカル（ＯＨラジカル）を生成し、ＯＨラジカルが有機物を酸化分解している。有機物に対してＯＨラジカルが過多の場合、ＯＨラジカル同士が結合してＨ2Ｏ2（過酸化水素）が生成される。ＴＯＣ酸化分解用の紫外線液体処理装置の後段にはイオン交換樹脂が設けられている。このイオン交換樹脂に過酸化水素が入ると過酸化水素の一部が水と酸素に分離し、イオン交換樹脂の出口でＤＯがその入口より高くなる現象が起こる。このように、ＴＯＣ酸化分解処理にてＴＯＣを低減しているが、同時にＤＯを上昇させることになってしまうという不都合があった。ＤＯも超純水の水質として重要な項目であるため、ＤＯが上昇することは運転管理上、問題となっている。 By the way, in TOC oxidative decomposition, hydroxyl radicals (OH radicals) are generated from H 2 O of water by 185 nm wavelength light, and OH radicals oxidize and decompose organic substances. When the OH radicals are excessive with respect to the organic matter, the OH radicals are combined to generate H 2 O 2 (hydrogen peroxide). An ion exchange resin is provided downstream of the ultraviolet liquid processing apparatus for TOC oxidative decomposition. When hydrogen peroxide enters the ion exchange resin, a part of the hydrogen peroxide is separated into water and oxygen, and a phenomenon occurs in which DO becomes higher at the outlet of the ion exchange resin than the inlet. Thus, although the TOC is reduced by the TOC oxidative decomposition treatment, there is a disadvantage that the DO is increased at the same time. Since DO is also an important item for the quality of ultrapure water, an increase in DO is a problem in terms of operation management.

このような問題を解決するために、下記特許文献１においては、紫外線ＴＯＣ分解装置内における１８５ｎｍ波長光と２５４ｎｍ波長光の比率を、従前の１：５乃至１：７．８の範囲に対して、１：「８以上」とすることが示されている。これにより、紫外線ＴＯＣ分解装置内で被処理液体に照射される１８５ｎｍ波長光の比率を相対的に下げ、ＤＯの減少を図っている。
特開平９−２７６８５８号公報 In order to solve such a problem, in the following Patent Document 1, the ratio of 185 nm wavelength light to 254 nm wavelength light in the ultraviolet TOC decomposing apparatus is set to the conventional range of 1: 5 to 1: 7.8. , 1: “8 or more”. Thereby, the ratio of 185 nm wavelength light irradiated to the liquid to be processed in the ultraviolet TOC decomposing apparatus is relatively lowered to reduce DO.
Japanese Patent Laid-Open No. 9-276858

しかし、上記特許文献１に示された装置においては、紫外線ＴＯＣ分解装置内で被処理液体に照射される１８５ｎｍ波長光の比率を相対的に下げることができるだけであったため、ＤＯの発生を確実に抑制するには不十分であった。
本発明は上述の点に鑑みてなされたもので、ＴＯＣ分解処理を行うにあたって、ＤＯの発生を抑制することに適した紫外線照射装置を提供しようとするものである。 However, in the apparatus disclosed in Patent Document 1, since the ratio of 185 nm wavelength light irradiated to the liquid to be processed in the ultraviolet TOC decomposition apparatus can only be relatively lowered, the generation of DO is ensured. It was insufficient to suppress.
The present invention has been made in view of the above points, and an object of the present invention is to provide an ultraviolet irradiation apparatus suitable for suppressing the occurrence of DO in performing the TOC decomposition process.

請求項１の本発明に係る紫外線照射装置は、２２０ｎｍ以下の波長の紫外線及びそれ以上の波長の紫外線を共存して放射する紫外線ランプを収納した紫外線透過管を複数配置し、該紫外線透過管を透過した紫外線を被処理物に照射する紫外線照射装置において、複数の前記紫外線透過管のうちの一部の管の紫外線透過特性が２２０ｎｍ以下の波長の紫外線を吸収する特性のものからなることを特徴とする。
これにより、２２０ｎｍ以下の波長の紫外線及びそれ以上の波長の紫外線を共存して放射する、という同じような紫外線放射性能を持つ複数の紫外線ランプを使用するものでありながら、前記一部の紫外線透過管では２２０ｎｍ以下の波長の紫外線を吸収することにより、該一部の紫外線透過管を通して被処理物に照射される紫外線においては、２２０ｎｍ以下の波長の紫外線が含まれないものとなり、それ以上の波長（例えば２５４ｎｍ）の紫外線だけが照射されるようになるものであり、同じような紫外線放射性能を持つ複数の紫外線ランプを使用して異なる波長特性の紫外線を適宜の比率で混在して放射させることができる、という効果を奏するものであり、また、そのように異なる波長特性の紫外線を混在して放射させようとする場合において、その内部の紫外線ランプは同じタイプのものを使用することで、ランプ交換のメンテナンス時におけるランプの着け間違いの問題が起こらなくなる、という効果も奏する。 The ultraviolet irradiation device according to the present invention of claim 1 is provided with a plurality of ultraviolet transmission tubes containing ultraviolet lamps that coexist and emit ultraviolet rays having a wavelength of 220 nm or less and ultraviolet rays having a wavelength of 220 nm or more. In the ultraviolet irradiation apparatus for irradiating the workpiece with the transmitted ultraviolet rays, the ultraviolet transmission characteristics of some of the plurality of the ultraviolet transmission tubes are of a characteristic of absorbing ultraviolet rays having a wavelength of 220 nm or less. And
Thus, while using a plurality of ultraviolet lamps having the same ultraviolet radiation performance of coexisting and radiating ultraviolet light having a wavelength of 220 nm or less and ultraviolet light having a wavelength longer than that, the part of the ultraviolet light transmitting By absorbing ultraviolet light having a wavelength of 220 nm or less in the tube, ultraviolet light having a wavelength of 220 nm or less is not included in the ultraviolet light irradiated to the object to be processed through the part of the ultraviolet transmissive tube. Only ultraviolet rays of 254 nm (for example, 254 nm) are irradiated, and ultraviolet rays having different wavelength characteristics are mixed and emitted at an appropriate ratio using a plurality of ultraviolet lamps having the same ultraviolet radiation performance. If you are trying to radiate ultraviolet rays with different wavelength characteristics, In its interior the ultraviolet lamp By using the same type, lamp put mistakes problem does not occur at the time of maintenance of the lamp replacement, effect so called.

請求項２の本発明に係る紫外線照射装置は、紫外線ランプを収納した紫外線透過管を複数配置し、該紫外線透過管を透過した紫外線を被処理物に照射する紫外線照射装置において、複数の前記紫外線透過管のうちの一部の管の紫外線透過特性が２２０ｎｍ以下の波長の紫外線を吸収する特性のものからなることを特徴としており、かつ、前記２２０ｎｍ以下の波長の紫外線を吸収する特性の前記一部の紫外線透過管に収納された紫外線ランプを選択的に点灯し、その他の紫外線透過管に収納された紫外線ランプは消灯する点灯制御装置を更に具備することを特徴とする。
これにより、前記一部の紫外線透過管では２２０ｎｍ以下の波長の紫外線を吸収することにより、該一部の紫外線透過管を通して被処理物に照射される紫外線においては、２２０ｎｍ以下の波長の紫外線が含まれないものとなり、それ以上の波長（例えば２５４ｎｍ）の紫外線だけが照射されるようになり、例えばＤＯの発生を確実に抑制したい場合は、前記一部の紫外線透過管に収納された紫外線ランプのみを選択的に点灯することにより、２２０ｎｍ以下の波長の紫外線を照射することなく、それ以上の波長（例えば２５４ｎｍ）の紫外線だけが照射されるように被処理物の紫外線照射処理を行うことができるので、ＴＯＣ分解処理を行うにあたって、従来装置に比べてＤＯの発生をより一層抑制することに適した紫外線照射装置を提供することができる、という効果を奏する。また、この場合も、紫外線透過特性の異なる紫外線透過管を紫外線照射装置内に混在させることにより、各紫外線透過管から異なる特性の紫外線を放射させようとする場合において、その内部の紫外線ランプは同じタイプのものを使用することができることとなり、従って、ランプ交換のメンテナンス時におけるランプの着け間違いの問題が起こらなくなる。
 According to a second aspect of the present invention, there is provided an ultraviolet irradiation apparatus according to the present invention, wherein a plurality of ultraviolet transmission tubes containing ultraviolet lamps are arranged, and the ultraviolet rays transmitted through the ultraviolet transmission tubes are irradiated to an object to be processed. The ultraviolet transmission characteristics of some of the transmission tubes are characterized by absorbing ultraviolet light having a wavelength of 220 nm or less, and the one of the characteristics of absorbing ultraviolet light having a wavelength of 220 nm or less. The apparatus further includes a lighting control device that selectively turns on the ultraviolet lamp housed in the ultraviolet ray transmissive tube and turns off the ultraviolet lamps housed in the other ultraviolet ray transmissive tubes.
As a result, the ultraviolet rays having a wavelength of 220 nm or less are absorbed by the part of the ultraviolet transmission tubes, and the ultraviolet rays irradiated to the object to be processed through the partial ultraviolet transmission tubes include ultraviolet rays having a wavelength of 220 nm or less. it shall not, Ri Na so that only ultraviolet rays more wavelengths (e.g., 254 nm) is irradiated, for example, if you want to reliably suppress generation of dO, ultraviolet lamps housed in the UV transmission tube of the portion By selectively illuminating only the UV light, it is possible to perform the UV irradiation treatment of the workpiece so that only UV light having a wavelength longer than that (for example, 254 nm) is irradiated without irradiating UV light having a wavelength of 220 nm or less. providing so when performing TOC decomposition treatment, an ultraviolet irradiation device which is suitable for further suppress the occurrence of DO as compared with the conventional apparatus can be Can Rukoto, an effect that. Also in this case, when ultraviolet rays having different characteristics are mixed in the ultraviolet irradiation device so that ultraviolet rays having different characteristics are radiated from the respective ultraviolet ray transmission tubes, the internal ultraviolet lamps are the same. Therefore, it is possible to use a lamp of the type, and therefore, the problem of wrong wearing of the lamp at the time of maintenance for replacing the lamp does not occur.

以下、添付図面を参照して本発明の実施例を詳細に説明する。
図１は、密閉した管路１内に被処理液体Ｐを通して紫外線処理するタイプの紫外線液体処理装置における本発明の一実施例を示す断面略図である。被処理液体Ｐを通す管路つまり容器（以下、便宜上、密閉管という）１は、その両端がシール部２及び３によって液密に密閉されており、液体入口１ａから取り入れた被処理液体Ｐを管内に通し、液体出口１ｂから排出する。この密閉管１内には、石英ガラス製の透光性のランプ保護管（紫外線透過管）４ａ，４ｂ内に液密に挿入された状態で紫外線ランプ５が配置される。この紫外線ランプ５は、２２０nm以下、典型的には１８５nm、の波長の紫外線を発するもので、この波長の紫外線は被処理液体Ｐ中の有機物を分解する機能を発揮する。また、紫外線ランプ５は、併せて、２２０nm以上の、典型的には２５４nm、の波長の紫外線を発するもので、この波長の紫外線は殺菌効果を発揮する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic cross-sectional view showing an embodiment of the present invention in an ultraviolet liquid processing apparatus of the type that performs ultraviolet processing through a liquid to be processed P in a sealed pipe line 1. A pipe line, that is, a container (hereinafter referred to as a sealed pipe for convenience) 1 through which the liquid to be treated P is passed is hermetically sealed at both ends by the seal portions 2 and 3, and the liquid to be treated P taken in from the liquid inlet 1 a is received. It passes through the pipe and is discharged from the liquid outlet 1b. In this sealed tube 1, an ultraviolet lamp 5 is disposed in a state of being inserted in a liquid-tight manner into a light-transmitting lamp protection tube (ultraviolet ray transmitting tube) 4 a and 4 b made of quartz glass. The ultraviolet lamp 5 emits ultraviolet light having a wavelength of 220 nm or less, typically 185 nm, and the ultraviolet light having this wavelength exhibits a function of decomposing organic substances in the liquid P to be treated. In addition, the ultraviolet lamp 5 emits ultraviolet light having a wavelength of 220 nm or more, typically 254 nm, and the ultraviolet light having this wavelength exhibits a bactericidal effect.

密閉管１の両端に設けられたカバー部６及び７は、シール部２，３を介して密閉管１の内部空間とは液密に遮断され、かつ、ランプ保護管（紫外線透過管）４ａ，４ｂの内部空間とは通じた状態である。すなわち、ランプ保護管（紫外線透過管）４ａ，４ｂの両端はシール部２，３を通り抜けてカバー部６及び７内の空間に臨んでおり、これにより、紫外線ランプ５は、その交換時において、ランプ保護管（紫外線透過管）４ａ，４ｂの端部から出し入れできるようになっている。カバー部６及び７は公知の構造により（例えば蓋６ａ，７ａの開閉により）任意に開閉自在であり、勿論、紫外線ランプ５の出し入れ等のメンテナンス作業時には、カバー部６及び７が開放される（蓋６ａ，７ａが開かれる）。   Cover portions 6 and 7 provided at both ends of the sealed tube 1 are liquid-tightly cut off from the internal space of the sealed tube 1 through the seal portions 2 and 3, and the lamp protection tube (ultraviolet transmission tube) 4 a, It is in a state of communicating with the internal space 4b. That is, both ends of the lamp protection tubes (ultraviolet ray transmissive tubes) 4a and 4b pass through the seal portions 2 and 3 and face the spaces in the cover portions 6 and 7, whereby the ultraviolet lamp 5 is replaced at the time of replacement. The lamp protection tubes (ultraviolet transmission tubes) 4a and 4b can be inserted and removed from the ends. The cover portions 6 and 7 can be freely opened and closed by a known structure (for example, by opening and closing the lids 6a and 7a). Of course, the cover portions 6 and 7 are opened during maintenance work such as taking in and out the ultraviolet lamp 5 ( The lids 6a and 7a are opened).

図２は、カバー部６の蓋６ａを外した状態で、長手状の紫外線ランプ５の軸線方向に該カバー部６を見た端面略図であり、複数のランプ保護管（紫外線透過管）４ａ，４ｂ及びその中に挿入配置された紫外線ランプ５の一端が示されている。複数のランプ保護管（紫外線透過管）４ａ，４ｂのうち一部のランプ保護管（紫外線透過管）４ａは、その紫外線透過特性が２２０ｎｍ以下（典型的には１８５nm）の波長の紫外線を吸収する特性のものからなる。そのようなランプ保護管（紫外線透過管）４ａとして、一例として、酸化チタンを１０乃至１０００ｐｐｍ含有する（典型的には１００ｐｐｍ程度含有する）オゾンレス石英管を使用することができる。あるいは、そのようなランプ保護管（紫外線透過管）４ａの別の例として、フッ素樹脂のＦＥＰ材質からなる紫外線透過管を使用することができる。なお、ランプ保護管（紫外線透過管）４ａは、２２０ｎｍよりも長い（典型的には２５４nm）の波長の紫外線は吸収することなく透過する。その他のランプ保護管（紫外線透過管）４ｂは、２２０ｎｍ以下（典型的には１８５nm）の波長の紫外線を吸収することなく透過し、また、それ以上の（典型的には２５４nm）の波長の紫外線も吸収することなく透過する。   FIG. 2 is a schematic end view of the cover 6 in the axial direction of the longitudinal ultraviolet lamp 5 with the cover 6a removed, and a plurality of lamp protection tubes (ultraviolet transmission tubes) 4a, 4b and one end of an ultraviolet lamp 5 inserted and disposed therein are shown. Among the plurality of lamp protection tubes (ultraviolet transmission tubes) 4a and 4b, some of the lamp protection tubes (ultraviolet transmission tubes) 4a absorb ultraviolet rays having a wavelength of 220 nm or less (typically 185 nm). It consists of characteristic ones. As an example of such a lamp protection tube (ultraviolet ray transmissive tube) 4a, an ozoneless quartz tube containing 10 to 1000 ppm of titanium oxide (typically containing about 100 ppm) can be used. Alternatively, as another example of such a lamp protection tube (ultraviolet transmission tube) 4a, an ultraviolet transmission tube made of a fluororesin FEP material can be used. The lamp protection tube (ultraviolet transmission tube) 4a transmits ultraviolet light having a wavelength longer than 220 nm (typically 254 nm) without being absorbed. The other lamp protection tube (ultraviolet transmission tube) 4b transmits ultraviolet light having a wavelength of 220 nm or less (typically 185 nm) without absorbing it, and ultraviolet light having a wavelength longer than that (typically 254 nm). Also penetrates without absorbing.

このように、紫外線透過特性の異なる複数のランプ保護管（紫外線透過管）４ａ，４ｂが、密閉管１内に配置されている。この配置は、例えば、紫外線透過特性の異なるランプ保護管（紫外線透過管）４ａ，４ｂが偏ることなく、できるだけ均一に分散して配置されるのが好ましい。なお、紫外線透過特性の異なるランプ保護管（紫外線透過管）４ａ，４ｂであっても、その中に挿入配置する紫外線ランプ５の特性は、同じものであってよい。つまり、どのタイプのランプ保護管（紫外線透過管）４ａ，４ｂであっても、有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線と殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線の双方を放射することのできる紫外線ランプ５を収納するようにしてよい。これによって、ランプ取り替えのメンテナンスの際に、ランプの着け間違いといった問題が起こらないようになる。因みに、異なるタイプの紫外線ランプを使用した場合、不注意によるランプの着け間違いといった問題が起こるおそれがある。同じタイプの紫外線ランプ５を収納したとしても、一方のランプ保護管（紫外線透過管）４ａを通して被処理液体Ｐに照射されるのは殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線のみとなり、有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線は照射されないが、他方のランプ保護管（紫外線透過管）４ｂを通して被処理液体Ｐに照射されるのは有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線と殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線の双方である。   As described above, the plurality of lamp protection tubes (ultraviolet transmission tubes) 4 a and 4 b having different ultraviolet transmission characteristics are arranged in the sealed tube 1. In this arrangement, for example, it is preferable that lamp protection tubes (ultraviolet transmission tubes) 4a and 4b having different ultraviolet transmission characteristics are arranged as uniformly as possible without being biased. Note that the characteristics of the ultraviolet lamp 5 inserted and disposed in the lamp protection tubes (ultraviolet transmission tubes) 4a and 4b having different ultraviolet transmission characteristics may be the same. That is, in any type of lamp protection tube (ultraviolet transmission tube) 4a, 4b, ultraviolet light having a wavelength of 220 nm or less (typically 185 nm) for organic matter decomposition treatment and 220 nm or more for sterilization (typically An ultraviolet lamp 5 capable of emitting both ultraviolet rays having a wavelength of 254 nm may be accommodated. As a result, problems such as incorrect lamp wearing do not occur during lamp replacement maintenance. Incidentally, when different types of ultraviolet lamps are used, there is a possibility that problems such as inadvertent wearing of the lamp may occur. Even if the same type of ultraviolet lamp 5 is housed, the liquid P to be treated is irradiated through the one lamp protection tube (ultraviolet transmission tube) 4a with an ultraviolet ray having a wavelength of 220 nm or more (typically 254 nm) for sterilization. However, UV light having a wavelength of 220 nm or less (typically 185 nm) for organic matter decomposition treatment is not irradiated, but the liquid P is irradiated through the other lamp protection tube (ultraviolet transmission tube) 4b. Both ultraviolet light with a wavelength of 220 nm or less (typically 185 nm) for treatment and ultraviolet light with a wavelength of 220 nm or more (typically 254 nm) for sterilization.

以上のように、有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線と殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線の双方の照射を可とするランプ保護管（紫外線透過管）４ｂと、殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線の照射は可とするが有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線の照射は可とするランプ保護管（紫外線透過管）４ａを、密閉管１内に混在させることにより、全体的に、被処理液体Ｐに照射する有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線を相対的に減少させることができる。これにより、本発明の紫外線照射装置を応用したＴＯＣ酸化分解装置においては、ＴＯＣ酸化分解処理工程においてＯＨラジカルが過多になる事態を防ぎ、従って、その後段におけるイオン交換処理工程においてＤＯ（溶存酸素）が増加することを防ぐことができる。従って、本発明の紫外線照射装置を超純水製造装置に応用した場合、ＴＯＣ及び細菌のみならずＤＯの含有量も少ない、良質の超純水を提供することができる。よって、本発明の紫外線照射装置を応用した超純水製造装置を、半導体ウェハーの製造過程において使用する洗浄水用の超純水製造装置として使用することで、良質の半導体ウェハーを提供することができる。   As described above, lamp protection that enables irradiation of ultraviolet light having a wavelength of 220 nm or less (typically 185 nm) for organic substance decomposition treatment and ultraviolet light having a wavelength of 220 nm or more (typically 254 nm) for sterilization. Tube (ultraviolet ray transmissive tube) 4b and ultraviolet light having a wavelength of 220 nm or more (typically 254 nm) for sterilization are acceptable, but ultraviolet light having a wavelength of 220 nm or less (typically 185 nm) for organic matter decomposition treatment The lamp protective tube (ultraviolet ray transmissive tube) 4a that can be irradiated is mixed in the sealed tube 1 so that the entire liquid P to be treated is irradiated with an organic substance decomposition treatment of 220 nm or less (typically UV light having a wavelength of 185 nm) can be relatively reduced. As a result, in the TOC oxidative decomposition apparatus to which the ultraviolet irradiation apparatus of the present invention is applied, a situation in which OH radicals are excessive in the TOC oxidative decomposition process is prevented, and therefore DO (dissolved oxygen) in the subsequent ion exchange process. Can be prevented from increasing. Therefore, when the ultraviolet irradiation apparatus of the present invention is applied to an ultrapure water production apparatus, it is possible to provide high quality ultrapure water that has a low DO content as well as TOC and bacteria. Therefore, it is possible to provide a high-quality semiconductor wafer by using an ultrapure water manufacturing apparatus to which the ultraviolet irradiation apparatus of the present invention is applied as an ultrapure water manufacturing apparatus for cleaning water used in the process of manufacturing a semiconductor wafer. it can.

図３は、本実施例の紫外線照射装置に関連する制御系統の一例を示すブロック図である。点灯制御装置１０は、密閉管１内の各紫外線ランプ５の点灯／消灯を制御するものである。例えば、有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線と殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線の双方の照射を可とするタイプのランプ保護管（紫外線透過管）４ｂ内に収納されている紫外線ランプ５のみを点灯し、他を消灯したり、あるいは、殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線の照射は可とするが有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線の照射は可とするタイプのランプ保護管（紫外線透過管）４ａ内に収納されている紫外線ランプ５のみを点灯し、他を消灯したり、あるいは、すべての紫外線ランプ５を点灯するといったように、密閉管１内の各紫外線ランプ５の点灯／消灯を選択的に制御することができる。   FIG. 3 is a block diagram illustrating an example of a control system related to the ultraviolet irradiation apparatus of the present embodiment. The lighting control device 10 controls lighting / extinguishing of each ultraviolet lamp 5 in the sealed tube 1. For example, a lamp protection tube of a type that allows irradiation of ultraviolet light having a wavelength of 220 nm or less (typically 185 nm) for organic matter decomposition treatment and ultraviolet light having a wavelength of 220 nm or more (typically 254 nm) for sterilization. (Ultraviolet transmission tube) Only the ultraviolet lamp 5 housed in the 4b is turned on and the others are turned off, or irradiation with ultraviolet light having a wavelength of 220 nm or more (typically 254 nm) for sterilization is allowed. However, only the ultraviolet lamp 5 housed in a lamp protection tube (ultraviolet transmission tube) 4a of a type that can irradiate ultraviolet rays having a wavelength of 220 nm or less (typically 185 nm) for decomposing organic matter is lit. It is possible to selectively control lighting / extinguishing of the respective ultraviolet lamps 5 in the sealed tube 1 so that the others are turned off or all the ultraviolet lamps 5 are turned on.

ＤＯ監視装置１１は、本実施例の紫外線照射装置を適用している液体処理システム（例えば超純水製造装置）内の所定箇所（例えばイオン交換処理工程）における被処理液体中のＤＯ（溶存酸素）量を監視し、所定水準以上の溶存酸素量が生じた場合に、点灯制御装置１０にＤＯ超過時の点灯／消灯制御信号を与える。点灯制御装置１０では、このＤＯ超過時の点灯／消灯制御信号に応じて、殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線の照射は可とするが有機物分解処理用の２２０nm以下（典型的には１８５nm）の波長の紫外線の照射は可とするタイプのランプ保護管（紫外線透過管）４ａ内に収納されている紫外線ランプ５のみを選択的に点灯し、他を消灯するよう制御する。このような点灯制御を行うことにより、ＤＯ量が所定水準以上となった場合に、ランプ保護管（紫外線透過管）４ａ内に収納されている紫外線ランプ５のみを選択的に点灯することで、２２０nm以下（典型的には１８５nm）の波長の紫外線をカットし、殺菌用の２２０nm以上（典型的には２５４nm）の波長の紫外線のみを被処理液体に照射することができる。これにより、ＤＯを抑制することができる一方で、殺菌効果は維持できる。その後、ＤＯ量が所定水準未満となったならば、通常の点灯モードに戻し、２２０nm以下（典型的には１８５nm）の波長の紫外線も被処理液体に照射されるようにして、有機物の分解処理が行われるようにすればよい。   The DO monitoring device 11 is provided with DO (dissolved oxygen) in a liquid to be treated at a predetermined location (for example, an ion exchange processing step) in a liquid processing system (for example, an ultrapure water production device) to which the ultraviolet irradiation device of this embodiment is applied. ) When the amount of dissolved oxygen exceeds a predetermined level, the lighting control device 10 is given a lighting / extinguishing control signal when DO is exceeded. The lighting control device 10 can irradiate ultraviolet light having a wavelength of 220 nm or more (typically 254 nm) for sterilization according to the lighting / extinguishing control signal when the DO is exceeded, but 220 nm or less for organic matter decomposition treatment. Only the ultraviolet lamp 5 housed in a lamp protection tube (ultraviolet transmission tube) 4a of a type capable of irradiating ultraviolet rays having a wavelength (typically 185 nm) is selectively turned on and the others are turned off. Control. By performing such lighting control, when the amount of DO becomes a predetermined level or more, by selectively lighting only the ultraviolet lamp 5 housed in the lamp protection tube (ultraviolet transmission tube) 4a, Ultraviolet light having a wavelength of 220 nm or less (typically 185 nm) can be cut, and only ultraviolet light having a wavelength of 220 nm or more (typically 254 nm) for sterilization can be irradiated to the liquid to be treated. Thereby, while the DO can be suppressed, the bactericidal effect can be maintained. Thereafter, when the amount of DO becomes less than a predetermined level, the normal lighting mode is restored, and the liquid to be treated is irradiated with ultraviolet light having a wavelength of 220 nm or less (typically 185 nm) to decompose the organic matter. Can be done.

被処理液体Ｐが通される容器は、密閉管１つまり円筒形容器に限らず、どのような構造であってもよい。また、液体処理に限らず、その他の被処理物の紫外線照射処理処理に本発明を適用してもよい。   The container through which the liquid P to be treated passes is not limited to the sealed tube 1, that is, the cylindrical container, and may have any structure. Further, the present invention may be applied not only to liquid processing but also to ultraviolet irradiation processing of other objects to be processed.

被処理液体を管路に通すタイプの紫外線照射装置における本発明の一実施例を示す側面断面略図。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic side cross-sectional view showing an embodiment of the present invention in an ultraviolet irradiation apparatus of a type that allows a liquid to be treated to pass through a pipeline. 同実施例における複数のランプ保護管（紫外線透過管）の配置例を示す端面図。The end elevation which shows the example of arrangement | positioning of the some lamp protection tube (ultraviolet ray transmission tube) in the Example. 同実施例におけるランプ点灯／消灯制御系統の一例を示すブロック図。The block diagram which shows an example of the lamp lighting / extinguishing control system in the same Example.

符号の説明Explanation of symbols

１ 管路（密閉管）
１ａ 液体入口
１ｂ 液体出口
２，３ シール部
４ａ ２２０ｎｍ以下（典型的には１８５nm）の波長の紫外線を吸収するタイプのランプ保護管
４ｂ ２２０ｎｍ以下（典型的には１８５nm）の波長の紫外線を透過するタイプのランプ保護管
５ 紫外線ランプ
６，７ カバー部
１０ 点灯制御装置
１１ ＤＯ監視装置
1 pipeline (sealed tube)
DESCRIPTION OF SYMBOLS 1a Liquid inlet 1b Liquid outlet 2,3 Seal part 4a The type | mold of the lamp | ramp protection tube 4b of the type which absorbs the ultraviolet-ray of the wavelength of 220 nm or less (typically 185 nm) Transmits the ultraviolet-ray of the wavelength of 220 nm or less (typically 185 nm) Type lamp protection tube 5 UV lamps 6 and 7 Cover part 10 Lighting control device 11 DO monitoring device

Claims (7)

２２０ｎｍ以下の波長の紫外線及びそれ以上の波長の紫外線を共存して放射する紫外線ランプを収納した紫外線透過管を複数配置し、該紫外線透過管を透過した紫外線を被処理物に照射する紫外線照射装置において、
複数の前記紫外線透過管のうちの一部の管の紫外線透過特性が２２０ｎｍ以下の波長の紫外線を吸収する特性のものからなることを特徴とする紫外線照射装置。 An ultraviolet irradiation apparatus for arranging a plurality of ultraviolet transmission tubes containing ultraviolet lamps that coexist and emit ultraviolet rays having a wavelength of 220 nm or less and ultraviolet rays of longer wavelengths, and irradiating an object to be processed with ultraviolet rays transmitted through the ultraviolet transmission tubes In
An ultraviolet irradiation apparatus characterized in that an ultraviolet transmission characteristic of a part of the plurality of ultraviolet transmission tubes has a characteristic of absorbing ultraviolet rays having a wavelength of 220 nm or less. 紫外線ランプを収納した紫外線透過管を複数配置し、該紫外線透過管を透過した紫外線を被処理物に照射する紫外線照射装置において、
複数の前記紫外線透過管のうちの一部の管の紫外線透過特性が２２０ｎｍ以下の波長の紫外線を吸収する特性のものからなることを特徴としており、かつ、
前記２２０ｎｍ以下の波長の紫外線を吸収する特性の前記一部の紫外線透過管に収納された紫外線ランプを選択的に点灯し、その他の紫外線透過管に収納された紫外線ランプは消灯する点灯制御装置を更に具備することを特徴とする紫外線照射装置。 In an ultraviolet irradiation device that arranges a plurality of ultraviolet transmissive tubes containing ultraviolet lamps and irradiates an object to be treated with ultraviolet rays transmitted through the ultraviolet transmissive tubes.
The ultraviolet transmission characteristics of some of the plurality of the ultraviolet transmission tubes are composed of a characteristic of absorbing ultraviolet rays having a wavelength of 220 nm or less, and
A lighting control device that selectively turns on the ultraviolet lamps housed in the part of the ultraviolet transmissive tube having the characteristic of absorbing ultraviolet light having a wavelength of 220 nm or less, and turns off the ultraviolet lamps housed in the other ultraviolet transmissive tubes. further ultraviolet irradiation device characterized by comprising. 前記被処理物たる被処理水中の溶存酸素量を監視し、所定水準以上の溶存酸素量が生じた場合に、前記点灯制御装置により前記一部の紫外線透過管に収納された紫外線ランプのみを選択的に点灯することを特徴とする請求項２に記載の紫外線照射装置。 Monitor the amount of dissolved oxygen in the treated water, which is the object to be treated, and select only the ultraviolet lamps stored in the part of the ultraviolet transmission tube by the lighting control device when the dissolved oxygen amount exceeds a predetermined level. The ultraviolet irradiation device according to claim 2 , wherein the ultraviolet irradiation device is turned on. 前記紫外線ランプは、２２０ｎｍ以下の波長の紫外線及びそれ以上の波長の紫外線を放射するものであることを特徴とする請求項２又は３に記載の紫外線照射装置。 The ultraviolet lamp, the ultraviolet irradiation apparatus according to claim 2 or 3, characterized in that to emit ultraviolet light of ultraviolet and more wavelengths having a wavelength of not more than 220 nm. 前記複数の紫外線透過管が、被処理液体が通される容器内に配置されたものであることを特徴とする請求項１乃至４のいずれかに記載の紫外線照射装置。 The ultraviolet irradiation apparatus according to any one of claims 1 to 4, wherein the plurality of ultraviolet transmission tubes are arranged in a container through which a liquid to be processed passes. 前記２２０ｎｍ以下の波長の紫外線を吸収する特性の前記一部の紫外線透過管は、酸化チタンを１０乃至１０００ｐｐｍ含有するオゾンレス石英管である請求項１乃至５のいずれかに記載の紫外線照射装置。   6. The ultraviolet irradiation apparatus according to claim 1, wherein the part of the ultraviolet transmissive tube having a characteristic of absorbing ultraviolet rays having a wavelength of 220 nm or less is an ozone-less quartz tube containing 10 to 1000 ppm of titanium oxide. 前記２２０ｎｍ以下の波長の紫外線を吸収する特性の前記一部の紫外線透過管は、フッ素樹脂で形成されたものである請求項１乃至５のいずれかに記載の紫外線照射装置。   6. The ultraviolet irradiation apparatus according to claim 1, wherein the part of the ultraviolet transmissive tube having a characteristic of absorbing ultraviolet light having a wavelength of 220 nm or less is formed of a fluororesin.
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JP5803215B2 (en) * 2011-03-31 2015-11-04 岩崎電気株式会社 UV treatment equipment
JP6377529B2 (en) * 2013-08-02 2018-08-22 株式会社日本フォトサイエンス Electrodeless UV radiation lamp and UV treatment equipment
JP6229404B2 (en) * 2013-09-27 2017-11-15 ウシオ電機株式会社 Excimer lamp device and light irradiation processing device
JP2016024998A (en) * 2014-07-22 2016-02-08 江東電気株式会社 Mercury lamp
US20190135658A1 (en) 2016-05-31 2019-05-09 Photoscience Japan Corporation Uv irradiation apparatus

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