JP3853320B2 - 光干渉型表示パネル及びその製造方法 - Google Patents
光干渉型表示パネル及びその製造方法 Download PDFInfo
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- JP3853320B2 JP3853320B2 JP2004014480A JP2004014480A JP3853320B2 JP 3853320 B2 JP3853320 B2 JP 3853320B2 JP 2004014480 A JP2004014480 A JP 2004014480A JP 2004014480 A JP2004014480 A JP 2004014480A JP 3853320 B2 JP3853320 B2 JP 3853320B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/288—Interference filters comprising deposited thin solid films comprising at least one thin film resonant cavity, e.g. in bandpass filters
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- Spectroscopy & Molecular Physics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Optical Filters (AREA)
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Description
しかし、各メーカーでは引き続き異なるタイプの平面型表示装置の研究開発が続けられているが、その反面では、携帯型電子製品(例えば、携帯電話、PDA、電子ペーパーなど)に液晶表示装置を組込んだ際に使用電力の負荷が増加するという問題がある。故に、現在では如何にして表示装置の消費電力を抑えるかが最大の課題である。
図4A,Bに示すように、碁板70上に周知の技術である薄膜形成、フォトリソグラフィー或いはエッチングなどにより光学層71及び犠牲層701を形成し、それら光学層71及び犠牲層701の表面にネガ型レジストを塗布すると共に、背面露光、現像などの工程によりパターン化を行なう。
その後、図4Cに示すように、ネガ型レジストを除去して支持層72を設け、続いて、図4Dに示すように、犠牲層701上に導体層73を二つの支持層72上を跨ぐように形成し、最後に図4Eに示すように、導体層73の下方の犠牲層701を除去し、導体層73を支持層72により支持する。
本発明の光干渉型表示パネルの製造方法は、以下の工程による。即ち、図1のAに示すように、ガラス或いは高分子材料により成る基板10上に支持層11を形成する工程と、図1のBに示すように、前記基板10上に光学層12を形成する工程と、図1のCに示すように、前記基板10の表面に、犠牲層13を構成すべき素材を積層し、平坦化して犠牲層13を形成する工程と、図1のDに示すように、前記支持層11同士の間に形成される犠牲層13上に少なくとも反射層を含む導体層14を形成する工程と、前記導体層14の下方における犠牲層13を除去して、該導体層14を支持層11により支持させる工程と、からなる。
前記製造過程においては、支持層11は精密な背面露光技術を用いなくても、一般に採用されている露光現像技術により完成させることができる。
11 支持層
12 光学層
121 透明電極
122 吸収層
123 誘電層
124 誘電層
13 犠牲層
14 導体層
70 基板
701 犠牲層
71 光学層
72 支持層
73 導体層
Claims (13)
- 基板(10)を準備する工程と、
前記基板(10)上に複数の支持層(11)を形成する工程と、
前記基板(10)上で且つ隣接する支持層(11)間に、光学層(12)を形成する工程と、なおここでは、前記光学層(12)の一部分が前記隣接する支持層(11)に重なる、
前記基板(10)上に犠牲層(13)を形成する工程と、
前記犠牲層(13)上に導体層(14)を形成する工程と、なおここでは、前記導体層(14)は、前記支持層(11)に重なる前記光学層の前記部分の上面上に形成されている、
前記導体層(14)の下方における前記犠牲層(13)を除去して、該導体層(14)を前記支持層(11)により支持させる工程と、
を有する光干渉型表示パネルの製造方法。 - 前記基板(10)はガラス又は高分子材料から成る、請求項1に記載の光干渉型表示パネルの製造方法。
- 前記光学層(12)は少なくとも透明電極(121)、吸収層(122)及び誘電層(124)から成り、該誘電層(124)は単層又は複数層である、請求項1に記載の光干渉型表示パネルの製造方法。
- 前記導体層(14)は少なくとも反射層を含む、請求項1に記載の光干渉型表示パネルの製造方法。
- 基板(10)と、
前記基板(10)の表面に位置する複数の支持層(11)と、
前記基板(10)の表面に形成される光学層(12)と、なおここでは、前記光学層(12)は隣接する支持層(11)間に形成されており且つ前記支持層(11)に部分的に重なっている、
前記光学層(12)における、前記支持層(11)に重なる部分の上面に形成される導体層(14)と、
を含む光干渉型表示パネル。 - 前記導体層(14)、前記光学層(12)及び前記支持層(11)は前記基板(10)の同一側に形成される、請求項5に記載の光干渉型表示パネル。
- 前記基板(10)はガラス又は高分子材料から成る、請求項5に記載の光干渉型表示パネル。
- 前記光学層(12)は少なくとも透明電極(121)、吸収層(122)及び誘電層(124)から成り、前記誘電層(124)は単層又は複数層である、請求項5に記載の光干渉型表示パネル。
- 前記導体層(14)は少なくとも反射層を含む、請求項5に記載の光干渉型表示パネル。
- 基板(10)と、
前記基板(10)上に形成される複数の支持層(11)と、
前記基板(10)上に形成される複数の光学層(12)と、なおここでは、前記光学層(12)の各層は隣接する支持層(11)間に形成されており且つ前記支持層(11)に部分的に重なっている、
前記光学層(12)上方に形成される複数の導体層(14)と、なおここでは、前記導体層は、前記光学層(12)が前記隣接する支持層(11)の上に形成されている領域に部分的に重なっている、
を含む光干渉型表示パネル。 - 前記基板(10)はガラス又は高分子材料から成る、請求項10に記載の光干渉型表示パネル。
- 前記光学層(12)は透明電極(121)、吸収層(122)及び少なくとも1つの誘電層(124)から成る、請求項10に記載の光干渉型表示パネル。
- 前記導体層(14)は少なくとも反射層を含む、請求項10に記載の光干渉型表示パネル。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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TW092101977A TW557395B (en) | 2003-01-29 | 2003-01-29 | Optical interference type reflection panel and the manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
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JP2004233994A JP2004233994A (ja) | 2004-08-19 |
JP3853320B2 true JP3853320B2 (ja) | 2006-12-06 |
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JP2004014480A Expired - Fee Related JP3853320B2 (ja) | 2003-01-29 | 2004-01-22 | 光干渉型表示パネル及びその製造方法 |
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US (1) | US6999236B2 (ja) |
JP (1) | JP3853320B2 (ja) |
KR (1) | KR100635446B1 (ja) |
TW (1) | TW557395B (ja) |
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KR20040070012A (ko) | 2004-08-06 |
TW200413787A (en) | 2004-08-01 |
KR100635446B1 (ko) | 2006-10-17 |
JP2004233994A (ja) | 2004-08-19 |
US20040145811A1 (en) | 2004-07-29 |
TW557395B (en) | 2003-10-11 |
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