JP3839362B2 - 軽合金表面を清浄化及び不動態化する方法 - Google Patents

軽合金表面を清浄化及び不動態化する方法 Download PDF

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Publication number: JP3839362B2
Authority: JP; Japan
Prior art keywords: phosphoric acid; solution containing; light alloy; alcohol; containing phosphoric
Prior art date: 2001-06-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

JP2002179814A

Other languages

English (en)

Japanese (ja)

Other versions

JP2003049299A (ja

Inventor

フランツヴォルフ−ディーター

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Franz Oberflaechentechnik GmbH and Co KG

Original Assignee

Franz Oberflaechentechnik GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-06-20

Filing date

2002-06-20

Publication date

2006-11-01

2002-06-20 Application filed by Franz Oberflaechentechnik GmbH and Co KG filed Critical Franz Oberflaechentechnik GmbH and Co KG

2003-02-21 Publication of JP2003049299A publication Critical patent/JP2003049299A/ja

2006-11-01 Application granted granted Critical

2006-11-01 Publication of JP3839362B2 publication Critical patent/JP3839362B2/ja

2022-06-20 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims abstract description 52
238000004140 cleaning Methods 0.000 title claims abstract description 31
229910001234 light alloy Inorganic materials 0.000 title claims description 31
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 52
229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 26
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 24
230000008569 process Effects 0.000 claims abstract description 14
239000011248 coating agent Substances 0.000 claims abstract description 7
238000000576 coating method Methods 0.000 claims abstract description 7
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 17
-1 fluoride ions Chemical class 0.000 claims description 10
LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 8
239000000126 substance Substances 0.000 claims description 7
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
239000000463 material Substances 0.000 claims description 5
239000007800 oxidant agent Substances 0.000 claims description 4
238000001465 metallisation Methods 0.000 claims description 3
238000005406 washing Methods 0.000 claims description 3
BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 2
230000003647 oxidation Effects 0.000 abstract description 7
238000007254 oxidation reaction Methods 0.000 abstract description 7
229910001092 metal group alloy Inorganic materials 0.000 abstract 2
229910045601 alloy Inorganic materials 0.000 description 14
239000000956 alloy Substances 0.000 description 14
238000002161 passivation Methods 0.000 description 8
239000000203 mixture Substances 0.000 description 7
230000000694 effects Effects 0.000 description 6
150000001298 alcohols Chemical class 0.000 description 5
239000010408 film Substances 0.000 description 4
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
238000006243 chemical reaction Methods 0.000 description 3
239000003795 chemical substances by application Substances 0.000 description 3
229910017604 nitric acid Inorganic materials 0.000 description 3
230000001590 oxidative effect Effects 0.000 description 3
MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
230000009471 action Effects 0.000 description 2
239000003513 alkali Substances 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
230000008901 benefit Effects 0.000 description 2
238000007796 conventional method Methods 0.000 description 2
238000007739 conversion coating Methods 0.000 description 2
238000005530 etching Methods 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
238000005457 optimization Methods 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
229910052760 oxygen Inorganic materials 0.000 description 2
JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 2
229920000548 poly(silane) polymer Polymers 0.000 description 2
229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
229910000838 Al alloy Inorganic materials 0.000 description 1
101001108245 Cavia porcellus Neuronal pentraxin-2 Proteins 0.000 description 1
239000002253 acid Substances 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
230000033228 biological regulation Effects 0.000 description 1
230000008859 change Effects 0.000 description 1
230000003749 cleanliness Effects 0.000 description 1
238000011109 contamination Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
238000005238 degreasing Methods 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000004512 die casting Methods 0.000 description 1
150000002009 diols Chemical class 0.000 description 1
239000007789 gas Substances 0.000 description 1
230000036541 health Effects 0.000 description 1
239000012535 impurity Substances 0.000 description 1
230000002401 inhibitory effect Effects 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
239000006082 mold release agent Substances 0.000 description 1
230000007935 neutral effect Effects 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
229920000570 polyether Polymers 0.000 description 1
230000002265 prevention Effects 0.000 description 1
238000000746 purification Methods 0.000 description 1
239000010802 sludge Substances 0.000 description 1
230000001629 suppression Effects 0.000 description 1
DAFQZPUISLXFBF-UHFFFAOYSA-N tetraoxathiolane 5,5-dioxide Chemical compound O=S1(=O)OOOO1 DAFQZPUISLXFBF-UHFFFAOYSA-N 0.000 description 1
239000010409 thin film Substances 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
- C25F1/02—Pickling; Descaling
- C25F1/04—Pickling; Descaling in solution

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Chemical Treatment Of Metals (AREA)
ing And Chemical Polishing (AREA)

JP2002179814A 2001-06-20 2002-06-20 軽合金表面を清浄化及び不動態化する方法 Expired - Fee Related JP3839362B2 (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
EP01114981A EP1270767B1 (de)	2001-06-20	2001-06-20	Verfahren zum Reinigen und Passivieren von Leichtmetalllegierungsoberflächen
EP01114981.2		2001-06-20

Publications (2)

Publication Number	Publication Date
JP2003049299A JP2003049299A (ja)	2003-02-21
JP3839362B2 true JP3839362B2 (ja)	2006-11-01

Family

ID=8177771

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2002179814A Expired - Fee Related JP3839362B2 (ja)	2001-06-20	2002-06-20	軽合金表面を清浄化及び不動態化する方法

Country Status (9)

Country	Link
US (1)	US20030056807A1 (de)
EP (1)	EP1270767B1 (de)
JP (1)	JP3839362B2 (de)
KR (1)	KR100502863B1 (de)
CN (1)	CN1316067C (de)
AT (1)	ATE256770T1 (de)
DE (1)	DE50101194D1 (de)
DK (1)	DK1270767T3 (de)
SI (1)	SI1270767T1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7578921B2 (en) *	2001-10-02	2009-08-25	Henkel Kgaa	Process for anodically coating aluminum and/or titanium with ceramic oxides
AU2002338880A1 (en) *	2002-10-09	2004-05-04	Wolf-Dieter Franz	Method for cleaning and passivating light alloy surfaces
US20050221007A1 (en) *	2003-11-20	2005-10-06	Bae Systems Plc	Surface preparation
CN101591797B (zh) *	2008-05-30	2012-08-08	中芯国际集成电路制造(上海)有限公司	铝垫电化学刻蚀方法
CN101591799B (zh) *	2008-05-30	2011-04-20	比亚迪股份有限公司	一种镁合金的电解抛光液及其表面抛光处理方法
JP6557984B2 (ja) *	2015-02-06	2019-08-14	栗田工業株式会社	アルミニウムまたはアルミニウム合金の封孔処理方法、及び封孔処理装置
CN105603409B (zh) *	2016-01-15	2018-10-09	华南理工大学	一种铝合金常温碱性无铬钝化液及钝化方法
DE102017109739A1 (de) *	2017-05-05	2018-11-08	Fischer Oberflächentechnik GmbH	Wässrige Lösung und Verfahren zur Entfernung von Säure-Rückständen von Metalloberflächen
CN107829122A (zh) *	2017-11-24	2018-03-23	绩溪山合机械有限公司	一种链条钝化处理液及其钝化处理工艺

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3627654A (en) *	1969-11-19	1971-12-14	Atomic Energy Commission	Electrolytic process for cleaning high-carbon steels
US3920471A (en) *	1974-10-10	1975-11-18	Teletype Corp	Prevention of aluminum etching during silox photoshaping
FR2298619A1 (fr) *	1975-01-22	1976-08-20	Pechiney Aluminium	Procede et traitement superficiel d'un fil en aluminium a usage electrique
JPS60248898A (ja) *	1983-06-30	1985-12-09	Chobe Taguchi	電解用脱錆液
FR2633945B1 (fr) *	1988-07-06	1992-09-04	Pechiney Aluminium	Procede d'emaillage en continu de fils en alliage d'aluminium destines a la confection de bobinages electriques
US5015298A (en) *	1989-08-22	1991-05-14	Halliburton Company	Composition and method for removing iron containing deposits from equipment constructed of dissimilar metals
US5217586A (en) *	1992-01-09	1993-06-08	International Business Machines Corporation	Electrochemical tool for uniform metal removal during electropolishing
WO1996019596A1 (en) *	1994-12-19	1996-06-27	Alcan International Limited	Cleaning aluminium workpieces
CN1049259C (zh) *	1994-12-29	2000-02-09	华中理工大学	铝及铝合金焊丝的电化学抛光方法
US5601695A (en) *	1995-06-07	1997-02-11	Atotech U.S.A., Inc.	Etchant for aluminum alloys
US6579439B1 (en) *	2001-01-12	2003-06-17	Southern Industrial Chemicals, Inc.	Electrolytic aluminum polishing processes

2001
- 2001-06-20 AT AT01114981T patent/ATE256770T1/de active
- 2001-06-20 DE DE50101194T patent/DE50101194D1/de not_active Expired - Lifetime
- 2001-06-20 EP EP01114981A patent/EP1270767B1/de not_active Expired - Lifetime
- 2001-06-20 DK DK01114981T patent/DK1270767T3/da active
- 2001-06-20 SI SI200130069T patent/SI1270767T1/xx unknown
2002
- 2002-06-19 KR KR10-2002-0034323A patent/KR100502863B1/ko not_active IP Right Cessation
- 2002-06-20 JP JP2002179814A patent/JP3839362B2/ja not_active Expired - Fee Related
- 2002-06-20 US US10/176,308 patent/US20030056807A1/en not_active Abandoned
- 2002-06-20 CN CNB021248060A patent/CN1316067C/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
US20030056807A1 (en)	2003-03-27
KR20020097002A (ko)	2002-12-31
JP2003049299A (ja)	2003-02-21
ATE256770T1 (de)	2004-01-15
KR100502863B1 (ko)	2005-07-25
SI1270767T1 (en)	2004-06-30
EP1270767B1 (de)	2003-12-17
CN1316067C (zh)	2007-05-16
EP1270767A1 (de)	2003-01-02
DK1270767T3 (da)	2004-04-13
DE50101194D1 (de)	2004-01-29
CN1397667A (zh)	2003-02-19

Legal Events

Date	Code	Title	Description
2005-06-16	A711	Notification of change in applicant	Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20050615
2005-07-14	A521	Request for written amendment filed	Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20050615
2005-10-19	A131	Notification of reasons for refusal	Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051018
2006-01-19	A601	Written request for extension of time	Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20060118
2006-01-24	A602	Written permission of extension of time	Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20060123
2006-04-15	A521	Request for written amendment filed	Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060414
2006-07-10	TRDD	Decision of grant or rejection written
2006-07-19	A01	Written decision to grant a patent or to grant a registration (utility model)	Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060718
2006-08-10	A61	First payment of annual fees (during grant procedure)	Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060802
2006-08-11	R150	Certificate of patent or registration of utility model	Free format text: JAPANESE INTERMEDIATE CODE: R150
2009-08-11	LAPS	Cancellation because of no payment of annual fees

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