JP3741184B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP3741184B2 JP3741184B2 JP21105698A JP21105698A JP3741184B2 JP 3741184 B2 JP3741184 B2 JP 3741184B2 JP 21105698 A JP21105698 A JP 21105698A JP 21105698 A JP21105698 A JP 21105698A JP 3741184 B2 JP3741184 B2 JP 3741184B2
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- conductor wire
- semiconductor device
- wires
- semiconductor chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 82
- 239000004020 conductor Substances 0.000 claims abstract description 135
- 238000005452 bending Methods 0.000 claims abstract description 52
- 230000000630 rising effect Effects 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000010931 gold Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
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Description
【発明の属する技術分野】
本発明は、半導体チップを外部導体へ電気的に接続するための導体ワイヤに関し、特にパッケージの薄型化及びワイヤ間のショートを回避するに優れた導体ワイヤを提供する。
【0002】
【従来の技術】
半導体チップを外部導体、例えば絶縁基板上のパターンやリードフレームへ接続する方法として、ワイヤボンディングは最も一般的な方法である。ワイヤボンディングでは、キャピラリと呼ばれる工具から供給される金(Au)やアルミニウム(Al)の極細ワイヤによって、半導体チップと外部導体とが接続される。製造工程においてワイヤは、キャピラリによりその一端を半導体チップの電極パッドにボンディングされ、ルーピング、すなわちループを描くように引き伸ばされ、他端を外部導体にボンディングされる。
【0003】
上記ワイヤのルーピングは、モールド注入時における圧力耐性や熱によるワイヤの収縮の影響を吸収する上で重要な役割を果たす。しかしながらその一方で、ルーピングによる、ワイヤの半導体チップ表面からの立ち上がり量が、半導体装置の厚さに直接影響を与える。半導体チップ表面には、上記ワイヤを完全に覆い隠すに十分なパッケージ材による厚みが必要となる。電子・通信機器の小型化の要求によって、それに搭載される半導体装置の更なる小型化、薄型化が必要とされており、従って半導体チップ上のパッケージ材の厚みをより薄くすることは極めて重要である。
【0004】
一方、半導体装置の高速化及び多機能化に伴い、半導体装置の接続端子数は増加の一途を辿っている。接続端子数の増加は、装置内部のワイヤの本数の増加を意味する。この結果、上記装置の小型化の要求と相俟って、隣り合うワイヤ同士のショートの危険性が増大する。すなわち、隣り合うワイヤ間の距離が狭くなると、製造時におけるワイヤの配置のばらつきや、モールド注入時におけるワイヤの変形により、ワイヤのショートが起こる。図6に示すように半導体チップ1上に千鳥状に電極パッド2を配列した場合、単位面積当たりの接続端子数を多くすることができるが、ワイヤW間の距離は更に狭くなり、上記問題はより深刻化する。
【0005】
【発明が解決しようとする課題】
この問題を解決する一つの方法として、図7に示すようにワイヤWの途中に一般に”曲”と呼ばれる屈曲点(図中、P点)を形成して、変形に対する耐性を高める方法がある。しかしながら、該屈曲点によってもワイヤの変形が無くなることはなく、ワイヤの配置のばらつきによって、依然ショートの危険性がある。
【0006】
ワイヤショートの危険性を小さくする他の方法として、図8に示すように隣り合うワイヤのルーピングの高さ位置を交互に変えてボンディングする方法がある。製造時のワイヤのばらつきにより隣り合うワイヤ同士が平面的に見て近接しても、高さ方向でワイヤ間には十分な間隙が確保され、ショートの危険性は極めて小さくなる。しかしながら、高さ方向に十分な間隙を確保するためには、半導体チップ上のパッケージ材の厚さを厚くしなければならないという問題が生じる。
【0007】
本発明の目的は、半導体装置の薄型化を実現するに適した導体ワイヤを提供することである。
【0008】
本発明の別の目的は、上記半導体装置の薄型化を達成しつつ、ワイヤ間のショートの問題を最小限に抑えることができる導体ワイヤを提供することである。
【0009】
【課題を解決するための手段】
本発明は、半導体チップを外部導体へ電気的に接続するための導体ワイヤに関する。本発明に係わる半導体装置は、半導体チップと、外部導体と、上記半導体チップを上記外部導体へ電気的に接続するための第1の導体ワイヤとを有する半導体装置において、上記第1の導体ワイヤは、上記半導体チップの上面の電極パッドにボンディングされる第1の端部と、上記外部導体にボンディングされる第2の端部と、上記第1の端部と上記第2の端部との間に位置する屈曲点とを有し、上記屈曲点が上記半導体チップの上面と底面との間の高さに位置すると共に上記第2の端部よりも上記第1の端部に近い位置する。
【0010】
ここで上記屈曲点とは、一般に”曲”といわれる、製造時に意図的に曲げられたワイヤ上の箇所である。屈曲点を導体ワイヤの立ち上がり方向と略逆方向に屈曲することにより、導体ワイヤの半導体チップ主面からの立ち上がり量を抑え、半導体装置を更に薄くできるようにする。
【0011】
本発明において、導体ワイヤの立ち上がり量をできるだけ抑えるために、上記屈曲点を、上記第一の端部と上記第二の端部とを結ぶ直線位置を基準として導体ワイヤの立ち上がり側と反対側に位置させること、また上記第一の端部寄りに位置させることが好ましい。
【0012】
また、導体ワイヤの変形に対する耐性を更に高めるために、一つの導体ワイヤ上に、上記屈曲点を複数備えても良い。
【0013】
本発明は、更に上記導体ワイヤを備えた半導体装置を提供する。本発明に係る半導体装置は、複数の第一の導体ワイヤと、該各第一の導体ワイヤ間に配置される複数の第二の導体ワイヤとを備える。ここで、上記第一の導体ワイヤは、上記第一の端部からの導体ワイヤの立ち上がり方向に屈曲された屈曲点を備え、上記第二の導体ワイヤは、それとは略逆方向に屈曲された屈曲点を備える。異なる方向の屈曲点を有する導体ワイヤ間には、十分な間隙が形成されショートの可能性が減少する。
【0014】
【発明の実施の形態】
以下、本発明の実施形態を図面に沿って説明する。図1に本発明の導体ワイヤを適用した半導体装置の要部を拡大して示す。図1に示す半導体装置は、TQFP(Thin Quad Flat Package)である。TQFPでは、半導体チップ1はダイパッド3上に固定され、それとは離れた位置にリードフレームのインナーリード4が、半導体チップ1を囲むように配置される。そして、半導体チップ1の主面の周囲に配置された電極パッド2と、リードフレームのインナーリード4とが、導体ワイヤ5によって電気的に接続される。TQFPの一般的な構造についてはここではこれ以上言及しないが、当業者においてそれがどのようなものであるかは周知のものとして理解されるであろう。
【0015】
図において、導体ワイヤ5は下向きの屈曲点A1を有する。屈曲点A1は、導体ワイヤ5の全長の中間点よりも電極パッド2側の端部5a寄りに位置している。導体ワイヤ5は、また端部5b寄りに僅かに上向きに屈曲された屈曲点A2を有する。導体ワイヤ5は、端部5aからいくらか上方に立ち上げられた後、やや急峻に斜め下方に延び屈曲点A1に至る。屈曲点A1で導体ワイヤ5は急激に曲げられ、屈曲点A2によりそこからなだらかに下方に湾曲して、インナーリード4側の端部5bに至る。
【0016】
図1には、導体ワイヤ5の両端部5a及び5bを結ぶ直線Lが示されている。屈曲点A1は、この直線Lよりも下側に位置している。屈曲点A1の直線Lに対する高さ位置が低くなれば、半導体チップの面からの導体ワイヤの最大立ち上がり高さ(図ではワイヤ上のP点の位置)は低くなる。しかし、屈曲点A1の位置を下げ過ぎると、ワイヤ端部5aに掛かる応力が大きくなり電極パッド2への接合不良を引き起こす可能性があるので、これを考慮して屈曲点A1の位置を調整する必要がある。屈曲点A1の高さ位置は、その開き角度θによってある程度コントロールできるので、導体ワイヤ5の敷設時に該開き角度θを調整すれば良い。
【0017】
上記半導体装置において、電極パッド2から引き出される全ての導体ワイヤ5が、図1に示す形状を有している。図では示していないが、半導体チップ1及び導体ワイヤ5は、パッケージ外形を形成するモールド樹脂により封止される。
【0018】
図2は、本発明の他の実施形態を示している。図において半導体チップ1は、図6に示すと同様の千鳥状配列の電極パッド2a及び2bを有している。図には2種類の形状の導体ワイヤ5、6が示されている。一方の導体ワイヤ5は、図1に示した導体ワイヤと同じ形状であり、その端部5aは外側の電極パッド2aの列にボンディングされている。他方の導体ワイヤ6は、従来から用いられている一般的な引き出しによるワイヤであり、その端部6aは内側の電極パッド2bにボンディングされている。すなわち導体ワイヤ6は、電極パッド2bから垂直に引き出された後、略直角に屈曲されて水平に延び、インナーリード4寄りの中間位置、すなわち屈曲点Bで下方に僅かに屈曲されてインナーリード4に至る。
【0019】
導体ワイヤ5及び6は、千鳥状配列の電極パッド2a及び2bから交互に引き出されており、従って同じ形状の導体ワイヤが隣り合うことがないように配列されている。ここで導体ワイヤ5の屈曲点A1は下向きであり、導体ワイヤ6の屈曲点Bは上向きである。このため両導体ワイヤにおける中間領域Mにおいて、ワイヤ同士はその高さ方向において十分に引き離されている。導体ワイヤの中間領域Mは、モールド樹脂注入時における変形量が大きく、またワイヤボンディング時の位置誤差が最も大きく現れる領域である。上記両導体ワイヤの相対的な位置関係によって、該中間領域Mにおけるワイヤの接触の可能性が最小限に抑えられる。両導体ワイヤは、その両端部近傍の領域においては、その高さ方向に関し比較的接近して配置されている。しかしながら、ワイヤの端部付近ではモールド樹脂注入時の変形及びワイヤボンディング時の位置誤差も小さいため、この領域で両導体ワイヤが接触する可能性は極めて少ない。なお、上記導体ワイヤ6は上向きの屈曲点Bを備えているが、このような屈曲点がないワイヤと上記下向きの屈曲点を有する上記導体ワイヤ5との組み合わせによっても、両ワイヤ間には十分なクリアランスが確保される。
【0020】
図3は上記図1及び図2における導体ワイヤ5のボンディング工程を示すものである。本工程において基本的なボンディング手順は従来の方法と変わらないが、上記導体ワイヤ5の特殊な形状を実現するため、キャピラリの移動軌跡は特徴的である。
【0021】
最初に、ワイヤの先端にボールを形成し、キャピラリ10からの超音波及び熱圧着により、半導体チップの電極パッド2にボンディングする。導体ワイヤのチップからの立ち上がり量を考慮して、斜め上方にワイヤを引き出した後、更に上方にキャピラリ10を引き上げる(工程(A))。屈曲点を形成する位置(図中、A1点)でキャピラリ10の引き上げを停止し、キャピラリを側方に移動させた後(工程(B))、更に引き上げる(工程(C))。
【0022】
次に、上記屈曲点A1とは逆向きの屈曲点A2を形成する位置で、キャピラリ10を左側へ移動し(工程(D))、屈曲点A1に十分な曲を付ける。キャピラリを上方へ引き上げ(工程(E))、最後に、ワイヤを引き出しながらキャピラリを移動し、インナーリード4へボンディングを行う(工程(F))。
【0023】
図4は、本発明の導体ワイヤの他の実施形態を示したものである。本実施形態において導体ワイヤ7は、複数の下向きの屈曲点Cを有する。図では導体ワイヤ7を4分割するように3箇所に下向きの屈曲点C1〜C3が形成されている。このように複数の下向きの屈曲点を一つの導体ワイヤ上に形成する利点は、導体ワイヤの変形に対する耐性を高められる点及び導体ワイヤの全域を平均して低い位置に配置できる点にある。本実施形態を図2に示す2種類のワイヤを交互に配置したものの一方として採用すれば、隣り合うワイヤ間のショートの問題はより回避される。
【0024】
【実施例】
図5に示すように、従来構造及び本発明の一実施例による導体ワイヤのサンプルを作成し、半導体チップ面に対するその高さ位置の比較を行った。サンプルの作成に際し、両ワイヤの高さを出来るだけ低く張るように努めた。使用したワイヤは、何れも、長さ4mm、径25μmのAlワイヤである。測定は全てのサンプルについて、半導体チップの主面の高さを基準にし、該基準に対する屈曲点Aでのワイヤの高さDを求めた。その結果を以下の表に纏めた。
【0025】
【表1】
【0026】
結果より、本実施例の場合、屈曲点Aにおいてワイヤの高さを平均値で186.4μm低くできることが確認された。
【0027】
以上、本発明の実施形態及び実施例を図面に沿って説明した。本発明の適用範囲が、上記実施形態及び実施例において示した事項に限定されないことは明らかである。本発明は、導体ワイヤを用いて半導体チップを外部導体へ電気的に接続するあらゆる半導体装置に適用可能である。導体ワイヤがボンディングされる外部導体は、リードフレームのインナーリード、絶縁基板上の導体パターンその他の導体部分であって良い。またベアチップを直接プリント基板上に実装する際に、プリント基板上のパターンへボンディングされる導体ワイヤにおいても本発明が適用可能である。本発明に係る導体ワイヤは、それが導体ワイヤを必要とする限り、TQFP、BGA(Ball Grid Array)、CSP(Chip Size Package)その他の半導体装置において実現可能である。
【0028】
【発明の効果】
本発明により、半導体チップの主面からの導体ワイヤの立ち上がり量を抑えることができ、その結果、半導体装置の薄型化を実現可能となる。
【0029】
また、本発明により隣り合う導体ワイヤ間の相互距離を比較的大きくとることができるようになり、ワイヤ間のショートの問題を最小限に抑えることができる。
【図面の簡単な説明】
【図1】本発明の導体ワイヤを適用した半導体装置の要部を拡大して示す図である。
【図2】千鳥状ボンディングを用いた半導体装置において本発明を適用した例を示す図である。
【図3】本発明に係る導体ワイヤのボンディング工程を示す図である。
【図4】複数の屈曲点を有する本発明の他の実施形態を示す図である。
【図5】従来構造及び本発明の一実施例による導体ワイヤを比較して示す図である。
【図6】千鳥状ボンディングの様子を示す平面図である。
【図7】従来の導体ワイヤの形状を示す図である。
【図8】千鳥状ボンディングにおける従来の導体ワイヤの形状を示す図である。
【符号の説明】
1 半導体チップ
2 電極パッド
3 ダイパッド
4 インナーリード
5 導体ワイヤ
5a 端部
5b 端部
A 屈曲点
Claims (14)
- 半導体チップと、外部導体と、上記半導体チップを上記外部導体へ電気的に接続するための第1の導体ワイヤとを有する半導体装置において、
上記第1の導体ワイヤは、上記半導体チップの上面の電極パッドにボンディングされる第1の端部と、上記外部導体にボンディングされる第2の端部と、上記第1の端部と上記第2の端部との間に位置する屈曲点とを有し、
上記屈曲点が上記半導体チップの上面と底面との間の高さに位置すると共に上記第2の端部よりも上記第1の端部に近い位置にある半導体装置。 - 上記屈曲点が上記半導体チップの底面の向きに曲げられている請求項1に記載の半導体装置。
- 上記第1の導体ワイヤが複数の屈曲点を有する請求項1又は2に記載の半導体装置。
- 上記半導体チップの上面の電極パッドにボンディングされる第1の端部と外部導体にボンディングされる第2の端部とを有する複数の第2の導体ワイヤを更に有し、
上記第2の導体ワイヤが上記半導体チップの上面と底面との間の高さの位置に形成される屈曲点を有しない請求項1、2又は3に記載の半導体装置。 - 上記第1の導体ワイヤが2つの上記第2の導体ワイヤの間に配置されている請求項4に記載の半導体装置。
- 上記第2の導体ワイヤが上記半導体チップの上面の高さの上方に位置する屈曲点を有する請求項4又は5に記載の半導体装置。
- 上記第1の導体ワイヤに接続される上記半導体チップの第1の電極パッドと上記第2の導体ワイヤに接続される上記半導体チップの第2の電極パッドとが千鳥状に配置されている請求項5に記載の半導体装置。
- 半導体チップを外部導体へ電気的に接続するための複数の導体ワイヤを備えた半導体装置において、
複数の第1の導体ワイヤと、該各第1の導体ワイヤ間に配置される複数の第2の導体ワイヤとを備え、
上記第1の導体ワイヤは、上記半導体チップの電極パッドにボンディングされる第1の端部と、上記外部導体にボンディングされる第2の端部と、上記第1及び第2の端部の間に位置し、上記第1の端部からの導体ワイヤの立ち上がり方向に屈曲された屈曲点とを備え、
上記第2の導体ワイヤは、上記半導体チップの電極パッドにボンディングされる第1の端部と、上記外部導体にボンディングされる第2の端部と、上記第1及び第2の端部の間に位置し、上記第1の端部からの導体ワイヤの立ち上がり方向と略逆方向に屈曲された屈曲点とを備え、
隣り合う上記第1及び第2の導体ワイヤが空間的に離れて配置された半導体装置。 - 上記第1の導体ワイヤの上記屈曲点を、該導体ワイヤの第1の端部と第2の端部とを結ぶ直線位置を基準として導体ワイヤの立ち上がり側に位置させ、
上記第2の導体ワイヤの上記屈曲点を、該導体ワイヤの第1の端部と第2の端部とを結ぶ直線位置を基準として導体ワイヤの立ち上がり側と反対側に位置させた請求項8に記載の半導体装置。 - 上記第2の導体ワイヤの上記屈曲点が、該導体ワイヤ上の第1の端部寄りに位置している請求項8又は9に記載の半導体装置。
- 上記第2の導体ワイヤ上に、上記屈曲点を複数備えた請求項8又は9に記載の半導体装置。
- 上記半導体チップは、
上記第1の導体ワイヤの上記第1の端部をボンディングする第1の電極パッドの列と、
上記第1の電極パッドの列に隣接され、上記第2の導体ワイヤの上記第1の端部をボンディングする第2の電極パッドの列と、
を備えた請求項8、9、10又は11に記載の半導体装置。 - 上記第1及び第2の導体ワイヤにおける上記第2の端部がボンディングされる外部導体が、絶縁基板上の導体パターンである請求項8、9、10、11又は12に記載の半導体装置。
- 上記第1及び第2の導体ワイヤにおける上記第2の端部がボンディングされる外部導体が、リードフレームである請求項8、9、10、11又は12に記載の半導体装置。
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US09/361,502 US6380634B1 (en) | 1998-07-27 | 1999-07-23 | Conductor wires and semiconductor device using them |
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JP4663179B2 (ja) * | 2001-08-27 | 2011-03-30 | ルネサスエレクトロニクス株式会社 | 半導体装置及びワイヤボンディング装置 |
TW200642012A (en) * | 2005-05-17 | 2006-12-01 | Advanced Semiconductor Eng | Chip package and wire bonding process thereof |
JP5332211B2 (ja) * | 2007-03-07 | 2013-11-06 | 株式会社デンソー | 半導体装置およびその製造方法 |
JP2009021499A (ja) * | 2007-07-13 | 2009-01-29 | Toshiba Corp | 積層型半導体装置 |
JP4361593B1 (ja) | 2008-10-21 | 2009-11-11 | 株式会社新川 | ワイヤボンディング方法 |
JP5595694B2 (ja) * | 2009-01-15 | 2014-09-24 | パナソニック株式会社 | 半導体装置 |
CN102244058A (zh) * | 2010-05-13 | 2011-11-16 | 群丰科技股份有限公司 | 四方扁平无导脚的半导体封装件及制法及该制造用金属板 |
KR101746614B1 (ko) * | 2011-01-07 | 2017-06-27 | 삼성전자 주식회사 | 발광소자 패키지 및 그 제조방법 |
JP5917817B2 (ja) * | 2011-03-25 | 2016-05-18 | シチズン電子株式会社 | ワイヤーボンディング構造 |
MY152355A (en) | 2011-04-11 | 2014-09-15 | Carsem M Sdn Bhd | Short and low loop wire bonding |
MY181180A (en) | 2011-09-09 | 2020-12-21 | Carsem M Sdn Bhd | Low loop wire bonding |
KR101815754B1 (ko) * | 2016-03-10 | 2018-01-08 | 앰코 테크놀로지 코리아 주식회사 | 반도체 디바이스 |
JP6447580B2 (ja) * | 2016-06-15 | 2019-01-09 | 日亜化学工業株式会社 | 発光装置 |
JP2018137342A (ja) * | 2017-02-22 | 2018-08-30 | 株式会社村田製作所 | 半導体装置及びその製造方法 |
JP6809522B2 (ja) * | 2018-11-29 | 2021-01-06 | 日亜化学工業株式会社 | 発光装置 |
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