JP3372246B2 - Method and apparatus for purifying harmful gases containing harmful substances such as dioxin - Google Patents
Method and apparatus for purifying harmful gases containing harmful substances such as dioxinInfo
- Publication number
- JP3372246B2 JP3372246B2 JP2000595765A JP2000595765A JP3372246B2 JP 3372246 B2 JP3372246 B2 JP 3372246B2 JP 2000595765 A JP2000595765 A JP 2000595765A JP 2000595765 A JP2000595765 A JP 2000595765A JP 3372246 B2 JP3372246 B2 JP 3372246B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- tower
- cleaning liquid
- harmful
- gas ejection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
- B01D53/18—Absorbing units; Liquid distributors therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
- B01D53/70—Organic halogen compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
- B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
- B01D47/021—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath by bubbling the gas through a liquid bath
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Environmental & Geological Engineering (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】技術分野
本発明は，一般に，ダイオキシンなどの，有害物質が含
まれる有害ガスの浄化方法及び装置に関し，さらに詳細
には，好ましくは，焼却システムの各種毒物に含まれる
排気ガスの浄化に使用され，あるいは，無塵清浄空気を
半導体製造装置などの製造工場のクリンリームに供給す
るために空気を浄化するためのガス浄化方法及び装置に
関する。TECHNICAL FIELD The present invention generally relates to a method and apparatus for purifying harmful gases containing harmful substances such as dioxins, and more particularly, exhaust gas contained in various poisons of an incineration system. The present invention relates to a gas purifying method and device for purifying air used for purifying gas or for supplying clean dust-free air to cleanlines of manufacturing plants such as semiconductor manufacturing devices.
【０００２】[0002]
【従来の技術】背景技術
当業者に既知であるように，ダイオキシンや亜硫酸ガス
などの有害物質は，様々な産業分野で発生し，重大な大
気汚染を引き起こす。即ち，石油精製工程や重油燃焼工
程は大量の亜硫酸ガスが発生するので，焼却システムの
排気ガスには大量のダイオキシンが含まる。即ち，かか
る石油精製工程や石油燃焼工程の間，石油あるいは油の
中の硫黄は酸化されて亜硫酸ガスを形成し，排気ガスと
共に大気中に放出される。特に，油が近年の重要なエネ
ルギ資源であり，大量に使用されるので，油燃焼工程に
より発生する有害物質は，日毎に，深刻に大気を汚染す
る。BACKGROUND ART As is known to those skilled in the art, toxic substances such as dioxins and sulfur dioxide are generated in various industrial fields and cause serious air pollution. That is, since a large amount of sulfurous acid gas is generated in the oil refining process and the heavy oil combustion process, a large amount of dioxin is contained in the exhaust gas of the incineration system. That is, during such an oil refining process or an oil burning process, petroleum or sulfur in the oil is oxidized to form sulfurous acid gas, which is released into the atmosphere together with the exhaust gas. In particular, since oil is an important energy resource in recent years and is used in large quantities, harmful substances generated by the oil combustion process seriously pollute the atmosphere every day.
【０００３】かかる有害物質に起因する大気汚染を制御
するために，排気ガス中に含まれる有害物質の許容量は
厳格に規制される。従って，排気ガス中に含まれる有害
物質の許容量のかかる厳格な規則に適合するガス浄化装
置を提供することが必要である。また，半導体製造，高
集積電子デバイス製造，光工学技術，遺伝子工学技術，
宇宙空間工学技術あるいは非常に高精度が要求される医
療薬が処理されるクリーンルームに対して清浄空気を供
給することも必要である。かかる清浄空気により，クリ
ーンルームを，塵，バクテリアあるいは他の異物質が完
全に存在しない最適な環境とすることができる。In order to control air pollution caused by such harmful substances, the allowable amount of harmful substances contained in exhaust gas is strictly regulated. Therefore, it is necessary to provide a gas purification device that complies with the strict regulations regarding the allowable amount of harmful substances contained in exhaust gas. In addition, semiconductor manufacturing, highly integrated electronic device manufacturing, optical engineering technology, genetic engineering technology,
It is also necessary to supply clean air to a clean room where space medicine technology or medical drugs requiring extremely high precision are processed. Such clean air allows the clean room to be an optimal environment completely free of dust, bacteria or other foreign substances.
【０００４】上記要求を実現する成果として，種々のタ
イプの空気浄化装置が提案された。As a result of realizing the above requirements, various types of air purifying devices have been proposed.
【０００５】かかる従来の空気浄化装置は，大略，２つ
のタイプ，即ち，湿式装置と乾式装置に分類される。Such conventional air purifiers are roughly classified into two types, namely, wet type devices and dry type devices.
【０００６】かかる湿式ガス浄化装置の代表例は，大型
タワーの下側部分にガス噴出管が具備され，ガス噴出管
上部の複数の異なる高さ位置でタワー内に水平に取り付
けられた複数の金網を具備する充装タワー式装置であ
る。粒子は，所定の厚さを有する金網上に均一に積層さ
れ，各金網上に粒子層が形成されている。さらに，複数
の浄化液スプレイ管が粒子層上に設置され，粒子層表面
に浄化液を均一にスプレイして，粒子層を湿らせる。A typical example of such a wet gas purifier is a plurality of wire nets which are equipped with a gas ejection pipe in a lower portion of a large tower and horizontally mounted in the tower at a plurality of different height positions above the gas ejection pipe. It is a charging tower type device equipped with. The particles are uniformly laminated on a wire net having a predetermined thickness, and a particle layer is formed on each wire net. Further, a plurality of cleaning liquid spray pipes are installed on the particle layer to uniformly spray the cleaning liquid on the surface of the particle layer to wet the particle layer.
【０００７】上記充装タワー式ガス浄化装置の処理にお
いては，粒子層を通り抜けている間，有害ガスは，ガス
噴出管からタワー内に噴出され，粒子層を通過してタワ
ー内の上方に流れる。有害ガスが，湿った粒子層を上方
に通り抜ける際には，粒子層の浄化液と接触するように
導かれる。ガスの有害物質は浄化液中に溶解され，浄化
空気がタワー内で上方に上昇した後，タワーから大気中
に放出される。[0007] In the treatment of the above gas charging tower type gas purifier, while passing through the particle layer, the harmful gas is ejected from the gas ejection pipe into the tower, passes through the particle layer and flows upward in the tower. . As the noxious gas passes upward through the moist particle layer, it is guided into contact with the cleaning fluid of the particle layer. The harmful substances of the gas are dissolved in the purification liquid, the purified air rises upward in the tower, and then is released from the tower to the atmosphere.
【０００８】しかしながら，上記充装タワー式ガス浄化
装置は，以下のような問題がある。有害ガスが粒子層を
通り抜けるときだけ，有害ガスが限定的に浄化液と接触
するので，タワー内の有害ガスの浄化液接触領域が限定
される。これは，結果的に，装置のガス浄化効率を低下
させ，装置の大きさを拡大することになる。However, the above-mentioned charging tower type gas purifier has the following problems. Since the harmful gas comes into limited contact with the cleaning liquid only when the harmful gas passes through the particle layer, the cleaning liquid contact area of the harmful gas in the tower is limited. This results in a reduction in the gas purification efficiency of the device and an increase in the size of the device.
【０００９】湿式ガス浄化装置他のの例は，ガス噴出管
が浄化液タワーの下方位置に具備され，ガス噴出管の上
方位置でタワー内に取り付けられた電動プロペラを有す
る，攪拌式装置である。上記攪拌式ガス浄化装置の処理
においては，プロペラにより攪拌されている間，ガス噴
出管から放出されるガス気泡は浄化液と接触するように
導かれる。ガスの有害物質は，浄化液中にこのように溶
解され，浄化空気がタワー内で上方に流れた後，タワー
から大気中に放出される。Another example of the wet gas purifying device is a stirring type device in which a gas ejection pipe is provided in a lower position of the purification liquid tower and an electric propeller is installed in the tower above the gas ejection pipe. . In the process of the stirring type gas purifying apparatus, the gas bubbles emitted from the gas jet pipe are guided so as to come into contact with the purifying liquid while being stirred by the propeller. The harmful substances of the gas are thus dissolved in the purification liquid, and after the purified air flows upward in the tower, it is released from the tower into the atmosphere.
【００１０】しかしながら，上記攪拌式ガス浄化装置
は，以下のような問題がある。ガス気泡の浮力が，プロ
ペラにより形成された浄化液の攪拌力よりも高いので，
ガス気泡はタワー内で急速に上昇する。これは，結果的
に，ガス気泡が浄化液と接触する時間を制限することに
なる。従って，有害ガスが，必要な長時間の間，浄化液
と接触することは，ほとんど不可能である。さらに，装
置のガス浄化効率は低減する。また，タワー径と同一直
径の大型プロペラを設置することも必要である。かかる
大型プロペラは，装置周囲に動作振動や人々に迷惑な雑
音を発生させ，さらに電力を浪費する大容量モータを必
要とする。さらに，プロペラの中央部分及び縁部分に位
置するガス気泡は，トルクの影響なしでタワー内を上昇
する。このことは，装置のガス浄化効率をさらに低下さ
せる。However, the above-mentioned stirring type gas purifier has the following problems. Since the buoyancy of gas bubbles is higher than the stirring force of the cleaning liquid formed by the propeller,
Gas bubbles rise rapidly in the tower. This consequently limits the time during which the gas bubbles come into contact with the cleaning liquid. Therefore, it is almost impossible for the harmful gas to come into contact with the cleaning liquid for the required long time. Furthermore, the gas purification efficiency of the device is reduced. It is also necessary to install a large propeller with the same diameter as the tower diameter. Such a large propeller requires a large-capacity motor that generates operating vibrations around the device and noise that is annoying to people and consumes electric power. Furthermore, the gas bubbles located in the central and edge parts of the propeller rise in the tower without the influence of torque. This further reduces the gas purification efficiency of the device.
【００１１】乾式ガス浄化装置の例は，制御集塵機であ
る。しかしながら，かかる制御集塵機は，湿式ガス浄化
装置と比較して，処理効率が低く，設置費用が増大する
点で問題がある。An example of a dry gas purifier is a controlled dust collector. However, such a controlled dust collector has a problem in that the treatment efficiency is low and the installation cost is increased as compared with the wet gas purifier.
【００１２】上述のように，従来のガス浄化装置は，設
置費用が増大するという点で問題がある。上記装置も，
必要なガス浄化効果を達成することができないので，大
気汚染を引き起こし，実際の使用には余り適していな
い。その結果，より効果的にかかる有害ガスを処理する
ことが可能なガス浄化装置を提供することが必要であ
る。As described above, the conventional gas purifier has a problem that the installation cost increases. The above device also
Since it cannot achieve the required gas purification effect, it causes air pollution and is not very suitable for actual use. As a result, it is necessary to provide a gas purification device that can treat such harmful gas more effectively.
【００１３】本発明の発明者は，韓国特許公告番号９１
−４４７において，「有害ガスの浄化方法及び装置」を
提案した。上記韓国の装置は，添付図面１及び２に示さ
れる。The inventor of the present invention has a Korean Patent Publication No. 91.
-447 proposed "Method and apparatus for cleaning harmful gas". The Korean device is shown in the attached drawings 1 and 2.
【００１４】図に示すように，上記韓国のガス浄化装置
は，筒状の浄化液タワーを有し，その中に，ガス浄化液
が渦流を形成するためにスプレイされ，有害ガスも渦流
と同一方向に噴射される。上記韓国の装置の処理では，
ガス浄化液中に溶解しているガス有害物質を有する有害
ガス気泡は，徐々に延伸されて薄くなり，最終的に破裂
する。As shown in the figure, the Korean gas purification device has a cylindrical purification liquid tower in which the gas purification liquid is sprayed to form a vortex, and the harmful gas is also the same as the vortex. Is jetted in the direction. In the above Korean device processing,
The harmful gas bubbles containing the harmful gas substances dissolved in the gas purification solution are gradually elongated and thinned, and finally burst.
【００１５】従って，上記韓国の装置は，有害ガスが，
タワー内を高速で渦巻くガス浄化液中に，妨害されずに
滑らかに挿入されるように設計することが必要である。
この装置は，また，ガス浄化液の渦巻力がガス気泡の浮
力よりも高くなるように，従って，有害ガス気泡を徐々
に延伸して薄くし，最終的に破裂できるように設計しな
ければならない。このようにして，有害物質を反応さ
せ，ガス浄化液中に溶解することができる。Therefore, in the Korean device, the harmful gas is
It is necessary to design it so that it can be smoothly inserted into the gas purification solution swirling at high speed inside the tower without obstruction.
This device must also be designed so that the swirling force of the gas purification liquid is higher than the buoyancy of the gas bubbles, and thus the harmful gas bubbles can be gradually stretched to thin and eventually burst. . In this way, harmful substances can be reacted and dissolved in the gas purification liquid.
【００１６】上記韓国のガス浄化装置は，有害ガスは，
主としてガス気泡になり，渦巻きながらタワー内の長い
通路に沿って上昇する点で効果がある。このように，こ
の装置中の有害ガスは，従来の湿式ガス浄化装置と比較
して，必要な長時間の間，効果的にガス浄化液と接触す
ることができる。従って，ガスの有害物質がガス浄化液
中に効果的に溶解するので，従来の湿式ガス浄化装置と
比較して，この装置のガス浄化効果が改善される。この
韓国の装置は，また，大きさを小型化して，近年のコン
パクト化傾向を実現し，製造コストを低減する。The above-mentioned Korean gas purifier has the following characteristics:
It is effective in that it mainly becomes gas bubbles and rises along a long passage in the tower while swirling. In this way, the harmful gas in this device can effectively contact the gas purification liquid for a required long time, as compared with the conventional wet gas purification device. Therefore, the harmful substances of the gas are effectively dissolved in the gas purification liquid, so that the gas purification effect of this device is improved as compared with the conventional wet gas purification device. This Korean device also reduces the size, realizes the recent trend toward compactness, and reduces the manufacturing cost.
【００１７】[0017]
【発明が解決しようとする課題】近年においては，排気
ガス中に含まれるダイオキシン，塵などの有害物質の許
容量は，かかる有害物質に起因する大気汚染を抑制する
ために，さらに厳密に規制される。さらに，ダイオキシ
ンなどの非常に浄化が困難な有害物質量の増加をともな
って工業が発達がなされる。従って，高い処理効率を達
成すると同時に，大量の有害ガスを処理するように設計
されたガス浄化装置を提供することが必要である。かか
る浄化装置は，また，人々から反感を買うことのない設
置費用に低減すると同時に，限られた領域中に容易に設
置することができる所定のコンパクト化を達成するよう
に設計する必要がある。In recent years, the permissible amount of harmful substances such as dioxins and dust contained in exhaust gas is more strictly regulated in order to suppress air pollution caused by such harmful substances. It Furthermore, the industry will be developed with an increase in the amount of harmful substances such as dioxins that are extremely difficult to purify. Therefore, there is a need to provide a gas purification device designed to treat large amounts of harmful gases while achieving high treatment efficiency. Such purifiers also need to be designed to achieve a certain compactness that can be easily installed in a confined area while reducing installation costs without inviting people.
【００１８】[0018]
【課題を解決するための手段】発明の開示
従って，本発明は，従来技術に起因する上記課題を留意
し，本発明の目的は，大量の有害ガスを処理するように
設計する同時に，高い処理効率及び近年のコンパクト化
傾向を共に実現する有害ガス浄化方法及びその装置を提
供することにある。DISCLOSURE OF THE INVENTION Accordingly, the present invention has been made in view of the above problems caused by the prior art, and an object of the present invention is to design a large amount of harmful gas while at the same time providing a high processing efficiency. It is an object of the present invention to provide a harmful gas purification method and an apparatus thereof that achieve both efficiency and the recent trend toward compactness.
【００１９】上記目的を達成するために，本発明は，有
害ガスの浄化法及び装置を提供する。本方法及び装置に
おいては，有害ガスは，複数のガス噴出管からタワー内
に充填されている浄化液の渦流に噴射される。かかる場
合には各ガス噴出管から噴射される有害ガスは，各ガス
噴出管の前方に位置する他のガス噴出管と衝突して，各
ガス噴出管のガス放出方向の略垂直方向にはね飛ばされ
る際に，微小サイズのガス気泡を形成する。ガス気泡は
浄化液の渦流と共に対流するので，ガスの有害物質をよ
り活発に浄化液中に吸収して溶解することができる。本
方法と装置においては，ガス気泡は，また，相互に衝突
するように導かれるので，ガスの有害物質をより活発に
浄化液中に吸収して溶解することが可能な付加的渦流が
形成される。In order to achieve the above object, the present invention provides a method and apparatus for purifying harmful gas. In the method and apparatus, the harmful gas is injected from the plurality of gas ejection pipes into the swirling flow of the cleaning liquid filled in the tower. In such a case, the harmful gas ejected from each gas ejection pipe collides with another gas ejection pipe located in front of each gas ejection pipe, and splashes in a direction substantially perpendicular to the gas ejection direction of each gas ejection pipe. When blown off, it forms gas bubbles of very small size. Since the gas bubbles convection with the vortex of the cleaning liquid, it is possible to more actively absorb and dissolve harmful substances in the gas into the cleaning liquid. In the method and apparatus, the gas bubbles are also directed to impinge on each other so that an additional vortex is formed which allows the harmful substances of the gas to be absorbed and dissolved in the cleaning liquid more actively. It
【００２０】[0020]
【発明の実施の形態】発明を実施するための最良な形態
図３は，本発明の好ましい実施例にかかるガスガス浄化
装置の図である。BEST MODE FOR CARRYING OUT THE INVENTION FIG. 3 is a diagram of a gas gas purifying apparatus according to a preferred embodiment of the present invention.
【００２１】図に示すように，本発明のガス浄化装置
は，浄化液が供給される浄化液タワー１を有する。オー
バフロータンク２は，タワー１内の下側中央部分に設置
され，タワー１内の浄化液の必要なレベルを維持するた
めに使用される。排水ポート３は，オーバフロータンク
２の周囲位置でタワー１の底部壁に形成され，予め設定
された量の浄化液を，タワー１から排水するために使用
される。複数の浄化液スプレイ管４が，タワー１内に規
則的に垂直に設置され，タワー１に浄化液をスプレイす
るために使用される。ポンプ５は，全ての浄化液スプレ
イ管４に接続され，強制的に，浄化液スプレイ管４に浄
化液を供給する。輪状のガス給送ダクト６は，タワー１
の側壁外部表面の周囲に形成される。複数のガス噴出管
７は，ガス供給ダクト６からタワー１内に放射状に内方
向に延びている。上記構成は，従来のガス浄化装置のも
の同様である。本発明の装置は，ガス噴出管７がタワー
１内の同一平面上に配置され，多層のガス噴出管配置を
形成する点に特徴がある。複数の上部及び下部ガス噴出
ノズル８，９は，各ガス噴出管７の側壁の２つの縦直線
に沿って規則的に形成される。本装置の処理において
は，各ガス噴出管７の上部及び下部ガス噴出ノズル８，
９は，有害ガスを各ガス噴出管７の前方にある他のガス
噴出管上に噴出し，そのガスは，ガスの噴出方向の略垂
直方向にはじき飛ばされる。かかる場合において，有害
ガスは，扇子の骨の形ではね飛ばされる。さらに，複数
の液体スプレイノズル１０は，各浄化液管４の側壁に，
多層のガス噴出管７の間の位置で形成される。As shown in the figure, the gas purification apparatus of the present invention has a purification liquid tower 1 to which the purification liquid is supplied. The overflow tank 2 is installed in the lower central portion of the tower 1 and is used to maintain a required level of the cleaning liquid in the tower 1. The drainage port 3 is formed on the bottom wall of the tower 1 around the overflow tank 2 and is used for draining a preset amount of the purification liquid from the tower 1. A plurality of cleaning liquid spray tubes 4 are regularly installed vertically in the tower 1 and used to spray the cleaning liquid on the tower 1. The pump 5 is connected to all the cleaning liquid spray tubes 4 and forcibly supplies the cleaning liquid spray tubes 4 with the cleaning liquid. The ring-shaped gas supply duct 6 is the tower 1
Formed around the outer surface of the sidewall. The plurality of gas ejection pipes 7 extend radially inward from the gas supply duct 6 into the tower 1. The above configuration is similar to that of the conventional gas purification device. The device of the present invention is characterized in that the gas ejection pipes 7 are arranged on the same plane in the tower 1 to form a multi-layer gas ejection pipe arrangement. The plurality of upper and lower gas ejection nozzles 8 and 9 are regularly formed along two vertical straight lines on the side wall of each gas ejection pipe 7. In the processing of this device, the upper and lower gas ejection nozzles 8 of each gas ejection pipe 7,
Numeral 9 ejects harmful gas onto another gas ejection pipe in front of each gas ejection pipe 7, and the gas is repelled in a direction substantially vertical to the ejection direction of the gas. In such a case, the harmful gas is blown off in the form of a fan bone. Further, the plurality of liquid spray nozzles 10 are provided on the side wall of each purification liquid pipe 4,
It is formed at a position between the multilayer gas ejection pipes 7.
【００２２】図４は，上記装置のガス浄化処理を示す図
である。FIG. 4 is a diagram showing a gas purification process of the above apparatus.
【００２３】図に示すように，ガス浄化液は，液体スプ
レイ管４からタワー１にスプレイされ，タワー１の渦流
を形成する。浄化液の渦流のため，ガス噴出管７から放
出される有害ガスは気泡になり，浄化液に渦巻かれ，従
来のガス浄化装置のものと同様の方法で吸収されて溶解
される。しかしながら，本発明の装置は，各ガス噴出管
７から放出される有害ガスが，各パイプ７の前方に配置
される他のパイプ７に衝突するように導かれ，各パイプ
７のガス噴射方向の略垂直方向にはじき飛ばされる点に
特徴がある。かかる場合には，ガスは扇子の骨の形では
ね飛ばされて，大量の数のガス気泡“Ａ”が浄化液中に
形成される。ガス気泡“Ａ”は，浄化液により形成され
た渦流に巻き込まれて，急速に破壊され，液体から破裂
される。ダイオキシンなどのガスの有害物質は，このよ
うにして浄化液中に吸収されて，溶解される。As shown in the figure, the gas purification liquid is sprayed from the liquid spray pipe 4 to the tower 1 to form a vortex flow of the tower 1. Due to the swirling flow of the cleaning liquid, the harmful gas discharged from the gas ejection pipe 7 becomes bubbles, is swirled by the cleaning liquid, and is absorbed and dissolved in the same manner as in the conventional gas cleaning device. However, in the device of the present invention, the harmful gas emitted from each gas jet pipe 7 is guided so as to collide with another pipe 7 arranged in front of each pipe 7, and the gas jet direction of each pipe 7 It is characterized in that it is repelled almost vertically. In such a case, the gas is splashed in the form of a fan bone and a large number of gas bubbles "A" are formed in the cleaning liquid. The gas bubble “A” is caught in the vortex flow formed by the cleaning liquid, is rapidly broken, and is burst from the liquid. Gas toxic substances such as dioxins are thus absorbed and dissolved in the cleaning liquid.
【００２４】本装置の処理においては，ガス気泡“Ａ”
は，さらに互いに衝突するように導かれるので，ガス気
泡“Ａ”はより効果的に破壊される。In the processing of this apparatus, gas bubbles "A"
Are further guided to collide with each other, so that the gas bubbles "A" are destroyed more effectively.
【００２５】本発明の装置は，ガス噴出管７から噴射さ
れる有害ガスが，より効果的に，及びより急速に浄化液
中に吸収され，溶解することができる。このことは，最
終的に，タワー１の大きさを拡大することなく，浄化液
タワー１内に必要な数のガス噴出管７を設置することが
できる。従って，本発明の装置に関して，ガス浄化効率
は著しく改善され，ガス浄化量も高めることができる。In the device of the present invention, the harmful gas injected from the gas injection pipe 7 can be absorbed and dissolved in the cleaning liquid more effectively and more rapidly. This means that finally, the required number of gas ejection pipes 7 can be installed in the purified liquid tower 1 without increasing the size of the tower 1. Therefore, regarding the apparatus of the present invention, the gas purification efficiency is significantly improved and the gas purification amount can be increased.
【００２６】有害物質が含まれる浄化液は，液体スプレ
イ管４からの液の連続噴射により，タワー１内のレベル
が徐々に上昇すると，オーバフロータンク２に流入す
る。Purified liquid containing harmful substances flows into the overflow tank 2 when the level in the tower 1 gradually rises due to continuous injection of liquid from the liquid spray pipe 4.
【００２７】オーバフロータンク２に流入された液は，
その後，タンク２の底部に設置された第１の排水バルブ
の制御下でタンク２から排出され，タワー１内で予め設
定された液体レベルを維持することができる。他方で
は，タワー１内の液体レベルが極めて高い場合には，排
水ポート３が第２の排水バルブにより好適に開放され，
タワー１から必要量の液を排出し，タワー１内で好適な
液体レベルの液体が維持される。かかる排水バルブの操
作は，従来のレベルセンサにより自動的に制御すること
もできる。The liquid flowing into the overflow tank 2 is
After that, the liquid can be discharged from the tank 2 under the control of the first drain valve installed at the bottom of the tank 2, and the preset liquid level can be maintained in the tower 1. On the other hand, when the liquid level in the tower 1 is extremely high, the drainage port 3 is preferably opened by the second drainage valve,
The required amount of liquid is discharged from the tower 1, and the liquid having a suitable liquid level is maintained in the tower 1. The operation of such a drain valve can also be automatically controlled by a conventional level sensor.
【００２８】本発明の装置の処理においては，可溶性の
有害物質は，各ガス噴出管７から噴射される際，及びガ
ス気泡“Ａ”を形成するための他のパイプ７との衝突に
導かれて扇子の骨の形ではね飛ばされる際に，容易に浄
化液中に溶解され，タワー１内の液の渦流共に循環す
る。他方では，非可溶性有害物質あるいは塵は，上記と
同様の工程を介して処理される際に液中に吸収される。
可溶性あるいは非可溶性の有害物質は，浄化液によりガ
スから除去され，液と共にタワー１から排出される。か
かる有害物質あるいは塵が除去されたガスは，タワー１
内を上昇して大気中に排出される。In the treatment of the device according to the invention, soluble noxious substances are introduced as they are jetted from each gas jet 7 and in collisions with other pipes 7 for forming gas bubbles "A". When blown off in the form of a fan blade, it is easily dissolved in the cleaning liquid and circulates with the swirling flow of the liquid in the tower 1. On the other hand, non-soluble toxic substances or dust are absorbed in the liquid when they are processed through the same process as above.
Soluble or insoluble harmful substances are removed from the gas by the cleaning liquid and discharged from the tower 1 together with the liquid. The gas from which such harmful substances or dust has been removed is the tower 1
It rises inside and is discharged into the atmosphere.
【００２９】本発明の装置と方法は，ガスからダイオキ
シン，亜硫酸ガス及び塵などの有害物質を取り除いて，
排気ガスを浄化し，浄化ガスを大気中に排出する。本発
明の装置及び方法は，焼却システムあるいはクリーンル
ームに対する清浄空気供給システムで使用されるのが好
ましい。The apparatus and method of the present invention removes harmful substances such as dioxin, sulfurous acid gas and dust from gas,
Purifies exhaust gas and discharges the purified gas into the atmosphere. The apparatus and method of the present invention is preferably used in an incineration system or a clean air supply system for a clean room.
【００３０】本発明においては，ガス噴出管７を近接し
て配置するのが好ましく，このようパイプ７の近接配置
はガスの跳ね角度を拡大し，各ガス噴出管７から噴出し
たガスが他のパイプ７への衝突に導かれた際に，タワー
１内でより効果的に小さいサイズのガス気泡“Ａ”を形
成するからである。In the present invention, it is preferable that the gas ejection pipes 7 are arranged close to each other. In this way, the arrangement of the pipes 7 close to each other expands the splash angle of gas so that the gas ejected from each gas ejection pipe 7 is This is because gas bubbles “A” having a small size are formed more effectively in the tower 1 when the gas bubbles “A” are guided to the pipe 7.
【００３１】実験によれば，タワー１内のガス噴出管７
を，パイプ７間の間隔２０ｍｍ−２５ｍｍで形成するの
が好ましい。かかるパイプ７間の間隔は，ガス跳ね角度
を最大にして，タワー１内のガス気泡“Ａ”を最も効果
的に形成する。 本発明の好ましい実施例においては，
水を浄化液として使用するのが好ましい。ダイオキシン
が効果的に浄化液中に吸収されるためには，液化活性炭
素を浄化液として使用するのがより好ましい。有機物質
が含まれる有害ガスを浄化する場合には，浄化液中にパ
ラフィンを加えるのが好ましい。簡単な説明では，本発
明のガス浄化方法及び装置は，浄化液の成分及び構成を
変えることにより，様々な有害物質で汚染されるガスを
処理するために使用されるのが好ましい。According to the experiment, the gas ejection pipe 7 in the tower 1
Is preferably formed with a space between the pipes 7 of 20 mm-25 mm. The spacing between the pipes 7 maximizes the gas splash angle and most effectively forms gas bubbles "A" in the tower 1. In a preferred embodiment of the invention,
Preference is given to using water as cleaning liquid. In order for dioxin to be effectively absorbed in the cleaning liquid, it is more preferable to use liquefied activated carbon as the cleaning liquid. When purifying harmful gases containing organic substances, it is preferable to add paraffin to the purification liquid. Briefly, the gas purification method and apparatus of the present invention is preferably used to treat gases contaminated with various harmful substances by altering the composition and composition of the purification liquid.
【００３２】上記のように，本発明は，有害ガスの浄化
方法及び装置を提供する。本装置の処理においては，有
害ガスは，タワー内の浄化液中に液の渦流と同一方向に
噴出され，形成されたガス気泡は渦流と共に対流し，破
壊される。本装置は，有害ガスが浄化液と接触させる時
間を増大させるので，ガス浄化効率が改善される。As described above, the present invention provides a method and apparatus for purifying harmful gas. In the process of this device, the harmful gas is jetted into the cleaning liquid in the tower in the same direction as the swirl of the liquid, and the gas bubbles formed are convected with the swirl and destroyed. This device improves the gas purification efficiency because it increases the time during which the harmful gas comes into contact with the cleaning liquid.
【００３３】本発明の装置においては，有害ガスが各ガ
ス噴出管から各ガス噴出管の前方に配置される他のガス
噴出管に向けて噴出され，形成された微小サイズのガス
気泡が各ガス噴射管の噴出方向の略垂直方向にはね飛ば
される。かかる場合においては，ガス気泡は，扇子の骨
の形ではね飛ばされる。かかるガス気泡は，また，互い
に衝突するように導かれ，さらに，タワー内の液の渦流
を活発化し，活発化した渦流と共に対流する。ガス気泡
は，このように，より急速に破壊される。このことによ
り，最終的に，ダイオキシンや塵などのガスの有害物質
が，より効果的に吸収され溶解することができる。本発
明の方法及び装置は，かかるダイオキシンや塵（従来の
ガス浄化装置により浄化することが困難であったダイオ
キシンや塵）をより効果的に除去する。本発明の方法及
び装置の他の利点は，大量の有害ガスを処理することが
できると同時に，高い処理効率及び近年のコンパクト化
傾向を実現する点にある。In the apparatus of the present invention, harmful gas is ejected from each gas ejection pipe toward another gas ejection pipe arranged in front of each gas ejection pipe, and minute gas bubbles formed are formed in each gas ejection pipe. It is splashed in a direction substantially perpendicular to the jetting direction of the jet pipe. In such a case, the gas bubbles are repelled in the form of a fan bone. The gas bubbles are also guided so as to collide with each other, and further activate the vortex flow of the liquid in the tower, and convect with the activated vortex flow. The gas bubbles are thus destroyed more rapidly. As a result, finally, harmful substances such as dioxins and dust can be absorbed and dissolved more effectively. The method and apparatus of the present invention more effectively remove such dioxin and dust (dioxin and dust that have been difficult to purify by conventional gas purifiers). Another advantage of the method and apparatus of the present invention is that they can treat large amounts of harmful gases while at the same time achieving high treatment efficiency and the recent trend toward compactness.
【００３４】本発明の好ましい実施例を説明の目的のた
めに開示したが，従属請求項に開示するように，本発明
の範囲及び精神から離れることなく，当業者は，各種の
修正，追加及び変更が可能である。
［図面の簡単な説明］図面の簡単な説明
本発明の上記及び他の目的，特徴及び他の利点は，添付
図面と関連付けられる以下の詳細な説明によりより明確
に理解されるであろう。While the preferred embodiment of the invention has been disclosed for purposes of illustration, those skilled in the art will appreciate that various modifications, additions and changes may be made without departing from the scope and spirit of the invention as disclosed in the dependent claims. It can be changed. BRIEF DESCRIPTION OF THE DRAWINGS The above and other objects, features and other advantages of the invention will be more clearly understood by the following detailed description in connection with the accompanying drawings.
【図１】図１は，従来のガス浄化装置の断面図である；FIG. 1 is a cross-sectional view of a conventional gas purification device;
【図２】図２は，図１の装置をガス浄化処理を示す斜視
図ある；FIG. 2 is a perspective view showing the gas purification process of the apparatus of FIG. 1;
【図３】図３は，本発明の好ましい実施形態にかかるガ
ス浄化装置の断面図である；FIG. 3 is a cross-sectional view of a gas purification device according to a preferred embodiment of the present invention;
【図４】図４は，図３の装置のガス浄化処理を示す図で
ある；及び4 is a diagram showing a gas purification process of the apparatus of FIG. 3; and
【図５】図５は，図３の装置の平面図である。5 is a plan view of the device of FIG.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ // Ｃ０７Ｄ 319/24 Ｂ０１Ｄ 53/34 ＺＡＢ (58)調査した分野(Int.Cl.7，ＤＢ名) B01D 53/14 - 53/18 B01D 53/34 - 53/85 B01J 10/00 B01F 1/00 - 5/26 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 7 identification code FI // C07D 319/24 B01D 53/34 ZAB (58) Fields investigated (Int.Cl. 7 , DB name) B01D 53/14- 53/18 B01D 53/34-53/85 B01J 10/00 B01F 1/00-5/26
Claims (5)
ガス噴出管から噴出された有害ガスが各ガス噴出管の前
方に配置された他のガス噴出管に衝突するように導かれ
るように，タワー内に充填された浄化液の渦流に噴出
し，従って，各ガス噴出管の噴出方向の略垂直方向には
ね飛ばされて，微小サイズのガス気泡を形成し，前記ガ
ス気泡は，前記浄化液の渦流と共に対流し，従って，ガ
スの有害物質が前記浄化液中に活発に吸収及び溶解す
る，工程を有することを特徴とする有害ガスの浄化方
法。1. The harmful gas is guided from a plurality of gas ejection pipes so that the harmful gas ejected from each gas ejection pipe collides with another gas ejection pipe arranged in front of each gas ejection pipe. Then, the gas is ejected into the vortex of the purifying liquid filled in the tower, and is thus splashed in a direction substantially perpendicular to the ejection direction of each gas ejection pipe to form a gas bubble of a minute size. A method for purifying harmful gas, comprising the step of convection with the swirling flow of the cleaning liquid, and thus actively absorbing and dissolving harmful substances in the gas in the cleaning liquid.
導かれ，従って，ガスの有害物質が前記浄化液中により
活発に吸収及び溶解することが可能な付加的な渦流を形
成する，ことを特徴とする請求項１に記載の有害ガスの
浄化方法。2. The gas bubbles are guided to collide with each other, thus forming an additional vortex in which the harmful substances of the gas can be more actively absorbed and dissolved in the cleaning liquid. The method for purifying harmful gas according to claim 1, which is characterized in that.
央位置に設置され，タワー内の必要な浄化液レベルを維
持するために使用されるオーバフロータンクと，前記タ
ワーの底部壁に形成され，予め設定された浄化液量をタ
ワーから排水するために使用される排水ポートと，前記
タワー内に規則的に垂直に設置され，浄化液をタワー内
にスプレイするために使用される複数の浄化液スプレイ
管と，全ての液体スプレイ管と接続され、浄化液を浄化
液スプレイ管に供給するための液体ポンプと，タワーの
側壁外部の周囲に形成される輪状の供給ダクトと，及
び，ガス供給ダクトからタワー内に放射状に内部方向に
延びており，有害ガスをタワー内の浄化液の渦流に噴出
するために使用される，複数のガス噴出管と，を有する
有害ガスの浄化装置であって，前記ガス噴出管は，タワ
ー内の少なくとも１つの水平面上に配置され，前記各ガ
ス噴出管の側壁の２つの縦直線に沿って規則的に形成さ
れる複数の上部及び下部ガス噴出ノズルを有し，各ガス
噴出ノズルの上部及び下部ノズルは，各ガス噴出管の前
方に配置されて，有害ガスを他のガス噴出管上に噴出
し，有害ガスが各ガス噴出管のガス噴出方向の略垂直方
向にはね飛ばされる，ことを特徴とする，有害ガスの浄
化装置。3. A cleaning liquid tower, an overflow tank installed in the lower central position in the tower and used to maintain a required cleaning liquid level in the tower, and a bottom wall of the tower, A drainage port used for draining a preset amount of cleaning liquid from the tower, and a plurality of cleaning liquids regularly installed in the tower and used for spraying the cleaning liquid into the tower. A spray pipe, a liquid pump connected to all the liquid spray pipes, for supplying the cleaning liquid to the cleaning liquid spray pipe, a ring-shaped supply duct formed around the outside of the side wall of the tower, and a gas supply duct. Is a device for purifying harmful gas, which has a plurality of gas ejection pipes, which extend radially inward from the to the inside of the tower, and are used to eject harmful gas into the swirling flow of the cleaning liquid in the tower. The gas ejection pipes are arranged on at least one horizontal plane in the tower, and a plurality of upper and lower gas ejection nozzles are regularly formed along the two vertical straight lines of the sidewalls of the gas ejection pipes. The upper and lower nozzles of each gas ejection nozzle are arranged in front of each gas ejection pipe, ejecting harmful gas onto another gas ejection pipe, and the harmful gas ejecting direction of each gas ejection pipe. A device for purifying harmful gas, which is characterized by being splashed in a substantially vertical direction.
水平面上に配置され，従って，多層ガス噴出管が形成さ
れ，ガス噴出管から噴出されたガス気泡は，互いに衝突
するように導かれて，付加的な渦流を形成する，ことを
特徴とする，請求項３に記載の有害ガスの浄化装置。4. The gas ejection pipes are arranged on two or more horizontal planes in the tower, so that a multi-layer gas ejection pipe is formed and the gas bubbles ejected from the gas ejection pipes are guided so as to collide with each other. The device for purifying harmful gas according to claim 3, wherein the device is formed to generate an additional vortex.
たガス噴出管の間の位置に複数の液体スプレイノズルを
有する，ことを特徴とする，請求項３に記載の有害ガス
の浄化装置。5. The harmful gas purifying apparatus according to claim 3, wherein the cleaning liquid spray pipe has a plurality of liquid spray nozzles at positions between horizontally arranged gas ejection pipes.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1999/2785 | 1999-01-28 | ||
| KR1019990002785A KR100274815B1 (en) | 1999-01-28 | 1999-01-28 | Purification method of contaminated gases by dioxin and detrimental gas and the device thereof |
| PCT/KR2000/000054 WO2000044473A1 (en) | 1999-01-28 | 2000-01-25 | Purification method of contaminated gases by dioxin and detrimental gas and the device therefor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002535126A JP2002535126A (en) | 2002-10-22 |
| JP3372246B2 true JP3372246B2 (en) | 2003-01-27 |
Family
ID=19572658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000595765A Expired - Fee Related JP3372246B2 (en) | 1999-01-28 | 2000-01-25 | Method and apparatus for purifying harmful gases containing harmful substances such as dioxin |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP3372246B2 (en) |
| KR (1) | KR100274815B1 (en) |
| AU (1) | AU2329500A (en) |
| WO (1) | WO2000044473A1 (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100356315B1 (en) * | 2000-05-25 | 2002-10-19 | 박세준 | Air cleaning system |
| KR20020069428A (en) * | 2001-02-26 | 2002-09-04 | 아니코산업 주식회사 | Pollutant Gas Spray Apparatus for Purifying Pollutant Gases |
| KR20040048575A (en) * | 2002-12-04 | 2004-06-10 | 강성일 | Air cleaner using aqua filter and screw flow |
| KR100589788B1 (en) * | 2004-11-08 | 2006-06-19 | 주식회사 대우일렉트로닉스 | Water washing type air cleaner |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR910002321Y1 (en) * | 1987-06-03 | 1991-04-11 | 문홍식 | Fixing apparatus in arms of doorcloser |
| US5592609A (en) * | 1994-10-31 | 1997-01-07 | Nintendo Co., Ltd. | Video game/videographics program fabricating system and method with unit based program processing |
| JP3369829B2 (en) * | 1996-01-17 | 2003-01-20 | 花王株式会社 | Moisture measurement device |
-
1999
- 1999-01-28 KR KR1019990002785A patent/KR100274815B1/en not_active IP Right Cessation
-
2000
- 2000-01-25 AU AU23295/00A patent/AU2329500A/en not_active Abandoned
- 2000-01-25 WO PCT/KR2000/000054 patent/WO2000044473A1/en active Application Filing
- 2000-01-25 JP JP2000595765A patent/JP3372246B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR20000012164A (en) | 2000-03-06 |
| JP2002535126A (en) | 2002-10-22 |
| AU2329500A (en) | 2000-08-18 |
| WO2000044473A1 (en) | 2000-08-03 |
| KR100274815B1 (en) | 2000-12-15 |
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