WO2022083613A1 - Horizontal gas treatment device - Google Patents

Horizontal gas treatment device Download PDF

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Publication number
WO2022083613A1
WO2022083613A1 PCT/CN2021/124864 CN2021124864W WO2022083613A1 WO 2022083613 A1 WO2022083613 A1 WO 2022083613A1 CN 2021124864 W CN2021124864 W CN 2021124864W WO 2022083613 A1 WO2022083613 A1 WO 2022083613A1
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Prior art keywords
gas
processing chamber
horizontal
liquid
processing
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PCT/CN2021/124864
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French (fr)
Chinese (zh)
Inventor
宋斐
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绿岸壹号(廊坊)环保设备有限公司
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Publication of WO2022083613A1 publication Critical patent/WO2022083613A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact

Definitions

  • the invention relates to the technical field of gas treatment, in particular to a horizontal gas treatment device.
  • a horizontal gas treatment device that overcomes the above problems or at least partially solves the above problems.
  • An object of the present invention is to provide a horizontal gas treatment device that can reduce space occupation and facilitate layout.
  • a further object of the present invention is to ensure the smooth discharge of the liquid through the inclined design of the bottom of the processing chamber.
  • a horizontal gas treatment device comprising:
  • the casing encloses a flat processing chamber, wherein the ratio of the maximum horizontal dimension of the processing chamber to the height of the processing chamber is in the range of 1:1 to 8:1;
  • a gas inlet disposed in the lower portion of the processing chamber, configured to allow gas to enter the processing chamber through the gas inlet so that the gas flows upwardly after entering the processing chamber to contact the liquid within the processing chamber to process;
  • a gas outlet in communication with the processing chamber, is configured to allow the processed gas to be discharged from the gas outlet.
  • the processing chamber is square; and
  • the width of the processing chamber is 2.5 meters to 5 meters, the ratio of the length to the height of the processing chamber is (1-8): 1, and the ratio of the width to the height of the processing chamber is (1-3): 1 .
  • the width of the processing chamber is 2.5 meters to 3.5 meters.
  • the horizontal gas treatment device further includes a liquid outlet arranged at the bottom of the treatment chamber.
  • the bottom of the processing chamber is inclined relative to the horizontal plane
  • the liquid outlet is provided at the lowest position of the bottom of the processing chamber.
  • the bottom plate of the housing has a horizontal lower surface and an upper surface inclined relative to the horizontal, thereby forming an inclined bottom of the processing chamber.
  • the bottom plate of the casing is in the shape of a plate with parallel upper and lower surfaces, and the bottom plate is inclined relative to the horizontal plane, thereby forming an inclined bottom of the processing chamber.
  • the horizontal gas treatment device further includes a liquid inlet for feeding the liquid into the treatment chamber.
  • the liquid inlet includes a nozzle extending into the interior of the processing chamber, the nozzle being used to spray the liquid.
  • the horizontal gas treatment device further includes a first baffle plate disposed in the treatment chamber and above the nozzle, and a plurality of through holes are disposed on the first baffle plate.
  • the first separator is configured to place a solid particulate treatment agent thereon to participate in the gas-liquid reaction.
  • the horizontal gas treatment device further includes a second baffle plate disposed in the treatment chamber and below the nozzle, and a plurality of through holes are disposed on the second baffle plate.
  • the second separator is configured to place a solid particulate treatment agent thereon to participate in the gas-liquid reaction.
  • the horizontal gas treatment device further includes at least one manhole disposed on the side wall of the treatment chamber.
  • a flat processing chamber is formed by enclosing the casing, and the ratio of the maximum horizontal dimension of the processing chamber to the height of the processing chamber is in the range of 1:1 to 8:1.
  • the bottom of the processing chamber is inclined relative to the horizontal plane, and the liquid outlet of the gas processing device is set at the lowest position of the bottom of the processing chamber.
  • FIG. 1 shows a schematic front view of a horizontal gas processing device according to an embodiment of the present invention
  • FIG. 2 shows a schematic front cross-sectional view of a horizontal gas processing device according to an embodiment of the present invention
  • FIG. 3 shows a schematic left cross-sectional view of a horizontal gas processing apparatus according to an embodiment of the present invention.
  • FIG. 1 shows a schematic front view of a horizontal gas processing apparatus 100 according to an embodiment of the present invention.
  • FIG. 2 shows a schematic front cross-sectional view of a horizontal gas processing apparatus 100 according to an embodiment of the present invention.
  • FIG. 3 shows a schematic left cross-sectional view of a horizontal gas processing apparatus 100 according to an embodiment of the present invention.
  • the horizontal gas processing device 100 may generally include a housing 1 , a gas inlet 3 and a gas outlet 4 .
  • the casing 1 encloses a flat processing chamber 2, and the ratio of the maximum horizontal dimension of the processing chamber 2 to the height of the processing chamber 2 is in the range of 1:1 to 8:1.
  • the maximum horizontal dimension of the processing chamber 2 refers to the maximum distance between any two points on the contour line of the horizontal section of the processing chamber 2 .
  • the horizontal section of the processing chamber 2 is circular, its maximum horizontal dimension is the diameter length of the circle; if the horizontal section of the processing chamber 2 is a rectangle, its maximum horizontal dimension is the length of the rectangle; If the horizontal section is a regular hexagon, its maximum horizontal dimension is the diagonal length of the regular hexagon.
  • the shape of the processing chamber 2 enclosed by the casing 1 can be selected according to actual application requirements, such as square, cylindrical, etc., which is not limited in the present invention.
  • the gas inlet 3 is provided in the lower part of the processing chamber 2 .
  • the lower part of the processing chamber 2 here may refer to the lower half of the processing chamber 2 in the vertical direction, in particular, may refer to the bottom 21 of the processing chamber 2 and its adjacent area, for example, as shown in FIG. 1 , the gas inlet 3 It is arranged on the side wall of the processing chamber 2 at a position close to the bottom 21 of the processing chamber 2 .
  • the positions of the gas inlets 3 shown in FIG. 1 are only schematic, and the gas inlets 3 may also be arranged at other suitable positions in the processing chamber 2 .
  • the gas can enter the processing chamber 2 through the gas inlet 3 so that the gas flows upward after entering the processing chamber 2 to contact the liquid in the processing chamber 2 for processing.
  • the liquid herein can be a liquid used for treating gas, such as an absorption liquid (specifically, water) and the like.
  • the gas outlet 4 communicates with the processing chamber 2 to allow the processed gas to be discharged from the gas outlet 4 .
  • the gas outlet 4 may be provided at a position above the gas inlet 3 of the processing chamber 2 .
  • the gas outlet 4 may be provided at the top of the processing chamber 2 .
  • the gas outlet 4 can also be arranged at other suitable positions in the processing chamber 2.
  • the gas outlet 4 can also be arranged on the side wall above the gas inlet 3 of the processing chamber 2.
  • the gas inlet 3 and The gas outlet 4 may be located on the same side of the processing chamber 2, or may be located on different sides of the processing chamber 2, which is not specifically limited in the present invention.
  • a flat processing chamber 2 is formed by the casing 1, and the ratio of the maximum horizontal dimension of the processing chamber 2 to the height of the processing chamber 2 is 1:1 to 8 :1 range.
  • the processing chamber 2 may be square. Specifically, the horizontal cross section of the processing chamber 2 is rectangular. In this case, the maximum horizontal dimension of the processing chamber 2 is the length of the processing chamber 2 (i.e. the length of the rectangular horizontal section of the processing chamber 2), so the ratio of the length of the processing chamber 2 to its height is 1:1 to 8: In the range of 1, i.e. (1-8):1. Further, the ratio of the width of the processing chamber 2 (ie the width of the rectangular horizontal section of the processing chamber 2 ) to its height may be in the range of 1:1 to 3:1, ie (1-3):1.
  • the design structure of the square processing chamber 2 that is, the square shell 1 ) is stable and easy to process.
  • the width of the processing chamber 2 can be designed to be in the range of 2.5 meters to 5 meters, such as 2.5 meters, 3 meters, 3.5 meters, 4 meters, 4.5 meters, 5 meters, and the like.
  • the width of the processing chamber 2 can be designed in the range of 2.5 meters to 3.5 meters.
  • the horizontal gas processing device 100 may further include a liquid outlet 5 disposed at the bottom 21 of the processing chamber 2 for discharging the liquid flowing down to the bottom 21 of the processing chamber 2 .
  • the liquid outlet 5 may be an overflow groove.
  • the liquid discharged through the liquid outlet 5 can be confluent to the liquid storage tank for recycling (or after regeneration).
  • the number of the liquid outlet 5 can be one or more, which can be set according to actual application requirements.
  • the number of the liquid outlet ports 5 shown in the figure is only illustrative, and the present invention does not specifically limit it.
  • the bottom 21 of the processing chamber 2 may be inclined relative to the horizontal plane. Specifically, for example, the bottom 21 of the processing chamber 2 slopes downward from one side to the other, or the bottom 21 of the processing chamber 2 slopes downward from opposite sides to a central position, and so on.
  • the liquid outlet 5 is provided at the lowest position of the bottom 21 of the processing chamber 2 .
  • the liquid outlet 5 is provided on the lower side of the bottom 21 of the processing chamber 2 .
  • the liquid outlet 5 is arranged at the central position of the bottom 21 of the processing chamber 2 .
  • the aforementioned inclined design of the bottom 21 of the processing chamber 2 can be realized in various ways. Two of the methods are described below.
  • the bottom plate 11 of the housing 1 has a horizontal lower surface and an upper surface inclined relative to the horizontal plane, thereby forming the inclined bottom 21 of the processing chamber 2 . That is, the bottom plate 11 of the casing 1 is in a plate shape with uneven thickness, and the inclined design of the bottom 21 of the processing chamber 2 is realized by the inclination angle of the upper surface of the bottom plate 11 of the casing 1 . In this way, the outer surface of the bottom plate 11 of the housing 1 is horizontal, which is beneficial to keep the horizontal gas treatment device 100 horizontal, and makes the installation of the horizontal gas treatment device 100 more convenient.
  • the bottom plate 11 of the housing 1 is in the shape of a plate with parallel upper and lower surfaces, and the bottom plate 11 is inclined relative to the horizontal plane, thereby forming the inclined bottom 21 of the processing chamber 2 . That is to say, the bottom plate 11 of the housing 1 is in the shape of a plate with uniform thickness, and the bottom 21 of the processing chamber 2 is designed to be inclined by slanting the bottom plate 11 relative to the horizontal plane. In this way, the processing of the bottom plate 11 is more convenient.
  • the horizontal gas processing device 100 may further include a liquid inlet 6 for feeding the aforementioned liquid into the processing chamber 2 .
  • the number of the liquid inlets 6 can be one or more (specifically, two), which can be set according to actual application requirements.
  • the liquid inlet 6 may include a nozzle 61 extending into the interior of the processing chamber 2 for spraying the aforementioned liquid.
  • the nozzle 61 may extend into the interior of the treatment chamber 2 through a liquid infusion tube.
  • the number of nozzles 61 may be multiple, and the multiple nozzles 61 are distributed in an array, for example, in one or more rows with uniform intervals.
  • the horizontal gas treatment device 100 may further include the first partition plate 7 .
  • the first partition plate 7 is disposed in the processing chamber 2 above the nozzle 61 , and a plurality of through holes 71 are formed on the first partition plate 7 .
  • the first partition 7 may be arranged horizontally in the processing chamber 2 , so that the first partition 7 may partition the processing chamber 2 into a first region communicating with the gas inlet 3 and a second region communicating with the gas outlet 4 area.
  • the nozzles 61 are located in the first area and spray liquid facing the first partition 7 .
  • the ejected liquid may be in the form of droplets, liquid columns, jets, and the like.
  • the liquid sprayed by the nozzle 61 can reach the top of the first separator 7 through the through hole 71 , and then falls onto the first separator 7 and then accumulates to form a liquid pool.
  • the gas entering the processing chamber 2 from the gas inlet 3 generates bubbles into the liquid pool through the through hole 71, so that the gas and the liquid are fully mixed and contacted to process the gas (eg, mixing, removing impurities, etc.).
  • the liquid above the first separator 7 also percolates downward through the through holes 71 , and finally flows down to the bottom 21 of the processing chamber 2 .
  • the distribution of the through holes 71 shown in FIG. 2 and FIG. 3 is only schematic. In practical applications, the through holes 71 may be uniformly distributed on the first separator 7 or distributed in different densities. Different areas of the first partition 7 can be set according to actual application requirements.
  • a wire mesh can be used for the first separator 7 , and the through holes 71 of the first separator 7 are formed by the meshes of the wire mesh.
  • the size of the air bubbles generated by the gas passing through the through holes 71 ie, the mesh holes of the wire mesh
  • a wire mesh with a mesh size of microns can be used as the first separator 7. In this way, the gas can generate micron-scale bubbles through the mesh of the wire mesh and enter the liquid pool, greatly improving the gas flow rate. Liquid mixing effect.
  • the first separator 7 may also be configured to place solid particulate treatment agents thereon, and these solid particulate treatment agents will participate in the gas-liquid reaction to achieve gas treatment.
  • the present invention does not specifically limit the shape and size of the solid granular treatment agent, as long as the particle size of the treatment agent can ensure that the treatment agent will not fall from the through hole 71 .
  • the type of solid particulate treatment agent can be selected according to the type of gas treatment.
  • the solid particulate treatment agent may include limestone particles, magnesium ore particles, and the like.
  • the horizontal gas processing device 100 may further include a second partition (not shown in the figure).
  • the second partition is arranged in the processing chamber 2 and is located below the nozzle 61 , and a plurality of through holes are arranged on the second partition.
  • the liquid sprayed by the nozzle 61 can flow down to the second partition plate under the action of gravity to form a liquid pool with a relatively stable depth.
  • the second separator can be completely the same as the first separator 7 , and of course, can also be different from the first separator 7 .
  • the second separator can also be configured to place the solid particulate treatment agent thereon to participate in the gas-liquid reaction.
  • the solid granular treatment agent placed on the second separator can be the same as the solid granular treatment agent on the first separator 7, and will not be described further.
  • the first separator 7 and the second separator can be set either, that is, only the first separator 7 or only the second separator can be set; the first separator 7 and the second separator can also be set at the same time.
  • Two separators that is, two layers of separators are provided.
  • the horizontal gas treatment device 100 may be provided with multiple layers of separators and multiple nozzles, wherein the separators and nozzles are alternately arranged, that is, from top to bottom in the vertical direction, one layer of A layer of nozzles and a second layer of partitions are arranged in turn.
  • the horizontal gas processing device 100 may further include at least one manhole 8 disposed on the side wall of the processing chamber 2 .
  • the arrangement of the manhole 8 facilitates the inspection and maintenance of the internal structure of the horizontal gas processing device 100 by the staff.
  • the number, shape and position of the manholes 8 shown in FIG. 1 are only schematic. In practical applications, the number, shape and position of the manholes 8 can be set according to actual requirements. In addition, in the case of multiple manholes 8, the shape and size of each manhole 8 can also be independently set according to actual application requirements.
  • the horizontal gas treatment device 100 may further include a mist eliminator (not shown in the figure).
  • the mist eliminator can be arranged at the gas outlet 4, or connected to the gas outlet 4 through an air duct.
  • the mist eliminator has rotatable vanes by which droplets entrained in the gas discharged from the gas outlet 4 are removed.
  • the mist eliminator may be a motor-driven fan (eg, an axial fan, a centrifugal fan, or a mixed flow fan).
  • the blades of the fan are driven to rotate by the motor to suck the gas in the processing chamber 2 and discharge it from the gas outlet 4 .
  • the fan can remove the droplets in the gas through the rotating blades, and on the other hand, it can also act as a power device for driving the gas flow. Power equipment in one.
  • the mist eliminator can be an impeller driven by airflow, that is, the impeller does not have a power drive mechanism (such as an electric drive mechanism or a mechanical drive mechanism, etc.), and the blades of the impeller are driven by the airflow. free spins.
  • the horizontal gas processing device 100 may further include a gas driving element (not shown in the figure) disposed at the gas inlet 3 for driving the gas from the gas inlet 3 into the processing chamber 2 and from the gas outlet 4 out to form the airflow that drives the blades of the impeller to rotate.
  • the gas driving element can be, for example, a fan, by blowing the gas, the driving gas enters the process chamber 2 from the gas inlet 3 and is discharged from the gas outlet 4 .
  • the embodiments of the present invention can achieve the following beneficial effects:
  • a flat processing chamber is formed by enclosing the casing, and the ratio of the maximum horizontal dimension of the processing chamber to the height of the processing chamber is in the range of 1:1 to 8:1.
  • the bottom of the processing chamber is inclined relative to the horizontal plane, and the liquid outlet of the gas processing device is set at the lowest position of the bottom of the processing chamber.

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
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Abstract

A horizontal gas treatment device, comprising: a housing, which encloses a flat treatment chamber, with the ratio of the maximum horizontal size of the treatment chamber to the height of the treatment chamber being in a range of 1:1 to 8:1; a gas inlet, which is provided at the lower portion of the treatment chamber and is configured to allow gas to enter the treatment chamber via the gas inlet, such that the gas flows upwards after entering the treatment chamber so as to come into contact with a liquid in the treatment chamber to perform treatment; and a gas outlet, which is in communication with the treatment chamber and is configured to allow the treated gas to be discharged via the gas outlet. The design of the flat treatment chamber on the one hand increases the amount of gas passing through the horizontal section, and on the other hand, slows down the upward flowing speed of a gas flow, which ensures the contact time of the gas and the liquid in the treatment chamber, so as to reduce the space occupied by the gas treatment device to facilitate the layout thereof while ensuring the treatment effect of the gas.

Description

一种卧式气体处理装置A horizontal gas treatment device 技术领域technical field
本发明涉及气体处理技术领域，特别是一种卧式气体处理装置。The invention relates to the technical field of gas treatment, in particular to a horizontal gas treatment device.
背景技术Background technique
经济增长引起的能源需求的增加导致了大气污染物的产生，使众多领域(如火电、钢铁、化工等)的治理问题日益突出，因此，对气体处理技术的需求也日益增长。在工业废气(如锅炉排气等)净化领域，现有技术中通常使用塔式设备(如脱硫塔等)对工业废气进行脱硫、脱硝、除尘等处理。为了使待处理气体与处理液充分接触以保证处理效果，现有技术的塔式设备通常设计得较高，需占用的空间较大，设备布局受限。并且，对于高度较大的塔式设备，其配套的支撑固定和维护设施的要求也较高，增加了成本。The increase in energy demand caused by economic growth has led to the production of air pollutants, and the governance problems in many fields (such as thermal power, steel, chemical industry, etc.) have become increasingly prominent. Therefore, the demand for gas treatment technology is also increasing. In the field of purification of industrial waste gas (such as boiler exhaust gas, etc.), tower-type equipment (such as desulfurization tower, etc.) is usually used in the prior art to perform desulfurization, denitration, dust removal and other treatments on industrial waste gas. In order to make the gas to be treated and the treatment liquid fully contacted to ensure the treatment effect, the tower equipment in the prior art is usually designed to be taller, which requires a larger space to be occupied, and the equipment layout is limited. In addition, for tower equipment with a larger height, the requirements for supporting, fixing and maintenance facilities are also higher, which increases the cost.
发明内容SUMMARY OF THE INVENTION
鉴于上述问题，提出了一种克服上述问题或者至少部分地解决上述问题的卧式气体处理装置。In view of the above problems, a horizontal gas treatment device is proposed that overcomes the above problems or at least partially solves the above problems.
本发明的一个目的在于提供一种可减少空间占用从而便于布局的卧式气体处理装置。An object of the present invention is to provide a horizontal gas treatment device that can reduce space occupation and facilitate layout.
本发明的一个进一步的目的在于通过对处理室的底部的倾斜设计，保证液体的顺利排出。A further object of the present invention is to ensure the smooth discharge of the liquid through the inclined design of the bottom of the processing chamber.
特别地，根据本发明实施例的一方面，提供了一种卧式气体处理装置，包括：In particular, according to an aspect of the embodiments of the present invention, a horizontal gas treatment device is provided, comprising:
壳体，所述壳体围合形成一扁平状处理室，其中，所述处理室的最大水平尺寸与所述处理室的高度的比例在1:1至8:1范围内；a casing, the casing encloses a flat processing chamber, wherein the ratio of the maximum horizontal dimension of the processing chamber to the height of the processing chamber is in the range of 1:1 to 8:1;
气体入口，设置在所述处理室的下部，配置为允许气体通过所述气体入口进入所述处理室，以便所述气体在进入所述处理室后向上流动，以与所述处理室内的液体接触进行处理；以及a gas inlet, disposed in the lower portion of the processing chamber, configured to allow gas to enter the processing chamber through the gas inlet so that the gas flows upwardly after entering the processing chamber to contact the liquid within the processing chamber to process; and
气体出口，与所述处理室连通，配置为允许处理后的所述气体从所述气体出口排出。A gas outlet, in communication with the processing chamber, is configured to allow the processed gas to be discharged from the gas outlet.
可选地，所述处理室为方形；且Optionally, the processing chamber is square; and
所述处理室的宽度为2.5米至5米，所述处理室的长度与高度的比例为 (1-8):1，所述处理室的宽度与高度的比例为(1-3):1。The width of the processing chamber is 2.5 meters to 5 meters, the ratio of the length to the height of the processing chamber is (1-8): 1, and the ratio of the width to the height of the processing chamber is (1-3): 1 .
可选地，所述处理室的宽度为2.5米至3.5米。Optionally, the width of the processing chamber is 2.5 meters to 3.5 meters.
可选地，卧式气体处理装置还包括设置在所述处理室底部的出液口。Optionally, the horizontal gas treatment device further includes a liquid outlet arranged at the bottom of the treatment chamber.
可选地，所述处理室的底部相对水平面倾斜设置；且Optionally, the bottom of the processing chamber is inclined relative to the horizontal plane; and
所述出液口设置在所述处理室的底部的最低位置处。The liquid outlet is provided at the lowest position of the bottom of the processing chamber.
可选地，所述壳体的底板具有水平的下表面和相对水平面倾斜的上表面，从而形成所述处理室的倾斜的底部。Optionally, the bottom plate of the housing has a horizontal lower surface and an upper surface inclined relative to the horizontal, thereby forming an inclined bottom of the processing chamber.
可选地，所述壳体的底板呈上下表面平行的板状，且所述底板相对水平面倾斜设置，从而形成所述处理室的倾斜的底部。Optionally, the bottom plate of the casing is in the shape of a plate with parallel upper and lower surfaces, and the bottom plate is inclined relative to the horizontal plane, thereby forming an inclined bottom of the processing chamber.
可选地，卧式气体处理装置还包括液体入口，用于向所述处理室内馈入所述液体。Optionally, the horizontal gas treatment device further includes a liquid inlet for feeding the liquid into the treatment chamber.
可选地，所述液体入口包括伸入所述处理室内部的喷嘴，所述喷嘴用于喷射所述液体。Optionally, the liquid inlet includes a nozzle extending into the interior of the processing chamber, the nozzle being used to spray the liquid.
可选地，卧式气体处理装置还包括设置在所述处理室内且位于所述喷嘴的上方的第一隔板，且所述第一隔板上设置有多个通孔。Optionally, the horizontal gas treatment device further includes a first baffle plate disposed in the treatment chamber and above the nozzle, and a plurality of through holes are disposed on the first baffle plate.
可选地，所述第一隔板配置用于在其上放置固体颗粒状处理剂以参与气液反应。Optionally, the first separator is configured to place a solid particulate treatment agent thereon to participate in the gas-liquid reaction.
可选地，卧式气体处理装置还包括设置在所述处理室内且位于所述喷嘴的下方的第二隔板，且所述第二隔板上设置有多个通孔。Optionally, the horizontal gas treatment device further includes a second baffle plate disposed in the treatment chamber and below the nozzle, and a plurality of through holes are disposed on the second baffle plate.
可选地，所述第二隔板配置用于在其上放置固体颗粒状处理剂以参与气液反应。Optionally, the second separator is configured to place a solid particulate treatment agent thereon to participate in the gas-liquid reaction.
可选地，卧式气体处理装置还包括设置在所述处理室的侧壁的至少一个人孔。Optionally, the horizontal gas treatment device further includes at least one manhole disposed on the side wall of the treatment chamber.
本发明实施例的卧式气体处理装置中，由壳体围合形成一扁平状处理室，且该处理室的最大水平尺寸与处理室的高度的比例在1:1至8:1范围内。通过这种扁平状处理室设计，一方面增大了水平截面上通过的气体量，另一方面减缓了气流向上流动的速度，保证了气体与处理室内液体的接触时间，从而在保证气体的处理效果的同时，减少了气体处理装置的空间占用从而便于布局。In the horizontal gas processing device of the embodiment of the present invention, a flat processing chamber is formed by enclosing the casing, and the ratio of the maximum horizontal dimension of the processing chamber to the height of the processing chamber is in the range of 1:1 to 8:1. Through this flat processing chamber design, on the one hand, the amount of gas passing through the horizontal section is increased, and on the other hand, the upward flow rate of the gas flow is slowed down, which ensures the contact time between the gas and the liquid in the processing chamber, thereby ensuring the processing of the gas. At the same time, the space occupied by the gas treatment device is reduced and the layout is facilitated.
进一步地，处理室的底部相对水平面倾斜设置，且气体处理装置的出液口设置在处理室的底部的最低位置处。通过对处理室的底部的倾斜设计，保 证液体的顺利排出。Further, the bottom of the processing chamber is inclined relative to the horizontal plane, and the liquid outlet of the gas processing device is set at the lowest position of the bottom of the processing chamber. Through the inclined design of the bottom of the processing chamber, the smooth discharge of the liquid is ensured.
上述说明仅是本发明技术方案的概述，为了能够更清楚了解本发明的技术手段，而可依照说明书的内容予以实施，并且为了让本发明的上述和其它目的、特征和优点能够更明显易懂，以下特举本发明的具体实施方式。The above description is only an overview of the technical solutions of the present invention, in order to be able to understand the technical means of the present invention more clearly, it can be implemented according to the content of the description, and in order to make the above and other objects, features and advantages of the present invention more obvious and easy to understand , the following specific embodiments of the present invention are given.
根据下文结合附图对本发明具体实施例的详细描述，本领域技术人员将会更加明了本发明的上述以及其他目的、优点和特征。The above and other objects, advantages and features of the present invention will be more apparent to those skilled in the art from the following detailed description of the specific embodiments of the present invention in conjunction with the accompanying drawings.
附图说明Description of drawings
后文将参照附图以示例性而非限制性的方式详细描述本发明的一些具体实施例。附图中相同的附图标记标示了相同或类似的部件或部分。本领域技术人员应该理解，这些附图未必是按比例绘制的。附图中：Hereinafter, some specific embodiments of the present invention will be described in detail by way of example and not limitation with reference to the accompanying drawings. The same reference numbers in the figures designate the same or similar parts or parts. It will be understood by those skilled in the art that the drawings are not necessarily to scale. In the attached picture:
图1示出了根据本发明一实施例的卧式气体处理装置的示意性主视图；FIG. 1 shows a schematic front view of a horizontal gas processing device according to an embodiment of the present invention;
图2示出了根据本发明一实施例的卧式气体处理装置的示意性主视剖面图；2 shows a schematic front cross-sectional view of a horizontal gas processing device according to an embodiment of the present invention;
图3示出了根据本发明一实施例的卧式气体处理装置的示意性左视剖面图。FIG. 3 shows a schematic left cross-sectional view of a horizontal gas processing apparatus according to an embodiment of the present invention.
具体实施方式Detailed ways
下面将参照附图更详细地描述本公开的示例性实施例。虽然附图中显示了本公开的示例性实施例，然而应当理解，可以以各种形式实现本公开而不应被这里阐述的实施例所限制。相反，提供这些实施例是为了能够更透彻地理解本公开，并且能够将本公开的范围完整的传达给本领域的技术人员。Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided so that the present disclosure will be more thoroughly understood, and will fully convey the scope of the present disclosure to those skilled in the art.
为解决上述技术问题，本发明提供了一种卧式气体处理装置。图1示出了根据本发明一实施例的卧式气体处理装置100的示意性主视图。图2示出了根据本发明一实施例的卧式气体处理装置100的示意性主视剖面图。图3示出了根据本发明一实施例的卧式气体处理装置100的示意性左视剖面图。In order to solve the above technical problems, the present invention provides a horizontal gas treatment device. FIG. 1 shows a schematic front view of a horizontal gas processing apparatus 100 according to an embodiment of the present invention. FIG. 2 shows a schematic front cross-sectional view of a horizontal gas processing apparatus 100 according to an embodiment of the present invention. FIG. 3 shows a schematic left cross-sectional view of a horizontal gas processing apparatus 100 according to an embodiment of the present invention.
参见图1所示，卧式气体处理装置100一般性地可包括壳体1、气体入口3和气体出口4。壳体1围合形成一扁平状处理室2，处理室2的最大水平尺寸与处理室2的高度的比例在1:1至8:1范围内。处理室2的最大水平尺寸指处理室2的水平截面的轮廓线上任意两点间的最大距离。例如，若处理室2的水平截面为圆形，则其最大水平尺寸为圆形的直径长度；若处理室2的水平截面为矩形，则其最大水平尺寸为矩形的长度；若处理室2的水平 截面为正六边形，则其最大水平尺寸为正六边形的对角线长度。壳体1围合形成的处理室2的形状可以根据实际应用需求进行选择，例如方形、圆柱形等，本发明对此不作限制。Referring to FIG. 1 , the horizontal gas processing device 100 may generally include a housing 1 , a gas inlet 3 and a gas outlet 4 . The casing 1 encloses a flat processing chamber 2, and the ratio of the maximum horizontal dimension of the processing chamber 2 to the height of the processing chamber 2 is in the range of 1:1 to 8:1. The maximum horizontal dimension of the processing chamber 2 refers to the maximum distance between any two points on the contour line of the horizontal section of the processing chamber 2 . For example, if the horizontal section of the processing chamber 2 is circular, its maximum horizontal dimension is the diameter length of the circle; if the horizontal section of the processing chamber 2 is a rectangle, its maximum horizontal dimension is the length of the rectangle; If the horizontal section is a regular hexagon, its maximum horizontal dimension is the diagonal length of the regular hexagon. The shape of the processing chamber 2 enclosed by the casing 1 can be selected according to actual application requirements, such as square, cylindrical, etc., which is not limited in the present invention.
气体入口3设置在处理室2的下部。此处的处理室2的下部可指处理室2的竖直方向上的下半部分，特别地，可指处理室2的底部21及其邻近区域，例如，如图1所示，气体入口3设置在处理室2的侧壁上靠近处理室2的底部21的位置。当然，图1所示的气体入口3的位置仅是示意性的，气体入口3还可以设置在处理室2的适宜的其他位置。气体可通过气体入口3进入处理室2，以便气体在进入处理室2后向上流动，以与处理室2内的液体接触进行处理。本文中的液体可以是用于对气体进行处理的液体，如吸收液(具体可为水)等。The gas inlet 3 is provided in the lower part of the processing chamber 2 . The lower part of the processing chamber 2 here may refer to the lower half of the processing chamber 2 in the vertical direction, in particular, may refer to the bottom 21 of the processing chamber 2 and its adjacent area, for example, as shown in FIG. 1 , the gas inlet 3 It is arranged on the side wall of the processing chamber 2 at a position close to the bottom 21 of the processing chamber 2 . Of course, the positions of the gas inlets 3 shown in FIG. 1 are only schematic, and the gas inlets 3 may also be arranged at other suitable positions in the processing chamber 2 . The gas can enter the processing chamber 2 through the gas inlet 3 so that the gas flows upward after entering the processing chamber 2 to contact the liquid in the processing chamber 2 for processing. The liquid herein can be a liquid used for treating gas, such as an absorption liquid (specifically, water) and the like.
气体出口4与处理室2连通，以允许处理后的气体从气体出口4排出。具体地，气体出口4可设置于处理室2的气体入口3上方的位置。优选地，如图1所示，气体出口4可设置于处理室2的顶部。当然，气体出口4还可以设置在处理室2的适宜的其他位置，例如，气体出口4还可以设置在处理室2的气体入口3上方的侧壁上，在这种情况下，气体入口3和气体出口4可以位于处理室2的同侧，也可以分别位于处理室2的不同侧，本发明对此不做具体限制。The gas outlet 4 communicates with the processing chamber 2 to allow the processed gas to be discharged from the gas outlet 4 . Specifically, the gas outlet 4 may be provided at a position above the gas inlet 3 of the processing chamber 2 . Preferably, as shown in FIG. 1 , the gas outlet 4 may be provided at the top of the processing chamber 2 . Of course, the gas outlet 4 can also be arranged at other suitable positions in the processing chamber 2. For example, the gas outlet 4 can also be arranged on the side wall above the gas inlet 3 of the processing chamber 2. In this case, the gas inlet 3 and The gas outlet 4 may be located on the same side of the processing chamber 2, or may be located on different sides of the processing chamber 2, which is not specifically limited in the present invention.
本发明实施例的卧式气体处理装置100中，由壳体1围合形成一扁平状处理室2，且该处理室2的最大水平尺寸与处理室2的高度的比例在1:1至8:1范围内。通过这种扁平状处理室2设计，一方面增大了水平截面上通过的气体量，另一方面减缓了气流向上流动的速度，保证了气体与处理室2内液体的接触时间，从而在保证气体的处理效果的同时，减少了气体处理装置100的空间占用从而便于布局。In the horizontal gas processing device 100 of the embodiment of the present invention, a flat processing chamber 2 is formed by the casing 1, and the ratio of the maximum horizontal dimension of the processing chamber 2 to the height of the processing chamber 2 is 1:1 to 8 :1 range. Through the design of the flat processing chamber 2, on the one hand, the amount of gas passing through the horizontal section is increased, and on the other hand, the upward flow rate of the air flow is slowed down, so as to ensure the contact time between the gas and the liquid in the processing chamber 2, so as to ensure the While improving the gas treatment effect, the space occupied by the gas treatment device 100 is reduced so as to facilitate the layout.
在一个优选的实施例中，处理室2可以为方形。具体地说，处理室2的水平截面为矩形。在这种情况下，处理室2的最大水平尺寸为处理室2的长度(即处理室2的矩形水平截面的长度)，因此，处理室2的长度与其高度的比例在1:1至8:1范围内，即(1-8):1。进一步地，处理室2的宽度(即处理室2的矩形水平截面的宽度)与其高度的比例可以在1:1至3:1范围内，即(1-3):1。方形处理室2(也即方形壳体1)的设计结构稳定、便于加工。In a preferred embodiment, the processing chamber 2 may be square. Specifically, the horizontal cross section of the processing chamber 2 is rectangular. In this case, the maximum horizontal dimension of the processing chamber 2 is the length of the processing chamber 2 (i.e. the length of the rectangular horizontal section of the processing chamber 2), so the ratio of the length of the processing chamber 2 to its height is 1:1 to 8: In the range of 1, i.e. (1-8):1. Further, the ratio of the width of the processing chamber 2 (ie the width of the rectangular horizontal section of the processing chamber 2 ) to its height may be in the range of 1:1 to 3:1, ie (1-3):1. The design structure of the square processing chamber 2 (that is, the square shell 1 ) is stable and easy to process.
更具体地，处理室2的宽度可以设计在2.5米至5米范围内，例如2.5 米、3米、3.5米、4米、4.5米、5米等。优选地，处理室2的宽度可以设计在2.5米至3.5米范围内。通过将处理室2的宽度尺寸设计在此范围内，既保证了气体处理效果，又保证了单位时间处理量。More specifically, the width of the processing chamber 2 can be designed to be in the range of 2.5 meters to 5 meters, such as 2.5 meters, 3 meters, 3.5 meters, 4 meters, 4.5 meters, 5 meters, and the like. Preferably, the width of the processing chamber 2 can be designed in the range of 2.5 meters to 3.5 meters. By designing the width dimension of the processing chamber 2 within this range, both the gas processing effect and the processing capacity per unit time are ensured.
在本发明的一个实施例中，继续参照图1所示，卧式气体处理装置100还可以包括设置在处理室2底部21的出液口5，用于排出下流至处理室2底部21的液体。出液口5具体可以为溢流槽。通过出液口5排出的液体可以汇流至储液槽以循环利用(或经再生后再循环利用)。出液口5的数量可以为一个或多个，可根据实际应用需求进行设置。图中所示的出液口5的数量仅是示意性的，本发明对此不做具体限制。In one embodiment of the present invention, with continued reference to FIG. 1 , the horizontal gas processing device 100 may further include a liquid outlet 5 disposed at the bottom 21 of the processing chamber 2 for discharging the liquid flowing down to the bottom 21 of the processing chamber 2 . Specifically, the liquid outlet 5 may be an overflow groove. The liquid discharged through the liquid outlet 5 can be confluent to the liquid storage tank for recycling (or after regeneration). The number of the liquid outlet 5 can be one or more, which can be set according to actual application requirements. The number of the liquid outlet ports 5 shown in the figure is only illustrative, and the present invention does not specifically limit it.
进一步地，处理室2的底部21可相对水平面倾斜设置。具体地，例如，处理室2的底部21从一侧向另一侧向下倾斜，或者，处理室2的底部21从相对的两侧向中心位置向下倾斜，等等。在这种情况下，出液口5设置在处理室2的底部21的最低位置处。例如，若处理室2的底部21从一侧向另一侧向下倾斜，则出液口5设置在处理室2底部21的较低一侧。若处理室2的底部21从相对的两侧向中心位置向下倾斜，则出液口5设置在处理室2底部21的中心位置。通过对处理室2的底部21的倾斜设计，能够保证液体的顺利排出。Further, the bottom 21 of the processing chamber 2 may be inclined relative to the horizontal plane. Specifically, for example, the bottom 21 of the processing chamber 2 slopes downward from one side to the other, or the bottom 21 of the processing chamber 2 slopes downward from opposite sides to a central position, and so on. In this case, the liquid outlet 5 is provided at the lowest position of the bottom 21 of the processing chamber 2 . For example, if the bottom 21 of the processing chamber 2 slopes downward from one side to the other, the liquid outlet 5 is provided on the lower side of the bottom 21 of the processing chamber 2 . If the bottom 21 of the processing chamber 2 is inclined downward from the opposite sides to the central position, the liquid outlet 5 is arranged at the central position of the bottom 21 of the processing chamber 2 . Through the inclined design of the bottom 21 of the processing chamber 2, the smooth discharge of the liquid can be ensured.
前述的处理室2的底部21的倾斜设计可以通过多种方式实现。下面对其中的两种方式进行介绍。The aforementioned inclined design of the bottom 21 of the processing chamber 2 can be realized in various ways. Two of the methods are described below.
在第一种方式中，壳体1的底板11具有水平的下表面和相对水平面倾斜的上表面，从而形成处理室2的倾斜的底部21。也就是说，壳体1的底板11为厚度不均的板状，通过壳体1的底板11的上表面的倾斜角度实现处理室2的底部21的倾斜设计。在这种方式中，壳体1的底板11的外表面是水平的，利于保持卧式气体处理装置100的水平，使卧式气体处理装置100的安装更加便利。In the first manner, the bottom plate 11 of the housing 1 has a horizontal lower surface and an upper surface inclined relative to the horizontal plane, thereby forming the inclined bottom 21 of the processing chamber 2 . That is, the bottom plate 11 of the casing 1 is in a plate shape with uneven thickness, and the inclined design of the bottom 21 of the processing chamber 2 is realized by the inclination angle of the upper surface of the bottom plate 11 of the casing 1 . In this way, the outer surface of the bottom plate 11 of the housing 1 is horizontal, which is beneficial to keep the horizontal gas treatment device 100 horizontal, and makes the installation of the horizontal gas treatment device 100 more convenient.
在另一种方式中，壳体1的底板11呈上下表面平行的板状，且底板11相对水平面倾斜设置，从而形成处理室2的倾斜的底部21。也就是说，壳体1的底板11为厚度均匀的板状，通过将底板11相对水平面倾斜设置实现处理室2的底部21的倾斜设计。这种方式底板11的加工更加方便。In another way, the bottom plate 11 of the housing 1 is in the shape of a plate with parallel upper and lower surfaces, and the bottom plate 11 is inclined relative to the horizontal plane, thereby forming the inclined bottom 21 of the processing chamber 2 . That is to say, the bottom plate 11 of the housing 1 is in the shape of a plate with uniform thickness, and the bottom 21 of the processing chamber 2 is designed to be inclined by slanting the bottom plate 11 relative to the horizontal plane. In this way, the processing of the bottom plate 11 is more convenient.
本发明的一个实施例中，继续参照图1所示，卧式气体处理装置100还可以包括液体入口6，用于向处理室2内馈入前述液体。液体入口6的数量 可以为一个或多个(具体如2个)，可根据实际应用需求进行设置。In an embodiment of the present invention, with continued reference to FIG. 1 , the horizontal gas processing device 100 may further include a liquid inlet 6 for feeding the aforementioned liquid into the processing chamber 2 . The number of the liquid inlets 6 can be one or more (specifically, two), which can be set according to actual application requirements.
进一步地，参照图2和图3所示，液体入口6可包括延伸至处理室2内部的喷嘴61，用于喷射前述液体。具体地，喷嘴61可以通过输液管伸入处理室2内部。喷嘴61的数量可以为多个，多个喷嘴61呈阵列分布，例如，呈间隔均匀的一排或多排分布。Further, as shown in FIGS. 2 and 3 , the liquid inlet 6 may include a nozzle 61 extending into the interior of the processing chamber 2 for spraying the aforementioned liquid. Specifically, the nozzle 61 may extend into the interior of the treatment chamber 2 through a liquid infusion tube. The number of nozzles 61 may be multiple, and the multiple nozzles 61 are distributed in an array, for example, in one or more rows with uniform intervals.
更进一步地，卧式气体处理装置100还可以包括第一隔板7。第一隔板7设置在处理室2内，位于喷嘴61的上方，且第一隔板7上设置有多个通孔71。具体地，第一隔板7可以水平地设置在处理室2中，如此，第一隔板7可将处理室2分隔为与气体入口3连通的第一区域和与气体出口4连通的第二区域。喷嘴61位于第一区域内，面向第一隔板7喷射液体。根据喷嘴61的具体结构，所喷射的液体可以是液滴、液柱、射流等形式。Furthermore, the horizontal gas treatment device 100 may further include the first partition plate 7 . The first partition plate 7 is disposed in the processing chamber 2 above the nozzle 61 , and a plurality of through holes 71 are formed on the first partition plate 7 . Specifically, the first partition 7 may be arranged horizontally in the processing chamber 2 , so that the first partition 7 may partition the processing chamber 2 into a first region communicating with the gas inlet 3 and a second region communicating with the gas outlet 4 area. The nozzles 61 are located in the first area and spray liquid facing the first partition 7 . According to the specific structure of the nozzle 61, the ejected liquid may be in the form of droplets, liquid columns, jets, and the like.
由于第一隔板7上设有通孔71，喷嘴61喷射的液体通过通孔71可到达第一隔板7的上方，并下落至第一隔板7上后蓄积形成液池。自气体入口3进入处理室2的气体通过通孔71产生气泡进入液池，从而实现气体与液体充分混合接触，以对气体进行处理(例如混合、去除杂物等处理)。第一隔板7上方的液体也会通过通孔71向下渗流，最终下流至处理室2的底部21。通过控制液体的喷射流速和液体的向下渗流流速，可以在第一隔板7上维持相对稳定深度的液池。Since the first separator 7 is provided with a through hole 71 , the liquid sprayed by the nozzle 61 can reach the top of the first separator 7 through the through hole 71 , and then falls onto the first separator 7 and then accumulates to form a liquid pool. The gas entering the processing chamber 2 from the gas inlet 3 generates bubbles into the liquid pool through the through hole 71, so that the gas and the liquid are fully mixed and contacted to process the gas (eg, mixing, removing impurities, etc.). The liquid above the first separator 7 also percolates downward through the through holes 71 , and finally flows down to the bottom 21 of the processing chamber 2 . By controlling the jetting flow rate of the liquid and the downward percolating flow rate of the liquid, a liquid pool with a relatively stable depth can be maintained on the first separator 7 .
需要说明的是，图2和图3中所示的通孔71的分布方式仅是示意性的，在实际应用中，通孔71可以在第一隔板7上均匀分布，或者以不同密度分布在第一隔板7的不同区域，可以根据实际应用需求进行设置。It should be noted that the distribution of the through holes 71 shown in FIG. 2 and FIG. 3 is only schematic. In practical applications, the through holes 71 may be uniformly distributed on the first separator 7 or distributed in different densities. Different areas of the first partition 7 can be set according to actual application requirements.
在一种具体的实施方案中，第一隔板7可以采用丝网，以丝网的网孔构成第一隔板7的通孔71。通过选择恰当的网孔尺寸，能够有效地控制气体通过通孔71(即，丝网的网孔)产生的气泡的大小，以调控气体与液体的混合效率。在一种优选的实施方案中，可采用网孔尺寸为微米级别的丝网作为第一隔板7，如此，气体可以通过丝网的网孔产生微米级的气泡进入液池，大大地提高气液混合效果。In a specific embodiment, a wire mesh can be used for the first separator 7 , and the through holes 71 of the first separator 7 are formed by the meshes of the wire mesh. By selecting an appropriate mesh size, the size of the air bubbles generated by the gas passing through the through holes 71 (ie, the mesh holes of the wire mesh) can be effectively controlled, so as to control the mixing efficiency of the gas and the liquid. In a preferred embodiment, a wire mesh with a mesh size of microns can be used as the first separator 7. In this way, the gas can generate micron-scale bubbles through the mesh of the wire mesh and enter the liquid pool, greatly improving the gas flow rate. Liquid mixing effect.
在一些实施例中，第一隔板7还可以配置用于在其上放置固体颗粒状处理剂，这些固体颗粒状处理剂将参与气液反应，以实现对气体的处理。本发明对固体颗粒状处理剂的外形和尺寸不做具体限制，只需其粒径大小可保证这些处理剂不会从通孔71下落即可。固体颗粒状处理剂的种类可根据气体 处理的类型进行选择。例如，在进行脱硫处理时，固体颗粒状处理剂可包括石灰石颗粒、镁矿石颗粒等。In some embodiments, the first separator 7 may also be configured to place solid particulate treatment agents thereon, and these solid particulate treatment agents will participate in the gas-liquid reaction to achieve gas treatment. The present invention does not specifically limit the shape and size of the solid granular treatment agent, as long as the particle size of the treatment agent can ensure that the treatment agent will not fall from the through hole 71 . The type of solid particulate treatment agent can be selected according to the type of gas treatment. For example, in the desulfurization treatment, the solid particulate treatment agent may include limestone particles, magnesium ore particles, and the like.
在本发明的一个实施例中，卧式气体处理装置100还可以包括第二隔板(图中未示出)。第二隔板设置在处理室2内且位于喷嘴61的下方，且第二隔板上设置有多个通孔。喷嘴61喷射的液体在重力作用下可下流至第二隔板上形成具有相对稳定深度的液池。第二隔板可以与第一隔板7完全相同，当然，也可以与第一隔板7不同。In one embodiment of the present invention, the horizontal gas processing device 100 may further include a second partition (not shown in the figure). The second partition is arranged in the processing chamber 2 and is located below the nozzle 61 , and a plurality of through holes are arranged on the second partition. The liquid sprayed by the nozzle 61 can flow down to the second partition plate under the action of gravity to form a liquid pool with a relatively stable depth. The second separator can be completely the same as the first separator 7 , and of course, can also be different from the first separator 7 .
进一步地，第二隔板也可以配置用于在其上放置固体颗粒状处理剂以参与气液反应。第二隔板上放置的固体颗粒状处理剂可与第一隔板7上的固体颗粒状处理剂相同，不另赘述。Further, the second separator can also be configured to place the solid particulate treatment agent thereon to participate in the gas-liquid reaction. The solid granular treatment agent placed on the second separator can be the same as the solid granular treatment agent on the first separator 7, and will not be described further.
卧式气体处理装置100中可以择一设置第一隔板7和第二隔板，即，只设置第一隔板7或只设置第二隔板；也可以同时设置第一隔板7和第二隔板，即，设置两层隔板。In the horizontal gas treatment device 100, the first separator 7 and the second separator can be set either, that is, only the first separator 7 or only the second separator can be set; the first separator 7 and the second separator can also be set at the same time. Two separators, that is, two layers of separators are provided.
在一些实施例中，卧式气体处理装置100中可以设置多层隔板和多层喷嘴，其中隔板和喷嘴交替设置，即，在竖直方向上从上到下，一层隔板、一层喷嘴、再一层隔板，依次轮流设置。In some embodiments, the horizontal gas treatment device 100 may be provided with multiple layers of separators and multiple nozzles, wherein the separators and nozzles are alternately arranged, that is, from top to bottom in the vertical direction, one layer of A layer of nozzles and a second layer of partitions are arranged in turn.
继续参照图1所示，在本发明的一个实施例中，卧式气体处理装置100还可以包括设置在处理室2的侧壁的至少一个人孔8。通过人孔8的设置，便于工作人员对卧式气体处理装置100的内部构造进行检查和维修。需要说明的是，图1中所示的人孔8的数量、形状和位置都仅是示意性的，在实际应用中，可根据实际需求设置人孔8的数量、形状和位置。另外，在有多个人孔8的情况下，各人孔8的形状和尺寸也可以根据实际应用需求独立设置。Continuing to refer to FIG. 1 , in one embodiment of the present invention, the horizontal gas processing device 100 may further include at least one manhole 8 disposed on the side wall of the processing chamber 2 . The arrangement of the manhole 8 facilitates the inspection and maintenance of the internal structure of the horizontal gas processing device 100 by the staff. It should be noted that the number, shape and position of the manholes 8 shown in FIG. 1 are only schematic. In practical applications, the number, shape and position of the manholes 8 can be set according to actual requirements. In addition, in the case of multiple manholes 8, the shape and size of each manhole 8 can also be independently set according to actual application requirements.
在一个实施例中，卧式气体处理装置100还可以包括除雾器(图中未示出)。除雾器可设置于气体出口4处，或通过风管与气体出口4相连。除雾器具有可旋转的叶片，通过旋转的叶片去除从气体出口4排出的气体中携带的液滴。In one embodiment, the horizontal gas treatment device 100 may further include a mist eliminator (not shown in the figure). The mist eliminator can be arranged at the gas outlet 4, or connected to the gas outlet 4 through an air duct. The mist eliminator has rotatable vanes by which droplets entrained in the gas discharged from the gas outlet 4 are removed.
在一种实施方案中，除雾器可以是由电机驱动的风机(如轴流式风机、离心式风机或混流式风机)。风机的叶片由电机驱动旋转以抽吸处理室2内的气体从气体出口4排出。在这种情况下，风机一方面可以通过旋转的叶片去除气体中的液滴，另一方面还可以同时作为驱动气体流动的动力设备，如此，实现了将除雾器与用于驱动气体流动的动力设备合二为一。In one embodiment, the mist eliminator may be a motor-driven fan (eg, an axial fan, a centrifugal fan, or a mixed flow fan). The blades of the fan are driven to rotate by the motor to suck the gas in the processing chamber 2 and discharge it from the gas outlet 4 . In this case, on the one hand, the fan can remove the droplets in the gas through the rotating blades, and on the other hand, it can also act as a power device for driving the gas flow. Power equipment in one.
在另一种实施方案中，除雾器可以是由气流驱动的叶轮，也就是说，叶轮不带有动力驱动机构(如电力驱动机构或机械驱动机构等)，叶轮的叶片是由气流驱动进行自由旋转的。在这种情况下，卧式气体处理装置100还可以包括设置于气体入口3处的气体驱动元件(图中未示出)，用于驱动气体从气体入口3进入处理室2并从气体出口4排出，以形成驱动叶轮的叶片旋转的气流。气体驱动元件例如可以为风机，通过吹送气体，驱动气体从气体入口3进入处理室2并从气体出口4排出。In another embodiment, the mist eliminator can be an impeller driven by airflow, that is, the impeller does not have a power drive mechanism (such as an electric drive mechanism or a mechanical drive mechanism, etc.), and the blades of the impeller are driven by the airflow. free spins. In this case, the horizontal gas processing device 100 may further include a gas driving element (not shown in the figure) disposed at the gas inlet 3 for driving the gas from the gas inlet 3 into the processing chamber 2 and from the gas outlet 4 out to form the airflow that drives the blades of the impeller to rotate. The gas driving element can be, for example, a fan, by blowing the gas, the driving gas enters the process chamber 2 from the gas inlet 3 and is discharged from the gas outlet 4 .
根据上述任意一个可选实施例或多个可选实施例的组合，本发明实施例能够达到如下有益效果：According to any one of the foregoing optional embodiments or a combination of multiple optional embodiments, the embodiments of the present invention can achieve the following beneficial effects:
本发明实施例的卧式气体处理装置中，由壳体围合形成一扁平状处理室，且该处理室的最大水平尺寸与处理室的高度的比例在1:1至8:1范围内。通过这种扁平状处理室设计，一方面增大了水平截面上通过的气体量，另一方面减缓了气流向上流动的速度，保证了气体与处理室内液体的接触时间，从而在保证气体的处理效果的同时，减少了气体处理装置的空间占用从而便于布局。In the horizontal gas processing device of the embodiment of the present invention, a flat processing chamber is formed by enclosing the casing, and the ratio of the maximum horizontal dimension of the processing chamber to the height of the processing chamber is in the range of 1:1 to 8:1. Through this flat processing chamber design, on the one hand, the amount of gas passing through the horizontal section is increased, and on the other hand, the upward flow rate of the gas flow is slowed down, which ensures the contact time between the gas and the liquid in the processing chamber, thereby ensuring the processing of the gas. At the same time, the space occupied by the gas treatment device is reduced and the layout is facilitated.
进一步地，处理室的底部相对水平面倾斜设置，且气体处理装置的出液口设置在处理室的底部的最低位置处。通过对处理室的底部的倾斜设计，保证液体的顺利排出。Further, the bottom of the processing chamber is inclined relative to the horizontal plane, and the liquid outlet of the gas processing device is set at the lowest position of the bottom of the processing chamber. Through the inclined design of the bottom of the processing chamber, the smooth discharge of the liquid is ensured.
在此处所提供的说明书中，说明了大量具体细节。然而，能够理解，本发明的实施例可以在没有这些具体细节的情况下实践。在一些实例中，并未详细示出公知的方法、结构和技术，以便不模糊对本说明书的理解。In the description provided herein, numerous specific details are set forth. It will be understood, however, that embodiments of the invention may be practiced without these specific details. In some instances, well-known methods, structures and techniques have not been shown in detail in order not to obscure an understanding of this description.
至此，本领域技术人员应认识到，虽然本文已详尽示出和描述了本发明的多个示例性实施例，但是，在不脱离本发明精神和范围的情况下，仍可根据本发明公开的内容直接确定或推导出符合本发明原理的许多其他变型或修改。因此，本发明的范围应被理解和认定为覆盖了所有这些其他变型或修改。By now, those skilled in the art will recognize that, although various exemplary embodiments of the present invention have been illustrated and described in detail herein, the present invention may still be implemented in accordance with the present disclosure without departing from the spirit and scope of the present invention. The content directly determines or derives many other variations or modifications consistent with the principles of the invention. Accordingly, the scope of the present invention should be understood and deemed to cover all such other variations or modifications.

Claims (14)

  1. 一种卧式气体处理装置，包括：A horizontal gas treatment device, comprising:
    壳体，所述壳体围合形成一扁平状处理室，其中，所述处理室的最大水平尺寸与所述处理室的高度的比例在1:1至8:1范围内；a casing, the casing encloses a flat processing chamber, wherein the ratio of the maximum horizontal dimension of the processing chamber to the height of the processing chamber is in the range of 1:1 to 8:1;
    气体入口，设置在所述处理室的下部，配置为允许气体通过所述气体入口进入所述处理室，以便所述气体在进入所述处理室后向上流动，以与所述处理室内的液体接触进行处理；以及a gas inlet, disposed in the lower portion of the processing chamber, configured to allow gas to enter the processing chamber through the gas inlet so that the gas flows upwardly after entering the processing chamber to contact the liquid within the processing chamber to process; and
    气体出口，与所述处理室连通，配置为允许处理后的所述气体从所述气体出口排出。A gas outlet, in communication with the processing chamber, is configured to allow the processed gas to be discharged from the gas outlet.
  2. 根据权利要求1所述的卧式气体处理装置，其中，The horizontal gas treatment device according to claim 1, wherein,
    所述处理室为方形；且the processing chamber is square; and
    所述处理室的宽度为2.5米至5米，所述处理室的长度与高度的比例为(1-8):1，所述处理室的宽度与高度的比例为(1-3):1。The width of the processing chamber is 2.5 meters to 5 meters, the ratio of the length to the height of the processing chamber is (1-8): 1, and the ratio of the width to the height of the processing chamber is (1-3): 1 .
  3. 根据权利要求2所述的卧式气体处理装置，其中，The horizontal gas treatment device according to claim 2, wherein,
    所述处理室的宽度为2.5米至3.5米。The width of the processing chamber is 2.5 meters to 3.5 meters.
  4. 根据权利要求1-3中任一项所述的卧式气体处理装置，还包括设置在所述处理室底部的出液口。The horizontal gas processing device according to any one of claims 1-3, further comprising a liquid outlet provided at the bottom of the processing chamber.
  5. 根据权利要求4所述的卧式气体处理装置，其中，所述处理室的底部相对水平面倾斜设置；且The horizontal gas processing device according to claim 4, wherein the bottom of the processing chamber is inclined relative to the horizontal plane; and
    所述出液口设置在所述处理室的底部的最低位置处。The liquid outlet is provided at the lowest position of the bottom of the processing chamber.
  6. 根据权利要求5所述的卧式气体处理装置，其中，所述壳体的底板具有水平的下表面和相对水平面倾斜的上表面，从而形成所述处理室的倾斜的底部。The horizontal gas processing apparatus of claim 5, wherein the bottom plate of the housing has a horizontal lower surface and an upper surface inclined relative to the horizontal, thereby forming an inclined bottom of the processing chamber.
  7. 根据权利要求5所述的卧式气体处理装置，其中，所述壳体的底板呈上下表面平行的板状，且所述底板相对水平面倾斜设置，从而形成所述处理 室的倾斜的底部。The horizontal gas processing apparatus according to claim 5, wherein the bottom plate of the casing is in the shape of a plate with parallel upper and lower surfaces, and the bottom plate is inclined relative to the horizontal plane to form an inclined bottom of the processing chamber.
  8. 根据权利要求1所述的卧式气体处理装置，还包括液体入口，用于向所述处理室内馈入所述液体。The horizontal gas processing apparatus of claim 1, further comprising a liquid inlet for feeding the liquid into the processing chamber.
  9. 根据权利要求8所述的卧式气体处理装置，其中，所述液体入口包括伸入所述处理室内部的喷嘴，所述喷嘴用于喷射所述液体。9. The horizontal gas processing apparatus of claim 8, wherein the liquid inlet includes a nozzle extending into the interior of the processing chamber, the nozzle for spraying the liquid.
  10. 根据权利要求9所述的卧式气体处理装置，还包括设置在所述处理室内且位于所述喷嘴的上方的第一隔板，且所述第一隔板上设置有多个通孔。The horizontal gas processing device according to claim 9, further comprising a first partition plate disposed in the processing chamber and above the nozzle, and a plurality of through holes are disposed on the first partition plate.
  11. 根据权利要求10所述的卧式气体处理装置，其中，The horizontal gas treatment device according to claim 10, wherein,
    所述第一隔板配置用于在其上放置固体颗粒状处理剂以参与气液反应。The first separator is configured to place the solid particulate treatment agent thereon to participate in the gas-liquid reaction.
  12. 根据权利要求9所述的卧式气体处理装置，还包括设置在所述处理室内且位于所述喷嘴的下方的第二隔板，且所述第二隔板上设置有多个通孔。The horizontal gas processing apparatus according to claim 9, further comprising a second partition plate disposed in the processing chamber and below the nozzle, and a plurality of through holes are disposed on the second partition plate.
  13. 根据权利要求12所述的卧式气体处理装置，其中，The horizontal gas treatment device according to claim 12, wherein,
    所述第二隔板配置用于在其上放置固体颗粒状处理剂以参与气液反应。The second separator is configured to place the solid particulate treatment agent thereon to participate in the gas-liquid reaction.
  14. 根据权利要求1所述的卧式气体处理装置，还包括设置在所述处理室的侧壁的至少一个人孔。The horizontal gas processing apparatus of claim 1, further comprising at least one manhole provided in the side wall of the processing chamber.
PCT/CN2021/124864 2020-10-20 2021-10-20 Horizontal gas treatment device WO2022083613A1 (en)

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