JP3278194B2 - Optical components - Google Patents
Optical componentsInfo
- Publication number
- JP3278194B2 JP3278194B2 JP09366392A JP9366392A JP3278194B2 JP 3278194 B2 JP3278194 B2 JP 3278194B2 JP 09366392 A JP09366392 A JP 09366392A JP 9366392 A JP9366392 A JP 9366392A JP 3278194 B2 JP3278194 B2 JP 3278194B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- thickness
- water
- substrate
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Surface Treatment Of Glass (AREA)
- Surface Treatment Of Optical Elements (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、光学部材用基板の表面
に設けられる反射防止膜や反射膜などに撥水性を付与し
た光学部材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical member having an anti-reflection film or a reflection film provided on the surface of a substrate for an optical member provided with water repellency.
【０００２】[0002]
【従来の技術】従来より、ガラスなどの光学部材の表面
に撥水性を付与させるためには、基材表面をポリシロキ
サンやポリフルオロ化合物で被履することが知られてい
る。しかし、これらの化合物はガラスとの密着強度が小
さく、耐久性、耐摩耗性にも劣る問題があった。そこ
で、耐久性能の高い撥水性部材を供給するために特開平
３−２０５３２７号公報には、ポリシロキサン化合物を
ガラス基板の表面に塗布した後、このポリシロキサン化
合物をコロナ放電または紫外線照射によってガラス基板
の表面に固着させる方法が開示されている。2. Description of the Related Art Hitherto, in order to impart water repellency to the surface of an optical member such as glass, it is known that the surface of a substrate is covered with a polysiloxane or a polyfluoro compound. However, these compounds have a problem that adhesion strength to glass is small and durability and abrasion resistance are inferior. In order to supply a water-repellent member having high durability, Japanese Patent Application Laid-Open No. 3-205327 discloses that after coating a polysiloxane compound on the surface of a glass substrate, the polysiloxane compound is applied to the glass substrate by corona discharge or ultraviolet irradiation. Discloses a method of fixing to the surface of a.
【０００３】[0003]
【発明が解決しようとする課題】しかし、上記特開平３
−２０５３２７号公報に開示されている従来方法により
製造された撥水性部材は、最表層に有機物質を用いてい
るため十分な耐久性、耐摩耗性を有していない。また、
この有機物質の塗布はディップコート等の方法によって
行うため、その膜厚の精密な制御が難しく、均一な膜厚
とすることも困難である。このようなことから、従来の
方法による撥水性部材は高い光学性能の必要のない自動
車、建築物の窓ガラスやミラーなどに使われるのみであ
り、精密な光学性能を要求されるカメラレンズなどの光
学部品としての使用には適していなかった。さらに従来
の製造方法では反射防止膜などを真空槽内で成膜した後
大気中に取り出し、その上に有機物質を成膜する工程が
必要なため、工程が複雑である問題も有していた。However, Japanese Patent Application Laid-Open No.
The water-repellent member manufactured by the conventional method disclosed in JP-A-205327 does not have sufficient durability and abrasion resistance because an organic substance is used for the outermost layer. Also,
Since the application of the organic substance is performed by a method such as dip coating, precise control of the film thickness is difficult, and it is also difficult to obtain a uniform film thickness. For this reason, the water-repellent member according to the conventional method is used only for automobiles and building windows or mirrors that do not require high optical performance, and is used for camera lenses and the like that require precise optical performance. It was not suitable for use as an optical component. Further, in the conventional manufacturing method, a process of forming an anti-reflection film or the like in a vacuum chamber, taking out the film in the air, and forming an organic material thereon is necessary, which also has a problem that the process is complicated. .
【０００４】本発明は上記問題点を考慮してなされたも
のであり、通常の反射防止膜などと同質の無機物のみの
コーティングによって構成することにより耐久性および
耐摩耗性に優れた撥水性の光学部材を提供することを目
的とする。The present invention has been made in view of the above problems, and has a water-repellent optical property excellent in durability and abrasion resistance by being constituted by a coating of only an inorganic substance of the same quality as a normal antireflection film or the like. An object is to provide a member.
【０００５】[0005]
【課題を解決するための手段および作用】本発明の光学
部材は、産業上の利用分野に記載するように、基板の表
面に設けられる反射防止膜や反射膜などに撥水性を付与
するために基板状に成膜された反射防止膜または反射膜
の上の最表層が、１０ｎｍ以下の厚さで且つ水との接触
角が６０°を超える撥水性を有する、スパッタリングに
よって成膜したフッ化マグネシウムによって構成されて
いることを特徴とする。また、本発明の光学部材は、基
板上に成膜された反射防止膜または反射膜の上の最表層
が、１０ｎｍ以下の厚さでその表面はフッ化マグネシウ
ムの一部が解離した（−Ｆ）基を有し、水との接触角が
６０°を超える撥水性を有するフッ化マグネシウムによ
って構成されていることを特徴とする。また本発明の光
学部材は、基板上に成膜された反射防止膜または反射膜
の上の最表層が、１０ｎｍ以下の厚さで金属マグネシウ
ムとともにその表面にフッ化マグネシウムの一部が解離
した（−Ｆ）基を有し、水との接触角が６０°を超える
撥水性を有するフッ化マグネシウムによって構成されて
いることを特徴とする。The optical member of the present invention is used for imparting water repellency to an antireflection film or a reflection film provided on the surface of a substrate, as described in the field of industrial application. Magnesium fluoride formed by sputtering, wherein the outermost layer on the antireflection film or the reflection film formed on the substrate has a water repellency having a thickness of 10 nm or less and a contact angle with water exceeding 60 °. Characterized by the following. In the optical member of the present invention, the outermost layer on the antireflection film or the reflection film formed on the substrate has a thickness of 10 nm or less, and a part of the surface has dissociated magnesium fluoride (−F). ) Group, and is characterized by being composed of magnesium fluoride having water repellency having a contact angle with water of more than 60 °. Further, in the optical member of the present invention, the outermost layer on the antireflection film or the reflection film formed on the substrate has a thickness of 10 nm or less and a part of magnesium fluoride is dissociated on the surface thereof together with metallic magnesium ( -F) It is characterized by being composed of magnesium fluoride having a group and having a water repellency having a contact angle with water of more than 60 °.
【０００６】スパッタリングによって成膜したＭｇＦ２
膜は、スパッタリング時のプラズマ作用によってＭｇＦ
２の一部が解離しており、その表面には解離により生じ
た（−Ｆ）基、すなわちフッ素基を有する。このためス
パッタリングによるＭｇＦ２を最表層に備えることによ
り、（−Ｆ）基を有することになって水との接触角が６
０°を越えることとなり、高い撥水性能を有する。MgF 2 formed by sputtering
The film is made of MgF by plasma action during sputtering.
Part of 2 is dissociated, and the surface thereof has a (-F) group generated by dissociation, that is, a fluorine group. For this reason, by providing MgF 2 on the outermost layer by sputtering, it has a (−F) group and has a contact angle with water of 6%.
It exceeds 0 ° and has high water repellency.
【０００７】また、一般に化合物ＭｇＦ２は、カメラな
どの高い性能が要求される光学部品の反射防止膜などに
使われている物質であり、その耐久性能および光学性能
が非常に高いものとなっている。なお、スパッタリング
により形成したＭｇＦ２膜は、スパッタリング中のＭｇ
Ｆ２の解離により生じた金属マグネシウムをも膜中に含
むため、吸収膜となり、膜厚によっては光学性能に影響
するほどの吸収性を有した膜となる虞があるが、このス
パッタリングによるＭｇＦ２膜の厚さを光学性能に影響
するような吸収性を有しない範囲（１０ｎｍ以下）に設
定することにより解決することができる。In general, the compound MgF 2 is a substance used for an antireflection film or the like of an optical component requiring high performance such as a camera, and its durability and optical performance are extremely high. I have. Note that the MgF 2 film formed by sputtering is the same as the MgF 2 film during sputtering.
Since also include in the film a metal magnesium produced by dissociation of F 2, becomes absorbing film, although the film thickness is likely to be a membrane having an absorbent enough to affect the optical performance, MgF 2 by the sputtering The problem can be solved by setting the thickness of the film to a range (10 nm or less) that does not have absorptivity that affects optical performance.
【０００８】[0008]
【実施例】図１は本発明の実施例１の光学部材を示し、
ＢＫ７のガラスからなる基板１上に反射防止膜を設けて
いる。この反射防止膜は膜厚λ／４のＡｌ2 Ｏ3 膜２、
膜厚λ／２のＺｒＯ2 膜３、膜厚λ／４のＭｇＦ2 膜４
（λ＝５００ｎｍ、以下同様）を真空蒸着によって基板
１上に順に成膜することにより形成されるものである。
さらに、ＭｇＦ2 膜４上の最表層には膜厚１０ｎｍのＭ
ｇＦ2 膜がマグネトロンスパッタリングにより成膜さ
れ、これにより、光学部材が構成されている。図３はこ
の実施例１の比較例を示し、ＢＫ７のガラスからなる基
板１上に膜厚λ／４のＡｌ2 Ｏ3 膜２、膜厚λ／２のＺ
ｒＯ2 膜３、膜厚λ／４のＭｇＦ2 膜４が真空蒸着によ
り順に成膜されている（比較例１）。FIG. 1 shows an optical member according to a first embodiment of the present invention.
An antireflection film is provided on a substrate 1 made of BK7 glass. This antireflection film is an Al 2 O 3 film 2 having a thickness of λ / 4,
ZrO 2 film 3 having a thickness of λ / 2, MgF 2 film 4 having a thickness of λ / 4
(Λ = 500 nm, the same applies hereinafter) by sequentially forming a film on the substrate 1 by vacuum evaporation.
Further, the outermost layer on the MgF 2 film 4 has a thickness of 10 nm.
The gF 2 film is formed by magnetron sputtering, thereby forming an optical member. FIG. 3 shows a comparative example of the first embodiment, in which an Al 2 O 3 film 2 having a film thickness of λ / 4 and a Z film having a film thickness of λ / 2 are formed on a substrate 1 made of BK7 glass.
An rO 2 film 3 and a MgF 2 film 4 having a thickness of λ / 4 are sequentially formed by vacuum deposition (Comparative Example 1).
【０００９】図２は本発明の実施例２の光学部材を示
し、ポリメチルメタアクリレート（ＰＭＭＡ）からなる
基板１１上に反射防止膜を設けている。この反射防止膜
は膜厚λ／４のＳｉＯ膜１１、膜厚λ／２のＺｒＯ2 膜
１２、膜厚λ／４のＳｉＯ2 膜１３を真空蒸着によって
基板１１上に順に成膜することにより形成される。さら
にＳｉＯ2 膜１３上の最表層には膜厚１０ｎｍのＭｇＦ
2 膜がマグネトロンスパッタリングにより成膜されてい
る。図４はこの実施例２の比較例を示し、ＰＭＭＡから
なる基板１１上に膜厚λ／４のＳｉＯ膜１２、膜厚λ／
２のＺｒＯ2 膜、膜厚λ／４のＳｉＯ2 膜１３が真空蒸
着により順に成膜されている（比較例２）。FIG. 2 shows an optical member according to a second embodiment of the present invention, in which an antireflection film is provided on a substrate 11 made of polymethyl methacrylate (PMMA). The antireflection film is formed by sequentially forming a SiO film 11 having a thickness of λ / 4, a ZrO 2 film 12 having a thickness of λ / 2, and a SiO 2 film 13 having a thickness of λ / 4 on the substrate 11 by vacuum deposition. It is formed. Further, as the outermost layer on the SiO 2 film 13, a 10 nm-thick MgF
Two films are formed by magnetron sputtering. FIG. 4 shows a comparative example of Example 2, in which a SiO film 12 having a thickness of λ / 4 and a film λ /
2, a ZrO 2 film and a SiO 2 film 13 having a thickness of λ / 4 are sequentially formed by vacuum evaporation (Comparative Example 2).
【００１０】表１は以上の実施例１，２および比較例
１，２の表面の撥水性の検査結果を示し、実施例１，２
の水に対する接触角はいずれも１１５°であり、大きな
撥水性を有しているのに対し、比較例１，２はいずれも
撥水性を有していないことが判明している。Table 1 shows the results of inspection of the water repellency of the surfaces of Examples 1 and 2 and Comparative Examples 1 and 2.
Has a large water repellency, whereas Comparative Examples 1 and 2 have no water repellency.
【００１１】[0011]
【表１】 [Table 1]
【００１２】また、実施例１，２の最表層に幅１８ｍｍ
のセロハンテープ（商品名）を接着し、その接着面に対
し、約４５°の角度でテープを取り除く密着性試験を行
った。さらに実施例１，２の光学部材の対環境試験とし
て、−２０℃→常温（２０〜２５℃）→＋６０℃を５回
繰り返す熱衝撃試験を行った。この結果、いずれの試験
においても成膜初期および対環境試験後における膜剥離
および異常はみられなかった。また、分光反射率を測定
したところ、実施例１，２はいずれも初期性能としての
基本的な光学特性を有していた。The outermost layer of the first and second embodiments has a width of 18 mm.
A cellophane tape (trade name) was adhered, and an adhesion test was performed to remove the tape at an angle of about 45 ° with respect to the adhered surface. Further, as an environmental test of the optical members of Examples 1 and 2, a thermal shock test in which -20 ° C → normal temperature (20 to 25 ° C) → + 60 ° C was repeated 5 times was performed. As a result, no peeling or abnormality was observed in the initial stage of film formation and after the environmental test in any of the tests. When the spectral reflectance was measured, Examples 1 and 2 each had basic optical characteristics as initial performance.
【００１３】[0013]
【発明の効果】本発明の光学素子部材は撥水性を有する
だけでなく、通常の光学膜に使用する材料のみによって
構成されているため、有機物を使用する部材に比べて非
常に高い耐久性と耐摩耗性を有し、しかも高い光学性能
を有している。The optical element member of the present invention has not only water repellency but also a very high durability compared with a member using an organic substance because it is composed only of a material used for an ordinary optical film. It has wear resistance and high optical performance.
【００１４】また、光学膜の全てをスパッタリングのみ
で成膜するか真空蒸着とスパッタリングの双方の成膜を
行う成膜装置を使用することができ、これにより真空中
の成膜後にさらに大気中で成膜するよりも少ない工程
で、撥水性を有する光学部材を製造できる。Further, it is possible to use a film forming apparatus for forming all of the optical film only by sputtering or a film forming apparatus for performing both vacuum vapor deposition and sputtering. An optical member having water repellency can be manufactured with fewer steps than film formation.
【図１】本発明の実施例１の断面図である。FIG. 1 is a sectional view of a first embodiment of the present invention.
【図２】本発明の実施例２の断面図である。FIG. 2 is a sectional view of a second embodiment of the present invention.
【図３】比較例１の断面図である。FIG. 3 is a sectional view of Comparative Example 1.
【図４】比較例２の断面図である。FIG. 4 is a cross-sectional view of Comparative Example 2.
１ 基板 ２ Ａｌ2 Ｏ3 膜 ３ ＺｒＯ2 膜 ４ ＭｇＦ2 膜 ５ ＭｇＦ2 スパッタリング膜1 substrate 2 Al 2 O 3 film 3 ZrO 2 film 4 MgF 2 film 5 MgF 2 sputtering film
Claims (3)
射膜の上の最表層が、１０ｎｍ以下の厚さで且つ水との
接触角が６０°を越える撥水性を有する、スパッタリン
グによって成膜したフッ化マグネシウムによって構成さ
れていることを特徴とする光学部材。An outermost layer on an antireflection film or a reflection film formed on a substrate has a thickness of 10 nm or less and a water repellency having a contact angle with water of more than 60 ° by sputtering. An optical member comprising a film of magnesium fluoride.
射膜の上の最表層が、１０ｎｍ以下の厚さでその表面は
フッ化マグネシウムの一部が解離した（−Ｆ）基を有
し、水との接触角が６０°を越える撥水性を有するフッ
化マグネシウムによって構成されていることを特徴とす
る光学部材。2. An anti-reflection film formed on a substrate or an outermost layer on a reflection film having a thickness of 10 nm or less and a surface having a (-F) group in which a part of magnesium fluoride is dissociated. An optical member comprising a water-repellent magnesium fluoride having a contact angle with water of more than 60 °.
射膜の上の最表層が、１０ｎｍ以下の厚さで金属マグネ
シウムとともにその表面にフッ化マグネシウムの一部が
解離した（−Ｆ）基を有し、水との接触角が６０°を越
える撥水性を有するフッ化マグネシウムによって構成さ
れていることを特徴とする光学部材。3. A part of magnesium fluoride is dissociated on the surface of the outermost layer on the antireflection film or the reflection film formed on the substrate together with metallic magnesium at a thickness of 10 nm or less (-F). An optical member comprising a group and a water-repellent magnesium fluoride having a contact angle with water exceeding 60 °.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09366392A JP3278194B2 (en) | 1992-03-19 | 1992-03-19 | Optical components |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP09366392A JP3278194B2 (en) | 1992-03-19 | 1992-03-19 | Optical components |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05264803A JPH05264803A (en) | 1993-10-15 |
| JP3278194B2 true JP3278194B2 (en) | 2002-04-30 |
Family
ID=14088639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP09366392A Expired - Fee Related JP3278194B2 (en) | 1992-03-19 | 1992-03-19 | Optical components |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3278194B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116590677A (en) * | 2023-04-17 | 2023-08-15 | 哈尔滨工业大学 | Moon dust protective coating with high transmittance and low adhesion on surface of optical lens and preparation method thereof |
-
1992
- 1992-03-19 JP JP09366392A patent/JP3278194B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05264803A (en) | 1993-10-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Rancourt | Optical thin films: user handbook | |
| TWI411694B (en) | Adhesive, hermetic oxide films for metal fluoride optics method of making same | |
| US4944581A (en) | Rear face reflection mirror of multilayer film for synthetic resin optical parts | |
| JP3387204B2 (en) | Polarizing plate, method for manufacturing polarizing plate, and liquid crystal display device | |
| JPH08254612A (en) | Multilayer film optical component and manufacture thereof | |
| CN112501557B (en) | Sapphire substrate 1-5 mu m ultra-wideband antireflection film and preparation method thereof | |
| US20170139083A1 (en) | Silica-modified-fluoride broad angle antireflection coatings | |
| US6645608B2 (en) | Reflection reducing coating | |
| JP3278194B2 (en) | Optical components | |
| JPH07104102A (en) | Water repellant reflection preventive film for glass-made optical parts and production thereof | |
| JP7279713B2 (en) | Optical thin film, optical member, and method for producing optical thin film | |
| JP3497236B2 (en) | Anti-reflection coating for high precision optical components | |
| JPS60156001A (en) | Reflection preventive film of plastic optical parts | |
| JPH0553001A (en) | Multilayered antireflection film of optical parts made of synthetic resin | |
| JP3320148B2 (en) | Manufacturing method of metal mirror | |
| JPH11149005A (en) | Inside surface reflection mirror and its production | |
| JP3352172B2 (en) | Optical thin film of plastic optical component and method of forming the same | |
| JP3689923B2 (en) | Method for producing plastic film having antireflection film | |
| CN114196924A (en) | Coating method of vacuum ultraviolet aluminum reflector on surface of copper substrate | |
| JPS638605A (en) | Reflection mirror consisting of synthetic resin member | |
| JPH08184706A (en) | Manufacture of optical element, and optical element | |
| JP2000162402A (en) | Joined optical product and its manufacture | |
| JP2023135937A (en) | Optical element, optical system, and optical apparatus | |
| JPH07198902A (en) | Water-repellent optical element and its production | |
| JPH08146202A (en) | Optical parts having antireflection film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20020129 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090215 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090215 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100215 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110215 Year of fee payment: 9 |
|
| LAPS | Cancellation because of no payment of annual fees |