JP3231600B2 - Magnetic disk polishing composition and polishing liquid using the same - Google Patents
Magnetic disk polishing composition and polishing liquid using the sameInfo
- Publication number
- JP3231600B2 JP3231600B2 JP29593795A JP29593795A JP3231600B2 JP 3231600 B2 JP3231600 B2 JP 3231600B2 JP 29593795 A JP29593795 A JP 29593795A JP 29593795 A JP29593795 A JP 29593795A JP 3231600 B2 JP3231600 B2 JP 3231600B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- magnetic disk
- composition
- alumina
- polishing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【０００１】[0001]
【発明の属する技術分野】本発明は磁気ディスク基板を
高能率で、高精度の鏡面に研磨することが可能な磁気デ
ィスク研磨用組成物及びそれを用いた研磨液に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic disk polishing composition capable of polishing a magnetic disk substrate with high efficiency and high precision to a mirror surface, and a polishing liquid using the same.
【０００２】[0002]
【従来の技術】パーソナルコンピューターなどの記憶媒
体として、ドライブ装置に組み込まれて使用されるハー
ド磁気ディスク用のガラス基板は、最近の高密度化およ
び小型化への要求から、強度が高くかつ耐水性を有する
新たな材質を有するガラス基板が強く求められている。
このため従来のガラスとは異なる組成を有するガラスが
開発されているが、これらの中には従来のガラス用研磨
剤ではほとんど研磨できないものがある。従来、ガラス
用研磨剤として使用されている組成物は酸化セリウムを
水に分散混合しスラリー状にしたものであり、研磨作用
の主体はメカノケミカル効果によるものであるが、新た
に開発された磁気ディスク基板用のガラスにはこのメカ
ノケミカル効果が全く作用せず、研磨作業の能率が著し
く低下するものがあり、問題となっている。化学的研磨
作用が働かないガラスを、アルミナ質研磨剤を水に分散
させた研磨剤を用いて、機械的研磨作用で研磨しようと
すると、研磨表面がオレンジピールと称する柚肌状を呈
するようになり、好ましくない。2. Description of the Related Art A glass substrate for a hard magnetic disk used as a storage medium for a personal computer or the like incorporated in a drive device has been required to have high strength and water resistance due to recent demands for higher density and smaller size. There is a strong demand for a glass substrate having a new material having
For this reason, glass having a composition different from that of the conventional glass has been developed, but some of them cannot be polished with the conventional glass polishing agent. Conventionally, the composition used as an abrasive for glass is a slurry obtained by dispersing and mixing cerium oxide in water, and the polishing action is mainly based on the mechanochemical effect. This mechanochemical effect does not act on glass for disk substrates at all, and the efficiency of the polishing operation is significantly reduced, which is a problem. If a glass that does not act chemically is polished by mechanical polishing using an abrasive made by dispersing an alumina-based abrasive in water, the polished surface takes on the form of orange peel called orange peel. Is not preferred.
【０００３】[0003]
【発明が解決しようとする課題】本発明においては、ア
ルミナ質研磨剤を水に分散させ、さらにギブサイトを適
量添加することにより、オレンジピールの発生を防止す
ることが可能であることを見い出したものである。すな
わち、本発明においては、磁気ディスク基板を高能率で
高精度の鏡面に研磨することが可能な磁気ディスク研磨
用組成物及びそれを用いた研磨液を提供することを課題
としている。SUMMARY OF THE INVENTION In the present invention, it has been found that the generation of orange peel can be prevented by dispersing an alumina-based abrasive in water and further adding an appropriate amount of gibbsite. It is. That is, an object of the present invention is to provide a magnetic disk polishing composition capable of polishing a magnetic disk substrate to a highly efficient and highly accurate mirror surface, and a polishing liquid using the same.
【０００４】[0004]
【課題を解決するための手段】本発明の磁気ディスク研
磨用組成物は、組成物の主成分がアルミナ質研磨剤粉
末、ギブサイトおよび分散剤であることを特徴とする。
このような研磨用組成物においては、アルミナ質研磨剤
粉末が０．２〜１０μｍの平均粒子径を有していること
が望ましく、０．８〜４μｍであればさらに望ましい。
また、このような組成物を用いた研磨液は、アルミナ質
研磨剤粉末の含有量が５０〜４００ｇ／ｌであることが
望ましく、ギブサイトの含有量が２０〜１００ｇ／ｌで
あることも好ましい。The magnetic disk polishing composition of the present invention is characterized in that the main components of the composition are alumina-based abrasive powder, gibbsite and a dispersant.
In such a polishing composition, the alumina-based abrasive powder preferably has an average particle diameter of 0.2 to 10 μm, and more preferably 0.8 to 4 μm.
Further, the polishing liquid using such a composition desirably has an alumina abrasive powder content of 50 to 400 g / l, and preferably a gibbsite content of 20 to 100 g / l.
【０００５】[0005]
【作用】本発明のアルミナ質研磨剤粉末として、α結晶
粒径が１μｍ以下で、かつ、粉体の平均粒子径が０．２
〜１０μｍ、好ましくは０．８〜４μｍであり、かつ、
最大粒子径が２０μｍ以下のα型アルミナ（酸化アルミ
ニウム）の粉末を用いることが好ましい。平均粒子径が
０．２μｍ以下では研磨能率が低くなり、一方１０μｍ
以上を越えると研磨後の表面粗さが粗くなるので好まし
くない。またギブサイトはボーキサイトを原料とし、バ
イヤー法により製造されたＡｌ（ＯＨ）3 が好ましい。
さらに分散剤としてはヘキサメタリン酸が好ましい。The alumina-based abrasive powder of the present invention has an α crystal particle size of 1 μm or less and an average particle size of the powder of 0.2 μm or less.
10 to 10 μm, preferably 0.8 to 4 μm, and
It is preferable to use α-type alumina (aluminum oxide) powder having a maximum particle diameter of 20 μm or less. If the average particle diameter is 0.2 μm or less, the polishing efficiency is low, while 10 μm
Exceeding the above is undesirable because the surface roughness after polishing becomes coarse. Gibbsite is preferably Al (OH) 3 produced by a Bayer method using bauxite as a raw material.
Further, hexametaphosphoric acid is preferable as the dispersant.
【０００６】これらのアルミナ質研磨剤粉末、ギブサイ
ト、分散剤などを水に分散させスラリー状の研磨液とす
る。アルミナ質研磨剤粉末の含有量は５０〜４００ｇ／
ｌであることが好ましい。含有量が５０ｇ／ｌ未満では
研磨能率が低下し、かつ、スクラッチが発生しやすい。
一方４００ｇ／ｌを越えても研磨能率の向上は認められ
ず、かつ、粘度が増大し作業性が不調となるので好まし
くない。また、ギブサイトの含有量は２０〜１００ｇ／
ｌであることが好ましい。含有量が２０ｇ／ｌ未満で
は、オレンジピールと呼ばれる柚肌状の欠陥の発生を防
止することが困難であり、一方１００ｇ／ｌを越えると
研磨能率の低下が著しくなるので、好ましくない。さら
に、分散剤を１〜３ｇ／ｌ添加することにより、研磨液
中にアルミナ質研磨剤を均一に分散させ、スクラッチの
発生を防止することが可能となる。[0006] These alumina-based abrasive powder, gibbsite, dispersant and the like are dispersed in water to form a slurry-like polishing liquid. The content of the alumina-based abrasive powder is 50 to 400 g /
It is preferably 1. If the content is less than 50 g / l, the polishing efficiency is reduced and scratches are likely to occur.
On the other hand, if it exceeds 400 g / l, no improvement in the polishing efficiency is observed, and the viscosity is increased, resulting in poor workability. In addition, the content of gibbsite is 20 to 100 g /
It is preferably 1. If the content is less than 20 g / l, it is difficult to prevent the occurrence of citrus-like defects called orange peel, while if it exceeds 100 g / l, the polishing efficiency is significantly reduced, which is not preferable. Further, by adding 1 to 3 g / l of the dispersant, the alumina-based abrasive can be uniformly dispersed in the polishing liquid, and the generation of scratches can be prevented.
【０００７】上記のようにして、磁気ディスク基板を高
能率で高精度の鏡面に研磨することが可能な磁気ディス
ク研磨液が得られる。本発明の磁気ディスク研磨用組成
物は、特殊な結晶化ガラスの磁気ディスクの研磨を対象
としているが、通常のガラス磁気ディスクや、アルミニ
ウム合金に無電解ニッケル−リン合金めっきを施した磁
気ディスクにも適用可能である。As described above, a magnetic disk polishing liquid capable of polishing a magnetic disk substrate to a highly efficient and highly accurate mirror surface is obtained. The magnetic disk polishing composition of the present invention is intended for polishing a special crystallized glass magnetic disk.However, it can be applied to a normal glass magnetic disk or a magnetic disk obtained by subjecting an aluminum alloy to electroless nickel-phosphorus alloy plating. Is also applicable.
【０００８】[0008]
【実施例】以下、本発明を実施例にてさらに詳細に説明
する。 （実施例）表１〜３に本発明の実施範囲を説明する実験
に用いた磁気ディスク研磨用組成物を示す。これらの磁
気ディスク研磨用組成物を用いて、下記の条件でディス
ク基板を研磨した。 [研磨装置]：片面ポリシンブマシン（定盤径２００ｍ
ｍ） [ギブサイト]：以下のＡまたはＢのいずれかのギブサイ
トを用いた。 Ａ：昭和電工(株)製、Ｈ−４２ 平均粒子径：１．０μｍ、比表面積：５．４ｍ2／ｇ
（ＢＥＴ装置で測定） Ｂ：昭和電工(株)製、Ｈ−４３ 平均粒子径：０．６μｍ、比表面積：８．０ｍ2／ｇ
（ＢＥＴ装置で測定） [ディスク基板]：以下の甲または乙のいずれかのディス
ク基板を用いた。 甲：厚さ０．６７５ｍｍの２０ｍｍ径の孔を有する６５
ｍｍ径のドーナッツ状の結晶化ガラス板 乙：厚さ０．６４５ｍｍの２０ｍｍ径の孔を有する６５
ｍｍ径のドーナッツ状のニッケル−燐めっきを施したア
ルミニウム板 [研磨条件]：下定盤回転数：１２０ｒｐｍ 加工圧力 ガラスディスク：２００〜２５０ｇ／ｃｍ2 ニッケル−燐めっきアルミニウムディスク：８０ｇ／ｃ
ｍ2 研磨液流量：１〜１０ｍｌ／分The present invention will be described in more detail with reference to the following examples. (Examples) Tables 1 to 3 show compositions for polishing magnetic disks used in experiments for explaining the scope of the present invention. Using these magnetic disk polishing compositions, disk substrates were polished under the following conditions. [Polishing device]: Single-sided polysimbu machine (platen diameter 200m)
m) [Give site]: The following A or B gibbsite was used. A: Showa Denko KK, H-42 average particle diameter: 1.0 μm, specific surface area: 5.4 m 2 / g
(Measured with a BET device) B: H-43 manufactured by Showa Denko KK, average particle diameter: 0.6 μm, specific surface area: 8.0 m 2 / g.
(Measured by BET device) [Disk substrate]: One of the following disk substrates was used. Party A: 65 with a 20 mm diameter hole 0.675 mm thick
Donut-shaped crystallized glass plate having a diameter of mm: B: 65 mm having a hole having a thickness of 0.645 mm and a diameter of 20 mm
mm diameter donut-shaped nickel-phosphorus-plated aluminum plate [Polishing condition]: Lower platen rotation speed: 120 rpm Working pressure Glass disc: 200 to 250 g / cm 2 Nickel-phosphorus-plated aluminum disc: 80 g / c
m 2 polishing liquid flow rate: 1 to 10 ml / min
【０００８】上記の磁気ディスク研磨用組成物を用い
て、上記の条件でディスク基板を研磨し、下記の項目を
測定し、磁気ディスク研磨用組成物の特性を評価した。 [研磨レート]：研磨前後の磁気ディスク基板の重量を測
定し、重量減を厚みに換算し、研磨レートとした。 [表面状態]：研磨後の磁気ディスク基板の表面は、微分
干渉顕微鏡でオレンジピールおよびスクラッチの発生の
有無を観察し、下記に示す基準で評価した。 ○：表面欠陥は認められない。 △：表面欠陥がわずかに認められ、実用上問題を生じる
恐れがある。 ×：実用に供し得ない程度に表面欠陥が認められる。 特性評価結果を表４〜５に示す。Using the above-described magnetic disk polishing composition, a disk substrate was polished under the above conditions, and the following items were measured to evaluate the characteristics of the magnetic disk polishing composition. [Polishing rate]: The weight of the magnetic disk substrate before and after polishing was measured, and the weight loss was converted into a thickness to obtain a polishing rate. [Surface state]: The surface of the polished magnetic disk substrate was observed for the occurrence of orange peel and scratches with a differential interference microscope and evaluated according to the following criteria. ：: No surface defect is observed. Δ: Slight surface defects were observed, which might cause practical problems. X: Surface defects are observed to such an extent that they cannot be put to practical use. Tables 4 and 5 show the characteristic evaluation results.
【０００９】[0009]
【表１】 [Table 1]
【００１０】[0010]
【表２】 [Table 2]
【００１１】[0011]
【表３】 [Table 3]
【００１２】[0012]
【表４】 [Table 4]
【００１３】[0013]
【表５】 [Table 5]
【００１４】上記のように、本発明の磁気ディスク研磨
用組成物を用いて結晶化ガラス板を研磨した場合、従来
の酸化セリウムを用いた研磨剤に比較し、研磨レートが
著しく改善される。また本発明の磁気ディスク研磨用組
成物及び研磨液はニッケル−燐めっきを施したアルミニ
ウム板の研磨にも適用可能である。As described above, when a crystallized glass plate is polished using the magnetic disk polishing composition of the present invention, the polishing rate is significantly improved as compared with a conventional polishing agent using cerium oxide. The magnetic disk polishing composition and polishing liquid of the present invention can also be applied to polishing of an aluminum plate subjected to nickel-phosphorus plating.
【００１５】[0015]
【発明の効果】本発明の磁気ディスク研磨用組成物及び
研磨液は、機械的研磨作用でガラス磁気ディスク基板を
研磨することが可能であり、従来の研磨剤に比較し、研
磨レートが著しく大きく、かつ機械的研磨作用で生じや
すいオレンジピールの発生を防止することができる。ま
た、本発明の組成物及び研磨液は、ニッケル−燐めっき
を施したアルミニウム板の研磨にも適用することができ
る。The composition and polishing solution for polishing a magnetic disk of the present invention can polish a glass magnetic disk substrate by a mechanical polishing action, and the polishing rate is significantly higher than that of a conventional polishing agent. In addition, it is possible to prevent the occurrence of orange peel, which tends to occur due to the mechanical polishing action. Further, the composition and polishing liquid of the present invention can be applied to polishing of an aluminum plate subjected to nickel-phosphorus plating.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平１−188264（ＪＰ，Ａ) 特開 平４−159387（ＪＰ，Ａ) 特表 平11−511394（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) B24B 37/00 C09K 3/14 550 G11B 5/84 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-1-188264 (JP, A) JP-A-4-159387 (JP, A) JP-A-11-511394 (JP, A) (58) Survey Field (Int.Cl. 7 , DB name) B24B 37/00 C09K 3/14 550 G11B 5/84
Claims (5)
末、ギブサイトおよび分散剤である磁気ディスク研磨用
組成物。1. A magnetic disk polishing composition wherein the main components of the composition are alumina-based abrasive powder, gibbsite and a dispersant.
０μｍの平均粒子径を有していることを特徴とする、請
求項１に記載の磁気ディスク研磨用組成物。2. The method according to claim 1, wherein the alumina-based abrasive powder is 0.2 to 1%.
The composition for polishing a magnetic disk according to claim 1, wherein the composition has an average particle diameter of 0 µm.
μｍの平均粒子径を有していることを特徴とする、請求
項２に記載の磁気ディスク研磨用組成物。3. The method according to claim 1, wherein the alumina-based abrasive powder is 0.8 to 4%.
3. The composition for polishing a magnetic disk according to claim 2, wherein the composition has an average particle diameter of μm.
０〜４００ｇ／ｌである、請求項１〜３のいずれかに記
載の磁気ディスク研磨用組成物を用いた研磨液。4. The content of the alumina-based abrasive powder is 5%.
A polishing liquid using the magnetic disk polishing composition according to any one of claims 1 to 3, which is 0 to 400 g / l.
ｇ／ｌである、請求項１〜３のいずれかに記載の磁気デ
ィスク研磨用組成物を用いた研磨液。5. The content of gibbsite is 20 to 100.
A polishing liquid comprising the magnetic disk polishing composition according to claim 1, wherein the polishing liquid is g / l.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29593795A JP3231600B2 (en) | 1995-10-20 | 1995-10-20 | Magnetic disk polishing composition and polishing liquid using the same |
| AU17346/97A AU1734697A (en) | 1995-10-20 | 1997-02-21 | Magnetic disc polishing composition and polishing liquid containing it |
| PCT/JP1997/000498 WO1998037162A1 (en) | 1995-10-20 | 1997-02-21 | Magnetic disc polishing composition and polishing liquid containing it |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29593795A JP3231600B2 (en) | 1995-10-20 | 1995-10-20 | Magnetic disk polishing composition and polishing liquid using the same |
| PCT/JP1997/000498 WO1998037162A1 (en) | 1995-10-20 | 1997-02-21 | Magnetic disc polishing composition and polishing liquid containing it |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09109020A JPH09109020A (en) | 1997-04-28 |
| JP3231600B2 true JP3231600B2 (en) | 2001-11-26 |
Family
ID=17827050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29593795A Expired - Fee Related JP3231600B2 (en) | 1995-10-20 | 1995-10-20 | Magnetic disk polishing composition and polishing liquid using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3231600B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998037162A1 (en) * | 1995-10-20 | 1998-08-27 | Toyo Kohan Co., Ltd. | Magnetic disc polishing composition and polishing liquid containing it |
| JP2002110596A (en) * | 2000-10-02 | 2002-04-12 | Mitsubishi Electric Corp | Polishing agent for semiconductor processing, dispersant used therefor, and method of manufacturing semiconductor device using the same polishing agent |
-
1995
- 1995-10-20 JP JP29593795A patent/JP3231600B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09109020A (en) | 1997-04-28 |
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