JP3142185U - Press mold washer - Google Patents
Press mold washer Download PDFInfo
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- JP3142185U JP3142185U JP2008001753U JP2008001753U JP3142185U JP 3142185 U JP3142185 U JP 3142185U JP 2008001753 U JP2008001753 U JP 2008001753U JP 2008001753 U JP2008001753 U JP 2008001753U JP 3142185 U JP3142185 U JP 3142185U
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Abstract
【課題】製品不良率を下げ、コストを下げ、全体の競争力を高める押圧金型洗浄機を提供する。
【解決手段】押圧金型洗浄機は、一前置洗浄機構１及び前置洗浄機構一側に連接する一プラズマ洗浄機構２を含む。そのうち、前置洗浄機構は一機体、及び機体に可動設置する一回転ブラシを含み、プラズマ洗浄機構は一プラズマ発生ユニット、プラズマ発生ユニット２１に連接する少なくとも一気体進入通路２２、及びプラズマ発生ユニット一面に複数設置するプラズマ出口を含む。
【選択図】図２The present invention provides a press die cleaning machine that reduces the product defect rate, reduces costs, and increases overall competitiveness.
A press die cleaning machine includes a pre-cleaning mechanism and a plasma cleaning mechanism connected to one side of the pre-cleaning mechanism. Among them, the pre-cleaning mechanism includes one body and one rotating brush that is movably installed on the body, and the plasma cleaning mechanism includes one plasma generation unit, at least one gas entry passage 22 connected to the plasma generation unit 21, and one surface of the plasma generation unit. Includes multiple plasma outlets.
[Selection] Figure 2
Description
本考案は、押圧金型洗浄機に関するもので、特にプラズマ洗浄機構に依る高洗浄効率及び前置洗浄の補助機構により、製品不良率を下げ、コストを下げ、全体の競争力を高める目的を達成する。 The present invention relates to a press die cleaning machine, and achieves the purpose of lowering the product defect rate, lowering the cost, and increasing the overall competitiveness, especially by the high cleaning efficiency and pre-cleaning auxiliary mechanism by the plasma cleaning mechanism. To do.
一般に半導体のパッケージ過程に於いて、金型上に残った有機汚染物質もしくは沈殿物は製品本体を汚したり、材料の接合に良好な効果をもたらさなかったりする。そのため、現在業界では化合物を使用して吸着、粘着特性を利用し、金型から汚れを取り除いて洗浄する。 In general, in the semiconductor packaging process, organic contaminants or precipitates remaining on the mold may contaminate the product body or do not have a good effect on the joining of materials. For this reason, the industry currently uses compounds to take advantage of the adsorption and adhesive properties, removes dirt from the mold and cleans it.
大気圧力下的プラズマ表面処理方式は、気体(例として窒素、酸素、二酸化炭素、酸化窒素、全フッ化気体、水素、アンモニア、塩化物気体、オゾンもしくはその混合物等)に電圧(交流電圧もしくは直流電圧)をかけてプラズマ(一部イオン化を受けた気体)を発生させ、そのプラズマを金型表面上に噴霧し、金型表面の汚れを除去し、レジスト剥離、金属酸化物還元、表面修正、薄膜形成及び有機薄膜の粘着力等を行うことを目的とする。 The plasma surface treatment method under atmospheric pressure uses gas (for example, nitrogen, oxygen, carbon dioxide, nitrogen oxide, perfluorinated gas, hydrogen, ammonia, chloride gas, ozone, or a mixture thereof) to a voltage (AC voltage or DC). Voltage) to generate plasma (partially ionized gas), spray the plasma on the mold surface, remove the mold surface dirt, resist stripping, metal oxide reduction, surface modification, The purpose is to form a thin film and to adhere an organic thin film.
解決しようとする問題点は、製品不良率及びコストが高く、全体の競争力が低い点である。 The problem to be solved is that the product defect rate and cost are high, and the overall competitiveness is low.
本考案は、一前置洗浄機構及び前置洗浄機構一側に連接する一プラズマ洗浄機構を含む。そのうち、前置洗浄機構は一機体、及び機体に可動設置する一回転ブラシを含み、プラズマ洗浄機構は一プラズマ発生ユニット、プラズマ発生ユニットに連接する少なくとも一気体進入通路、及びプラズマ発生ユニット一面に複数設置するプラズマ出口を含むことを最も主要な特徴とする。 The present invention includes a pre-cleaning mechanism and a plasma cleaning mechanism connected to one side of the pre-cleaning mechanism. Among them, the pre-cleaning mechanism includes one body and one rotating brush movably installed on the body, and the plasma cleaning mechanism includes one plasma generation unit, at least one gas inlet passage connected to the plasma generation unit, and a plurality of plasma generation units on one surface. The main feature is to include a plasma outlet to be installed.
本考案の押圧金型洗浄機は、製品不良率を下げ、コストを下げ、全体の競争力を高めるという利点がある。 The press die cleaning machine of the present invention has the advantages of reducing the product defect rate, reducing the cost, and increasing the overall competitiveness.
公知技術の欠点を改善するため、製品不良率及びコストを下げ、更に全体の競争力を高める押圧金型洗浄機を提供することを本考案の主な目的とする。 The main object of the present invention is to provide a pressing mold washer that reduces the defective product rate and cost, and further increases the overall competitiveness in order to improve the drawbacks of the known technology.
上述の目的を達成するため、本考案の提供する一種の押圧金型洗浄機は、一機体、及び機体に可動設置する一回転ブラシを含む一前置洗浄機構と、
前置洗浄機構一側に連接し、一プラズマ発生ユニット、プラズマ発生ユニットに連接する少なくとも一気体進入通路、及びプラズマ発生ユニット一面に設置する複数のプラズマ出口を含む一プラズマ洗浄機構を含む。
In order to achieve the above-mentioned object, a kind of pressing mold cleaning machine provided by the present invention includes one body and a one-front cleaning mechanism including a one-turn brush that is movably installed on the body,
One plasma cleaning mechanism is connected to one side of the pre-cleaning mechanism, and includes one plasma generation unit, at least one gas inlet passage connected to the plasma generation unit, and a plurality of plasma outlets installed on one surface of the plasma generation unit.
図１から図３に示すのは、本考案の押圧金型洗浄機の実施例で、洗浄待ち金型９(例として図４参照)表面に対して処理を行い、一前置洗浄機構１及び一前置洗浄機構１後側に連接したプラズマ洗浄機構２を含む。ここで説明しなければならないのは、本考案の実施例は別にその他各式機能ユニットを具え、簡略図式及び説明を行う。ここでのアーキテクチャーは本考案の実施例に関連する部品についてのみで、例としてプラズマ洗浄機構２内に用いる気体を転換してプラズマを発生する電極部、電極部を絶縁する絶縁部、電極部表面温度を下げる放熱部等は図式に示していない。更に前置洗浄機構１及びプラズマ洗浄機構２の数は実施例では一個で示しているが制限するものではなく、二個、三個もしくは三個以上等でもよい。実施例では前置洗浄機構１及びプラズマ洗浄機構２について説明を行う。 FIG. 1 to FIG. 3 show an embodiment of the press die cleaning machine according to the present invention, which performs processing on the surface of a cleaning waiting die 9 (see FIG. 4 as an example), A plasma cleaning mechanism 2 connected to the rear side of the pre-cleaning mechanism 1 is included. What has to be explained here is that, in addition to the embodiment of the present invention, other functional units are provided and simplified diagrams and explanations will be given. The architecture here is only for parts related to the embodiment of the present invention. For example, an electrode part for generating plasma by changing the gas used in the plasma cleaning mechanism 2, an insulating part for insulating the electrode part, and an electrode part The heat dissipating part etc. which lower the surface temperature are not shown in the diagram. Furthermore, although the number of the pre-cleaning mechanisms 1 and the plasma cleaning mechanisms 2 is shown as one in the embodiment, it is not limited, and may be two, three, three or more. In the embodiment, the pre-cleaning mechanism 1 and the plasma cleaning mechanism 2 will be described.
図１から図３に示すとおり、上述の前置洗浄機構１は、一機体１１、機体１１に可動設置する一回転ブラシ１２及び機体１１側辺に貫設した第一排気孔１３を含む。この回転ブラシ１２は、洗浄待ち金型９(図４)表面を回転洗浄し、第一排気孔１３は、汚れた気体及び洗浄待ち金型９表面上の汚染物もしくは沈殿物を排出する。 As shown in FIGS. 1 to 3, the above-described pre-cleaning mechanism 1 includes one body 11, a one-turn brush 12 that is movably installed on the body 11, and a first exhaust hole 13 that penetrates the side of the body 11. The rotary brush 12 rotates and cleans the surface of the cleaning waiting mold 9 (FIG. 4), and the first exhaust hole 13 discharges dirty gas and contaminants or precipitates on the surface of the cleaning waiting mold 9.
図１から図３に示すとおり、上述のプラズマ洗浄機構２は、前置洗浄機構１一側に連接し、一プラズマ発生ユニット２１、プラズマ発生ユニット２１に連接する少なくとも一気体進入通路２２、プラズマ発生ユニット２１一面に複数穿設するプラズマ出口２３、及びプラズマ発生ユニット２１一側に設置する少なくとも一第二排気孔２４を含む。この気体進入通路２２はプラズマ発生ユニット２１が必要とする気体を入れて供給し、プラズマ発生ユニット２１は気体進入通路２２から進入及び供給された気体を受け取り、転換してプラズマを発生させ、発生したプラズマをプラズマ出口２３に伝える。このプラズマ出口２３がプラズマを洗浄待ち金型９(例として図４参照)表面に排出して処理を行う。その他、上述したプラズマ出口２３はノズルとする。 As shown in FIGS. 1 to 3, the above-described plasma cleaning mechanism 2 is connected to one side of the pre-cleaning mechanism 1, one plasma generation unit 21, at least one gas entry passage 22 connected to the plasma generation unit 21, and plasma generation A plurality of plasma outlets 23 formed on one surface of the unit 21 and at least one second exhaust hole 24 installed on one side of the plasma generation unit 21 are included. The gas entry passage 22 is supplied with the gas required by the plasma generation unit 21, and the plasma generation unit 21 receives the gas entered and supplied from the gas entry passage 22, converts it to generate plasma, and generates it. The plasma is transmitted to the plasma outlet 23. The plasma outlet 23 discharges the plasma to the surface of the cleaning waiting mold 9 (see FIG. 4 as an example) for processing. In addition, the plasma outlet 23 described above is a nozzle.
上述部品を実施した使用状態は、図４に示すとおり、本考案の押圧金型洗浄機の良好な実施例であり、一洗浄待ち金型９を提供し、前置洗浄機構１及びプラズマ洗浄機構２を洗浄待ち金型９の表面に対して処理する。先ず、前置洗浄機構１は回転ブラシ１２を回転し、且つ回転ブラシ１２で洗浄待ち金型９の表面に対して洗浄を行う。続いてプラズマ洗浄機構２ではプラズマを発生させ、プラズマ出口２３から洗浄待ち金型９表面に対してそのプラズマを排出して処理する。洗浄待ち金型９の表面を回転ブラシ１２で洗浄した後、続いてプラズマ洗浄を行うので、使用すると、洗浄待ち金型９表面の有機汚染物もしくは沈殿物の発生機会を減らし、有効に製品不良率を下げ、更にコストを下げ、別に全体の競争力を高める。 As shown in FIG. 4, the use state in which the above-described parts are implemented is a good embodiment of the press die cleaning machine of the present invention, and provides one cleaning waiting die 9, the pre-cleaning mechanism 1 and the plasma cleaning mechanism. 2 is processed on the surface of the cleaning waiting mold 9. First, the pre-cleaning mechanism 1 rotates the rotating brush 12 and cleans the surface of the cleaning waiting mold 9 with the rotating brush 12. Subsequently, the plasma cleaning mechanism 2 generates plasma and discharges the plasma from the plasma outlet 23 to the surface of the cleaning waiting mold 9 for processing. Since the surface of the waiting mold 9 is cleaned with the rotary brush 12 and then plasma cleaning is performed, if used, the chance of generating organic contaminants or precipitates on the surface of the waiting mold 9 is reduced and the product is effectively defective. Reduce rates, further reduce costs, and increase overall competitiveness.
図５に示すのは、本考案の別の一実施例の押圧金型洗浄機は、前の一実施例と組立方式が同じである。本実施例が異なるのは、プラズマ出口２３が複数連続し、間隔が隣接して配列し、且つプラズマ出口２３が洗浄待ち金型９に相対するように設置する。本実施例を動作する時、前置洗浄機構１が先に動き、洗浄待ち金型９に対して補助洗浄動作を行う。次にプラズマ洗浄機構２が洗浄待ち金型９に対してプラズマ表面処理を行う。プラズマ出口２３は洗浄待ち金型に相対して設置するため、プラズマ洗浄機構２が定位すると、一回の動作で済むため効率が高まる。 FIG. 5 shows a pressing mold washer according to another embodiment of the present invention having the same assembly method as the previous embodiment. This embodiment is different in that a plurality of plasma outlets 23 are continuously arranged, the intervals are arranged adjacent to each other, and the plasma outlets 23 are opposed to the cleaning mold 9. When this embodiment is operated, the pre-cleaning mechanism 1 moves first and performs an auxiliary cleaning operation on the cleaning waiting mold 9. Next, the plasma cleaning mechanism 2 performs plasma surface treatment on the cleaning waiting mold 9. Since the plasma outlet 23 is installed relative to the cleaning waiting mold, when the plasma cleaning mechanism 2 is localized, only one operation is required, so that the efficiency is increased.
上述のプラズマ出口２３の形状大きさ及び分布の密度は可視で随意に設置する。本考案は単一の前置洗浄機構１を単一のプラズマ洗浄機構２に結合しているが、当然複数の前置洗浄機構１及びプラズマ洗浄機構２を同時に設置してもよく、同時に複数個の洗浄待ち金型９を洗浄する。ただ置くだけでいいので、本実施例は本考案を制限しない。 The shape size of the plasma outlet 23 and the density of the distribution are visible and optional. In the present invention, a single pre-cleaning mechanism 1 is coupled to a single plasma cleaning mechanism 2, but naturally a plurality of pre-cleaning mechanisms 1 and plasma cleaning mechanisms 2 may be installed at the same time. The waiting mold 9 is cleaned. This embodiment does not limit the present invention because it can be simply placed.
１ 前置洗浄機構
１１ 機体
１２ 回転ブラシ
１３ 第一排気孔
２ プラズマ洗浄機構
２１ プラズマ発生ユニット
２２ 気体進入通路
２３ プラズマ出口
２４ 第二排気孔
９ 洗浄待ち金型
DESCRIPTION OF SYMBOLS 1 Pre-cleaning mechanism 11 Airframe 12 Rotating brush 13 First exhaust hole 2 Plasma cleaning mechanism 21 Plasma generating unit 22 Gas entrance passage 23 Plasma outlet 24 Second exhaust hole 9 Cleaning waiting mold
Claims (5)
一機体、及び機体に可動設置する一回転ブラシを含む一前置洗浄機構と、
前置洗浄機構一側に連接し、一プラズマ発生ユニット、プラズマ発生ユニットに連接する少なくとも一気体進入通路、及びプラズマ発生ユニット一面に設置する複数のプラズマ出口を含む一プラズマ洗浄機構を含むことを特徴とする、押圧金型洗浄機。 In the press mold washing machine,
One pre-cleaning mechanism including one airframe and a one-turn brush that is movably installed on the airframe;
One plasma cleaning mechanism is connected to one side of the front cleaning mechanism, and includes one plasma generation unit, at least one gas inflow passage connected to the plasma generation unit, and a plurality of plasma outlets installed on one surface of the plasma generation unit. A pressing mold washer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008001753U JP3142185U (en) | 2008-03-25 | 2008-03-25 | Press mold washer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| JP2008001753U JP3142185U (en) | 2008-03-25 | 2008-03-25 | Press mold washer |
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| Publication Number | Publication Date |
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| JP3142185U true JP3142185U (en) | 2008-06-05 |
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| JP2008001753U Expired - Fee Related JP3142185U (en) | 2008-03-25 | 2008-03-25 | Press mold washer |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017516651A (en) * | 2014-06-05 | 2017-06-22 | イリノイ トゥール ワークス インコーポレイティド | System and method for cleaning objects |
| CN114308907A (en) * | 2022-02-23 | 2022-04-12 | 袭晓冰 | Plasma cleaning device for precision analysis instrument |
-
2008
- 2008-03-25 JP JP2008001753U patent/JP3142185U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017516651A (en) * | 2014-06-05 | 2017-06-22 | イリノイ トゥール ワークス インコーポレイティド | System and method for cleaning objects |
| CN114308907A (en) * | 2022-02-23 | 2022-04-12 | 袭晓冰 | Plasma cleaning device for precision analysis instrument |
| CN114308907B (en) * | 2022-02-23 | 2023-11-28 | 深圳市震华等离子体智造有限公司 | Plasma cleaning device for precise analysis instrument |
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