JP3131160U - 低温スパッタリングコーティング抗反射層のボード構造 - Google Patents
低温スパッタリングコーティング抗反射層のボード構造 Download PDFInfo
- Publication number
- JP3131160U JP3131160U JP2006008963U JP2006008963U JP3131160U JP 3131160 U JP3131160 U JP 3131160U JP 2006008963 U JP2006008963 U JP 2006008963U JP 2006008963 U JP2006008963 U JP 2006008963U JP 3131160 U JP3131160 U JP 3131160U
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- Prior art keywords
- refractive index
- index layer
- board
- low
- temperature sputtering
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- 238000004544 sputter deposition Methods 0.000 title claims abstract description 29
- 238000000576 coating method Methods 0.000 title claims abstract description 24
- 230000003667 anti-reflective effect Effects 0.000 title claims abstract description 23
- 239000011248 coating agent Substances 0.000 title claims abstract description 23
- 239000011521 glass Substances 0.000 claims description 8
- 150000004706 metal oxides Chemical class 0.000 claims description 8
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 229910052755 nonmetal Inorganic materials 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 239000002861 polymer material Substances 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 41
- 238000004140 cleaning Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 8
- 239000002994 raw material Substances 0.000 abstract description 6
- 238000009434 installation Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 239000003595 mist Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 238000010924 continuous production Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000005693 optoelectronics Effects 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
【解決手段】光電気産業の原材料業者が抗反射層パネルの材料を大量生産するのに用いられ、かつ従来の霧状抗反射層パネルの大量生産に優れている。主として高屈折率層22により低屈折率層32の交互に積層するスパッタリングボード構造の抗反射の特徴によって、連続で生産するフローチャートを有し、プラズマの洗浄ボードの表面を使用し、従来のスパッタリング生産機器を組み合わせることで、設置の利便性と高級材料の大量生産の利便性を図ることができる。
【選択図】図3
Description
15 洗浄表面プラズマ
20 金属酸化物プラズマ
22 高屈折率層
30 非金属酸化物プラズマ
32 低屈折率層
Claims (5)
- ボードから成る基材と、
基材の上に形成する少なくとも一層の高屈折率層または低屈折率層を含み、前記高屈折率層は低屈折率層に対し少なくとも2層に交互に積層することを特徴とする低温スパッタリングコーティング抗反射層のボードにおける構造。 - 前記ボードが高分子材料またはガラスから成ることを特徴とする請求項1に記載の低温スパッタリングコーティング抗反射層のボードにおける構造。
- 前記高屈折率層は金属酸化物から成り、且つ前記低屈折率層は非金属酸化物から成ることを特徴とする請求項1に記載の低温スパッタリングコーティング抗反射層のボードにおける構造。
- 前記高屈折率層がITO、Nb2O5またはZnOから成り、前記低屈折率層はSiO2から成ることを特徴とする請求項1に記載の低温スパッタリングコーティング抗反射層のボードにおける構造。
- 前記ボードの最低層と最高層が低屈折率層から成ることを特徴とする請求項1に記載の低温スパッタリングコーティング抗反射層のボードにおける構造。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094138864A TW200718790A (en) | 2005-11-04 | 2005-11-04 | Low temperature sputtering anti-reflection layer structure on sheet and manufacturing method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JP3131160U true JP3131160U (ja) | 2007-04-26 |
Family
ID=37421581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006008963U Expired - Fee Related JP3131160U (ja) | 2005-11-04 | 2006-11-02 | 低温スパッタリングコーティング抗反射層のボード構造 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3131160U (ja) |
GB (1) | GB2431931A (ja) |
TW (1) | TW200718790A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018008431A (ja) * | 2016-07-13 | 2018-01-18 | 大日本印刷株式会社 | 光学積層体 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101902217B (zh) * | 2009-06-01 | 2013-03-27 | 冠华科技股份有限公司 | 数字电容式触控板结构改良 |
CN106086800A (zh) * | 2016-08-03 | 2016-11-09 | 光驰科技(上海)有限公司 | 在pmma或pc材质基板上制备高性能减反射膜的工艺 |
TWI617828B (zh) * | 2017-06-27 | 2018-03-11 | 吳鳳學校財團法人吳鳳科技大學 | 抗反射組合片 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69128192T2 (de) * | 1990-08-30 | 1998-05-28 | Viratec Thin Films Inc | Verfahren zur abscheidung von nioboxid enthaltenden optischen beschichtungen mittels reaktiver gleichstromzerstäubung |
US5450238A (en) * | 1993-12-10 | 1995-09-12 | Viratec Thin Films, Inc. | Four-layer antireflection coating for deposition in in-like DC sputtering apparatus |
JPH0925562A (ja) * | 1995-07-10 | 1997-01-28 | Ulvac Japan Ltd | 反射防止多層薄膜およびその成膜方法並びにその成膜装置 |
JP3975242B2 (ja) * | 1997-05-16 | 2007-09-12 | Hoya株式会社 | 反射防止膜を有するプラスチック光学部品 |
JP3952609B2 (ja) * | 1998-09-28 | 2007-08-01 | コニカミノルタホールディングス株式会社 | 電磁波低減反射防止コート |
JP3952603B2 (ja) * | 1998-07-23 | 2007-08-01 | コニカミノルタホールディングス株式会社 | 電磁波低減反射防止膜および該反射防止膜を有する光学部材 |
WO2005030663A1 (en) * | 2003-09-29 | 2005-04-07 | Glaverbel | Transparent substrate comprising an anti-reflective stack of layers |
-
2005
- 2005-11-04 TW TW094138864A patent/TW200718790A/zh unknown
-
2006
- 2006-09-25 GB GB0618865A patent/GB2431931A/en not_active Withdrawn
- 2006-11-02 JP JP2006008963U patent/JP3131160U/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018008431A (ja) * | 2016-07-13 | 2018-01-18 | 大日本印刷株式会社 | 光学積層体 |
Also Published As
Publication number | Publication date |
---|---|
GB2431931A (en) | 2007-05-09 |
TW200718790A (en) | 2007-05-16 |
GB0618865D0 (en) | 2006-11-01 |
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