JP2022095545A

JP2022095545A - Electrode for high frequency dielectric heating

Info

Publication number: JP2022095545A
Application number: JP2021189335A
Authority: JP
Inventors: 正邦芝; Masakuni Shiba; 清巳中井; Kiyomi Nakai
Original assignee: Asahi Kasei Corp
Current assignee: Asahi Kasei Corp
Priority date: 2020-12-16
Filing date: 2021-11-22
Publication date: 2022-06-28
Also published as: KR20220086490A; CN114633480A; CN114633480B

Abstract

To provide an electrode for high frequency dielectric heating which can reduce the possibility that a surface layer portion of a resin tubular film is peeled off and the opening fails when a sealing portion of the film is cut and opened.SOLUTION: An electrode 20 for high frequency dielectric heating for forming an envelope-attached tubular film 100 by performing high-frequency dielectric heating across a first region P1 and a second region P2 in a state in which the first region P1 and the second region P2 of a laminated film P formed by stacking two vinylidene chloride resin films F are arranged and stacked on the outer side in the radial direction and the inner side in the radial direction, respectively, includes an external electrode 21 arranged radially outside the first region P1, and an internal electrode 22 arranged radially inside the second region P2, and a coating 21A made of an electrical insulator is formed on the external electrode 21.SELECTED DRAWING: Figure 2

Description

本発明は、高周波誘電加熱用電極に関する。 The present invention relates to a high frequency dielectric heating electrode.

現在、ソーセージ等の内容物を包装するための樹脂製フィルムからなる筒状の包装体が種々提案されている。例えば、円筒状に丸めたフィルムの両縁部の内面同士を合掌状態で接合することにより、円筒状のケーシング部と、ケーシング部から径方向外側に突出して長手方向に延在するシール部と、を形成し、シール部を倒しケーシング部と一緒に溶着して接合することにより、円筒状の包装体を構成する技術が提案されている（特許文献１参照）。また、近年においては、フィルムの両縁部同士を接合して形成したシール部を特定の材料で構成することにより、易開封性とレトルト耐性との双方を実現させる技術が提案されている（特許文献２参照）。 Currently, various tubular packages made of a resin film for packaging contents such as sausages have been proposed. For example, a cylindrical casing portion and a sealing portion that protrudes radially outward from the casing portion and extends in the longitudinal direction by joining the inner surfaces of both edge portions of the cylindrically rolled film in a palm-to-hand state. (See Patent Document 1), a technique has been proposed in which a cylindrical package is formed by forming a seal portion and welding and joining the seal portion together with the casing portion (see Patent Document 1). Further, in recent years, a technique has been proposed that realizes both easy-opening property and retort resistance by forming a sealing portion formed by joining both edges of a film with a specific material (patent). See Document 2).

特開平１－１３９３５６号公報Japanese Unexamined Patent Publication No. 1-139356 特開２０１５－１６４８６０号公報JP-A-2015-164860

ところで、特許文献１や特許文献２に記載された技術においては、シールする部分を電極で挟み込んで電界を印加することにより当該部分を加熱して溶着する、いわゆる高周波溶着を採用する場合がある。このような高周波溶着を採用すると、シール部を切断して包装体を開封する際に、フィルムの表層部分（径方向において最も外側に位置する部分）のみが剥がれて開封失敗となる可能性があった。すなわち、従来の包装体（筒状フィルム）は、樹脂製フィルムを２枚重ねて構成した積層フィルムをそれぞれ径方向外側と径方向内側に配置することにより樹脂製フィルムを４枚重ね、それら４枚のフィルム全てを溶着してシール部を形成しているため、そのシール部を切断して包装体を開封する際に、径方向外側の２枚のフィルム（径方向において最も外側に位置して力がかかりやすい表層部分）のみが剥がれて開封失敗となる事例が多数発生していた。このため、開封失敗の可能性を低下させるための改良された高周波溶着技術が求められており、特に高周波誘電加熱用の電極の開発が待望されていた。 By the way, in the technique described in Patent Document 1 and Patent Document 2, there is a case where so-called high frequency welding is adopted in which a portion to be sealed is sandwiched between electrodes and an electric field is applied to heat and weld the portion. If such high-frequency welding is adopted, when the seal portion is cut and the package is opened, only the surface layer portion (the outermost portion in the radial direction) of the film may be peeled off and the opening may fail. rice field. That is, in the conventional package (cylindrical film), four resin films are stacked by arranging laminated films composed of two resin films on the radial outer side and the radial inner side, respectively, and these four sheets are stacked. Since all of the films in the above are welded to form a seal portion, when the seal portion is cut and the package is opened, the two films on the outer side in the radial direction (the force located on the outermost side in the radial direction). There were many cases in which only the surface layer (the surface layer where it is easy to get rid of) was peeled off and the package failed to open. Therefore, there is a demand for an improved high-frequency welding technique for reducing the possibility of opening failure, and in particular, the development of an electrode for high-frequency dielectric heating has been long-awaited.

本発明は、かかる事情に鑑みてなされたものであり、樹脂製の筒状フィルムのシール部を切断して開封する際にフィルムの表層部分が剥離して開封失敗となる可能性を低下させることができる高周波誘電加熱用電極を提供することを目的とする。 The present invention has been made in view of such circumstances, and reduces the possibility that the surface layer portion of the resin is peeled off and the opening fails when the sealing portion of the resin tubular film is cut and opened. It is an object of the present invention to provide an electrode for high frequency dielectric heating.

前記目的を達成するため、本発明に係る高周波誘電加熱用電極は、塩化ビニリデン系樹脂製フィルムを２枚重ねて構成した積層フィルムの第一領域と第二領域とをそれぞれ径方向外側と径方向内側に配置して重ねた状態で、第一領域及び前記第二領域を挟んで高周波誘電加熱を実施して封筒貼り形式の筒状フィルムを形成するためのものであって、第一領域よりも径方向外側に配置される外部電極と、第二領域よりも径方向内側に配置される内部電極と、を備え、外部電極には、電気絶縁体からなる被膜が形成されているものである。電気絶縁体としては、セラミックス類、雲母、ガラスから選ばれた一種以上の無機電気絶縁体を採用することができる。 In order to achieve the above object, the high-frequency dielectric heating electrode according to the present invention has a first region and a second region of a laminated film formed by stacking two vinylidene chloride resin films in the radial outer direction and the radial direction, respectively. It is for forming an envelope-pasted tubular film by performing high-frequency dielectric heating across the first region and the second region in a state of being arranged inside and stacked, and is more than the first region. An external electrode arranged on the outer side in the radial direction and an internal electrode arranged on the inner side in the radial direction from the second region are provided, and a film made of an electric insulator is formed on the external electrode. As the electric insulator, one or more kinds of inorganic electric insulators selected from ceramics, mica, and glass can be adopted.

かかる構成を採用すると、塩化ビニリデン系樹脂製フィルムを２枚重ねて構成した積層フィルムの第一領域及び第二領域とをそれぞれ径方向外側と径方向内側に配置して重ねた状態で、第一領域よりも径方向外側に配置した外部電極と、第二領域よりも径方向内側に配置した内部電極と、によって第一領域及び第二領域を挟んで高周波誘電加熱を実施して第一領域と第二領域とを連続的に溶着させることにより、各種内容物（例えばすり身等）を充填・密封可能な封筒貼り形式の筒状フィルムを形成することができる。この際、外部電極に電気絶縁体からなる被膜を形成しているため、電極間の温度が最も高くなる領域を外部電極側にシフトさせることができる。従って、径方向外側に配置した第一領域を構成する２枚のフィルムと、径方向内側に配置した第二領域を構成する２枚のフィルムのうち径方向外側に位置する１枚のフィルムと、を溶着させてシール部を形成することができる。すなわち、４枚のフィルム中の外側から３枚を溶着させてシール部を形成することができるので、シール部を切断して包装体を開封する際に、径方向外側に配置した第一領域を構成する２枚のフィルムのうち径方向外側に位置するフィルムが径方向内側に位置するフィルムから剥離することを防ぐことができる。この結果、開封失敗の可能性を低下させることができる。 When such a configuration is adopted, the first region and the second region of the laminated film formed by stacking two vinylidene chloride resin films are arranged and stacked on the radial outer side and the radial inner side, respectively. High-frequency dielectric heating is performed across the first and second regions by means of an external electrode arranged radially outside the region and an internal electrode arranged radially inside the second region to form the first region. By continuously welding to the second region, it is possible to form an envelope-pasted tubular film that can be filled and sealed with various contents (for example, ground meat). At this time, since a film made of an electric insulator is formed on the external electrode, the region where the temperature between the electrodes is highest can be shifted to the external electrode side. Therefore, the two films constituting the first region arranged on the outer side in the radial direction and one film located on the outer side in the radial direction among the two films forming the second region arranged on the inner side in the radial direction. Can be welded to form a sealed portion. That is, since three films can be welded from the outside of the four films to form a sealing portion, when the sealing portion is cut and the package is opened, the first region arranged on the outer side in the radial direction is formed. It is possible to prevent the film located on the outer side in the radial direction from the film located on the inner side in the radial direction among the two constituent films. As a result, the possibility of opening failure can be reduced.

本発明に係る高周波誘電加熱用電極において、外部電極の塩化ビニリデン系樹脂製フィルムに接触する部分の線粗さを、最大高さＲｚ１００（μｍ）以下かつ算術平均粗さＲａ１０（μｍ）以下に設定することができる。 In the high-frequency dielectric heating electrode according to the present invention, the line roughness of the portion of the external electrode in contact with the vinylidene chloride resin film is set to a maximum height of Rz100 (μm) or less and an arithmetic average roughness of Ra10 (μm) or less. can do.

かかる構成を採用すると、外部電極の塩化ビニリデン系樹脂製フィルムに接触する部分の線粗さが、最大高さＲｚ１００（μｍ）以下かつ算術平均粗さＲａ１０（μｍ）以下に設定されているため、電極とフィルムとの間の摩擦抵抗を小さくすることができ、例えばフィルム速度３０～４０ｍ／分での連続的な溶着を実現させることができる。すなわち、当該部分の線粗さを、最大高さＲｚ１００（μｍ）以下かつ算術平均粗さＲａ１０（μｍ）以上とすることにより、電極とフィルムとの間の摩擦抵抗が大きくなってフィルムが脈動する、というような事態が発生することを未然に防ぐことができる。 When such a configuration is adopted, the line roughness of the portion of the external electrode in contact with the vinylidene chloride resin film is set to a maximum height of Rz100 (μm) or less and an arithmetic average roughness of Ra10 (μm) or less. The frictional resistance between the electrode and the film can be reduced, and continuous welding can be realized, for example, at a film speed of 30 to 40 m / min. That is, by setting the line roughness of the portion to a maximum height of Rz100 (μm) or less and an arithmetic average roughness of Ra10 (μm) or more, the frictional resistance between the electrode and the film increases and the film pulsates. , Can be prevented from occurring.

本発明に係る高周波誘電加熱用電極において、外部電極の塩化ビニリデン系樹脂製フィルムに接触する部分の線粗さを、最大高さＲｚ１（μｍ）以上かつ算術平均粗さＲａ０．５（μｍ）以上に設定することができる。 In the high-frequency dielectric heating electrode according to the present invention, the linear roughness of the portion of the external electrode in contact with the vinylidene chloride resin film is set to a maximum height of Rz1 (μm) or more and an arithmetic average roughness of Ra0.5 (μm) or more. Can be set to.

かかる構成を採用すると、外部電極の塩化ビニリデン系樹脂製フィルムに接触する部分の線粗さが、最大高さＲｚ１（μｍ）以上かつ算術平均粗さＲａ０．５（μｍ）以上に設定されているため、フィルムとの滑り性を適度に発現させることができる。すなわち、当該部分の線粗さを、最大高さＲｚ１（μｍ）以上かつ算術平均粗さＲａ０．５（μｍ）以上とすることにより、平滑になり過ぎてフィルムとの滑り性が悪化し摩擦抵抗が大きくなってフィルムが脈動する、というような事態が発生することを未然に防ぐことができる。 When such a configuration is adopted, the line roughness of the portion of the external electrode in contact with the vinylidene chloride resin film is set to a maximum height of Rz1 (μm) or more and an arithmetic average roughness of Ra0.5 (μm) or more. Therefore, the slipperiness with the film can be appropriately exhibited. That is, by setting the line roughness of the portion to a maximum height of Rz1 (μm) or more and an arithmetic average roughness of Ra0.5 (μm) or more, the film becomes too smooth and slipperiness with the film deteriorates, resulting in frictional resistance. It is possible to prevent a situation in which the film becomes large and the film pulsates.

本発明に係る高周波誘電加熱用電極において、被膜の厚さを１０μｍ以上１５０μｍ以下に設定することができる。 In the high frequency dielectric heating electrode according to the present invention, the thickness of the coating film can be set to 10 μm or more and 150 μm or less.

かかる構成を採用すると、４枚の塩化ビニリデン系樹脂製フィルム中の外側から３枚をより確実に溶着させてシール部を形成することができる。すなわち、被膜の厚さを１０μｍ以上とすることにより、電極間の温度が最も高くなる領域を外部電極側に充分シフトさせることができるため、径方向外側に配置した第一領域を構成する２枚のフィルムと径方向内側に配置した第二領域を構成する２枚のフィルムが溶着して開封性を確保できなくなる、というような事態が発生することを未然に防ぐことができる。また、被膜の厚さを１５０μｍ以下とすることにより、溶着のための出力が大きくなり過ぎることがなく、フィルムの微小な変動でスパークが発生するというような事態が発生することを未然に防ぐことができる。 When such a configuration is adopted, three sheets of the four vinylidene chloride-based resin films can be more reliably welded from the outside to form a sealing portion. That is, by setting the thickness of the film to 10 μm or more, the region where the temperature between the electrodes is the highest can be sufficiently shifted to the external electrode side. It is possible to prevent a situation in which the film and the two films constituting the second region arranged radially inside are welded and the openability cannot be ensured. In addition, by setting the thickness of the film to 150 μm or less, the output for welding does not become too large, and it is possible to prevent the occurrence of sparks due to minute fluctuations in the film. Can be done.

本発明に係る高周波誘電加熱用電極において、被膜の厚さを４０μｍ以上９０μｍ以下に設定することができる。 In the high frequency dielectric heating electrode according to the present invention, the thickness of the coating film can be set to 40 μm or more and 90 μm or less.

かかる構成を採用すると、４枚の塩化ビニリデン系樹脂製フィルム中の外側から３枚をより一層確実に溶着させてシール部を形成することができる。 When such a configuration is adopted, three sheets of the four vinylidene chloride-based resin films can be more reliably welded from the outside to form a sealing portion.

本発明によれば、樹脂製の筒状フィルムのシール部を切断して開封する際にフィルムの表層部分が剥離して開封失敗となる可能性を低下させることができる高周波誘電加熱用電極を提供することが可能となる。 According to the present invention, there is provided a high frequency dielectric heating electrode capable of reducing the possibility that the surface layer portion of the film is peeled off and the opening fails when the sealing portion of the resin tubular film is cut and opened. It becomes possible to do.

本発明の実施形態に係る高周波誘電加熱用電極を備える自動充填包装機の構成図である。It is a block diagram of the automatic filling packaging machine provided with the electrode for high frequency dielectric heating which concerns on embodiment of this invention. 本発明の実施形態に係る高周波誘電加熱用電極の構成図である。It is a block diagram of the electrode for high frequency dielectric heating which concerns on embodiment of this invention. 本発明の実施形態に係る高周波誘電加熱用電極を備える自動充填包装機によって形成された筒状フィルムの断面図である。It is sectional drawing of the tubular film formed by the automatic filling packaging machine provided with the electrode for high frequency dielectric heating which concerns on embodiment of this invention. 本発明の実施形態に係る高周波誘電加熱用電極を備える自動充填包装機によって形成された筒状フィルムの平面図である。It is a top view of the tubular film formed by the automatic filling and packaging machine provided with the electrode for high frequency dielectric heating which concerns on embodiment of this invention. 本発明の実施形態に係る高周波誘電加熱用電極を備える自動充填包装機によって形成された筒状フィルムのシール部（図３のＶ部分）の拡大断面図である。FIG. 3 is an enlarged cross-sectional view of a sealing portion (V portion in FIG. 3) of a tubular film formed by an automatic filling and packaging machine provided with an electrode for high-frequency dielectric heating according to an embodiment of the present invention.

以下、図面を参照して、本発明の実施形態について説明する。なお、以下の実施形態はあくまでも好適な適用例であって、本発明の適用範囲がこれらに限定されるものではない。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the following embodiments are merely suitable application examples, and the scope of application of the present invention is not limited thereto.

まず、図１及び図２等を用いて、本実施形態に係る高周波誘電加熱用電極２０を備える自動充填包装機１の構成について説明する。 First, the configuration of the automatic filling and packaging machine 1 provided with the high-frequency dielectric heating electrode 20 according to the present embodiment will be described with reference to FIGS. 1 and 2.

自動充填包装機１は、塩化ビニリデン系樹脂製フィルム（以下、単に「フィルム」と称する）Ｆを２枚重ねて構成した積層フィルムＰの第一領域Ｐ₁と第二領域Ｐ₂とをそれぞれ径方向外側と径方向内側に配置して重ねた状態で、第一領域Ｐ₁及び第二領域Ｐ₂を挟んで高周波誘電加熱を実施して封筒貼り形式の筒状フィルム１００（図３等参照）を形成し、形成した円筒状フィルム１００に内容物Ｃを充填し、所定長毎に密封して切断することにより所定長の包装体２００を得る、という各工程を自動的に行うためのものであり、図１に示すように、フィルム供給部１０と、高周波誘電加熱用電極２０と、内容物供給部３０と、密封部４０と、切断部５０と、を備えている。 The automatic filling and packaging machine 1 has diameters of a first region P ₁ and a second region P ₂ of a laminated film P formed by stacking two vinylidene chloride-based resin films (hereinafter, simply referred to as “films”) F. Envelope-pasted tubular film 100 (see FIG. 3 etc.) is subjected to high-frequency dielectric heating while sandwiching the first region P ₁ and the second region P ₂ in a state of being arranged and overlapped on the outer side in the direction and the inner side in the radial direction. The purpose is to automatically perform each step of forming the formed cylindrical film 100, filling the formed cylindrical film 100 with the content C, sealing and cutting each predetermined length to obtain a package 200 having a predetermined length. Yes, as shown in FIG. 1, it includes a film supply unit 10, a high frequency dielectric heating electrode 20, a content supply unit 30, a sealing unit 40, and a cutting unit 50.

フィルム供給部１０は、積層フィルムＰが巻き付けられた状態で所定の回転速度で回転するように構成されることにより積層フィルムＰを繰り出すローラ１１、ローラ１１によって繰り出された積層フィルムＰを所定の位置までガイドするガイド部材群１２、所定の位置までガイドされた積層フィルムＰの第一領域Ｐ₁と第二領域Ｐ₂とをそれぞれ径方向外側と径方向内側に配置して重ねるようにして積層フィルムＰを封筒貼り形式の筒状体とする図示されていない筒状体形成部、等を有している。ローラ１１の回転速度、ガイド部材群１２の位置、筒状体形成部の構成、等は、積層フィルムＰの種類、要求されるフィルム供給速度、高周波誘電加熱用電極２０の位置、等に応じて適宜調整することができる。 The film supply unit 10 is configured to rotate the laminated film P at a predetermined rotation speed in a wound state, so that the roller 11 unwinds the laminated film P and the laminated film P unwound by the roller 11 is placed at a predetermined position. A laminated film in which the first region P ₁ and the second region P ₂ of the laminated film P guided to a predetermined position are arranged on the radial outer side and the radial inner side, respectively. It has a tubular body forming portion (not shown), etc., in which P is an envelope-pasted tubular body. The rotation speed of the roller 11, the position of the guide member group 12, the configuration of the tubular body forming portion, etc. depend on the type of the laminated film P, the required film supply speed, the position of the high frequency dielectric heating electrode 20, and the like. It can be adjusted as appropriate.

高周波誘電加熱用電極２０は、フィルム供給部１０によって所定速度（例えば４０ｍ／分）で連続的に供給された積層フィルムＰを筒状フィルム１００にするためのものであり、図２に示すように、フィルム供給部１０の筒状体形成部によって筒状体とされた積層フィルムＰの第一領域Ｐ₁よりもさらに径方向外側に配置される外部電極２１と、積層フィルムＰの第二領域Ｐ₂よりもさらに径方向内側に配置される内部電極２２と、を有している。 The high-frequency dielectric heating electrode 20 is for turning the laminated film P continuously supplied by the film supply unit 10 at a predetermined speed (for example, 40 m / min) into a tubular film 100, as shown in FIG. The external electrode 21 arranged radially outside the _first region P1 of the laminated film P formed into a tubular body by the tubular body forming portion of the film supply unit 10, and the second region P of the laminated film P. It has an internal electrode 22 which is arranged radially inside more than ₂ .

外部電極２１には、図２に示すように、電気絶縁体からなる被膜２１Ａが形成されている。本実施形態における被膜２１Ａを構成する電気絶縁体としては、例えば有機系のものとしてポリアミド系樹脂、ポリイミド系樹脂、ポリエステル系樹脂、ポリエチレン系樹脂、ポリプロピレン系樹脂、ポリスチレン系樹脂、フッ素系樹脂、ポリウレタン系樹脂、アクリル系樹脂、ポリフェニレンエーテル系樹脂、ポリアセタール樹脂、フェノール樹脂、エポキシ樹脂、シリコン樹脂等が挙げられる。無機系の電気絶縁体としては、セラミックス類、雲母、ガラス等が挙げられる。耐熱性と耐摩耗性の観点から無機系の電気絶縁体が好ましく、セラミックス類のうち硬度が大きいアルミナ、ジルコニア、炭化ケイ素がより好ましい。なお、例えばシリコンゴム等の摩擦抵抗が大きくなるような素材は、フィルムＦとの滑り性が悪化するため、被膜２１Ａを構成する電気絶縁体としては好ましくない。 As shown in FIG. 2, the external electrode 21 is formed with a coating film 21A made of an electrical insulator. Examples of the electric insulator constituting the coating film 21A in the present embodiment include polyamide resin, polyimide resin, polyester resin, polyethylene resin, polypropylene resin, polystyrene resin, fluororesin, and polyurethane as organic ones. Examples thereof include based resins, acrylic resins, polyphenylene ether resins, polyacetal resins, phenol resins, epoxy resins, silicon resins and the like. Examples of the inorganic electric insulator include ceramics, mica, glass and the like. From the viewpoint of heat resistance and wear resistance, inorganic electric insulators are preferable, and among ceramics, alumina, zirconia, and silicon carbide, which have high hardness, are more preferable. It should be noted that a material such as silicon rubber, which has a large frictional resistance, is not preferable as an electric insulator constituting the film 21A because the slipperiness with the film F deteriorates.

外部電極２１に設けられた被膜２１Ａの厚さは、１０μｍ以上１５０μｍ以下に設定されている。被膜２１Ａの厚さは、好ましくは２０μｍ以上１４０μｍ以下であり、より好ましくは４０μｍ以上１３０μｍ以下であり、特に好ましくは４０μｍ以上９０μｍ以下である。これにより、外部電極２１及び内部電極２２の間の温度が最も高くなる領域Ａ（図２参照）を外部電極２１側にシフトさせることができ、４枚のフィルムＦ中の外側から３枚をより確実に溶着させてシール部Ｓ（図３～図５参照）を形成することができる。 The thickness of the coating film 21A provided on the external electrode 21 is set to 10 μm or more and 150 μm or less. The thickness of the coating film 21A is preferably 20 μm or more and 140 μm or less, more preferably 40 μm or more and 130 μm or less, and particularly preferably 40 μm or more and 90 μm or less. As a result, the region A (see FIG. 2) where the temperature is highest between the external electrode 21 and the internal electrode 22 can be shifted to the external electrode 21 side, and three of the four films F from the outside can be twisted. The sealing portion S (see FIGS. 3 to 5) can be formed by reliable welding.

すなわち、被膜２１Ａの厚さを１０μｍ以上とすることにより、外部電極２１及び内部電極２２の間の温度が最も高くなる領域Ａを外部電極２１側に充分シフトさせることができるため、径方向外側に配置した第一領域Ｐ₁を構成する２枚のフィルムＦと径方向内側に配置した第二領域Ｐ₂を構成する２枚のフィルムＦが溶着して開封性を確保できなくなる、というような事態が発生することを未然に防ぐことができる。また、被膜２１Ａの厚さを１５０μｍ以下とすることにより、溶着のための出力が大きくなり過ぎることがなく、フィルムＦの微小な変動でスパークが発生するというような事態が発生することを未然に防ぐことができる。特に、被膜２１Ａの厚さを４０μｍ以上９０μｍ以下に設定することが好ましい。 That is, by setting the thickness of the film 21A to 10 μm or more, the region A where the temperature is highest between the external electrode 21 and the internal electrode 22 can be sufficiently shifted to the external electrode 21 side, so that the region A is radially outward. A situation in which the two films F constituting the arranged first region P ₁ and the two films F constituting the arranged second region P ₂ are welded to each other and the openability cannot be ensured. Can be prevented from occurring. Further, by setting the thickness of the film 21A to 150 μm or less, the output for welding does not become too large, and a situation such as sparks occurring due to minute fluctuations in the film F does not occur. Can be prevented. In particular, it is preferable to set the thickness of the coating film 21A to 40 μm or more and 90 μm or less.

外部電極２１のフィルムＦに接触する部分（すなわち被膜２１Ａの表面２１Ａａ）の線粗さは、最大高さＲｚ１（μｍ）以上１００（μｍ）以下かつ算術平均粗さＲａ０．５（μｍ）以上１０（μｍ）以下に設定されている。これにより、外部電極２１とフィルムＦとの間の摩擦抵抗を小さくすることができ、例えばフィルム速度３０～４０ｍ／分での連続的な溶着を実現させることができるとともに、フィルムＦとの滑り性を適度に発現させることができる。すなわち、当該部分（被膜２１Ａの表面２１Ａａ）の線粗さを、最大高さＲｚ１００（μｍ）以下かつ算術平均粗さＲａ１０（μｍ）以上とすることにより、外部電極２１とフィルムＦとの間の摩擦抵抗が大きくなってフィルムＦが脈動する、というような事態が発生することを未然に防ぐことができる。また、当該部分（被膜２１Ａの表面２１Ａａ）の線粗さを、最大高さＲｚ１（μｍ）以上かつ算術平均粗さＲａ０．５（μｍ）以上とすることにより、平滑になり過ぎてフィルムＦとの滑り性が悪化し摩擦抵抗が大きくなってフィルムＦが脈動する、というような事態が発生することを未然に防ぐことができる。 The line roughness of the portion of the external electrode 21 in contact with the film F (that is, the surface 21Aa of the coating film 21A) is a maximum height Rz1 (μm) or more and 100 (μm) or less and an arithmetic mean roughness Ra0.5 (μm) or more 10 It is set to (μm) or less. As a result, the frictional resistance between the external electrode 21 and the film F can be reduced, for example, continuous welding can be realized at a film speed of 30 to 40 m / min, and slipperiness with the film F can be realized. Can be appropriately expressed. That is, by setting the line roughness of the portion (the surface 21Aa of the film 21A) to be the maximum height Rz100 (μm) or less and the arithmetic mean roughness Ra10 (μm) or more, the line roughness between the external electrode 21 and the film F is set. It is possible to prevent a situation in which the frictional resistance becomes large and the film F pulsates. Further, by setting the line roughness of the portion (the surface 21Aa of the film 21A) to a maximum height of Rz1 (μm) or more and an arithmetic average roughness of Ra0.5 (μm) or more, the film F becomes too smooth. It is possible to prevent a situation in which the slipperiness of the film is deteriorated, the frictional resistance is increased, and the film F is pulsated.

内容物供給部３０は、高周波誘電加熱用電極２０によって形成された筒状フィルム１００の内部に内容物（例えば魚肉用すり身）Ｃを供給するためのものであり、筒状フィルム１００の径より若干小さい径を有して筒状フィルム１００の内部に部分的に挿入される円筒体３１と、円筒体３１を経由させて筒状フィルム１００の内部に内容物Ｃを供給する図示されていない内容物供給源と、を有している。 The content supply unit 30 is for supplying the content (for example, surimi for fish meat) C to the inside of the tubular film 100 formed by the high-frequency dielectric heating electrode 20, and is slightly larger than the diameter of the tubular film 100. A cylindrical body 31 having a small diameter and partially inserted inside the tubular film 100, and a content (not shown) that supplies the content C to the inside of the tubular film 100 via the cylindrical body 31. It has a source and.

密封部４０は、内容物Ｃが充填された筒状フィルム１００を所定長（例えば２００ｍｍ）毎に密封するためのものである。本実施形態における密封部４０は、２個一組のアルミワイヤー４１を用いて筒状フィルム１００を所定長毎に縛って密封する機構を採用している。２個一組のアルミワイヤー４１は、僅かに離隔された状態で筒状フィルム１００に取り付けられるようになっており、これらアルミワイヤー４１の間に形成される隙間に、後述する切断部５０のカッター５１が挿入される。 The sealing portion 40 is for sealing the tubular film 100 filled with the content C at predetermined lengths (for example, 200 mm). The sealing portion 40 in the present embodiment employs a mechanism for binding and sealing the tubular film 100 at predetermined lengths using a set of two aluminum wires 41. A set of two aluminum wires 41 are attached to the tubular film 100 in a slightly separated state, and a cutter of a cutting portion 50, which will be described later, is formed in a gap formed between the aluminum wires 41. 51 is inserted.

切断部５０は、内部に内容物Ｃが充填され密封された所定長の筒状フィルム１００を切断することにより、所定長の包装体２００を得るためのものである。本実施形態における切断部５０は、密封部４０の２個一組のアルミワイヤー４１の間にある筒状フィルム１００の部分を切断するように構成されたカッター５１と、このカッター５１を駆動する図示されていない駆動機構と、を有している。 The cutting portion 50 is for cutting a tubular film 100 having a predetermined length filled with the content C and sealed to obtain a package 200 having a predetermined length. The cutting portion 50 in the present embodiment is a cutter 51 configured to cut a portion of the tubular film 100 between two sets of aluminum wires 41 of the sealing portion 40, and an illustration for driving the cutter 51. It has a drive mechanism that is not.

次に、図３～図５を用いて、本実施形態に係る高周波誘電加熱用電極２０を備える自動充填包装機１によって形成された筒状フィルム１００の構成について説明する。 Next, the configuration of the tubular film 100 formed by the automatic filling and packaging machine 1 provided with the high-frequency dielectric heating electrode 20 according to the present embodiment will be described with reference to FIGS. 3 to 5.

筒状フィルム１００は、図３に示すように、フィルムＦを２枚重ねて構成した積層フィルムＰの第一領域Ｐ₁と第二領域Ｐ₂とがそれぞれ径方向外側と径方向内側に配置されて重ねられた状態でシールされてなるシール部Ｓを有する、封筒貼り形式の筒状のフィルムである。 As shown in FIG. 3, in the tubular film 100, the first region P ₁ and the second region P ₂ of the laminated film P formed by stacking two films F are arranged on the outer side in the radial direction and the inner side in the radial direction, respectively. It is an envelope-pasted type tubular film having a sealing portion S that is sealed in a stacked state.

本実施形態においては、図３等に示すように、積層フィルムＰの第一領域Ｐ₁として、積層フィルムＰの一方の縁部Ｐ_E1の最端部から若干（幅Ｗ₁だけ）離隔した所定幅の領域を採用し、積層フィルムＰの第二領域Ｐ₂として、積層フィルムＰの他方の縁部Ｐ_E2の最端部から若干（幅Ｗ₂だけ）離隔した所定幅の領域を採用している。すなわち、第一領域Ｐ₁は、積層フィルムＰの一方の縁部Ｐ_E1を含まない縁部近傍の領域であり、第二領域Ｐ₂は、積層フィルムＰの他方の縁部Ｐ_E2を含まない縁部近傍の領域である。 In the present embodiment, as shown in FIG. 3 and the like, a predetermined region P ₁ of the laminated film P is slightly separated (only the width W ₁ ) from the end of one edge portion P _E 1 of the laminated film P. A width region is adopted, and as the second region P ₂ of the laminated film P, a region having a predetermined width slightly separated (only the width W ₂ ) from the end of the other edge portion P _E 2 of the laminated film P is adopted. There is. That is, the first region P ₁ is a region near the edge portion that does not include one edge portion P _E 1 of the laminated film P, and the second region P ₂ does not include the other edge portion P _E 2 of the laminated film P. It is an area near the edge.

フィルムＦの大きさや厚さは、充填される内容物Ｃの大きさに応じて定められる。フィルムＦの周長は、通常１５～４００ｍｍ、多くの場合３０～３００ｍｍ、広く採用されるのは４０～２００ｍｍの範囲であり、フィルムＦの長手方向の長さは、通常５０～４００ｍｍ、多くの場合７０～３００ｍｍ、広く採用されるのは８０～２５０ｍｍの範囲である。また、フィルムＦの厚さは、充填される内容物Ｃに応じたフィルムの強度やバリア性等を勘案して定められるが、通常１５～３００μｍ、多くの場合１８～２００μｍ、広く採用されるのは２０～１５０μｍの範囲である。この範囲の中でも１５～２５μｍの厚さに設定すると、フィルムＦが適度な強度を有しつつ切断し易くなるためが好ましい。 The size and thickness of the film F are determined according to the size of the content C to be filled. The peripheral length of the film F is usually in the range of 15 to 400 mm, often 30 to 300 mm, and widely adopted is in the range of 40 to 200 mm, and the longitudinal length of the film F is usually 50 to 400 mm, in many cases. In the case of 70 to 300 mm, widely adopted is in the range of 80 to 250 mm. The thickness of the film F is determined in consideration of the strength and barrier properties of the film according to the content C to be filled, but is usually 15 to 300 μm, and in most cases 18 to 200 μm, which is widely adopted. Is in the range of 20 to 150 μm. Even within this range, if the thickness is set to 15 to 25 μm, it is preferable that the film F has an appropriate strength and is easy to cut.

シール部Ｓは、図３及び図５に示すように、積層フィルムＰのうち径方向外側に配置された第一領域Ｐ₁を構成する２枚のフィルムＦ_1A，Ｆ_1Bと、積層フィルムＰのうち径方向内側に配置された第二領域Ｐ₂を構成する２枚のフィルムＦ_2A，Ｆ_2Bのうち径方向外側に位置する１枚のフィルムＦ_2Aと、が溶着されてなるものである。本実施形態においては、既に述べた高周波誘電加熱用電極２０を用いた高周波誘電加熱を実施することにより、これら３枚のフィルムＦ_1A，Ｆ_1B，Ｆ_2Aを溶着させている。 As shown in FIGS. 3 and 5, the sealing portion S is formed by two films F _1A and F _1B constituting the first region P ₁ arranged radially outside the laminated film P, and the laminated film P. Of the two films F _2A and F _2B constituting the second region P ₂ arranged on the inner side in the radial direction, one film F _2A located on the outer side in the radial direction is welded. In the present embodiment, these three films F _1A , F _1B , and F _2A are welded by performing high frequency dielectric heating using the high frequency dielectric heating electrode 20 described above.

なお、積層フィルムＰのうち径方向外側に配置された第一領域Ｐ₁に近い縁部Ｐ_Eの最端部から所定幅Ｗ₁の領域Ｐ_Aは、ユーザがつまむことができる非シール部（外耳部）Ｎとされている。非シール部Ｎには、長手方向に所定間隔ｄで配置された貫通孔Ｈが形成されている。このように貫通孔Ｈが形成された非シール部Ｎ（領域Ｐ_A）は、シール部Ｓを切断する際の起点となる領域であり、ユーザの手によって引き裂かれ易くなっている。なお、本実施形態においては二列の貫通孔Ｈを設けた例を示したが、貫通孔Ｈは一列のみ設けてもよく、三列以上設けてもよい。 In the laminated film P, the region PA having a predetermined width W ₁ from the end of the edge portion P _E near the first region P ₁ arranged on the outer side in the radial direction is a non _- sealing portion (a non-sealing portion) that can be pinched by the user. Outer ear) N. Through holes H arranged at predetermined intervals d in the longitudinal direction are formed in the non-sealed portion N. The unsealed portion N (region _PA ) in which the through hole H is formed is a region serving as a starting point when cutting the sealed portion S, and is easily torn by the user's hand. In this embodiment, an example in which two rows of through holes H are provided is shown, but only one row of through holes H may be provided, or three or more rows of through holes H may be provided.

続いて、本実施形態における自動充填包装機１を用いて包装体２００を作製する方法について説明する。 Subsequently, a method of manufacturing the package 200 using the automatic filling and packaging machine 1 in the present embodiment will be described.

まず、自動充填包装機１のフィルム供給部１０によって積層フィルムＰを所定速度で高周波誘電加熱用電極２０側へと供給しつつ、積層フィルムＰの第一領域Ｐ₁と第二領域Ｐ₂とをそれぞれ径方向外側と径方向内側に配置して重ねることにより、封筒貼り形式の筒状体を形成する（フィルム供給工程）。次いで、フィルム供給工程で重ねた第一領域Ｐ₁及び第二領域Ｐ₂を、径方向外側に配置した外部電極２１と径方向内側に配置した内部電極２２とで挟んで高周波誘電加熱を実施してシールすることにより、シール部Ｓを有する筒状フィルム１００を形成する（筒状フィルム形成工程）。 First, the first region P ₁ and the second region P ₂ of the laminated film P are supplied to the high-frequency dielectric heating electrode 20 side at a predetermined speed by the film supply unit 10 of the automatic filling and packaging machine 1. By arranging and stacking them on the outer side in the radial direction and the inner side in the radial direction, respectively, an envelope-pasted tubular body is formed (film supply step). Next, the first region P ₁ and the second region P ₂ overlapped in the film supply step are sandwiched between the external electrode 21 arranged radially outside and the internal electrode 22 arranged radially inside, and high-frequency dielectric heating is performed. To form a tubular film 100 having a sealing portion S (cylindrical film forming step).

筒状フィルム形成工程では、積層フィルムＰの第一領域Ｐ₁の外側に、所定厚さの被膜２１Ａが形成された外部電極２１を配置しているため、図２に示すように、高周波誘電加熱によって最も加熱される領域Ａ（図２において最も色の濃い部分）の位置を、径方向外側にシフトさせることができる。これにより、図３に示すように、積層フィルムＰのうち径方向外側に配置した第一領域Ｐ₁を構成する２枚のフィルムＦ_1A，Ｆ_1Bと、径方向内側に配置した第二領域Ｐ₂を構成する２枚のフィルムＦ_2A，Ｆ_2Bのうち径方向外側に位置する１枚のフィルムＦ_2Aと、を溶着させてシール部Ｓを形成することができる。 In the tubular film forming step, since the external electrode 21 on which the coating film 21A having a predetermined thickness is formed is arranged outside the _first region P1 of the laminated film P, high-frequency dielectric heating is performed as shown in FIG. The position of the region A most heated by (the darkest part in FIG. 2) can be shifted outward in the radial direction. As a result, as shown in FIG. 3, two films F _1A and F _1B constituting the first region P ₁ arranged on the outer side in the radial direction of the laminated film P and the second region P arranged on the inner side in the radial direction P. Of the _two films F _2A and F _2B constituting 2, one film F _2A located on the outer side in the radial direction can be welded to form the sealing portion S.

その後、内容物供給部３０により、筒状フィルム１００の内部に内容物（例えば魚肉用すり身）Ｃを供給して充填し（内容物充填工程）、内容物Ｃが充填された筒状フィルム１００を密封部４０で所定長（例えば２００ｍｍ）毎に密封し（密封工程）、内部に内容物Ｃが充填され密封された所定長の筒状フィルム１００を切断部５０で切断する（切断工程）。以上の工程群によって得られた包装体２００は、例えば１２０℃２０分程度のレトルト処理等を経て製品化されることとなる。 After that, the content supply unit 30 supplies and fills the content (for example, surimi for fish meat) C inside the tubular film 100 (content filling step), and fills the tubular film 100 with the content C. The sealing portion 40 seals the film every predetermined length (for example, 200 mm) (sealing step), and the tubular film 100 having the content C filled therein and sealed is cut by the cutting portion 50 (cutting step). The package 200 obtained by the above process group will be commercialized after undergoing, for example, a retort treatment at 120 ° C. for about 20 minutes.

包装体２００を開封する際には、ユーザは、まず、包装体２００の非シール部（外耳部）Ｎを指でつまみ、包装体２００の長手方向に対して略直交する方向（幅方向）に沿って引き裂くことにより、シール部Ｓを切断するような力を加える。このような力が加えられると、シール部Ｓは幅方向に沿って切断されることとなるが、この際、第一領域Ｐ₁を構成する２枚のフィルムＦ_1A，Ｆ_1Bのうち径方向外側に位置するフィルムＦ_1Aが径方向内側に位置するフィルムＦ_1Bから剥離することがなく、第一領域Ｐ₁を第二領域Ｐ₂から離隔させてシール状態を確実に解除することができる。この後、ユーザは、包装体２００の幅方向に沿って積層フィルムＰを切断したり、包装体２００の長手方向に沿ってシール部Ｓを切断したりすることにより、包装体２００を開封することができる。 When opening the package 200, the user first picks up the unsealed portion (outer ear portion) N of the package 200 with a finger, and in a direction (width direction) substantially orthogonal to the longitudinal direction of the package 200. By tearing along the line, a force that cuts the seal portion S is applied. When such a force is applied, the seal portion S is cut along the width direction. At this time, of the two films F _1A and F _{1 B} constituting the first region P ₁ , the radial direction is used. The film F _1A located on the outer side does not peel off from the film F _{1 B} located on the inner side in the radial direction, and the first region P ₁ can be separated from the second region P ₂ to reliably release the sealed state. After that, the user opens the package 200 by cutting the laminated film P along the width direction of the package 200 or cutting the seal portion S along the longitudinal direction of the package 200. Can be done.

以上説明した実施形態に係る高周波誘電加熱用電極２０においては、塩化ビニリデン系樹脂製フィルムＦを２枚重ねて構成した積層フィルムＰの第一領域Ｐ₁及び第二領域Ｐ₂をそれぞれ径方向外側と径方向内側に配置して重ねた状態で、第一領域Ｐ₁よりも径方向外側に配置した外部電極２１と、第二領域Ｐ₂よりも径方向内側に配置した内部電極２２と、によって第一領域Ｐ₁及び第二領域Ｐ₂を挟んで高周波誘電加熱を実施して第一領域Ｐ₁と第二領域Ｐ₂とを連続的に溶着させることにより、各種内容物Ｃ（例えばすり身等）を充填・密封可能な封筒貼り形式の筒状フィルム１００を製造することができる。この際、外部電極２１に電気絶縁体からなる被膜２１Ａを形成しているため、電極間の温度が最も高くなる領域Ａを外部電極２１側にシフトさせることができる。従って、径方向外側に配置した第一領域Ｐ₁を構成する２枚のフィルムＦと、径方向内側に配置した第二領域Ｐ₂を構成する２枚のフィルムＦのうち径方向外側に位置する１枚のフィルムＦと、を溶着させてシール部Ｓを形成することができる。すなわち、４枚のフィルムＦ中の外側から３枚を溶着させてシール部Ｓを形成することができるので、シール部Ｓを切断して包装体１００を開封する際に、径方向外側に配置した第一領域Ｐ₁を構成する２枚のフィルムＦのうち径方向外側に位置するフィルムＦが径方向内側に位置するフィルムＦから剥離することを防ぐことができる。この結果、開封失敗の可能性を低下させることができる。 In the high-frequency dielectric heating electrode 20 according to the above-described embodiment, the first region P ₁ and the second region P ₂ of the laminated film P formed by stacking two vinylidene chloride resin films F are radially outside. The external electrode 21 arranged radially outside the first region P ₁ and the internal electrode 22 arranged radially inside the second region P ₂ in a state of being arranged and overlapped radially inside. By performing high-frequency dielectric heating across the first region P ₁ and the second region P ₂ to continuously weld the first region P ₁ and the second region P ₂ , various contents C (for example, shavings, etc.) ) Can be filled and sealed, and an envelope-pasted tubular film 100 can be manufactured. At this time, since the coating film 21A made of an electric insulator is formed on the external electrode 21, the region A where the temperature between the electrodes is the highest can be shifted to the external electrode 21 side. Therefore, it is located on the outer side in the radial direction of the two films F constituting the first region P ₁ arranged on the outer side in the radial direction and the two films F forming the second region P ₂ arranged on the inner side in the radial direction. A single film F and a single film F can be welded to form a sealing portion S. That is, since three films F can be welded from the outside of the four films F to form the seal portion S, the seal portion S is arranged on the outer side in the radial direction when the seal portion S is cut and the package 100 is opened. Of the two films F constituting the first region P ₁ , the film F located on the outer side in the radial direction can be prevented from peeling off from the film F located on the inner side in the radial direction. As a result, the possibility of opening failure can be reduced.

また、以上説明した実施形態に係る高周波誘電加熱用電極２０においては、外部電極２１のフィルムＦに接触する部分（被膜２１Ａの表面２１Ａａ）の線粗さが、最大高さＲｚ１（μｍ）以上１００（μｍ）以下かつ算術平均粗さＲａ０．５（μｍ）以上１０（μｍ）以下に設定されているため、フィルムＦとの滑り性を適度に発現させつつ、外部電極２１とフィルムＦとの間の摩擦抵抗を小さくすることができ、例えばフィルム速度３０～４０ｍ／分での連続的な溶着を実現させることができる。 Further, in the high-frequency dielectric heating electrode 20 according to the above-described embodiment, the linear roughness of the portion of the external electrode 21 in contact with the film F (the surface 21Aa of the coating film 21A) is 100 at a maximum height of Rz1 (μm) or more. Since it is set to (μm) or less and the arithmetic average roughness Ra of 0.5 (μm) or more and 10 (μm) or less, the space between the external electrode 21 and the film F is appropriately exhibited while the slipperiness with the film F is appropriately exhibited. The frictional resistance of the film can be reduced, and continuous welding can be realized at a film speed of 30 to 40 m / min, for example.

また、以上説明した実施形態に係る高周波誘電加熱用電極２０においては、被膜２１Ａの厚さを１０μｍ以上１５０μｍ以下に設定しているため、フィルム４枚中の外側から３枚をより確実に溶着させてシール部Ｓを形成することができる。 Further, in the high-frequency dielectric heating electrode 20 according to the above-described embodiment, since the thickness of the coating film 21A is set to 10 μm or more and 150 μm or less, three of the four films are more reliably welded from the outside. The seal portion S can be formed.

次に、本発明の各実施例について説明する。 Next, each embodiment of the present invention will be described.

〔実施例１〕
塩化ビニリデン－塩化ビニル共重合体（塩化ビニリデン含有量／塩化ビニル含有量＝８９質量％／１１質量％、重量平均分子量１２５０００）を溶融させ環状ダイから押し出して環状フィルムを製造し、延伸温度３０℃、長手方向に３．０倍、幅方向に４．０倍のインフレーション２軸延伸を行って環状フィルムの内側同士を重ね合わせ、厚さ４３μｍ（厚さ２１．５μｍのフィルム２枚の厚さ）のフィルム原反を得、これを巻き解きながら幅８６ｍｍに裁断することにより帯状の積層フィルムを得た。 [Example 1]
A polyvinylidene chloride-vinyl chloride copolymer (vinylidene chloride content / vinyl chloride content = 89% by mass / 11% by mass, weight average molecular weight 125000) is melted and extruded from a cyclic die to produce a cyclic film, and a stretching temperature of 30 ° C. , 3.0 times in the longitudinal direction and 4.0 times in the width direction, and the insides of the annular films are overlapped by biaxial stretching, and the thickness is 43 μm (thickness of two films with a thickness of 21.5 μm). The original film of the above film was obtained, and the film was unwound and cut to a width of 86 mm to obtain a strip-shaped laminated film.

上記工程により得た積層フィルムを、本実施形態で説明した構成と同様の構成を有する自動充填包装機（旭化成社製：商品名「ＡＤＰ（登録商標）」）にセットして繰り出し、長手方向に延びる両側縁部を重ねて封筒貼り状の筒状に巻いて下流に走行させながら、重なった両側縁部を、高周波誘電加熱用電極を用いて高周波にてシールして筒状フィルムを形成した。本実施例においては、表面の線粗さが最大高さＲｚ４０．０μｍかつ算術平均粗さＲａ５．０μｍ、厚さ５０μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用した。 The laminated film obtained by the above step is set in an automatic filling and packaging machine (manufactured by Asahi Kasei Co., Ltd .: trade name "ADP (registered trademark)") having the same configuration as that described in the present embodiment, and is fed in the longitudinal direction. While the extending both side edges were overlapped and wound into an envelope-pasted tubular shape and run downstream, the overlapped both side edges were sealed at high frequency using a high-frequency dielectric heating electrode to form a tubular film. In this embodiment, a high-frequency dielectric heating electrode having an external electrode having a zirconia film having a maximum surface line roughness of Rz 40.0 μm, an arithmetic mean roughness Ra of 5.0 μm, and a thickness of 50 μm was adopted.

〔実施例２〕
表面の線粗さが最大高さＲｚ８０．０μｍかつ算術平均粗さＲａ７．０μｍ、厚さ８０μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 2]
A high-frequency dielectric heating electrode equipped with an external electrode having a zirconia film having a maximum height of Rz of 80.0 μm, an arithmetic mean roughness of Ra 7.0 μm, and a thickness of 80 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔実施例３〕
表面の線粗さが最大高さＲｚ４．０μｍかつ算術平均粗さＲａ０．７μｍ、厚さ２０μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 3]
A high-frequency dielectric heating electrode equipped with an external electrode having a zirconia film having a maximum height of Rz 4.0 μm, an arithmetic mean roughness Ra of 0.7 μm, and a thickness of 20 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔実施例４〕
表面の線粗さが最大高さＲｚ４１．５μｍかつ算術平均粗さＲａ４．８μｍ、厚さ１１８μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 4]
A high-frequency dielectric heating electrode equipped with an external electrode having a zirconia film having a maximum height of Rz of 41.5 μm, an arithmetic mean roughness of Ra 4.8 μm, and a thickness of 118 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔実施例５〕
表面の線粗さが最大高さＲｚ３９．２μｍかつ算術平均粗さＲａ４．７μｍ、厚さ２３μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 5]
A high-frequency dielectric heating electrode equipped with an external electrode having a zirconia film having a maximum height of Rz39.2 μm, an arithmetic mean roughness of Ra4.7 μm, and a thickness of 23 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔実施例６〕
表面の線粗さが最大高さＲｚ４１．２μｍかつ算術平均粗さＲａ４．４μｍ、厚さ４９μｍのアルミナ製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 6]
An electrode for high-frequency dielectric heating equipped with an external electrode having an alumina coating having a maximum height of Rz of 41.2 μm, an arithmetic mean roughness of Ra 4.4 μm, and a thickness of 49 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔実施例７〕
表面の線粗さが最大高さＲｚ２．５μｍかつ算術平均粗さＲａ０．３μｍ、厚さ５２μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 7]
An electrode for high-frequency dielectric heating having an external electrode having a zirconia film having a maximum height of Rz 2.5 μm, an arithmetic mean roughness Ra of 0.3 μm, and a thickness of 52 μm on the surface was adopted, and the others were the same as in Example 1. Similarly, a tubular film was formed.

〔実施例８〕
表面の線粗さが最大高さＲｚ０．３μｍかつ算術平均粗さＲａ０．２μｍ、厚さ５１μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 8]
An electrode for high-frequency dielectric heating equipped with an external electrode having a zirconia film having a maximum height of Rz of 0.3 μm, an arithmetic mean roughness of Ra of 0.2 μm, and a thickness of 51 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔実施例９〕
表面の線粗さが最大高さＲｚ０．５μｍかつ算術平均粗さＲａ０．４μｍ、厚さ５０μｍのポリエステル製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 9]
An electrode for high-frequency dielectric heating having an external electrode having a polyester film having a maximum height of Rz of 0.5 μm, an arithmetic mean roughness of Ra of 0.4 μm, and a thickness of 50 μm on the surface was adopted, and the others were the same as in Example 1. Similarly, a tubular film was formed.

〔実施例１０〕
表面の線粗さが最大高さＲｚ０．５μｍかつ算術平均粗さＲａ０．４μｍ、厚さ６０μｍのポリエチレン製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Example 10]
An electrode for high-frequency dielectric heating equipped with an external electrode having a polyethylene film having a maximum height of Rz of 0.5 μm, an arithmetic mean roughness of Ra of 0.4 μm, and a thickness of 60 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔比較例１〕
表面の線粗さが最大高さＲｚ１２０．０μｍかつ算術平均粗さＲａ１１．０μｍ、厚さ５０μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Comparative Example 1]
A high-frequency dielectric heating electrode equipped with an external electrode having a zirconia film having a maximum height of Rz of 120.0 μm, an arithmetic mean roughness of Ra of 11.0 μm, and a thickness of 50 μm is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔比較例２〕
表面の線粗さが最大高さＲｚ４０．０μｍかつ算術平均粗さＲａ５．０μｍ、厚さ１７０μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Comparative Example 2]
A high-frequency dielectric heating electrode equipped with an external electrode having a zirconia film having a maximum height of Rz 40.0 μm, an arithmetic mean roughness Ra of 5.0 μm, and a thickness of 170 μm on the surface is adopted, and the others are the same as in Example 1. Similarly, a tubular film was formed.

〔比較例３〕
表面の線粗さが最大高さＲｚ０．５μｍかつ算術平均粗さＲａ０．４μｍ、厚さ５μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Comparative Example 3]
An electrode for high-frequency dielectric heating equipped with an external electrode having a zirconia film having a maximum height of Rz of 0.5 μm, an arithmetic mean roughness of Ra of 0.4 μm, and a thickness of 5 μm on the surface was adopted, and the others were the same as in Example 1. Similarly, a tubular film was formed.

〔比較例４〕
表面の線粗さが最大高さＲｚ３９．５μｍかつ算術平均粗さＲａ４．８μｍ、厚さ８μｍのジルコニア製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Comparative Example 4]
A high-frequency dielectric heating electrode equipped with an external electrode having a zirconia film having a maximum height of 39.5 μm on the surface, an arithmetic average roughness of Ra 4.8 μm, and a thickness of 8 μm was adopted, and the others were the same as in Example 1. Similarly, a tubular film was formed.

〔参考例〕
表面の線粗さが最大高さＲｚ０．９μｍかつ算術平均粗さＲａ０．３μｍ、厚さ１０μｍのシリコンゴム製被膜を形成した外部電極を備える高周波誘電加熱用電極を採用し、その他は実施例１と同様に筒状フィルムを形成した。 [Reference example]
An electrode for high-frequency dielectric heating having an external electrode having a silicon rubber coating having a maximum height of Rz of 0.9 μm, an arithmetic mean roughness of Ra of 0.3 μm, and a thickness of 10 μm on the surface is adopted, and the others are Example 1. A tubular film was formed in the same manner as in the above.

〔線粗さ〕
以上の各実施例及び各比較例においては、形状解析レーザー顕微鏡（ＫＥＹＥＮＣＥ社製：商品名「ＬＡＳＥＲＭＩＣＲＯＳＣＯＰＥＶＫ－Ｘ１０００」）を用い、外部電極がフィルムに接触する部分の最大高さＲｚ（μｍ）及び算術平均粗さＲａ（μｍ）を測定し、これを線粗さとした。
＜測定準備＞
「観察アプリケーション」を起動し、外部電極のフィルムが接触する側を上にし、モニターの上下方向が外部電極の長さ方向を表すように形状解析レーザー顕微鏡の回転ステージに設置した。
＜測定方法の設定＞
対物レンズの倍率を５倍に設定し、外部電極の表面にフォーカスを合わせた後、操作パネルにて画像をカメラ画像からレーザー画像に切り替えた。
＜３Ｄ画像の作製＞
ツールバーの「基本測定」からスキャンモードを「レーザーコンフォーカル」に設定して明るさを調整した。測定する外部電極表面の上限と下限を設定し、測定を開始した。測定終了後、得られた３Ｄ画像を保存した。なお、「レーザーコンフォーカル」は、レーザーから照射された光が試料表面で反射し、その反射光の強弱から合焦点位置（高さ情報）を検出して形状を測定するスキャン方法である。
＜線粗さの計測＞
「マルチファイル解析アプリケーション」を起動して、ツールバーから「線粗さ」を選択してプロファイルツールから垂直線を選び、３Ｄ表示画像で高さレベルの高いエリアを測定するよう設定し、最大高さＲｚ（μｍ）及び算術平均粗さＲａ（μｍ）を得た。 [Line roughness]
In each of the above Examples and Comparative Examples, a shape analysis laser microscope (manufactured by KEYENCE: trade name "LASER MICROSCOPE VK-X1000") is used, and the maximum height Rz (μm) of the portion where the external electrode contacts the film is used. And the arithmetic average roughness Ra (μm) was measured and used as the line roughness.
<Measurement preparation>
The "observation application" was started and installed on the rotating stage of the shape analysis laser microscope so that the side of the external electrode in contact with the film was facing up and the vertical direction of the monitor represented the length direction of the external electrode.
<Measurement method setting>
After setting the magnification of the objective lens to 5 times and focusing on the surface of the external electrode, the image was switched from the camera image to the laser image on the operation panel.
<Creation of 3D image>
I set the scan mode to "Laser Confocal" from "Basic measurement" on the toolbar and adjusted the brightness. The upper and lower limits of the surface of the external electrode to be measured were set, and the measurement was started. After the measurement was completed, the obtained 3D image was saved. The "laser confocal" is a scanning method in which the light emitted from the laser is reflected on the surface of the sample, and the confocal position (height information) is detected from the intensity of the reflected light to measure the shape.
<Measurement of line roughness>
Start the "Multi-File Analysis Application", select "Line Roughness" from the toolbar, select vertical lines from the Profile Tool, set to measure areas with high height levels in the 3D display image, and set the maximum height. Rz (μm) and arithmetic mean roughness Ra (μm) were obtained.

〔被膜厚さ〕
以上の各実施例及び各比較例においては、電気絶縁体を被膜する前の外部電極の寸法と、電気絶縁体を被膜した後の外部電極の寸法と、の双方をマイクロゲージにて測定し、被膜厚さを測定した。この際、幅４０ｍｍ、長さ４０ｍｍ、厚さ２ｍｍの略直方体状を呈する外部電極の一辺に電気絶縁体を被膜し、その被膜された辺の端から２０ｍｍの位置（すなわち当該辺の略中央付近の位置）の寸法を測定した。 [Thickness]
In each of the above Examples and Comparative Examples, both the dimensions of the external electrode before coating the electrical insulator and the dimensions of the external electrode after coating the electrical insulator are measured with a microgauge. The film thickness was measured. At this time, an electric insulator is coated on one side of an external electrode having a substantially rectangular cuboid shape having a width of 40 mm, a length of 40 mm, and a thickness of 2 mm, and a position 20 mm from the end of the coated side (that is, near the substantially center of the side). Position) was measured.

〔包装適性評価〕
実施例及び比較例において得られた筒状フィルムの内部に魚肉用すり身を充填し、両端をアルミニウム鋼線でクリップすることにより、クリップ間の長さ２００ｍｍ、幅７ｍｍの外耳部（非シール部）を有する包装体を２００本／分の速度で作製した。塩化ビニリデン系樹脂性フィルム１５００ｍを用いて上記充填作業を行い、その途中でスパークが生じた回数をカウントし、下記評価基準により包装適性を評価した。
（評価基準）
○：製造過程においてスパークが発生した回数が０回
×：製造過程においてスパークが発生した回数が１回以上 [Packaging aptitude evaluation]
By filling the inside of the tubular film obtained in Examples and Comparative Examples with surimi for fish meat and clipping both ends with aluminum steel wire, the outer ear portion (non-sealed portion) having a length of 200 mm and a width of 7 mm between the clips. A package having the above was produced at a rate of 200 pieces / minute. The filling operation was performed using a vinylidene chloride-based resin film 1500 m, the number of times sparks were generated during the filling operation was counted, and the packaging suitability was evaluated according to the following evaluation criteria.
(Evaluation criteria)
◯: The number of times sparks occurred in the manufacturing process was 0 times ×: The number of times sparks occurred in the manufacturing process was 1 or more

〔レトルト耐性評価〕
上記包装適性評価の際に得られた包装体１０００本を、高温高圧調理殺菌装置（日阪製作所社製：商品名「ＲＣＳ－４０ＴＧＮ」）を使用して、加熱缶内ゲージ圧が０．２０ＭＰａの条件下で１２０℃２０分のレトルト処理を行い、密封包装体を得た。レトルト処理後の密封包装体のうち、破袋した本数をカウントし、下記評価基準によりレトルト耐性を評価した。
（評価基準）
○：破袋数が０本
×：破袋数が１本以上 [Retort resistance evaluation]
Using a high-temperature high-pressure cooking sterilizer (manufactured by Hisaka Works: trade name "RCS-40TGN"), the gauge pressure inside the heating can is 0.20 MPa for 1000 packages obtained during the above packaging suitability evaluation. A sealed package was obtained by performing a retort treatment at 120 ° C. for 20 minutes under the above conditions. Among the sealed packages after the retort treatment, the number of broken bags was counted, and the retort resistance was evaluated according to the following evaluation criteria.
(Evaluation criteria)
○: The number of broken bags is 0 ×: The number of broken bags is 1 or more

〔易開封性評価〕
上記レトルト処理後の密封包装体のうち、破袋が発生しなかったものを無作為に１００本サンプリングした。得られたサンプルについて、外耳部（非シール部）をつまみ、人力で開封することでどの程度の力で開封が可能かを官能検査にて評価した。具体的には、１０名のパネラーが、各自１０本の密封包装体サンプルを開封し、密封包装体毎に０点～２点の官能検査点数（２点：誰でも簡単に開封が可能、１点：力をいれれば誰でも開封が可能、０点：素手で開封できない）で評価した。総計１００本の官能検査点数の平均値の小数点第２位を四捨五入して評価点とし、得られた評価点に基づき、以下の基準に従って易開封性を評価した。
（評価基準）
◎：官能検査点数の平均値が２．０
○：官能検査点数の平均値が１．５以上２未満
△：官能検査点数の平均値が１以上１．５未満
×：官能検査点数の平均値が１未満 [Easy to open evaluation]
Among the sealed packages after the retort treatment, 100 samples were randomly sampled in which no bag breakage occurred. The obtained sample was evaluated by a sensory test as to how much force it could be opened by pinching the outer ear part (non-sealed part) and opening it manually. Specifically, 10 panelists each opened 10 sealed package samples, and each sealed package had a sensory test score of 0 to 2 points (2 points: anyone can easily open 1). Point: Anyone can open it with force, 0 point: Cannot open with bare hands). The second decimal place of the average value of a total of 100 sensory test scores was rounded off to obtain an evaluation score, and based on the obtained evaluation score, the ease of opening was evaluated according to the following criteria.
(Evaluation criteria)
⊚: The average sensory test score is 2.0
◯: The average value of the sensory test points is 1.5 or more and less than 2. Δ: The average value of the sensory test points is 1 or more and less than 1.5 ×: The average value of the sensory test points is less than 1.

〔耐摩耗性評価〕
包装適性評価と同様に塩化ビニリデン系樹脂性フィルム１５００ｍを２巻使用した後、目視にて以下の基準に従って電極の耐摩耗性を評価した。
（評価基準）
〇：電極の被膜状態に異常なし
×：電極の被膜に穴や摩耗が見られる [Abrasion resistance evaluation]
After using two rolls of a vinylidene chloride resin film 1500 m in the same manner as in the packaging suitability evaluation, the wear resistance of the electrode was visually evaluated according to the following criteria.
(Evaluation criteria)
〇: No abnormality in the electrode coating condition ×: Holes or wear are seen in the electrode coating

以下の表１（実施例）及び表２（比較例）に、各性能評価の結果を示す。

The results of each performance evaluation are shown in Table 1 (Example) and Table 2 (Comparative Example) below.

表１から明らかなように、外部電極の被膜の表面の線粗さが最大高さＲｚ１μｍ以上１００μｍ以下かつ算術平均粗さＲａ０．５μｍ以上１０μｍ以下であり、かつ、外部電極の被膜の厚さが１０μｍ以上１５０μｍ以下である各実施例（実施例１～７）においては、全ての性能について「△」以上の評価が得られた。また、外部電極の被膜の表面の線粗さが最大高さＲｚ１μｍ未満であって算術平均粗さＲａ０．５μｍ以下である各実施例（実施例８～１０）においても、全ての性能について「△」以上の評価が得られた。全ての実施例１～１０は、外部電極の被膜の表面の線粗さが最大高さＲｚ１００μｍ以下かつ算術平均粗さＲａ１０μｍ以下であり、かつ、外部電極の被膜の厚さが１０μｍ以上１５０μｍ以下である。一方、被膜の表面の線粗さが最大高さＲｚ１００μｍを超えかつ算術平均粗さＲａ１０μｍを超える比較例１においては、包装適性及びレトルト耐性が「×」と評価され、被膜の厚さが１５０μｍを超える比較例２においては、包装適性、レトルト適性、易開封性が「×」と評価され、被膜の表面の線粗さが最大高さＲｚ１μｍ未満かつ算術平均粗さＲａ０．５μｍ未満である比較例３においては、易開封性が「×」と評価され、被膜の厚さが１０μｍ未満である比較例４においても、易開封性が「×」と評価されることとなった。なお、被膜素材がシリコンゴムであって被膜の表面の線粗さが最大高さＲｚ１μｍ未満かつ算術平均粗さＲａ０．５μｍ未満である参考例においては、包装適正評価で「包装不可」と評価されることとなった。 As is clear from Table 1, the linear roughness of the surface of the coating film of the external electrode is the maximum height Rz of 1 μm or more and 100 μm or less, the arithmetic mean roughness Ra is 0.5 μm or more and 10 μm or less, and the thickness of the coating film of the external electrode is In each of the examples (Examples 1 to 7) having a size of 10 μm or more and 150 μm or less, all the performances were evaluated as “Δ” or higher. Further, in each example (Examples 8 to 10) in which the linear roughness of the surface of the coating film of the external electrode is less than the maximum height Rz of 1 μm and the arithmetic mean roughness Ra is 0.5 μm or less, “Δ” is obtained for all the performances. The above evaluation was obtained. In all Examples 1 to 10, the linear roughness of the surface of the coating film of the external electrode is 100 μm or less at the maximum height and the arithmetic average roughness Ra is 10 μm or less, and the thickness of the coating film of the external electrode is 10 μm or more and 150 μm or less. be. On the other hand, in Comparative Example 1 in which the linear roughness of the surface of the coating film exceeds the maximum height Rz of 100 μm and the arithmetic average roughness Ra exceeds 10 μm, the packaging suitability and retort resistance are evaluated as “x”, and the film thickness is 150 μm. In Comparative Example 2 exceeding, the packaging suitability, the retort suitability, and the easy-opening property were evaluated as “x”, and the linear roughness of the surface of the coating film was less than the maximum height Rz 1 μm and the arithmetic mean roughness Ra less than 0.5 μm. In No. 3, the easy-opening property was evaluated as “x”, and even in Comparative Example 4 in which the film thickness was less than 10 μm, the easy-opening property was evaluated as “x”. In the reference example in which the coating material is silicon rubber and the linear roughness of the surface of the coating is less than the maximum height Rz of 1 μm and the arithmetic average roughness Ra is less than 0.5 μm, it is evaluated as “unpackable” in the packaging appropriateness evaluation. It was decided.

本発明は、以上の実施形態に限定されるものではなく、かかる実施形態に当業者が適宜設計変更を加えたものも、本発明の特徴を備えている限り、本発明の範囲に包含される。すなわち、前記実施形態が備える各要素及びその配置、材料、条件、形状、サイズ等は、例示したものに限定されるわけではなく適宜変更することができる。また、前記実施形態が備える各要素は、技術的に可能な限りにおいて組み合わせることができ、これらを組み合わせたものも本発明の特徴を含む限り本発明の範囲に包含される。 The present invention is not limited to the above embodiments, and those having a design modification appropriately by those skilled in the art are also included in the scope of the present invention as long as they have the features of the present invention. .. That is, each element included in the embodiment and its arrangement, material, condition, shape, size, etc. are not limited to those exemplified, and can be appropriately changed. Further, the elements included in the embodiment can be combined as much as technically possible, and the combination thereof is also included in the scope of the present invention as long as the features of the present invention are included.

２０…高周波誘電加熱用電極
２１…外部電極
２１Ａ…被膜
２１Ａａ…被膜の表面（フィルムに接触する部分）
２２…内部電極
１００…筒状フィルム
Ｓ…シール部
Ｆ…塩化ビニリデン系樹脂製フィルム
Ｐ…積層フィルム
Ｐ₁…第一領域
Ｐ₂…第二領域 20 ... Electrode for high frequency dielectric heating 21 ... External electrode 21A ... Coating 21Aa ... Surface of coating (part in contact with film)
22 ... Internal electrode 100 ... Cylindrical film S ... Sealing part F ... Vinylidene chloride resin film P ... Laminated film P ₁ ... First region P ₂ ... Second region

Claims

塩化ビニリデン系樹脂製フィルムを２枚重ねて構成した積層フィルムの第一領域と第二領域とをそれぞれ径方向外側と径方向内側に配置して重ねた状態で、前記第一領域及び前記第二領域を挟んで高周波誘電加熱を実施して封筒貼り形式の筒状フィルムを形成するための高周波誘電加熱用電極であって、
前記第一領域よりも径方向外側に配置される外部電極と、
前記第二領域よりも径方向内側に配置される内部電極と、を備え、
前記外部電極には、電気絶縁体からなる被膜が形成されており、
前記外部電極の前記塩化ビニリデン系樹脂製フィルムに接触する部分の線粗さは、最大高さＲｚ１００（μｍ）以下かつ算術平均粗さＲａ１０（μｍ）以下に設定されており、
前記被膜の厚さは、１０μｍ以上１５０μｍ以下に設定されている、高周波誘電加熱用電極。 The first region and the second region are in a state where the first region and the second region of the laminated film formed by stacking two vinylidene chloride-based resin films are arranged and stacked on the radial outer side and the radial inner side, respectively. A high-frequency dielectric heating electrode for forming an envelope-pasted tubular film by performing high-frequency dielectric heating across a region.
An external electrode arranged radially outside the first region,
With an internal electrode located radially inside the second region,
A film made of an electric insulator is formed on the external electrode.
The linear roughness of the portion of the external electrode in contact with the vinylidene chloride resin film is set to a maximum height of Rz100 (μm) or less and an arithmetic average roughness of Ra10 (μm) or less.
A high-frequency dielectric heating electrode having a coating thickness of 10 μm or more and 150 μm or less.

前記外部電極の前記塩化ビニリデン系樹脂製フィルムに接触する部分の線粗さは、最大高さＲｚ１（μｍ）以上かつ算術平均粗さＲａ０．５（μｍ）以上に設定されている、請求項１に記載の高周波誘電加熱用電極。 The line roughness of the portion of the external electrode in contact with the vinylidene chloride resin film is set to a maximum height of Rz1 (μm) or more and an arithmetic average roughness of Ra0.5 (μm) or more, claim 1. High frequency dielectric heating electrode according to.

前記被膜の厚さは、４０μｍ以上１３０μｍ以下に設定されている、請求項１又は２に記載の高周波誘電加熱用電極。 The high-frequency dielectric heating electrode according to claim 1 or 2, wherein the thickness of the coating film is set to 40 μm or more and 130 μm or less.

前記被膜の厚さは、４０μｍ以上９０μｍ以下に設定されている、請求項３に記載の高周波誘電加熱用電極。 The high-frequency dielectric heating electrode according to claim 3, wherein the thickness of the coating film is set to 40 μm or more and 90 μm or less.

前記電気絶縁体は、セラミックス類、雲母、ガラスから選ばれた一種以上の無機電気絶縁体である、請求項１から４の何れか一項に記載の高周波誘電加熱用電極。 The high-frequency dielectric heating electrode according to any one of claims 1 to 4, wherein the electric insulator is one or more kinds of inorganic electric insulators selected from ceramics, mica, and glass.

前記電気絶縁体は、セラミックス類のアルミナ、ジルコニア、炭化ケイ素から選ばれた一種以上の無機電気絶縁体である、請求項１から４の何れか一項に記載の高周波誘電加熱用電極。 The high-frequency dielectric heating electrode according to any one of claims 1 to 4, wherein the electric insulator is one or more inorganic electric insulators selected from ceramics alumina, zirconia, and silicon carbide.