JP2021503429A - 熱履歴の影響を受けにくいアルカリ含有ガラス - Google Patents
熱履歴の影響を受けにくいアルカリ含有ガラス Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 292
- 239000003513 alkali Substances 0.000 title description 18
- 239000000203 mixture Substances 0.000 claims abstract description 140
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims abstract description 33
- 230000008859 change Effects 0.000 claims abstract description 20
- 238000000137 annealing Methods 0.000 claims abstract description 15
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 57
- 229910052760 oxygen Inorganic materials 0.000 claims description 47
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 40
- 229910052708 sodium Inorganic materials 0.000 claims description 35
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 description 68
- 238000000034 method Methods 0.000 description 28
- 238000005342 ion exchange Methods 0.000 description 25
- 238000004519 manufacturing process Methods 0.000 description 12
- 238000000465 moulding Methods 0.000 description 12
- 230000006835 compression Effects 0.000 description 7
- 238000007906 compression Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- 229910006404 SnO 2 Inorganic materials 0.000 description 4
- 229910052785 arsenic Inorganic materials 0.000 description 4
- 238000005452 bending Methods 0.000 description 4
- 238000003286 fusion draw glass process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000006060 molten glass Substances 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 238000003283 slot draw process Methods 0.000 description 4
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 3
- 239000005354 aluminosilicate glass Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000006059 cover glass Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 3
- 238000004611 spectroscopical analysis Methods 0.000 description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 238000003280 down draw process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000006025 fining agent Substances 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- AZFNGPAYDKGCRB-XCPIVNJJSA-M [(1s,2s)-2-amino-1,2-diphenylethyl]-(4-methylphenyl)sulfonylazanide;chlororuthenium(1+);1-methyl-4-propan-2-ylbenzene Chemical compound [Ru+]Cl.CC(C)C1=CC=C(C)C=C1.C1=CC(C)=CC=C1S(=O)(=O)[N-][C@@H](C=1C=CC=CC=1)[C@@H](N)C1=CC=CC=C1 AZFNGPAYDKGCRB-XCPIVNJJSA-M 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000003426 chemical strengthening reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 235000010289 potassium nitrite Nutrition 0.000 description 1
- 239000004304 potassium nitrite Substances 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K potassium phosphate Substances [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000007655 standard test method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
- C03C10/0027—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents containing SiO2, Al2O3, Li2O as main constituents
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/16—Constructional details or arrangements
- G06F1/1613—Constructional details or arrangements for portable computers
- G06F1/1626—Constructional details or arrangements for portable computers with a single-body enclosure integrating a flat display, e.g. Personal Digital Assistants [PDAs]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/16—Constructional details or arrangements
- G06F1/1613—Constructional details or arrangements for portable computers
- G06F1/1633—Constructional details or arrangements of portable computers not specific to the type of enclosures covered by groups G06F1/1615 - G06F1/1626
- G06F1/1656—Details related to functional adaptations of the enclosure, e.g. to provide protection against EMI, shock, water, or to host detachable peripherals like a mouse or removable expansions units like PCMCIA cards, or to provide access to internal components for maintenance or to removable storage supports like CDs or DVDs, or to mechanically mount accessories
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- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2200/00—Indexing scheme relating to G06F1/04 - G06F1/32
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Abstract
Description
69.0モル%以上のSiO2と、
7.0モル%以上のAl2O3と、
14.0モル%以上のR2Oと、
|0.020|以下の第一の端点と第二の端点との間に延在する線の傾きの絶対値と
を含むガラス組成物において、
前記第一の端点が、アニール点温度の仮想温度でのヤング率であり、前記第二の端点が、歪点温度の仮想温度でのヤング率であり、
前記傾きが、仮想温度の変化1℃あたりのヤング率(GPa)の変化であり、
R2Oが、アルカリ金属酸化物の総数であり、少なくとも2種のアルカリ金属酸化物を含む、
ガラス組成物。
前記傾きの前記絶対値が|0.015|以下である、実施形態1記載のガラス組成物。
前記傾きの前記絶対値が|0.010|以下である、実施形態1または2記載のガラス組成物。
SiO2+Al2O3が80.0モル%超である、実施形態1から3までのいずれか1項記載のガラス組成物。
R2Oが18.0モル%以上である、実施形態1から4までのいずれか1項記載のガラス組成物。
R2Oが、K2Oを7.0モル%以上11.0モル%以下の量で含む、実施形態1から5までのいずれか1項記載のガラス組成物。
72.0モル%以上のSiO2を含む、実施形態1から6までのいずれか1項記載のガラス組成物。
少なくとも2種のアルカリ金属酸化物がそれぞれ、前記ガラス組成物中に0.5モル%以上の量で存在する、実施形態1から7までのいずれか1項記載のガラス組成物。
R2OがNa2OおよびLi2Oを含み、Na2O/Li2Oの比が1.0以上である、実施形態1から8までのいずれか1項記載のガラス組成物。
R2OがK2OおよびNa2Oを含み、K2O/Na2Oの比が1.0以上である、実施形態1から9までのいずれか1項記載のガラス組成物。
R2Oが少なくとも3種のアルカリ金属酸化物を含む、実施形態1から10までのいずれか1項記載のガラス組成物。
少なくとも3種のアルカリ金属酸化物がそれぞれ、前記ガラス組成物中に0.5モル%以上の量で存在する、実施形態11記載のガラス組成物。
R2OがLi2O、Na2OおよびK2Oを含み、
K2O/Li2Oの比が1.0以上であり、
K2O/Na2Oの比が1.0以上である、
実施形態1から12までのいずれか1項記載のガラス組成物。
前記K2O/Li2Oの比が5.0以上である、実施形態13記載のガラス組成物。
70.0モル%以上75.0モル%以下のSiO2と、
8.0モル%以上12.0モル%以下のAl2O3と
を含み、
R2Oが16.0モル%以上である、
実施形態1から14までのいずれか1項記載のガラス組成物。
70.0モル%以上75.0モル%以下のSiO2と、
8.0モル%以上12.0モル%以下のAl2O3と
を含み、
R2OがLi2OおよびNa2Oを含み、
Li2O+Na2Oが14.0モル%以上15.0モル%以下である、
実施形態1から15までのいずれか1項記載のガラス組成物。
70.0モル%以上75.0モル%以下のSiO2と、
8.0モル%以上12.0モル%以下のAl2O3と
を含み、
R2OがNa2OおよびK2Oを含み、
Na2O+K2Oが15.0モル%以上21.0モル%以下である、
実施形態1から16までのいずれか1項記載のガラス組成物。
70.0モル%以上75.0モル%以下のSiO2と、
8.0モル%以上12.0モル%以下のAl2O3と
を含み、
R2OがLi2O、Na2OおよびK2Oを含み、
Li2O+Na2O+K2Oが15.0モル%以上21.0モル%以下である、
実施形態1から17までのいずれか1項記載のガラス組成物。
第一の表面と、
第二の表面と、
前記第一の表面と前記第二の表面との間に位置する中央領域と、
前記第一の表面および前記第二の表面のうちの少なくとも1つからガラス物品の前記中央領域へと延在する圧縮応力層と
を含む、実施形態1から18までのいずれか1項記載のガラス組成物から成形されたガラス物品。
前面、背面および側面を含むハウジングと、
少なくとも部分的に前記ハウジング内にある電気部品であって、少なくとも1個のコントローラ、メモリおよびディスプレイを含み、前記ディスプレイが、前記ハウジングの前記前面にあるかまたはそれに隣接している、電気部品と、
前記ディスプレイ上に配置されたカバー基材と
を含む消費者用電子製品であって、
前記ハウジングまたは前記カバー基材の少なくとも一部が、実施形態19記載のガラス物品を含む、消費者用電子製品。
Claims (10)
- 69.0モル%以上のSiO2と、
7.0モル%以上のAl2O3と、
14.0モル%以上のR2Oと、
|0.020|以下の第一の端点と第二の端点との間に延在する線の傾きの絶対値と
を含むガラス組成物であって、
前記第一の端点が、アニール点温度の仮想温度でのヤング率であり、前記第二の端点が、歪点温度の仮想温度でのヤング率であり、
前記傾きが、仮想温度の変化1℃あたりのヤング率(GPa)の変化であり、
R2Oが、アルカリ金属酸化物の総数であり、少なくとも2種のアルカリ金属酸化物を含む、
ガラス組成物。 - 前記傾きの前記絶対値が|0.015|以下である、請求項1記載のガラス組成物。
- SiO2+Al2O3が80.0モル%超である、請求項1または2記載のガラス組成物。
- R2OがNa2OおよびLi2Oを含み、Na2O/Li2Oの比が1.0以上である、請求項1から3までのいずれか1項記載のガラス組成物。
- R2OがK2OおよびNa2Oを含み、K2O/Na2Oの比が1.0以上である、請求項1から4までのいずれか1項記載のガラス組成物。
- R2OがLi2O、Na2OおよびK2Oを含み、
K2O/Li2Oの比が1.0以上であり、
K2O/Na2Oの比が1.0以上である、
請求項1から5までのいずれか1項記載のガラス組成物。 - 前記K2O/Li2Oの比が5.0以上である、請求項6記載のガラス組成物。
- 70.0モル%以上75.0モル%以下のSiO2と、
8.0モル%以上12.0モル%以下のAl2O3と
を含み、
以下、
R2Oが16.0モル%以上であること、
R2OがLi2OおよびNa2Oを含み、Li2O+Na2Oが14.0モル%以上15.0モル%以下であること、
R2OがNa2OおよびK2Oを含み、Na2O+K2Oが15.0モル%以上21.0モル%以下であること、および/または
R2OがLi2O、Na2OおよびK2Oを含み、Li2O+Na2O+K2Oが15.0モル%以上21.0モル%以下であること
のうちの少なくとも1つによって特徴付けられる、
請求項1から7までのいずれか1項記載のガラス組成物。 - 第一の表面と、
第二の表面と、
前記第一の表面と前記第二の表面との間に位置する中央領域と、
前記第一の表面および前記第二の表面のうちの少なくとも1つからガラス物品の前記中央領域へと延在する圧縮応力層と
を含む、請求項1から8までのいずれか1項記載のガラス組成物から成形されたガラス物品。 - 前面、背面および側面を含むハウジングと、
少なくとも部分的に前記ハウジング内にある電気部品であって、少なくとも1個のコントローラ、メモリおよびディスプレイを含み、前記ディスプレイが、前記ハウジングの前記前面にあるかまたはそれに隣接している、電気部品と、
前記ディスプレイ上に配置されたカバー基材と
を含む消費者用電子製品であって、
前記ハウジングまたは前記カバー基材の少なくとも一部が、請求項9記載のガラス物品を含む、消費者用電子製品。
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EP (1) | EP3710411A1 (ja) |
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CN117623625A (zh) | 2014-10-08 | 2024-03-01 | 康宁股份有限公司 | 包含金属氧化物浓度梯度的玻璃和玻璃陶瓷 |
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Patent Citations (7)
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DE10351885A1 (de) * | 2002-11-04 | 2004-05-19 | Wieland Dental Ceramics Gmbh | Opale Glaskeramik sowie deren Herstellung und Verwendung |
JP2006290704A (ja) * | 2005-04-14 | 2006-10-26 | Hitachi Ltd | ガラス |
JP2008001590A (ja) * | 2006-05-25 | 2008-01-10 | Nippon Electric Glass Co Ltd | 強化ガラス及びその製造方法 |
WO2008044694A1 (en) * | 2006-10-10 | 2008-04-17 | Nippon Electric Glass Co., Ltd. | Reinforced glass substrate |
JP2010116276A (ja) * | 2008-11-11 | 2010-05-27 | Nippon Electric Glass Co Ltd | 強化ガラス基板及びその製造方法 |
JP2013502370A (ja) * | 2009-08-21 | 2013-01-24 | コーニング インコーポレイテッド | ダウン・ドロー用ジルコン適合性ガラス |
WO2014207244A1 (en) * | 2013-06-28 | 2014-12-31 | Queen Mary And Westfield College University Of London | Leucite glass ceramics |
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TWI791675B (zh) | 2023-02-11 |
WO2019099807A1 (en) | 2019-05-23 |
JP7386788B2 (ja) | 2023-11-27 |
KR102637763B1 (ko) | 2024-02-16 |
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US20190152836A1 (en) | 2019-05-23 |
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