JP2021159900A - Mixed gas supply device and method - Google Patents

Mixed gas supply device and method Download PDF

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JP2021159900A
JP2021159900A JP2020067616A JP2020067616A JP2021159900A JP 2021159900 A JP2021159900 A JP 2021159900A JP 2020067616 A JP2020067616 A JP 2020067616A JP 2020067616 A JP2020067616 A JP 2020067616A JP 2021159900 A JP2021159900 A JP 2021159900A
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flow rate
gas supply
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mixed gas
path
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JP7200166B2 (en
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直規 古村
Naoki Komura
淳弘 藤井
Atsuhiro Fujii
元博 西野
Motohiro Nishino
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Taiyo Nippon Sanso Corp
Taiyo Nippon Sanso Engineering Corp
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Taiyo Nippon Sanso Engineering Corp
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Abstract

To provide a mixed gas supply device and a method which can mix a plurality of raw material gases while maintaining a constant mixing ratio regardless of the flow rate and can supply a mixed gas to consumption equipment at a low pressure.SOLUTION: A mixed gas supply device 11 comprises a first gas supply path 13 which is provided with a mass flow meter 19 and to which TCS is supplied, a second gas supply path 15 which is provided with a mass flow controller 21 and to which H2 is supplied, a merging part 17 that merges the first gas supply path 13 and the second gas supply path 15, and a mixed gas supply path 18 extending from the merging part 17 and connected to consumption equipment of a mixed gas. Upon detecting the flow rate of the TCS, the mass flow meter 19 transmits information (output signal), which indicates a ratio of the detected flow rate to a measurement upper limit value Hm, to the mass flow controller 21. Upon receiving the information (input signal), the mass flow controller 21 adjusts the flow rate of H2 to a flow rate obtained by multiplying an adjustment upper limit value Hc by the above ratio.SELECTED DRAWING: Figure 1

Description

本発明は、混合ガス供給装置及び方法に関し、詳しくは、複数のガスを所定の流量比率で混合して供給する装置及び方法に関する。 The present invention relates to a mixed gas supply device and method, and more particularly to a device and method for mixing and supplying a plurality of gases at a predetermined flow rate ratio.

半導体製造の分野においては、様々な特殊材料ガスが使用されており、例えば、ウェハー上の結晶をエピタキシャル成長させるために、トリクロロシラン（ＴＣＳ）と水素（Ｈ２）との混合ガスが用いられている。このような混合ガスは、使用量が変動しても混合比率が保たれた状態で製造・供給されることが望ましい。 In the field of semiconductor manufacturing, various special material gases are used. For example, a mixed gas of trichlorosilane (TCS) and hydrogen (H2) is used for epitaxially growing crystals on a wafer. It is desirable that such a mixed gas be manufactured and supplied in a state where the mixing ratio is maintained even if the amount used fluctuates.

そのような技術としては、例えば、圧力調整弁と流量調整弁と遮断弁とが設けられた複数のガス供給経路を合流させ、圧力計を備えたバッファータンクにつなぎ、バッファータンク内の圧力に応じて各ガス供給経路の遮断弁を開閉制御する混合ガス供給装置が提案されている（特許文献１参照。）。 As such a technique, for example, a plurality of gas supply paths provided with a pressure regulating valve, a flow rate regulating valve, and a shutoff valve are merged, connected to a buffer tank equipped with a pressure gauge, and depending on the pressure in the buffer tank. A mixed gas supply device that controls the opening and closing of the shutoff valve of each gas supply path has been proposed (see Patent Document 1).

また、流量検出手段と圧力調整部とが設けられたメインガス流通路と、流量調整手段が設けられた添加ガス流通路とを接続し、流量計が検出したメインガスの流量に基づいて、添加ガスの流量を流量調整手段が制御し、添加ガスの圧力に応じて圧力調整部がメインガスの圧力を調整する混合ガス供給装置が提案されている（特許文献２参照。）。 Further, the main gas flow path provided with the flow rate detecting means and the pressure adjusting unit is connected to the added gas flow path provided with the flow rate adjusting means, and the gas is added based on the flow rate of the main gas detected by the flow meter. A mixed gas supply device has been proposed in which the flow rate adjusting means controls the gas flow rate and the pressure adjusting unit adjusts the pressure of the main gas according to the pressure of the added gas (see Patent Document 2).

特許３８６３６４４号公報Japanese Patent No. 386364 特許５５５７８２７号公報Japanese Patent No. 5557827

しかしながら、特許文献１に記載された発明では、ガスの流量や圧力を安定させるべく、バッファータンクを設けて蓄圧しており、高圧ガス用設備を用いることなくガス混合をしたいという需要に応えることができていなかった。 However, in the invention described in Patent Document 1, a buffer tank is provided to store pressure in order to stabilize the flow rate and pressure of the gas, and it is possible to meet the demand for gas mixing without using high-pressure gas equipment. It wasn't done.

また、特許文献２に記載された発明でも、圧力調整部が構成として必須となり、圧力調整部における圧力損失が大きいので、原料となるガスを低圧のまま取り扱うことができなかった。 Further, even in the invention described in Patent Document 2, the pressure adjusting unit is indispensable as a configuration, and the pressure loss in the pressure adjusting unit is large, so that the gas as a raw material cannot be handled at a low pressure.

そこで本発明は、高圧ガス用設備を用いることなく、複数の原料ガスを流量に依らず一定の混合比率を維持して混合でき、混合したガスを低圧のまま消費設備に供給可能な混合ガス供給装置及び方法を提供することを目的としている。 Therefore, the present invention provides a mixed gas supply in which a plurality of raw material gases can be mixed while maintaining a constant mixing ratio regardless of the flow rate without using high-pressure gas equipment, and the mixed gas can be supplied to the consumption equipment at low pressure. It is intended to provide equipment and methods.

上記目的を達成するため、本発明の第１の混合ガス供給装置は、複数の原料ガスを所定の割合で混合して供給する混合ガス供給装置であって、複数の原料ガス供給経路と、各原料ガス供給経路から供給される複数の原料ガスを合流させて混合ガスとするガス合流部と、混合ガスを使用先に供給するための混合ガス供給経路と、を備え、前記原料ガス供給経路の一つに流量計測器が設けられ、他の原料ガス供給経路には流量調整器が設けられ、前記流量調整器は、前記流量計測器からの信号を受信可能に構成され、前記流量計測器は、検出した流量に応じて、前記流量計測器の計測可能な流量の上限値で割って得られる流量比を示す信号を前記流量調整器に送信し、前記流量調整器は、前記信号を受信すると、原料ガスの流量を、前記流量調整器の調整可能な流量の上限値に前記流量比を掛けて得られる流量に調整することを特徴としている。 In order to achieve the above object, the first mixed gas supply device of the present invention is a mixed gas supply device that mixes and supplies a plurality of raw material gases at a predetermined ratio, and has a plurality of raw material gas supply paths and each. The raw material gas supply path includes a gas confluence portion that merges a plurality of raw material gases supplied from the raw material gas supply path to form a mixed gas, and a mixed gas supply path for supplying the mixed gas to the destination. A flow rate measuring device is provided in one, a flow rate regulator is provided in the other raw material gas supply path, the flow rate regulator is configured to be able to receive a signal from the flow rate measuring device, and the flow rate measuring device is configured. When a signal indicating a flow rate ratio obtained by dividing by the upper limit value of the measurable flow rate of the flow rate measuring device is transmitted to the flow rate regulator according to the detected flow rate, the flow rate regulator receives the signal. It is characterized in that the flow rate of the raw material gas is adjusted to a flow rate obtained by multiplying the upper limit value of the adjustable flow rate of the flow rate regulator by the flow rate ratio.

また、本発明の混合ガス供給装置は、前記流量計測器によって検出された流量が、計測上限値に達する、又は、計測下限値を下回ると、前記複数の原料ガス供給経路を遮断する遮断弁を備えていてもよく、前記流量計測器によって検出された流量が計測下限値を下回ると、前記混合ガス供給経路に設けられたベント経路に混合ガスを流してもよい。 Further, the mixed gas supply device of the present invention provides a shutoff valve that shuts off the plurality of raw material gas supply paths when the flow rate detected by the flow rate measuring device reaches the measurement upper limit value or falls below the measurement lower limit value. When the flow rate detected by the flow rate measuring device falls below the lower limit of measurement, the mixed gas may flow through the vent path provided in the mixed gas supply path.

また、上記目的を達成するため、本発明の第２の混合ガス供給装置は、複数の原料ガスを所定の割合で混合して供給する混合ガス供給装置であって、複数の原料ガス供給経路と、各原料ガス供給経路から供給される複数の原料ガスを合流させて混合ガスとするガス合流部と、混合ガスを使用先に供給するための混合ガス供給経路と、を備え、前記原料ガス供給経路の一つが複数に分岐され、各分岐経路にそれぞれ流量計測器が設けられ、他の原料ガス供給経路も同様に複数に分岐され、各分岐経路にそれぞれ流量調整器が設けられ、前記流量調整器は、対応する前記流量計測器からの信号を受信可能に構成され、前記流量計測器は、検出した流量に応じて、前記流量計測器の計測可能な流量の上限値で割って得られる流量比を示す信号を対応する前記流量調整器に送信し、前記流量調整器は、前記信号を受信すると、原料ガスの流量を、前記流量調整器の調整可能な流量の上限値に前記流量比を掛けて得られる流量に調整することを特徴としている。 Further, in order to achieve the above object, the second mixed gas supply device of the present invention is a mixed gas supply device that mixes and supplies a plurality of raw material gases at a predetermined ratio, and has a plurality of raw material gas supply paths. , The raw material gas supply is provided with a gas confluence portion that merges a plurality of raw material gases supplied from each raw material gas supply path to form a mixed gas, and a mixed gas supply path for supplying the mixed gas to the destination. One of the routes is branched into a plurality of routes, each branch route is provided with a flow measuring device, the other raw material gas supply routes are also branched into a plurality of routes, and each branch route is provided with a flow regulator. The instrument is configured to be able to receive signals from the corresponding flow meter, which is the flow rate obtained by dividing by the upper limit of the measurable flow rate of the flow meter according to the detected flow rate. A signal indicating the ratio is transmitted to the corresponding flow rate regulator, and when the flow rate regulator receives the signal, the flow rate of the raw material gas is set to the upper limit of the adjustable flow rate of the flow rate regulator. It is characterized by adjusting the flow rate obtained by multiplying.

さらに、前記原料ガス供給経路の一つの分岐経路に設けられた前記流量計測器の検出した流量が、所定の流量を上回ると、隣接する分岐経路の原料ガスを流し始め、所定の流量を下回ると、隣接する分岐経路の原料ガスの流れを遮断することを特徴としている。 Further, when the flow rate detected by the flow rate measuring instrument provided in one branch path of the raw material gas supply path exceeds a predetermined flow rate, the raw material gas of the adjacent branch path starts to flow, and when the flow rate falls below the predetermined flow rate. It is characterized by blocking the flow of raw material gas in the adjacent branch path.

また、上記目的を達成するため、本発明の混合ガス供給方法は、複数の原料ガスを所定の割合で混合して供給する混合ガス供給方法であって、複数の原料ガスを各原料ガス供給経路に供給し、流量計測器を介して一の原料ガスを供給し、前記流量計測器によって検出された流量に基づく出力信号を、入力信号として流量調整器で他の原料ガスの流量を調整し、複数の原料ガスを合流させて混合ガスとすることを特徴としている。 Further, in order to achieve the above object, the mixed gas supply method of the present invention is a mixed gas supply method in which a plurality of raw material gases are mixed and supplied at a predetermined ratio, and a plurality of raw material gases are supplied to each raw material gas supply route. , One raw material gas is supplied via the flow rate measuring instrument, and the output signal based on the flow rate detected by the flow rate measuring device is used as an input signal to adjust the flow rate of the other raw material gas with the flow rate regulator. It is characterized in that a plurality of raw material gases are merged into a mixed gas.

本発明の第１の混合ガス供給装置によれば、第１原料ガスの流量に対して、第２原料ガスの流量を、流量計測器の計測上限値と、流量調整器の調整上限値とによって決定して混合できるので、複数の原料ガスを流量に依らず一定の混合比率を維持して混合でき、混合したガスを低圧のまま消費設備に供給可能になる。 According to the first mixed gas supply device of the present invention, the flow rate of the second raw material gas is determined by the measurement upper limit value of the flow rate measuring instrument and the adjustment upper limit value of the flow rate regulator with respect to the flow rate of the first raw material gas. Since it can be determined and mixed, a plurality of raw material gases can be mixed while maintaining a constant mixing ratio regardless of the flow rate, and the mixed gas can be supplied to the consumption facility at a low pressure.

また、本発明の第２の混合ガス供給装置によれば、１台の流量計測器と流量調整器では供給できない大流量の混合ガスが必要とされる場合に、複数台を多段式に接続することにより、供給することができる。 Further, according to the second mixed gas supply device of the present invention, when a large flow rate of mixed gas that cannot be supplied by one flow rate measuring instrument and a flow rate regulator is required, a plurality of units are connected in a multi-stage system. Thereby, it can be supplied.

本発明の第１形態例を示す混合ガス供給装置の系統図である。It is a system diagram of the mixed gas supply apparatus which shows the 1st Embodiment example of this invention. 混合ガス供給装置による各原料ガスの流量と混合比率との関係を示すグラフである。It is a graph which shows the relationship between the flow rate of each raw material gas by a mixed gas supply device, and a mixing ratio. 本発明の第２形態例を示す多段式の混合ガス供給装置の系統図である。It is a system diagram of the multistage mixed gas supply apparatus which shows the 2nd Embodiment example of this invention. 図３の多段式の混合ガス供給装置において、第１原料ガスの流量増加に伴って各第１ガス分岐経路に流入するガス流量の遷移を示すグラフである。It is a graph which shows the transition of the gas flow rate flowing into each 1st gas branch path with the increase of the flow rate of the 1st raw material gas in the multi-stage mixed gas supply device of FIG. 図３の多段式の混合ガス供給装置において、第１原料ガスの流量減少に伴って各第１ガス分岐経路に流入するガス流量の遷移を示すグラフである。It is a graph which shows the transition of the gas flow rate which flows into each 1st gas branch path with the decrease of the flow rate of the 1st raw material gas in the multi-stage mixed gas supply device of FIG. 他の多段式の混合ガス供給装置において、第１原料ガスの流量増加に伴って各第１ガス分岐経路に流入するガス流量の遷移を示すグラフである。It is a graph which shows the transition of the gas flow rate flowing into each 1st gas branch path with the increase of the flow rate of the 1st raw material gas in another multi-stage mixed gas supply device. 他の多段式の混合ガス供給装置において、第１原料ガスの流量減少に伴って各第１ガス分岐経路に流入するガス流量の遷移を示すグラフである。It is a graph which shows the transition of the gas flow rate which flows into each 1st gas branch path with the flow rate decrease of the 1st raw material gas in another multi-stage mixed gas supply device. 本発明の変形例を示す混合ガス供給装置の系統図である。It is a system diagram of the mixed gas supply device which shows the modification of this invention.

図１は、本発明の第１形態例を示す混合ガス供給装置１１の系統図である。本形態例では、トリクロロシラン（ＴＣＳ）を水素（Ｈ２）で２０％に希釈した混合ガスを供給する場合に適用される場合について説明する。 FIG. 1 is a system diagram of a mixed gas supply device 11 showing an example of the first embodiment of the present invention. In this embodiment, a case where trichlorosilane (TCS) is applied in the case of supplying a mixed gas diluted with hydrogen (H 2) to 20% will be described.

混合ガス供給装置１１は、第１原料ガスであるトリクロロシラン（ＴＣＳ）を供給するＴＣＳ供給部１２から延びた第１ガス供給経路１３と、第２原料ガスである水素（Ｈ２）を供給するＨ２供給部１４から延びた第２ガス供給経路１５と、ＴＣＳとＨ２とを混合した混合ガスを、混合ガスを使用する消費設備１６に供給する混合ガス供給経路１８とを備えており、第１ガス供給経路１３と第２ガス供給経路１５とは、合流部１７で合流して混合ガス供給経路１８に繋げられている。 The mixed gas supply device 11 supplies the first gas supply path 13 extending from the TCS supply unit 12 that supplies the first raw material gas trichlorosilane (TCS) and the hydrogen (H 2 ) that is the second raw material gas. A second gas supply path 15 extending from the H2 supply unit 14 and a mixed gas supply path 18 for supplying a mixed gas obtained by mixing TCS and H 2 to a consumption facility 16 using the mixed gas are provided. The 1 gas supply path 13 and the 2nd gas supply path 15 merge at the merging portion 17 and are connected to the mixed gas supply path 18.

ＴＣＳ供給部１２には、供給するＴＣＳを所定の温度に保つ温度調整装置１２ａが取り付けられている。蒸気圧が０．２ＭＰａ以上となると高圧ガス用設備としての取り扱いとなるため、温度調整装置１２ａにより、蒸気圧が０．２ＭＰａ以上となることを防ぐため５３℃を超えないよう、蒸気圧０．１８３ＭＰａとなる５０℃にて温度調整している。 A temperature adjusting device 12a for keeping the supplied TCS at a predetermined temperature is attached to the TCS supply unit 12. When the vapor pressure becomes 0.2 MPa or more, it is treated as a high-pressure gas facility. Therefore, in order to prevent the vapor pressure from becoming 0.2 MPa or more by the temperature adjusting device 12a, the vapor pressure is set to 0. The temperature is adjusted at 50 ° C., which is 183 MPa.

第１ガス供給経路１３には、流量計測器であるマスフローメータ１９（ＭＦＭ）と、ガス流を遮断可能な第１遮断弁２０とが設けられており、第２ガス供給経路１５には、流量調整器であるマスフローコントローラ２１（ＭＦＣ）と、ガス流を遮断可能な第２遮断弁２２とが設けられている。 The first gas supply path 13 is provided with a mass flow meter 19 (MFM) which is a flow rate measuring instrument and a first shutoff valve 20 capable of shutting off the gas flow, and the second gas supply path 15 is provided with a flow rate. A mass flow controller 21 (MFC), which is a regulator, and a second shutoff valve 22 capable of shutting off the gas flow are provided.

合流部１７と、マスフローメータ１９と、第１遮断弁２０と、マスフローコントローラ２１と、第２遮断弁２２とは、それぞれ、恒温槽２３の内部に配置されて、内部のガス温度を一定に保つように構成されている。 The merging portion 17, the mass flow meter 19, the first shutoff valve 20, the mass flow controller 21, and the second shutoff valve 22 are respectively arranged inside the constant temperature bath 23 to keep the internal gas temperature constant. It is configured as follows.

マスフローメータ１９は、フルスケールと称される計測可能な流量の上限値（計測上限値）Ｈｍと、計測精度が保証される流量の下限値（計測下限値）Ｌｍとが、あらかじめ定まっている。本形態例では、５０Ｌ／ｍｉｎが計測上限値Ｈｍとなるマスフローメータ１９を採用しており、計測下限値Ｌｍは、一般的な機種であれば、計測上限値Ｈｍの２％程度、高精度な機種であっても０．５％程度である。 In the mass flow meter 19, an upper limit value (measurement upper limit value) Hm of a measurable flow rate called full scale and a lower limit value (measurement lower limit value) Lm of a flow rate whose measurement accuracy is guaranteed are predetermined. In this embodiment, a mass flow meter 19 having a measurement upper limit value of Hm of 50 L / min is adopted, and the measurement lower limit value Lm is about 2% of the measurement upper limit value Hm for a general model, which is highly accurate. Even if it is a model, it is about 0.5%.

同様に、マスフローコントローラ２１についても、フルスケールと称される調整可能な流量の上限値（調整上限値）Ｈｃと、調整精度が保証される流量の下限値（調整下限値）Ｌｃとが、あらかじめ定まっている。本形態例では、ＴＣＳを２０％に希釈することから、２００Ｌ／ｍｉｎが調整上限値Ｈｃとなるマスフローコントローラ２１を採用している。調整下限値Ｌｃもマスフローメータ１９と同様に、一般的な機種であれば、調整上限値Ｈｃの２％程度、高精度な機種であっても０．５％程度となる。 Similarly, for the mass flow controller 21, the upper limit value (adjustment upper limit value) Hc of the adjustable flow rate called full scale and the lower limit value (adjustment lower limit value) Lc of the flow rate whose adjustment accuracy is guaranteed are set in advance. It has been decided. In this embodiment example, since TCS is diluted to 20%, a mass flow controller 21 having an adjustment upper limit value of Hc of 200 L / min is adopted. Similar to the mass flow meter 19, the adjustment lower limit value Lc is about 2% of the adjustment upper limit value Hc for a general model, and about 0.5% even for a high-precision model.

マスフローメータ１９は、マスフローコントローラ２１、第１遮断弁２０及び第２遮断弁２２のそれぞれに対して、電気的に接続されて情報伝達可能に形成されており、計測した第１ガス供給経路１３のガス流量Ｌ１を、計測上限値Ｈｍで割って得られる流量比に応じた０〜５Ｖの範囲の電圧信号Ｓ（出力信号）に変換して送るように設定されている。 The mass flow meter 19 is electrically connected to each of the mass flow controller 21, the first shutoff valve 20, and the second shutoff valve 22 so as to be able to transmit information, and is formed in the measured first gas supply path 13. The gas flow rate L1 is set to be converted into a voltage signal S (output signal) in the range of 0 to 5 V according to the flow rate ratio obtained by dividing the gas flow rate L1 by the measurement upper limit value Hm and sent.

すなわち、Ｓ＝５・Ｌ１／Ｈｍである。例えば、マスフローメータ１９によって、計測されたＴＣＳの流量が４０Ｌ／ｍｉｎの場合、電圧信号Ｓは４Ｖとなる。このとき、第１ガス供給経路１３におけるＴＣＳの圧力は、マスフローメータ１９の上流側では０．１８３ＭＰａであったのが、マスフローメータ１９の下流側では、配管等の圧力損失により、０．１８ＭＰａとなる。 That is, S = 5 · L1 / Hm. For example, when the flow rate of TCS measured by the mass flow meter 19 is 40 L / min, the voltage signal S is 4 V. At this time, the pressure of the TCS in the first gas supply path 13 was 0.183 MPa on the upstream side of the mass flow meter 19, but it was 0.18 MPa on the downstream side of the mass flow meter 19 due to the pressure loss of the piping or the like. Become.

マスフローコントローラ２１は、マスフローメータ１９から受け取った電圧信号Ｓ（入力信号）に応じて第２ガス供給経路１５の流量を調整するように形成されており、これにより調整される流量Ｌ２は、調整上限値Ｈｃに電圧信号Ｓの最大値５Ｖに応じた流量比を掛けて得られる値になるように設定されている。 The mass flow controller 21 is formed so as to adjust the flow rate of the second gas supply path 15 according to the voltage signal S (input signal) received from the mass flow meter 19, and the flow rate L2 adjusted by this is the adjustment upper limit. It is set to be a value obtained by multiplying the value Hc by the flow rate ratio corresponding to the maximum value 5V of the voltage signal S.

すなわち、Ｌ２＝Ｈｃ・Ｓ／５である。したがって、電圧信号Ｓが４Ｖの場合、Ｈ２の流量が１６０Ｌ／ｍｉｎとなるように調整される。このとき、Ｈ２の圧力は、第２ガス供給経路１５において、マスフローコントローラ２１の上流側では０．２５ＭＰａであったのが、マスフローコントローラ２１の下流側では、混合されるＴＣＳ供給圧力となる（本形態例では、０．１８ＭＰａ）。 That is, L2 = Hc · S / 5. Therefore, when the voltage signal S is 4V, the flow rate of H 2 is adjusted to 160 L / min. At this time, the pressure of H 2 was 0.25 MPa on the upstream side of the mass flow controller 21 in the second gas supply path 15, but becomes the mixed TCS supply pressure on the downstream side of the mass flow controller 21 (). In this embodiment, 0.18 MPa).

このように、合流部１７に送り込まれるＴＣＳとＨ２との割合は、Ｌ１／Ｌ２＝Ｈｍ／Ｈｃとなり、ＴＣＳの流量が変動しても、常に一定のガス混合比になるように、Ｈ２の流量が調整可能となる。 Thus, the ratio between the TCS and H 2 fed to the merging portion 17, L1 / L2 = Hm / Hc, and the flow amount of TCS is varied, so as to always become constant gas mixture ratio, H 2 The flow rate of is adjustable.

また、第１遮断弁２０及び第２遮断弁２２は、それぞれ、マスフローメータ１９が計測した流量Ｌ１が計測上限値Ｈｍに達した、又は、計測下限値Ｌｍを下回った場合の電圧信号Ｓを受け取ると、各弁を閉じて第１ガス供給経路１３及び第２ガス供給経路１５のガス流をそれぞれ遮断するように形成されている。 Further, the first shutoff valve 20 and the second shutoff valve 22 each receive a voltage signal S when the flow rate L1 measured by the mass flow meter 19 reaches the measurement upper limit value Hm or falls below the measurement lower limit value Lm. And each valve is closed to shut off the gas flow of the first gas supply path 13 and the second gas supply path 15, respectively.

図２は、第１形態例における混合ガス供給装置１１による各原料ガスの流量と混合比率との関係を示すグラフで、ＴＣＳの流量を０〜５０Ｌ／ｍｉｎの範囲で１０Ｌ／ｍｉｎずつ断続的に変化させた場合の各経路におけるガス流量を計測した結果を示している。 FIG. 2 is a graph showing the relationship between the flow rate of each raw material gas and the mixing ratio by the mixed gas supply device 11 in the first embodiment, in which the flow rate of TCS is intermittently increased by 10 L / min in the range of 0 to 50 L / min. The result of measuring the gas flow rate in each path when changed is shown.

図２に示されるように、時刻ｔにおける第１ガス供給経路１３の流量Ｌ１（ｔ）と、第２ガス供給経路１５の流量Ｌ２（ｔ）と、混合ガス供給経路１８の流量Ｌ３（ｔ）との関係を見ると、流量が一定の範囲では、Ｌ３（ｔ）＝Ｌ１（ｔ）＋Ｌ２（ｔ）が成り立っており、かつ、Ｌ２（ｔ）＝４・Ｌ１（ｔ）であることがわかる。 As shown in FIG. 2, the flow rate L1 (t) of the first gas supply path 13 at time t, the flow rate L2 (t) of the second gas supply path 15, and the flow rate L3 (t) of the mixed gas supply path 18 Looking at the relationship with, it can be seen that L3 (t) = L1 (t) + L2 (t) holds and L2 (t) = 4 · L1 (t) in a certain range of the flow rate. ..

したがって、ＴＣＳとＨ２の混合比率は、Ｌ１（ｔ）：Ｌ２（ｔ）＝２０％：８０％＝Ｈｍ：Ｈｃとなって、実際に、マスフローメータ１９の計測上限値Ｈｍとマスフローコントローラ２１の調整上限値Ｈｃとの関係で決まっていることがわかる。 Therefore, the mixing ratio of TCS and H 2 are, L1 (t): L2 ( t) = 20%: 80% = Hm: becomes Hc, in fact, measured upper limit of the mass flow meter 19 Hm and the mass flow controller 21 It can be seen that it is determined in relation to the adjustment upper limit value Hc.

このように、本発明の混合ガス供給装置１１によれば、第１原料ガスであるＴＣＳの流量Ｌ１に対して、第２原料ガスであるＨ２の流量Ｌ２を、マスフローメータ１９の計測上限値Ｈｍと、マスフローコントローラ２１の調整上限値Ｈｃとによって決定して混合できるので、複数の原料ガスを流量に依らず一定の混合比率を維持して混合でき、混合したガスを低圧のまま消費設備に供給可能になる。 As described above, according to the mixed gas supply device 11 of the present invention, the flow rate L2 of the second raw material gas H2 is set to the measurement upper limit value Hm of the mass flow meter 19 with respect to the flow rate L1 of the TCS which is the first raw material gas. And, since it can be determined and mixed according to the adjustment upper limit value Hc of the mass flow controller 21, a plurality of raw material gases can be mixed while maintaining a constant mixing ratio regardless of the flow rate, and the mixed gas is supplied to the consumption equipment at a low pressure. It will be possible.

また、第１ガス供給経路１３にマスフローメータ１９の計測上限値Ｈｍから計測下限値Ｌｍの範囲を外れた流量の第１原料ガスが流されても、第１ガス供給経路１３を第１遮断弁２０が、第２ガス供給経路１５を第２遮断弁２２が、それぞれ遮断するので、マスフローメータ１９が精度よく計測可能な場合のみガスの混合を行うことができ、一定の混合比率を保つことができる。 Further, even if the first raw material gas having a flow rate outside the range of the measurement upper limit value Hm to the measurement lower limit value Lm of the mass flow meter 19 flows through the first gas supply path 13, the first gas supply path 13 is cut off by the first shutoff valve. Since the second shutoff valve 22 shuts off the second gas supply path 15 respectively, the gas can be mixed only when the mass flow meter 19 can measure accurately, and a constant mixing ratio can be maintained. can.

図３は、本発明の第２形態例を示す混合ガス供給装置３０の系統図である。本形態例は、消費設備において、１台のマスフローメータとマスフローコントローラでは供給できない大流量の混合ガスが必要とされる場合に、複数台のマスフローメータとマスフローコントローラを多段式に接続するものである。 FIG. 3 is a system diagram of the mixed gas supply device 30 showing an example of the second embodiment of the present invention. In this embodiment, a plurality of mass flow meters and a mass flow controller are connected in a multi-stage manner when a large flow rate mixed gas that cannot be supplied by one mass flow meter and a mass flow controller is required in a consumption facility. ..

図３に示されるように、本形態例における多段式の混合ガス供給装置３０は、第１形態例とは恒温槽２３内の構成が異なっており、ＴＣＳとＨ２とを混合させる経路が３段、並列に配設されたものである。 As shown in FIG. 3, the multi-stage mixed gas supply device 30 in this embodiment has a different configuration in the constant temperature bath 23 from the first embodiment, and has three paths for mixing TCS and H 2. The stages are arranged in parallel.

第１ガス供給経路１３からは第１ガス分岐経路１３ａ，１３ｂ，１３ｃがそれぞれ延びており、第２ガス供給経路１５からは第２ガス分岐経路１５ａ，１５ｂ，１５ｃがそれぞれ延びている。 The first gas branch paths 13a, 13b, and 13c extend from the first gas supply path 13, and the second gas branch paths 15a, 15b, and 15c extend from the second gas supply path 15, respectively.

第１ガス分岐経路１３ａと第２ガス分岐経路１５ａとは、合流部１７ａで混合ガス供給経路１８と接続しており、第１ガス分岐経路１３ｂと第２ガス分岐経路１５ｂとは、合流部１７ｂで混合ガス供給経路１８と接続しており、第１ガス分岐経路１３ｃと第２ガス分岐経路１５ｃとは、合流部１７ｃで混合ガス供給経路１８と接続している。 The first gas branch path 13a and the second gas branch path 15a are connected to the mixed gas supply path 18 at the confluence 17a, and the first gas branch path 13b and the second gas branch path 15b are connected to the confluence 17b. The first gas branch path 13c and the second gas branch path 15c are connected to the mixed gas supply path 18 at the confluence 17c.

また、混合ガス供給経路１８において、合流部１７ｂは、合流部１７ａよりも上流に配置されており、合流部１７ｃは、合流部１７ｂよりも上流に配置されている。 Further, in the mixed gas supply path 18, the merging portion 17b is arranged upstream of the merging portion 17a, and the merging portion 17c is arranged upstream of the merging portion 17b.

第１ガス分岐経路１３ａ，１３ｂ，１３ｃには、それぞれ、マスフローメータ１９ａ，１９ｂ，１９ｃが取り付けられており、第２ガス分岐経路１５ａ，１５ｂ，１５ｃには、それぞれ、マスフローコントローラ２１ａ，２１ｂ，２１ｃが取り付けられている。また、第１ガス分岐経路１３ａには、マスフローメータ１９ａの上流に第１開閉弁３１が、第１ガス分岐経路１３ｂには、マスフローメータ１９ｂの上流に第２開閉弁３２が、第１ガス分岐経路１３ｃには、マスフローメータ１９ｃの上流に第３開閉弁３３が取り付けられている。 Mass flow meters 19a, 19b, 19c are attached to the first gas branch paths 13a, 13b, 13c, respectively, and mass flow controllers 21a, 21b, 21c are attached to the second gas branch paths 15a, 15b, 15c, respectively. Is installed. Further, in the first gas branch path 13a, the first on-off valve 31 is upstream of the mass flow meter 19a, and in the first gas branch path 13b, the second on-off valve 32 is upstream of the mass flow meter 19b. A third on-off valve 33 is attached to the path 13c upstream of the mass flow meter 19c.

なお、マスフローメータ１９ａ，１９ｂ，１９ｃは、それぞれ同一のフルスケールである計測上限値Ｈｍを有し、マスフローコントローラ２１ａ，２１ｂ，２１ｃは、それぞれ同一のフルスケールである調整上限値Ｈｃを有している。 The mass flow meters 19a, 19b, and 19c each have the same full-scale measurement upper limit value Hm, and the mass flow controllers 21a, 21b, and 21c each have the same full-scale adjustment upper limit value Hc. There is.

マスフローメータ１９ａは、マスフローコントローラ２１ａと第２開閉弁３２とのそれぞれに対して、電気的に接続されて情報伝達可能に形成されており、第１ガス分岐経路１３ａで計測したガス流量Ｌ１ａの情報を、計測上限値Ｈｍとの比に応じた０〜５Ｖの範囲の電圧信号Ｓａに変換して送るように設定されている。 The mass flow meter 19a is formed so as to be electrically connected to each of the mass flow controller 21a and the second on-off valve 32 so that information can be transmitted, and information on the gas flow rate L1a measured by the first gas branch path 13a. Is set to be converted into a voltage signal Sa in the range of 0 to 5 V according to the ratio with the measurement upper limit value Hm and sent.

マスフローメータ１９ｂは、マスフローコントローラ２１ｂと第３開閉弁３３とのそれぞれに対して、電気的に接続されて情報伝達可能に形成されており、第１ガス分岐経路１３ｂで計測したガス流量Ｌ１ｂの情報を、計測上限値Ｈｍとの比に応じた０〜５Ｖの範囲の電圧信号Ｓｂに変換して送るように設定されている。 The mass flow meter 19b is formed so as to be electrically connected to each of the mass flow controller 21b and the third on-off valve 33 so that information can be transmitted, and information on the gas flow rate L1b measured by the first gas branch path 13b. Is set to be converted into a voltage signal Sb in the range of 0 to 5 V according to the ratio with the measurement upper limit value Hm and sent.

マスフローメータ１９ｃは、マスフローコントローラ２１ｃに対して、電気的に接続されて情報伝達可能に形成されており、第１ガス分岐経路１３ｃで計測したガス流量Ｌ１ｃの情報を、計測上限値Ｈｍとの比に応じた０〜５Ｖの範囲の電圧信号Ｓｃに変換して送るように設定されている。 The mass flow meter 19c is formed so as to be electrically connected to the mass flow controller 21c so that information can be transmitted, and the information of the gas flow rate L1c measured by the first gas branch path 13c is compared with the measurement upper limit value Hm. It is set to convert and send a voltage signal Sc in the range of 0 to 5 V according to the above.

マスフローコントローラ２１ａは、マスフローメータ１９ａから受け取った電圧信号Ｓａに応じて第２ガス分岐経路１５ａの流量を調整するように形成されており、これにより調整される流量Ｌ２ａは、調整上限値Ｈｃに電圧信号Ｓの最大値５Ｖに対する割合を掛けて得られる量に設定されている。 The mass flow controller 21a is formed so as to adjust the flow rate of the second gas branch path 15a according to the voltage signal Sa received from the mass flow meter 19a, and the flow rate L2a adjusted thereby is a voltage at the adjustment upper limit value Hc. The amount is set to be obtained by multiplying the maximum value of the signal S by the ratio to the maximum value of 5V.

マスフローコントローラ２１ｂは、マスフローメータ１９ｂから受け取った電圧信号Ｓｂに応じて第２ガス分岐経路１５ｂの流量を調整するように形成されており、これにより調整される流量Ｌ２ｂは、調整上限値Ｈｃに電圧信号Ｓの最大値５Ｖに対する割合を掛けて得られる量に設定されている。 The mass flow controller 21b is formed so as to adjust the flow rate of the second gas branch path 15b according to the voltage signal Sb received from the mass flow meter 19b, and the flow rate L2b adjusted thereby is a voltage at the adjustment upper limit value Hc. The amount is set to be obtained by multiplying the maximum value of the signal S by the ratio to the maximum value of 5V.

マスフローコントローラ２１ｃは、マスフローメータ１９ｃから受け取った電圧信号Ｓｃに応じて第２ガス分岐経路１５ｃの流量を調整するように形成されており、これにより調整される流量Ｌ２ｃは、調整上限値Ｈｃに電圧信号Ｓｃの最大値５Ｖに対する割合を掛けて得られる量に設定されている。 The mass flow controller 21c is formed so as to adjust the flow rate of the second gas branch path 15c according to the voltage signal Sc received from the mass flow meter 19c, and the flow rate L2c adjusted by this is a voltage to the adjustment upper limit value Hc. The amount is set to be obtained by multiplying the maximum value of the signal Sc by the ratio to the maximum value of 5V.

多段式の混合ガス供給装置における開閉弁の開閉動作について、次段の開閉弁の開閉設定を1つの閾値で制御すると、開閉時に流量変動が大きくなり濃度変動がおきてしまうため、開時、閉時の閾値をそれぞれ別に設定することで、流量変動を小さくすることができる。 Regarding the opening / closing operation of the on-off valve in the multi-stage mixed gas supply device, if the opening / closing setting of the on-off valve of the next stage is controlled by one threshold value, the flow rate fluctuates greatly at the time of opening / closing and the concentration fluctuates. By setting the hour thresholds separately, the flow rate fluctuation can be reduced.

具体的には、第２開閉弁３２は、電圧信号Ｓａの８０％までは機器の自己制御とし、マスフローメータ１９ａから受け取った電圧信号Ｓａが最大値５Ｖの８０％（４Ｖ）を超えると第２開閉弁３２を開き、電圧信号Ｓｂの最大値の２０％（１Ｖ）を下回ると弁を閉じるように設定されている。 Specifically, the second on-off valve 32 controls the device up to 80% of the voltage signal Sa, and when the voltage signal Sa received from the mass flow meter 19a exceeds 80% (4V) of the maximum value of 5V, the second on-off valve 32 is second. The on-off valve 32 is opened, and the valve is set to close when the voltage signal Sb falls below 20% (1 V) of the maximum value.

第３開閉弁３３は、電圧信号Ｓｂの７５％までは機器の自己制御とし、マスフローメータ１９ｂから受け取った電圧信号Ｓｂが最大値５Ｖの７５％（３．７５Ｖ）を超えると弁を開き、電圧信号Ｓｃの最大値の２５％（１．２５Ｖ）を下回ると弁を閉じるように設定されている。 The third on-off valve 33 controls the equipment up to 75% of the voltage signal Sb, and when the voltage signal Sb received from the mass flow meter 19b exceeds 75% (3.75V) of the maximum value of 5V, the valve is opened and the voltage is increased. The valve is set to close below 25% (1.25V) of the maximum value of the signal Sc.

多段式の混合ガス供給装置３０による混合ガスの供給は、次のように行われる。 The mixed gas is supplied by the multi-stage mixed gas supply device 30 as follows.

第１開閉弁３１を開き、ＴＣＳ供給部１２からＴＣＳが第１ガス供給経路１３に供給されると、まず、ＴＣＳが第１段目の第１ガス分岐経路１３ａに流れ込み、マスフローメータ１９ａがＴＣＳの流量を計測して電圧信号Ｓａを送る。 When the first on-off valve 31 is opened and the TCS is supplied from the TCS supply unit 12 to the first gas supply path 13, the TCS first flows into the first gas branch path 13a of the first stage, and the mass flow meter 19a is the TCS. The voltage signal Sa is sent by measuring the flow rate of.

マスフローコントローラ２１ａが電圧信号Ｓａを受け取ると、マスフローコントローラ２１ａによって電圧信号Ｓａに応じた流量のＨ２が、Ｈ２供給部１４から第２ガス分岐経路１５ａに流されるので、ＴＣＳとＨ２とが合流部１７ａで混合されて混合ガス供給経路１８に流され、混合ガス供給経路１８を介して消費設備１６に供給される。 When the mass flow controller 21a receives the voltage signal Sa, the mass flow controller 21a causes H 2 having a flow rate corresponding to the voltage signal Sa to flow from the H2 supply unit 14 to the second gas branch path 15a, so that the TCS and H 2 merge. It is mixed in the unit 17a, flows through the mixed gas supply path 18, and is supplied to the consumption facility 16 via the mixed gas supply path 18.

また、第１ガス分岐経路１３ａに流れ込むＴＣＳの流量がマスフローメータ１９ａの計測上限値Ｈｍの８０％に達すると、第２開閉弁３２がその電圧信号Ｓａに反応して開放されるので、ＴＣＳが２段目の第１ガス分岐経路１３ｂにも流れ込む。 Further, when the flow rate of the TCS flowing into the first gas branch path 13a reaches 80% of the measurement upper limit value Hm of the mass flow meter 19a, the second on-off valve 32 is opened in response to the voltage signal Sa, so that the TCS is opened. It also flows into the first gas branch path 13b of the second stage.

第１ガス分岐経路１３ｂにＴＣＳが流れると、マスフローコントローラ２１ｂがＴＣＳの流量を計測して電圧信号Ｓｂを送る。マスフローメータ１９ｂが電圧信号Ｓｂを受け取ると、マスフローメータ１９ｂによって電圧信号Ｓｂに応じた流量のＨ２が、Ｈ２供給部１４から第２ガス分岐経路１５ｂに流されるので、ＴＣＳとＨ２とが合流部１７ｂでも混合されて混合ガス供給経路１８に流される。 When the TCS flows through the first gas branch path 13b, the mass flow controller 21b measures the flow rate of the TCS and sends a voltage signal Sb. When the mass flow meter 19b receives the voltage signal Sb, the mass flow meter 19b causes H 2 having a flow rate corresponding to the voltage signal Sb to flow from the H2 supply unit 14 to the second gas branch path 15b, so that the TCS and H 2 merge. Part 17b is also mixed and flowed through the mixed gas supply path 18.

さらに、第１ガス分岐経路１３ｂに流れ込むＴＣＳの流量がマスフローメータ１９ｂの計測上限値Ｈｍの７５％に達すると、第３開閉弁３３がその電圧信号Ｓｂに反応して開放されるので、ＴＣＳが３段目の第１ガス分岐経路１３ｃにも流れ込む。 Further, when the flow rate of the TCS flowing into the first gas branch path 13b reaches 75% of the measurement upper limit value Hm of the mass flow meter 19b, the third on-off valve 33 is opened in response to the voltage signal Sb, so that the TCS is opened. It also flows into the first gas branch path 13c of the third stage.

第１ガス分岐経路１３ｃにＴＣＳが流れると、マスフローコントローラ２１ｃがＴＣＳの流量を計測して電圧信号Ｓｃを送る。マスフローメータ１９ｃが電圧信号Ｓｃを受け取ると、マスフローメータ１９ｃによって電圧信号Ｓｃに応じた流量のＨ２が、Ｈ２供給部１４から第２ガス分岐経路１５ｃに流されるので、ＴＣＳとＨ２とが合流部１７ｃでも混合されて混合ガス供給経路１８に流される。 When the TCS flows through the first gas branch path 13c, the mass flow controller 21c measures the flow rate of the TCS and sends a voltage signal Sc. When the mass flow meter 19c receives the voltage signal Sc, the mass flow meter 19c causes H 2 having a flow rate corresponding to the voltage signal Sc to flow from the H2 supply unit 14 to the second gas branch path 15c, so that the TCS and H 2 merge. Part 17c is also mixed and flowed through the mixed gas supply path 18.

また、ＴＣＳの供給によって第２開閉弁３２及び第３開閉弁３３が開放されている状態で、第１ガス分岐経路１３ｃに分配されて流れ込むＴＣＳの流量がマスフローメータ１９ｃの計測上限値Ｈｍの２５％にまで下がると、第３開閉弁３３がその電圧信号Ｓｃに反応して閉鎖されるので、ＴＣＳが第１ガス分岐経路１３ｃに流れなくなる。 Further, in a state where the second on-off valve 32 and the third on-off valve 33 are opened by the supply of TCS, the flow rate of TCS distributed and flowing into the first gas branch path 13c is 25, which is the measurement upper limit value Hm of the mass flow meter 19c. When it drops to%, the third on-off valve 33 is closed in response to the voltage signal Sc, so that the TCS does not flow into the first gas branch path 13c.

さらに、第１ガス分岐経路１３ｂに分配されて流れ込むＴＣＳの流量がマスフローメータ１９ｂの計測上限値Ｈｍの２０％にまで下がると、第２開閉弁３２がその電圧信号Ｓｂに反応して閉鎖されるので、ＴＣＳが第１ガス分岐経路１３ｂに流れなくなる。 Further, when the flow rate of the TCS distributed and flowing into the first gas branch path 13b drops to 20% of the measurement upper limit value Hm of the mass flow meter 19b, the second on-off valve 32 is closed in response to the voltage signal Sb. Therefore, the TCS does not flow to the first gas branch path 13b.

図４は、図３の多段式の混合ガス供給装置３０において、ＴＣＳの流量増加に伴って各第１ガス分岐経路１３ａ，１３ｂ，１３ｃに流入するガス流量の遷移を示すグラフであり、図５は、図３の多段式の混合ガス供給装置３０において、ＴＣＳの流量減少に伴って各第１ガス分岐経路１３ａ，１３ｂ，１３ｃに流入するガス流量の遷移を示すグラフである。 FIG. 4 is a graph showing the transition of the gas flow rate flowing into each of the first gas branch paths 13a, 13b, 13c as the flow rate of the TCS increases in the multi-stage mixed gas supply device 30 of FIG. Is a graph showing the transition of the gas flow rate flowing into each of the first gas branch paths 13a, 13b, 13c as the flow rate of the TCS decreases in the multi-stage mixed gas supply device 30 of FIG.

図４及び図５において、各第１ガス分岐経路１３ａ，１３ｂ，１３ｃの流量を計測する各マスフローメータ１９ａ，１９ｂ，１９ｃの計測上限値Ｈｍは、それぞれ５０Ｌ／ｍｉｎに設定されている。 In FIGS. 4 and 5, the measurement upper limit value Hm of each of the mass flow meters 19a, 19b, 19c for measuring the flow rate of each of the first gas branch paths 13a, 13b, 13c is set to 50 L / min, respectively.

図４に示されるように、ＴＣＳの流量を０／ｍｉｎから増加させると、０〜４０Ｌ／ｍｉｎの範囲では、第１ガス分岐経路１３ａのみ流入可能であるが、４０Ｌ／ｍｉｎ（Ｈｍの８０％）を超えたところで第２開閉弁３２が開くので、第１ガス分岐経路１３ｂにもＴＣＳが流入可能になり、ＴＣＳの流量を２つの経路で分け合って第１ガス分岐経路１３ａ及び第１ガス分岐経路１３ｂの流量が２０Ｌ／ｍｉｎまで下がる。 As shown in FIG. 4, when the flow rate of TCS is increased from 0 / min, only the first gas branch path 13a can flow in the range of 0 to 40 L / min, but 40 L / min (80% of Hm). ) Is exceeded, the second on-off valve 32 opens, so that the TCS can flow into the first gas branch path 13b, and the flow rate of the TCS is divided by the two paths to divide the flow rate of the TCS into the first gas branch path 13a and the first gas branch. The flow rate of the path 13b drops to 20 L / min.

さらにＴＣＳの流量を増加させ、第１ガス分岐経路１３ａ及び第１ガス分岐経路１３ｂにおけるＴＣＳの流量が３７．５Ｌ／ｍｉｎ（Ｈｍの７５％）を超えると、第３開閉弁３３が開くので、第１ガス分岐経路１３ｃにもＴＣＳが流入可能になり、ＴＣＳの流量を３つの経路で分け合って第１ガス分岐経路１３ａ，第１ガス分岐経路１３ｂ及び第１ガス分岐経路１３ｃの流量は２５Ｌ／ｍｉｎまで下がる。 Further, when the flow rate of TCS is further increased and the flow rate of TCS in the first gas branch path 13a and the first gas branch path 13b exceeds 37.5 L / min (75% of Hm), the third on-off valve 33 opens. TCS can also flow into the first gas branch path 13c, and the flow rate of the TCS is divided by three paths so that the flow rates of the first gas branch path 13a, the first gas branch path 13b, and the first gas branch path 13c are 25 L / It goes down to min.

そして、さらに流量を増加させることで第１ガス分岐経路１３ａ，１３ｂ，１３ｃの流量がそれぞれ５０Ｌ／ｍｉｎに達するので、ＴＣＳの流量を全体で１５０Ｌ／ｍｉｎまで精度よく増やすことが可能である。 Then, by further increasing the flow rate, the flow rates of the first gas branch paths 13a, 13b, and 13c each reach 50 L / min, so that the total flow rate of the TCS can be increased accurately to 150 L / min.

図５に示されるように、ＴＣＳの流量を１５０Ｌ／ｍｉｎから減少させると、１５０〜４０Ｌ／ｍｉｎの範囲では、第１ガス分岐経路１３ａ，１３ｂ，１３ｃ全てで流入可能であるが、総流量が３７．５Ｌ／ｍｉｎ、つまり、各経路で１２．５Ｌ／ｍｉｎ（Ｈｍの２５％）を下回ると、第１ガス分岐経路１３ｃで第３開閉弁３３が閉じるので、第１ガス分岐経路１３ｃにＴＣＳが流入できなくなり、ＴＣＳの流量を２つの経路で分け合って第１ガス分岐経路１３ａの流量及び第１ガス分岐経路１３ｂの流量は１８．７５Ｌ／ｍｉｎまで上がる。 As shown in FIG. 5, when the flow rate of TCS is reduced from 150 L / min, it is possible to flow in all of the first gas branch paths 13a, 13b, 13c in the range of 150 to 40 L / min, but the total flow rate is increased. When it falls below 37.5 L / min, that is, 12.5 L / min (25% of Hm) in each path, the third on-off valve 33 closes in the first gas branch path 13c, so that TCS in the first gas branch path 13c. The flow rate of the TCS is divided by two paths, and the flow rate of the first gas branch path 13a and the flow rate of the first gas branch path 13b increase to 18.75 L / min.

さらにＴＣＳの流量を減少させ、第１ガス分岐経路１３ａ及び第１ガス分岐経路１３ｂにおけるＴＣＳの総流量が２０Ｌ／ｍｉｎ、つまり、各経路で１０Ｌ／ｍｉｎ（（Ｈｍの２０％）を下回ると、第１ガス分岐経路１３ｂで第２開閉弁３２が閉じるので、第１ガス分岐経路１３ａのみ流入可能になり、第１ガス分岐経路１３ａの流量は２０Ｌ／ｍｉｎまで上がる。 Further reducing the flow rate of TCS, when the total flow rate of TCS in the first gas branch path 13a and the first gas branch path 13b is less than 20 L / min, that is, less than 10 L / min ((20% of Hm)) in each path. Since the second on-off valve 32 is closed at the first gas branch path 13b, only the first gas branch path 13a can flow in, and the flow rate of the first gas branch path 13a increases to 20 L / min.

そして、さらに流量を減少させることで第１ガス分岐経路１３ａの流量が５Ｌ／ｍｉｎに達するので、ＴＣＳの流量を計測下限値Ｌｍまで精度よく減らすことが可能である。 Then, by further reducing the flow rate, the flow rate of the first gas branch path 13a reaches 5 L / min, so that the flow rate of the TCS can be accurately reduced to the lower limit of measurement Lm.

このように、本発明の多段式の混合ガス供給装置３０によれば、ＴＣＳとＨ２とを混合する経路を分岐させて複数段設け、ＴＣＳの流量増加に応じてＴＣＳが流れる経路を順次開放することで、最大でマスフローメータ１９ａ，１９ｂ，１９ｃの各計測上限値Ｈｍを合算した流量のＴＣＳを流すことができるので、単一の経路では対応できない大流量の混合ガスを供給可能になる。 As described above, according to the multi-stage mixed gas supply device 30 of the present invention, the path for mixing the TCS and the H 2 is branched and provided in a plurality of stages, and the path through which the TCS flows is sequentially opened according to the increase in the flow rate of the TCS. By doing so, it is possible to flow a TCS with a flow rate that is the sum of the measurement upper limit values Hm of the mass flow meters 19a, 19b, and 19c at the maximum, so that it is possible to supply a large flow rate of mixed gas that cannot be handled by a single route.

また、二段目以降の第１ガス分岐経路１３ｂ，１３ｃのそれぞれを前段のＴＣＳの流量が所定の範囲を上回ったら開き、下回ったら閉じるように構成したことで、ＴＣＳが第１ガス分岐経路１３ａ，１３ｂ，１３ｃのいずれかに偏って流入するいわゆる片流れを防止できるので、ＴＣＳの流量を、計測上限値Ｈｍを段数倍した値から計測下限値Ｌｍの範囲で、Ｈ２と精度よく混合することができる。 Further, the TCS is configured to open each of the first gas branch paths 13b and 13c of the second and subsequent stages when the flow rate of the TCS in the previous stage exceeds a predetermined range and close when the flow rate falls below the predetermined range, so that the TCS is the first gas branch path 13a. , 13b, 13c, so-called one-sided flow can be prevented. Therefore, the flow rate of TCS should be accurately mixed with H2 in the range from the value obtained by multiplying the measurement upper limit value Hm by the number of steps to the measurement lower limit value Lm. Can be done.

さらに、各段で混合が正しくされているかの濃度検定を行うことで、故障・異常箇所の検知も容易となる。 Furthermore, by performing a concentration test to see if the mixing is correct at each stage, it becomes easy to detect a failure / abnormality part.

なお、本形態例の多段式の混合ガス供給装置では、第１分岐経路及び第２分岐経路をそれぞれ３段ずつ設けているが、必ずしも３段である必要はなく、２段でもよいし、消費設備先の混合ガスの必要量に応じて４段以上設けてもよい。 In the multi-stage mixed gas supply device of this embodiment, the first branch path and the second branch path are provided in three stages each, but the number of stages is not necessarily three, and two stages may be used for consumption. Four or more stages may be provided depending on the required amount of mixed gas at the facility destination.

例えば、第１分岐経路及び第２分岐経路を８段設けた場合、ＴＣＳの流量増加又は減少に伴う各第１ガス分岐経路に流入するガス流量は、図６及び図７に示されるように遷移するので、第１原料ガスの流量を、マスフローメータの計測上限値を段数倍した値から計測下限値の範囲で、第２原料ガスと精度よく混合することができる。 For example, when eight stages of the first branch path and the second branch path are provided, the gas flow rate flowing into each first gas branch path due to the increase or decrease of the TCS flow rate changes as shown in FIGS. 6 and 7. Therefore, the flow rate of the first raw material gas can be accurately mixed with the second raw material gas within the range from the value obtained by multiplying the measurement upper limit value of the mass flow meter by the number of steps to the measurement lower limit value.

ここで、第２形態例では、開時の閾値を８０％から７５％、閉時の閾値を２５％から２０％へと段々と幅を絞っていくようにしているが、図６及び図７の場合は、各第１分岐経路に設けられた機器の自己制御幅はいずれも８０％〜４０％の範囲に設定されている Here, in the second embodiment, the threshold value at the time of opening is gradually narrowed from 80% to 75%, and the threshold value at the time of closing is gradually narrowed down from 25% to 20%. In the case of, the self-control width of the equipment provided in each first branch path is set in the range of 80% to 40%.

このように不感帯の設定については、マスフローメータ、マスフローコントローラのフルスケールや段数、供給する混合ガスの成分・比率によって適宜設けることができる。 As described above, the dead zone can be appropriately set depending on the full scale and the number of stages of the mass flow meter and the mass flow controller, and the components and ratios of the mixed gas to be supplied.

なお、本発明は、以上の形態例に限定されることなく、発明の範囲内において種々の変更が可能である。例えば、本形態例では、原料ガスを、第１ガス供給経路と第２ガス供給経路との２つから供給しているが、原料ガスの供給経路は必ずしも２つである必要はなく、３つ以上の供給経路から原料ガスを供給するようにしてもよい。 The present invention is not limited to the above embodiment, and various modifications can be made within the scope of the invention. For example, in this embodiment, the raw material gas is supplied from the first gas supply path and the second gas supply path, but the raw material gas supply path does not necessarily have to be two, and three. The raw material gas may be supplied from the above supply route.

例えば、二酸化炭素（ＣＯ２）８９％、ヘリウム（Ｈｅ）１０％、窒素（Ｎ２）１％のレーザーガスを２０Ｌ／ｍｉｎで供給する場合には、二酸化炭素を１７．８Ｌ／ｍｉｎを計測上限値（フルスケール）とするマスフローメータを介して供給し、その信号に基づいて、ヘリウムを２Ｌ／ｍｉｎを調整上限値（フルスケール）とするマスフローメータを介して、窒素を０．２Ｌ／ｍｉｎを調整上限値（フルスケール）とするマスフローメータを介して供給することで、連続供給が可能となる。 For example, when a laser gas containing 89% carbon dioxide (CO 2 ), 10% helium (He), and 1% nitrogen (N 2 ) is supplied at 20 L / min, the upper limit of measurement is 17.8 L / min for carbon dioxide. Supply via a mass flow meter with a value (full scale), and based on the signal, adjust nitrogen to 0.2 L / min via a mass flow meter with an adjustment upper limit (full scale) of 2 L / min. Continuous supply is possible by supplying via a mass flow meter with the adjustment upper limit (full scale).

また、フッ素（Ｆ２）、クリプトン（Ｋｒ）、ネオン（Ｎｅ）等を混合するレーザーガスでも同様に適用でき、本発明は、高圧ガス用設備や圧力調整部を用いることなく、低蒸気圧ガスを混合して供給する場合に好適である。 Further, the same can be applied to a laser gas in which fluorine (F2), krypton (Kr), neon (Ne) and the like are mixed, and the present invention can use a low vapor pressure gas without using a high-pressure gas facility or a pressure adjusting unit. It is suitable for mixing and supplying.

さらに、３つ以上の供給経路から原料ガスを供給する場合、同種の原料ガスを２つ以上の経路から供給してもよい。このようにマスフローメータとマスフローコントローラの連携台数を増やすことで、機器による流量誤差を小さくすることができる。 Further, when the raw material gas is supplied from three or more supply routes, the same kind of raw material gas may be supplied from two or more routes. By increasing the number of linked mass flow meters and mass flow controllers in this way, it is possible to reduce the flow rate error due to the equipment.

また、第１形態例では、遮断弁を設けてマスフローメータの計測上限値Ｈｍと計測下限値Ｌｍとから外れた流量の場合にガス供給を遮断できるようにしているが、マスフローメータの計測下限値Ｌｍから外れる場合には、図８に示すように、混合ガス供給経路１８に設けられたベント経路４１に混合ガスを流すようにしてもよい。原料ガスの混合比率が保証されない場合に、消費設備１６へ供給されることを避けることができる。ベント経路に開閉弁を設け、マスフローメータ１９の計測下限値を下回る場合には、開閉弁を開けて、混合ガスをすべてベント経路４１に流すようにしてもよいが、図８に示すようにベント経路４１にマスフローコントローラ４２を設けてもよい。これにより、計測下限値Ｌｍを下回っている電圧信号Ｓをマスフローコントローラ４２が受信して、ベント経路に流れる流量を制御することができる。ただし、配管長が長い場合には変動差が生じるため制御が難しいので、マスフローメータ１９が高精度な機種であり、計測下限値Ｌｍが計測上限値Ｈｍの０．５％のときには、マスフローコントローラ４２のベントへの制御流量は、マスフローメータ１９の計測下限値Ｌｍよりも少し高めの流量を維持できる値を採用するのが好ましい。なお、第１形態例の遮断弁の機構と、本形態例のベント経路の機構を併用することも可能である。 Further, in the first embodiment, a shutoff valve is provided so that the gas supply can be shut off when the flow rate deviates from the measurement upper limit value Hm and the measurement lower limit value Lm of the mass flow meter. When the gas deviates from Lm, as shown in FIG. 8, the mixed gas may flow through the vent path 41 provided in the mixed gas supply path 18. When the mixing ratio of the raw material gas is not guaranteed, it can be avoided that the raw material gas is supplied to the consumption facility 16. An on-off valve may be provided in the vent path, and if the value falls below the lower limit of measurement of the mass flow meter 19, the on-off valve may be opened so that all the mixed gas flows through the vent path 41. A mass flow controller 42 may be provided on the path 41. As a result, the mass flow controller 42 can receive the voltage signal S below the lower limit of measurement Lm and control the flow rate flowing through the vent path. However, if the pipe length is long, it is difficult to control because a fluctuation difference occurs. Therefore, when the mass flow meter 19 is a highly accurate model and the measurement lower limit value Lm is 0.5% of the measurement upper limit value Hm, the mass flow controller 42 As the control flow rate to the vent, it is preferable to adopt a value capable of maintaining a flow rate slightly higher than the measurement lower limit value Lm of the mass flow meter 19. It is also possible to use the shutoff valve mechanism of the first embodiment and the vent path mechanism of the present embodiment together.

なお、原料ガスの混合比率を変更した場合には、所定の比率となるようなフルスケールを有するマスフローメータ、マスフローコントローラに適宜組合せを変更すればよい。 When the mixing ratio of the raw material gas is changed, the combination may be appropriately changed to a mass flow meter and a mass flow controller having a full scale so as to have a predetermined ratio.

１１…混合ガス供給装置、１２…ＴＣＳ供給部、１３…第１ガス供給経路、１３ａ，１３ｂ，１３ｃ…第１ガス分岐経路、１４…Ｈ２供給部、１５…第２ガス供給経路、１５ａ，１５ｂ，１５ｃ…第２ガス分岐経路、１６…消費設備、１７（１７ａ，１７ｂ，１７ｃ）…合流部、１８…混合ガス供給経路、１９（１９ａ，１９ｂ，１９ｃ）…マスフローメータ、２０…第１遮断弁、２１（２１ａ，２１ｂ，２１ｃ）…マスフローコントローラ、２２…第２遮断弁、２３…恒温槽、３０…混合ガス供給装置、３１…第１開閉弁、３２…第２開閉弁、３３…第３開閉弁、４１…ベント経路、４２…マスフローコントローラ 11 ... mixed gas supply device, 12 ... TCS supply section, 13 ... first gas supply path, 13a, 13b, 13c ... first gas branch path, 14 ... H2 supply section, 15 ... second gas supply path, 15a, 15b , 15c ... 2nd gas branch path, 16 ... Consuming equipment, 17 (17a, 17b, 17c) ... Confluence, 18 ... Mixed gas supply path, 19 (19a, 19b, 19c) ... Mass flow meter, 20 ... First cutoff Valves, 21 (21a, 21b, 21c) ... Mass flow controller, 22 ... Second shutoff valve, 23 ... Constant temperature bath, 30 ... Mixed gas supply device, 31 ... First on-off valve, 32 ... Second on-off valve, 33 ... No. 3 on-off valve, 41 ... vent path, 42 ... mass flow controller

Claims (6)

複数の原料ガスを所定の割合で混合して供給する混合ガス供給装置であって、
複数の原料ガス供給経路と、
各原料ガス供給経路から供給される複数の原料ガスを合流させて混合ガスとするガス合流部と、
混合ガスを使用先に供給するための混合ガス供給経路と、を備え、
前記原料ガス供給経路の一つに流量計測器が設けられ、
他の原料ガス供給経路には流量調整器が設けられ、
前記流量調整器は、前記流量計測器からの信号を受信可能に構成され、
前記流量計測器は、検出した流量に応じて、前記流量計測器の計測可能な流量の上限値で割って得られる流量比を示す信号を前記流量調整器に送信し、
前記流量調整器は、前記信号を受信すると、原料ガスの流量を、前記流量調整器の調整可能な流量の上限値に前記流量比を掛けて得られる流量に調整することを特徴とする混合ガス供給装置。 A mixed gas supply device that mixes and supplies a plurality of raw material gases at a predetermined ratio.
Multiple raw material gas supply channels and
A gas merging section that merges a plurality of raw material gases supplied from each raw material gas supply path into a mixed gas,
It is equipped with a mixed gas supply path for supplying the mixed gas to the destination.
A flow measuring instrument is provided in one of the raw material gas supply paths.
Flow regulators are installed in other raw material gas supply paths,
The flow rate regulator is configured to be able to receive a signal from the flow rate measuring instrument.
The flow rate measuring instrument transmits a signal indicating a flow rate ratio obtained by dividing by the upper limit value of the measurable flow rate of the flow rate measuring device to the flow rate regulator according to the detected flow rate.
Upon receiving the signal, the flow rate regulator adjusts the flow rate of the raw material gas to a flow rate obtained by multiplying the upper limit of the adjustable flow rate of the flow rate regulator by the flow rate ratio. Feeding device. 前記流量計測器によって検出された流量が、計測上限値に達する、又は、計測下限値を下回ると、前記複数の原料ガス供給経路を遮断する遮断弁を備えていることを特徴とする請求項１記載の混合ガス供給装置。 Claim 1 is characterized in that it includes a shutoff valve that shuts off the plurality of raw material gas supply paths when the flow rate detected by the flow rate measuring instrument reaches the measurement upper limit value or falls below the measurement lower limit value. The mixed gas supply device according to the description. 前記流量計測器によって検出された流量が計測下限値を下回ると、前記混合ガス供給経路に設けられたベント経路に混合ガスを流すことを特徴とする請求項１又は２記載の混合ガス供給装置。 The mixed gas supply device according to claim 1 or 2, wherein when the flow rate detected by the flow rate measuring instrument falls below the measurement lower limit value, the mixed gas is flowed through the vent path provided in the mixed gas supply path. 複数の原料ガスを所定の割合で混合して供給する混合ガス供給装置であって、
複数の原料ガス供給経路と、
各原料ガス供給経路から供給される複数の原料ガスを合流させて混合ガスとするガス合流部と、
混合ガスを使用先に供給するための混合ガス供給経路と、を備え、
前記原料ガス供給経路の一つが複数に分岐され、各分岐経路にそれぞれ流量計測器が設けられ、
他の原料ガス供給経路も同様に複数に分岐され、各分岐経路にそれぞれ流量調整器が設けられ、
前記流量調整器は、対応する前記流量計測器からの信号を受信可能に構成され、
前記流量計測器は、検出した流量に応じて、前記流量計測器の計測可能な流量の上限値で割って得られる流量比を示す信号を対応する前記流量調整器に送信し、
前記流量調整器は、前記信号を受信すると、原料ガスの流量を、前記流量調整器の調整可能な流量の上限値に前記流量比を掛けて得られる流量に調整することを特徴とする混合ガス供給装置。 A mixed gas supply device that mixes and supplies a plurality of raw material gases at a predetermined ratio.
Multiple raw material gas supply channels and
A gas merging section that merges a plurality of raw material gases supplied from each raw material gas supply path into a mixed gas,
It is equipped with a mixed gas supply path for supplying the mixed gas to the destination.
One of the raw material gas supply paths is branched into a plurality of branches, and a flow measuring instrument is provided in each branch path.
The other raw material gas supply paths are also branched into a plurality of branches in the same manner, and each branch path is provided with a flow rate regulator.
The flow rate regulator is configured to be able to receive signals from the corresponding flow rate measuring instrument.
The flow rate measuring instrument transmits a signal indicating a flow rate ratio obtained by dividing by the upper limit value of the measurable flow rate of the flow rate measuring device to the corresponding flow rate regulator according to the detected flow rate.
Upon receiving the signal, the flow rate regulator adjusts the flow rate of the raw material gas to a flow rate obtained by multiplying the upper limit of the adjustable flow rate of the flow rate regulator by the flow rate ratio. Supply device. 前記原料ガス供給経路の一つの分岐経路に設けられた前記流量計測器の検出した流量が、所定の流量を上回ると、隣接する分岐経路の原料ガスを流し始め、
所定の流量を下回ると、隣接する分岐経路の原料ガスの流れを遮断することを特徴とする請求項４記載の混合ガス供給装置。 When the flow rate detected by the flow rate measuring instrument provided in one branch path of the raw material gas supply path exceeds a predetermined flow rate, the raw material gas in the adjacent branch path starts to flow.
The mixed gas supply device according to claim 4, wherein when the flow rate falls below a predetermined flow rate, the flow of the raw material gas in the adjacent branch path is blocked. 複数の原料ガスを所定の割合で混合して供給する混合ガス供給方法であって、
複数の原料ガスを各原料ガス供給経路に供給し、
流量計測器を介して一の原料ガスを供給し、前記流量計測器によって検出された流量に基づく出力信号を、入力信号として流量調整器で他の原料ガスの流量を調整し、
複数の原料ガスを合流させて混合ガスとする混合ガス供給方法。 A mixed gas supply method in which a plurality of raw material gases are mixed and supplied at a predetermined ratio.
Supplying multiple raw material gases to each raw material gas supply path,
One raw material gas is supplied via the flow rate measuring instrument, and the output signal based on the flow rate detected by the flow rate measuring instrument is used as an input signal to adjust the flow rate of the other raw material gas with the flow rate regulator.
A mixed gas supply method in which a plurality of raw material gases are merged into a mixed gas.
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