JP2018528915A - 磁性酸化鉄−グラフェン複合体の製造方法 - Google Patents
磁性酸化鉄−グラフェン複合体の製造方法 Download PDFInfo
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- JP2018528915A JP2018528915A JP2018501962A JP2018501962A JP2018528915A JP 2018528915 A JP2018528915 A JP 2018528915A JP 2018501962 A JP2018501962 A JP 2018501962A JP 2018501962 A JP2018501962 A JP 2018501962A JP 2018528915 A JP2018528915 A JP 2018528915A
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- iron oxide
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- magnetic iron
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0075—Magnetic shielding materials
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G49/00—Compounds of iron
- C01G49/02—Oxides; Hydroxides
- C01G49/06—Ferric oxide [Fe2O3]
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G49/00—Compounds of iron
- C01G49/02—Oxides; Hydroxides
- C01G49/08—Ferroso-ferric oxide [Fe3O4]
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
- H01F1/009—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity bidimensional, e.g. nanoscale period nanomagnet arrays
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- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
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- B82—NANOTECHNOLOGY
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B82Y40/00—Manufacture or treatment of nanostructures
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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- C—CHEMISTRY; METALLURGY
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- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/0036—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties showing low dimensional magnetism, i.e. spin rearrangements due to a restriction of dimensions, e.g. showing giant magnetoresistivity
- H01F1/0045—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use
- H01F1/0063—Zero dimensional, e.g. nanoparticles, soft nanoparticles for medical/biological use in a non-magnetic matrix, e.g. granular solids
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
Description
本出願は、2015年10月30日付の韓国特許出願第10−2015−0152413号に基づく優先権の利益を主張し、当該韓国特許出願の文献に開示された全ての内容は本明細書の一部として含まれる。
また、本発明は、前記製造方法により製造された磁性酸化鉄−グラフェン複合体を提供する。
グラファイトおよび鉄のハロゲン塩を混合し熱処理する段階(段階1);
前記段階1の生成物を(C1-20アルキル)アミンと反応させる段階(段階2);
前記段階2の生成物を洗浄する段階(段階3);
前記段階3の生成物を高速均質化する段階(段階4);および
前記段階4の生成物を超音波処理または高圧均質化する段階(段階5)。
前記段階1は、グラファイトの層間の間に鉄のハロゲン塩が介在した形態のGIC(graphite intercalation compound)を製造する段階である。
前記段階2では、30℃乃至250℃、好ましくは60℃乃至120℃、さらに好ましくは80℃乃至100℃で行うことが望ましいのである。また、前記段階2では6時間以上、好ましくは12時間以上行うことが望ましいのである。また、前記段階2の遂行時間の実質的な上限はないが、一例として100時間以下、90時間以下、または80時間以下が望ましい。
丸底フラスコに純粋なグラファイト4gおよびFeCl320gを入れて混合した後、box furnaceで337℃で3日間(72時間)熱処理した。生成物を常温で冷却した後、ドデシルアミン溶液400mLに分散させて90℃で6時間反応させた。生成物をろ過した後、10mM HCl/EtOH溶液2Lとエタノール500mLで減圧フィルターを洗浄した。次に、これを乾燥させて酸化鉄が介在したグラファイトを製造し、これを'FeOx-GIC'と命名した。
前記実施例1と同様な方法で製造し、ドデシルアミンの代わりにヘキシルアミンを使って磁性酸化鉄−グラフェン複合体を製造した。
前記実施例1で製造したFeOx−GIC 2.5gおよびPVP 0.5gをNMP500mLに添加し、これを高速均質機(Silverson model L5M mixer)を使って5000rpmで1時間高速均質化した。
1次アミン処理後、グラファイトの層間の間隔を確認するために、実施例1および実施例2の1次アミン処理までのグラファイトをSEMイメージに確認し、その結果を図2に示した。
実施例1で製造した磁性酸化鉄−グラフェン複合体をTEMおよびHR−TEMで分析し、その結果を図5に示した。図5に示されているように、厚さが約1〜5nm水準のグラフェンが製造されたことを確認することができた。
実施例3で製造した磁性酸化鉄−グラフェン複合体を各製造段階別にSEMイメージで分析し、その結果を図7に示した。
実施例3で製造した磁性酸化鉄−グラフェン複合体の平均サイズ(lateral size)をSEMイメージで分析し、その結果を図8に示した。図8に示されているように、磁性酸化鉄−グラフェン複合体の大きさ(lateral size)は約0.5μm乃至7μmの分布を有し、平均サイズは約2.38μmであることを確認することができた。
PMMA/Chloroform溶液に適切な量の実施例3で製造された酸化鉄−グラフェン複合体を添加して60℃乃至75℃、3時間乃至6時間solventとして用いたchloroformを蒸発させた後、60℃で残留chloroformを蒸発させるために12時間減圧乾燥した。減圧乾燥後、hot pressを使って5MPa、210℃、10分間加圧してフィルム形態のsheetを製造し、EMI shielding efficiencyを測定した。測定結果を図10に示した。
Claims (17)
- グラファイトおよび鉄のハロゲン塩を混合し熱処理する段階(段階1);
前記段階1の生成物を(C1-20アルキル)アミンと反応させる段階(段階2);
前記段階2の生成物を洗浄する段階(段階3);
前記段階3の生成物を高速均質化する段階(段階4);および
前記段階4の生成物を超音波処理または高圧均質化する段階(段階5)を含む、磁性酸化鉄−グラフェン複合体の製造方法。 - 前記鉄のハロゲン塩はFeCl3、FeCl2、またはその混合物であることを特徴とする、請求項1に記載の製造方法。
- 前記段階1で、グラファイトおよび鉄のハロゲン塩の重量比は1:1ないし1:10であることを特徴とする、請求項1に記載の製造方法。
- 前記熱処理は300℃乃至400℃であることを特徴とする、請求項1に記載の製造方法。
- 前記段階1は24時間以上行うことを特徴とする、請求項1に記載の製造方法。
- 前記(C1-20アルキル)アミンは、ヘキシルアミン、またはドデシルアミンであることを特徴とする、請求項1に記載の製造方法。
- 前記段階2は30℃乃至250℃で6時間以上行うことを特徴とする、請求項1に記載の製造方法。
- 前記段階4の高速均質化は、前記段階2の生成物を3000ないし8000rpmで攪拌して行うことを特徴とする、請求項1に記載の製造方法。
- 前記段階4は0.5時間乃至3時間行うことを特徴とする、請求項1に記載の製造方法。
- 前記段階5の高圧均質化は、前記段階4の生成物を流入部と、流出部と、流入部と流出部の間を連結し、マイクロメータースケールの直径を有する微細流路を含む高圧均質器に通過させて行うことを特徴とする、請求項1に記載の製造方法。
- 前記微細流路は50ないし300μmの直径を有することを特徴とする、請求項10に記載の製造方法。
- 前記段階4の生成物は500ないし3000barの圧力印加下で前記高圧均質器の流入部に流入して微細流路を通過することを特徴とする、請求項10に記載の製造方法。
- 前記段階5を2回乃至10回さらに行うことを特徴とする、請求項10に記載の製造方法。
- 前記磁性酸化鉄−グラフェン複合体の酸化鉄はFe3O4またはFe2O3であることを特徴とする、請求項1に記載の製造方法。
- 請求項1乃至14のいずれか1項に記載の製造方法で製造された、磁性酸化鉄−グラフェン複合体。
- 前記磁性酸化鉄−グラフェン複合体の平均サイズ(lateral size)は0.5μm乃至10μmであり、平均厚さは0.5nm乃至15nmであることを特徴とする、請求項15に記載の磁性酸化鉄−グラフェン複合体。
- 請求項15に記載の磁性酸化鉄−グラフェン複合体を含む電磁波遮蔽用組成物。
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014103283A (ja) * | 2012-11-20 | 2014-06-05 | Seiji Kagawa | 電磁波吸収フィルムの製造方法 |
JP2015023036A (ja) * | 2013-07-16 | 2015-02-02 | 東レ株式会社 | 電磁波吸収体およびその製造方法 |
WO2015044478A1 (es) * | 2013-09-24 | 2015-04-02 | Consejo Superior De Investigaciones Científicas (Csic) | Exfoliación de grafito con disolventes eutécticos profundos |
KR20150076093A (ko) * | 2013-12-26 | 2015-07-06 | 주식회사 엘지화학 | 그래핀의 제조 방법과, 그래핀의 분산 조성물 |
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US6124365A (en) | 1996-12-06 | 2000-09-26 | Amcol Internatioanl Corporation | Intercalates and exfoliates formed with long chain (C6+) or aromatic matrix polymer-compatible monomeric, oligomeric or polymeric intercalant compounds and composite materials containing same |
JP5471465B2 (ja) | 2010-01-12 | 2014-04-16 | 株式会社豊田中央研究所 | グラファイト層間化合物の製造方法 |
KR101292151B1 (ko) | 2010-12-29 | 2013-08-09 | 한국과학기술연구원 | 그라핀-산화철 복합체 및 그 제조방법 |
CN102390830B (zh) | 2011-08-23 | 2013-04-17 | 华南理工大学 | 聚酰胺胺原位插层石墨烯复合材料的制备方法 |
KR101945818B1 (ko) | 2011-10-04 | 2019-02-08 | 성균관대학교산학협력단 | 그래핀에 지지된 금속 성분을 포함하는 복합체, 그의 제조방법 및 용도 |
CN102583336B (zh) | 2012-01-20 | 2014-09-03 | 厦门大学 | 一种磁功能化石墨烯复合材料的制备方法 |
JP5933374B2 (ja) * | 2012-07-03 | 2016-06-08 | ハリマ化成株式会社 | 薄層黒鉛または薄層黒鉛化合物の製造方法 |
TWI466818B (zh) | 2012-08-10 | 2015-01-01 | 國立清華大學 | 磁性石墨烯奈米複合物的製備方法 |
KR20140045160A (ko) | 2012-10-08 | 2014-04-16 | 대주전자재료 주식회사 | 저산화된 그래핀 옥사이드 및 이의 제조방법 |
TWI485106B (zh) * | 2012-10-16 | 2015-05-21 | Ritedia Corp | 石墨烯薄片製備方法及其所製備之石墨烯薄片 |
US11098233B2 (en) | 2012-12-04 | 2021-08-24 | William Marsh Rice University | Carbonaceous nanoparticles as conductivity enhancement additives to water-in-oil emulsions, oil-in-water emulsions and oil-based wellbore fluids |
US9543569B2 (en) | 2012-12-21 | 2017-01-10 | Lawrence Livermore National Security, Llc | Graphene-supported metal oxide monolith |
KR101467993B1 (ko) | 2013-02-14 | 2014-12-02 | 한국기계연구원 | 전자파 흡수를 위한 그래핀―자성금속 복합체 및 이의 제조방법 |
KR101682007B1 (ko) * | 2013-12-26 | 2016-12-02 | 주식회사 엘지화학 | 그래핀의 제조 방법 |
US10457557B2 (en) * | 2014-06-20 | 2019-10-29 | Directa Plus S.P.A. | Process for preparing graphene nanoplatelets |
KR101818703B1 (ko) * | 2014-12-11 | 2018-01-16 | 주식회사 엘지화학 | 고속 균질화 전처리 및 고압 균질화를 이용한 그래핀의 제조 방법 |
-
2015
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014103283A (ja) * | 2012-11-20 | 2014-06-05 | Seiji Kagawa | 電磁波吸収フィルムの製造方法 |
JP2015023036A (ja) * | 2013-07-16 | 2015-02-02 | 東レ株式会社 | 電磁波吸収体およびその製造方法 |
WO2015044478A1 (es) * | 2013-09-24 | 2015-04-02 | Consejo Superior De Investigaciones Científicas (Csic) | Exfoliación de grafito con disolventes eutécticos profundos |
KR20150076093A (ko) * | 2013-12-26 | 2015-07-06 | 주식회사 엘지화학 | 그래핀의 제조 방법과, 그래핀의 분산 조성물 |
Non-Patent Citations (1)
Title |
---|
MASAKI UJIHARA: "Massive-exfoliation of magnetic graphene from acceptor-type GIC by long-chain alkyl amine", JOURNAL OF MATERIALS CHEMISTRY A, vol. 2, JPN6019001026, 2014, pages 4244 - 4250, XP055379561, ISSN: 0003959064, DOI: 10.1039/c3ta14117a * |
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