JP2017526955A - リソグラフィ装置およびデバイス製造方法 - Google Patents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
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Abstract
Description
本出願は、2014年7月16日に出願された欧州出願14177236.8号の利益を主張し、その全体が参照により本書に援用される。
Claims (7)
- 光軸を有する投影システムと、
雰囲気ガスを有する筐体と、
前記筐体内に収容される物理的構成要素と、を備え、
当該リソグラフィ装置は、前記筐体に対して前記光軸に直交する面内で所定方向に前記物理的構成要素の移動を生じさせるよう構成され、
当該リソグラフィ装置は、前記移動中に前記物理的構成要素が前記筐体に対して所定の向きを維持するよう構成され、
前記移動は、前記構成要素に対する前記雰囲気ガスの流れを生じさせ、
前記物理的構成要素は、前記光軸に直交するように向けられる第1表面を有し、
前記構成要素は、前記雰囲気ガスの流れを前記第1表面から離れる方向に向けるよう構成される流向システムを含むことを特徴とするリソグラフィ装置。 - 前記流向システムは、前記物理的構成要素の前面を成形することを含み、前記前面が前記移動中に前記物理的構成要素の前部として機能することを特徴とする請求項1に記載のリソグラフィ装置。
- 前記成形することは、前記第1表面に直交する方向の前記物理的構成要素の厚さが前記第1表面と前記前面とが当接する位置に近づく方向に減少するように、前記第1表面に直交する方向に対して前記前部に角度を付けることを含むことを特徴とする請求項2に記載のリソグラフィ装置。
- 前記成形することは、前記前面への凹部形成を含み、前記凹部は、前記前面の前記第1表面から離れた位置にあり、前記前面と前記第1表面が当接する縁部とは異なる前記前面の縁部に開いていることを特徴とする請求項2または3に記載のリソグラフィ装置。
- 前記前面を成形することは、前記第1表面の上から見たときの前記物理的構成要素の角部で少なくともなされることを特徴とする請求項2から4のいずれか一項に記載のリソグラフィ装置。
- 前記流向システムは、第1開口と第2開口の間で第1構成要素を貫通するように延在することにより、前記移動中に前記物理的構成要素の前部から前記物理的構成要素の側部または後部へ向かうガスの貫通孔流路を提供する貫通孔を含み、前記貫通孔流路は、前記第1開口から前記第2開口へ向かう前記物理的構成要素の外部周辺のガスの外側流路よりも低い流れ抵抗を有することを特徴とする請求項1から5のいずれか一項に記載のリソグラフィ装置。
- リソグラフィプロセスにおける方法であって、
雰囲気ガスを有する筐体に対して第1表面を有する物理的構成要素を移動させ、前記物理的構成要素に対して前記雰囲気ガスの流れを生じさせることと、
前記第1表面から離れる方向に前記雰囲気ガスの流れを向けることと、を備えることを特徴とする方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14177236.8 | 2014-07-16 | ||
EP14177236 | 2014-07-16 | ||
PCT/EP2015/062631 WO2016008641A1 (en) | 2014-07-16 | 2015-06-08 | Lithographic apparatus and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017526955A true JP2017526955A (ja) | 2017-09-14 |
JP6400827B2 JP6400827B2 (ja) | 2018-10-03 |
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JP2017502658A Active JP6400827B2 (ja) | 2014-07-16 | 2015-06-08 | リソグラフィ装置およびデバイス製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10133197B2 (ja) |
JP (1) | JP6400827B2 (ja) |
KR (1) | KR101947049B1 (ja) |
CN (1) | CN106537256B (ja) |
NL (1) | NL2014934A (ja) |
TW (1) | TWI575337B (ja) |
WO (1) | WO2016008641A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107329371B (zh) * | 2016-04-28 | 2019-01-22 | 中芯国际集成电路制造(上海)有限公司 | 套刻测量***以及测量套刻精度的方法 |
KR20190005955A (ko) * | 2016-05-12 | 2019-01-16 | 에이에스엠엘 네델란즈 비.브이. | 측정치 획득 방법, 프로세스 단계 수행 장치, 계측 장치, 디바이스 제조 방법 |
Citations (6)
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JP2004296829A (ja) * | 2003-03-27 | 2004-10-21 | Semiconductor Leading Edge Technologies Inc | ペリクル構造体の姿勢制御機構及び露光方法 |
WO2005083758A1 (ja) * | 2004-03-02 | 2005-09-09 | Nikon Corporation | ステ−ジ装置及び投影露光装置 |
JP2006308996A (ja) * | 2005-04-28 | 2006-11-09 | Fuji Photo Film Co Ltd | 露光装置 |
JP2010021549A (ja) * | 2008-07-09 | 2010-01-28 | Nikon Corp | ステージ装置、露光装置、及びデバイス製造方法 |
JP2012209401A (ja) * | 2011-03-29 | 2012-10-25 | Canon Inc | 計測装置、リソグラフィ装置及びデバイスの製造方法。 |
JP2014165342A (ja) * | 2013-02-25 | 2014-09-08 | Dainippon Printing Co Ltd | インプリント装置およびインプリント転写体の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10209040A (ja) | 1996-11-25 | 1998-08-07 | Nikon Corp | 露光装置 |
TW480372B (en) | 1999-11-05 | 2002-03-21 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method |
US6954255B2 (en) * | 2001-06-15 | 2005-10-11 | Canon Kabushiki Kaisha | Exposure apparatus |
US6934003B2 (en) * | 2002-01-07 | 2005-08-23 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
NL1036543A1 (nl) | 2008-02-20 | 2009-08-24 | Asml Netherlands Bv | Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method. |
US8493547B2 (en) * | 2009-08-25 | 2013-07-23 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
NL2008184A (en) | 2011-02-28 | 2012-08-29 | Asml Netherlands Bv | Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
NL2009139A (en) | 2011-08-05 | 2013-02-06 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
-
2015
- 2015-06-08 CN CN201580038638.7A patent/CN106537256B/zh active Active
- 2015-06-08 US US15/325,987 patent/US10133197B2/en active Active
- 2015-06-08 KR KR1020177004218A patent/KR101947049B1/ko active IP Right Grant
- 2015-06-08 WO PCT/EP2015/062631 patent/WO2016008641A1/en active Application Filing
- 2015-06-08 JP JP2017502658A patent/JP6400827B2/ja active Active
- 2015-06-08 NL NL2014934A patent/NL2014934A/en unknown
- 2015-06-24 TW TW104120374A patent/TWI575337B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004296829A (ja) * | 2003-03-27 | 2004-10-21 | Semiconductor Leading Edge Technologies Inc | ペリクル構造体の姿勢制御機構及び露光方法 |
WO2005083758A1 (ja) * | 2004-03-02 | 2005-09-09 | Nikon Corporation | ステ−ジ装置及び投影露光装置 |
JP2006308996A (ja) * | 2005-04-28 | 2006-11-09 | Fuji Photo Film Co Ltd | 露光装置 |
JP2010021549A (ja) * | 2008-07-09 | 2010-01-28 | Nikon Corp | ステージ装置、露光装置、及びデバイス製造方法 |
JP2012209401A (ja) * | 2011-03-29 | 2012-10-25 | Canon Inc | 計測装置、リソグラフィ装置及びデバイスの製造方法。 |
JP2014165342A (ja) * | 2013-02-25 | 2014-09-08 | Dainippon Printing Co Ltd | インプリント装置およびインプリント転写体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2016008641A1 (en) | 2016-01-21 |
KR20170032401A (ko) | 2017-03-22 |
KR101947049B1 (ko) | 2019-05-16 |
US10133197B2 (en) | 2018-11-20 |
TWI575337B (zh) | 2017-03-21 |
US20170160653A1 (en) | 2017-06-08 |
CN106537256B (zh) | 2019-12-27 |
JP6400827B2 (ja) | 2018-10-03 |
CN106537256A (zh) | 2017-03-22 |
TW201606448A (zh) | 2016-02-16 |
NL2014934A (en) | 2016-04-12 |
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